TWI622119B - 用於分開接合晶圓結構之夾鉗裝置及用於分開之方法 - Google Patents
用於分開接合晶圓結構之夾鉗裝置及用於分開之方法 Download PDFInfo
- Publication number
- TWI622119B TWI622119B TW101140405A TW101140405A TWI622119B TW I622119 B TWI622119 B TW I622119B TW 101140405 A TW101140405 A TW 101140405A TW 101140405 A TW101140405 A TW 101140405A TW I622119 B TWI622119 B TW I622119B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- edge
- clamp
- peripheral edge
- arm
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 235000012431 wafers Nutrition 0.000 claims description 234
- 230000002093 peripheral effect Effects 0.000 claims description 40
- 238000000926 separation method Methods 0.000 description 25
- 239000010410 layer Substances 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000012212 insulator Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- TVEXGJYMHHTVKP-UHFFFAOYSA-N 6-oxabicyclo[3.2.1]oct-3-en-7-one Chemical compound C1C2C(=O)OC1C=CC2 TVEXGJYMHHTVKP-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241001417523 Plesiopidae Species 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Chemical group 0.000 description 1
- 229910052734 helium Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B43/00—Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
- B32B43/006—Delaminating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/50—Additional features of adhesives in the form of films or foils characterized by process specific features
- C09J2301/502—Additional features of adhesives in the form of films or foils characterized by process specific features process for debonding adherents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
- Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/934—Apparatus having delaminating means adapted for delaminating a specified article
- Y10S156/941—Means for delaminating semiconductive product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1179—Gripping and pulling work apart during delaminating with poking during delaminating [e.g., jabbing, etc.]
- Y10T156/1184—Piercing layer during delaminating [e.g., cutting, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1961—Severing delaminating means [e.g., chisel, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
- Y10T225/12—With preliminary weakening
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
- Y10T225/35—Work-parting pullers [bursters]
- Y10T225/357—Relatively movable clamps
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/30—Breaking or tearing apparatus
- Y10T225/393—Web restrainer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161553447P | 2011-10-31 | 2011-10-31 | |
| US61/553,447 | 2011-10-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201324676A TW201324676A (zh) | 2013-06-16 |
| TWI622119B true TWI622119B (zh) | 2018-04-21 |
Family
ID=47221551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101140405A TWI622119B (zh) | 2011-10-31 | 2012-10-31 | 用於分開接合晶圓結構之夾鉗裝置及用於分開之方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US9165802B2 (enExample) |
| EP (1) | EP2774176B1 (enExample) |
| JP (1) | JP6167108B2 (enExample) |
| KR (1) | KR102061359B1 (enExample) |
| CN (1) | CN104025277A (enExample) |
| TW (1) | TWI622119B (enExample) |
| WO (1) | WO2013066758A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102061359B1 (ko) * | 2011-10-31 | 2019-12-31 | 글로벌웨이퍼스 씨오., 엘티디. | 본딩된 웨이퍼 구조물 절개를 위한 클램핑 장치 및 절개 방법 |
| WO2015113591A1 (de) * | 2014-01-28 | 2015-08-06 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zum lösen eines ersten substrats |
| CN104505363A (zh) * | 2014-12-25 | 2015-04-08 | 苏州凯锝微电子有限公司 | 一种晶圆夹持装置 |
| CN104701233B (zh) * | 2015-03-10 | 2017-10-17 | 北京七星华创电子股份有限公司 | 一种盘状物夹持装置 |
| JP6470414B2 (ja) * | 2015-08-11 | 2019-02-13 | 東京応化工業株式会社 | 支持体分離装置及び支持体分離方法 |
| US10272661B2 (en) | 2017-04-17 | 2019-04-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pad removal device and method |
| KR102483443B1 (ko) * | 2018-08-14 | 2023-01-04 | 삼성전자주식회사 | 기판 접합 장치 및 이를 구비하는 기판 접합 설비와 이를 이용한 기판의 접합방법 |
| EP3657537A1 (en) * | 2018-11-23 | 2020-05-27 | ATOTECH Deutschland GmbH | End effector for slab formed substrates |
| FR3093715B1 (fr) * | 2019-03-15 | 2021-03-05 | Soitec Silicon On Insulator | Dispositif de maintien pour un ensemble à fracturer |
| FR3093858B1 (fr) * | 2019-03-15 | 2021-03-05 | Soitec Silicon On Insulator | Procédé de transfert d’une couche utile sur un substrat support |
| CN110640324B (zh) * | 2019-09-02 | 2022-06-10 | 中芯集成电路（宁波）有限公司 | 一种晶圆双面制作系统 |
| JP7309191B2 (ja) * | 2019-11-06 | 2023-07-18 | 中村留精密工業株式会社 | ウェハー分割装置 |
| JP7471862B2 (ja) | 2020-02-27 | 2024-04-22 | キオクシア株式会社 | 貼合装置および貼合方法 |
| JP7339905B2 (ja) | 2020-03-13 | 2023-09-06 | キオクシア株式会社 | 貼合装置および貼合方法 |
| US20250180453A1 (en) * | 2023-12-04 | 2025-06-05 | Tokyo Electron Limited | Torsional shear testing for semiconductor surface bonds |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW398039B (en) * | 1997-06-16 | 2000-07-11 | Canon Kk | Apparatus and method of separating sample and substrate fabrication method |
| US6672358B2 (en) * | 1998-11-06 | 2004-01-06 | Canon Kabushiki Kaisha | Sample processing system |
| TW200419690A (en) * | 2003-03-18 | 2004-10-01 | Taiwan Semiconductor Mfg | Chuck rotating and chuck roller apparatuses |
| US20050000649A1 (en) * | 2002-01-03 | 2005-01-06 | Olivier Rayssac | Substrate cutting device and method |
| US20090166930A1 (en) * | 2007-12-27 | 2009-07-02 | Tdk Corporation | Peeling apparatus, peeling method, and method of manufacturing information recording medium |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE369160B (enExample) * | 1972-12-21 | 1974-08-12 | Siporex Int Ab | |
| US5367762A (en) | 1992-12-23 | 1994-11-29 | Advanced Micro Devices, Inc. | Decapping machine for packaged integrated circuits |
| JP3408000B2 (ja) * | 1994-11-28 | 2003-05-19 | 菱電セミコンダクタシステムエンジニアリング株式会社 | ペリクル剥離方法 |
| JPH09263500A (ja) | 1996-01-22 | 1997-10-07 | Komatsu Electron Metals Co Ltd | 貼り合わせｓｏｉウェーハの剥がし治具 |
| US6048411A (en) | 1997-05-12 | 2000-04-11 | Silicon Genesis Corporation | Silicon-on-silicon hybrid wafer assembly |
| EP0951068A1 (en) | 1998-04-17 | 1999-10-20 | Interuniversitair Micro-Elektronica Centrum Vzw | Method of fabrication of a microstructure having an inside cavity |
| JP3917313B2 (ja) * | 1999-01-26 | 2007-05-23 | ローム株式会社 | 半導体製造品の搬送治具 |
| AU6905000A (en) | 1999-08-10 | 2001-03-05 | Silicon Genesis Corporation | A cleaving process to fabricate multilayered substrates using low implantation doses |
| US6221740B1 (en) | 1999-08-10 | 2001-04-24 | Silicon Genesis Corporation | Substrate cleaving tool and method |
| US6263941B1 (en) | 1999-08-10 | 2001-07-24 | Silicon Genesis Corporation | Nozzle for cleaving substrates |
| US6336787B1 (en) | 1999-10-07 | 2002-01-08 | Mosel Vitelic, Inc. | Method for transferring wafers in a semiconductor tape-peeling apparatus |
| TW508690B (en) | 1999-12-08 | 2002-11-01 | Canon Kk | Composite member separating method, thin film manufacturing method, and composite member separating apparatus |
| US6444082B1 (en) * | 2000-06-22 | 2002-09-03 | International Business Machines Corporation | Apparatus and method for removing a bonded lid from a substrate |
| JP2002050749A (ja) * | 2000-07-31 | 2002-02-15 | Canon Inc | 複合部材の分離方法及び装置 |
| US6491083B2 (en) | 2001-02-06 | 2002-12-10 | Anadigics, Inc. | Wafer demount receptacle for separation of thinned wafer from mounting carrier |
| FR2823373B1 (fr) | 2001-04-10 | 2005-02-04 | Soitec Silicon On Insulator | Dispositif de coupe de couche d'un substrat, et procede associe |
| AT502233B1 (de) | 2001-06-07 | 2007-04-15 | Thallner Erich | Vorrichtung zum lösen eines trägers von einer halbleiterscheibe |
| JP2003288028A (ja) | 2001-12-25 | 2003-10-10 | Canon Inc | 画像表示装置の分解方法、画像表示装置の製造方法、支持体の製造方法、画像表示部の製造方法、加工材料の製造方法、および画像表示装置 |
| JP4364535B2 (ja) | 2003-03-27 | 2009-11-18 | シャープ株式会社 | 半導体装置の製造方法 |
| US7510948B2 (en) | 2003-09-05 | 2009-03-31 | Sumco Corporation | Method for producing SOI wafer |
| JP2006135272A (ja) | 2003-12-01 | 2006-05-25 | Tokyo Ohka Kogyo Co Ltd | 基板のサポートプレート及びサポートプレートの剥離方法 |
| JP4995626B2 (ja) * | 2007-04-27 | 2012-08-08 | 信越化学工業株式会社 | 貼り合わせ基板の製造方法 |
| JP2010010207A (ja) * | 2008-06-24 | 2010-01-14 | Tokyo Ohka Kogyo Co Ltd | 剥離装置および剥離方法 |
| JP5448860B2 (ja) * | 2010-01-13 | 2014-03-19 | 東京応化工業株式会社 | 分離方法及び分離装置 |
| US8845859B2 (en) | 2011-03-15 | 2014-09-30 | Sunedison Semiconductor Limited (Uen201334164H) | Systems and methods for cleaving a bonded wafer pair |
| KR102061359B1 (ko) | 2011-10-31 | 2019-12-31 | 글로벌웨이퍼스 씨오., 엘티디. | 본딩된 웨이퍼 구조물 절개를 위한 클램핑 장치 및 절개 방법 |
| KR102355643B1 (ko) * | 2011-12-22 | 2022-01-25 | 에베 그룹 에. 탈너 게엠베하 | 가요성 기판 홀더, 제1 기판을 분리하기 위한 장치 및 방법 |
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2012
- 2012-10-26 KR KR1020147011610A patent/KR102061359B1/ko active Active
- 2012-10-26 JP JP2014539062A patent/JP6167108B2/ja active Active
- 2012-10-26 WO PCT/US2012/062194 patent/WO2013066758A1/en not_active Ceased
- 2012-10-26 EP EP12790726.9A patent/EP2774176B1/en active Active
- 2012-10-26 CN CN201280053782.4A patent/CN104025277A/zh active Pending
- 2012-10-29 US US13/663,038 patent/US9165802B2/en active Active
- 2012-10-29 US US13/663,073 patent/US9159596B2/en active Active
- 2012-10-31 TW TW101140405A patent/TWI622119B/zh active
-
2015
- 2015-09-04 US US14/845,327 patent/US9925755B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW398039B (en) * | 1997-06-16 | 2000-07-11 | Canon Kk | Apparatus and method of separating sample and substrate fabrication method |
| US6672358B2 (en) * | 1998-11-06 | 2004-01-06 | Canon Kabushiki Kaisha | Sample processing system |
| US20050000649A1 (en) * | 2002-01-03 | 2005-01-06 | Olivier Rayssac | Substrate cutting device and method |
| TW200419690A (en) * | 2003-03-18 | 2004-10-01 | Taiwan Semiconductor Mfg | Chuck rotating and chuck roller apparatuses |
| US20090166930A1 (en) * | 2007-12-27 | 2009-07-02 | Tdk Corporation | Peeling apparatus, peeling method, and method of manufacturing information recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6167108B2 (ja) | 2017-07-19 |
| US9165802B2 (en) | 2015-10-20 |
| EP2774176A1 (en) | 2014-09-10 |
| CN104025277A (zh) | 2014-09-03 |
| WO2013066758A1 (en) | 2013-05-10 |
| US20130105539A1 (en) | 2013-05-02 |
| JP2014532992A (ja) | 2014-12-08 |
| KR20140085477A (ko) | 2014-07-07 |
| US9159596B2 (en) | 2015-10-13 |
| KR102061359B1 (ko) | 2019-12-31 |
| TW201324676A (zh) | 2013-06-16 |
| US20130105538A1 (en) | 2013-05-02 |
| EP2774176B1 (en) | 2016-08-10 |
| US9925755B2 (en) | 2018-03-27 |
| US20150375495A1 (en) | 2015-12-31 |
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