TWI663038B - 導電材料之壓印微影方法及壓印微影之印模與壓印微影之設備 - Google Patents
導電材料之壓印微影方法及壓印微影之印模與壓印微影之設備 Download PDFInfo
- Publication number
- TWI663038B TWI663038B TW106126054A TW106126054A TWI663038B TW I663038 B TWI663038 B TW I663038B TW 106126054 A TW106126054 A TW 106126054A TW 106126054 A TW106126054 A TW 106126054A TW I663038 B TWI663038 B TW I663038B
- Authority
- TW
- Taiwan
- Prior art keywords
- stamp
- conductive paste
- layer
- patterned layer
- lithography
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
??PCT/US2016/045769 | 2016-08-05 | ||
PCT/US2016/045769 WO2018026378A1 (en) | 2016-08-05 | 2016-08-05 | Method of imprint lithography of conductive materials; stamp for imprint lithography, and apparatus for imprint lithograph |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201815545A TW201815545A (zh) | 2018-05-01 |
TWI663038B true TWI663038B (zh) | 2019-06-21 |
Family
ID=61073033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106126054A TWI663038B (zh) | 2016-08-05 | 2017-08-02 | 導電材料之壓印微影方法及壓印微影之印模與壓印微影之設備 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2019527938A (ko) |
KR (1) | KR20190027389A (ko) |
CN (1) | CN109564852A (ko) |
TW (1) | TWI663038B (ko) |
WO (1) | WO2018026378A1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10948818B2 (en) * | 2018-03-19 | 2021-03-16 | Applied Materials, Inc. | Methods and apparatus for creating a large area imprint without a seam |
CN112219164A (zh) * | 2018-03-26 | 2021-01-12 | 应用材料公司 | 用于生产多层压印母版的方法、多层压印母版及多层压印母版的用途 |
US10705268B2 (en) * | 2018-06-29 | 2020-07-07 | Applied Materials, Inc. | Gap fill of imprinted structure with spin coated high refractive index material for optical components |
CN112689797A (zh) * | 2018-09-12 | 2021-04-20 | 应用材料公司 | 用于制造压印光刻的印模的方法、用于压印光刻的印模、压印辊子、和卷对卷基板处理设备 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200846278A (en) * | 2007-05-24 | 2008-12-01 | Contrel Technology Co Ltd | Method for producing viscous micro-structure |
US20090046362A1 (en) * | 2007-04-10 | 2009-02-19 | Lingjie Jay Guo | Roll to roll nanoimprint lithography |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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US5296043A (en) * | 1990-02-16 | 1994-03-22 | Canon Kabushiki Kaisha | Multi-cells integrated solar cell module and process for producing the same |
JPH08118467A (ja) * | 1994-10-21 | 1996-05-14 | Matsushita Electric Ind Co Ltd | スクリーン印刷用グリーンシート |
US7857611B2 (en) * | 2006-02-14 | 2010-12-28 | Pioneer Corporation | Imprinting device and imprinting method |
US20070298176A1 (en) * | 2006-06-26 | 2007-12-27 | Dipietro Richard Anthony | Aromatic vinyl ether based reverse-tone step and flash imprint lithography |
KR20090107494A (ko) * | 2006-12-05 | 2009-10-13 | 나노 테라 인코포레이티드 | 표면을 패턴화하는 방법 |
WO2008100583A1 (en) * | 2007-02-13 | 2008-08-21 | Yale University | Method for imprinting and erasing amorphous metal alloys |
KR20090061771A (ko) * | 2007-12-12 | 2009-06-17 | 인하대학교 산학협력단 | 마이크로 구조물 제작을 나노 임프린트 리소그래피 공정기법의 몰드 구조 형성 방법 |
JP5388539B2 (ja) * | 2008-10-28 | 2014-01-15 | 旭化成イーマテリアルズ株式会社 | パターン形成方法 |
JP5518538B2 (ja) * | 2009-03-26 | 2014-06-11 | 富士フイルム株式会社 | レジスト組成物、レジスト層、インプリント方法、パターン形成体、磁気記録媒体の製造方法、及び磁気記録媒体 |
JP2010262959A (ja) * | 2009-04-30 | 2010-11-18 | Murata Mfg Co Ltd | 配線パターンの形成方法 |
JP2010263000A (ja) * | 2009-04-30 | 2010-11-18 | Murata Mfg Co Ltd | 電子部品製造方法 |
KR101076520B1 (ko) * | 2009-06-11 | 2011-10-24 | 고려대학교 산학협력단 | 나노 임프린트 리소그래피 공정을 이용한 광전자 소자 제조 방법 |
JP2010287765A (ja) * | 2009-06-12 | 2010-12-24 | Murata Mfg Co Ltd | インプリント方法、配線パターンの形成方法、および積層電子部品 |
JP5540628B2 (ja) * | 2009-09-28 | 2014-07-02 | 大日本印刷株式会社 | ナノインプリントパターン形成方法 |
JP5491997B2 (ja) * | 2010-07-07 | 2014-05-14 | 株式会社東芝 | テンプレートの製造方法および半導体装置の製造方法 |
JP5599355B2 (ja) * | 2011-03-31 | 2014-10-01 | 富士フイルム株式会社 | モールドの製造方法 |
WO2012167076A2 (en) * | 2011-06-01 | 2012-12-06 | The Regents Of The University Of Michigan | Nanochannel-guided patterning for polymeric substrates |
CN103959485A (zh) * | 2011-09-23 | 2014-07-30 | 1366科技公司 | 用于利用包括不填满以保留间隙的印模和脉动印模在衬底上改进压印软材料的技术 |
JP5824399B2 (ja) * | 2012-03-30 | 2015-11-25 | 富士フイルム株式会社 | ナノインプリント用樹脂モールドおよびその製造方法 |
JP6307269B2 (ja) * | 2013-04-09 | 2018-04-04 | 旭化成株式会社 | 微細パターン形成用積層体、モールドの製造方法 |
-
2016
- 2016-08-05 JP JP2019506171A patent/JP2019527938A/ja active Pending
- 2016-08-05 KR KR1020197006249A patent/KR20190027389A/ko not_active Application Discontinuation
- 2016-08-05 WO PCT/US2016/045769 patent/WO2018026378A1/en active Application Filing
- 2016-08-05 CN CN201680088160.3A patent/CN109564852A/zh active Pending
-
2017
- 2017-08-02 TW TW106126054A patent/TWI663038B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090046362A1 (en) * | 2007-04-10 | 2009-02-19 | Lingjie Jay Guo | Roll to roll nanoimprint lithography |
TW200846278A (en) * | 2007-05-24 | 2008-12-01 | Contrel Technology Co Ltd | Method for producing viscous micro-structure |
Also Published As
Publication number | Publication date |
---|---|
TW201815545A (zh) | 2018-05-01 |
WO2018026378A1 (en) | 2018-02-08 |
CN109564852A (zh) | 2019-04-02 |
JP2019527938A (ja) | 2019-10-03 |
KR20190027389A (ko) | 2019-03-14 |
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