TWI659848B - 積層體之剝離裝置及剝離方法、與電子裝置之製造方法 - Google Patents
積層體之剝離裝置及剝離方法、與電子裝置之製造方法 Download PDFInfo
- Publication number
- TWI659848B TWI659848B TW104122384A TW104122384A TWI659848B TW I659848 B TWI659848 B TW I659848B TW 104122384 A TW104122384 A TW 104122384A TW 104122384 A TW104122384 A TW 104122384A TW I659848 B TWI659848 B TW I659848B
- Authority
- TW
- Taiwan
- Prior art keywords
- peeling
- substrate
- laminated body
- interface
- blade
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H41/00—Machines for separating superposed webs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/7806—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate
- H01L21/7813—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices involving the separation of the active layers from a substrate leaving a reusable substrate, e.g. epitaxial lift off
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-143019 | 2014-07-11 | ||
JP2014143019A JP6269954B2 (ja) | 2014-07-11 | 2014-07-11 | 積層体の剥離装置及び剥離方法並びに電子デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201607763A TW201607763A (zh) | 2016-03-01 |
TWI659848B true TWI659848B (zh) | 2019-05-21 |
Family
ID=55101203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104122384A TWI659848B (zh) | 2014-07-11 | 2015-07-09 | 積層體之剝離裝置及剝離方法、與電子裝置之製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6269954B2 (ko) |
KR (1) | KR102471564B1 (ko) |
CN (1) | CN105261578B (ko) |
TW (1) | TWI659848B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110065291A (zh) * | 2019-04-25 | 2019-07-30 | 业成科技(成都)有限公司 | 胶贴合件分离装置以及胶贴合件分离方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102171745A (zh) * | 2009-02-06 | 2011-08-31 | 旭硝子株式会社 | 电子器件的制造方法及该方法中使用的剥离装置 |
TW201321191A (zh) * | 2011-11-18 | 2013-06-01 | Au Optronics Corp | 脫黏器及自基板分離薄膜的方法 |
TW201334090A (zh) * | 2012-01-19 | 2013-08-16 | Asahi Glass Co Ltd | 剝離裝置及電子元件之製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100543024B1 (ko) * | 1998-01-21 | 2006-05-25 | 삼성전자주식회사 | 액정표시장치의 편광판 제거장치 |
JP4241697B2 (ja) * | 2005-09-06 | 2009-03-18 | ユーテック株式会社 | フィルム剥離装置 |
WO2011024689A1 (ja) | 2009-08-31 | 2011-03-03 | 旭硝子株式会社 | 剥離装置 |
JP5534222B2 (ja) | 2010-03-08 | 2014-06-25 | 旭硝子株式会社 | ガラス基板 |
JP2014031301A (ja) * | 2012-08-06 | 2014-02-20 | Asahi Glass Co Ltd | ガラス積層体用支持基板の管理方法及び管理装置 |
-
2014
- 2014-07-11 JP JP2014143019A patent/JP6269954B2/ja active Active
-
2015
- 2015-07-08 KR KR1020150097079A patent/KR102471564B1/ko active IP Right Grant
- 2015-07-09 TW TW104122384A patent/TWI659848B/zh active
- 2015-07-10 CN CN201510406254.8A patent/CN105261578B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102171745A (zh) * | 2009-02-06 | 2011-08-31 | 旭硝子株式会社 | 电子器件的制造方法及该方法中使用的剥离装置 |
TW201321191A (zh) * | 2011-11-18 | 2013-06-01 | Au Optronics Corp | 脫黏器及自基板分離薄膜的方法 |
TW201334090A (zh) * | 2012-01-19 | 2013-08-16 | Asahi Glass Co Ltd | 剝離裝置及電子元件之製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN105261578B (zh) | 2019-04-23 |
JP6269954B2 (ja) | 2018-01-31 |
TW201607763A (zh) | 2016-03-01 |
JP2016016984A (ja) | 2016-02-01 |
KR20160007399A (ko) | 2016-01-20 |
CN105261578A (zh) | 2016-01-20 |
KR102471564B1 (ko) | 2022-11-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI659849B (zh) | 積層體之剝離裝置及剝離方法、與電子裝置之製造方法 | |
TWI680060B (zh) | 積層體之剝離開始部作成方法、剝離開始部作成裝置以及電子元件之製造方法 | |
TWI695807B (zh) | 積層體之剝離裝置及剝離方法與電子裝置之製造方法 | |
KR102535656B1 (ko) | 적층체의 박리 장치 및 박리 방법, 및 전자 디바이스의 제조 방법 | |
TWI663060B (zh) | 積層體之剝離裝置及剝離方法、以及電子裝置之製造方法 | |
JP2016147758A (ja) | 積層体の剥離装置、及び剥離方法並びに電子デバイスの製造方法 | |
TWI659848B (zh) | 積層體之剝離裝置及剝離方法、與電子裝置之製造方法 | |
TWI652731B (zh) | Stripping device and peeling method of laminated body, and manufacturing method of electronic component | |
TWI686307B (zh) | 積層體之剝離裝置及剝離方法與電子裝置之製造方法 | |
TWI659847B (zh) | 積層體之剝離裝置及剝離方法以及電子元件之製造方法 | |
JP6468462B2 (ja) | 積層体の剥離装置及び剥離方法並びに電子デバイスの製造方法 |