TWI663038B - 導電材料之壓印微影方法及壓印微影之印模與壓印微影之設備 - Google Patents
導電材料之壓印微影方法及壓印微影之印模與壓印微影之設備 Download PDFInfo
- Publication number
- TWI663038B TWI663038B TW106126054A TW106126054A TWI663038B TW I663038 B TWI663038 B TW I663038B TW 106126054 A TW106126054 A TW 106126054A TW 106126054 A TW106126054 A TW 106126054A TW I663038 B TWI663038 B TW I663038B
- Authority
- TW
- Taiwan
- Prior art keywords
- stamp
- conductive paste
- layer
- patterned layer
- lithography
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2016/045769 WO2018026378A1 (en) | 2016-08-05 | 2016-08-05 | Method of imprint lithography of conductive materials; stamp for imprint lithography, and apparatus for imprint lithograph |
??PCT/US2016/045769 | 2016-08-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201815545A TW201815545A (zh) | 2018-05-01 |
TWI663038B true TWI663038B (zh) | 2019-06-21 |
Family
ID=61073033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106126054A TWI663038B (zh) | 2016-08-05 | 2017-08-02 | 導電材料之壓印微影方法及壓印微影之印模與壓印微影之設備 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2019527938A (ja) |
KR (1) | KR20190027389A (ja) |
CN (1) | CN109564852A (ja) |
TW (1) | TWI663038B (ja) |
WO (1) | WO2018026378A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10948818B2 (en) * | 2018-03-19 | 2021-03-16 | Applied Materials, Inc. | Methods and apparatus for creating a large area imprint without a seam |
CN112219164A (zh) * | 2018-03-26 | 2021-01-12 | 应用材料公司 | 用于生产多层压印母版的方法、多层压印母版及多层压印母版的用途 |
US10705268B2 (en) * | 2018-06-29 | 2020-07-07 | Applied Materials, Inc. | Gap fill of imprinted structure with spin coated high refractive index material for optical components |
CN112689797A (zh) * | 2018-09-12 | 2021-04-20 | 应用材料公司 | 用于制造压印光刻的印模的方法、用于压印光刻的印模、压印辊子、和卷对卷基板处理设备 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200846278A (en) * | 2007-05-24 | 2008-12-01 | Contrel Technology Co Ltd | Method for producing viscous micro-structure |
US20090046362A1 (en) * | 2007-04-10 | 2009-02-19 | Lingjie Jay Guo | Roll to roll nanoimprint lithography |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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US5296043A (en) * | 1990-02-16 | 1994-03-22 | Canon Kabushiki Kaisha | Multi-cells integrated solar cell module and process for producing the same |
JPH08118467A (ja) * | 1994-10-21 | 1996-05-14 | Matsushita Electric Ind Co Ltd | スクリーン印刷用グリーンシート |
WO2007094213A1 (ja) * | 2006-02-14 | 2007-08-23 | Pioneer Corporation | インプリント装置及びインプリント方法 |
US20070298176A1 (en) * | 2006-06-26 | 2007-12-27 | Dipietro Richard Anthony | Aromatic vinyl ether based reverse-tone step and flash imprint lithography |
JP2010512028A (ja) * | 2006-12-05 | 2010-04-15 | ナノ テラ インコーポレイテッド | 表面をパターニングするための方法 |
EP2121992A4 (en) * | 2007-02-13 | 2015-07-08 | Univ Yale | METHOD OF PRINTING AND DELETING PATTERNS ON AMORPHOUS METALLIC ALLOYS |
KR20090061771A (ko) * | 2007-12-12 | 2009-06-17 | 인하대학교 산학협력단 | 마이크로 구조물 제작을 나노 임프린트 리소그래피 공정기법의 몰드 구조 형성 방법 |
JP5388539B2 (ja) * | 2008-10-28 | 2014-01-15 | 旭化成イーマテリアルズ株式会社 | パターン形成方法 |
JP5518538B2 (ja) * | 2009-03-26 | 2014-06-11 | 富士フイルム株式会社 | レジスト組成物、レジスト層、インプリント方法、パターン形成体、磁気記録媒体の製造方法、及び磁気記録媒体 |
JP2010262959A (ja) * | 2009-04-30 | 2010-11-18 | Murata Mfg Co Ltd | 配線パターンの形成方法 |
JP2010263000A (ja) * | 2009-04-30 | 2010-11-18 | Murata Mfg Co Ltd | 電子部品製造方法 |
KR101076520B1 (ko) * | 2009-06-11 | 2011-10-24 | 고려대학교 산학협력단 | 나노 임프린트 리소그래피 공정을 이용한 광전자 소자 제조 방법 |
JP2010287765A (ja) * | 2009-06-12 | 2010-12-24 | Murata Mfg Co Ltd | インプリント方法、配線パターンの形成方法、および積層電子部品 |
JP5540628B2 (ja) * | 2009-09-28 | 2014-07-02 | 大日本印刷株式会社 | ナノインプリントパターン形成方法 |
JP5491997B2 (ja) * | 2010-07-07 | 2014-05-14 | 株式会社東芝 | テンプレートの製造方法および半導体装置の製造方法 |
JP5599355B2 (ja) * | 2011-03-31 | 2014-10-01 | 富士フイルム株式会社 | モールドの製造方法 |
WO2012167076A2 (en) * | 2011-06-01 | 2012-12-06 | The Regents Of The University Of Michigan | Nanochannel-guided patterning for polymeric substrates |
KR20140064981A (ko) * | 2011-09-23 | 2014-05-28 | 1366 테크놀로지 인코포레이티드 | 간극을 남기는 언더필과 스탬프에 대한 펄스 인가를 포함하는, 스탬프를 이용하여 기판 상의 연성 재료를 각인하는 기술 |
JP5824399B2 (ja) * | 2012-03-30 | 2015-11-25 | 富士フイルム株式会社 | ナノインプリント用樹脂モールドおよびその製造方法 |
JP6307269B2 (ja) * | 2013-04-09 | 2018-04-04 | 旭化成株式会社 | 微細パターン形成用積層体、モールドの製造方法 |
-
2016
- 2016-08-05 CN CN201680088160.3A patent/CN109564852A/zh active Pending
- 2016-08-05 WO PCT/US2016/045769 patent/WO2018026378A1/en active Application Filing
- 2016-08-05 JP JP2019506171A patent/JP2019527938A/ja active Pending
- 2016-08-05 KR KR1020197006249A patent/KR20190027389A/ko not_active Application Discontinuation
-
2017
- 2017-08-02 TW TW106126054A patent/TWI663038B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090046362A1 (en) * | 2007-04-10 | 2009-02-19 | Lingjie Jay Guo | Roll to roll nanoimprint lithography |
TW200846278A (en) * | 2007-05-24 | 2008-12-01 | Contrel Technology Co Ltd | Method for producing viscous micro-structure |
Also Published As
Publication number | Publication date |
---|---|
JP2019527938A (ja) | 2019-10-03 |
WO2018026378A1 (en) | 2018-02-08 |
TW201815545A (zh) | 2018-05-01 |
CN109564852A (zh) | 2019-04-02 |
KR20190027389A (ko) | 2019-03-14 |
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