TWI688616B - 乾膜光阻用保護膜及感光性樹脂層合體 - Google Patents

乾膜光阻用保護膜及感光性樹脂層合體 Download PDF

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Publication number
TWI688616B
TWI688616B TW104142773A TW104142773A TWI688616B TW I688616 B TWI688616 B TW I688616B TW 104142773 A TW104142773 A TW 104142773A TW 104142773 A TW104142773 A TW 104142773A TW I688616 B TWI688616 B TW I688616B
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TW
Taiwan
Prior art keywords
film
protective film
photosensitive resin
group
coating
Prior art date
Application number
TW104142773A
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English (en)
Chinese (zh)
Other versions
TW201631069A (zh
Inventor
棟泰人
森井秀和
舟津良亮
井崎公裕
Original Assignee
日商三菱化學股份有限公司
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Application filed by 日商三菱化學股份有限公司 filed Critical 日商三菱化學股份有限公司
Publication of TW201631069A publication Critical patent/TW201631069A/zh
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Publication of TWI688616B publication Critical patent/TWI688616B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

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  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
TW104142773A 2014-12-24 2015-12-18 乾膜光阻用保護膜及感光性樹脂層合體 TWI688616B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014259623A JP6471490B2 (ja) 2014-12-24 2014-12-24 ドライフィルムレジスト用保護フィルムおよび感光性樹脂積層体
JP2014-259623 2014-12-24

Publications (2)

Publication Number Publication Date
TW201631069A TW201631069A (zh) 2016-09-01
TWI688616B true TWI688616B (zh) 2020-03-21

Family

ID=56150068

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104142773A TWI688616B (zh) 2014-12-24 2015-12-18 乾膜光阻用保護膜及感光性樹脂層合體

Country Status (4)

Country Link
JP (1) JP6471490B2 (ja)
CN (1) CN107111235B (ja)
TW (1) TWI688616B (ja)
WO (1) WO2016104036A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017181673A (ja) * 2016-03-29 2017-10-05 三菱ケミカル株式会社 フォトレジスト用保護フィルム
JP2018077426A (ja) * 2016-11-11 2018-05-17 ニッコー・マテリアルズ株式会社 フォトレジストフィルム、レジストパターンの形成方法、および導体パターンの形成方法
CN109388026A (zh) * 2017-08-11 2019-02-26 日兴材料株式会社 光致抗蚀膜、抗蚀图案的形成方法及导体图案的形成方法
JP7167463B2 (ja) 2018-03-27 2022-11-09 三菱ケミカル株式会社 ドライフィルムレジスト用保護フィルム
CN112789172B (zh) * 2018-08-09 2023-08-15 东丽薄膜先端加工股份有限公司 脱模膜
WO2021137467A1 (ko) * 2019-12-31 2021-07-08 코오롱인더스트리 주식회사 감광성 수지층, 이를 이용한 드라이 필름 포토레지스트, 및 감광성 엘리먼트

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1806000A (zh) * 2003-09-11 2006-07-19 三菱聚酯薄膜公司 高分辨率干膜光阻用聚酯薄膜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4129543B2 (ja) * 2002-08-08 2008-08-06 三菱樹脂株式会社 ドライフィルムレジスト用保護フィルム
JP4701838B2 (ja) * 2005-05-30 2011-06-15 東洋紡績株式会社 極細線フォトレジスト用ポリエステルフィルム
JP5127306B2 (ja) * 2007-06-06 2013-01-23 三菱樹脂株式会社 感光性粘着樹脂用保護ポリエステルフィルム
JP2009169351A (ja) * 2008-01-21 2009-07-30 Mitsubishi Plastics Inc 液状レジストフォトマスク保護テープ用ポリエステルフィルム
JP5363176B2 (ja) * 2009-04-16 2013-12-11 帝人デュポンフィルム株式会社 離型フィルム
JP5307050B2 (ja) * 2010-02-07 2013-10-02 三菱樹脂株式会社 積層ポリエステルフィルム
JP5553627B2 (ja) * 2010-02-07 2014-07-16 三菱樹脂株式会社 積層ポリエステルフィルム
JP5271293B2 (ja) * 2010-02-07 2013-08-21 三菱樹脂株式会社 積層ポリエステルフィルム
JP5700547B2 (ja) * 2011-05-30 2015-04-15 国立大学法人京都大学 バイオチップ形成用感光性樹脂組成物、及びバイオチップ

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1806000A (zh) * 2003-09-11 2006-07-19 三菱聚酯薄膜公司 高分辨率干膜光阻用聚酯薄膜

Also Published As

Publication number Publication date
JP2016118727A (ja) 2016-06-30
CN107111235A (zh) 2017-08-29
CN107111235B (zh) 2020-11-10
WO2016104036A1 (ja) 2016-06-30
TW201631069A (zh) 2016-09-01
JP6471490B2 (ja) 2019-02-20

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