JP2019008318A5 - - Google Patents
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- JP2019008318A5 JP2019008318A5 JP2018175261A JP2018175261A JP2019008318A5 JP 2019008318 A5 JP2019008318 A5 JP 2019008318A5 JP 2018175261 A JP2018175261 A JP 2018175261A JP 2018175261 A JP2018175261 A JP 2018175261A JP 2019008318 A5 JP2019008318 A5 JP 2019008318A5
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- JP
- Japan
- Prior art keywords
- light
- polarizer
- shielding film
- thin
- light shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 238000002834 transmittance Methods 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 230000001678 irradiating Effects 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
Claims (13)
前記細線が配置された偏光領域の外側に、前記紫外光を遮光する遮光膜が形成されており、
前記偏光領域の外縁を構成する一の辺に沿って、前記遮光膜が形成され、
前記一の辺が、前記細線に平行な辺であり、
前記細線と前記遮光膜の内縁側のエッジとの間隔が、前記細線同士の間隔と同じであることを特徴とする偏光子。 It is a polarizer in which a plurality of thin wires are arranged in parallel on a transparent substrate transparent to ultraviolet light,
A light shielding film for shielding the ultraviolet light is formed outside the polarization region in which the thin lines are arranged ,
The light shielding film is formed along one side that constitutes the outer edge of the polarization area,
The one side is a side parallel to the thin line,
A polarizer , wherein a distance between the thin line and an edge on an inner edge side of the light shielding film is equal to a distance between the thin lines .
前記透明基板の上に第1の材料層を形成した積層体を準備する工程と、 Preparing a laminate in which the first material layer is formed on the transparent substrate;
前記第1の材料層の上にレジスト層を形成する工程と、 Forming a resist layer on the first material layer;
前記レジスト層を加工して、細線パターンと遮光膜パターンを有するレジストパターンを形成する工程と、 Processing the resist layer to form a resist pattern having a fine line pattern and a light shielding film pattern;
前記レジストパターンをエッチングマスクに用いて前記第1の材料層をエッチング加工する工程と、 Etching the first material layer using the resist pattern as an etching mask;
を備えることを特徴とする偏光子の製造方法。 A method of manufacturing a polarizer, comprising:
前記細線パターンと前記遮光膜パターンを有するレジストパターンを形成する工程が、前記細線パターンを構成するラインアンドスペースパターンのスペースパターン部となる位置のレジスト層に電子線を照射する工程を含むことを特徴とする請求項8に記載の偏光子の製造方法。 The step of forming a resist pattern having the thin line pattern and the light shielding film pattern includes the step of irradiating the resist layer at a position to be a space pattern portion of the line and space pattern constituting the thin line pattern. A method of manufacturing a polarizer according to claim 8.
前記偏光子の前記偏光領域を透過する光を、前記光配向膜に照射することを特徴とする光配向装置。 A light alignment device, comprising: irradiating the light alignment film with light transmitted through the polarization area of the polarizer.
前記偏光子が前記光配向膜の移動方向および前記光配向膜の移動方向に直交する方向の両方向に複数個備えられており、 A plurality of the polarizers are provided in both the moving direction of the light alignment film and the direction orthogonal to the moving direction of the light alignment film,
前記光配向膜の移動方向に直交する方向において隣り合う前記複数個の偏光子間の境界部が、前記光配向膜の移動方向に連続的に繋がらないように、前記複数個の偏光子が配置されていることを特徴とする請求項10に記載の光配向装置。 The plurality of polarizers are disposed such that boundaries between the plurality of adjacent polarizers in the direction orthogonal to the moving direction of the optical alignment film are not continuously connected to the moving direction of the optical alignment film. The light aligning device according to claim 10, characterized in that:
前記紫外光に対して透過性を有する基板の上に、複数本の前記細線が並列に配置され、 A plurality of the thin wires are arranged in parallel on a substrate having transparency to the ultraviolet light,
前記細線が配置された領域である細線領域の外側に、前記紫外光を遮光する遮光膜を有し、 A light shielding film for shielding the ultraviolet light is provided outside the thin wire region which is a region where the thin wire is disposed,
前記遮光膜の内縁側のエッジの形成方向が、前記細線の長手方向と平行または垂直であり、 The formation direction of the inner edge side of the light shielding film is parallel or perpendicular to the longitudinal direction of the thin line,
前記細線領域の外縁を構成する一の辺に沿って、前記遮光膜が形成され、 The light shielding film is formed along one side constituting an outer edge of the thin line region,
前記一の辺が、前記細線の長手方向に平行な辺であり、 The one side is a side parallel to the longitudinal direction of the thin line,
前記細線と前記遮光膜の内縁側のエッジとの間隔が、前記細線同士の間隔と同じであることを特徴とする偏光子。 A polarizer, wherein a distance between the thin line and an edge on an inner edge side of the light shielding film is equal to a distance between the thin lines.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014005220 | 2014-01-15 | ||
JP2014005220 | 2014-01-15 | ||
JP2014122212 | 2014-06-13 | ||
JP2014122212 | 2014-06-13 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015557851A Division JP6455444B2 (en) | 2014-01-15 | 2015-01-14 | Polarizer and method for producing polarizer |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2019008318A JP2019008318A (en) | 2019-01-17 |
JP2019008318A5 true JP2019008318A5 (en) | 2019-04-18 |
JP6620854B2 JP6620854B2 (en) | 2019-12-18 |
Family
ID=53542963
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2015557851A Active JP6455444B2 (en) | 2014-01-15 | 2015-01-14 | Polarizer and method for producing polarizer |
JP2018175261A Active JP6620854B2 (en) | 2014-01-15 | 2018-09-19 | Polarizer, polarizer manufacturing method, photo-alignment apparatus, and polarizer mounting method |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015557851A Active JP6455444B2 (en) | 2014-01-15 | 2015-01-14 | Polarizer and method for producing polarizer |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP6455444B2 (en) |
KR (2) | KR101919210B1 (en) |
CN (1) | CN105874365B (en) |
TW (2) | TWI564633B (en) |
WO (1) | WO2015108075A1 (en) |
Families Citing this family (7)
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JP6312454B2 (en) * | 2014-02-07 | 2018-04-18 | 株式会社ブイ・テクノロジー | Polarized light irradiation device |
JP6766370B2 (en) * | 2015-02-18 | 2020-10-14 | 大日本印刷株式会社 | Polarizer, polarizer holder, and photoaligner |
JP6884501B2 (en) * | 2015-08-25 | 2021-06-09 | 大日本印刷株式会社 | Polarizer |
JP6270927B2 (en) * | 2016-07-08 | 2018-01-31 | 日本エイアンドエル株式会社 | Plating resin composition and plating molded product |
JP2018017952A (en) * | 2016-07-29 | 2018-02-01 | ウシオ電機株式会社 | Light projection apparatus and light projection method |
JP2019109375A (en) * | 2017-12-19 | 2019-07-04 | セイコーエプソン株式会社 | Polarization element, and manufacturing method for polarization element |
CN117518621A (en) * | 2023-11-07 | 2024-02-06 | 成都瑞波科材料科技有限公司 | Optical alignment device |
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-
2015
- 2015-01-14 KR KR1020167016788A patent/KR101919210B1/en active IP Right Grant
- 2015-01-14 KR KR1020187024359A patent/KR101991216B1/en active IP Right Review Request
- 2015-01-14 CN CN201580003710.2A patent/CN105874365B/en active Active
- 2015-01-14 JP JP2015557851A patent/JP6455444B2/en active Active
- 2015-01-14 WO PCT/JP2015/050822 patent/WO2015108075A1/en active Application Filing
- 2015-01-15 TW TW104101299A patent/TWI564633B/en active
- 2015-01-15 TW TW105127436A patent/TWI612362B/en active
-
2018
- 2018-09-19 JP JP2018175261A patent/JP6620854B2/en active Active
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