JP2019008318A5 - - Google Patents

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JP2019008318A5
JP2019008318A5 JP2018175261A JP2018175261A JP2019008318A5 JP 2019008318 A5 JP2019008318 A5 JP 2019008318A5 JP 2018175261 A JP2018175261 A JP 2018175261A JP 2018175261 A JP2018175261 A JP 2018175261A JP 2019008318 A5 JP2019008318 A5 JP 2019008318A5
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light
polarizer
shielding film
thin
light shielding
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Claims (13)

紫外光に対して透過性を有する透明基板の上に、複数本の細線が並列に配置された偏光子であって、
前記細線が配置された偏光領域の外側に、前記紫外光を遮光する遮光膜が形成されており、
前記偏光領域の外縁を構成する一の辺に沿って、前記遮光膜が形成され、
前記一の辺が、前記細線に平行な辺であり、
前記細線と前記遮光膜の内縁側のエッジとの間隔が、前記細線同士の間隔と同じであることを特徴とする偏光子。
It is a polarizer in which a plurality of thin wires are arranged in parallel on a transparent substrate transparent to ultraviolet light,
A light shielding film for shielding the ultraviolet light is formed outside the polarization region in which the thin lines are arranged ,
The light shielding film is formed along one side that constitutes the outer edge of the polarization area,
The one side is a side parallel to the thin line,
A polarizer , wherein a distance between the thin line and an edge on an inner edge side of the light shielding film is equal to a distance between the thin lines .
前記偏光領域の外周に、前記遮光膜が形成されていることを特徴とする請求項1に記載の偏光子。The said light shielding film is formed in the outer periphery of the said polarization | polarized-light area | region, The polarizer of Claim 1 characterized by the above-mentioned. 前記遮光膜に、文字、記号、または、アライメントマークが形成されていることを特徴とする請求項1または請求項2に記載の偏光子。  The polarizer according to claim 1 or 2, wherein a character, a symbol, or an alignment mark is formed on the light shielding film. 前記文字、前記記号、または、前記アライメントマークが、複数本の細線が並列に配置された構成を有することを特徴とする請求項3に記載の偏光子。  The polarizer according to claim 3, wherein the character, the symbol, or the alignment mark has a configuration in which a plurality of thin lines are arranged in parallel. 前記文字、前記記号、または、前記アライメントマークにおける前記紫外光に対するS波透過率の値が、前記偏光領域における前記紫外光に対するS波透過率と同じ値、若しくは、前記偏光領域における前記紫外光に対するS波透過率よりも小さい値であることを特徴とする請求項4に記載の偏光子。  The value of the S-wave transmittance for the ultraviolet light in the character, the symbol, or the alignment mark is the same as the S-wave transmittance for the ultraviolet light in the polarized region, or for the ultraviolet light in the polarized region The polarizer according to claim 4, which has a smaller value than the S-wave transmittance. 前記遮光膜に、前記細線が接続していることを特徴とする請求項1から請求項5までのいずれかの請求項に記載の偏光子。  The polarizer according to any one of claims 1 to 5, wherein the thin line is connected to the light shielding film. 前記遮光膜を構成する材料が、前記細線を構成する材料を含有することを特徴とする請求項1から請求項6までのいずれかの請求項に記載の偏光子。  The polarizer according to any one of claims 1 to 6, wherein a material forming the light shielding film contains a material forming the thin wire. 請求項1から請求項7までのいずれかの請求項に記載の偏光子を製造する偏光子の製造方法であって、  A method for producing a polarizer according to any one of claims 1 to 7, which produces the polarizer,
前記透明基板の上に第1の材料層を形成した積層体を準備する工程と、  Preparing a laminate in which the first material layer is formed on the transparent substrate;
前記第1の材料層の上にレジスト層を形成する工程と、  Forming a resist layer on the first material layer;
前記レジスト層を加工して、細線パターンと遮光膜パターンを有するレジストパターンを形成する工程と、  Processing the resist layer to form a resist pattern having a fine line pattern and a light shielding film pattern;
前記レジストパターンをエッチングマスクに用いて前記第1の材料層をエッチング加工する工程と、  Etching the first material layer using the resist pattern as an etching mask;
を備えることを特徴とする偏光子の製造方法。  A method of manufacturing a polarizer, comprising:
前記レジスト層が、ポジ型の電子線レジストから構成されており、  The resist layer is composed of a positive type electron beam resist,
前記細線パターンと前記遮光膜パターンを有するレジストパターンを形成する工程が、前記細線パターンを構成するラインアンドスペースパターンのスペースパターン部となる位置のレジスト層に電子線を照射する工程を含むことを特徴とする請求項8に記載の偏光子の製造方法。  The step of forming a resist pattern having the thin line pattern and the light shielding film pattern includes the step of irradiating the resist layer at a position to be a space pattern portion of the line and space pattern constituting the thin line pattern. A method of manufacturing a polarizer according to claim 8.
紫外光を偏光して光配向膜に照射する光配向装置であって、請求項1から請求項7までのいずれかの請求項に記載の偏光子を備え、  A photo-alignment device that polarizes ultraviolet light and irradiates the photo-alignment film, comprising the polarizer according to any one of claims 1 to 7.
前記偏光子の前記偏光領域を透過する光を、前記光配向膜に照射することを特徴とする光配向装置。  A light alignment device, comprising: irradiating the light alignment film with light transmitted through the polarization area of the polarizer.
前記光配向膜を移動させる機構が備えられており、  A mechanism for moving the photo alignment film is provided;
前記偏光子が前記光配向膜の移動方向および前記光配向膜の移動方向に直交する方向の両方向に複数個備えられており、  A plurality of the polarizers are provided in both the moving direction of the light alignment film and the direction orthogonal to the moving direction of the light alignment film,
前記光配向膜の移動方向に直交する方向において隣り合う前記複数個の偏光子間の境界部が、前記光配向膜の移動方向に連続的に繋がらないように、前記複数個の偏光子が配置されていることを特徴とする請求項10に記載の光配向装置。  The plurality of polarizers are disposed such that boundaries between the plurality of adjacent polarizers in the direction orthogonal to the moving direction of the optical alignment film are not continuously connected to the moving direction of the optical alignment film. The light aligning device according to claim 10, characterized in that:
入射した紫外光の細線に平行な偏光方向の光を遮蔽し、前記細線に垂直な偏光方向の光を透過させる偏光子であって、  A polarizer that shields light in a polarization direction parallel to a thin line of ultraviolet light that has entered, and transmits light in a polarization direction perpendicular to the thin line,
前記紫外光に対して透過性を有する基板の上に、複数本の前記細線が並列に配置され、  A plurality of the thin wires are arranged in parallel on a substrate having transparency to the ultraviolet light,
前記細線が配置された領域である細線領域の外側に、前記紫外光を遮光する遮光膜を有し、  A light shielding film for shielding the ultraviolet light is provided outside the thin wire region which is a region where the thin wire is disposed,
前記遮光膜の内縁側のエッジの形成方向が、前記細線の長手方向と平行または垂直であり、  The formation direction of the inner edge side of the light shielding film is parallel or perpendicular to the longitudinal direction of the thin line,
前記細線領域の外縁を構成する一の辺に沿って、前記遮光膜が形成され、  The light shielding film is formed along one side constituting an outer edge of the thin line region,
前記一の辺が、前記細線の長手方向に平行な辺であり、  The one side is a side parallel to the longitudinal direction of the thin line,
前記細線と前記遮光膜の内縁側のエッジとの間隔が、前記細線同士の間隔と同じであることを特徴とする偏光子。  A polarizer, wherein a distance between the thin line and an edge on an inner edge side of the light shielding film is equal to a distance between the thin lines.
前記遮光膜の外側に、前記細線が配置された領域である第2細線領域が形成されていることを特徴とする請求項12に記載の偏光子。  The polarizer according to claim 12, wherein a second fine wire region, which is a region in which the thin wire is arranged, is formed outside the light shielding film.
JP2018175261A 2014-01-15 2018-09-19 Polarizer, polarizer manufacturing method, photo-alignment apparatus, and polarizer mounting method Active JP6620854B2 (en)

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6312454B2 (en) * 2014-02-07 2018-04-18 株式会社ブイ・テクノロジー Polarized light irradiation device
JP6766370B2 (en) * 2015-02-18 2020-10-14 大日本印刷株式会社 Polarizer, polarizer holder, and photoaligner
JP6884501B2 (en) * 2015-08-25 2021-06-09 大日本印刷株式会社 Polarizer
JP6270927B2 (en) * 2016-07-08 2018-01-31 日本エイアンドエル株式会社 Plating resin composition and plating molded product
JP2018017952A (en) * 2016-07-29 2018-02-01 ウシオ電機株式会社 Light projection apparatus and light projection method
JP2019109375A (en) * 2017-12-19 2019-07-04 セイコーエプソン株式会社 Polarization element, and manufacturing method for polarization element
CN117518621A (en) * 2023-11-07 2024-02-06 成都瑞波科材料科技有限公司 Optical alignment device

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534574B2 (en) 1972-11-10 1980-09-08
JP2003131356A (en) * 2001-10-25 2003-05-09 Hitachi Ltd Method for manufacturing photomask and pattern exposure system
KR100732749B1 (en) * 2001-12-28 2007-06-27 주식회사 하이닉스반도체 Mask for Forming Minute Pattern
JP4280518B2 (en) * 2003-03-05 2009-06-17 リコー光学株式会社 Polarizing optical element and manufacturing method thereof
US20040174596A1 (en) * 2003-03-05 2004-09-09 Ricoh Optical Industries Co., Ltd. Polarization optical device and manufacturing method therefor
KR100614651B1 (en) * 2004-10-11 2006-08-22 삼성전자주식회사 Apparatus And Method For Pattern Exposure, Photomask Used Therefor, Design Method For The Photomask, Illuminating System Therefor and Implementing Method For The Illuminating System
JP4506412B2 (en) * 2004-10-28 2010-07-21 ウシオ電機株式会社 Polarizing element unit and polarized light irradiation device
JP4815995B2 (en) * 2005-10-24 2011-11-16 ウシオ電機株式会社 Polarized light irradiation device for photo-alignment
JP4951960B2 (en) * 2005-12-22 2012-06-13 大日本印刷株式会社 Metal mask, metal mask position alignment method and apparatus
JP2007178763A (en) 2005-12-28 2007-07-12 Seiko Epson Corp Method for manufacturing optical element, liquid crystal device, and projection-type display device
JP2008083215A (en) * 2006-09-26 2008-04-10 Seiko Epson Corp Mask for manufacturing alignment layer and method of manufacturing liquid crystal device
JP5109520B2 (en) * 2007-07-27 2012-12-26 セイコーエプソン株式会社 Optical element, liquid crystal device, mother substrate for liquid crystal device, electronic device, and wire grid polarization element
JP4968165B2 (en) 2008-04-24 2012-07-04 ウシオ電機株式会社 Polarized light irradiation device for photo-alignment
JP5191851B2 (en) * 2008-09-25 2013-05-08 株式会社東芝 Polarization state inspection apparatus and polarization state inspection method
US20120183739A1 (en) * 2009-09-22 2012-07-19 Jae-Jin Kim High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof
JP2011186394A (en) * 2010-03-11 2011-09-22 Toppan Printing Co Ltd Method for correction of white defect in mask pattern, and mask pattern
JP2011203669A (en) * 2010-03-26 2011-10-13 Toppan Printing Co Ltd Polarizing exposure apparatus
JP2011248284A (en) * 2010-05-31 2011-12-08 Sony Chemical & Information Device Corp Polarizing plate and method of manufacturing the same
JP5682437B2 (en) * 2010-09-07 2015-03-11 ソニー株式会社 Solid-state imaging device, solid-state imaging device, imaging apparatus, and polarizing element manufacturing method
US8873144B2 (en) * 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
JP5077465B2 (en) * 2011-07-14 2012-11-21 ウシオ電機株式会社 Polarized light irradiation device for photo-alignment
JP4977794B2 (en) * 2011-09-21 2012-07-18 信越化学工業株式会社 Pattern transfer method and photomask
JP2013145863A (en) 2011-11-29 2013-07-25 Gigaphoton Inc Two-beam interference apparatus and two-beam interference exposure system
US8922890B2 (en) * 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
US10310321B2 (en) * 2012-06-21 2019-06-04 Maxell, Ltd. Optical element, manufacturing method of optical element, and optical device
JP6308816B2 (en) * 2013-03-07 2018-04-11 株式会社ブイ・テクノロジー Polarized light irradiation device for photo-alignment
JP5344105B1 (en) * 2013-03-08 2013-11-20 ウシオ電機株式会社 Polarizing light irradiation apparatus for photo-alignment and polarized light irradiation method for photo-alignment
JP6428171B2 (en) * 2013-11-13 2018-11-28 大日本印刷株式会社 Polarizer, polarizer substrate and optical alignment apparatus

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