TWI641915B - 基板處理裝置、基板處理方法、及圓筒狀光罩 - Google Patents

基板處理裝置、基板處理方法、及圓筒狀光罩 Download PDF

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Publication number
TWI641915B
TWI641915B TW101137189A TW101137189A TWI641915B TW I641915 B TWI641915 B TW I641915B TW 101137189 A TW101137189 A TW 101137189A TW 101137189 A TW101137189 A TW 101137189A TW I641915 B TWI641915 B TW I641915B
Authority
TW
Taiwan
Prior art keywords
substrate
mask
pattern
region
holding portion
Prior art date
Application number
TW101137189A
Other languages
English (en)
Chinese (zh)
Other versions
TW201329646A (zh
Inventor
鈴木智也
木內徹
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201329646A publication Critical patent/TW201329646A/zh
Application granted granted Critical
Publication of TWI641915B publication Critical patent/TWI641915B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Liquid Crystal (AREA)
TW101137189A 2012-01-12 2012-10-09 基板處理裝置、基板處理方法、及圓筒狀光罩 TWI641915B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012004307 2012-01-12
JP2012004308 2012-01-12
JPJP2012-004307 2012-01-12
JPJP2012-004308 2012-01-12

Publications (2)

Publication Number Publication Date
TW201329646A TW201329646A (zh) 2013-07-16
TWI641915B true TWI641915B (zh) 2018-11-21

Family

ID=48781281

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101137189A TWI641915B (zh) 2012-01-12 2012-10-09 基板處理裝置、基板處理方法、及圓筒狀光罩

Country Status (3)

Country Link
JP (3) JP6115473B2 (ja)
TW (1) TWI641915B (ja)
WO (1) WO2013105317A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6269660B2 (ja) * 2013-04-30 2018-01-31 株式会社ニコン 基板処理装置、デバイス製造方法及び円筒マスク
ES2648663T3 (es) * 2013-09-30 2018-01-05 Flint Group Germany Gmbh Dispositivo y método para la producción en línea de placas de impresión flexográfica
CN106896647B (zh) * 2013-10-22 2019-05-10 应用材料公司 用于基于网的处理的无掩模平版印刷
US9594274B2 (en) 2013-12-05 2017-03-14 Sumitomo Chemical Company, Limited Process for producing optically anisotropic film component
CN110451316B (zh) * 2014-09-04 2021-01-05 株式会社尼康 基板处理装置
JP6606449B2 (ja) * 2016-03-23 2019-11-13 東芝機械株式会社 転写装置および転写方法
CN111470362B (zh) * 2016-08-08 2022-04-01 株式会社尼康 基板处理装置
JP6702404B2 (ja) * 2018-12-21 2020-06-03 株式会社ニコン デバイス製造システムおよびデバイス製造方法
CN110196535B (zh) * 2019-06-20 2021-10-26 合肥芯碁微电子装备股份有限公司 一种卷对卷无掩膜激光直写光刻设备的分段曝光方法
WO2021010370A1 (ja) * 2019-07-12 2021-01-21 株式会社ニコン 基板処理方法、パターン形成方法、及び基板処理システム
JP7018419B2 (ja) 2019-10-18 2022-02-10 本田技研工業株式会社 鞍乗型車両
JP7451191B2 (ja) * 2020-01-28 2024-03-18 住友重機械工業株式会社 制御装置およびロール・ツー・ロール搬送システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200830057A (en) * 2006-09-08 2008-07-16 Nikon Corp Mask, exposure apparatus and device manufacturing method
JP2008241987A (ja) * 2007-03-27 2008-10-09 Mitsubishi Paper Mills Ltd 連続露光装置

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JPS54128733A (en) * 1978-03-29 1979-10-05 Toppan Printing Co Ltd Method of reproducing upon projection
JPH01118136A (ja) * 1988-08-24 1989-05-10 Dainippon Screen Mfg Co Ltd 原画貼付指定紙の作成装置
JPH04339690A (ja) * 1991-01-24 1992-11-26 Konica Corp 画像形成用マスク材作成方法
JP2000075497A (ja) * 1998-08-26 2000-03-14 Adtec Engineeng Co Ltd 露光装置
JP5181451B2 (ja) * 2006-09-20 2013-04-10 株式会社ニコン マスク、露光装置及び露光方法、並びにデバイス製造方法
JP2008116514A (ja) * 2006-10-31 2008-05-22 Mitsubishi Paper Mills Ltd 連続露光装置
JP5036351B2 (ja) * 2007-03-06 2012-09-26 富士フイルム株式会社 パターン露光方法及び装置
JP2009026933A (ja) * 2007-07-19 2009-02-05 Konica Minolta Holdings Inc 電磁波遮蔽フィルムの製造方法及び電磁波遮蔽フィルム
DE102007035387A1 (de) * 2007-07-26 2009-01-29 Leibnitz-Institut für neue Materialien Gemeinnützige GmbH Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien
US8221964B2 (en) * 2007-11-20 2012-07-17 Eastman Kodak Company Integrated color mask
JP2009175287A (ja) * 2008-01-23 2009-08-06 Mitsubishi Paper Mills Ltd 露光装置
JP2009237305A (ja) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd マスクパターンフィルムの巻き付け機構及び露光装置
JP2011033907A (ja) * 2009-08-04 2011-02-17 Nikon Corp 照明装置、露光装置、照明方法、露光方法及びデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200830057A (en) * 2006-09-08 2008-07-16 Nikon Corp Mask, exposure apparatus and device manufacturing method
JP2008241987A (ja) * 2007-03-27 2008-10-09 Mitsubishi Paper Mills Ltd 連続露光装置

Also Published As

Publication number Publication date
WO2013105317A1 (ja) 2013-07-18
TW201329646A (zh) 2013-07-16
JPWO2013105317A1 (ja) 2015-05-11
JP2017126095A (ja) 2017-07-20
JP6481707B2 (ja) 2019-03-13
JP6115473B2 (ja) 2017-04-19
JP2016191937A (ja) 2016-11-10
JP6210132B2 (ja) 2017-10-11

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