TWI688616B - 乾膜光阻用保護膜及感光性樹脂層合體 - Google Patents
乾膜光阻用保護膜及感光性樹脂層合體 Download PDFInfo
- Publication number
- TWI688616B TWI688616B TW104142773A TW104142773A TWI688616B TW I688616 B TWI688616 B TW I688616B TW 104142773 A TW104142773 A TW 104142773A TW 104142773 A TW104142773 A TW 104142773A TW I688616 B TWI688616 B TW I688616B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- protective film
- photosensitive resin
- group
- coating
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Laminated Bodies (AREA)
- Materials For Photolithography (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014259623A JP6471490B2 (ja) | 2014-12-24 | 2014-12-24 | ドライフィルムレジスト用保護フィルムおよび感光性樹脂積層体 |
JP2014-259623 | 2014-12-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201631069A TW201631069A (zh) | 2016-09-01 |
TWI688616B true TWI688616B (zh) | 2020-03-21 |
Family
ID=56150068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104142773A TWI688616B (zh) | 2014-12-24 | 2015-12-18 | 乾膜光阻用保護膜及感光性樹脂層合體 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6471490B2 (ja) |
CN (1) | CN107111235B (ja) |
TW (1) | TWI688616B (ja) |
WO (1) | WO2016104036A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017181673A (ja) * | 2016-03-29 | 2017-10-05 | 三菱ケミカル株式会社 | フォトレジスト用保護フィルム |
JP2018077426A (ja) * | 2016-11-11 | 2018-05-17 | ニッコー・マテリアルズ株式会社 | フォトレジストフィルム、レジストパターンの形成方法、および導体パターンの形成方法 |
CN109388026A (zh) * | 2017-08-11 | 2019-02-26 | 日兴材料株式会社 | 光致抗蚀膜、抗蚀图案的形成方法及导体图案的形成方法 |
JP7167463B2 (ja) | 2018-03-27 | 2022-11-09 | 三菱ケミカル株式会社 | ドライフィルムレジスト用保護フィルム |
CN112789172B (zh) * | 2018-08-09 | 2023-08-15 | 东丽薄膜先端加工股份有限公司 | 脱模膜 |
WO2021137467A1 (ko) * | 2019-12-31 | 2021-07-08 | 코오롱인더스트리 주식회사 | 감광성 수지층, 이를 이용한 드라이 필름 포토레지스트, 및 감광성 엘리먼트 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1806000A (zh) * | 2003-09-11 | 2006-07-19 | 三菱聚酯薄膜公司 | 高分辨率干膜光阻用聚酯薄膜 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4129543B2 (ja) * | 2002-08-08 | 2008-08-06 | 三菱樹脂株式会社 | ドライフィルムレジスト用保護フィルム |
JP4701838B2 (ja) * | 2005-05-30 | 2011-06-15 | 東洋紡績株式会社 | 極細線フォトレジスト用ポリエステルフィルム |
JP5127306B2 (ja) * | 2007-06-06 | 2013-01-23 | 三菱樹脂株式会社 | 感光性粘着樹脂用保護ポリエステルフィルム |
JP2009169351A (ja) * | 2008-01-21 | 2009-07-30 | Mitsubishi Plastics Inc | 液状レジストフォトマスク保護テープ用ポリエステルフィルム |
JP5363176B2 (ja) * | 2009-04-16 | 2013-12-11 | 帝人デュポンフィルム株式会社 | 離型フィルム |
JP5307050B2 (ja) * | 2010-02-07 | 2013-10-02 | 三菱樹脂株式会社 | 積層ポリエステルフィルム |
JP5553627B2 (ja) * | 2010-02-07 | 2014-07-16 | 三菱樹脂株式会社 | 積層ポリエステルフィルム |
JP5271293B2 (ja) * | 2010-02-07 | 2013-08-21 | 三菱樹脂株式会社 | 積層ポリエステルフィルム |
JP5700547B2 (ja) * | 2011-05-30 | 2015-04-15 | 国立大学法人京都大学 | バイオチップ形成用感光性樹脂組成物、及びバイオチップ |
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2014
- 2014-12-24 JP JP2014259623A patent/JP6471490B2/ja active Active
-
2015
- 2015-11-26 WO PCT/JP2015/083209 patent/WO2016104036A1/ja active Application Filing
- 2015-11-26 CN CN201580069400.0A patent/CN107111235B/zh active Active
- 2015-12-18 TW TW104142773A patent/TWI688616B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1806000A (zh) * | 2003-09-11 | 2006-07-19 | 三菱聚酯薄膜公司 | 高分辨率干膜光阻用聚酯薄膜 |
Also Published As
Publication number | Publication date |
---|---|
JP2016118727A (ja) | 2016-06-30 |
CN107111235A (zh) | 2017-08-29 |
CN107111235B (zh) | 2020-11-10 |
WO2016104036A1 (ja) | 2016-06-30 |
TW201631069A (zh) | 2016-09-01 |
JP6471490B2 (ja) | 2019-02-20 |
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