TWI648793B - Conductor forming device and conductor manufacturing method - Google Patents
Conductor forming device and conductor manufacturing method Download PDFInfo
- Publication number
- TWI648793B TWI648793B TW105132073A TW105132073A TWI648793B TW I648793 B TWI648793 B TW I648793B TW 105132073 A TW105132073 A TW 105132073A TW 105132073 A TW105132073 A TW 105132073A TW I648793 B TWI648793 B TW I648793B
- Authority
- TW
- Taiwan
- Prior art keywords
- pattern
- plating
- conductor
- peeling
- processed
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2016/060872 WO2017168745A1 (ja) | 2016-04-01 | 2016-04-01 | 導体形成装置及び導体製造方法 |
??PCT/JP2016/060872 | 2016-04-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201737347A TW201737347A (zh) | 2017-10-16 |
TWI648793B true TWI648793B (zh) | 2019-01-21 |
Family
ID=59962782
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105132073A TWI648793B (zh) | 2016-04-01 | 2016-10-04 | Conductor forming device and conductor manufacturing method |
TW107139032A TWI699833B (zh) | 2016-04-01 | 2016-10-04 | 導體形成裝置及導體製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107139032A TWI699833B (zh) | 2016-04-01 | 2016-10-04 | 導體形成裝置及導體製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2017168745A1 (ja) |
CN (1) | CN107710888B (ja) |
TW (2) | TWI648793B (ja) |
WO (1) | WO2017168745A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010041267A1 (en) * | 2000-04-11 | 2001-11-15 | Toshiba Tec Kabushiki Kaisha | Process and apparatus for nickel plating and nickel-plated product |
TW579306B (en) * | 2002-01-28 | 2004-03-11 | Tokyo Kakoki Co Ltd | Substrate processing equipment |
TW201246293A (en) * | 2010-12-01 | 2012-11-16 | Novellus Systems Inc | Electroplating apparatus and process for wafer level packaging |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05235506A (ja) * | 1992-02-24 | 1993-09-10 | Fujitsu Ltd | プリント基板の製造方法 |
JP3296992B2 (ja) * | 1996-09-27 | 2002-07-02 | イビデン株式会社 | 多層プリント配線板の製造方法 |
JP4044722B2 (ja) * | 2000-10-10 | 2008-02-06 | 上村工業株式会社 | 板状ワークの搬送方向変換装置 |
JP4677216B2 (ja) * | 2004-10-25 | 2011-04-27 | アルメックスPe株式会社 | 平板形状物の表面処理装置 |
KR100794961B1 (ko) * | 2006-07-04 | 2008-01-16 | 주식회사제4기한국 | 인쇄회로기판 제조용 psap 방법 |
-
2016
- 2016-04-01 JP JP2016564116A patent/JPWO2017168745A1/ja active Pending
- 2016-04-01 CN CN201680001048.1A patent/CN107710888B/zh active Active
- 2016-04-01 WO PCT/JP2016/060872 patent/WO2017168745A1/ja active Application Filing
- 2016-10-04 TW TW105132073A patent/TWI648793B/zh active
- 2016-10-04 TW TW107139032A patent/TWI699833B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010041267A1 (en) * | 2000-04-11 | 2001-11-15 | Toshiba Tec Kabushiki Kaisha | Process and apparatus for nickel plating and nickel-plated product |
TW579306B (en) * | 2002-01-28 | 2004-03-11 | Tokyo Kakoki Co Ltd | Substrate processing equipment |
TW201246293A (en) * | 2010-12-01 | 2012-11-16 | Novellus Systems Inc | Electroplating apparatus and process for wafer level packaging |
Also Published As
Publication number | Publication date |
---|---|
JPWO2017168745A1 (ja) | 2018-04-05 |
CN107710888A (zh) | 2018-02-16 |
CN107710888B (zh) | 2020-04-28 |
TW201907484A (zh) | 2019-02-16 |
TWI699833B (zh) | 2020-07-21 |
WO2017168745A1 (ja) | 2017-10-05 |
TW201737347A (zh) | 2017-10-16 |
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