TWI612362B - Polarizer and manufacturing method for polarizer - Google Patents

Abstract

The main purpose of the polarizer provided by the present invention is to solve the problem that when a polarizer in which a plurality of thin wires are arranged in parallel is arranged in an optical alignment device, the failure of the thin wires caused by interlocking and the occurrence of foreign matter from the broken thin wires are eliminated. And excellent extinction ratio.

The present invention is a polarizer in which a plurality of thin lines are arranged in parallel on a transparent substrate that is transparent to ultraviolet light, and a light-shielding film that blocks the ultraviolet light is formed outside the polarized light region where the thin lines are arranged. To solve the above problems.

Description

Polarizer and manufacturing method of polarizer

The present invention relates to a polarizer having an excellent extinction ratio, a method for manufacturing the same, and a light alignment device including the polarizer.

A liquid crystal display device generally has a structure in which a counter substrate on which a driving element has been formed and a color filter are opposed to each other and sealed around, and a gap is filled with a liquid crystal material. However, the liquid crystal material has refractive index anisotropy, because the state in which the voltage is applied to the liquid crystal material is neat and the state is different from the state where no voltage is applied, and pixels can be displayed by switching off / on. Here, an alignment film for aligning the liquid crystal material is provided on the substrate holding the liquid crystal material.

In addition, an alignment film is also used as a material for a retardation film used in a liquid crystal display device or a retardation film for 3D display.

It is known that an alignment film has an alignment restricting force by using a polymer material typified by polyimide, for example, by subjecting the polymer material to a rubbing treatment using a cloth or the like.

However, an alignment film to which an alignment restricting force is given by such a polishing process may include a cloth or the like. The problem of becoming a foreign body and remaining.

In contrast, an alignment film that exhibits an alignment restricting force by irradiating linearly polarized light, that is, a light alignment film, can be provided with an alignment restricting force without performing a polishing treatment using a cloth or the like as described above, so there is no cloth or the like. Residual problems that have become foreign bodies and remain have attracted much attention in recent years.

Such a linearly polarized light irradiation method capable of imparting an alignment restricting force to a light alignment film generally adopts a method of exposing through a polarizer. As the polarizer, those having a plurality of thin wires arranged in parallel are used, and the material constituting the thin wires is aluminum or titanium oxide (for example, Patent Document 1).

In addition, a method of forming a plurality of thin lines arranged in parallel has been using a two-beam interference exposure method (for example, Patent Documents 2 and 3).

This two-beam interference exposure method is a technology that transfers the periodic light intensity distribution (interference pattern) generated when two laser lights with the same phase and optical path overlap, and then transfers it to the photoresist on the substrate.

For example, a metal layer such as aluminum is formed on a glass substrate, and double-beam interference exposure is performed on the photoresist layer formed thereon. The periodic photoresist pattern obtained after development is used as an etching mask, and the metal layer is etched. Then, by removing the photoresist pattern, a plurality of parallel arrangement thin lines made of metal such as aluminum can be formed on the glass substrate.

Then, by cutting the glass substrate into a desired form of the polarizer, a polarizer having a thin line made of a metal such as aluminum can be obtained.

[Prior technical literature] [Patent Literature]

[Patent Document 1] Japanese Patent No. 4968165

[Patent Document 2] Japanese Patent Laid-Open No. 2013-145863

[Patent Document 3] Japanese Patent Laid-Open No. 2007-178763

As described above, the polarizer is cut from a large-area glass substrate on which thin lines have been formed for each thin line, and a polarizer of a desired size and shape is cut. Therefore, the obtained polarizer is shown in FIG. 12 (a). 112 extends to the outer edge (ie, the cut end) of the polarizer 110.

Therefore, when the polarizer 110 is disposed in the optical alignment device, if the polarizer 110 can be fixed and the area where the thin line 112 is formed is clamped, there is a problem that the thin line 112 is broken due to the chain of the clamped part. Or the foreign matter may be caused by the broken thin line.

On the other hand, in order to eliminate the need to clamp the portion where the thin line is arranged, it is considered to use some method to limit the area where the thin line is arranged to the area inside the area cut out as the polarizer, and sandwich the area where the thin line is not arranged. (Ie, the area where the glass substrate is exposed) and the polarizer is fixed.

However, in this case, for example, as shown in FIG. 12 (b), the area outside the area where the thin line 122 is arranged in the polarizer 120 becomes the area where the glass substrate 121 is exposed. Because the area exposed from this glass substrate 121 is not only incident light The P-wave component penetrates, and even the S-wave component penetrates, so there is a disadvantage that the extinction ratio is greatly reduced.

The "extinction ratio" refers to a polarization component (S Wave) transmittance (S-wave component in outgoing light / S-wave component in incident light, hereinafter also referred to as "S-wave transmittance"), the transmittance (emission of the polarized light component (P wave) perpendicular to the thin line) P-wave component in light / P-wave component in incident light, hereinafter also referred to as "P-wave transmittance") ratio (P-wave transmittance / S-wave transmittance).

For example, a polarizer having polarization characteristics of 50% P-wave transmittance and 1% S-wave transmittance has an extinction ratio value of 50. However, when a region where a glass substrate is exposed is formed in the polarizer, and the P-wave When both the transmittance and the S-wave transmittance increase by 1%, the extinction ratio (that is, the ratio of P-wave transmittance / S-wave transmittance) becomes (50 + 1) / (1 + 1) = 25.5. The extinction ratio is reduced to approximately half the value.

The present invention has been completed in view of the above-mentioned facts, and the main purpose is to provide a solution to the disadvantages of chain breakage caused by chain breakage when polarizers are arranged in a light alignment device, and the trouble of foreign matter from broken filaments, and Polarizer with excellent extinction ratio.

As a result of various studies, the present inventors have found that the above-mentioned problems can be solved by forming a light-shielding film that shields ultraviolet light outside the polarized light region where the thin lines are arranged, and thus completed the present invention.

That is, the polarizer of the present invention is a polarizer in which a plurality of thin lines are arranged in parallel on a transparent substrate that is transparent to ultraviolet light, and the ultraviolet light is shielded from the outside of the polarized region where the thin lines are arranged. Light-shielding film.

Furthermore, in the polarizer of the present invention, the light-shielding film is formed along one side constituting the outer edge of the polarized region.

In the polarizer of the present invention, the light-shielding film is formed on an outer periphery of the polarized region.

Furthermore, in the polarizer of the present invention, characters, marks, or alignment marks are formed in the light-shielding film.

Furthermore, in the polarizer of the present invention, the character, the symbol, or the alignment mark has a structure in which a plurality of thin lines are arranged in parallel.

Furthermore, in the polarizer of the present invention, the S-wave transmittance value of the letter, the mark, or the alignment mark to the ultraviolet light is the same as that of the S-wave transmission of the ultraviolet light in the polarized region. The same value or smaller than the S-wave transmittance value for the ultraviolet light in the polarized light region.

In the polarizer of the present invention, the light shielding film is connected to the thin wire.

Furthermore, in the polarizer of the present invention, a material constituting the light-shielding film contains a material constituting the thin wires.

Furthermore, in the polarizer of the present invention, a material constituting the light-shielding film is made of a material containing molybdenum silicide.

Furthermore, the method for manufacturing a polarizer of the present invention is a method for manufacturing a polarizer provided with a plurality of thin wires and a light-shielding film that blocks the above-mentioned ultraviolet light on a transparent substrate that is transparent to ultraviolet light, including: : A step of preparing a multilayer body on which the first material layer has been formed on the transparent substrate; a step of forming a photoresist layer on the first material layer; processing the photoresist layer to form a pattern having a thin line pattern and a light-shielding film A step of using a photoresist pattern; and a step of using the photoresist pattern as an etching mask and performing an etching process on the first material layer.

Furthermore, in the method of manufacturing a polarizer of the present invention, the photoresist layer is composed of a positive electron beam photoresist, and the step of forming a photoresist pattern having the thin line pattern and the light shielding film pattern includes: : A step of irradiating an electron beam to the photoresist layer at the space pattern forming portion of the line and the space pattern constituting the thin line pattern.

Furthermore, the light alignment device of the present invention is a light alignment device that polarizes ultraviolet light and irradiates the light alignment film. The light alignment device is provided with the polarizer and irradiates light that passes through the polarized region of the polarizer. The above-mentioned photo-alignment film.

Furthermore, the optical alignment device of the present invention is provided with a mechanism for moving the optical alignment film, and the polarizer is provided with a plurality of numbers in two directions orthogonal to the moving direction of the optical alignment film and the moving direction of the optical alignment film. And arrange the plurality of polarizers adjacent to each other in a direction orthogonal to the direction of movement of the light alignment film, so that the boundary between the plurality of polarizers is not continuously connected in the direction of movement of the light alignment film. Polarizer.

The polarizer provided by the present invention is a polarizer that shields the incident ultraviolet light parallel to the polarization direction of the thin line and allows the light in the polarization direction perpendicular to the thin line to pass through. A plurality of the thin lines are arranged in parallel on a flexible substrate. A light-shielding film that blocks the ultraviolet light is provided outside the thin-line area in the area where the thin lines are arranged, and the edge forming direction of the inner edge side of the light-shielding film is the same as the thin line The direction of the long side is parallel or vertical.

According to the present invention, the light-shielding film is formed outside the thin-line area, and when the polarizer is disposed in the light alignment device, the area where the light-shielding film is formed can be sandwiched. That is, in a polarizer, the polarizer can be fixed to the optical alignment device without holding the thin line area where the thin line arrangement area is held. Therefore, the trouble of the thin line breakage caused by the interlocking of the holding part can be eliminated. Defective foreign matter occurs in the broken thin line.

Furthermore, as described above, since a light-shielding film is formed on the periphery of the thin line region where the thin line is arranged, in the polarizer, it is possible to suppress the penetration of incident light (especially the S-wave component of the incident light) from the outer region of the thin line region. It can suppress the bad situation that the extinction ratio is greatly reduced.

Furthermore, the reason is that the edge on the inner edge side of the light-shielding film is parallel or perpendicular to the long side direction of the thin line, so that the interval between the thin-line area and the light-shielding film can be easily reduced, and a high extinction ratio can be obtained. .

In the present invention, a second thin line region in a region where the thin lines are arranged may be formed outside the light shielding film. If the outer edge of the light-shielding film is located more inward than the outer edge of the polarizer, and the area from the outer edge of the light-shielding film to the outer edge of the polarizer also has a second thin-line area forming a thin-line configuration area, When a plurality of reflectors are arranged in a planar arrangement on the light alignment device, the light shielding films of adjacent polarizers can be prevented from contacting each other, resulting in the expansion of the light shielding area. The big picture.

The light alignment device provided by the present invention is a light alignment device provided with a plurality of polarizers, and the polarizer is provided with a light shielding film in which a plurality of thin lines are arranged in parallel and formed outside the thin line area where the thin lines are arranged; The said polarizers are arrange | positioned so that the said polarizer arrange | positioned adjacently may not contain the said light shielding film between the said thin-line area | regions, respectively.

According to the present invention, the plurality of polarizers are arranged in such a manner that the polarizers disposed adjacent to each other do not include the light-shielding film between the thin line regions, so there is no light-shielding film between the polarizers. With the function of a polarizer.

The installation method of a polarizer provided by the present invention is a method of installing a plurality of polarizers on a polarizer of an optical alignment device. The polarizer is provided with a plurality of thin lines arranged in parallel and formed in an area where the thin lines are arranged. The light-shielding film on the outside of the thin-line area; the mounting method includes the steps of performing the alignment of the polarizers by using the alignment marks formed on the light-shielding film, and simultaneously adjusting the polarization directions of the plurality of polarizers.

According to the present invention, by using the alignment mark formed on the light-shielding film, information on the position and angle of the thin line can be obtained with high accuracy, and the desired position and angle can be easily matched.

According to the present invention, when a polarizer is disposed in a light alignment device, it is possible to eliminate the problem that the thin wire is broken due to interlocking, and the foreign matter is generated from the broken thin wire portion. Polarizer with excellent extinction ratio under good conditions.

Furthermore, the optical alignment device provided with the polarizer of the present invention can effectively perform an alignment restriction force on the optical alignment film, thereby improving productivity.

1‧‧‧ transparent substrate

2‧‧‧ thin line

3‧‧‧ polarized area

4‧‧‧ light-shielding film

5‧‧‧ inner edge

6‧‧‧ outer edge

7‧‧‧ alignment mark

8‧‧‧ thin line

10, 20‧‧‧ polarizer

10a, 10b, 10c, 10d, 10e, 10f, 10g, 10h, 10p, 10q, 10r, 10s‧‧‧ polarizer

31‧‧‧Polarizing material layer

31P‧‧‧polarized material pattern

32‧‧‧ hard cover material layer

32P‧‧‧ hard cover pattern

33‧‧‧Photoresistive layer

34‧‧‧Photoresist pattern

34a‧‧‧ thin line pattern

34b‧‧‧Light-shielding film pattern

40‧‧‧ electron beam

50, 60‧‧‧ light alignment device

51, 61‧‧‧ polarizer units

52, 62‧‧‧ UV light

53, 63‧‧‧ mirror

54, 64‧‧‧ polarized light

55, 65‧‧‧ light alignment film

56, 66‧‧‧ artifacts

71, 72‧‧‧ Border

110, 120‧‧‧ polarizers

112, 122‧‧‧ Thin

121‧‧‧ glass substrate

Fig. 1 is an example of a polarizer of the present invention, (a) is a schematic plan view, and (b) is a cross-sectional view taken along the line A-A of (a).

FIG. 2 is a plan view illustrating a light-shielding film of the polarizer of the present invention shown in FIG. 1. FIG.

Figs. 3 (a) to (h) are diagrams illustrating another planar form of the light shielding film of the polarizer of the present invention.

FIG. 4 is a diagram of another example of the polarizer of the present invention, (a) is a schematic plan view, and (b) is an enlarged view of an alignment mark of (a).

5 (a) to (d) are schematic steps of an example of a method for manufacturing a polarizer of the present invention.

6 (e) to (h) are schematic diagrams of an example of a method for manufacturing a polarizer according to the present invention, following FIG. 5.

FIG. 7 is a structural example of a light alignment device of the present invention.

FIG. 8 is a diagram illustrating another configuration example of the light alignment device of the present invention.

9 (a) to 9 (d) are diagrams showing an example of a configuration of a polarizer of the optical alignment device of the present invention.

Figs. 10 (a) and 10 (b) are diagrams showing another example of the arrangement of the polarizers of the optical alignment device of the present invention.

FIG. 11 is a graph showing measurement results of polarization characteristics of a polarizer of Example 2. FIG.

12 (a) and 12 (b) are schematic plan views of an example of a conventional polarizer.

Hereinafter, the polarizer of the present invention, a method of manufacturing the polarizer, a light alignment device, and The installation method of the polarizer is explained.

A. Polarizer

First, the polarizer of the present invention will be described.

The polarizer of the present invention is a polarizer in which a plurality of thin lines are arranged in parallel on a transparent substrate that is transparent to ultraviolet light, wherein a light shielding area for the ultraviolet light is formed on the outer side of the polarized area where the thin lines are arranged. Light-shielding film.

An example of the polarizer of the present invention is shown in FIG. 1, (a) is a schematic plan view, and (b) is a cross-sectional view taken along the line A-A in FIG.

As shown in FIG. 1, a polarizer 10 is configured by arranging a plurality of thin lines 2 in parallel on a transparent substrate 1, and forming a light-shielding film 4 on the outer periphery of a polarization region 3 in which the thin lines 2 are arranged.

Because of having such a configuration, when the polarizer 10 is disposed in the light alignment device, an area where the light shielding film 4 is formed can be sandwiched.

That is, in the polarizer 10, the polarizer 10 can be fixed to the optical alignment device without clamping the area formed by the thin line 2 (polarized area 3). Therefore, the damage of the thin line 2 caused by the interlocking of the clamping portions can be eliminated. Defective conditions and the occurrence of foreign matter from broken thin line parts.

Furthermore, as described above, since the light-shielding film 4 is formed on the outer periphery of the polarized region 3 where the thin line 2 is arranged, the polarizer 10 can suppress penetration of incident light from the outer region of the polarized region 3 (especially S of incident light). (Wave component), can suppress the bad situation that the extinction ratio is greatly reduced.

Hereinafter, each configuration of the polarizer of the present invention will be described in detail.

Transparent substrate

The transparent substrate 1 is not specifically limited until it is supported before it can support the thin wires 2 stably, and has excellent ultraviolet light permeability and less deterioration due to exposure light. For example, optically polished synthetic quartz glass, fluorite, calcium fluoride, and the like can be used, and among these, synthetic quartz glass is preferably used. The reason is that the quality is stable, and even if short-wavelength light (that is, high-energy exposure light) is used, there is less deterioration.

The thickness of the transparent substrate 1 can be appropriately selected in accordance with the application and size of the polarizer 10.

2. Thin line

The thin line 2 is used in the polarizer 10 to efficiently penetrate the P-wave component of the incident light, and to reduce the transmittance of the S-wave component of the incident light. It is formed in a linear plural form on the transparent substrate 1 and Arranged in parallel.

The material constituting the thin wire 2 is provided before the required extinction ratio and P-wave transmittance can be obtained, and the rest is not particularly limited, and may include, for example, aluminum, titanium, molybdenum, silicon, chromium, tantalum, ruthenium, niobium, Materials of any metal or alloy such as rhenium, nickel, gold, silver, platinum, palladium, rhodium, cobalt, manganese, iron, indium, and any of these oxides, nitrides, or oxynitrides. Among them, it is preferably made of a material containing molybdenum silicide. The reason is that even in a short wavelength in the ultraviolet region, the extinction ratio and the P-wave transmittance can be made excellent, and both the heat resistance and the light resistance are excellent.

The material system containing molybdenum silicide may be, for example, molybdenum silicide (MoSi), molybdenum silicide (MoSiO), molybdenum silicide nitride (MoSiN), molybdenum silicide oxide nitride (MoSiON), and the like.

The thin line 2 may be composed of a plurality of materials, and may be composed of a plurality of layers of different materials.

The thickness of the thin line 2 is raised before the required extinction ratio and P-wave transmittance can be obtained, and the rest is not particularly limited. For example, it is preferably 60 nm or more, more preferably within the range of 60 nm to 160 nm, and particularly preferably 80 nm. In the range of ~ 140nm. The reason is that by being in the above range, both the extinction ratio and the P-wave transmittance can be excellent.

In addition, the thickness of the thin line refers to the maximum thickness of the thickness in the vertical direction of the thin line in the longitudinal direction and the width direction. When the thin line is composed of a plurality of layers, it means the thickness including all layers.

In addition, the thickness of the thin line may include different thicknesses in a polarizer, but is usually formed with the same thickness.

The number and length of the thin wires 2 are set before the required extinction ratio and P-wave transmittance can be obtained, and the rest are not particularly limited, and can be appropriately set according to the purpose of the polarizer 10 and the like.

The pitch of the thin line 2 (P ₁ shown in Fig. 1 (a)) is raised before the required extinction ratio and P-wave transmittance can be obtained, and the rest is not particularly limited. Although it is used with the linearly polarized light generation wavelength It may be different from each other, but it may be, for example, within a range of 60 nm or more and 140 nm or less, preferably within a range of 80 nm or more and 120 nm or less, and more preferably within a range of 90 nm or more and 110 nm or less. The reason is that by using the above-mentioned pitch, both the extinction ratio and the P-wave transmittance can be excellent.

In addition, the pitch of the thin line is the maximum pitch between adjacent thin lines in the width direction. When the thin line is composed of a plurality of layers, it means the pitch including all layers.

In addition, the pitch of the thin lines may include different pitches in a polarizer, but is usually formed at the same pitch.

The duty ratio of the thin line [ie, the ratio of the width of the thin line to the pitch (width / pitch)] is raised before the required extinction ratio and P-wave transmittance can be obtained, and the rest are not special. The limitation can be, for example, in a range of 0.3 or more and 0.6 or less, and among them, it is preferably in a range of 0.35 or more and 0.45 or less. The reason is that the above working ratio can be used as a polarizer with an excellent extinction ratio in a state with a high P-wave transmittance, and it is easier to process fine wires.

In addition, the width of the thin line refers to the vertical length in the long-side direction of the thin line in a plan view. When the thin line is composed of a plurality of layers, it means the width including all the layers.

In addition, the width of the thin line may include those having different widths in a polarizer, but is usually formed with the same width.

3. Polarized area

In the polarizer 10 shown in FIG. 1, a polarizing region 3 is a region surrounded by a light shielding film 4, and a thin line 2 is arranged in the polarizing region 3. In other words, the polarization region 3 of the polarizer 10 shown in FIG. 1 is a region regulated by the light shielding film 4 and belongs to a region where incident light penetrates.

In the present invention, the polarizing region 3 may be set to a region larger than the region where the thin line 2 is arranged. More specifically, the thin wire 2 may have a form in which the light shielding film 4 is not connected to the long side direction (Y direction shown in FIG. 1 (a)).

Furthermore, in the arrangement direction of the thin lines 2 (in a plan view, the vertical direction of the long sides of the thin lines 2, that is, the X direction shown in FIG. 1 (a)), the distance between the end thin lines 2 and the light shielding film 4 may be larger than the thin lines 2. The size of each other. More specifically, in FIG. 1 (a) and (b), the interval P ₂ between the left edge of the thin line 2 on the right end and the inner edge side edge of the light shielding film 4 in the figure may be larger than the interval P ₁ between the thin lines 2 size of.

However, in order to obtain a high extinction ratio, it is preferable to use a polarizer 10 as shown in FIG. 1, and the thin wires 2 are connected to the light-shielding film 4 in the longitudinal direction. The reason is that in the polarized region 3, the region where the thin line 2 does not exist can be made smaller, so that the S-wave component of incident light can be more suppressed from penetrating.

In addition, the interval between the end thin line 2 and the light-shielding film 4 of the thin line 2 in the arrangement direction is preferably the same as the interval between the thin lines 2.

More specifically, in FIG. 1 (a) and (b), the distance P ₂ between the left edge of the thin line 2 on the right end and the inner edge side edge of the light shielding film 4 in the figure is preferably the distance P between the thin line 2 and the thin line 2. ₁ is the same size. Similarly, in Figs. 1 (a) and (b), the distance between the right edge of the thin line 2 on the left end and the inner edge of the light shielding film 4 is preferably the same as the distance P ₁ between the thin lines 2 size. The reason is to obtain a higher extinction ratio.

In the present invention, for example, by setting the step of forming the thin line 2 and the step of forming the light-shielding film 4 to be the same step, the end thin line 2 and the light-shielding film 4 in the direction in which the thin lines 2 are arranged can be set. The interval is set to be the same as the interval between the thin lines 2. In addition, the positional relationship between the light-shielding film 4 and the thin line 2 can be produced with high accuracy, and the edge direction of the light-shielding film 4 and the direction of the thin line 2 can be produced in parallel (or perpendicular) with high accuracy.

In addition, as described above, if the light-shielding film 4 is connected to the thin wires 2, the heat accumulated in the thin wires 2 by the light irradiated to the polarizer can be dispersed in the light-shielding film 4 and have antistatic effects.

Furthermore, if the light-shielding film 4 is connected to the thin wires 2, a thin photoresist pattern (thin-line pattern) for forming the thin wires 2 in the manufacturing step of the polarizer 10 may be connected to the light-shielding film 4. A large-area photoresist pattern (light-shielding film pattern) can also suppress the occurrence of a breakdown or peeling of a thinner photoresist pattern (thin line pattern) for forming the fine lines 2 during the manufacturing process.

4.Light-shielding film

The light-shielding film 4 is formed outside the polarized light region 3, and can suppress the penetration of incident light (particularly, the S-wave component of incident light).

In the present invention, the light-shielding film 4 preferably has a light-shielding property of ultraviolet light having a wavelength of 240 nm or more and 380 nm or less, with an optical concentration of 2.8 or more.

The reason is that by providing the light-shielding film 4 with a high light-shielding property in the wavelength range of ultraviolet light irradiated to impart an alignment restricting force to the light-alignment film, a polarizer having an excellent extinction ratio can be improved.

The material constituting the light-shielding film 4 is selected before the required optical concentration can be obtained, and the rest is not particularly limited, and may include, for example, aluminum, titanium, molybdenum, silicon, chromium, tantalum, ruthenium, niobium, hafnium, nickel, gold , Silver, platinum, palladium, rhodium, cobalt, manganese, iron, indium and other metals or alloys, and these A material of any of oxides, nitrides, or oxynitrides. Among these, a material containing molybdenum silicide is preferable.

The reason is that when the material constituting the light-shielding film 4 is made of a material containing molybdenum silicide, if the thickness of the light-shielding film 4 is 60 nm or more, ultraviolet light having a wavelength of 240 nm or more and 380 nm or less can have an optical concentration of 2.8 or more. Light-shielding.

The light-shielding film 4 may be composed of a plurality of materials, or may be composed of a plurality of layers having different materials.

The material constituting the light-shielding film 4 preferably contains a material constituting the thin wires 2.

The reason is that when the material constituting the light-shielding film 4 contains the material constituting the thin wire 2, the devices and materials used in the step of forming the thin wire 2 can also be used in the step of forming the light-shielding film 4, which can reduce the manufacturing cost. In addition, by setting the step of forming the thin line 2 and the step of forming the light-shielding film 4 to be the same step, the relative position accuracy of the thin line 2 and the light-shielding film 4 can also be improved.

Furthermore, when the material constituting the light-shielding film 4 and the material constituting the thin wires 2 are both made of a material containing molybdenum silicide, the light-shielding film 4 can be made to have high light-shielding properties, and both have excellent extinction ratio and P-wave transmittance. Polarizer.

Next, the planar form of the light shielding film 4 is demonstrated.

FIG. 2 is a plan view illustrating a light-shielding film of the polarizer of the present invention shown in FIG. 1. FIG.

As shown in FIG. 2, the light-shielding film 4 of the polarizer 10 has a frame shape of an inner edge 5 and an outer edge 6. Generally, the inner edge 5 of the light-shielding film 4 corresponds to the outer edge of the polarized region 3.

Moreover, as shown in FIG. 1, the outer edge 6 of the light shielding film 4 is usually connected to the polarizer 10 The outer edge of 10 is consistent.

However, the present invention is not limited to the above-mentioned form. When the polarizer is disposed in the light alignment device, the polarizer can be clamped in the area formed by the light shielding film 4 and can be lifted before the unwanted S-wave component can be prevented from penetrating. Both apply.

For example, when a polarizer is installed in a light alignment device that irradiates linearly polarized light toward a light alignment film, the vicinity of the outer edge of the polarizer is covered by a holding mechanism or the like, so that light from the vicinity of the outer edge of the polarizer is not irradiated to the light. In the case of an alignment film, the outer edge 6 of the light-shielding film 4 may also be disposed more inward than the outer edge of the polarizer.

Furthermore, if a thin line 2 is formed in a polarizer region other than the area formed by the light shielding film 4 (for example, a thin line 2 is also formed in a region further outside the outer edge 6 of the light shielding film 4), the The polarizer is held in the area formed by the film 4, while the thin line 2 is formed in the area where the light-shielding film is not formed, so that unwanted S-wave component penetration can be suppressed, so it can be applied to the polarizer of the present invention.

FIG. 3 is a diagram showing another example of a planar shape of a light shielding film of the polarizer of the present invention. In addition, in FIG. 3, the long-side direction of the thin line 2 is the up-down direction in the figure.

As described above, the light-shielding film 4 of the present invention is formed on the outside of the polarized region 3 and can suppress the penetration of incident light, particularly the S-wave component of the incident light.

Therefore, the planar form of the light-shielding film 4 of the present invention is not limited to the form in which the light-shielding film 4 is formed on the outer periphery of the polarizing region 3 as shown in FIG.

For example, as shown in Figs. 3 (a) and (b), the area formed by forming the thin line 2 (polarized area 3) may also be used. One side of the outer edge forms the shape of the light shielding film 4.

In addition, the morphology shown in FIG. 3 (a) illustrates an example in which the long-side direction of the thin line 2 and the long-side direction of the light-shielding film 4 are the same, and the morphology of the morphology-based thin line 2 shown in FIG. The longitudinal direction of the film 4 is an example of an orthogonal relationship.

Moreover, a plurality of light shielding films 4 may be arranged. For example, as shown in FIGS. 3 (c) and (d), the light-shielding film 4 may be formed along a pair of opposite two sides constituting the outer edge of the region (polarized region 3) formed by the thin line 2.

Alternatively, as shown in FIG. 3 (e), the light shielding film 4 may be formed along the sides constituting the outer edge of the region (polarized region 3) formed by the thin line 2 and crossing each other. In addition, as shown in FIGS. 3 (f) and (g), the light-shielding film 4 may be formed along three sides constituting the outer edge of the region (polarized region 3) formed by the thin line 2.

Here, as described in the description of FIG. 2, in the present invention, the outer edge 6 of the light-shielding film 4 may be disposed more inward than the outer edge of the polarizer 10. For example, as shown in FIG. 3 (h), all four sides constituting the outer edge of the light-shielding film 4 (outer edge 6 shown in FIG. 2) may be disposed inwardly from the outer edge of the polarizer. One of the four sides constituting the outer edge (outer edge 6 shown in FIG. 2) of the light-shielding film 4 may be arranged in such a manner that it is positioned more inward than the outer edge of the polarizer.

In addition, in the same manner as shown in Figs. 3 (a) to (g), the outer edge of the light shielding film 4 may be disposed more inward than the outer edge of the polarizer.

In these cases, it is preferable that the fine line 2 is formed in a region where the light-shielding film 4 is not formed. The reason is that it is possible to suppress the The polarizer penetrates unwanted S-wave components.

If it belongs to the form shown in FIGS. 3 (a) to (d) above, for example, when the polarizers are arranged in a plurality of planes and arranged in a light alignment device, one side of each polarizer is not formed with the light-shielding film 4 therebetween. By being arranged adjacently, the light shielding film 4 does not affect the joint portion between the polarizers.

In addition, for example, when the plurality of polarizers are arranged on the optical alignment device in such a manner that the outer edge portions overlap each other, the light shielding film can be made by overlapping the outer edge portions between the sides where the light shielding film 4 is not formed. 4 Does not affect the joints between polarizers.

In addition, as shown in FIGS. 3 (e) to (h), if the light-shielding film 4 is formed in both the parallel direction and the vertical direction of the thin line 2, the polarizing direction is rotated by 90 degrees to arrange it. When the light alignment device is used, the same polarizer can be used without integrating other polarizers.

Furthermore, as shown in FIG. 3 (h), if the outer edge of the light shielding film 4 is disposed more inward than the outer edge of the polarizer, and it is also formed in a region from the outer edge of the light shielding film 4 to the outer edge of the polarizer. In the form of the thin line 2, when the polarizers are arranged in a plurality of planes and arranged on the optical alignment device, the light shielding films 4 of adjacent polarizers will not contact each other and the light shielding area will not expand.

In addition, when a plurality of polarizers are arranged in the optical alignment device, the polarizers in various forms shown in FIGS. 1 and 3 (a) to (h) may be used in combination.

FIG. 4 shows another example of the polarizer of the present invention, (a) is a schematic plan view, and (b) is an enlarged view of an alignment mark of (a).

As shown in FIG. 4 (a), the polarizer 20 is provided with alignment marks 7 in the light shielding film 4 near the four corners.

In the present invention, characters, marks, or alignment marks may be formed in the light-shielding film 4. For example, by forming characters, symbols, and the like in the light-shielding film 4, information about the polarizer such as the model number can be given. In addition, it can also be used to determine the orientation of the top and bottom, left and right, the front and back, and rough alignment.

Furthermore, as described above, in the present invention, by setting the step of forming the thin line 2 and the step of forming the light shielding film 4 to be the same step, the relative position accuracy of the thin line 2 and the light shielding film 4 can also be improved. Therefore, by forming the alignment mark 7 in the light-shielding film 4, the position and angle information of the thin line 2 can be obtained from the alignment mark 7.

Furthermore, when a polarizer 20 is installed in a light alignment device that irradiates the light alignment film with linear polarized light, the alignment mark 7 can also be used to easily match the position and angle of the thin line 2 to the desired position and angle. .

In the present invention, the form of the alignment mark is not particularly limited, and various forms such as a cross shape and an L-shape may be used, but the alignment mark is preferably in at least one of a parallel direction or a vertical direction in the direction of the thin line 2 Form an edge upward. Depending on the application, it may have an edge at an angle of 45 degrees with respect to the direction of the thin line 2.

The number and arrangement of the alignment marks are not particularly limited, and an appropriate and necessary number and place can be set.

The above-mentioned characters, marks, or alignment marks may also be made of a material different from the light-shielding film 4, Alternatively, an opening may be provided in the light shielding film 4 to expose the transparent substrate 1.

However, when the above-mentioned characters, symbols, or alignment marks have a configuration in which the transparent substrate 1 is exposed by providing an opening in the light-shielding film 4, it is possible to suppress a decrease in the extinction ratio. Therefore, it is generally preferable to reduce the exposed area of the transparent substrate 1. The form.

On the other hand, in the present invention, the above-mentioned characters, symbols, or alignment marks may be arranged in parallel with a plurality of thin lines.

For example, as shown in FIG. 4 (b), the alignment mark 7 may have a configuration in which a plurality of thin lines 8 are arranged in parallel. In addition, although not shown in the drawings, the above-mentioned characters and symbols can be similarly configured to arrange a plurality of thin lines 8 in parallel. The direction of the plurality of thin lines is preferably the same as the direction of the thin lines in the polarized region.

Furthermore, by using the alignment mark 7 and the polarizer 20 having the above-mentioned characters and signs as the required extinction ratio, the material, thickness, spacing, and working ratio of the thin line 8 can be designed to enable the The function of blocking or polarizing ultraviolet light can prevent the extinction ratio of the polarizer 20 from decreasing even if the alignment mark 7 and the above-mentioned characters and symbols are formed in the light-shielding film 4.

In the present invention, the material, thickness, pitch, working ratio, etc. of the thin line 8 constituting the alignment mark 7, the above-mentioned characters, and symbols can be used as long as it can achieve the required S-wave transmittance. The material of the thin line 8 and The thickness is preferably set to be the same as the material and thickness of the thin line 2 arranged in the polarized region 3, and the longitudinal direction, pitch, and working ratio of the thin line 8 are preferably set to be longer than the length of the thin line 2 arranged in the polarized region 3. Side direction, pitch and work ratio are the same.

The reason is that even if the alignment mark 7 and the above-mentioned characters and symbols are formed, the extinction ratio is still not high. There will be changes, so the relevant alignment marks 7, the number and configuration of the above characters and signs can be more freely designed.

In addition, the polarizer of the present invention requires a high extinction ratio for the thin lines 2 arranged in the polarized region 3, that is, the P-wave transmittance is high and the S-wave transmittance is low. Although the above-mentioned characters are formed in the light-shielding film 4, The thin line 8 of the mark or alignment mark requires a lower S-wave transmittance, but the related P-wave transmittance does not necessarily require a high transmittance.

That is, although the above-mentioned characters, marks, or alignment marks must be avoided from irradiating the S-wave component of the incident light on the light alignment film, the transmittance of the relevant P-wave components is only required to be able to identify the above-mentioned characters, marks, or alignment marks. The level is sufficient, and high transmittance is not necessarily required.

Therefore, in the present invention, for the ultraviolet light irradiated by the polarizer, the S-wave transmittance value of the above-mentioned characters, symbols, or alignment marks is preferably the same or less than the S-wave transmittance of the polarized region 3 value.

B. Manufacturing method of polarizer

Next, the manufacturing method of the polarizer of this invention is demonstrated.

The manufacturing method of the polarizer of the present invention is a manufacturing method of a polarizer provided with a plurality of thin wires and a light-shielding film that blocks ultraviolet light on a transparent substrate that is transparent to ultraviolet light, and includes the following steps: A step of forming a laminate of a first material layer on a transparent substrate; a step of forming a photoresist layer on the first material layer; processing the photoresist layer to form a photoresist having a thin line pattern and a light-shielding film pattern A step of patterning; and a step of using the photoresist pattern as an etching mask and performing an etching process on the first material layer.

In the present invention, by setting the step of forming the thin line 2 and the step of forming the light shielding film 4 as the same step, the manufacturing steps can be shortened, and the relative position accuracy of the thin line 2 and the light shielding film 4 can be improved.

Furthermore, since the thin wires 2 and the light-shielding film 4 are made of the same material, the manufacturing cost can be reduced.

5 and 6 are schematic steps diagrams showing an example of a method of manufacturing the polarizer of the present invention.

For example, when the polarizer 10 is manufactured using the manufacturing method of the polarizer of the present invention, as shown in FIG. 5 (a), firstly, it is prepared on the transparent substrate 1 and formed in order: the thin wire 2 and the light shielding film 4 A laminated body of a polarizing material layer 31 and a hard cover material layer 32 that functions as a hard cover when the polarizing material layer 31 is etched.

In this example, the hard cover material layer 32 corresponds to the first material layer.

Next, a photoresist layer 33 (FIG. 5 (b)) is formed on the hard cover material layer 32, and an electron beam 40 or the like (FIG. 5 (c)) is irradiated for development or the like to form a thin line pattern 34a and a light-shielding film pattern 34b. Photoresist pattern 34 (FIG. 5 (d)).

In the present invention, for example, an electron beam drawing device used when a semiconductor lithography mask is manufactured, and the thin line pattern 34a and the light-shielding film pattern 34b and the above-mentioned alignment marks can be produced in the same step can be used in the electron beam drawing device. The relative position is controlled under the high-precision position accuracy management.

Next, the photoresist pattern 34 is used as an etching mask, and the hard mask material layer 32 is etched to form a hard mask pattern 32P (FIG. 6 (e)). For example, when chromium is used as the material of the hard cover material layer 32, hard etching can be performed by using dry etching using a mixed gas of chlorine and oxygen. Hood pattern 32P.

Next, the photoresist pattern 34 and the hard mask pattern 32P are used as an etching mask, and the polarizing material layer 31 is etched to form a polarizing material pattern 31P having a thin line 2 and a light-shielding film 4 (FIG. 6 (f)). For example, when the material of the polarizing material layer 31 is molybdenum silicide, the polarizing material pattern 31P can be formed by dry etching using SF ₆ gas.

Next, the photoresist pattern 34 is removed (FIG. 6 (g)), and then the hard mask pattern 32P is removed, and a polarizer 10 having a plurality of thin lines 2 and a light-shielding film 4 on the transparent substrate 1 is obtained (FIG. 6 (h)). ).

In addition, although omitted in the examples shown in FIG. 5 and FIG. 6, in the present invention, a plurality of thin lines 2 and a light shielding film 4 may be formed on a large-area transparent substrate 1, and then the polarization region 3 where the thin lines 2 are arranged may be cut. On the outside, a polarizer 10 cut into a desired size and shape is obtained.

Furthermore, in the above, the polarizing material layer 31 is etched according to the state of the remaining photoresist pattern 34, but the present invention may also remove the photoresist pattern after the step of forming the hard mask pattern 32P shown in FIG. 6 (e). 34. Only the hard mask pattern 32P is used as an etching mask, and the polarizing material layer 31 is etched to form a polarizing material pattern 31P.

In the above description, the obtained polarizer 10 is described with reference to a form in which the hard mask pattern 32P is removed, but the present invention may completely or partially leave the hard mask pattern 32P as necessary.

For example, the form shown in FIG. 6 (g) may be a form in which the hard mask pattern 32P is completely left as a form in which a polarizer is finally obtained. In this case, the step of removing the hard mask pattern 32P can be omitted, and the effect of shortening the step can be achieved.

In addition, although the above description has been made of the configuration in which the hard cover material layer 32 is provided on the polarizing material layer 31, the present invention can also form a photoresist layer on the polarizing material layer 31 without providing the hard cover material layer 32. 33. Then, the photoresist pattern 34 is used as an etching mask and the polarizing material layer 31 is etched to form a polarizing material pattern 31P having thin lines 2 and a light-shielding film 4.

In this case, the polarizing material layer 31 corresponds to the first material layer described above.

Here, the method used in the formation of the photoresist pattern 34 shown in FIG. 5 (c) above can be used on the premise that the photoresist pattern 34 having the required thin line pattern 34a and the light-shielding film pattern 34b can be formed. Particularly preferred is a method of irradiating an electron beam.

The reason is the formation of a photoresist pattern using a method of irradiating an electron beam, and has practical performance in the manufacture of semiconductor photomasks. For example, it is possible to form a fine line pattern with a pitch of 60 nm or more and 140 nm or less in a desired region with high accuracy. The reason is that the relative positional accuracy of the thin line pattern 34a and the light-shielding film pattern 34b can also achieve the nano-level accuracy required for the manufacture of a semiconductor photomask.

Furthermore, in the present invention, it is preferable that the photoresist layer 33 is composed of a positive electron beam photoresist, and the step of forming a photoresist pattern 34 provided with a thin line pattern 34a and a light-shielding film pattern 34b is a process for forming a thin line The step of irradiating the electron beam with the photoresist layer 33 other than the position where the light shielding film is formed is required.

More specifically, it is preferable that the thin line pattern 34a is a step of forming a line and a space pattern, and irradiating the photoresist layer 33 at the position of the space pattern portion among the lines and the space pattern with an electron beam.

The reason is that if it is a method of irradiating an electron beam to the above-mentioned position, the area of the irradiated electron beam can be reduced, and the time of the electron beam irradiation step can be shortened.

The above will be described in more detail.

For example, in the case where the width of the thin line 2 of the polarizer 10 shown in FIG. 1 is half the size of the pitch of the thin line 2, if a negative electron beam photoresist is used, when the thin line pattern and the light shielding film pattern of the polarizer 10 are to be obtained, the electron beam irradiation The area of is the total area of all the thin lines 2 plus the area of the area of the light shielding film 4.

On the other hand, if the above-mentioned method is used, the area irradiated by the electron beam becomes the total area of all spaced portions of the thin line 2, that is, approximately the total area of all the thin lines 2 is sufficient, and the time for irradiating the area of the light-shielding film 4 can be reduced.

C. Optical alignment device

Next, the optical alignment device of the present invention will be described.

The light alignment device of the present invention is a light alignment device that polarizes ultraviolet light and irradiates the light alignment film. The light alignment device includes the polarizer of the present invention, and irradiates light passing through the polarization region of the polarizer to the light alignment film.

The optical alignment device of the present invention is provided with the polarizer of the present invention, and can suppress the unnecessary S-wave component penetration of the ultraviolet light irradiated from the ultraviolet lamp. Therefore, it is possible to effectively perform the alignment restricting force to the light alignment film, thereby improving the productivity.

FIG. 7 is a structural example of a light alignment device of the present invention.

The light alignment device 50 shown in FIG. 7 is provided with a polarizer unit 51 and an ultraviolet lamp 52 stored in the polarizer of the present invention, and the ultraviolet light radiated from the ultraviolet lamp 52 is used by the polarizer 10 stored in the polarizer unit 51. The polarized light is polarized, and the polarized light (polarized light 54) is irradiated to the light alignment film 55 formed on the workpiece 56, thereby providing the light alignment film 55 with alignment. To the limiting force.

Furthermore, the light alignment device 50 includes a mechanism for moving the workpiece 56 on which the light alignment film 55 has been formed, and by moving the workpiece 56, the entire light alignment film 55 can be irradiated with polarized light 54. For example, in the example shown in FIG. 6, the workpiece 56 moves in the right direction (the direction of the arrow in FIG. 6) in the figure.

In addition, in the example shown in FIG. 7, the workpiece 56 is illustrated as a rectangular flat plate. However, the shape of the workpiece 56 of the present invention is lifted before the polarized light 54 can be irradiated, and the rest is not particularly limited. For example, the workpiece 56 may be a thin film. The shape may also be a strip-like (reticulated) shape that can be wound up.

In the present invention, the ultraviolet lamp 52 is preferably capable of irradiating ultraviolet light having a wavelength of 240 nm or more and 380 nm or less, and the light alignment film 55 is preferably sensitive to ultraviolet light having a wavelength of 240 nm or more and 380 nm or less.

Since the optical alignment device 50 is provided with the polarizer 10 having the light-shielding film 4 having high light-shielding properties for the above-mentioned ultraviolet light in the wavelength range, it is possible to efficiently suppress transmission of unnecessary S-wave components. Therefore, it is possible to efficiently perform the provision of an alignment restriction force on the light alignment film having sensitivity to the ultraviolet light in the above-mentioned wavelength range, and thus the productivity can be improved.

Furthermore, in order to efficiently irradiate the polarizer with the light from the ultraviolet lamp 52, the light alignment device 50 is preferably provided on the back side (opposite side of the polarizer unit 51) or the side of the ultraviolet lamp 52. There is a mirror 53 for reflecting ultraviolet light.

In addition, in order to efficiently provide alignment restricting force to a large-area light alignment film 55, it is preferable to use a rod-shaped lamp as shown in FIG. The light aligning device 50 having a long irradiation area orthogonal to the direction in which the workpiece 56 moves (the direction of the arrow in FIG. 7).

In this case, the polarizer unit 51 is also suitable for irradiating the large-area light alignment film 55 with the polarized light 54. However, because it is difficult to manufacture the large-area polarizer, a plurality of polarizers are arranged in the polarizer unit 51. Both technically and economically are better.

The light alignment device of the present invention may have a configuration including a plurality of ultraviolet lamps.

FIG. 8 is a diagram showing another configuration example of the light alignment device of the present invention.

As shown in FIG. 8, the light alignment device 60 is provided with two ultraviolet lamps 62, and a polarizer unit 61 accommodated in the polarizer of the present invention is provided between each of the ultraviolet lamps 62 and the workpiece 66. Each of the ultraviolet lamps 62 is provided with a reflecting mirror 63.

Accordingly, by providing the plurality of ultraviolet lamps 62, the amount of irradiation of the polarized light 64 irradiated with the light alignment film 65 formed on the workpiece 66 can be increased compared with the case where only one ultraviolet lamp 62 is provided. Therefore, compared with the case where only one ultraviolet lamp 62 is provided, the moving speed of the workpiece 66 can be increased, and as a result, productivity can be improved.

In addition, in the example shown in FIG. 8, a configuration in which two ultraviolet lamps 62 are arranged in parallel in the moving direction of the workpiece 66 (in the direction of the arrow in FIG. 8) is illustrated. However, the present invention is not limited to this. A plurality of ultraviolet lamps are arranged in a direction orthogonal to the direction, and a plurality of ultraviolet lamps may be arranged in two directions such as the moving direction of the workpiece 66 and its orthogonal direction.

In addition, in the example shown in FIG. 8, a configuration in which one polarizer unit 61 is provided for one ultraviolet lamp 62 is illustrated. However, the present invention is not limited to this. For example, only one UV lamp may be provided for one Of two polarizer units. In this case, one polarizer unit only needs to have a size capable of covering a plurality of ultraviolet light irradiation areas.

FIG. 9 is a diagram showing an example of the arrangement of the polarizers of the optical alignment device of the present invention. In addition, the arrangement forms of the polarizers shown in FIGS. 9 (a) to (d) are all in the form in which the flat plate-shaped polarizer 10 is arranged in a planar shape with respect to the film surface of the light alignment film.

For example, in the optical alignment device 50 shown in FIG. 7, when the strip-shaped polarized light 54 is irradiated in a direction orthogonal to the moving direction of the workpiece 56, as shown in FIG. 9 (a), in the polarizer unit 51, the moving direction of the workpiece 56 is shown. It is effective to arrange a plurality of polarizers 10 in the orthogonal direction (arrow direction). The reason is that the number of polarizers 10 can be kept small.

On the other hand, when the area of the polarizer 10 is small or when the light alignment device is provided with a plurality of ultraviolet lamps, as shown in FIG. 9 (b), it is better to exclude the positive direction of the workpiece moving direction (arrow direction). In addition to the cross direction, a plurality of polarizers 10 are also arranged in the direction along the moving direction (arrow direction). The reason is that the light alignment film can be irradiated with light from the ultraviolet lamp without waste, which can improve productivity.

Here, in the present invention, as shown in FIG. 9 (c) and FIG. 9 (d), it is preferable that a plurality of polarizers are arranged in a non-aligned manner in a row along the moving direction of the workpiece (arrow direction), so that adjacent The position of the polarizer is shifted in a direction orthogonal to the moving direction of the workpiece (the up-down direction in the figure).

More specifically, in the orthogonal direction of the moving direction of the light alignment film, a plurality of adjacent ones are sandwiched. The light-shielding film at the boundary between the polarizers is preferably arranged with a plurality of polarizers in such a manner that the direction of movement of the light alignment film is not linearly connected.

The reason is that in the area formed by the light-shielding film 4, since polarized light is not generated, the disadvantage of the light-shielding film 4 to the light alignment film can be suppressed.

Here, the plurality of polarizers arranged in the arrangement system shown in FIG. 9 (c) have the same shape and the same size, and the vertical position of adjacent polarizers in the left-right direction depends on the size of the polarizer in the vertical direction. The size of 1/2 is a stepwise displacement configuration.

Furthermore, the multiple polarizers arranged in the configuration form shown in FIG. 9 (d) have the same shape and the same size, and the vertical position of adjacent polarizers in the left and right directions is smaller than the size of the polarizer in the vertical direction. One-half of them are arranged in a stepwise displacement in the vertical direction.

The above will be described in more detail.

In the arrangement shown in FIG. 9 (c), the boundary 71 between the polarizer 10 (10p) and the polarizer 10 (10q) arranged adjacent to each other in the up-down direction uses the polarizer 10 (left-right direction) ( 10r) and polarizer 10 (10s) to prevent extending in the left-right direction.

That is, in the arrangement form shown in FIG. 9 (c), the light-shielding film sandwiched between the polarizers disposed adjacently in the vertical direction is prevented from being connected linearly in the left-right direction.

Therefore, with the arrangement shown in FIG. 9 (c), when polarizing light is irradiated to the light alignment film, it is possible to suppress the continuity of the disadvantages caused by the light shielding film from spreading to the light alignment film.

Similarly, the arrangement shown in FIG. 9 (d) is a light-shielding film sandwiched between the polarizers disposed adjacent to each other in the up-down direction and prevented from being connected linearly in the left-right direction.

Therefore, using the configuration shown in FIG. 9 (d), when polarizing light is irradiated to the light alignment film, The continuity of the disadvantages caused by the light-shielding film can be suppressed from spreading to the light alignment film.

In addition, in the arrangement shown in FIG. 9 (c), the steps are shifted in the up-and-down direction according to a half of the polarizer's up-and-down direction, so that the position in the up-and-down direction of the boundary portion 71 relative to the left and right direction (workpiece moving direction). The two polarizers 2 are aligned with each other.

On the other hand, in the arrangement shown in FIG. 9 (d), the vertical position of the boundary portion 72 becomes more difficult to align because it is displaced in the vertical direction by a step smaller than 1/2 of the polarizer vertical direction size.

Therefore, the arrangement shown in FIG. 9 (d) can further suppress the continuity of the disadvantages caused by the light-shielding film from spreading to the optical alignment film.

In addition, in the example shown in Figs. 9 (a) to (d), the polarizers are arranged adjacent to each other on the sides. However, the present invention is not limited to this configuration, and may be a gap with a gap between adjacent polarizers. form.

Furthermore, the end portions of adjacent polarizers may overlap each other, so that the boundary portion between the polarizers does not have a gap.

FIG. 10 is a diagram showing another example of the arrangement of the polarizers of the optical alignment device of the present invention.

In the present invention, instead of the configuration shown in FIG. 9 (a), a polarizer 10c shown in FIG. 3 (c) and a polarizer 10f shown in FIG. 3 (c) can be used instead, as shown in FIG. 10 (a). It is shown that in each polarizer, the outer edge portions of one side where no light-shielding film is formed are arranged in an overlapping state.

If it belongs to this configuration, there is no space between the polarizers in the up and down direction in the figure. The light-shielding film, and there will be no gap between the polarizers. Therefore, the three polarizers 10f, 10c, and 10f are arranged in order from the upper direction to the lower direction in the figure. Effect of a long polarizer case.

Therefore, each polarizer can be disposed in the light alignment device by sandwiching a part of each light shielding film. Therefore, each polarizer can be fixed to the light alignment device without clamping the area formed by the thin line (polarized area), so that the failure of the thin line breakage caused by the interlocking of the clamped parts and the failure of the thin line from occurring can be avoided. The broken thin line part may cause a foreign matter.

In addition, in FIG. 10 (a), a three-piece polarizer configuration in which polarizers 10f, 10c, and 10f are sequentially arranged is illustrated to avoid complexity. However, the above-mentioned configuration may also use two or more polarizers 10c. The configuration is longer in the vertical direction.

Furthermore, similarly, the polarizer 10a shown in FIG. 3 (a) and the polarizer 10e shown in FIG. 3 (e) can be used. As shown in FIG. 10 (b), one side of each polarizer is not formed with a light-shielding film. The outer edge portions are arranged in an overlapping state. In this case, the effect can be exerted as if a single polarizer is provided.

Moreover, in this case, each polarizer can be arranged in the light alignment device by a method of clamping a part of the respective light shielding film. Therefore, each polarizer can be fixed to the light alignment device without clamping the area formed by the thin line (polarized area), so that the failure of the thin line breakage caused by the interlocking of the clamped parts and the failure of the thin line from occurring can be avoided. The broken thin line part may cause a foreign matter.

In addition, Figure 10 (b) also shows that two or more polarizers can be used in the vertical direction of the figure. 10a is formed in a longer arrangement in the vertical direction in the figure.

D. Polarizer

Next, a polarizer of the present invention will be described.

The polarizer of the present invention is a polarizer that shields incident polarized light in a direction parallel to a thin line and penetrates the polarized light in a direction perpendicular to the thin line, and is arranged in parallel on a substrate that is transparent to the ultraviolet light. A plurality of the thin lines are provided outside the thin line area of the area where the thin lines are arranged, and a light shielding film for blocking the ultraviolet light is provided. The edge forming direction of the inner edge side of the light shielding film is parallel or perpendicular to the long side direction of the thin line. .

Such a polarizer of the present invention can be, for example, the one shown in FIG. 1 described above.

In addition, the polarization region 3 shown in FIG. 1 is the same as the thin line region of the region where the thin line 2 is arranged.

Furthermore, the light shielding film 4 shown in FIG. 1 is formed outside the thin line region of the area where the thin line 2 is arranged, and the edge on the inner edge side of the light shielding film 4 is parallel or perpendicular to the long side direction of the thin line.

According to the present invention, the light-shielding film is formed outside the thin-line area, and when the polarizer is disposed in the light alignment device, the area formed by the light-shielding film can be clamped. That is, the polarizer can be fixed to the optical alignment device without clamping the thin line region of the thin line arrangement area in the polarizer, so that the trouble of thin line breakage caused by the interlocking of the clamped portion can be eliminated, and Defective foreign matter occurs in the broken thin line.

Furthermore, as described above, since a light-shielding film is formed on the outer periphery of the thin line region where the thin line is arranged, in the polarizer, it is possible to suppress the penetration of incident light from the outer region of the thin line region (specifically, Regarding the S-wave component of incident light), 俾 can suppress the problem that the extinction ratio is greatly reduced.

Furthermore, the reason is that the distance between the thin-line region and the light-shielding film can be easily reduced by making the edge on the inner edge side of the light-shielding film parallel or perpendicular to the long side of the thin line, so that a high extinction ratio can be obtained.

The polarizer of the present invention includes a substrate, a thin line region, and a light-shielding film.

Substrate

The substrate of the present invention is transparent to the ultraviolet light.

In the present invention, the term "transmissive to ultraviolet light" specifically means that light having a wavelength of 240 nm or more and 380 nm or less can be transmitted.

The material and thickness of the substrate may be the same as those described in the item "1. Transparent substrate" of the "A. Polarizer".

2. Thin line area

The thin line region of the present invention is a region where thin lines are arranged.

The above-mentioned thin-line area is more systematic and refers to an area where a plurality of thin lines are arranged side by side.

Furthermore, the thin-line region is a main region that shields the light in the polarization direction parallel to the thin line and transmits the light in the polarization direction perpendicular to the thin line to generate linearly polarized light.

The thin wires of the present invention are arranged in a plurality of parallel lines on the substrate.

The materials, thickness, number and length, pitch, working ratio, and width of the relevant thin lines can be set to be the same as those described in the "2. Thin lines" of the "A. Polarizer" above.

When a light-shielding film is formed on the outer side of the long-line direction of the thin line in the thin-line area, it is preferable to form the end of the long-line direction of the thin line and connect the light-shielding film.

When a light-shielding film is formed on the outer side of the thin-line arrangement direction of the thin-line region, the interval between the end thin line and the light-shielding film in the thin-line arrangement direction is preferably the same as the interval between the thin lines.

More specifically, in FIGS. 1 (a) and (b), the distance P ₂ between the left edge of the right end thin line 2 and the edge on the inner edge side of the light shielding film 4 in the figure is preferably between the thin line 2 and each other. The interval P1 is the same size. Similarly in FIG. 1 (a) and (b), the distance between the right edge of the left end thin line 2 and the edge of the inner edge side of the light shielding film 4 in the figure is preferably the interval P ₁ between the thin line 2 and the thin line 2. Are the same size.

In addition, the effects caused by the connection between the end of the thin line in the long-side direction and the light-shielding film, and the effect caused by the distance between the end thin line and the light-shielding film are the distance between the thin lines. The contents described in the item "3. Polarized area" are the same, so the description is omitted here.

3.Light-shielding film

The light-shielding film of the present invention shields the ultraviolet light.

The light-shielding film is formed outside a thin line region in a region where the thin line is arranged.

In addition, the light-shielding film is an edge forming direction on the inner edge side of the light-shielding film that is parallel or perpendicular to a long-side direction of the thin line.

The planar form of the light-shielding film may be formed outside the thin line region of the region where the thin line is arranged.

This planar form can be specifically set to be the same as that described in the item "4. Light-shielding film" of the above-mentioned "A. Polarizer".

In the present invention, as shown in FIG. 3 (h), the outer edge of the light-shielding film may also be disposed more inward than the outer edge of the polarizer, and the area from the outer edge of the light-shielding film to the outer edge of the polarizer may also form a thin line. That is, it forms the form of the 2nd thin-line area | region which forms the area | region where the said thin-line arrangement | positioning was formed on the outer side of the said light-shielding film. By sequentially forming the thin line region, the light shielding film, and the second thin line region, when a plurality of polarizers are arranged in a planar arrangement in the light alignment device, it is possible to prevent the light shielding regions of adjacent polarizers from contacting each other to cause a light shielding region. Expand the situation.

The long-side direction of the thin line included in the second thin-line area is generally the same direction as the long-side direction of the thin line included in the thin-line area.

Furthermore, when a plurality of polarizers are arranged in the light alignment device, various types of polarizers having different planar shapes of the light shielding film may be used in combination.

The edge formation direction on the inner edge side of the light-shielding film may be parallel or perpendicular to the long-side direction of the thin line.

Here, the "edge forming direction on the inner edge side of the light shielding film is parallel or perpendicular to the long side direction of the thin line", as long as the edge forming direction on the inner edge side is parallel or perpendicular to the long side direction of the thin line That is, when the light shielding film has a plurality of inner edge side edges, it may include both a parallel direction and a vertical direction with the long side direction of the thin line.

Figures 1 and 3 (e), (f), (g), and (h) described above are examples of the edge formation direction on the inner edge side of the light shielding film, and include the parallel and vertical directions to the long side direction of the thin line. The situation of both.

The edge forming direction of the light-shielding film shown in Figs. 3 (a) and (c) may be parallel to the long-side direction of the thin line.

The edge forming direction of the light-shielding film shown in Figs. 3 (b) and (d) is only a case where it is perpendicular to the long-side direction of the thin line.

When a second thin line region is formed on the outer side of the light shielding film, the edge formation direction on the outer edge side of the light shielding film is preferably parallel or perpendicular to the long side direction of the thin line included in the second thin line region. The reason is to obtain a higher extinction ratio.

Characters, marks, or alignment marks may be formed in the light-shielding film. For example, by forming characters, symbols, and the like in the light-shielding film, information about the polarizer such as the model number can be given. In addition, it can also be used to judge the orientation of the top and bottom, left and right, the front and back, and rough alignment.

The specific characters, marks, or alignment marks may be specifically the same as those described in the item "4. Light-shielding film" of the above-mentioned "A. Polarizer".

The light-shielding property and constituent materials of the light-shielding film to ultraviolet light can be set to be the same as those described in the item "4. Light-shielding film" in the above-mentioned "A. Polarizer".

4. Polarizer

The polarizer of the present invention includes a substrate, a thin line region, and a light-shielding film, but may have other configurations as necessary.

E. Optical alignment device

Next, the optical alignment device of the present invention will be described.

The optical alignment device of the present invention is provided with a plurality of polarizers, and the above-mentioned polarizer has a plurality of thin lines arranged side by side and formed in a thin line region where the thin lines are arranged. The light shielding film on the outside, and the plurality of polarizers are arranged in such a manner that the polarizers disposed adjacent to each other do not include the light shielding film between the thin line regions.

Such a photo-alignment device of the present invention may be, for example, those shown in FIGS. 7 and 8 described above.

Furthermore, the arrangement of the plurality of polarizers (that is, the arrangement in which the thin-line regions of the polarizers arranged adjacent to each other do not include the light-shielding film) may be specifically described in FIGS. 10 (a) and (b) described above. ) As shown.

According to the present invention, the plurality of polarizers are arranged in such a manner that the polarizers disposed adjacent to each other do not include the light-shielding film between the thin-line regions. Since there is no light-shielding film between the polarizers, it can function as if With the function of a single polarizer.

In addition, each polarizer can be disposed in the light alignment device by a method of clamping a part of each light shielding film. Therefore, the polarizers can be fixed to the optical alignment device without clamping the thin line area formed by the thin line, and the problems of breakage of the thin line caused by the interlocking of the clamped portions and the failure of the thin line from occurring will not occur. The broken thin line part may cause a foreign matter.

The present invention is provided with at least a polarizer.

Hereinafter, each configuration of the polarizer of the present invention will be described in detail.

Polarizer

The polarizer of the present invention includes a light-shielding film in which a plurality of thin lines are arranged in parallel and formed on the outside of the thin line region where the thin lines are arranged.

Since such a polarizer may be the same as that described in the above-mentioned "D. polarizer", a description is omitted here.

2.Polarizer configuration

The arrangement of the polarizer of the present invention is that the plurality of polarizers do not include the light-shielding film between the thin line regions of the polarizers arranged adjacent to each other.

The arrangement of such polarizers can be, for example, polarizers arranged adjacently, and the polarizers are arranged adjacent to each other without forming a light shielding film on each of the polarizers.

More specifically, the arrangement shown in FIGS. 10 (a) and (b) described above may be adopted.

The arrangement of the above-mentioned polarizers is that the adjacent polarizers may be arranged in a state in which the sides are in contact with each other, or may be in the form of a gap between the adjacent polarizers.

The arrangement of the above-mentioned polarizers may also be such that the ends of adjacent polarizers overlap each other to form a form in which there is no gap in the boundary portion between the polarizers.

The configuration of the above-mentioned polarizers is based on the polarizers disposed adjacent to each other on the side where each of the polarizers does not form a light-shielding film is arranged adjacent to each other, and the ends of adjacent polarizers are arranged overlapping each other (that is, each polarized The outer edges of one side of the device where the light-shielding film is not formed are overlapped with each other), for example, it can be set to be the same as that described in the item "C. Photo-alignment device".

The arrangement of the polarizer with respect to the moving direction of the workpiece may be the same as that described in the item "C. Light aligning device".

In the present invention, a plurality of the above-mentioned polarizers arranged in such a manner that the above-mentioned polarizers arranged adjacent to each other do not include the light-shielding film between the thin line regions are regarded as one polarizer (hereinafter also referred to as "combined polarizer" ), Multiple polarizers can be used in combination.

The arrangement configuration of such a combined polarizer may be the same as the arrangement configuration of a plurality of polarizers described in the item "C. Optical alignment device".

3. Light alignment device

The optical alignment device of the present invention includes a plurality of polarizers, but may have other configurations as needed.

Such other configurations may include, for example, a polarizer unit housed in a polarizer, an ultraviolet light, a reflector, a mechanism for moving a work, and the like.

The other components described above may be the same as those described in the item "C. Photo-alignment device".

F. Installation method of polarizer

Next, a method of mounting the polarizer of the present invention will be described.

The installation method of the polarizer of the present invention is a method of mounting a plurality of polarizers on an optical alignment device, wherein the polarizer is a light shielding film having a plurality of thin lines arranged side by side and formed outside the thin line area where the thin lines are arranged. It includes the steps of performing alignment of the polarizers and adjusting the polarizing directions of the plurality of polarizers at the same time by using an alignment mark formed on the light-shielding film.

According to the present invention, the alignment mark formed on the light-shielding film can be obtained with high accuracy. The position and angle information of the thin line can be easily matched to the desired position and angle.

More specifically, by setting the step of forming the thin line and the step of forming the light-shielding film to be the same step, the relative position accuracy of the thin line and the light-shielding film can be improved. Therefore, by forming an alignment mark on the light-shielding film, it is possible to obtain the position and angle information of the thin line from the alignment mark with high accuracy. In this case, by using the alignment mark formed on the light-shielding film, it is possible to accurately perform alignment and confirm the direction of the long side of the thin line in the thin line area that determines the polarization direction of the polarizer.

The installation method of the polarizer of the present invention includes at least an alignment step.

Hereinafter, each step of the method of installing the polarizer of the present invention will be described in detail.

Alignment steps

The alignment step of the present invention is a step of performing the alignment of the polarizer and adjusting the polarization directions of the plurality of polarizers using an alignment mark formed on the light-shielding film.

In addition, since the polarizer used in this step and the alignment mark formed on the light-shielding film can be set to be the same as those described in the above item "A. Polarizer", they are not repeated here.

In this step, the method of performing the alignment of the polarizers and adjusting the polarization directions of the plurality of polarizers is based on the method of using the alignment marks formed on the light-shielding film, and the rest is not particularly limited. General alignment methods for quasi-marking, etc.

The above method may, for example, in the optical alignment device, form the arrangement-side alignment marks corresponding to the above-mentioned alignment marks at the positions of the plurality of polarizers, and then superimpose the alignment marks of the polarizers with the arrangement-side alignment marks in a plan view. Way to configure.

2. Installation method of polarizer

The installation method of the polarizer of the present invention includes the above-mentioned alignment steps, but may include other steps as needed.

As mentioned above, although the respective embodiments of the polarizer, the method of manufacturing the polarizer, the optical alignment device, and the method of installing the polarizer of the present invention have been described respectively, the present invention is not limited to the above embodiments. The above-mentioned embodiment is only for illustration. Anyone having substantially the same structure as the technical idea described in the patent application scope of the present invention and achieving the same effect is covered by the technical scope of the present invention.

[Example]

The following examples illustrate the present invention in more detail.

[Example 1]

First, the following test substrate was manufactured, and the refractive index (n) and the attenuation coefficient (k) at each wavelength were measured, and the optical density at a predetermined film thickness was calculated.

(Shading film formation)

For the transparent substrate, a synthetic quartz glass with a thickness of 6.35 mm was prepared. A molybdenum and silicon mixed target (Mo: Si = 1: 2mol%) was used, and a molybdenum silicide film with a thickness of 60 nm was formed by reactive sputtering in an argon atmosphere. Then, a test substrate is prepared.

The above-mentioned film thickness was measured using an AFM device DIMENSION-X3D manufactured by VEECO.

(Measurement of refractive index and attenuation coefficient)

For the test substrate, the refractive index (n) and the attenuation coefficient (k) of ultraviolet light having a wavelength of 190 to 380 nm were measured using a transmission-type ellipsometry (VUV-VASE manufactured by Woollam). The results are shown in Table 1.

(Optical density)

Based on the refractive index (n) and the attenuation coefficient (k) shown in Table 1, the optical density (OD) when the film thickness of the molybdenum silicide film was 60 nm and 100 nm was calculated. The results are shown in Table 2.

(Evaluation of Example 1)

As shown in Table 2, the light-shielding film of the polarizer of the present invention can confirm that as long as it has a molybdenum silicide film having a film thickness of 60 nm or more, it has a light-shielding property of ultraviolet light having a wavelength of 190 nm or more and 380 nm or less.

Furthermore, it was confirmed that when the light-shielding film is made of a molybdenum silicide film having a thickness of 100 nm or more, it has a light-shielding property of an optical concentration of 4.4 or more for ultraviolet light having a wavelength of 190 nm or more and 380 nm or less.

[Example 2]

Next, the following polarizers were manufactured, the P-wave transmittance and S-wave transmittance at each wavelength were measured, and the extinction ratio was calculated.

(Manufacture of Polarizer)

The transparent substrate is prepared with a synthetic quartz glass with a plane size of 152mm × 152mm and a thickness of 6.35mm. A mixed target of molybdenum and silicon (Mo: Si = 1: 2mol%) is used. A 100-nm-thick molybdenum silicide film was formed by a reactive sputtering method.

Next, a chromium target was used to form a chromium film with a thickness of 5 nm on the molybdenum silicide film by a reactive sputtering method under an argon atmosphere.

Next, a positive-type electron beam photoresist (ZEP520 manufactured by Zeon Corporation, Japan) was coated on the chromium film, and electron beam drawing was performed to form a photoresist pattern having a thin line pattern and a light-shielding film pattern.

Here, the thin line pattern is a line and a space pattern with a pitch of 100 nm, and the planar size of the entire line and the space pattern is 90 mm × 100 mm. In other words, the plane size of the polarization region of the polarizer becomes 90 mm × 100 mm. The length of the thin line in the longitudinal direction is 90 mm, and the thin line is connected to the light-shielding film.

In addition, the inner edge of the light-shielding film pattern is consistent with the outer edge of the polarized region, and the outer edge has a size of 152 mm × 152 mm.

In addition, the inner edge of the light-shielding film pattern is formed with parallel and vertical edges with respect to the direction of the line and the space pattern constituting the thin line pattern, and the space pattern of the line and the space pattern is formed with respect to the line and The direction of the space pattern is uniform until the inner edge (edge) of the parallel light-shielding film.

Next, an etching mask is used for the photoresist pattern. First, the chromium film is etched by dry etching using a mixed gas of chlorine and oxygen to form a chromium film pattern, and then the molybdenum silicide exposed from the chromium film pattern is formed. The film was processed by dry etching using SF6 gas, and then the photoresist pattern and the chromium film pattern were removed to obtain a polarizer of Example 2 in which a light-shielding film was formed on the outer periphery of the polarizing region where the thin line was arranged.

The thin line width, thickness, and pitch of the polarizer of this Example 2 were obtained using Vistac The SEM measurement device LWM9000 made by the company and the DIMENSION-X3D made by VEECO AFM device were measured, and the results were 36 nm, 100 nm, and 100 nm, respectively.

(Structure Evaluation of Thin Line)

With respect to the thin line and the light-shielding film of the polarizer of Example 2, the structure was evaluated using a transmission-type elliptical polarizer (VUV-VASE manufactured by Woollam).

As a result, it was confirmed that the thin line system had a molybdenum silicide film having a width and a thickness of 31.8 nm and 95.8 nm, and an upper film thickness and a side film thickness of the molybdenum silicide film of 4.2 nm and 4.2 nm, respectively. Oxide film.

Furthermore, it was confirmed that the light-shielding film had a molybdenum silicide film having a thickness of 95.8 nm and an oxide film made of silicon oxide with a thickness of 4.2 nm on the upper surface of the molybdenum silicide film.

(Measurement of P-wave transmittance and S-wave transmittance)

Regarding the polarizer of Example 2, a transmission-type elliptical polarizer (VUV-VASE manufactured by Woollam) was used to measure the P-wave transmittance (the P-wave component in the emitted light / incident light) of the ultraviolet light in the wavelength range of 200 nm to 400 nm. P wave component) and S wave transmittance (S wave component in outgoing light / S wave component in incident light), and the extinction ratio (P wave transmittance / S wave transmittance) was calculated. The results are shown in Table 3 and FIG. 11.

As shown in Table 3 and FIG. 11, in the wavelength range of 240 nm to 400 nm, the P-wave transmittance of the polarizer of Example 2 is more than 64.3%, and the extinction ratio is more than 55.1.

In addition, the P-wave transmittance of the polarizer of Example 2 was more than 64.3%, and the extinction ratio was more than 55.1 in the range of 240 nm to 260 nm. In addition, in the range of wavelengths from 355 nm to 375 nm, the P-wave transmittance of the polarizer of Example 2 was 77.1% or more, and the extinction ratio was 277.9 or more.

(Evaluation of Example 2)

As shown in Table 3 and FIG. 11, the polarizer of Example 2 has a high P-wave transmittance and an excellent extinction ratio.

Furthermore, from the results of Example 1 above, it can be confirmed that if a molybdenum silicide film having a film thickness of 60 nm or more is provided, the ultraviolet light having a wavelength of 190 nm or more and 380 nm or less has a light-shielding property of an optical concentration of 2.8 or more because Since the light-shielding film of the polarizer of Example 2 has a molybdenum silicide film having a thickness of at least 95.8 nm, it can be evaluated as one having sufficiently high light-shielding properties.

1‧‧‧ transparent substrate

2‧‧‧ thin line

3‧‧‧ polarized area

4‧‧‧ light-shielding film

10‧‧‧ Polarizer

Claims (9)

A polarizer is a polarizer in which a plurality of thin lines are arranged in parallel on a transparent substrate that is transparent to ultraviolet light. The polarizer is characterized in that: outside the polarized area where the thin lines are arranged, a light-shielding device for shielding the ultraviolet light is formed. The thin wires are connected to the light-shielding film in the long-side direction; the material constituting the light-shielding film is made of a material containing molybdenum silicide. The polarizer according to claim 1, wherein the light-shielding film is formed along a side constituting an outer edge of the polarized region. The polarizer according to claim 1 or 2, wherein the light-shielding film is formed on an outer periphery of the polarized region. According to the polarizer of claim 1 or 2, a character, a mark, or an alignment mark is formed in the light-shielding film, and the character, the mark, or the alignment mark has a plurality of thin lines arranged in parallel. The polarizer of claim 4, wherein the S-wave transmittance value of the text, the mark, or the alignment mark to the ultraviolet light is the same as the S-wave transmittance of the ultraviolet light in the polarized region. The same value, or smaller than the S-wave transmittance value for the ultraviolet light in the polarized light region. The polarizer according to claim 1 or 2, wherein a material constituting the light-shielding film contains a material constituting the thin line. A manufacturing method of a polarizer is a manufacturing method of a polarizer provided with a plurality of thin wires and a light-shielding film for shielding the ultraviolet light on a transparent substrate that is transparent to ultraviolet light. A step of forming a laminated body of the first material layer on the substrate; A step of forming a photoresist layer on the first material layer; a step of processing the photoresist layer to form a photoresist pattern having a thin line pattern and a light-shielding film pattern; and using the photoresist pattern as an etching mask, And performing an etching process on the first material layer; the photoresist layer is composed of a positive electron beam photoresist, and the step of forming a photoresist pattern having the thin line pattern and the light-shielding film pattern includes: : The step of irradiating an electron beam to the photoresist layer at the space pattern forming portion of the line and space pattern constituting the thin line pattern; the material constituting the thin line and the light shielding film is made of a material containing molybdenum silicide. A polarizer is a polarizer that shields incident ultraviolet light parallel to a polarization direction of a thin line and allows light that is perpendicular to the polarization direction of the thin line to pass through, and is characterized in that the ultraviolet light has a penetration A plurality of the thin lines are arranged side by side on a flexible substrate; a light shielding film for shielding the ultraviolet light is provided outside the thin line area of the area where the thin lines are arranged; the edge forming direction of the inner edge side of the light shielding film is the same as that of the thin lines The long-side direction is parallel or perpendicular; the thin lines are connected to the light-shielding film in the long-side direction; and the material constituting the light-shielding film is made of a material containing molybdenum silicide. The polarizer according to claim 8, wherein a second thin line region in a region where the thin lines are arranged is formed outside the light shielding film.