TWI612383B - 光壓印用之膜形成組成物及光學構件之製造方法 - Google Patents
光壓印用之膜形成組成物及光學構件之製造方法 Download PDFInfo
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- TWI612383B TWI612383B TW102108226A TW102108226A TWI612383B TW I612383 B TWI612383 B TW I612383B TW 102108226 A TW102108226 A TW 102108226A TW 102108226 A TW102108226 A TW 102108226A TW I612383 B TWI612383 B TW I612383B
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
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Abstract
本發明課題為提供一種光壓印用之膜形成組成物,即使含有有機溶劑也能夠進行良好的形狀轉印;以及提供一種光學構件製造方法。
課題解決手段為本發明所關連之光壓印用之膜形成組成物,其係含有(A)具有親水性基的光聚合性單體、(B)無機奈米粒子、及(C)光聚合起始劑,並且有機溶劑含量為20質量%以下,含有黏度為500cP以下的單體作為上述(A)成分,該單體相對於上述(A)成分與上述(B)成分合計量為30質量%以上,硬化後的折射率為1.56以上。另外,本發明所關連之光學構件製造方法係包括:在基板上塗佈本發明所關連之膜形成組成物而形成塗佈層,不進行加熱,將模具按壓於上述塗佈層之步驟;在將上述模具按壓於上述塗佈層的狀態下,對上述塗佈層照射紫外線使其硬化而形成樹脂層之步驟;及由上述樹脂層將上述模具剝離之步驟。
Description
本發明關於一種光壓印用之膜形成組成物及光學構件製造方法。
微影技術為半導體裝置程序的核心科技,隨著近年來半導體積體電路(IC)的高積體化,更進一步的電路微細化正在發展。特別是在元件的積體化程度超過1000萬個,被稱為超LSI的半導體積體電路(IC)方面,必須採用微細加工微影技術。
此處,用以實現超LSI的微細加工微影技術,到目前為止一直是使用利用KrF雷射、ArF雷射、F2雷射、X射線、遠紫外線等的光曝光蝕刻法。而且,藉由這些光曝光蝕刻法技術,可形成數十nm級的圖型。
但是,光曝光蝕刻法技術所使用的裝置昂貴,因此伴隨著高度微細化,曝光裝置本身的初期成本增加。另外,在這些光曝光蝕刻法中,必須採用可得到與光波長相同程度的高解像度的光罩,具有這種微細形狀的光罩是高價的物品。進一步而言,要盡可能達到高積體化的要求,而且
需要更進一步的微細化。
基於這種狀況所開發出的技術,其中一個是光奈米壓印微影。這是藉由將模具按壓於含有光硬化樹脂的塗佈層,接下來照射紫外線使樹脂硬化,然後將模具剝離而使圖型轉印至樹脂層的技術。
通常在形成塗佈層時是使用含有有機溶劑的液狀樹脂組成物,因此會經過藉由進行塗佈後預烘,將塗佈層所含有的有機溶劑除去之步驟。但是,在基板採用成形性優異的樹脂基板的情況,若塗佈後進行預烘,則會有基板劣化的問題。
於是有文獻提出一種方法,其係使所塗佈的樹脂組成物含有特定成分,即使在無溶劑或使用少量的有機溶劑的情況下也能夠成為低黏度,並且不經過預烘之步驟(參照專利文獻1)。在專利文獻1中認為,宜將有機溶劑的含量定為全組成物中佔3質量%以下,在實施例中,採用了將組成物的各成分混合之後,在塗佈前於室溫下攪拌以使有機溶劑揮發之方法。此處所使用的有機溶劑為乙氧基丁醇、異丙醇、甲氧基丙醇、甲基乙基酮、甲基異丁基酮。
[專利文獻1]日本特開2008-202022號公報
附帶一提,在藉由光奈米壓印微影來製造光學構件等的情況,為了使硬化後的樹脂組成物表現出高折射率,無法減少無機氧化物微粒子的摻合量。因此,若使用市售的溶劑分散溶膠來調製樹脂組成物,則會含有大量有機溶劑,而如日本專利文獻1的實施例所述般,在室溫下攪拌使有機溶劑揮發至有機溶劑的含量成為3質量%以下,會使作業時間變長,而為不適合。
於是,本發明目的為提供一種光壓印用之膜形成組成物,其係沒有必要在塗佈後進行預烘以除去有機溶劑,高折射率,同時可進行良好的形狀轉印;及光學構件製造方法。
本發明人等為了達成上述目的反覆潛心研究,結果發現若使用特定的膜形成組成物,則可解決上述課題,而使本發明達到完成。具體而言,本發明提供如下述項目:本發明的第一形態一種光壓印用之膜形成組成物,其係含有:(A)具有親水性基的光聚合性單體、(B)無機奈米粒子、及(C)光聚合起始劑,有機溶劑含量為20質量%以下,含有黏度為500cP以下的單體作為上述(A)成分,該單體相對於上述(A)成分與上述(B)成分合計量為30質量%以上,硬化後的折射率為1.56以上。
本發明的第二形態為一種光學構件製造方法,其係利用光壓印微影的光學構件製造方法,並且包括:在基板上
塗佈第一形態之膜形成組成物而形成塗佈層,不進行加熱,將模具按壓於上述塗佈層之步驟;在將上述模具按壓於上述塗佈層的狀態,對上述塗佈層照射紫外線使其硬化,形成樹脂層之步驟;及由上述樹脂層,將上述模具剝離之步驟。
依據本發明,可提供一種光壓印用之膜形成組成物,其係沒有必要在塗佈後進行預烘以除去有機溶劑,高折射率,同時可進行良好的形狀轉印;及使用這種膜形成組成物的光學構件製造方法。
本發明所關連之光壓印用之膜形成組成物,其係至少含有(A)具有親水性基的光聚合性單體、(B)無機奈米粒子、及(C)光聚合起始劑,並且有機溶劑含量為20質量%以下,含有黏度為500cP以下的單體作為上述(A)成分,該單體相對於上述(A)成分與上述(B)成分合計量的30質量%以上,硬化後的折射率為1.56以上。以下針對本發明所關連之膜形成組成物中所含有的各成分作詳細敘述。
本發明所使用的(A)具有親水性基的光聚合性單體,
係在至少一個以上單體中具有選自羥基、羰基、羧基、酯基之官能基作為親水性基。若使用具有這些官能基的光聚合性單體,則可得到分散性與形狀轉印性優異的膜形成組成物。
上述(A)成分已知有單官能單體與多官能單體。
單官能單體可列舉(甲基)丙烯醯胺、甲氧基甲基(甲基)丙烯醯胺、二甲基丙烯醯胺、乙氧基甲基(甲基)丙烯醯胺、丙氧基甲基(甲基)丙烯醯胺、丁氧基甲氧基甲基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、(甲基)丙烯酸、富馬酸、馬來酸、馬來酸酐、伊康酸、伊康酸酐、檸康酸、檸康酸酐、巴豆酸、2-丙烯醯胺-2-甲基丙磺酸、第三丁基丙烯醯胺磺酸、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸2-苯氧基-2-羥丙酯、2-(甲基)丙烯醯氧基-2-羥丙基酞酸酯、甘油單(甲基)丙烯酸酯、(甲基)丙烯酸四氫呋喃甲酯、(甲基)丙烯酸二甲基胺基酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3-四氟丙酯、酞酸衍生物的半(甲基)丙烯酸酯、γ-丁內酯甲基丙烯酸酯、丙烯醯基嗎啉、丙烯酸2-羥基-3-苯氧基丙酯等。
另一方面,多官能單體可列舉乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯
酸酯、丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、2,2-雙(4-(甲基)丙烯醯氧基二乙氧基苯基)丙烷、2,2-雙(4-(甲基)丙烯醯氧基聚乙氧基苯基)丙烷、2-羥基-3-(甲基)丙烯醯氧基丙基(甲基)丙烯酸酯、乙二醇二縮水甘油醚二(甲基)丙烯酸酯、二乙二醇二縮水甘油醚二(甲基)丙烯酸酯、酞酸二縮水甘油基酯二(甲基)丙烯酸酯、甘油三丙烯酸酯、甘油聚縮水甘油醚聚(甲基)丙烯酸酯、胺甲酸乙酯(甲基)丙烯酸酯(亦即甲苯二異氰酸酯)、三甲基六亞甲基二異氰酸酯與六亞甲基二異氰酸酯與2-羥乙基(甲基)丙烯酸酯的反應物、亞甲基雙(甲基)丙烯醯胺、(甲基)丙烯醯胺亞甲醚、多元醇與N-羥甲基(甲基)丙烯醯胺的縮合物等的多官能單體、或三丙烯醯基六氫均三嗪等。
這些單官能單體及多官能單體可單獨使用或組合2種以上以作為上述(A)成分。
上述(A)成分係以丙烯酸單體為佳。
上述(A)成分含有黏度為500cP以下的單體,該單體相對於上述(A)成分與上述(B)成分合計量為30質量%以
上。宜為含有50質量%以上未達95質量%,較佳為含有65%質量以上未達95質量%。藉由製成在上述的範圍含有黏度為500cP以下的單體的膜形成組成物,可良好地進行形狀轉印。
作為上述(A)成分且黏度為500cP以下的單體,可列舉二甲基丙烯醯胺、γ-丁內酯甲基丙烯酸酯、丙烯醯基嗎啉、丙烯酸2-羥基-3-苯氧基丙酯、季戊四醇三丙烯酸酯等。
本發明所使用之上述(A)成分的含量,係以在上述膜形成組成物之有機溶劑以外的成分中含5~95質量%為佳,30~90質量%為較佳。
(B)無機奈米粒子可提高本發明所關連之膜形成組成物之硬化物的硬度,並且可達到高折射率化,耐光性亦優異。
從確保硬化膜的透明性這點看來,上述(B)成分的平均粒徑係以500nm以下為佳,以2~100nm為更佳。
本發明所使用之上述(B)成分係以金屬氧化物之微粒子為佳。可列舉例如氧化鈦、氧化鋯、氧化鋁、鈦酸鋇、氧化鈰、氧化錫、氧化鋅、氧化鉭、氧化錳、氧化鎳、氧化鐵、氧化矽、氧化鈮、氧化鑭及酸化釓等,尤其為了提高膜形成組成物之硬化後的折射率,以氧化鈦或氧化鋯為佳。
為了使上述膜形成組成物之硬化後的折射率成為1.56以上,本發明所使用之上述(B)成分的含量,係以在膜形成組成物的有機溶劑以外的成分中含5~90質量%為佳,以10~70質量%為較佳。
本發明所使用的(C)光聚合起始劑並未受到特別限定,可依照膜形成組成物所含有的樹脂的種類、或官能基的種類適當地選擇。例如有光陽離子起始劑、光自由基起始劑、光陰離子起始劑等,只要一併考慮膜形成組成物的狀況來選擇必要的光聚合起始劑即可。
上述(C)成分可列舉例如2,2-雙(2-氯苯基)-4,5,4',5'-四苯基-1,2'-聯咪唑(以下稱為B-CIM(保土谷化學公司製))、1-羥基環己基苯酮、2,2-二甲氧基-1,2-二苯乙烷-1-酮、2-甲基-1-[4-(甲基硫代)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、2,4,6-三甲基苯甲醯基二苯膦氧化物、1-[4-(2-羥基乙氧基)苯基]-2-羥基-2-甲基-1-丙烷-1-酮、2,4-二乙基噻噸酮、2,4-二甲基噻噸酮、3,3-二甲基-4-甲氧基二苯酮、二苯酮、2-氯二苯酮、4,4'-雙二甲基胺基二苯酮(以下稱為米其勒酮)、4,4'-雙二乙基胺基二苯酮(以下稱為EAB-F(保土谷化學公司製))、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、1-(4-十二烷基苯基)-2-羥基-2-甲基丙烷-1-酮、4-苯甲醯基-4'-甲基二甲基硫醚、4-二甲基胺
基安息香酸、4-二甲基胺基安息香酸甲酯、4-二甲基胺基安息香酸乙酯、4-二甲基胺基安息香酸丁酯、4-二甲基胺基安息香酸-2-乙基己酯、4-二甲基胺基安息香酸-2-異戊酯、苯乙酮、2,2-二乙氧基苯乙酮、對甲基苯乙酮、對二甲基胺基丙醯苯、三氯苯乙酮、對第三丁基苯乙酮、苄基二甲基縮酮、苄基-β-甲氧基乙基縮醛、1-苯基-1,2-丙二酮-2-(o-乙氧基羰基)肟、o-苯甲醯基安息香酸甲酯、雙(4-二甲基胺基苯基)酮、4,4'-雙二乙基胺基二苯酮、二苯基乙二酮、安息香、安息香甲醚、安息香乙基醚、安息香異丙基醚、安息香正丁醚、安息香異丁醚、安息香丁醚、對二甲基胺基苯乙酮、2-甲基噻噸酮、2-異丙基噻噸酮、二苯并環庚酮、α,α-二氯-4-苯氧基苯乙酮、戊基-4-二甲基胺基苯甲酸酯、2,4-雙(三氯甲基)-6-(3-溴-4-甲氧基)苯基-s-三嗪、2,4-雙(三氯甲基)-6-(對甲氧基)苯乙烯基-s-三嗪等的三嗪化合物等。
另外,除了上述之外,還可使用噻噸酮、2-氯噻噸酮、2,4-二乙基硫雜蒽、2-甲基硫雜蒽、2-異丙基硫雜蒽等的硫化合物、或2-乙基蒽醌、八甲基蒽醌、1,2-苯并蒽醌、2,3-二苯蒽醌等的蒽醌類、或偶氮雙異丁腈、過氧化苯甲醚、過氧化異丙苯等的有機過氧化物、或2-巰基苯并咪唑、2-巰基苯并噁唑、2-巰基苯并噻唑等的硫醇化合物等。
上述(C)成分可單獨使用1種或可組合兩種以上來使用。上述(C)成分的量並未受到特別限定,而以相對於上
述膜形成組成物100質量份含有0.1~30質量份為佳。藉由在這樣的範圍使用上述(C)成分,可提升光硬化性,所形成的圖型表面會有平滑性良好的傾向。
本發明所關連之膜形成組成物可含有有機溶劑。本發明所使用之有機溶劑只要是能使上述(A)、(B)、及(C)成分、或後述其他成分分散或溶解,且不會與這些成分反應,具有適度揮發性的物質即可。
這種有機溶劑可列舉例如甲醇、乙醇、丙醇、正丁醇等的醇類;乙二醇、二乙二醇、丙二醇、二丙二醇等的多元醇類;丙酮、甲基乙基酮、環己酮、甲基正戊基酮、甲基異戊基酮、2-庚酮等的酮類;乙二醇單醋酸酯、二乙二醇單醋酸酯、丙二醇單醋酸酯、或二丙二醇單醋酸酯等的具有酯鍵的化合物、上述多元醇類或上述具有酯鍵的化合物之單甲醚、單乙醚、單丙基醚、單丁醚等的單烷醚或單苯醚等的具有醚鍵的化合物等的多元醇類的衍生物;二噁烷等的環狀醚類;乳酸甲酯、乳酸乙酯、醋酸甲酯、醋酸乙酯、醋酸丁酯、丙酮酸甲酯、丙酮酸乙酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯等的酯類;苯甲醚、乙基苄基醚、甲苯酚基甲醚、二苯醚、二苄基醚、苯乙醚、丁基苯醚、乙苯、二乙苯、戊苯、異丙苯、甲苯、二甲苯、蒔蘿烴、均三甲苯等的芳香族系有機溶劑等。該等可使用1種或可組合2種以上來使用。
可使上述膜形成組成物的塗佈性、模具的剝離性皆良好的上述有機溶劑的含量,為上述膜形成組成物的20質量%以下。較佳為5~15質量%。
在本發明所關連之膜形成組成物中,亦可因應必要含有界面活性劑。界面活性劑並不受特別限定,可使用氟系界面活性劑、矽系界面活性劑等的周知的成分。藉由含有界面活性劑,可使模具形狀的轉印性良好。
本發明所關連之光學構件製造方法,其特徵為包括:在基板上塗佈本發明所關連之膜形成組成物而形成塗佈層,不進行加熱,將模具按壓於上述塗佈層之步驟;在將上述模具按壓於上述塗佈層的狀態,對上述塗佈層照射紫外線使其硬化而形成樹脂層之步驟;及由上述樹脂層將上述模具剝離之步驟。
首先,藉由旋轉塗佈法等在基板上塗佈本發明所關連之膜形成組成物,而形成塗佈層。塗佈層的膜厚係以10nm~5μm左右為佳。
另外,基板只要具有透明性即可,可列舉玻璃基板、樹脂基板,而尤其以成形性優異的材料為佳,聚碳酸酯樹脂、丙烯酸樹脂、環烯烴聚合物、聚苯乙烯樹脂、及機能性降莰烯系樹脂等的透光性樹脂基板為佳。
接下來,將既定形狀的模具按壓在形成於基板上的塗佈層,在此狀態下對塗佈層照射紫外線使其硬化,而形成樹脂層。藉由這種方式,可將模具形狀轉印至樹脂層。
然後將模具由樹脂層剝離。其結果,轉印了模具形狀的光學構件會形成於基板上。藉由改變模具形狀,可製造出各種形狀光學構件。
此外,還可將上述轉印了模具形狀的樹脂層加熱及/或燒成,進一步使其硬化。
以這種方式,可使轉印了模具形狀的光學構件形成於基板上。所形成的光學構件可利用作為導光板、光學薄片、平面光源裝置、CMOS偵測器中的極小透鏡等。
以下基於實施例對本發明作更進一步具體地說明,而本發明完全不受這些實施例制約。
使表1~3所示的各成分分散於丙二醇單甲醚,調製出膜形成組成物。表1~3中小括弧()內的數值表示各成分的質量份。所調製出的膜形成組成物的分散性任一者皆良好。
DMAA:二甲基丙烯醯胺
GBLMA:γ-丁內酯甲基丙烯酸酯
ACMO:丙烯醯基嗎啉
Aronix M-5700:丙烯酸2-羥基-3-苯氧基丙酯(東亞合成公司製)
Aronix M-305:季戊四醇三及四丙烯酸酯(三丙烯酸酯=55~63%,東亞合成公司製)
Aronix M-451:季戊四醇三及四丙烯酸酯(三丙烯酸酯=25~40%,東亞合成公司製)
Aronix M-306:季戊四醇三及四丙烯酸酯(三丙烯酸酯=65~70%,東亞合成公司製)
Light Acrylate PE-3A:季戊四醇三丙烯酸酯(共榮社化學公司製)
Aronix M-215:異三聚氰酸EO變性二丙烯酸酯,東亞合成公司製)
RTTPGM20WT%-N13:氧化鈦分散液(CIK Nanotek公司製)
IR-907:光聚合起始劑Irgacure(CIBA-GEIGY公司製)
Kayarad DPHA:二季戊四醇五及六丙烯酸酯(日本化藥公司製)
PF656:氟系界面活性劑(OMNOVA公司製,氟系界面活性劑)
使用上述實施例1~10及比較例1~4所調製出的膜形成組成物,在矽基板上形成500nm的樹脂層。對於所得到的樹脂層,藉由分光橢圓偏光計(Woollam公司製,VUV-VASE)測定波長600nm時的折射率。將其結果揭示於表4。
使用旋轉塗佈機將上述實施例1~10及比較例1~4所調製出的膜形成組成物塗佈於邊長5cm方形聚碳酸酯基板或聚甲基丙烯酸甲酯基板上,而得到膜厚10μm的塗佈層。接下來,將在玻璃表面塗佈有脫模劑的模具按壓在塗佈層,在此狀態下以500mJ/cm2進行曝光。曝光後,將模具脫模,針對填在模具中的填充性、密著性、硬化性進行評估。關於在模具中的填充性的評估,在按壓模具時,液體進入模具圖型內的情況評為○。關於密著性的評估,在模具脫模時,圖型確實留在基板的情況評為○;膜由基板剝離的情況評為×。關於硬化性的評估,藉由UV照射使膜硬化,沒有沾黏,圖型轉印確實進行的情況評為○;硬化不足且發生沾黏,因此液體附著於模具或圖型崩塌發生的情況評為×。將結果揭示於表5及表6。
由表5及表6可知,若使用實施例之組成物,則在樹脂基板上會表現出良好的光壓印性。但是,有機溶劑量高的組成物(比較例1)無法順利硬化,(A)成分不含黏度為500cP以下的單體的組成物(比較例2~4),模具的圖型轉印不充分。
Claims (6)
- 一種光壓印用之膜形成組成物,其係含有(A)具有親水性基的光聚合性單體、(B)無機奈米粒子、及(C)光聚合起始劑,並且有機溶劑含量為20質量%以下,含有黏度為500cP以下的單體作為前述(A)成分,該單體相對於前述(A)成分與前述(B)成分合計量為30質量%以上,以波長600nm之光下測定之硬化後的折射率為1.56以上(但是包含:具有2個以上苯環的芳香族化合物,且具有2個以上(甲基)丙烯醯氧基的化合物(A);具有氟原子,且具有1個以上碳-碳不飽和雙鍵的化合物(B)(惟,化合物(A)除外);及具有1個(甲基)丙烯醯氧基的化合物(C)(惟,化合物(B)除外)的光硬化性組成物除外)。
- 如申請專利範圍第1項之膜形成組成物,其中前述(A)成分為丙烯酸單體。
- 如申請專利範圍第1項之膜形成組成物,其中前述(B)成分含有氧化鈦或氧化鋯。
- 一種光學構件製造方法,其係利用光壓印微影的光學構件之製造方法,並且包括:在基板上塗佈如申請專利範圍第1~3項中任一項之膜形成組成物而形成塗佈層,不進行加熱,將模具按壓於前述塗佈層之步驟;在將前述模具按壓於前述塗佈層的狀態下,對前述塗佈層照射紫外線使其硬化而形成樹脂層之步驟;及由前述樹脂層將前述模具剝離之步驟。
- 如申請專利範圍第4項之光學構件製造方法,其中進一步含有由前述樹脂層將前述模具剝離之後,將前述樹脂層加熱之步驟。
- 如申請專利範圍第4項之光學構件製造方法,其中前述基板為樹脂基板。
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EP3083842B1 (en) * | 2013-12-20 | 2017-11-29 | Essilor International (Compagnie Générale D'Optique) | Liquid polymerizable composition comprising an anhydride derivative monomer and mineral nanoparticles dispersed therein, and its use to manufacture an optical article |
EP3087146B1 (en) * | 2013-12-20 | 2018-01-10 | Essilor International | Liquid polymerizable composition comprising an amide or a thioamide derivative monomer and mineral nanoparticles dispersed therein, and its use to manufacture an optical article |
JP2016092269A (ja) * | 2014-11-06 | 2016-05-23 | 株式会社トクヤマ | レジスト積層基板、及び該基板を用いた基板表面パターンの形成方法 |
JP6753038B2 (ja) * | 2015-04-07 | 2020-09-09 | 三菱ケミカル株式会社 | 光硬化性組成物 |
US10754244B2 (en) * | 2016-03-31 | 2020-08-25 | Canon Kabushiki Kaisha | Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold |
TWI818898B (zh) * | 2016-09-21 | 2023-10-21 | 日商日產化學工業有限公司 | 硬化膜形成組合物 |
US11034843B2 (en) | 2016-12-29 | 2021-06-15 | 3M Innovative Properties Company | Flexible nanoparticle optical coating compositions |
JP6865047B2 (ja) * | 2017-01-27 | 2021-04-28 | 東京応化工業株式会社 | インプリント用下層膜形成用組成物及びパターン形成方法 |
JP6880793B2 (ja) * | 2017-02-07 | 2021-06-02 | Agc株式会社 | インプリント用光硬化性組成物、微細パターンを表面に有する物品およびその製造方法 |
WO2018151073A1 (ja) * | 2017-02-14 | 2018-08-23 | 日産化学工業株式会社 | 配線形成方法 |
JP6965188B2 (ja) * | 2017-03-10 | 2021-11-10 | 三洋化成工業株式会社 | 活性エネルギー線硬化性組成物 |
KR102560728B1 (ko) * | 2018-11-14 | 2023-07-27 | 주식회사 엘지화학 | 임프린팅용 조성물 및 이를 이용한 광학 기재의 제조 방법 |
US20200249568A1 (en) * | 2019-02-05 | 2020-08-06 | Facebook Technologies, Llc | Curable formulation with high refractive index and its application in surface relief grating using nanoimprinting lithography |
JP7284590B2 (ja) * | 2019-02-21 | 2023-05-31 | 三菱瓦斯化学株式会社 | 硬化性複合材料及びそれを用いたインプリント方法 |
US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
CN112558419A (zh) * | 2020-12-18 | 2021-03-26 | 中国科学院光电技术研究所 | 一种大口径柔性光学超构表面结构的加工方法 |
US20240158541A1 (en) | 2021-03-16 | 2024-05-16 | Tokyo Ohka Kogyo Co., Ltd. | Photocurable composition and pattern-forming method |
JPWO2022196408A1 (zh) | 2021-03-16 | 2022-09-22 | ||
JP2023108227A (ja) * | 2022-01-25 | 2023-08-04 | 東京応化工業株式会社 | ナノインプリント用組成物及びパターン形成方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201002743A (en) * | 2008-05-29 | 2010-01-16 | Asahi Glass Co Ltd | Photocurable composition and manufacturing method for a molded body having a fine pattern on the surface |
TW201008996A (en) * | 2008-07-02 | 2010-03-01 | Fujifilm Corp | Curable composition for imprint, curing object using the same, manufacturing method thereof and member for liquid crystal display device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6416690B1 (en) * | 2000-02-16 | 2002-07-09 | Zms, Llc | Precision composite lens |
US20060204676A1 (en) * | 2005-03-11 | 2006-09-14 | Jones Clinton L | Polymerizable composition comprising low molecular weight organic component |
JP2008202022A (ja) | 2007-01-23 | 2008-09-04 | Fujifilm Corp | 光ナノインプリントリソグラフィ用硬化性組成物およびそれを用いたパターン形成方法 |
JP2009206197A (ja) * | 2008-02-26 | 2009-09-10 | Fujifilm Corp | ナノインプリント用硬化性組成物、硬化物およびその製造方法 |
JP2010013514A (ja) * | 2008-07-02 | 2010-01-21 | Fujifilm Corp | ナノインプリント用硬化性組成物、これを用いた硬化物、並びに、液晶表示装置用部材 |
JP2010113170A (ja) * | 2008-11-07 | 2010-05-20 | Fujifilm Corp | 光インプリント用硬化性組成物、これを用いた硬化物およびその製造方法、ならびに液晶表示装置用部材 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201002743A (en) * | 2008-05-29 | 2010-01-16 | Asahi Glass Co Ltd | Photocurable composition and manufacturing method for a molded body having a fine pattern on the surface |
TW201008996A (en) * | 2008-07-02 | 2010-03-01 | Fujifilm Corp | Curable composition for imprint, curing object using the same, manufacturing method thereof and member for liquid crystal display device |
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