TWI641915B - 基板處理裝置、基板處理方法、及圓筒狀光罩 - Google Patents
基板處理裝置、基板處理方法、及圓筒狀光罩 Download PDFInfo
- Publication number
- TWI641915B TWI641915B TW101137189A TW101137189A TWI641915B TW I641915 B TWI641915 B TW I641915B TW 101137189 A TW101137189 A TW 101137189A TW 101137189 A TW101137189 A TW 101137189A TW I641915 B TWI641915 B TW I641915B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- mask
- pattern
- region
- holding portion
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012004307 | 2012-01-12 | ||
JP2012004308 | 2012-01-12 | ||
JPJP2012-004307 | 2012-01-12 | ||
JPJP2012-004308 | 2012-01-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201329646A TW201329646A (zh) | 2013-07-16 |
TWI641915B true TWI641915B (zh) | 2018-11-21 |
Family
ID=48781281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101137189A TWI641915B (zh) | 2012-01-12 | 2012-10-09 | 基板處理裝置、基板處理方法、及圓筒狀光罩 |
Country Status (3)
Country | Link |
---|---|
JP (3) | JP6115473B2 (ja) |
TW (1) | TWI641915B (ja) |
WO (1) | WO2013105317A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6269660B2 (ja) * | 2013-04-30 | 2018-01-31 | 株式会社ニコン | 基板処理装置、デバイス製造方法及び円筒マスク |
ES2648663T3 (es) * | 2013-09-30 | 2018-01-05 | Flint Group Germany Gmbh | Dispositivo y método para la producción en línea de placas de impresión flexográfica |
CN106896647B (zh) * | 2013-10-22 | 2019-05-10 | 应用材料公司 | 用于基于网的处理的无掩模平版印刷 |
US9594274B2 (en) | 2013-12-05 | 2017-03-14 | Sumitomo Chemical Company, Limited | Process for producing optically anisotropic film component |
CN110451316B (zh) * | 2014-09-04 | 2021-01-05 | 株式会社尼康 | 基板处理装置 |
JP6606449B2 (ja) * | 2016-03-23 | 2019-11-13 | 東芝機械株式会社 | 転写装置および転写方法 |
CN111470362B (zh) * | 2016-08-08 | 2022-04-01 | 株式会社尼康 | 基板处理装置 |
JP6702404B2 (ja) * | 2018-12-21 | 2020-06-03 | 株式会社ニコン | デバイス製造システムおよびデバイス製造方法 |
CN110196535B (zh) * | 2019-06-20 | 2021-10-26 | 合肥芯碁微电子装备股份有限公司 | 一种卷对卷无掩膜激光直写光刻设备的分段曝光方法 |
WO2021010370A1 (ja) * | 2019-07-12 | 2021-01-21 | 株式会社ニコン | 基板処理方法、パターン形成方法、及び基板処理システム |
JP7018419B2 (ja) | 2019-10-18 | 2022-02-10 | 本田技研工業株式会社 | 鞍乗型車両 |
JP7451191B2 (ja) * | 2020-01-28 | 2024-03-18 | 住友重機械工業株式会社 | 制御装置およびロール・ツー・ロール搬送システム |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200830057A (en) * | 2006-09-08 | 2008-07-16 | Nikon Corp | Mask, exposure apparatus and device manufacturing method |
JP2008241987A (ja) * | 2007-03-27 | 2008-10-09 | Mitsubishi Paper Mills Ltd | 連続露光装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54128733A (en) * | 1978-03-29 | 1979-10-05 | Toppan Printing Co Ltd | Method of reproducing upon projection |
JPH01118136A (ja) * | 1988-08-24 | 1989-05-10 | Dainippon Screen Mfg Co Ltd | 原画貼付指定紙の作成装置 |
JPH04339690A (ja) * | 1991-01-24 | 1992-11-26 | Konica Corp | 画像形成用マスク材作成方法 |
JP2000075497A (ja) * | 1998-08-26 | 2000-03-14 | Adtec Engineeng Co Ltd | 露光装置 |
JP5181451B2 (ja) * | 2006-09-20 | 2013-04-10 | 株式会社ニコン | マスク、露光装置及び露光方法、並びにデバイス製造方法 |
JP2008116514A (ja) * | 2006-10-31 | 2008-05-22 | Mitsubishi Paper Mills Ltd | 連続露光装置 |
JP5036351B2 (ja) * | 2007-03-06 | 2012-09-26 | 富士フイルム株式会社 | パターン露光方法及び装置 |
JP2009026933A (ja) * | 2007-07-19 | 2009-02-05 | Konica Minolta Holdings Inc | 電磁波遮蔽フィルムの製造方法及び電磁波遮蔽フィルム |
DE102007035387A1 (de) * | 2007-07-26 | 2009-01-29 | Leibnitz-Institut für neue Materialien Gemeinnützige GmbH | Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien |
US8221964B2 (en) * | 2007-11-20 | 2012-07-17 | Eastman Kodak Company | Integrated color mask |
JP2009175287A (ja) * | 2008-01-23 | 2009-08-06 | Mitsubishi Paper Mills Ltd | 露光装置 |
JP2009237305A (ja) * | 2008-03-27 | 2009-10-15 | Mitsubishi Paper Mills Ltd | マスクパターンフィルムの巻き付け機構及び露光装置 |
JP2011033907A (ja) * | 2009-08-04 | 2011-02-17 | Nikon Corp | 照明装置、露光装置、照明方法、露光方法及びデバイス製造方法 |
-
2012
- 2012-10-09 TW TW101137189A patent/TWI641915B/zh active
- 2012-10-10 JP JP2013553197A patent/JP6115473B2/ja active Active
- 2012-10-10 WO PCT/JP2012/076197 patent/WO2013105317A1/ja active Application Filing
-
2016
- 2016-06-27 JP JP2016126394A patent/JP6210132B2/ja active Active
-
2017
- 2017-04-25 JP JP2017086113A patent/JP6481707B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200830057A (en) * | 2006-09-08 | 2008-07-16 | Nikon Corp | Mask, exposure apparatus and device manufacturing method |
JP2008241987A (ja) * | 2007-03-27 | 2008-10-09 | Mitsubishi Paper Mills Ltd | 連続露光装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2013105317A1 (ja) | 2013-07-18 |
TW201329646A (zh) | 2013-07-16 |
JPWO2013105317A1 (ja) | 2015-05-11 |
JP2017126095A (ja) | 2017-07-20 |
JP6481707B2 (ja) | 2019-03-13 |
JP6115473B2 (ja) | 2017-04-19 |
JP2016191937A (ja) | 2016-11-10 |
JP6210132B2 (ja) | 2017-10-11 |
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