TWI647739B - 圖案形成裝置及圖案形成方法 - Google Patents
圖案形成裝置及圖案形成方法 Download PDFInfo
- Publication number
- TWI647739B TWI647739B TW104130672A TW104130672A TWI647739B TW I647739 B TWI647739 B TW I647739B TW 104130672 A TW104130672 A TW 104130672A TW 104130672 A TW104130672 A TW 104130672A TW I647739 B TWI647739 B TW I647739B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- position information
- pattern
- imaging
- group
- Prior art date
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-200521 | 2014-09-30 | ||
JP2014200521A JP6357064B2 (ja) | 2014-09-30 | 2014-09-30 | パターン形成装置およびパターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201628060A TW201628060A (zh) | 2016-08-01 |
TWI647739B true TWI647739B (zh) | 2019-01-11 |
Family
ID=55789843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104130672A TWI647739B (zh) | 2014-09-30 | 2015-09-16 | 圖案形成裝置及圖案形成方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6357064B2 (ja) |
KR (1) | KR102218136B1 (ja) |
TW (1) | TWI647739B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190097065A (ko) | 2016-12-20 | 2019-08-20 | 에베 그룹 에. 탈너 게엠베하 | 광-감지 층을 노광하기 위한 디바이스 및 방법 |
US10852528B2 (en) * | 2016-12-20 | 2020-12-01 | Ev Group E. Thallner Gmbh | Method and device for exposure of photosensitive layer |
CN109957504B (zh) * | 2017-12-14 | 2022-08-02 | 长春长光华大智造测序设备有限公司 | 便于初始对准的高通量基因测序仪硅片及初始对准方法 |
JP7379183B2 (ja) | 2020-01-28 | 2023-11-14 | 株式会社Screenホールディングス | ステージ姿勢推定装置、搬送装置、およびステージ姿勢推定方法 |
JP7374790B2 (ja) | 2020-01-30 | 2023-11-07 | 株式会社Screenホールディングス | 搬送装置および搬送方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4962423A (en) * | 1988-01-27 | 1990-10-09 | Canon Kabushiki Kaisha | Mark detecting method and apparatus |
US20040223157A1 (en) * | 1999-03-24 | 2004-11-11 | Nikon Corporation | Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method |
US20080273184A1 (en) * | 2007-03-30 | 2008-11-06 | Fujifilm Corporation | Apparatus and method for referential position measurement and pattern-forming apparatus |
US20080292177A1 (en) * | 2007-05-23 | 2008-11-27 | Sheets Ronald E | System and Method for Providing Backside Alignment in a Lithographic Projection System |
US20110262868A1 (en) * | 2010-04-22 | 2011-10-27 | Nitto Denko Corporation | Method of detecting alignment mark and method of manufacturing printed circuit board |
US20120083916A1 (en) * | 2010-09-30 | 2012-04-05 | Ryo Yamada | Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000228347A (ja) * | 1999-02-08 | 2000-08-15 | Nikon Corp | 位置決め方法及び露光装置 |
JP3169068B2 (ja) * | 1997-12-04 | 2001-05-21 | 日本電気株式会社 | 電子線露光方法及び半導体ウエハ |
JPH11329950A (ja) * | 1998-05-13 | 1999-11-30 | Nikon Corp | 位置検出方法、露光方法及び露光装置 |
JPWO2006025386A1 (ja) * | 2004-08-31 | 2008-05-08 | 株式会社ニコン | 位置合わせ方法、処理システム、基板の投入再現性計測方法、位置計測方法、露光方法、基板処理装置、計測方法及び計測装置 |
JP5252249B2 (ja) * | 2006-02-17 | 2013-07-31 | 株式会社ニコン | デバイス製造処理方法 |
JP5703069B2 (ja) * | 2010-09-30 | 2015-04-15 | 株式会社Screenホールディングス | 描画装置および描画方法 |
JP5722136B2 (ja) | 2011-06-30 | 2015-05-20 | 株式会社Screenホールディングス | パターン描画装置およびパターン描画方法 |
-
2014
- 2014-09-30 JP JP2014200521A patent/JP6357064B2/ja active Active
-
2015
- 2015-09-16 TW TW104130672A patent/TWI647739B/zh active
- 2015-09-24 KR KR1020150135508A patent/KR102218136B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4962423A (en) * | 1988-01-27 | 1990-10-09 | Canon Kabushiki Kaisha | Mark detecting method and apparatus |
US20040223157A1 (en) * | 1999-03-24 | 2004-11-11 | Nikon Corporation | Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method |
US20080273184A1 (en) * | 2007-03-30 | 2008-11-06 | Fujifilm Corporation | Apparatus and method for referential position measurement and pattern-forming apparatus |
US20080292177A1 (en) * | 2007-05-23 | 2008-11-27 | Sheets Ronald E | System and Method for Providing Backside Alignment in a Lithographic Projection System |
US20110262868A1 (en) * | 2010-04-22 | 2011-10-27 | Nitto Denko Corporation | Method of detecting alignment mark and method of manufacturing printed circuit board |
US20120083916A1 (en) * | 2010-09-30 | 2012-04-05 | Ryo Yamada | Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP2016072434A (ja) | 2016-05-09 |
KR102218136B1 (ko) | 2021-02-19 |
KR20160038790A (ko) | 2016-04-07 |
JP6357064B2 (ja) | 2018-07-11 |
TW201628060A (zh) | 2016-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI647739B (zh) | 圖案形成裝置及圖案形成方法 | |
JP5406256B2 (ja) | リソグラフィ装置、デバイス製造方法および基板にパターンを与える方法 | |
TWI390373B (zh) | 傳送基板之方法、電腦可讀媒體及傳送系統 | |
KR20150034080A (ko) | 위치 계측 장치, 얼라인먼트 장치, 패턴 묘화 장치 및 위치 계측 방법 | |
JP2022514365A (ja) | オーバーレイターゲットを用いるフィールド間補正 | |
KR20220143743A (ko) | 리소그래피 공정에서 오버레이 오류를 보정하기 위한 시스템 및 방법 | |
US10444635B2 (en) | Lithographic method and apparatus | |
JP2010191127A (ja) | 露光装置、露光方法、及び表示用パネル基板の製造方法 | |
JP2009246069A (ja) | パターン描画装置およびパターン描画方法 | |
KR20130020408A (ko) | 마스크리스 노광 장치와 이를 이용한 빔 위치 계측 방법 | |
KR20120015936A (ko) | 노광 장치와 이를 이용한 정렬 오차 보정 방법 | |
TWI422980B (zh) | Exposure method and exposure apparatus, and component manufacturing method | |
CN107735731A (zh) | 光刻设备、控制方法及计算机程序产品 | |
KR20160038788A (ko) | 묘화 방법 | |
JP2013026383A (ja) | 位置合わせ装置、位置合わせ方法、および、描画装置 | |
TW201712732A (zh) | 補正資訊生成裝置、描繪裝置、補正資訊生成方法及描繪方法 | |
CN105992997B (zh) | 图案描画装置用的gui装置、图案描画系统、作业单更新方法及记录介质 | |
KR100922203B1 (ko) | 레이저 디렉트 이미징 시스템용 상하부 노광 엔진의위치정렬방법 및 장치 | |
TWI526865B (zh) | 直接描繪裝置用之圖形使用者介面裝置、直接描繪系統、描繪區域設定方法及記錄媒體 | |
JP2012198372A (ja) | 描画装置および描画方法 | |
JP2012209443A (ja) | パターン描画装置およびパターン描画方法 | |
JP2011035333A (ja) | 走査型露光装置、走査型露光方法、半導体装置の製造方法およびプログラム | |
TW202111442A (zh) | 描繪方法及描繪裝置 | |
JP2022039596A (ja) | アライメント装置、露光装置およびアライメント方法 | |
JP2022137849A (ja) | 露光方法および露光装置 |