CN105874365B - Polarizer, the manufacturing method of polarizer, light orientation device and polarizer assemble method - Google Patents

Abstract

Present invention is primarily aimed at provide a kind of polarizer, when the polarizer for being arranged in parallel with a plurality of filament is configured at light orientation device by energy elimination, linksystem causes the unfavorable condition of filament breakage and generates the unfavorable condition of foreign matter from damaged filament part, and extinction ratio is excellent.The present invention, in the outside of the polarized regions configured with above-mentioned filament, forms the photomask that above-mentioned ultraviolet light is given to shading by having in the polarizer for configuring a plurality of filament side by side on radioparent transparent substrate to ultraviolet light, and solves the above subject.

Description

Polarizer, the manufacturing method of polarizer, the group of light orientation device and polarizer Dress method

Technical field

The present invention relates to the excellent polarizer of extinction ratio, its manufacturing method and the light orientations for having the polarizer Device.

Background technique

Liquid crystal display device generally has the opposite substrate that will be formed with driving element with colored filter in oppositely disposed And around sealing, and the construction of liquid crystal material is filled in gap therebetween.Also, liquid crystal material has refractive anisotrop, Due to, in the difference of neat state and the state of no applied voltage, switching along the mode for applying voltage direction to liquid crystal material Off/on can display pixel.This is in the substrate of clamping liquid crystal material, equipped with the alignment films for being orientated liquid crystal material.

In addition, even if the material as phase difference film used in liquid crystal display device or 3D display phase difference film Use alignment films.

Alignment films are known as, such as using using polyimides as the high molecular material of representative, utilize cloth etc. by implementing Become the alignment films with orientation restraint to the friction treatment that the high molecular material rubs.

However, having cloth etc. as foreign matter in such alignment films for being endowed orientation restraint by friction treatment The problem of remaining.

In contrast, shown in the alignment films of orientation restraint, i.e. optical alignment film by irradiating rectilinearly polarized light, because Do not implement as described above using the progress such as cloth friction treatment in the case where can assign orientation restraint, because without there is cloth Occur Deng the unfavorable condition for becoming foreign matter and remaining, so attract attention in recent years.

As for such optical alignment film assign orientation restraint linear polarization light illuminating method, generally take via The method that polarizer is exposed.As polarizer, using the element of a plurality of filament with configured in parallel, as composition Materials'use aluminium, the titanium oxide (such as patent document 1) of filament.

Also, as the method for a plurality of filament for forming configured in parallel, two-beam interference exposure method (two- is used in the past Beam interference exposure method) (such as patent document 2,3).

The two-beam interference exposure method is the periodical light that will make to generate when phase is Chong Die with 2 laser that optical length is added Intensity distribution (interference figure), is needed on the technology of the resist on substrate.

For example, the metal layers such as aluminium will be formed on the glass substrate, and implement dual-beam to being formed by resist layer on it Interference exposure, development, are used for etching mask for the periodical corrosion-resisting pattern so obtained, are etched to metal layer, later, lead to Removing corrosion-resisting pattern is crossed, it is possible thereby to form the filament for the multiple configured in parallel being made of metals such as aluminium on the glass substrate.

Then, by cutting into glass substrate as form required for polarizer, so as to obtain with aluminium The polarizer for the filament that equal metals are constituted.

Existing technical literature]

[patent document]

Patent document 1: No. 4968165 bulletins of Japanese Patent No.

Patent document 2: Japanese Unexamined Patent Publication 2013-145863 bulletin

Patent document 3: Japanese Unexamined Patent Publication 2007-178763 bulletin

Summary of the invention

(invention is wanted to solve the problems, such as)

Previous polarizer as described above, because being cut from the large-area glass substrate for having formed filament according to every filament It is disconnected, and the polarizer of required size and form is cut, thus shown in obtained polarizer such as Figure 12 (a), filament 112 extends To the outer rim (i.e. cutting end) of polarizer 110.

Therefore, when polarizer 110 is configured at light orientation device, shape is clamped if polarizer 110 is capable of fixing At the region for having the filament 112, there will be from the partial linkage of clamping cause the damaged unfavorable condition of filament 112 or from Damaged filament part generates the unfavorable condition of foreign matter.

On the other hand, in order to avoid clamping the part for being configured with filament, and consider to utilize some way, filament will be configured with Region be defined in the region of the area inside cut as polarizer, and the region clamped without configuration filament is exposing glass The region of glass substrate and fix polarizer.

However, shown in this situation such as Figure 12 (b), the outside area in the region in polarizer 120 configured with filament 122 Domain, can become glass substrate 121 expose region, and from the glass substrate 121 expose region, not only the P wave of incident light at Branch's transmission, even S wave component can also transmit, thus has the unfavorable condition for causing extinction ratio to be greatly reduced.

In addition, so-called " extinction ratio " refers to that the transmissivity relative to the polarized component (S wave) for being parallel to above-mentioned filament (projects The S wave component in S wave component/incident light in light, below also referred to as " S wave transmissivity "), perpendicular to polarizing for above-mentioned filament Divide the transmissivity (projecting the P wave component in P wave component/incident light in light, below also referred to as " P wave transmissivity ") of (P wave) Ratio (P wave transmissivity/S wave transmissivity).

It such as with P wave transmissivity is 50%, the extinction ratio of the polarizer for the properties of polarized light that S wave transmissivity is 1% Value be 50, but when forming the region for exposing glass substrate on the polarizer, and P wave transmissivity increases with S wave transmissivity In the case where adding 1%, extinction ratio (i.e. P wave transmissivity/S wave transmissivity ratio) is become as (50+1)/(1+1)=25.5, is disappeared Light ratio is about reduced to a half value.

The present invention has been made in view of the above circumstances, and main purpose is to provide: can eliminate ought be configured at light for polarizer When aligning device, linksystem causes the unfavorable condition of filament breakage, generates the unfavorable condition of foreign matter with from damaged filament part, And the polarizer that extinction ratio is excellent.

(being used for technical means to solve problem)

Present inventor carry out various researchs as a result, discovery by configured with above-mentioned filament polarized regions outside, The photomask that ultraviolet light is given to shading is formed, can be solved the above problems, completes the present invention then.

That is, polarizer of the invention is characterized in that, it is to have on radioparent transparent substrate to ultraviolet light, side by side Configure the polarizer of a plurality of filament, wherein in the outside of the polarized regions configured with above-mentioned filament, being formed with will be above-mentioned ultraviolet Light gives the photomask of shading.

In addition, polarizer of the invention is characterized in that, along the one side for constituting above-mentioned polarized regions outer rim, it is formed with Above-mentioned photomask.

In addition, polarizer of the invention is characterized in that, above-mentioned photomask is formed in the periphery of above-mentioned polarized regions.

In addition, polarizer of the invention is characterized in that, text, mark are formed in above-mentioned photomask or to fiducial mark Note.

In addition, polarizer of the invention is characterized in that, above-mentioned text, above-mentioned mark or above-mentioned alignment mark have simultaneously Column configure the composition of a plurality of filament.

In addition, polarizer of the invention is characterized in that, to upper in above-mentioned text, above-mentioned mark or above-mentioned alignment mark The value for stating the S wave transmissivity of ultraviolet light, be in above-mentioned polarized regions to the identical value of the S wave transmissivity of above-mentioned ultraviolet light, Or less than in above-mentioned polarized regions to the value of the S wave transmissivity of above-mentioned ultraviolet light.

In addition, polarizer of the invention is characterized in that, above-mentioned photomask is connect with above-mentioned filament.

In addition, polarizer of the invention is characterized in that, the material system for constituting above-mentioned photomask contain constitute it is above-mentioned thin The material of line.

In addition, polarizer of the invention is characterized in that, the material of above-mentioned photomask is constituted by the material of silicide-comprising molybdenum It constitutes.

In addition, the manufacturing method of polarizer of the invention is characterized in that, be have to ultraviolet light it is radioparent Bright substrate is equipped with a plurality of filament and above-mentioned ultraviolet light is given to the manufacturing method of the polarizer of the photomask of shading, the side Method includes: preparing the process that laminated body made of the 1st material layer is formed on above-mentioned transparent substrate；In above-mentioned 1st material layer The upper process for forming resist layer；Above-mentioned resist layer is processed, and being formed has the against corrosion of thread pattern and shading film figure The process of pattern；And the process that above-mentioned corrosion-resisting pattern is used for etching mask and is etched processing to above-mentioned 1st material layer.

In addition, the manufacturing method of polarizer of the invention is characterized in that, above-mentioned resist layer is against corrosion by eurymeric electron beam Agent is constituted；And the process with the corrosion-resisting pattern of above-mentioned thread pattern and above-mentioned shading film figure is formed, including to as structure At the position in the intermittent pattern portion in the lines and intermittent pattern in above-mentioned thread pattern resist layer irradiating electron beam the step of.

In addition, light orientation device of the invention is characterized in that, it is that ultraviolet light is polarized and is irradiated in optical alignment film Light orientation device, have above-mentioned polarizer, and the light of the above-mentioned polarized regions of above-mentioned polarizer will be transmitted, be irradiated to It states on optical alignment film.

In addition, light orientation device of the invention is characterized in that, has the mechanism for keeping above-mentioned optical alignment film mobile, just The two directions of direction of the mobile direction of above-mentioned optical alignment film and the movement of above-mentioned optical alignment film are met at equipped with multiple above-mentioned inclined Shake element, the boundary portion on the orthogonal direction of above-mentioned optical alignment film moving direction between adjacent above-mentioned multiple polarizers, with With above-mentioned optical alignment film moving direction will not the mode that connect of continuity configure above-mentioned multiple polarizers.

Polarizer provided by the present invention is characterized in that, is the polarization direction that institute's incident uv is parallel to filament Light covered and made the light transmissive polarizer of the polarization direction perpendicular to above-mentioned filament, to above-mentioned ultraviolet light have Have on radioparent substrate, configures a plurality of above-mentioned filament side by side, on the outside of region, that is, fine line region configured with above-mentioned filament, if There is the photomask that above-mentioned ultraviolet light is given to shading, and the edge of above-mentioned photomask inner edge side forms the length in direction and above-mentioned filament Edge direction is parallel or vertical.

According to the present invention, it is formed in the outside of above-mentioned fine line region by above-mentioned photomask, is configured at when by polarizer When light orientation device, the region for being formed with photomask can be clamped.I.e. in polarizer, filament configuring area will not be clamped with I.e. in the case of fine line region, polarizer can be fixed on to light orientation device, drawn so can eliminate from retained part linksystem It sends out the unfavorable condition of filament breakage, generate the unfavorable condition of foreign matter with from damaged filament part.

In addition, as described above, because be formed with photomask in the fine line region periphery in the region configured with filament, thus In polarizer, the S wave component transmission of incident light, especially incident light can be inhibited from the lateral area of fine line region, can be pressed down Such unfavorable condition is greatly reduced in extinction ratio processed.

In addition, the reason for this is that parallel or vertical with the longitudinal direction of above-mentioned filament by the edge of above-mentioned photomask inner edge side Directly, the interval between above-mentioned fine line region and photomask thus can be made to reduce easily, can get High Extinction Ratio.

In the present invention, the region configured with above-mentioned filament i.e. the 2nd fine line region can also be formed in the outside of above-mentioned photomask. The reason is that: it if the outer rim of photomask is set to compared with polarizer outer rim more in the inner part, and is from photomask outer rim to polarization member The region of part outer rim is also formed configured with the fine line region i.e. mode of the 2nd fine line region, then when being in plane by multi-disc polarizer Shape is arranged when light orientation device, and each photomask of adjacent polarization element can be inhibited to be in contact to each other, and makes shading The widened situation in region.

Light orientation device provided by the present invention, which is characterized in that it is the light orientation device for having multiple polarizers, Above-mentioned polarizer, which has, to be configured a plurality of filament side by side and is formed in the region configured with the above-mentioned filament i.e. outside of fine line region Photomask；Multiple above-mentioned polarizers are free of according between the respective above-mentioned fine line region of the above-mentioned polarizer of adjacent configuration There is the mode of above-mentioned photomask to configure.

According to the present invention, by multiple above-mentioned polarizers according to the above-mentioned polarizer in adjacent configuration on respectively The mode without containing above-mentioned photomask configures between stating fine line region, thus because there is no photomask, institutes between each polarizer When can play the role of as having 1 polarizer.

The assemble method of polarizer provided by the invention, which is characterized in that be that multiple polarizers are assembled in light to take To the assemble method of the polarizer of device, above-mentioned polarizer, which has, to be configured a plurality of filament side by side and is formed in configured with upper State the photomask in the region i.e. outside of fine line region of filament；The assemble method on above-mentioned photomask including the use of being formed by pair Fiducial mark note, implements the contraposition of above-mentioned polarizer, while adjusting the contraposition process of the polarization direction of multiple above-mentioned polarizers.

According to the present invention, by using alignment mark is formed by photomask, can obtain in high precision filament position, The information of angle can easily be directed at desired position and angle.

The effect of invention

According to the present invention, it is possible to provide when polarizer is configured at light orientation device, it is broken that linksystem initiation filament can be eliminated The unfavorable condition of damage, under the unfavorable condition that damaged filament part generates foreign matter, and the polarizer that extinction ratio is excellent.

In addition, having the light orientation device of polarizer of the present invention, it can efficiently perform and assign orientation limit to optical alignment film Power processed can promote productivity.

Detailed description of the invention

Fig. 1 is display one example diagram of polarizer of the present invention, and (a) is approximate vertical view, is (b) the line A-A sectional view of (a).

Fig. 2 is the photomask plane configuration explanatory diagram of polarizer of the present invention shown in Fig. 1.

Fig. 3 is another plane configuration example diagram of photomask shown in polarizer of the present invention.

Fig. 4 is display another example diagram of polarizer of the present invention, and (a) is approximate vertical view, is (b) that the alignment mark of (a) is put Big figure.

Fig. 5 is the outline process chart for showing manufacturing method an example of polarizer of the present invention.

Fig. 6 is hookup 5, shows the outline process chart of manufacturing method an example of polarizer of the present invention.

Fig. 7 is the composition example diagram for showing light orientation device of the present invention.

Fig. 8 is display another composition example diagram of light orientation device of the present invention.

Fig. 9 is one example diagram of polarizer configuration shown in light orientation device of the present invention.

Figure 10 is another example diagram of polarizer configuration shown in light orientation device of the present invention.

Figure 11 is the properties of polarized light measurement result figure for showing the polarizer of embodiment 2.

Figure 12 is the approximate vertical view for showing previous polarizer example.

Specific embodiment

Hereinafter, being directed to polarizer of the invention, the manufacturing method of polarizer, the group of light orientation device and polarizer Dress method is illustrated.

A. polarizer

Firstly, being illustrated for polarizer of the invention.

Polarizer of the invention is that have on radioparent transparent substrate to ultraviolet light, is arranged in parallel with a plurality of filament Polarizer, wherein configured with above-mentioned filament polarized regions outside, be formed with and above-mentioned ultraviolet light given into shading Photomask.

It is the example diagram for showing polarizer of the present invention shown in Fig. 1, (a) is approximate vertical view, is (b) that the line A-A of Fig. 1 cuts open Face figure.

As shown in Figure 1, polarizer 10 is to configure a plurality of filament 2 side by side on transparent substrate 1, and be configured with filament 2 Polarized regions 3 periphery formed photomask 4.

Because having such composition, when being configured at light orientation device, can clamp to be formed in polarizer 10 There is the region of photomask 4.

That is, in polarizer 10, it can be when not clamping 2 forming region (polarized regions 3) of filament, by polarizer 10 are fixed on light orientation device, therefore can eliminate and cause the damaged unfavorable condition of filament 2 by retained part linksystem and from having broken Damage the unfavorable condition that filament part generates foreign matter.

In addition, as described above, because photomask 4 is formed in the periphery of the polarized regions 3 configured with filament 2, thus inclined It shakes in element 10, the S wave component for transmiting incident light, particularly incident light from the lateral area of polarized regions 3 can be inhibited, can be pressed down The unfavorable condition that extinction ratio processed can be greatly reduced.

Hereinafter, each composition for polarizer of the present invention is described in detail.

1. transparent substrate

As transparent substrate 1, as long as can steadily support filament 2 and ultraviolet light transmission it is excellent, because expose it is photogenic Few substrate is deteriorated, there is no particular limitation.Such as can be used rub through optics made of synthetic quartz glass, fluorite, fluorination Calcium etc., wherein it is preferable to use synthetic quartz glass.The reason for this is that stay in grade, and even with the light of short wavelength, i.e. high-energy The case where exposure, deteriorates still less.

As the thickness of transparent substrate 1, can suitably be selected according to the purposes of polarizer 10 and size etc..

2. filament

Filament 2 is in polarizer 10, and can reach transmits the P wave component of incident light effectively, and inhibits incident light S wave component transmissivity to lower effect, linearly a plurality of formation and configured in parallel on transparent substrate 1.

As long as the material for constituting filament 2 can obtain required delustring when P wave transmissivity, there is no particular limitation, can arrange Citing such as contain: aluminium, titanium, molybdenum, silicon, chromium, tantalum, ruthenium, niobium, hafnium, nickel, gold, silver, platinum, palladium, rhodium, cobalt, manganese, iron, indium metal or Alloy；And any one of their oxide, nitride or nitrogen oxides.Wherein, preferably by the material structure containing molybdenum silicide At.Even if reason is in the short wavelength of ultraviolet range, can still making delustring, when P wave transmissivity is excellent, and heat resistance, fast light Property is also excellent.

As the material containing molybdenum silicide, it can be mentioned, for example: molybdenum silicide (MoSi), molybdenum silicide oxide (MoSiO), silication Molybdenum nitride (MoSiN), molybdenum silicide nitrogen oxide (MoSiON) etc..

It in addition, filament 2 can be made of multiple material, and can also be that different multilayers is constituted by material.

As the thickness of filament 2, as long as required delustring when P wave transmissivity can be obtained, there is no particular limitation, such as Preferably 60nm or more, wherein within the scope of preferably 60nm~160nm, within the scope of particularly preferably 80nm~140nm.Reason is By that within the above range, can make delustring, when P wave transmissivity is excellent.

In addition, the thickness of above-mentioned filament, refers in section view, and in the longitudinal direction of filament and the vertical direction of width direction Maximum gauge in thickness, in the case that filament is made up of multiple layers, refer to the thickness comprising all layers.

In addition, the thickness of above-mentioned filament can also be the filament containing different-thickness in a polarizer, but it is usually It is formed with same thickness.

As the item number and length of filament 2, as long as required delustring when P wave transmissivity can be obtained, special limit is had no It is fixed, it can be suitably set according to the purposes etc. of polarizer 10.

Spacing (P shown in Fig. 1 (a) as filament 2₁), as long as required delustring when P wave transmissivity can be obtained, have no It is special to limit, although optical wavelength according to used in linear polarization photogenerated etc. and difference, such as 60nm can be set as Above and in the range of 140nm or less, wherein the range of preferably 80nm or more and 120nm or less in, more preferably 90nm with In the upper and range of 110nm or less.Reason is by the way that for above-mentioned spacing, can making delustring, when P wave transmissivity is excellent.

In addition, the spacing of above-mentioned filament refers to the maximum spacing of the spacing between the filament adjacent with width direction, work as filament When being made up of multiple layers, refer to the spacing including whole layers.

It in addition, it includes different spacing that the spacing of above-mentioned filament, which can be in a polarizer, but is usually with phase It is formed with spacing.

Duty ratio (duty ratio) as above-mentioned filament, that is, the width of filament relative to spacing ratio (width/ Away from), as long as the when P wave transmissivity of delustring needed for capable of obtaining, there is no particular limitation, can be set as such as 0.3 or more and 0.6 with Under range in, wherein in preferably 0.35 or more and 0.45 or less range.Reason can be made up of above-mentioned duty ratio The excellent polarizer of extinction ratio, can further make filament handling ease under with high P wave transmission states.

In addition, the width of above-mentioned filament refers in vertical view, the length in the direction vertical with the longitudinal direction of filament works as filament When being made up of multiple layers, just refer to the width including whole layers.

In addition, the width of above-mentioned filament can be the filament containing different in width in a polarizer, but it is usually It is formed with same widths.

3. polarized regions

In polarizer 10 shown in FIG. 1, polarized regions 3 are the regions around being surrounded using photomask 4, in the polarization area Filament 2 is configured in domain 3.In other words, the polarized regions 3 of polarizer 10 shown in FIG. 1 are the regions standardized by photomask 4, It is incident light transmissive region.

In the present invention, polarized regions 3 can also be set as the region greater than 2 configuring areas of filament.More specifically, filament 2 The form that can not also do not connect with photomask 4 in its longitudinal direction (Y-direction shown in Fig. 1 (a)).

In addition, filament 2 orientation (in vertical view, longitudinal direction vertical direction with filament 2, i.e. shown in Fig. 1 (a) X-direction) on, the interval of end filament 2 and photomask 4 also may be greater than the size that filament 2 is spaced to each other.It is more specific and It says, in Fig. 1 (a), (b), the interval P in figure between 4 inner edge side edge of the left side edge of right end filament 2 and photomask₂, can also It is greater than filament 2 and is spaced P to each other₁Size.

However, like that, filament 2 is in its longitudinal direction for polarizer 10 preferably as shown in Figure 1 to obtain High Extinction Ratio Above in the form of being connect with photomask 4.Reason is the region that not there is no filament 2 can be set as smaller in polarized regions 3, can The S wave component for further suppressing incident light transmits.

In addition, end filament 2 of the filament 2 in orientation and the interval between photomask 4, preferably to each other with filament 2 Interval be in same size.

More specifically, Fig. 1 (a), in (b), the left side edge of right end filament 2 and 4 inner edge side of photomask in figure Intermarginal interval P₂, interval P preferably with filament 2 to each other₁In same size.Likewise, in Fig. 1 (a), (b), it is left in figure Interval between the 4 inner edge side edge of right side edge and photomask of side end filament 2, preferably the interval P with filament 2 to each other₁It is in Same size.Reason is to obtain higher extinction ratio.

In the present invention, such as by the way that the process for forming the process of filament 2 and forming photomask 4 is set as the same process, just End filament 2 in the orientation of filament 2 can be set as with the interval of filament 2 to each other being in phase with the interval between photomask 4 Same size.In addition, the positional relationship of photomask 4 Yu filament 2 can be precisely made, it can be accurately in parallel (or vertical) Make edge direction and 2 direction of filament of photomask 4.

In addition, as described above, if can reach makes using being irradiated in polarizer in the form of photomask 4 connects filament 2 Light and accumulate in the heat partition in filament 2 in photomask 4 and antistatic effect.

In addition, if the form that filament 2 is connect with photomask 4 can will be used for then in the manufacturing process of polarizer 10 The thinner corrosion-resisting pattern (thread pattern) for forming filament 2, is connected to the large area corrosion-resisting pattern (shading for being used to form photomask 4 Film figure), it may also suppress the thinner corrosion-resisting pattern (thread pattern) for being used to form filament 2 and occur to collapse in manufacturing process or shell From unfavorable condition.

4. photomask

Photomask 4 is formed at the outside of polarized regions 3, and the S wave component that can inhibit incident light, particularly incident light occurs Transmission.

In the present invention, ultraviolet light of the photomask 4 preferably to 240nm or more and 380nm or less wavelength is reached with optical density 2.8 or more light-proofness.

Reason is to make photomask in the ultraviolet wavelength range irradiated and assigning orientation restraint to optical alignment film 4 have high light-proofness, can promote the excellent polarizer of extinction ratio.

As long as the material for constituting photomask 4 can obtain required optical density, there is no particular limitation, can for example containing: aluminium, The metal or alloy such as titanium, molybdenum, silicon, chromium, tantalum, ruthenium, niobium, hafnium, nickel, gold, silver, platinum, palladium, rhodium, cobalt, manganese, iron, indium；And they Any one of oxide, nitride or nitrogen oxides.Wherein, the material containing molybdenum silicide is preferably enumerated.

Reason is when the material for constituting photomask 4 is made of the material containing molybdenum silicide, if the thickness of photomask 4 reaches 60nm or more can have light-proofness of the optical density up to 2.8 or more then to the ultraviolet light of 240nm or more and 380nm or less wavelength.

It in addition, photomask 4 can be made of multiple material, and can be that different multilayers is constituted by material.

In addition, the material for constituting photomask 4 preferably comprises the material for constituting filament 2.

Reason is the institute in the process for forming filament 2 when the material for constituting photomask 4 contains the material for constituting filament 2 Use device and material can be used with the process to form photomask 4, can cut down manufacturing cost.Additionally by filament will be formed 2 process and the process for forming photomask 4 are set as the same process, can also promote the relative positional accuracy of filament 2 Yu photomask 4.

In addition, when the material for constituting photomask 4 and the material for constituting filament 2 are made of the material of silicide-comprising molybdenum, just It can make photomask 4 that there is high light-proofness, and become extinction ratio and the excellent polarizer of P wave transmissivity.

Secondly, the vertical view form for photomask 4 is illustrated.

Fig. 2 is that the photomask of polarizer of the present invention shown in Fig. 1 overlooks form explanatory diagram.

As shown in Fig. 2, the photomask 4 in polarizer 10 has the frame-shaped form with inner edge 5 Yu outer rim 6, usually hide The inner edge 5 of light film 4 is consistent with the outer rim of polarized regions 3.

In addition, polarizer 10 as shown in Figure 1 is like that, the outer rim 6 of photomask 4 is usually the outer rim with polarizer 10 Unanimously.

But the present invention is not limited merely to above-mentioned form, as long as when polarizer is configured at light orientation device, It is formed in the region of photomask 4 and is capable of clamping polarizer, and it is i.e. applicable to inhibit unwanted S wave component that transmission occurs.

Such as when installing polarizer in the light orientation device towards optical alignment film irradiation rectilinearly polarized light, in polarization member The outer rim of part can nearby be kept the covering such as mechanism, and the light near the polarizer outer rim is caused not to be irradiated in light orientation When the case where film, the outer rim 6 of photomask 4 may also set up to be located more in the inner part in compared with polarizer outer rim.

In addition, if the polarizer region other than the region for being formed with photomask 4 is the form to form filament 2, such as It is also the form to form filament 2 in the more outward region of outer rim 6 compared with photomask 4, it can be in 4 forming region clampings of photomask Polarizer, on the other hand due to do not form photomask region formed filament 2, can inhibit unwanted S wave at The raw transmission of distribution, therefore applicable polarizer of the invention.

Fig. 3 is to show another plane configuration example diagram of the photomask of polarizer of the present invention.In addition, in Fig. 3, the length of filament 2 Edge direction is the up and down direction in figure.

As described above, photomask 4 of the invention is formed at the outside of polarized regions 3, it can inhibit incident light, especially enter The S wave component for penetrating light transmits.

Therefore, the vertical view form of the photomask 4 in the present invention is not limited merely to as shown in Figure 1 in polarized regions 3 Periphery is formed with the form of photomask 4, can be constructed, the configuration method of polarizer, is made each according to the holding of light orientation device Kind form.

For example, region (polarized regions 3) outer rim of filament 2 can also be formed with along composition as shown in Fig. 3 (a), (b) On one side, the form of photomask 4 is formed.

In addition, the longitudinal direction of the longitudinal direction and photomask 4 that show filament 2 is phase in the form shown in Fig. 3 (a) Equidirectional example, and in form shown in Fig. 3 (b), it is shown that the longitudinal direction of filament 2 and the longitudinal direction of photomask 4 are positive The example of friendship relationship.

In addition, photomask 4 can also be configured it is multiple.Such as shown in Fig. 3 (c), (d), filament 2 can also be formed with along constituting A pair of region (polarized regions 3) outer rim it is opposite to two sides form the form of photomask 4.

In addition, can also be as shown in Fig. 3 (e), along constituting the side, i.e. for being formed with region (polarized regions 3) outer rim of filament 2 Cross one another two sides form the form of photomask 4.In addition filament can also be formed with along composition as shown in Fig. 3 (f), (g) Three sides of 2 region (polarized regions 3) outer rim form the form of photomask 4.

Herein as described in the description of fig. 2, in the present invention, the outer rim 6 of photomask 4 be may also set up in compared with polarizer 10 Outer rim is more in the inner part.Such as shown in Fig. 3 (h), four sides that also may make up 4 outer rim of photomask (outer rim 6 shown in Fig. 2) are all provided with It is placed in the form more in the inner part compared with polarizer outer rim, in addition, although not shown, it is (outer shown in Fig. 2 also to may make up 4 outer rim of photomask Edge 6) four one to three in while be set to form compared with polarizer outer rim more in the inner part.

In addition, similarly, in the form shown in Fig. 3 (a)~(g), can also the outer rim of photomask 4 be set to compared with polarizer Outer rim is more in the inner part.

These situations form the form of filament 2 preferably in the region for not forming photomask 4.Reason is regardless of light orientation Not which kind of form such as holding mechanism of device can inhibit from polarizer and transmit unwanted S wave component.

As long as belong to form shown in above-mentioned Fig. 3 (a)~(d), for example, when by polarizer in multi-disc it is planar arrangement match When being placed in light orientation device, by making not forming one side of photomask 4 in each polarizer to be to each other in be configured adjacently, Photomask 4 is set not interfere with the seam portion between polarizer.

In addition, for example being filled when being arranged in upper and lower overlap condition multi-disc polarizer according to peripheral edge portion in light orientation When setting, by making not formed the peripheral edge portion of one side of photomask 4 to each other state in an overlapping, it can make photomask 4 will not Influence the seam portion between polarizer.

In addition, as shown in Fig. 3 (e)~(h), if the shape in the parallel direction of filament 2 and this two directions of vertical direction At the form for having photomask 4, then when being rotated by 90 ° polarization direction and light orientation device to be configured at, can also do not need it is whole In the case where closing other polarizers, it can be corresponded to using identical polarizer.

In addition, as shown in Fig. 3 (h), if the outer rim of photomask 4 is set to compared with polarizer outer rim more in the inner part, and from screening The outer genesis of light film 4 is also to form the form of filament 2 into the region of polarizer outer rim, then when putting down polarizer in multi-disc Planar is arranged when light orientation device, and each photomask 4 for just not having adjacent polarization element is in contact to each other and makes to hide The case where light region can expand.

In addition, also can be used in combination Fig. 1 and Fig. 3 (a)~(h) when multi-disc polarizer is configured at light orientation device The polarizer of shown various forms.

Fig. 4 is the figure for showing another example of polarizer of the present invention, and (a) is approximate vertical view, is (b) (a) to fiducial mark Remember enlarged drawing.

As shown in Fig. 4 (a), polarizer 20 is that alignment mark 7 is equipped in photomask 4 near quadrangle.

In the present invention, text, mark or alignment mark can also be formed in photomask 4.Such as by photomask 4 Text, mark etc. are formed, thus can assign the information relevant to polarizer such as model.In addition can also be used in up and down, Table back etc. is aligned towards judgement and roughly.

In addition, as described above, by the way that the process for forming filament 2 is set as same with the process for forming photomask 4 in the present invention One process can also promote the relative positional accuracy of filament 2 Yu photomask 4.So by forming alignment mark in photomask 4 7, position, the angle information of filament 2 can be obtained from alignment mark 7.

In addition, being used when installing polarizer 20 in the light orientation device to optical alignment film irradiation rectilinearly polarized light The alignment mark 7 can also make the position of filament 2, angle consistent with required position, angle easily.

In the present invention, there is no particular limitation for the form of above-mentioned alignment mark, and the various shapes such as cross, L font can be used State, but alignment mark is preferably in advance on at least one of which direction in the parallel direction or vertical direction in the direction of filament 2 Form edge.According further to purposes, there can also be the direction relative to filament 2 in 45 degree of equal angular edges.

There is no particular limitation with allocation position for the quantity of alignment mark, settable appropriate necessary quantity, needed position.

Above-mentioned text, mark or alignment mark can also be made of the material for being different from photomask 4, hidden in addition, can also be Setting is open and makes the composition of the exposing of transparent substrate 1 in light film 4.

But above-mentioned text, mark or alignment mark reveal transparent substrate 1 having the setting opening in photomask 4 When composition out, in order to inhibit extinction ratio to reduce, it is usually preferred to the form for making the exposing area of transparent substrate 1 become smaller be made.

On the other hand, in the present invention, may be made as above-mentioned text, mark or alignment mark configure a plurality of filament side by side and At composition.

Such as shown in Fig. 4 (b), alignment mark 7 can also be made to the composition for configuring a plurality of filament 8 side by side.Though in addition omitting Icon, above-mentioned text with mark be also in the same manner as can be made into the composition for configuring a plurality of filament 8 side by side.In addition the direction of a plurality of filament It is preferred that the filament direction with polarized regions is identical.

In addition, by with alignment mark 7, above-mentioned text, mark polarizer 20 according to becoming required extinction ratio Mode designs the conditions such as material, thickness, spacing, the duty ratio of filament 8, ultraviolet light can be made to have the function of shading or polarization, Even if forming alignment mark 7, above-mentioned text, mark in photomask 4, the extinction ratio for being prevented from polarizer 20 is reduced.

In the present invention, material, the thickness, spacing, duty ratio of the filament 8 of alignment mark 7, above-mentioned text or mark are constituted Deng, if can become required S wave transmissivity material i.e. can be used, wherein the material of filament 8 and thickness be preferably set to inclined The material of configured filament 2 and thickness are identical in vibration region 3, in addition, the longitudinal direction of filament 8, spacing and duty ratio, preferably set By in polarized regions 3 the longitudinal direction of configuration filament 2, spacing and duty ratio it is identical.

Even if reason is due to forming alignment mark 7, above-mentioned text, mark, but extinction ratio will not still be changed, thus right It can more freely be designed in alignment mark 7, above-mentioned text, the quantity of mark and configuration.

In addition, requiring High Extinction Ratio in polarizer of the invention in the configured filament 2 of polarized regions 3, that is, requiring P Wave transmissivity is high, S wave transmissivity is low, but is directed to the above-mentioned text of the composition formed in photomask 4, mark or alignment mark Filament 8, although requiring S wave transmissivity lower, correlation P wave transmissivity may not also require high-transmission rate.

Though that is, above-mentioned text, mark or alignment mark must avoid to optical alignment film irradiate incident light S wave component, As long as the transmissivity of related P wave component then belongs to the level that can recognize above-mentioned text, mark or alignment mark, unrequired Want high-transmission rate.

Therefore, in the present invention, for the ultraviolet light that polarizer is irradiated, the S of above-mentioned text, mark or alignment mark Wave transmittance values are preferably with value or smaller value with the S wave transmissivity in polarized regions 3.

B. the manufacturing method of polarizer

Secondly, the manufacturing method for polarizer of the present invention is illustrated.

The manufacturing method of polarizer of the invention is that have on radioparent transparent substrate to ultraviolet light equipped with a plurality of Filament and ultraviolet light is given shading photomask polarizer manufacturing method, include: prepare in above-mentioned transparent substrate On be formed with the process of laminated body made of the 1st material layer；The process of resist layer is formed in above-mentioned 1st material layer；To above-mentioned Resist layer is processed, and forms the process with the corrosion-resisting pattern of thread pattern and shading film figure；And it will be above-mentioned against corrosion Pattern is used for etching mask, and to the process that above-mentioned 1st material layer is etched processing.

In the present invention, by the way that the process for forming the process of filament 2 and forming photomask 4 is set as the same process, it can contract Short manufacturing process, and the relative positional accuracy of filament 2 Yu photomask 4 can be promoted.

In addition, by being constructed from the same material filament 2 with photomask 4, manufacturing cost also can inhibit to lower.

Fig. 5 and Fig. 6 is the outline process chart for showing manufacturing method an example of polarizer of the present invention.

Such as when manufacturing polarizer 10 using the manufacturing method of polarizer of the present invention, as shown in Fig. 5 (a), first Prepare on transparent substrate 1, laminated body made of being sequentially formed with as follows: what the material by constituting filament 2 and photomask 4 was constituted Polarizing material 31 and the layer of hard mask material 32 that hard mask effect is played when being etched processing to polarizing material 31.

In addition, layer of hard mask material 32 is comparable to above-mentioned 1st material layer in the example.

Secondly, form resist layer 33 (Fig. 5 (b)) in layer of hard mask material 32, irradiating electron beam 40 equal (Fig. 5 (c)) and Develop etc., the corrosion-resisting pattern 34 (Fig. 5 (d)) with thread pattern 34a Yu shading film figure 34b is consequently formed.

In the present invention, such as using when semiconductor lithography photoetch electron beam lithography system used in manufacture, pass through According to the same process production thread pattern 34a and shading film figure 34b and above-mentioned alignment mark etc., thus can be retouched in electron beam Draw the relative position that them are controlled under the high precision position accuracy control of device.

Then, corrosion-resisting pattern 34 is used for etching mask, processing is etched to layer of hard mask material 32, and formed and covered firmly Mould pattern 32P (Fig. 6 (e)).Such as when using chromium in the material of layer of hard mask material 32, using using chlorine and oxygen gas mixture Dry-etching, hard mask pattern 32P can be formed.

Secondly, corrosion-resisting pattern 34 and hard mask pattern 32P are used for etching mask, polarizing material 31 is etched and is added The polarized material pattern 31P (Fig. 6 (f)) with filament 2 Yu photomask 4 is consequently formed in work.Such as the material when polarizing material 31 When material is using molybdenum silicide, by using the dry-etching of SF6 gas, polarized material pattern 31P can be formed.

Again, corrosion-resisting pattern 34 (Fig. 6 (g)) is removed, then removes hard mask pattern 32P again, and obtained in transparent substrate 1 It is equipped with the polarizer 10 (Fig. 6 (h)) of a plurality of filament 2 and photomask 4.

Though in addition, omitted in Fig. 5 and example shown in fig. 6, in the present invention, can also on large-area transparent substrate 1 shape At a plurality of filament 2 and photomask 4, the outside of the polarized regions 3 configured with filament 2 is then cut off again, it is required that acquisition, which is cut, The polarizer 10 of size and form.

In addition, among the above, although being etched processing to polarizing material 31 in the state of remaining corrosion-resisting pattern 34, In the present invention, after the process of hard mask pattern 32P can also being formed shown in Fig. 6 (e), corrosion-resisting pattern 34 is removed, and only will Hard mask pattern 32P is used for etching mask, and is etched processing to polarizing material 31 and forms polarized material pattern 31P.

In addition, among the above, as obtained polarizer 10, being said for the form for eliminating hard mask pattern 32P It is bright, but the present invention optionally can also whole face or partial residual hard mask pattern 32P.

For example, the form that whole face remains hard mask pattern 32P can also be set as finally obtaining the form as shown in Fig. 6 (g) Obtain the form of polarizer.At this point, the process for removing hard mask pattern 32P can be omitted, can achieve the effect that shorten process.

In addition, among the above, though it is illustrated for the form on polarizing material 31 equipped with layer of hard mask material 32, In the present invention, in formation resist layer 33 on polarizing material 31, then it can also will resist at not set layer of hard mask material 32 Corrosion figure case 34 is etched processing for etching mask and to polarizing material 31, forms the polarization with filament 2 and photomask 4 Patterns of material 31P.

At this point, polarizing material 31 is equivalent to above-mentioned 1st material layer.

Herein, the formation institute application method of corrosion-resisting pattern 34 shown in above-mentioned Fig. 5 (c), as long as can be formed with required The method of the corrosion-resisting pattern 34 of thread pattern 34a and shading film figure 34b can be used, wherein the side of preferred irradiating electron beam Method.

Reason is that being formed using the corrosion-resisting pattern that the method for irradiating electron beam carries out, manufactured in the photomask of semiconductor Etc. having practical performance in being, such as precision spacing 60nm or more and 140nm or less range can be formed goodly in desired zone Thread pattern.In addition reason is the relative positional accuracy of thread pattern 34a Yu shading film figure 34b, also achievable pair semiconductor The sodium rice horizontal accuracy required by light fabrication mask.

In addition, preferably resist layer 33 is made of eurymeric electron sensitive resist in the present invention, and is formed and be equipped with thread pattern The process of the corrosion-resisting pattern 34 of 34a and shading film figure 34b is to anti-other than required filament and required photomask forming position Lose the process of 33 irradiating electron beam of layer.

More specifically, preferably thread pattern 34a constitutes lines and intermittent pattern, and to as above-mentioned lines and chart spacing The step of 33 irradiating electron beam of resist layer of the position of drafting department is spaced in case.

As long as reason is that the method for above-mentioned position irradiating electron beam, so that it may reduce the area of irradiating electron beam, can contract The time of short electron beam irradiation process.

It is described in more detail for above-mentioned.

For example, when the width of the filament 2 of polarizer 10 shown in FIG. 1 is the size of the spacing half of filament 2, if using In the case where minus electron sensitive resist, the thread pattern of polarizer 10 to be obtained and shading film figure, electron beam photograph is carried out The area penetrated is total area of all filaments 2 plus area obtained from 4 area of photomask.

On the other hand, if using the above method, the area of electron beam irradiation becomes all compartments for filament 2 Total area, as long as total area of that is, about all filaments 2, can cut down the time of irradiation 4 area of photomask.

C. light orientation device

Secondly, being illustrated for light orientation device of the invention.

Light orientation device of the invention is the light orientation device that ultraviolet light is polarized to and is irradiated in optical alignment film, is had There is the polarizer of aforementioned present invention, the illumination that will transmit through the polarized regions of polarizer is mapped on optical alignment film.

For light orientation device of the invention, by having polarizer of the invention, thus it can inhibit from ultraviolet Unwanted S wave component in the ultraviolet light that light lamp is irradiated transmits.So can effectively implement to assign optical alignment film Orientation restraint can promote productivity.

Fig. 7 is the composition example diagram for showing light orientation device of the present invention.

Light orientation device 50 shown in Fig. 7 has the polarizer unit 51 and ultraviolet light that polarizer of the present invention is stored Lamp 52 carries out the ultraviolet light irradiated from ultraviolet lamp 52 partially using the polarizer 10 that polarizer unit 51 is stored Vibration, then the light (polarised light 54) through polarization is irradiated in the optical alignment film 55 being formed on workpiece 56, thus to optical alignment film 55 assign orientation restraint.

Mobile mechanism is carried out in addition, having in light orientation device 50 and making to be formed with the workpiece 56 of optical alignment film 55, is led to Crossing moves workpiece 56, can carry out polarised light 54 to the whole face of optical alignment film 55 and irradiate.Such as in example shown in fig. 6, Workpiece 56 is mobile towards right in figure (arrow direction of Fig. 6).

In addition, showing workpiece 56 during Fig. 7 is exemplified and being used as rectangular-shaped plate, but in the present invention, as long as the form of workpiece 56 Polarised light 54 can be irradiated, then there is no particular limitation, such as workpiece 56 can also be film-form form, in addition can also can batch Band-like (netted) form.

In the present invention, ultraviolet lamp 52 preferably can illumination wavelength 240nm or more and 380nm ultraviolet light below lamp, separately Outer optical alignment film 55 is preferably to wavelength 240nm or more and 380nm ultraviolet light below has sensitivity.

The reason for this is that: because light orientation device 50 has the polarizer 10 with photomask 4, thus can effectively inhibit Unwanted S wave component transmits, and the photomask has high light-proofness to above-mentioned wave-length coverage ultraviolet light.Therefore, can have Effect ground, which is executed, assigns orientation restraint to the optical alignment film that above-mentioned wave-length coverage ultraviolet light has sensitivity, therefore can promote production Property.

In addition, light orientation device 50 preferably exists in order that the light from ultraviolet lamp 52 effectively can be irradiated in polarizer The back side (oncoming lane of polarizer unit 51) or side of ultraviolet lamp 52 are equipped with the reflection for being reflected ultraviolet light Mirror 53.

In addition, for can the optical alignment film 55 to large area effectively assign orientation restraint, preferably as shown in fig. 7, it is preferred that Ultraviolet lamp 52 uses bar light, is irradiated according to the polarised light 54 for becoming long irradiation area relative to 56 moving direction of workpiece (arrow direction of Fig. 7) is that the mode of orthogonal direction constitutes light orientation device 50.

At this point, polarizer unit 51 be also suitable for large area optical alignment film 55 irradiate polarised light 54 form, but because There is difficulty for the manufacture of large area polarizer, thus configure multiple polarizers in polarizer unit 51, with regard to technology Property with economic face for preferably.

In addition, light orientation device of the invention is also possible to the composition for having multiple ultraviolet lamps.

Fig. 8 is another composition example diagram for showing light orientation device of the present invention.

As shown in figure 8, light orientation device 60 has 2 ultraviolet lamps 62, and between each ultraviolet lamp 62 and workpiece 66, It is respectively equipped with the polarizer unit 61 that polarizer of the present invention is stored.In addition each ultraviolet lamp 62 is respectively equipped with reflecting mirror 63。

As a result, by having multiple ultraviolet lamps 62, compared to having the case where 1 ultraviolet lamp 62, can increase to The exposure for the polarised light 64 that formed optical alignment film 65 irradiates on workpiece 66.Therefore, compared to having 1 ultraviolet lamp 62 Situation, can increase the movement speed of workpiece 66, and result can promote productivity.

In addition, being enumerated ultraviolet in 66 moving direction of workpiece (arrow direction in Fig. 8) configuration 2 arranged side by side during Fig. 8 is exemplified The composition of light lamp 62, but the present invention is not limited merely to this, such as is also possible in the direction orthogonal with 66 moving direction of workpiece The composition of the upper multiple ultraviolet lamps of configuration, is in addition also possible at the moving direction of workpiece 66 and orthogonal to that direction etc. two Multiple ultraviolet lamps are each equipped on direction.

In addition, the composition for 1 ultraviolet lamp 62 being arranged 1 polarizer unit 61 is shown during Fig. 8 is exemplified, But the present invention is not limited merely to this, such as is also possible to multiple ultraviolet lamps be arranged the composition of 1 polarizer unit. At this point, as long as 1 polarizer unit has the size that can cover multiple ultraviolet lamp irradiation areas.

It is one example diagram of polarizer configuration in light orientation device of the present invention shown in Fig. 9.In addition, Fig. 9 (a)~(d) Shown in polarizer configuration show 10 phase of tabular polarizer against optical alignment film film surface in planar The form of arrangement.

For example, in light orientation device 50 shown in Fig. 7, when being orthogonal direction illumination bands to 56 moving direction of opposite piece It is orthogonal in 56 moving direction of workpiece (arrow direction) in polarizer unit 51 as shown in Fig. 9 (a) when shape polarised light 54 It is effective that multiple polarizers 10 are configured on direction.Reason be the quantity of polarizer 10 can be suppressed to it is less.

On the other hand, when the area of polarizer 10 is smaller or when light orientation device has multiple ultraviolet lamps, such as scheme Shown in 9 (b), preferably in addition to the orthogonal direction of workpiece moving direction (arrow direction), in the side along moving direction (arrow direction) Multiple polarizers 10 are also configured upwards.Reason is that optical alignment film, energy economically can be irradiated in the light from ultraviolet lamp Promote productivity.

Herein, in the present invention, as shown in Fig. 9 (c) and Fig. 9 (d), the polarizer of multiple configurations is preferably according to along workpiece Moving direction (arrow direction) is non-in such a way that a row is neat, makes the position of adjacent polarization element in the orthogonal of workpiece moving direction Misplace configuration on direction (up and down direction in figure).

More specifically, it on the orthogonal direction of optical alignment film moving direction, clamps between adjacent multiple polarizers The photomask of boundary portion preferably configures multiple polarization members in the way of in the non-linear property connection of optical alignment film moving direction Part.

Reason is that in 4 forming regions of photomask, because polarised light will not be generated, thus it is right to can inhibit the photomask 4 Adverse effect caused by optical alignment film.

Herein, configuration shown in Fig. 9 (c) are as follows: the multiple polarizers configured all have same shape, identical ruler It is very little, and in the lateral direction the up and down direction position of adjacent polarization element with 1/2 size of polarizer up and down direction size The ladder-like configuration to misplace in above-below direction.

In addition, configuration shown in Fig. 9 (d) are as follows: it configures multiple polarizers and all has same shape, identical size, The up and down direction position of adjacent polarization element is in the lateral direction with the ladder-like of 1/2 less than polarizer up and down direction size The configuration to misplace in above-below direction.

It is described in more detail for above-mentioned.

In configuration shown in Fig. 9 (c), the polarizer 10 (10p) and polarization member of adjacent configuration in the up-down direction The boundary portion 71 of part 10 (10q) is to utilize the polarizer 10 (10r) and polarizer 10 (10s) configured in the lateral direction And it prevents to extend to left and right direction.

That is, clamping the boundary between the polarizer of adjacent configuration in the up-down direction in configuration shown in Fig. 9 (c) The photomask in portion is prevented from linearity connection in the lateral direction.

Therefore, it can inhibit when irradiating polarised light to optical alignment film because of above-mentioned shading using configuration shown in Fig. 9 (c) Adverse effect caused by film continuously involves optical alignment film.

Even if likewise, clamping adjacent configuration polarizer in the up-down direction in the configuration shown in Fig. 9 (d) Between boundary portion photomask, be prevented from the lateral direction linearity connection.

Therefore, it can inhibit when irradiating polarised light to optical alignment film because of above-mentioned shading using configuration shown in Fig. 9 (d) Adverse effect caused by film continuously involves optical alignment film.

In addition, in configuration shown in Fig. 9 (c), due to the ladder-like of 1/2 size of polarizer up and down direction size It misplaces along the vertical direction, thus relative to left and right directions (workpiece moving direction), every 2 polarizers are above and below boundary portion 71 Direction position is in aligned condition.

On the other hand, in configuration shown in Fig. 9 (d), due to being less than 1/2 ladder of polarizer up and down direction size Shape misplaces along the vertical direction, thus the up and down direction position of boundary portion 72 becomes increasingly difficult to be aligned.

So the adverse effect caused by configuration shown in Fig. 9 (d) can more inhibit because of above-mentioned photomask continuously involves Optical alignment film.

In addition, each polarizer is configured according to the side state of adjoining each other during Fig. 9 (a)~(d) is exemplified, but The present invention is not limited merely to the form, can also have the form in gap for the boundary portion of adjacent polarization interelement.

In addition, can also be overlapped by the end of adjacent polarization element, thus make boundary portion between polarizer not The form in gap can be generated.

Figure 10 is another example diagram of polarizer configuration for showing light orientation device of the present invention.

In the present invention, configuration shown in Fig. 9 (a) also may replace, be changed to using such as polarizer 10c shown in Fig. 3 (c) With polarizer 10f shown in Fig. 3 (c), as shown in Figure 10 (a), in each polarizer according to one side of not formed photomask that State configures peripheral edge portion around here in an overlapping.

If it is such configuration, because there is no photomasks between each polarizer of up and down direction in figure, and Be not in gap between each polarizer, thus from the top in figure configure in order downward polarizer 10f, 10c, 10f this 3 Piece polarizer, it is possible thereby to play a role as when the polarizer in the up and down direction in figure with 1 length of a film.

Also, each polarizer can be made to be configured at light orientation device in the method for clamping a part of respective photomask.Cause This, can be fixed on light orientation device for each polarizer, no when that will not clamp filament institute forming region (polarized regions) It causes the unfavorable condition for occurring to cause filament breakage from clamped partial linkage and is generated from damaged filament part different The unfavorable condition of object.

In addition, in Figure 10 (a), though it instantiates to avoid many and diverse and configures in order polarizer 10f, 10c, 10f this 3 partially The form of vibration element, but 2 or more polarizer 10c can also be used in above-mentioned form, in more in the up and down direction in figure Long mode configures.

In addition, polarizer 10e shown in polarizer 10a shown in Fig. 3 (a) and Fig. 3 (e) similarly can also be used, such as Shown in Figure 10 (b), according to one side peripheral edge portion to each other of not formed photomask in each polarizer, state is configured in an overlapping. It plays a role like that also like when having 1 polarizer at this time.

In addition, each polarizer can also be made to be configured at light orientation in the method for clamping a part of respective photomask at this time Device.Therefore, each polarizer can be fixed on light orientation when filament institute forming region (polarized regions) will not be clamped The unfavorable condition for causing filament breakage from clamped partial linkage will not occur for device and from damaged thin thread part Divide the unfavorable condition for generating foreign matter.

In addition, even if being also possible to the polarizer that the upper and lower in figure is used up 2 or more in Figure 10 (b) 10a is formed in the configuration in the up and down direction in figure in longer mode.

D. polarizer

Secondly, being illustrated for polarizer of the invention.

Polarizer of the invention is characterized in that, is the polarization direction that shelter incident uv is parallel to filament Light, and make the light transmissive polarizer of the polarization direction perpendicular to above-mentioned filament, it is radioparent having to above-mentioned ultraviolet light On substrate, a plurality of above-mentioned filament is configured side by side, and in the region, that is, fine line region outside for configuring above-mentioned filament, being equipped with will be above-mentioned Ultraviolet light gives the photomask of shading, and it is parallel or perpendicular to above-mentioned filament that the edge of above-mentioned photomask inner edge side, which forms direction, Longitudinal direction.

As such polarizer of the invention, the polarizer shown in FIG. 1 having been described above may be, for example,.

It is polarized regions 3 and 2 configuring areas of filament i.e. fine line region is identical situation in addition, shown in fig. 1.

In addition, shown in fig. 1 is that above-mentioned photomask 4 is formed in 2 configuring areas of the above-mentioned filament i.e. outside of fine line region, And the edge of above-mentioned 4 inner edge side of photomask is the longitudinal direction parallel or perpendicular to above-mentioned filament.

According to the present invention, it is formed in the outside of above-mentioned fine line region by above-mentioned photomask, is configured at when by polarizer When light orientation device, the region for being formed with photomask can be clamped.That is, can will not clamp in polarizer configured with filament Region, that is, fine line region, and polarizer is fixed on light orientation device, cause so can eliminate from clamped partial linkage The unfavorable condition of filament breakage and the unfavorable condition of foreign matter is generated from damaged filament part.

In addition, as noted previously, as region, that is, fine line region periphery configured with filament is formed with photomask, thus In polarizer, the lateral area from fine line region can inhibit, transmit incident light, especially transmit the S wave component of incident light, it can The unfavorable condition for inhibiting extinction ratio to be greatly reduced.

In addition, reason is that being the long side side parallel or perpendicular to above-mentioned filament by the edge of above-mentioned photomask inner edge side To, the interval between above-mentioned fine line region and photomask can be reduced easily, can get High Extinction Ratio.

Polarizer of the invention has substrate, fine line region and photomask.

1. substrate

Substrate of the invention has transmittance to above-mentioned ultraviolet light.

In the present invention, it is so-called " to ultraviolet light have transmittance ", in particular to can make wavelength 240nm or more and 380nm with Under light transmission.

The material and thickness for constituting such substrate can be set as and institute in " 1. transparent substrate " item of above-mentioned " A. polarizer " Contents are identical.

2. fine line region

Fine line region of the invention is equipped with the region of filament.

Above-mentioned fine line region more specifically refers to the region for being arranged in parallel with a plurality of filament.

In addition, above-mentioned fine line region is the light for the polarization direction that masking is parallel to filament, and make perpendicular to above-mentioned filament The light transmission of polarization direction generates the main region of rectilinearly polarized light.

Filament of the invention is that a plurality of state is arranged in parallel on aforesaid substrate.

About material, thickness, item number and length, spacing, duty ratio and the width for constituting such filament, can be set as It is identical as described content in " 2. filament " item of above-mentioned " A. polarizer ".

When forming photomask on the outside of the filament longitudinal direction in above-mentioned fine line region, it is preferably formed as the long side side of the filament To end and photomask in connect in the form of.

When forming photomask on the outside of the filament orientation in above-mentioned fine line region, preferably in the orientation of filament It is in same size that the filament of end and the interval of photomask, which are with the interval of filament to each other,.

More specifically, Fig. 1 (a), in (b), the left side edge of the filament 2 of the right end in figure, with 4 inner edge of photomask Interval P between the edge of side₂, interval P preferably with filament 2 to each other₁For same size.Similarly in Fig. 1 (a), (b), figure In left distal end filament 24 inner edge side of right side edge and photomask edge between interval, preferably to each other with filament 2 Interval P₁For same size.

In addition, the end about the longitudinal direction by above-mentioned filament with photomask in the form of being connected and end it is thin Interval between line and photomask is the interval of filament to each other effect obtained etc., due to being and above-mentioned " A. polarizer " Described content is same in " 3. polarized regions " item, so in this description will be omitted.

3. photomask

Photomask of the invention is that above-mentioned ultraviolet light is given shading.

Above-mentioned photomask is formed at the region configured with the above-mentioned filament i.e. outside of fine line region.

In addition in above-mentioned photomask, the formation direction at the edge of above-mentioned photomask inner edge side is in parallel or perpendicular to above-mentioned thin The longitudinal direction of line.

As long as the plane configuration of above-mentioned photomask is formed at the region configured with the above-mentioned filament i.e. outside of fine line region ?.

Such plane configuration can specifically be set as described content phase in " 4. photomask " item with above-mentioned " A. polarizer " Together.

In the present invention, as shown in Fig. 3 (h), can also be photomask outer rim be set to compared with polarizer outer rim more in the inner part, from The region of photomask outer genesis to polarizer outer rim is also formed with the form of filament, i.e., is formed and matched in the outside of above-mentioned photomask It is equipped with the form of the 2nd fine line region in the region of above-mentioned filament.It is thin by sequentially forming above-mentioned fine line region, photomask and the 2nd Polarizer multi-disc can be arranged when light orientation device in planar, can inhibit as adjacent polarization by line region Each photomask of element is in contact to each other leads to the widened situation of lightproof area.

In addition, the longitudinal direction of filament contained in above-mentioned 2nd fine line region be usually with it is thin contained by above-mentioned fine line region The longitudinal direction of line is in the same direction.

In addition, also can be used in combination photomask plane configuration not when multi-disc polarizer is configured at light orientation device The polarizer of same various forms.

As long as the edge of above-mentioned photomask inner edge side forms direction parallel or perpendicular to the longitudinal direction of above-mentioned filament ?.

Herein, it is the longitudinal direction parallel or perpendicular to above-mentioned filament that the edge of so-called photomask inner edge side, which forms direction, As long as the longitudinal direction that the edge of above-mentioned inner edge side forms direction and above-mentioned filament is in parallel direction or vertical direction, when In the case that photomask has multiple inner edge side edges, then containing the longitudinal direction with filament in parallel direction and Vertical Square To the situation of both.

Earlier figures 1 and Fig. 3 (e), (f), (g) and (h) are to illustrate the edge of photomask inner edge side to form direction, contain The case where with above-mentioned filament longitudinal direction in both parallel direction and vertical direction.

Fig. 3 (a) and (c) shown in be photomask edge formed direction, only with the longitudinal direction of above-mentioned filament be in parallel side To the case where.

Fig. 3 (b) and (d) shown in be photomask edge formed direction, only with the perpendicular side of the longitudinal direction of above-mentioned filament To the case where.

When forming 2 fine line region on the outside of above-mentioned photomask, the edge of above-mentioned photomask outer edge side forms direction, excellent Choosing is in parallel or vertical direction with the longitudinal direction of filament contained by above-mentioned 2nd fine line region.Reason is to can get higher delustring Than.

Text, mark or alignment mark can also be formed in above-mentioned photomask.Such as by photomask formed text, Mark etc. can assign the information of the correlated polarizations element such as model.In addition it can also be used in up and down, the directions such as table back are sentenced Disconnected and rough contraposition.

About such text, mark or alignment mark, can specifically be set as and " 4. photomask " of above-mentioned " A. polarizer " Described content is same in.

Above-mentioned photomask can be set as " 4. screenings with above-mentioned " A. polarizer " to the light-proofness and constituent material of ultraviolet light Described content is same in light film " item.

4. polarizer

Polarizer of the invention has substrate, fine line region and photomask, but optionally can also have other compositions.

E. light orientation device

Secondly, being illustrated for light orientation device of the invention.

Light orientation device of the invention is characterized in that having multiple polarizers, and above-mentioned polarizer is with more Bar filament is in configuration side by side and is formed in the photomask in the region configured with the above-mentioned filament i.e. outside of fine line region, and multiple Do not contain above-mentioned photomask between the respective above-mentioned fine line region of above-mentioned polarizer that above-mentioned polarizer is configured according to adjoining Mode configure.

As such light orientation device of the invention, Fig. 7 and device shown in Fig. 8 of preceding description may be, for example,.

In addition, configured as multiple above-mentioned polarizers, i.e., according to the above-mentioned polarizer of adjacent configuration it is respective on State between fine line region that the mode containing above-mentioned photomask does not configure, concretely Figure 10 (a) of preceding description and (b) shown in match It sets.

According to the present invention, respective above-mentioned thin according to the above-mentioned polarizer of adjacent configuration by multiple above-mentioned polarizers It is not configured containing the mode of above-mentioned photomask during line is interregional, thus because there is no photomask between each polarizer, Effect when can play as having 1 polarizer.

In addition, each polarizer can be configured at light orientation device with the method for a part for clamping each photomask.So Each polarizer can be fixed on light orientation device when the i.e. fine line region in region for being formed with filament will not be clamped, by This will not occur to produce from clamped partial linkage initiation filament by damaged unfavorable condition and from damaged filament part The unfavorable condition of raw foreign matter.

The present invention is at least provided with polarizer.

Hereinafter, each composition for polarizer of the present invention is described in detail.

1. polarizer

Polarizer of the invention, which has, to be configured a plurality of filament side by side and is formed in the region i.e. filament for configuring above-mentioned filament The photomask in the outside in region.

About such polarizer, because can for example be set as same as content documented by above-mentioned " D. polarizer " item, So in this description will be omitted.

2. the configuration of polarizer

The configuration of polarizer of the present invention be multiple above-mentioned polarizers adjacent configuration above-mentioned polarizer respectively Above-mentioned fine line region between do not contain above-mentioned photomask configuration.

The configuration of such polarizer can be set as the polarizer of for example adjacent configuration, according to the non-shape of respective polarizer One side at photomask is in adjacent state configuration to each other.

More specifically, can be set as preceding description Figure 10 (a) and (b) shown in configure.

The configuration of above-mentioned polarizer can be shape of the adjacent polarizer according to side in the state configuration to contact with each other State is also possible to the form that the boundary portion between adjacent polarizer has gap.

The configuration of above-mentioned polarizer can also be overlapped by the end of adjacent polarizer, and is formed between polarizer Boundary portion do not occur the form in gap.

Configuration about above-mentioned polarizer is the polarizer according to adjacent configuration in the not formed shading of each polarizer One side of film is in adjacent state configuration to each other, and then is in overlapped configuration by the end of adjacent polarizer, i.e., respectively The peripheral edge portion of one side of not formed photomask to each other configures in an overlapping in polarizer, such as can be set as and above-mentioned " C. light Described content is same in aligning device " item.

Configuration about above-mentioned polarizer relative to workpiece moving direction can be set as and above-mentioned " C. light orientation device " item Middle described content is same.

In the present invention, when will according between the respective above-mentioned fine line region of above-mentioned polarizer of adjacent configuration containing above-mentioned Multiple above-mentioned polarizers that the mode of photomask configures are considered as 1 polarizer (below also referred to as " in conjunction with polarizer ") The case where when, can also be configured multiple above-mentioned combination polarizers and use.

About the configuration of such combination polarizer, can be set as with above-mentioned " C. light orientation device " item in documented by The configuration of multiple polarizers is same.

3. light orientation device

Light orientation device of the invention has multiple polarizers, but can also optionally have other compositions.

It, can also be for the polarizer unit, ultraviolet for for example being stored polarizer as other such compositions The mobile mechanism etc. of light lamp, reflecting mirror, workpiece.

Other above-mentioned compositions can be set as same as described content in above-mentioned " C. light orientation device " item.

F. the assemble method of polarizer

It is illustrated below for the assemble method of polarizer of the present invention.

The assemble method of polarizer of the present invention is characterized in that, is that multiple polarizers are assembled in light orientation device Method, wherein above-mentioned polarizer has a plurality of filament i.e. thin in configuring side by side and being formed in the region configured with above-mentioned filament The photomask in the outside in line region comprising have: by being formed by alignment mark on above-mentioned photomask, above-mentioned polarization is executed The contraposition of element, while adjusting the contraposition process of the polarization direction of multiple above-mentioned polarizers.

According to the present invention, by using the alignment mark formed on photomask, the position of filament can be obtained in high precision It, can be consistent with desired position with angle easily with angle information.

More specifically, by forming the process of filament, being set as the same process, Bian Keti with the process for forming photomask Rise the relative positional accuracy of filament and photomask.So by forming alignment mark on photomask, it can be from alignment mark essence Degree obtains position and the angle information of filament well.Thus situation, by using alignment mark is formed by photomask, just The court of the longitudinal direction of the filament in the fine line region of the polarization direction of contraposition and decision polarizer can precisely be executed To confirmation.

The assemble method of polarizer of the present invention, which includes at least, contraposition process.

Hereinafter, being described in detail for every process of the assemble method of polarizer of the present invention.

1. aligning process

Contraposition process of the invention is to execute above-mentioned polarizer using the formed alignment mark on above-mentioned photomask Contraposition, and the process for adjusting the polarization direction of multiple above-mentioned polarizers.

In addition, alignment mark that this process is formed by using polarizer and on photomask because can be set as with Described content is same in above-mentioned " A. polarizer " item, therefore details are not described herein.

The method for executing the contraposition of polarizer as this process and adjusting the polarization direction of multiple above-mentioned polarizers, As long as the method for stating formed alignment mark on photomask in use, then there is no particular limitation, can take using alignment The general alignment method etc. of label.

The above method can be formed multiple polarizers and above-mentioned alignment for example in light orientation device on allocation position Corresponding configuration side alignment mark is marked, then is in vertical view according to configuration side alignment mark by the alignment mark of polarizer The method etc. that the mode of overlapping is configured.

2. the assemble method of polarizer

The assemble method of polarizer of the present invention be include above-mentioned contraposition process, but optionally may also comprise other works Sequence.

More than, though for polarizer of the invention, the manufacturing method of polarizer, light orientation device and polarizer Assemble method illustrates respective implementation form respectively, but the present invention is not limited merely to above-mentioned implementation form.Above-mentioned implementation form Illustration is only terminated in, has substantially identical composition with technical idea recorded in scope of the present invention patent such as, and up to equally Function and effect person is covered by technical scope of the invention.

[embodiment]

Embodiment illustrated below carries out more specific property explanation for the present invention.

[embodiment 1]

Firstly, manufacturing following test substrates, and the refractive index (n) under each wavelength and attenuation coefficient (k) are measured, calculates rule Determine optical density when film thickness.

(photomask is formed)

The synthetic quartz glass for preparing thickness 6.35mm on transparent substrate, using molybdenum and silicon mixing target (Mo:Si=1: 2mol%), in an argon atmosphere, the molybdenum silicide film of film thickness 60nm is formed using reactive sputtering method, and test substrate is just made.

In addition, above-mentioned film thickness is measured using VEECO corporation AFM device DIMENSION-X3D.

(measurement of refractive index and attenuation coefficient)

It is measured using transmission-type elliptically polarized light instrument (Woollam corporation VUV-VASE) to wavelength for test substrate The refractive index (n) and attenuation coefficient (k) of 190nm~380nm ultraviolet light.The results are shown in Table 1.

[table 1]

Wavelength [nm]	n	k
			190	1.141	2.726
200	1.323	2.876
			220	1.723	3.094
240	2.114	3.211
			260	2.479	3.274
280	2.835	3.287
			300	3.170	3.241
320	3.463	3.145
			340	3.705	3.020
360	3.901	2.885
			380	4.058	2.748

(optical density)

According to refractive index (n) shown in table 1 and attenuation coefficient (k), calculate above-mentioned molybdenum silicide film film thickness be 60nm and Optical density (OD) when 100nm.The results are shown in Table 2.

[table 2]

Wavelength [nm]	Dense 60nm	Film thickness 100nm
			190	4.71	> 7.00
200	4.77	> 7.00
			220	4.76	> 7.00
240	4.61	> 7.00
			260	4.41	7.00
280	4.18	6.70
			300	3.91	6.30
320	3.62	5.77
			340	3.34	5.28
360	3.07	4.82
			380	2.83	4.40

(evaluation of embodiment 1)

As shown in table 2, as long as the photomask of polarizer of the present invention confirms the silication for reaching 60nm or more with film thickness Molybdenum film, the then light-proofness to the ultraviolet light of 190nm or more and 380nm or less wavelength, with optical density up to 2.8 or more.

In addition, confirm when photomask is to be made of film thickness up to the molybdenum silicide film of 100nm or more, just to 190nm with Upper and 380nm or less wavelength ultraviolet light, the light-proofness with optical density up to 4.4 or more.

[embodiment 2]

Secondly, manufacturing following polarizers, and the P wave transmissivity under each wavelength and S wave transmissivity are measured, and calculate and disappear Light ratio.

(manufacture of polarizer)

As transparent substrate, prepares the synthetic quartz glass of planar dimension 152mm × 152mm, thickness 6.35mm, use molybdenum The silicon of film thickness 100nm is formed using reactive sputtering method under ar gas environment with silicon mixing target (Mo:Si=1:2mol%) Change molybdenum film.

Then, using chromium target, under ar gas environment, using reactive sputtering method, film is formed on Yu Shangshu molybdenum silicide film The chromium film of thick 5nm.

Then, on above-mentioned chromium film, it is coated with the electron sensitive resist (Japanese ZEON corporation ZEP520) of eurymeric, carries out electricity Beamlet is described, and forms the corrosion-resisting pattern with thread pattern and shading film figure.

Herein, above-mentioned thread pattern is the lines and intermittent pattern of spacing 100nm, above-mentioned lines and intermittent pattern entirety Planar dimension is 90mm × 100mm.In other words, the polarized regions planar dimension of polarizer becomes 90mm × 100mm.In addition, The length of the longitudinal direction of filament is 90mm, becomes the form that filament is connected with photomask.

In addition, the outer rim of the inner edge of above-mentioned shading film figure and above-mentioned polarized regions is in consistent, and outer rim become 152mm × 152mm size.

In addition, the inner edge of shading film figure is according to the direction relative to the lines and intermittent pattern for constituting thread pattern, tool Have and formed in a manner of both parallel edge and vertical edge, and the intermittent pattern of above-mentioned lines and intermittent pattern according to Relative to the direction of lines and intermittent pattern, become the side of clean width at the photomask inner edge (edge) for reaching parallel Formula is formed.

Then, above-mentioned corrosion-resisting pattern is used for etching mask, first by using the dry-etching of chlorine and oxygen gas mixture, Processing is etched to chromium film and forms chromium film figure, then again to the molybdenum silicide film exposed from above-mentioned chromium film figure, is passed through Use SF₆The dry-etching of gas is processed, and above-mentioned corrosion-resisting pattern and chromium film figure are then removed, and is just obtained configured with thin The polarized regions periphery of line is formed with the polarizer of the embodiment 2 of photomask.

Filament width, thickness and the spacing of the polarizer of the embodiment 2 are used Vistec corporation SEM measurement dress Set LWM9000, be measured with VEECO corporation AFM device DIMENSION-X3D, as a result respectively 36nm, 100nm and 100nm。

(construction of filament is evaluated)

For the filament and photomask of the polarizer of embodiment 2, using transmission-type elliptically polarized light instrument, (Woollam is public Take charge of VUV-VASE processed) evaluation that is constructed.

As a result, confirm above-mentioned filament include width and thickness be respectively 31.8nm and 95.8nm molybdenum silicide film, with The upper surface of above-mentioned molybdenum silicide film film thickness and side film thickness are respectively the oxidation film of 4.2nm and 4.2nm being made of silica.

It is included above the molybdenum silicide film and above-mentioned molybdenum silicide film of thickness 95.8nm in addition, confirming above-mentioned photomask The oxidation film of film thickness 4.2nm being made of silica.

(measurement of P wave transmissivity and S wave transmissivity)

For the polarizer of embodiment 2, using transmission-type elliptically polarized light instrument (Woollam corporation VUV-VASE), Measure wavelength 200nm~400nm within the scope of ultraviolet light P wave transmissivity (project light in P wave component/incident light in P wave at Point) and S wave transmissivity (projecting the S wave component in S wave component/incident light in light), and calculate extinction ratio (P wave transmission Rate/S wave transmissivity).As a result as shown in table 3 and Figure 11.

As shown in table 3 and Figure 11, within the scope of wavelength 240nm~400nm, the P wave transmissivity of the polarizer of embodiment 2 Up to 64.3% or more, extinction ratio is up to 55.1 or more.

In addition, within the scope of wavelength 240nm~260nm, the P wave transmissivity of the polarizer of embodiment 2 up to 64.3% with On, extinction ratio is up to 55.1 or more.In addition within the scope of wavelength 355nm~375nm, the P wave transmissivity of the polarizer of embodiment 2 Up to 77.1% or more, extinction ratio is up to 277.9 or more.

[table 3]

(evaluation of embodiment 2)

As shown in table 3 and Figure 11, the polarizer of embodiment 2 P wave transmissivity with higher, and extinction ratio is excellent.

If in addition, by above-described embodiment 1 as a result, confirm with film thickness reach 60nm or more molybdenum silicide film, it is right The ultraviolet light of 190nm or more and 380nm or less wavelength, the just light-proofness with optical density up to 2.8 or more, because embodiment 2 The photomask of polarizer have at least with a thickness of the molybdenum silicide film of 95.8nm, thus also can be evaluated for light-proofness it is sufficiently high.

[symbol description]

1 transparent substrate

2 filaments

3 polarized regions

4 photomasks

5 inner edges

6 outer rims

7 alignment marks

8 filaments

10,20 polarizer

31 polarizing materials

31P polarized material pattern

32 layer of hard mask material

32P hard mask pattern

33 resist layers

34 corrosion-resisting patterns

34a thread pattern

34b shading film figure

50,60 light orientation device

51,61 polarizer unit

52,62 ultraviolet lamp

53,63 reflecting mirror

54,64 polarised light

55,65 optical alignment film

56,66 workpiece

71,72 boundary portion

110,120 polarizer

112,122 filament

121 glass substrates

Claims (14)

1. a kind of polarizer, which is characterized in that be a plurality of with being configured side by side on radioparent transparent substrate to ultraviolet light Polarizer made of filament,

In the outside of the polarized regions configured with the filament, it is formed with the photomask that the ultraviolet light is given to shading,

The filament and the photomask are made of the material containing molybdenum silicide,

The formation direction at the edge of the photomask inner edge side is parallel or vertical with the longitudinal direction of the filament.

2. polarizer according to claim 1, which is characterized in that be formed with the screening in the periphery of the polarized regions Light film.

3. polarizer according to claim 1 or 2, which is characterized in that be formed with text, mark on the photomask Or alignment mark.

4. polarizer according to claim 3, which is characterized in that the text, the mark or the alignment mark With configuring composition made of a plurality of filament side by side.

5. polarizer according to claim 4, which is characterized in that the text, the mark or the alignment mark In the S wave transmissivity to the ultraviolet light value, be identical to the S wave transmissivity of the ultraviolet light with the polarized regions Value or be less than in the polarized regions to the value of the S wave transmissivity of the ultraviolet light.

6. polarizer according to claim 1, which is characterized in that the filament is connect with the photomask.

7. a kind of manufacturing method of polarizer, which is characterized in that be to ultraviolet light have radioparent transparent substrate on have There is a plurality of filament and the ultraviolet light is given to the manufacturing method of the polarizer of the photomask of shading, which includes:

Prepare the process that laminated body made of the 1st material layer is formed on the transparent substrate；

The process of resist layer is formed in the 1st material layer；

The process that the resist layer is processed and forms the corrosion-resisting pattern with thread pattern Yu shading film figure；And

The corrosion-resisting pattern is used in etching mask, to the process that the 1st material layer is etched processing,

The filament and the photomask are made of the material containing molybdenum silicide,

The photomask is formed with along a side for constituting the polarized regions outer rim.

8. the manufacturing method of polarizer according to claim 7, which is characterized in that the resist layer is by eurymeric electron beam Resist is constituted,

It includes to described thin as constituting that being formed, which has the process of the corrosion-resisting pattern of the thread pattern and the shading film figure, The step of resist layer irradiating electron beam of the position in the intermittent pattern portion in the lines and intermittent pattern of line pattern.

9. a kind of light orientation device, which is characterized in that be that ultraviolet light is carried out polarization and is irradiated in the light orientation of optical alignment film Device has polarizer of any of claims 1 or 2,

The illumination for transmiting the polarized regions of the polarizer is mapped to the optical alignment film.

10. light orientation device according to claim 9, which is characterized in that have the machine for keeping the optical alignment film mobile Structure；

On the moving direction of the optical alignment film and the two directions of the direction orthogonal with the moving direction of the optical alignment film Equipped with multiple polarizers；

Boundary portion on the direction orthogonal with the moving direction of the optical alignment film between adjacent the multiple polarizer with With the moving direction of the optical alignment film will not the mode that connect of continuity configure multiple polarizers.

11. a kind of polarizer, which is characterized in that be to give the light of the polarization direction for being parallel to filament of incident ultraviolet light With masking, and make the light transmissive polarizer of the polarization direction perpendicular to the filament,

The a plurality of filament is configured side by side on radioparent substrate having to the ultraviolet light；

The photomask that the ultraviolet light is given to shading is equipped in the region that the filament the is configured i.e. outside of fine line region；

And the formation direction at the edge of the photomask inner edge side is parallel or vertical with the longitudinal direction of the filament,

The filament and the photomask are made of the material containing molybdenum silicide,

The photomask is formed with along a side for constituting the polarized regions outer rim.

12. polarizer according to claim 11, which is characterized in that be formed with described match on the outside of the photomask It is equipped with region i.e. the 2nd fine line region of filament.

13. a kind of light orientation device, which is characterized in that it is the light orientation device for having multiple polarizers,

The polarizer, which has, to be configured a plurality of filament side by side and is formed in outside the region i.e. fine line region configured with filament The photomask of side；

Multiple polarizers do not contain the screening between the respective fine line region with the polarizer of adjacent configuration The mode of light film configures.

14. a kind of assemble method of polarizer, which is characterized in that multiple polarizers are assembled in the polarization of light orientation device The assemble method of element,

The polarizer, which has, to be configured a plurality of filament side by side and is formed in the i.e. fine line region in region configured with filament The photomask in outside；

The described method includes: implementing the contraposition of the polarizer, simultaneously using alignment mark is formed by the photomask Adjust the contraposition process of the polarization direction of multiple polarizers.