CN105874365A - Polarizer, polarizer manufacturing method, optical alignment device and mounting method of polarizer - Google Patents

Polarizer, polarizer manufacturing method, optical alignment device and mounting method of polarizer Download PDF

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Publication number
CN105874365A
CN105874365A CN201580003710.2A CN201580003710A CN105874365A CN 105874365 A CN105874365 A CN 105874365A CN 201580003710 A CN201580003710 A CN 201580003710A CN 105874365 A CN105874365 A CN 105874365A
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Prior art keywords
polarizer
photomask
fine rule
mentioned
light
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CN105874365B (en
Inventor
稻月友
稻月友一
登山伸人
大川泰央
柴田晶彦
笹本和雄
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133548—Wire-grid polarisers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)

Abstract

The main purpose of the present invention is to provide a polarizer which has an excellent extinction ratio and which eliminates the problems that, when a polarizer comprising multiple fine wires arranged in parallel is arranged in an optical alignment device, the fine wires are damaged in a chain reaction and foreign matter is generated from the damaged portion of the fine wires. This polarizer comprises multiple fine wires arranged in parallel on a transparent substrate that is transparent to ultraviolet light, and outside of the polarizing region where the fine wires are arranged, a light-blocking film is formed that blocks the ultraviolet light.

Description

Polarizer, the manufacture method of polarizer, light aligning device and the group of polarizer Dress method
Technical field
The present invention relates to extinction ratio excellent polarizer, its manufacture method and possess and have the light of this polarizer to be orientated Device.
Background technology
It is oppositely disposed with colored filter that liquid crystal indicator typically has the opposite substrate that will be formed with driving element And seal around, and gap is filled with the structure of liquid crystal material betwixt.Further, liquid crystal material has refractive anisotrop, Owing to along the mode that liquid crystal material is applied voltage direction being the difference of state of neat state and no applied voltage, switching Off/on just can show pixel.This is in the substrate of clamping liquid crystal material, is provided with the alignment films for making liquid crystal material be orientated.
Even if it addition, the phase retardation film used as liquid crystal indicator or 3D show with the material of phase retardation film also Use alignment films.
It is known as alignment films, such as, uses the macromolecular material with polyimides as representative, utilize cloth etc. by enforcement Friction treatment that this macromolecular material is rubbed and become the alignment films with orientation restraint.
But, in such alignment films being endowed orientation restraint by friction treatment, have cloth etc. as foreign body The problem of remaining.
In contrast, manifest by irradiating rectilinearly polarized light in the orientation alignment films of restraint, i.e. optical alignment film, because Just orientation restraint can be given, because of without there being cloth in the case of not implementing to utilize as discussed above the friction treatment that cloth etc. is carried out Occur etc. the unfavorable condition becoming foreign body remaining, so in recent years getting most of the attention.
As the linear polarization light illuminating method for this kind of optical alignment film being given orientation restraint, typically take via The method that polarizer is exposed.As polarizer, use the element of a plurality of fine rule with configured in parallel, as composition The materials'use aluminum of fine rule, titanium oxide (such as patent documentation 1).
Further, as the method for a plurality of fine rule forming configured in parallel, used two-beam interference exposure method (two-in the past Beam interference exposure method) (such as patent documentation 2,3).
This two-beam interference exposure method is the periodicity light that will produce when making phase place overlapping with 2 laser that optical length is added Intensity distributions (interference figure), the technology of the resist being needed on substrate.
Such as, the metal levels such as aluminum will be formed on the glass substrate, and thereon the resist layer formed will be implemented dual-beam Interfere exposure, development, be used for etching mask by the periodicity corrosion-resisting pattern so obtained, metal level is etched, afterwards, logical Cross removing corrosion-resisting pattern, thus can form the fine rule of the multiple configured in parallel being made up of metals such as aluminum on the glass substrate.
Then, by glass substrate being cut into as the form required for polarizer, such that it is able to obtain that there is aluminum Polarizer in the fine rule that metal is constituted.
Prior art literature]
[patent documentation]
Patent documentation 1: No. 4968165 publications of Japanese Patent No.
Patent documentation 2: Japanese Unexamined Patent Publication 2013-145863 publication
Patent documentation 3: Japanese Unexamined Patent Publication 2007-178763 publication
Summary of the invention
(problem that invention is wanted to solve)
The most conventional polarizer, because cutting according to every fine rule from the large-area glass substrate forming fine rule Disconnected, and cut the polarizer of required size and form, thus shown in obtained polarizer such as Figure 12 (a), fine rule 112 extends Outer rim (i.e. cutting off end) to polarizer 110.
Therefore, when polarizer 110 is configured at light aligning device, if polarizer 110 can be fixed and clamps shape Become and have the region of this fine rule 112, then have the partial linkage from clamping cause fine rule 112 breakage unfavorable condition or from Damaged fine rule part produces the unfavorable condition of foreign body.
On the other hand, in order to avoid clamping is configured with the part of fine rule, and consider to utilize someway, fine rule will be configured with Region be defined in the region of the area inside cut as polarizer, and clamp and be configured without the region of fine rule and i.e. expose glass The region of glass substrate and fixing polarizer.
But, shown in this situation such as Figure 12 (b), polarizer 120 is configured with the LHA in the region of fine rule 122 Territory, can become the region that glass substrate 121 exposes, and the region exposed from this glass substrate 121, and not only the P ripple of incident illumination becomes Branch's transmission, even S wave component also can transmission, thus have the unfavorable condition causing extinction ratio to be greatly reduced.
It addition, so-called " extinction ratio " refers to the absorbance (injection relative to the polarized component (S ripple) being parallel to above-mentioned fine rule The S wave component in S wave component/incident illumination in light, is the most also called for short " S ripple absorbance "), it is perpendicular to polarizing of above-mentioned fine rule Divide the absorbance (the P wave component in P wave component/incident illumination in injection light, be the most also called for short " P ripple absorbance ") of (P ripple) Ratio (P ripple absorbance/S ripple absorbance).
Such as have P ripple absorbance be 50%, S ripple absorbance be 1% the extinction ratio of polarizer of properties of polarized light Value be 50, but expose the region of glass substrate when being formed on this polarizer, and P ripple absorbance all increases with S ripple absorbance In the case of adding 1%, extinction ratio (i.e. the ratio of P ripple absorbance/S ripple absorbance) becomes as (50+1)/(1+1)=25.5, disappears Light is than being about reduced to a half value.
The present invention completes in view of above-mentioned truth, and main purpose is to provide: can eliminate when polarizer is configured at light During aligning device, linksystem causes the unfavorable condition of fine rule breakage and produces the unfavorable condition of foreign body from damaged fine rule part, And the polarizer that extinction ratio is excellent.
(for solving the technological means of problem)
Present inventor carries out the result of various research, finds by the outside in the polarized regions being configured with above-mentioned fine rule, Form the photomask that ultraviolet light is given shading, just can solve the problems referred to above, then complete the present invention.
That is, the polarizer of the present invention is characterised by, is to have ultraviolet light on radioparent transparency carrier, side by side Configure the polarizer of a plurality of fine rule, wherein, in the outside of the polarized regions being configured with above-mentioned fine rule, be formed above-mentioned ultraviolet Light gives the photomask of shading.
It addition, the polarizer of the present invention is characterised by, along constituting above-mentioned polarized regions outer rim, it is formed Above-mentioned photomask.
It addition, the polarizer of the present invention is characterised by, it is formed with above-mentioned photomask in the periphery of above-mentioned polarized regions.
It addition, the polarizer of the present invention is characterised by, above-mentioned photomask is formed with word, mark or to fiducial mark Note.
It addition, the polarizer of the present invention is characterised by, above-mentioned word, above-mentioned mark or above-mentioned alignment mark have also Row configure the composition of a plurality of fine rule.
It addition, the polarizer of the present invention is characterised by, to upper in above-mentioned word, above-mentioned mark or above-mentioned alignment mark State the value of the S ripple absorbance of ultraviolet light, be with in above-mentioned polarized regions to the identical value of the S ripple absorbance of above-mentioned ultraviolet light, Or less than value to the S ripple absorbance of above-mentioned ultraviolet light in above-mentioned polarized regions.
It addition, the polarizer of the present invention is characterised by, above-mentioned photomask is connected with above-mentioned fine rule.
It addition, the polarizer of the present invention is characterised by, constituting the material system of above-mentioned photomask, to contain composition above-mentioned carefully The material of line.
It addition, the polarizer of the present invention is characterised by, constitute the material material by silicide-comprising molybdenum of above-mentioned photomask Constitute.
It addition, the manufacture method of the polarizer of the present invention is characterised by, be ultraviolet light is had radioparent Bright substrate is provided with a plurality of fine rule and above-mentioned ultraviolet light gives the manufacture method of polarizer of photomask of shading, described side Method includes: prepare to be formed the operation of the duplexer of the 1st material layer on above-mentioned transparency carrier；At above-mentioned 1st material layer The operation of upper formation resist layer；Above-mentioned resist layer is processed, and is formed and there is the against corrosion of thread pattern and photomask pattern The operation of pattern；And be used for etching mask and above-mentioned 1st material layer being etched the operation of processing by above-mentioned corrosion-resisting pattern.
It addition, the manufacture method of the polarizer of the present invention is characterised by, above-mentioned resist layer is against corrosion by eurymeric electron beam Agent is constituted；And form the operation that there is above-mentioned thread pattern with the corrosion-resisting pattern of above-mentioned photomask pattern, including to becoming structure Become the step of the lines in above-mentioned thread pattern and the resist layer irradiating electron beam of the position in the intermittent pattern portion in intermittent pattern.
It addition, the light aligning device of the present invention is characterised by, it is to carry out polarizing and being irradiated in optical alignment film by ultraviolet light Light aligning device, possess above-mentioned polarizer, and the light of the above-mentioned polarized regions by above-mentioned for transmission polarizer, be irradiated to State on optical alignment film.
It addition, the light aligning device of the present invention is characterised by possessing and have the mechanism making above-mentioned optical alignment film move, just Meet at direction that above-mentioned optical alignment film moves and the two direction, direction that above-mentioned optical alignment film moves be provided with multiple above-mentioned partially Shake element, the boundary portion between above-mentioned multiple polarizers adjacent on the orthogonal direction of above-mentioned optical alignment film moving direction, with The mode that is connected of seriality above-mentioned multiple polarizer will not be configured with above-mentioned optical alignment film moving direction.
Polarizer provided by the present invention is characterised by, is the polarization direction that institute's incident uv is parallel to fine rule Light covered and made to be perpendicular to the light transmissive polarizer of polarization direction of above-mentioned fine rule, above-mentioned ultraviolet light is being had Have on radioparent substrate, configure a plurality of above-mentioned fine rule side by side, be configured with outside the region i.e. fine line region of above-mentioned fine rule, if There is a photomask that above-mentioned ultraviolet light is given shading, and the length of the formation direction, edge of above-mentioned photomask inner edge side and above-mentioned fine rule Edge direction is parallel or vertical.
According to the present invention, it is formed at the outside of above-mentioned fine line region by above-mentioned photomask, when being configured at by polarizer During light aligning device, just can clamp the region being formed with photomask.I.e. in polarizer, fine rule configuring area will not be clamped with I.e. in the case of fine line region, polarizer can be fixed on light aligning device, draw from retained part linksystem so can eliminate Send out the damaged unfavorable condition of fine rule and produce the unfavorable condition of foreign body from damaged fine rule part.
It addition, as it has been described above, because be formed with photomask in the fine line region periphery in the region being configured with fine rule, thus In polarizer, the S wave component transmission of incident illumination, particularly incident illumination can be suppressed from the exterior lateral area of fine line region, just can press down Extinction ratio processed is greatly reduced such unfavorable condition.
It addition, its reason to be the edge by above-mentioned photomask inner edge side parallel or vertical with the long side direction of above-mentioned fine rule Directly, above-mentioned fine line region and the intermembranous interval of shading thus can be made easily to reduce, High Extinction Ratio can be obtained.
In the present invention, also can form region that is the 2nd fine line region being configured with above-mentioned fine rule in the outside of above-mentioned photomask. Its reason is: if the outer rim of photomask is arranged at relatively polarizer outer rim more in the inner part, and is to polarization unit from photomask outer rim The region of part outer rim also forms the mode being configured with fine line region that is the 2nd fine line region, then when being plane by multi-disc polarizer Shape is arranged when light aligning device, each photomask of adjacent polarization element just can be suppressed to contact to each other, and make shading The situation that region expands.
Smooth aligning device provided by the present invention, it is characterised in that be the light aligning device possessing and having multiple polarizer, Above-mentioned polarizer possesses a plurality of fine rule of configuration arranged side by side and is formed at the region i.e. outside of fine line region being configured with above-mentioned fine rule Photomask；Multiple above-mentioned polarizers do not contain according between the respective above-mentioned fine line region at the above-mentioned polarizer of adjacent configuration The mode having above-mentioned photomask configures.
According to the present invention, by multiple above-mentioned polarizers according to the above-mentioned polarizer in adjacent configuration on each State and do not contain the mode of above-mentioned photomask between fine line region and configure, thus because between each polarizer not photomask, institute With effect playing in time possessing 1 polarizer.
The assemble method of the polarizer that the present invention provides, it is characterised in that be multiple polarizers to be assembled in light take To the assemble method of the polarizer of device, above-mentioned polarizer possesses and configures side by side a plurality of fine rule and being formed at and be configured with State the photomask in the region i.e. outside of fine line region of fine rule；This assemble method includes utilizing formed on above-mentioned photomask right Fiducial mark is remembered, implements the para-position of above-mentioned polarizer, adjusts the para-position operation of the polarization direction of multiple above-mentioned polarizer simultaneously.
According to the present invention, the alignment mark formed on photomask by use, just can obtain in high precision fine rule position, The information of angle, can easily be directed at desired position and angle.
The effect of invention
According to the present invention, it is possible to provide when polarizer is configured at light aligning device, linksystem can be eliminated and cause fine rule to break The unfavorable condition damaged and producing the unfavorable condition of foreign body from damaged fine rule part, and the polarizer that extinction ratio is excellent.
It addition, possess the light aligning device of polarizer of the present invention, can efficiently perform and optical alignment film is given orientation limit Power processed, can promote productivity.
Accompanying drawing explanation
Fig. 1 is to show polarizer one illustration of the present invention, and (a) is approximate vertical view, and (b) is the line A-A profile of (a).
Fig. 2 is the photomask plane configuration explanatory diagram of polarizer of the present invention shown in Fig. 1.
Fig. 3 is to show another plane configuration illustration of photomask in polarizer of the present invention.
Fig. 4 is display another illustration of polarizer of the present invention, and (a) is approximate vertical view, and (b) is that the alignment mark of (a) is put Big figure.
Fig. 5 is the outline process chart of manufacture method one example showing polarizer of the present invention.
Fig. 6 is hookup 5, shows the outline process chart of manufacture method one example of polarizer of the present invention.
Fig. 7 is the composition illustration showing light aligning device of the present invention.
Fig. 8 is to show another composition illustration of light aligning device of the present invention.
Fig. 9 is to show polarizer configuration one illustration in light aligning device of the present invention.
Figure 10 is to show another illustration of polarizer configuration in light aligning device of the present invention.
Figure 11 is the properties of polarized light measurement result figure of the polarizer showing embodiment 2.
Figure 12 is the approximate vertical view showing conventional polarizer example.
Detailed description of the invention
Hereinafter, for polarizer, the manufacture method of polarizer, light aligning device and the group of polarizer of the present invention Dress method illustrates.
A. polarizer
First, the polarizer for the present invention illustrates.
The polarizer of the present invention is to have ultraviolet light on radioparent transparency carrier, is arranged in parallel with a plurality of fine rule Polarizer, wherein, in the outside of the polarized regions being configured with above-mentioned fine rule, be formed and above-mentioned ultraviolet light given shading Photomask.
Being the illustration showing polarizer of the present invention shown in Fig. 1, (a) is approximate vertical view, and (b) is that the line A-A of Fig. 1 cuts open Face figure.
As it is shown in figure 1, polarizer 10 is to configure a plurality of fine rule 2 on transparency carrier 1 side by side, and it is being configured with fine rule 2 Polarized regions 3 periphery formed photomask 4.
Because there is this kind constitute, so in polarizer 10, when being configured at light aligning device, formation just can be clamped There is the region of photomask 4.
That is, in polarizer 10, can be in the case of not clamping the formed region of fine rule 2 (polarized regions 3), by polarizer 10 are fixed on light aligning device, therefore can eliminate and be caused the unfavorable condition of fine rule 2 breakage and from the most broken by retained part linksystem Damage fine rule part and produce the unfavorable condition of foreign body.
It addition, as it has been described above, form photomask 4 because of the periphery in the polarized regions 3 being configured with fine rule 2, thus partially Shake in element 10, the S wave component from the exterior lateral area transmission incident illumination of polarized regions 3, particularly incident illumination can be suppressed, can press down The unfavorable condition that extinction ratio processed can be greatly reduced.
Hereinafter, each composition for polarizer of the present invention is described in detail.
1. transparency carrier
As transparency carrier 1, as long as it is excellent, photogenic because exposing stably to support fine rule 2 and ultraviolet light transmission Deteriorating few substrate, there is no particular limitation.Such as can use the synthetic quartz glass through optics friction, fluorite, fluorination Calcium etc., are wherein preferably used synthetic quartz glass.Its reason is stay in grade, and even with the light of short wavelength, i.e. high-energy The situation of exposure, deteriorates the most less.
As the thickness of transparency carrier 1, suitably can select with size etc. according to the purposes of polarizer 10.
2. fine rule
Fine rule 2 is in polarizer 10, can reach to make the P wave component transmission effectively of incident illumination, and suppression incident illumination S wave component absorbance to relatively low effect, linearly a plurality of formation and configured in parallel on transparency carrier 1.
As long as the material constituting fine rule 2 can obtain required delustring when P ripple absorbance, then there is no particular limitation, can arrange Citing such as contain: the metals such as aluminum, titanium, molybdenum, silicon, chromium, tantalum, ruthenium, niobium, hafnium, nickel, gold, silver, platinum, palladium, rhodium, cobalt, manganese, ferrum, indium or Alloy；And any one in their oxide, nitride or nitrogen oxides.Wherein, preferably by the material structure containing molybdenum silicide Become.Even if reason is in the short wavelength of ultraviolet range, delustring when P ripple absorbance still can be made excellent, and thermostability, fast light Property also all excellent.
As the material containing molybdenum silicide, can enumerate such as: molybdenum silicide (MoSi), molybdenum silicide oxide (MoSiO), silication Molybdenum nitride (MoSiN), molybdenum silicide nitrogen oxide (MoSiON) etc..
It addition, fine rule 2 can be made up of multiple material, and the multilamellar that can be also different by material is constituted.
As the thickness of fine rule 2, as long as required delustring when P ripple absorbance can be obtained, then there is no particular limitation, such as In the range of being preferably more than 60nm, the most preferably 60nm～160nm, in the range of particularly preferably 80nm～140nm.Reason is By within the above range, delustring when P ripple absorbance just can be made the most excellent.
It addition, the thickness of above-mentioned fine rule, refer in section view, and in the long side direction of fine rule and the vertical direction of width Maximum gauge in thickness, in the case of fine rule is made up of multilamellar, refer to comprise the thickness of all layers.
It addition, the thickness of above-mentioned fine rule may also be the fine rule being contained within different-thickness at a polarizer, but it is typically Formed with same thickness.
As bar number and the length of fine rule 2, as long as required delustring when P ripple absorbance can be obtained, then there is no particularly limit Fixed, suitably can set according to the purposes of polarizer 10 etc..
Spacing (P shown in Fig. 1 (a) as fine rule 21), as long as required delustring when P ripple absorbance can be obtained, then there is no Particularly limit, although the difference according to the optical wavelength that linear polarization photogenerated is used etc., but such as 60nm can be set to Above and in the scope of below 140nm, in the scope of the most preferably more than 80nm and below 120nm, more preferably 90nm with Go up and in the scope of below 110nm.Reason is by for above-mentioned spacing, and delustring when P ripple absorbance just can be made the most excellent.
It addition, the maximum spacing of the spacing between the fine rule that the spacing of above-mentioned fine rule refers to and width is adjacent, work as fine rule When being made up of multilamellar, refer to include the spacing of whole layer.
It addition, the spacing of above-mentioned fine rule can be to include different spacing in a polarizer, but it is typically with phase Formed with spacing.
Dutycycle (duty ratio) as above-mentioned fine rule, i.e. the width of fine rule relative to spacing ratio (width/ Away from), as long as required delustring when P ripple absorbance can be obtained, then there is no particular limitation, can be set to such as more than 0.3 and 0.6 with Under scope in, in the scope of the most preferably more than 0.35 and less than 0.45.Reason is by above-mentioned dutycycle, just can be made into The polarizer that extinction ratio is excellent under having high P ripple transmission states, can make fine rule handling ease further.
It addition, during the width of above-mentioned fine rule refers to overlook, the length in the direction vertical with the long side direction of fine rule, work as fine rule When being made up of multilamellar, just refer to include the width of whole layer.
It addition, the width of above-mentioned fine rule can be the fine rule being contained within different in width at a polarizer, but it is typically Formed with same widths.
3. polarized regions
In polarizer 10 shown in Fig. 1, polarized regions 3 is to utilize photomask 4 to surround region around, in this polarization district Territory 3 is configured with fine rule 2.In other words, the polarized regions 3 of the polarizer 10 shown in Fig. 1 is by the region of photomask 4 specification, It it is incident light transmissive region.
In the present invention, polarized regions 3 also can be set to the region more than 2 configuring areas of fine rule.More specifically, fine rule 2 Also the form can not being connected with photomask 4 on its long side direction (Y-direction shown in Fig. 1 (a)).
It addition, in the orientation of fine rule 2, (in vertical view, and the long side direction vertical direction of fine rule 2, i.e. shown in Fig. 1 (a) X-direction) on, the interval of end fine rule 2 and photomask 4 is alternatively the size being spaced to each other more than fine rule 2.More specifically and Speech, in Fig. 1 (a), (b), interval P between the left side edge of right end fine rule 2 and photomask 4 inner edge side edge in figure2, it is possible to It is greater than fine rule 2 and is spaced P to each other1Size.
But, for obtaining High Extinction Ratio, like that, fine rule 2 is at its long side direction for polarizer 10 the most as shown in Figure 1 On in the form being connected with photomask 4.Reason is in polarized regions 3, can be set to less by the region that there is not fine rule 2, can Suppress the S wave component generation transmission of incident illumination further.
It addition, the fine rule 2 end fine rule 2 in orientation and the interval between photomask 4, preferably with fine rule 2 to each other Interval be formed objects.
More specifically, in Fig. 1 (a), (b), the left side edge of right end fine rule 2 and photomask 4 inner edge side in figure Intermarginal interval P2, preferably and fine rule 2 interval P to each other1In formed objects.Same, in Fig. 1 (a), (b), left in figure Interval between the right side edge of side end fine rule 2 and photomask 4 inner edge side edge, preferably and fine rule 2 interval P to each other1In Formed objects.Reason is to obtain higher extinction ratio.
In the present invention, such as by the operation forming fine rule 2 is set to same operation, just with the operation forming photomask 4 End fine rule 2 in the orientation of fine rule 2 and the interval between photomask 4 can be set to and fine rule 2 interval to each other is phase Same size.It addition, the position relationship of photomask 4 and fine rule 2 can be made precision well, can be accurately in parallel (or vertical) Make edge direction and fine rule 2 direction of photomask 4.
If it addition, as it has been described above, 4 connect the form of fine rule 2 in photomask, then can reach and make utilization be irradiated in polarizer Light and accumulate the dissipation of heat in fine rule 2 in photomask 4 and anlistatig effect.
If it addition, the form that fine rule 2 is connected with photomask 4, then, in the manufacturing process of polarizer 10, can will be used for Form the thinner corrosion-resisting pattern (thread pattern) of fine rule 2, be connected to the large area corrosion-resisting pattern (shading for forming photomask 4 Film figure), may also suppress the thinner corrosion-resisting pattern (thread pattern) for forming fine rule 2 and collapse or stripping occur in manufacturing process From unfavorable condition.
4. photomask
Photomask 4 is formed at the outside of polarized regions 3, and the S wave component of incident illumination, particularly incident illumination can be suppressed to occur Transmission.
In the present invention, photomask 4 preferably to more than 240nm and the ultraviolet light of below 380nm wavelength, has optical density and reaches The light-proofness of more than 2.8.
Reason is by, in the ultraviolet wavelength range giving orientation restraint to optical alignment film and irradiate, making photomask 4 have high light-proofness, can promote the polarizer that extinction ratio is excellent.
As long as the material constituting photomask 4 can obtain required optical density, then there is no particular limitation, can such as contain: aluminum, The metal or alloy such as titanium, molybdenum, silicon, chromium, tantalum, ruthenium, niobium, hafnium, nickel, gold, silver, platinum, palladium, rhodium, cobalt, manganese, ferrum, indium；And they Any one in oxide, nitride or nitrogen oxides.Wherein, the material containing molybdenum silicide is preferably enumerated.
Reason is when the material constituting photomask 4 is made up of the material containing molybdenum silicide, if the thickness of photomask 4 reaches More than 60nm, then to more than 240nm and the ultraviolet light of below 380nm wavelength, can have optical density and reach the light-proofness of more than 2.8.
It addition, photomask 4 can be made up of multiple material, the multilamellar that can be different by material again is constituted.
It addition, the material constituting photomask 4 preferably comprises the material constituting fine rule 2.
Reason is when the material constituting photomask 4 contains the material constituting fine rule 2, institute in the operation forming fine rule 2 Use device and material to can be used with being formed the operation of photomask 4, just can cut down manufacturing cost.Additionally by forming fine rule The operation of 2 and the operation forming photomask 4 are set to same operation, it is possible to promote the relative positional accuracy of fine rule 2 and photomask 4.
It addition, when constitute photomask 4 material with constitute fine rule 2 material by silicide-comprising molybdenum material constitute time, just Photomask 4 can be made to have high light-proofness, and become the polarizer that extinction ratio is all excellent with P ripple absorbance.
Secondly, the vertical view form for photomask 4 illustrates.
Fig. 2 is that the photomask of polarizer of the present invention shown in Fig. 1 overlooks form explanatory diagram.
As in figure 2 it is shown, the photomask 4 in polarizer 10 possesses the frame-shaped form having inner edge 5 with outer rim 6, generally hide The inner edge 5 of light film 4 is consistent with the outer rim of polarized regions 3.
It addition, polarizer 10 as shown in Figure 1 is like that, the outer rim 6 of photomask 4 is typically the outer rim with polarizer 10 Unanimously.
But, the present invention is not limited merely to above-mentioned form, as long as when polarizer being configured at light aligning device, It is formed in the region of photomask 4 and can clamp polarizer, and unwanted S wave component generation transmission can be suppressed the most applicable.
Such as when installing polarizer in the light aligning device irradiating rectilinearly polarized light towards optical alignment film, in polarization unit Mechanism etc. can be kept near the outer rim of part cover, cause the light near this polarizer outer rim will not be irradiated in light orientation During the situation of film, the outer rim 6 of photomask 4 may also set up to be located more in the inner part in relatively polarizer outer rim.
If it addition, the polarizer region beyond the region being formed with photomask 4 is the form forming fine rule 2, such as In the more outward region of outer rim 6 compared with photomask 4 also for forming the form of fine rule 2, just can clamp in the formed region of photomask 4 Polarizer, on the other hand owing to forming fine rule 2 in the region being formed without photomask, therefore can suppress unwanted S ripple to become The raw transmission of distribution, therefore the polarizer of the applicable present invention.
Fig. 3 is another plane configuration illustration of photomask showing polarizer of the present invention.It addition, in Fig. 3, the length of fine rule 2 Edge direction is the above-below direction in figure.
As it has been described above, the photomask 4 of the present invention is formed at the outside of polarized regions 3, incident illumination can be suppressed, especially enter Penetrate the S wave component generation transmission of light.
Therefore, the vertical view form of the photomask 4 in the present invention be not limited merely to as shown in Figure 1 in polarized regions 3 Periphery is formed with the form of photomask 4, can make each according to the holding structure of light aligning device, the collocation method of polarizer Plant form.
Such as, as shown in Fig. 3 (a), (b), it is possible to be formed with region (polarized regions 3) outer rim of fine rule 2 along composition On one side, the form of photomask 4 is formed.
It addition, in form shown in Fig. 3 (a), it is shown that the long side direction of fine rule 2 is phase with the long side direction of photomask 4 Equidirectional example, and in form shown in Fig. 3 (b), it is shown that the long side direction of fine rule 2 is just with the long side direction of photomask 4 The example of friendship relation.
It addition, photomask 4 can also be configured multiple.Such as shown in Fig. 3 (c), (d), it is possible to be formed with fine rule 2 along constituting A pair of region (polarized regions 3) outer rim relatively to two limits form the form of photomasks 4.
Additionally, it is possible to as shown in Fig. 3 (e), along the limit, i.e. constituting region (polarized regions 3) outer rim being formed with fine rule 2 Cross one another two limits form the form of photomask 4.The most also as shown in Fig. 3 (f), (g), fine rule can be formed with along composition Three limits of region (polarized regions 3) outer rim of 2 form the form of photomask 4.
The most as described in the description of fig. 2, in the present invention, the outer rim 6 of photomask 4 may also set up in relatively polarizer 10 Outer rim is more in the inner part.Such as shown in Fig. 3 (h), it is possible to four limits constituting photomask 4 outer rim (outer rim 6 shown in Fig. 2) are all provided with It is placed in relatively polarizer outer rim form more in the inner part, it addition, although not shown, it is possible to constitute photomask 4 outer rim (outside shown in Fig. 2 Edge 6) four limits in one to three limit be arranged at relatively polarizer outer rim form more in the inner part.
It addition, similarly, in form shown in Fig. 3 (a)～(g), it is possible to the outer rim of photomask 4 is arranged at relatively polarizer Outer rim is more in the inner part.
These situations preferably form the form of fine rule 2 in the region being formed without photomask 4.Reason is no matter light is orientated Not which kind of form such as the maintaining body of device, all can suppress from polarizer transmission unwanted S wave component.
As long as belong to form shown in above-mentioned Fig. 3 (a)～(d), such as when being that the plane arrangement of multi-disc is joined by polarizer When being placed in light aligning device, by make each polarizer is formed without photomask 4 to each other in being adjacent to, just may be used Photomask 4 is made not interfere with the seam portion between polarizer.
It addition, such as when being that upper and lower overlap condition is arranged and is orientated dress in light by multi-disc polarizer according to peripheral edge portion When putting, by making to be formed without the state in an overlapping of peripheral edge portion to each other of photomask 4, just can make the photomask 4 will not Have influence on the seam portion between polarizer.
It addition, as shown in Fig. 3 (e)～(h), if shape in the parallel direction and these two directions of vertical direction of fine rule 2 Become and have the form of photomask 4, then when make polarization direction 90-degree rotation and during light aligning device to be configured at, it is possible to need not whole In the case of closing other polarizers, utilize the identical polarizer just can be corresponding.
It addition, as shown in Fig. 3 (h), if the outer rim of photomask 4 is arranged at relatively polarizer outer rim more in the inner part, and from screening The outer genesis of light film 4 in the region of polarizer outer rim also for forming the form of fine rule 2, then when being that multi-disc is put down by polarizer Planar is arranged when light aligning device, and each photomask 4 the most not having adjacent polarization element contacts to each other and makes screening The situation that light region can expand.
It addition, when multi-disc polarizer is configured at light aligning device, it is possible to it is applied in combination Fig. 1 Yu Fig. 3 (a)～(h) The polarizer of shown various forms.
Fig. 4 is the figure showing another example of polarizer of the present invention, and (a) is approximate vertical view, (b) be (a) to fiducial mark Note enlarged drawing.
As shown in Fig. 4 (a), polarizer 20 is to be provided with alignment mark 7 in the photomask 4 near corner.
In the present invention, photomask 4 also can form word, mark or alignment mark.Such as by photomask 4 Form word, mark etc., thus can give the information relevant to polarizer such as model.Additionally be possible with in up and down, The table back ofs the body etc. are towards judging and rough para-position.
It addition, as it has been described above, by the operation forming fine rule 2 is set to same with the operation forming photomask 4 in the present invention One operation, also can promote the relative positional accuracy of fine rule 2 and photomask 4.So, by forming alignment mark in photomask 4 7, just can obtain the position of fine rule 2, angle information from alignment mark 7.
It addition, when installing polarizer 20 in the light aligning device that optical alignment film is irradiated rectilinearly polarized light, use This alignment mark 7, it is possible to make the position of fine rule 2, angle and desired location, angle consistent easily.
In the present invention, there is no particular limitation for the form of above-mentioned alignment mark, can use the various shapes such as cross, L font State, but alignment mark is the most in advance at least one of which direction in the parallel direction or vertical direction in the direction of fine rule 2 Form edge.According further to purposes, it is possible to having relative to the direction of fine rule 2 is 45 degree of equal angular edges.
There is no particular limitation with allocation position for the quantity of alignment mark, can arrange the suitably quantity of necessity, needed position.
Above-mentioned word, mark or alignment mark also can be made up of the material being different from photomask 4, hiding it addition, may also be The composition in light film 4, opening being set and make transparency carrier 1 expose.
But, above-mentioned word, mark or alignment mark arrange opening in photomask 4 and make transparency carrier 1 reveal having During the composition gone out, in order to suppress extinction ratio to reduce, it is usually preferred to make make transparency carrier 1 expose the form that area diminishes.
On the other hand, in the present invention, it is possible to make above-mentioned word, mark or alignment mark configure a plurality of fine rule side by side and The composition become.
Such as shown in Fig. 4 (b), it is possible to alignment mark 7 is made the composition configuring a plurality of fine rule 8 side by side.Though additionally omitting Icon, above-mentioned word with mark be also in the same manner as can be made into the composition configuring side by side a plurality of fine rule 8.The direction of the most a plurality of fine rule Preferably identical with the filament direction of polarized regions.
It addition, by have alignment mark 7, above-mentioned word, mark polarizer 20 according to becoming required extinction ratio Mode, designs the conditions such as the material of fine rule 8, thickness, spacing, dutycycle, ultraviolet light just can be made to have the function of shading or polarization, Even if forming alignment mark 7, above-mentioned word, mark in photomask 4, the extinction ratio being prevented from polarizer 20 reduces.
In the present invention, constitute alignment mark 7, above-mentioned word or the material of fine rule 8 of mark, thickness, spacing, dutycycle Deng, as long as the material that can become required S ripple absorbance can use, wherein the material of fine rule 8 and thickness be preferably set to partially Shake material and the thickness of configured fine rule 2 in region 3 is identical, it addition, the long side direction of fine rule 8, spacing and dutycycle, preferably sets By with in polarized regions 3 the long side direction of configuration fine rule 2, spacing and dutycycle identical.
Even if reason is owing to forming alignment mark 7, above-mentioned word, mark, but extinction ratio still will not change, thus right Can more freely design in alignment mark 7, above-mentioned word, the quantity of mark and configuration.
It addition, in the polarizer of the present invention, require High Extinction Ratio at the configured fine rule of polarized regions 32, i.e. require P Ripple absorbance is high, S ripple absorbance is low, but for the above-mentioned word of composition, mark or the alignment mark formed in photomask 4 Fine rule 8, although require that S ripple absorbance is relatively low, but relevant P ripple absorbance also may not require high-transmission rate.
That is, though above-mentioned word, mark or alignment mark must avoid irradiating optical alignment film the S wave component of incident illumination, but As long as the absorbance of relevant P wave component then belong to can the above-mentioned word of identification, mark or alignment mark level just can, the most required Want high-transmission rate.
Therefore, in the present invention, the ultraviolet light irradiated for polarizer, the S of above-mentioned word, mark or alignment mark Ripple transmittance values, is preferably with value or smaller value with the S ripple absorbance in polarized regions 3.
B. the manufacture method of polarizer
Secondly, the manufacture method for polarizer of the present invention illustrates.
The manufacture method of the polarizer of the present invention be ultraviolet light is had be provided with on radioparent transparency carrier a plurality of Fine rule and ultraviolet light gives the manufacture method of polarizer of photomask of shading, includes: prepare at above-mentioned transparency carrier On be formed with the operation of duplexer of the 1st material layer；Above-mentioned 1st material layer is formed the operation of resist layer；To above-mentioned Resist layer is processed, and forms the operation having thread pattern with the corrosion-resisting pattern of photomask pattern；And by above-mentioned against corrosion Pattern is used for etching mask, and above-mentioned 1st material layer is etched the operation of processing.
In the present invention, by the operation forming fine rule 2 is set to same operation with the operation forming photomask 4, just can contract Short manufacturing process, and the relative positional accuracy of fine rule 2 and photomask 4 can be promoted.
It addition, by making fine rule 2 be constructed from the same material with photomask 4, it is possible to suppression manufacturing cost is to relatively low.
Fig. 5 and Fig. 6 is the outline process chart of manufacture method one example showing polarizer of the present invention.
Such as when the manufacture method using polarizer of the present invention manufactures polarizer 10, as shown in Fig. 5 (a), first Prepare on transparency carrier 1, be sequentially formed with duplexer as follows: by constituting what the fine rule 2 material with photomask 4 was constituted Polarizing material 31 and when being etched adding the layer of hard mask material 32 playing hard mask effect man-hour to polarizing material 31.
It addition, in this example, layer of hard mask material 32 is comparable to above-mentioned 1st material layer.
Secondly, layer of hard mask material 32 forms resist layer 33 (Fig. 5 (b)), irradiating electron beam 40 grade (Fig. 5 (c)) and Carry out development etc., be consequently formed the corrosion-resisting pattern 34 (Fig. 5 (d)) with thread pattern 34a and photomask pattern 34b.
In the present invention, such as, use electron beam lithography system used in semiconductor lithography photoetch manufactures, pass through Make thread pattern 34a and photomask pattern 34b and above-mentioned alignment mark etc. according to same operation, thus can retouch at electron beam Paint the relative position controlling them under the high precision position accuracy control of device.
Then, it is used for etching mask by corrosion-resisting pattern 34, layer of hard mask material 32 is etched processing, and is formed and firmly cover Mould pattern 32P (Fig. 6 (e)).Such as when the material of layer of hard mask material 32 uses chromium, utilize and use chlorine and oxygen gas mixture Dry-etching, hard mask pattern 32P can be formed.
Secondly, it is used for etching mask with hard mask pattern 32P by corrosion-resisting pattern 34, is etched adding to polarizing material 31 Work, is consequently formed polarized material pattern 31P (Fig. 6 (f)) having fine rule 2 with photomask 4.Such as when the material of polarizing material 31 When material uses molybdenum silicide, by using the dry-etching of SF6 gas, polarized material pattern 31P can be formed.
Again, remove corrosion-resisting pattern 34 (Fig. 6 (g)), remove hard mask pattern 32P the most again, and obtain at transparency carrier 1 It is provided with the polarizer 10 (Fig. 6 (h)) of a plurality of fine rule 2 and photomask 4.
Though it addition, omit in the example shown in Fig. 5 and Fig. 6, but in the present invention, it is possible to shape on large-area transparent substrate 1 Become a plurality of fine rule 2 and photomask 4, cut off the outside of the polarized regions 3 being configured with fine rule 2 the most again, it is thus achieved that through cutting as required The polarizer 10 of size and form.
It addition, in above-mentioned, although when remaining corrosion-resisting pattern 34, polarizing material 31 is etched processing, but In the present invention, it is possible to after the operation of the formation hard mask pattern 32P shown in Fig. 6 (e), remove corrosion-resisting pattern 34, and only will Hard mask pattern 32P is used for etching mask, and polarizing material 31 is etched processing and forms polarized material pattern 31P.
It addition, in above-mentioned, as obtained polarizer 10, say for the form eliminating hard mask pattern 32P Bright, but the present invention the most also can whole or partial residual hard mask pattern 32P.
Such as, form as shown in Fig. 6 (g), it is possible to be set to finally obtain by the form of whole residual hard mask pattern 32P Obtain the form of polarizer.Now, the operation removing hard mask pattern 32P can be omitted, can reach to shorten the effect of operation.
It addition, in above-mentioned, though illustrating for the form being provided with layer of hard mask material 32 on polarizing material 31, but In the present invention, it is possible in the case of being not provided with layer of hard mask material 32, on polarizing material 31, form resist layer 33, then will be anti- Corrosion figure case 34 is used for etching mask and polarizing material 31 being etched processing, forms the polarization having fine rule 2 with photomask 4 Patterns of material 31P.
Now, polarizing material 31 is equivalent to above-mentioned 1st material layer.
Herein, the formation institute using method of the corrosion-resisting pattern 34 shown in above-mentioned Fig. 5 (c), as long as can be formed have required Thread pattern 34a all can use with the method for the corrosion-resisting pattern 34 of photomask pattern 34b, wherein, and the preferably side of irradiating electron beam Method.
Reason is that the corrosion-resisting pattern utilizing the method for irradiating electron beam to carry out is formed, in the photomask manufacture of quasiconductor Etc. having actual performance in being, such as, in desired zone, precision can form more than spacing 60nm and below 140nm scope goodly Thread pattern.Additionally reason is the relative positional accuracy of thread pattern 34a and photomask pattern 34b, it is possible to reach quasiconductor With the sodium rice horizontal accuracy required by light fabrication mask.
It addition, in the present invention, preferably resist layer 33 is made up of eurymeric electron sensitive resist, and formation is provided with thread pattern The operation of the corrosion-resisting pattern 34 of 34a and photomask pattern 34b, is to resisting beyond required fine rule and required photomask forming position The operation of erosion layer 33 irradiating electron beam.
More specifically, preferably thread pattern 34a constitutes lines and intermittent pattern, and to becoming above-mentioned lines and chart spacing Case is spaced the step of resist layer 33 irradiating electron beam of the position of drafting department.
As long as reason is that the method to the irradiating electron beam of above-mentioned position, so that it may reduce the area of irradiating electron beam, can contract The time of short electron beam irradiation operation.
It is described in more detail for above-mentioned.
Such as, during the size of the spacing half that width is fine rule 2 of the fine rule 2 of the polarizer 10 shown in Fig. 1, if using In the case of minus electron sensitive resist, the thread pattern of polarizer 10 to be obtained and photomask pattern, carry out electron beam photograph The area penetrated is the area adding up to area to obtain plus photomask 4 area of all fine rules 2.
On the other hand, if making in aforementioned manners, then the area of electron beam irradiation becomes all compartments into fine rule 2 Add up to area, if the total area of the most all fine rules 2 just can, can cut down irradiation photomask 4 area time.
C. light aligning device
Secondly, the light aligning device for the present invention illustrates.
The light aligning device of the present invention is the light aligning device that ultraviolet light is polarized and is irradiated in optical alignment film, possesses Having the polarizer of the invention described above, the light of the polarized regions that will transmit through polarizer is irradiated on optical alignment film.
For the light aligning device of the present invention, by possessing the polarizer of the present invention, thus can suppress from ultraviolet Unwanted S wave component generation transmission in the ultraviolet light that light modulation is irradiated.So, can effectively implement optical alignment film is given Orientation restraint, can promote productivity.
Fig. 7 is the composition illustration showing light aligning device of the present invention.
Light aligning device 50 shown in Fig. 7 possesses polarizer unit 51 and the ultraviolet light that polarizer of the present invention is received Lamp 52, the polarizer 10 that the ultraviolet light irradiated from ultra-violet lamp 52 utilizes polarizer unit 51 received is carried out partially Shake, then this is irradiated in the optical alignment film 55 being formed on workpiece 56, thus to optical alignment film through the light (polarized light 54) of polarization 55 give orientation restraint.
It addition, light aligning device 50 possesses the mechanism making the workpiece 56 having been formed with optical alignment film 55 move, logical Cross and make workpiece 56 move, just the whole face of optical alignment film 55 can be carried out polarized light 54 and irradiate.Such as in the example shown in Fig. 6, Workpiece 56 is mobile towards right in figure (direction of arrow of Fig. 6).
It addition, during Fig. 7 is exemplified, it is shown that workpiece 56 is as rectangular-shaped flat board, but in the present invention, if the form of workpiece 56 Can irradiate polarized light 54, then there is no particular limitation, and such as workpiece 56 is alternatively film like form, the most alternatively can batch Banding (netted) form.
In the present invention, ultra-violet lamp 52 preferably can be more than illumination wavelength 240nm and the lamp of ultraviolet light of below 380nm, separately Outer optical alignment film 55 preferably has sensitivity to the ultraviolet light of more than wavelength 240nm and below 380nm.
It reason is that because light aligning device 50 possesses the polarizer 10 with photomask 4, thus can effectively suppress Unwanted S wave component generation transmission, described photomask has high light-proofness to above-mentioned wave-length coverage ultraviolet light.Therefore, can have Effect ground performs to have above-mentioned wave-length coverage ultraviolet light the optical alignment film of sensitivity and gives orientation restraint, therefore can promote production Property.
It addition, for the light from ultra-violet lamp 52 can be irradiated in polarizer effectively, light aligning device 50 preferably exists The rear side (oncoming lane of polarizer unit 51) of ultra-violet lamp 52 or side are provided with the reflection reflected by ultraviolet light Mirror 53.
It addition, be large-area optical alignment film 55 to be given effectively orientation restraint, preferably as it is shown in fig. 7, preferably Ultra-violet lamp 52 uses bar-shaped lamp, is irradiated in relative to workpiece 56 moving direction according to the polarized light 54 becoming long irradiation area (direction of arrow of Fig. 7) is that the mode of orthogonal direction constitutes light aligning device 50.
Now, polarizer unit 51 is also suitable the form for large area optical alignment film 55 irradiates polarized light 54, but because of Manufacture for large area polarizer has difficulty, thus configures multiple polarizers in polarizer unit 51, with regard to technology For property and economic face the most preferred.
It addition, the light aligning device of the present invention can also be the composition possessing multiple ultra-violet lamp.
Fig. 8 is another composition illustration showing light aligning device of the present invention.
As shown in Figure 8, light aligning device 60 possesses 2 ultra-violet lamps 62, and between each ultra-violet lamp 62 and workpiece 66, It is respectively equipped with the polarizer unit 61 that polarizer of the present invention is received.The most each ultra-violet lamp 62 is respectively equipped with reflecting mirror 63。
Thus, by possessing multiple ultra-violet lamp 62, compared to possessing the situation of 1 ultra-violet lamp 62, can increase to The irradiation dose of the polarized light 64 that formed optical alignment film 65 irradiates on workpiece 66.Therefore, compared to possessing 1 ultra-violet lamp 62 Situation, can increase the translational speed of workpiece 66, and its result can promote productivity.
It addition, during Fig. 8 is exemplified, be set forth in workpiece 66 moving direction (direction of arrow in Fig. 8) 2 ultraviolets of configuration side by side The composition of light modulation 62, but the present invention is not limited merely to this, such as, can also be in the direction orthogonal with workpiece 66 moving direction The composition of the multiple ultra-violet lamp of upper configuration, can also be additionally the moving direction of workpiece 66 and orthogonal to that direction etc. two Multiple ultra-violet lamp it is each equipped with on direction.
It addition, during Fig. 8 is exemplified, it is shown that 1 ultra-violet lamp 62 is arranged to the composition of 1 polarizer unit 61, But the present invention is not limited merely to this, such as, it can also be the composition multiple ultra-violet lamps being arranged to 1 polarizer unit. Now, as long as 1 polarizer unit has the size that can contain multiple ultra-violet lamp irradiation areas.
It it is polarizer configuration one illustration in light aligning device of the present invention shown in Fig. 9.It addition, Fig. 9 (a)～(d) The configuration of shown polarizer show tabular polarizer 10 relatively to the face in optical alignment film be plane The form of arrangement.
Such as, in the light aligning device 50 shown in Fig. 7, when being orthogonal direction illumination bands to opposite piece 56 moving direction During shape polarized light 54, in polarizer unit 51 as shown in Fig. 9 (a), orthogonal at workpiece 56 moving direction (direction of arrow) It is effective for configuring multiple polarizer 10 on direction.Reason is can to suppress the quantity of polarizer 10 for less.
On the other hand, when the area of polarizer 10 is less or when light aligning device possesses multiple ultra-violet lamp, such as figure Shown in 9 (b), preferably in addition to the orthogonal direction of workpiece moving direction (direction of arrow), in the side along moving direction (direction of arrow) The most also multiple polarizer 10 is configured.Reason is that and economically the light from ultra-violet lamp can be irradiated in optical alignment film, energy Promote productivity.
Herein, in the present invention, as shown in Fig. 9 (c) and Fig. 9 (d), the polarizer of multiple configurations is preferably according to along workpiece The non-mode neat in a row of moving direction (direction of arrow), makes orthogonal at workpiece moving direction of the position of adjacent polarization element Misplace on direction (above-below direction in figure) configuration.
More specifically, on the orthogonal direction of optical alignment film moving direction, clamp between adjacent multiple polarizers The photomask of boundary portion, preferably configures multiple polarization unit according to the mode connected in the non-linearly property of optical alignment film moving direction Part.
Reason is that in the formed region of photomask 4, because polarized light will not be produced, thus this photomask 4 can be suppressed right The harmful effect that optical alignment film causes.
Herein, configuration shown in Fig. 9 (c) by: the multiple polarizers configured are respectively provided with same shape, identical chi Very little, and the above-below direction position of adjacent polarization element in the lateral direction is with 1/2 size of polarizer above-below direction size The stepped configuration that dislocation occurs at above-below direction.
It addition, configuration shown in Fig. 9 (d) by: configured multiple polarizer and be respectively provided with same shape, same size, Stepped with less than the 1/2 of polarizer above-below direction size of the above-below direction position of adjacent polarization element in the lateral direction The configuration of dislocation is there is at above-below direction.
It is described in more detail for above-mentioned.
In configuration shown in Fig. 9 (c), the polarizer 10 (10p) of the most adjacent configuration and polarization unit The boundary portion 71 of part 10 (10q), is to utilize the polarizer 10 (10r) and polarizer 10 (10s) configured in the lateral direction And stop and extend to left and right direction.
That is, in configuration shown in Fig. 9 (c), the border between the polarizer of the most adjacent configuration is clamped The photomask in portion, is prevented from rectilinearity in the lateral direction and connects.
Therefore, use configuration shown in Fig. 9 (c), when optical alignment film is irradiated polarized light, can suppress because of above-mentioned shading The harmful effect that film is caused involves optical alignment film continuously.
Same, even if in configuration shown in Fig. 9 (d), clamp the most adjacent configuration polarizer Between the photomask of boundary portion, be prevented from rectilinearity in the lateral direction and connect.
Therefore, use configuration shown in Fig. 9 (d), when optical alignment film is irradiated polarized light, can suppress because of above-mentioned shading The harmful effect that film is caused involves optical alignment film continuously.
It addition, in configuration shown in Fig. 9 (c), stepped due to 1/2 size with polarizer above-below direction size Misplace along the vertical direction, thus relative to left and right directions (workpiece moving direction), upper and lower in boundary portion 71 of every 2 polarizers Position, direction is aligned condition.
On the other hand, in configuration shown in Fig. 9 (d), due to less than polarizer above-below direction size 1/2 ladder Shape misplaces along the vertical direction, thus the above-below direction position of boundary portion 72 becomes increasingly difficult to alignment.
So, configuration shown in Fig. 9 (d) more can suppress the harmful effect caused because of above-mentioned photomask to involve continuously Optical alignment film.
It addition, during Fig. 9 (a)～(d) are exemplified, each polarizer configures according to the side state of adjoining each other, but The present invention is not limited merely to this form, it is possible to have the form in gap for the interelement boundary portion of adjacent polarization.
It addition, it is overlapped to may also be the end by adjacent polarization element, thus make the boundary portion between polarizer not The form in gap can be produced.
Figure 10 is another illustration of polarizer configuration showing light aligning device of the present invention.
In the present invention, it is possible to replace configuration shown in Fig. 9 (a), change using such as polarizer 10c shown in Fig. 3 (c) into With polarizer 10f shown in Fig. 3 (c), as shown in Figure 10 (a), according to not forming that of photomask in each polarizer The state in an overlapping of peripheral edge portion around here configures.
If this kind of configuration, then because of not having photomask between each polarizer of above-below direction in the drawings, and Do not have gap between each polarizer, thus the top from figure configure the most successively polarizer 10f, 10c, 10f this 3 Sheet polarizer, thus can when there is on above-below direction in the drawings the polarizer of 1 length of a film play a role.
Further, each polarizer can be made to be configured at light aligning device with the method clamping a part for respective photomask.Cause This, can be fixed on light aligning device, no in the case of will not clamping the formed region of fine rule (polarized regions) by each polarizer Cause to occur to cause the unfavorable condition of fine rule breakage from clamped partial linkage and produce different from damaged fine rule part The unfavorable condition of thing.
It addition, in Figure 10 (a), though numerous and diverse and inclined exemplified with configuring polarizer 10f, 10c, 10f these 3 successively for avoiding Shake the form of element, but above-mentioned form is used as the polarizer 10c of more than 2, in more on above-below direction in the drawings Long mode configures.
It addition, be similarly used as polarizer 10e shown in the polarizer 10a Yu Fig. 3 (e) shown in Fig. 3 (a), as Shown in Figure 10 (b), configure according to the state in an overlapping of peripheral edge portion to each other not forming photomask in each polarizer. Now play a role like that also like when possessing 1 polarizer.
It addition, each polarizer now can also be made to be configured at light orientation with the method clamping a part for respective photomask Device.Therefore, in the case of will not clamping the formed region of fine rule (polarized regions), each polarizer can be fixed on light orientation Device, will not occur to cause the unfavorable condition of fine rule breakage and from damaged thin thread part from clamped partial linkage Divide the unfavorable condition producing foreign body.
Even if it addition, in Figure 10 (b), it is also possible to be the polarizer that is used up more than 2 of upper and lower in the drawings 10a, forms the configuration in longer mode on above-below direction in the drawings.
D. polarizer
Secondly, the polarizer for the present invention illustrates.
The polarizer of the present invention is characterised by, is the shelter incident uv polarization direction that is parallel to fine rule Light, and make to be perpendicular to the light transmissive polarizer of the polarization direction of above-mentioned fine rule, above-mentioned ultraviolet light is had radioparent On substrate, configure a plurality of above-mentioned fine rule side by side, and in configuring the region i.e. outside of fine line region of above-mentioned fine rule, be provided with above-mentioned Ultraviolet light gives the photomask of shading, and the formation direction, edge of above-mentioned photomask inner edge side is parallel or perpendicular to above-mentioned fine rule Long side direction.
As the polarizer of this kind of present invention, such as can be for the polarizer shown in Fig. 1 of having been described above.
It addition, Fig. 1 is illustrated that polarized regions 3 and 2 i.e. fine line region of configuring area of fine rule are identical situation.
It addition, Fig. 1 is illustrated that above-mentioned photomask 4 is formed at the outside of 2 i.e. fine line region of configuring area of above-mentioned fine rule, And the edge of above-mentioned photomask 4 inner edge side is the long side direction being parallel or perpendicular to above-mentioned fine rule.
According to the present invention, it is formed at the outside of above-mentioned fine line region by above-mentioned photomask, when being configured at by polarizer During light aligning device, the region being formed with photomask can be clamped.That is, in polarizer, can clamp and be configured with fine rule Region i.e. fine line region, and polarizer is fixed on light aligning device, cause so can eliminate from clamped partial linkage Unfavorable condition that fine rule is damaged and produce the unfavorable condition of foreign body from damaged fine rule part.
It is configured with the region i.e. periphery of fine line region of fine rule is formed with photomask it addition, be as noted previously, as, thus In polarizer, the exterior lateral area from fine line region can be suppressed, the S wave component of transmission incident illumination, particularly transmission incident illumination, can The unfavorable condition that suppression extinction ratio is greatly reduced.
Additionally, reason is that by the edge of above-mentioned photomask inner edge side be the long limit side being parallel or perpendicular to above-mentioned fine rule To, just can reduce above-mentioned fine line region and the intermembranous interval of shading easily, High Extinction Ratio can be obtained.
The polarizer of the present invention has substrate, fine line region and photomask.
1. substrate
The substrate of the present invention has transmittance to above-mentioned ultraviolet light.
In the present invention, so-called " ultraviolet light is had transmittance ", specifically refer to make more than wavelength 240nm and 380nm with Under light transmission.
The material and the thickness that constitute this kind of substrate can be set to institute in " 1. transparency carrier " item with above-mentioned " A. polarizer " Contents is identical.
2. fine line region
The fine line region of the present invention is equipped with the region of fine rule.
Above-mentioned fine line region more specifically refers to be arranged in parallel with the region of a plurality of fine rule.
It addition, above-mentioned fine line region is to cover the light of the polarization direction being parallel to fine rule, and make to be perpendicular to above-mentioned fine rule The light transmission of polarization direction, generates the main region of rectilinearly polarized light.
The fine rule of the present invention is to be arranged in parallel with a plurality of state on aforesaid substrate.
About constituting the material of this kind of fine rule, thickness, bar number and length, spacing, dutycycle and width, all can be set to Identical with described content in " 2. fine rule " item of above-mentioned " A. polarizer ".
When forming photomask outside the fine rule long side direction of above-mentioned fine line region, it is preferably formed as the long limit side of this fine rule To end with photomask in the form being connected.
When forming photomask outside the fine rule orientation of above-mentioned fine line region, preferably in the orientation of fine rule The fine rule of end and the interval of photomask, be and fine rule interval to each other be formed objects.
More specifically, in Fig. 1 (a), (b), the left side edge of the fine rule 2 of the right end in figure and photomask 4 inner edge Interval P between the edge of side2, preferably and fine rule 2 interval P to each other1For formed objects.Same in Fig. 1 (a), (b), figure In the right side edge of fine rule 2 of left distal end and interval between the edge of photomask 4 inner edge side, preferably with fine rule 2 to each other Interval P1For formed objects.
It addition, end and photomask about the long side direction by above-mentioned fine rule are in the form being connected and end thin Line and the intermembranous interval of shading are the effects etc. that fine rule interval to each other is obtained, due to above-mentioned " A. polarizer " In " 3. polarized regions " item, described content is same, so in this description will be omitted.
3. photomask
The photomask of the present invention is that above-mentioned ultraviolet light is given shading.
Above-mentioned photomask is formed at being configured with the region i.e. outside of fine line region of above-mentioned fine rule.
In the most above-mentioned photomask, the formation direction at the edge of above-mentioned photomask inner edge side in be parallel or perpendicular to above-mentioned carefully The long side direction of line.
As long as the plane configuration of above-mentioned photomask is formed at the region i.e. outside of fine line region being configured with above-mentioned fine rule Just may be used.
This kind of plane configuration specifically can be set to and described content phase in " 4. photomask " item of above-mentioned " A. polarizer " With.
In the present invention, as shown in Fig. 3 (h), it is possible to be that photomask outer rim is arranged at relatively polarizer outer rim more in the inner part, from The outer genesis of photomask to the region of polarizer outer rim is also formed with the form of fine rule, is i.e. formed in the outside of above-mentioned photomask and joins It is equipped with the form of the 2nd fine line region in the region of above-mentioned fine rule.Thin by sequentially forming above-mentioned fine line region, photomask and the 2nd Line region, can be able to suppress to become adjacent polarization when being plane being arranged in light aligning device by polarizer multi-disc Each photomask of element contacts the situation causing lightproof area to expand to each other.
It addition, the long side direction of fine rule contained in above-mentioned 2nd fine line region be typically with above-mentioned fine line region contained by thin The long side direction of line is equidirectional.
It addition, when multi-disc polarizer is configured at light aligning device, it is possible to it is applied in combination photomask plane configuration not The polarizer of same various forms.
As long as the direction that formed at the edge of above-mentioned photomask inner edge side is parallel or perpendicular to the long side direction of above-mentioned fine rule ?.
Herein, the formation direction, edge of so-called photomask inner edge side is the long side direction being parallel or perpendicular to above-mentioned fine rule, As long as the formation direction, edge of above-mentioned inner edge side is parallel direction or vertical direction with the long side direction of above-mentioned fine rule, when In the case of photomask has multiple inner edge side edge, can be the most also parallel direction and Vertical Square containing the long side direction with fine rule To the situation of both.
Earlier figures 1 and Fig. 3 (e), (f), (g) and (h), is the formation direction, edge illustrating photomask inner edge side, contains It is the situation of both parallel direction and vertical direction with above-mentioned fine rule long side direction.
It is the formation direction, edge of photomask shown in Fig. 3 (a) and (c), is only parallel side with the long side direction of above-mentioned fine rule To situation.
It is the formation direction, edge of photomask shown in Fig. 3 (b) and (d), the only perpendicular side with the long side direction of above-mentioned fine rule To situation.
When forming 2 fine line region outside above-mentioned photomask, the formation direction, edge of above-mentioned photomask outer edge side, excellent Select with above-mentioned 2nd fine line region contained by the long side direction of fine rule be parallel or vertical direction.Reason is to obtain higher delustring Ratio.
Above-mentioned photomask also can be formed word, mark or alignment mark.Such as by photomask formed word, Marks etc., just can give the information of the correlated polarizations elements such as model.Additionally be possible with in up and down, the table back of the body etc. towards sentence Disconnected and rough para-position.
About this kind of word, mark or alignment mark, " the 4. photomask " with above-mentioned " A. polarizer " specifically can be set to In Xiang, described content is same.
Above-mentioned photomask to the light-proofness of ultraviolet light and constituent material, can be set to and " 4. the hiding of above-mentioned " A. polarizer " Light film " described content is same in item.
4. polarizer
The polarizer of the present invention has substrate, fine line region and photomask, but the most also can have other and constitute.
E. light aligning device
Secondly, the light aligning device for the present invention illustrates.
The light aligning device of the present invention is characterised by, possesses multiple polarizer, and above-mentioned polarizer be have many Bar fine rule is in side by side configuration and the photomask that is formed at the region i.e. outside of fine line region being configured with above-mentioned fine rule, and multiple Above-mentioned polarizer does not contains above-mentioned photomask between the respective above-mentioned fine line region of the above-mentioned polarizer of adjacent configuration Mode configure.
As the light aligning device of this kind of present invention, such as can be for the device shown in Fig. 7 and Fig. 8 of preceding description.
It addition, as multiple above-mentioned polarizers configure, i.e. according to the above-mentioned polarizer of adjacent configuration respective on State and do not contain the mode of above-mentioned photomask between fine line region and configure, concretely Figure 10 (a) of preceding description and joining shown in (b) Put.
According to the present invention, by multiple above-mentioned polarizers according to the above-mentioned polarizer of adjacent configuration respective above-mentioned carefully The mode not containing above-mentioned photomask during line is interregional configures, thus because not having photomask between each polarizer, so Effect can playing in time possessing 1 polarizer.
It addition, each polarizer can be configured at light aligning device by the method for the part clamping each photomask.So, In the case of will not clamping the region being formed with fine rule i.e. fine line region, each polarizer can be fixed on light aligning device, by This will not occur to cause fine rule suffer the unfavorable condition of breakage and produce from damaged fine rule part from clamped partial linkage The unfavorable condition of raw foreign body.
The present invention is at least provided with polarizer.
Hereinafter, each composition for polarizer of the present invention is described in detail.
1. polarizer
The polarizer of the present invention has a plurality of fine rule of configuration arranged side by side and is formed at the region i.e. fine rule configuring above-mentioned fine rule The photomask in the outside in region.
About this kind of polarizer, because such as can be set to as the content described in above-mentioned " D. polarizer " item, So in this description will be omitted.
2. the configuration of polarizer
The configuration of polarizer of the present invention be multiple above-mentioned polarizer adjacent configuration above-mentioned polarizer each Above-mentioned fine line region between do not contain the configuration of above-mentioned photomask.
The configuration of this kind of polarizer can be set to the polarizer of the most adjacent configuration, according to the non-shape of respective polarizer The one side becoming photomask configures in adjacent state to each other.
More specifically, the configuration shown in Figure 10 (a) of preceding description and (b) can be set to.
The configuration of above-mentioned polarizer can be the shape that adjacent polarizer configures in the state contacted with each other according to side State, it is also possible to be the form with gap of the boundary portion between adjacent polarizer.
The configuration of above-mentioned polarizer also can be overlapped by the end of adjacent polarizer, and is formed between polarizer Boundary portion the form in gap does not occurs.
Configuration about above-mentioned polarizer is not form shading according to the polarizer of adjacent configuration at each polarizer One side of film configures in adjacent state to each other, and then is overlapped configuration by the end of adjacent polarizer, respectively Polarizer is not formed one side of photomask peripheral edge portion to each other configure in an overlapping, such as, can be set to and above-mentioned " C. light Aligning device " described content is same in item.
About above-mentioned polarizer relative to the configuration of workpiece moving direction, can be set to and above-mentioned " C. light aligning device " item Middle described content is same.
In the present invention, when by above-mentioned according to not containing in adjoining between the respective above-mentioned fine line region of above-mentioned polarizer configured The multiple above-mentioned polarizer that the mode of photomask configures, is considered as 1 polarizer (being the most also called for short " in conjunction with polarizer ") Situation time, it is possible to configure multiple above-mentioned combination polarizer use.
Combine the configuration of polarizer about this kind, can be set to described with above-mentioned " C. light aligning device " item The configuration of multiple polarizers is same.
The most smooth aligning device
The light aligning device of the present invention has multiple polarizer, but optionally can also have other and constitute.
Constitute as such other, it is possible to by having polarizer unit, the ultraviolet such as making polarizer be received The mechanism etc. that light modulation, reflecting mirror, workpiece move.
Other compositions above-mentioned can be set to as described content in above-mentioned " C. light aligning device " item.
F. the assemble method of polarizer
Assemble method below for polarizer of the present invention illustrates.
The assemble method of polarizer of the present invention is characterised by, multiple polarizers are assembled in light aligning device Method, wherein, above-mentioned polarizer has a plurality of fine rule and is configured with the region of above-mentioned fine rule the most carefully in configuring side by side and being formed at The photomask in the outside in line region, it includes: by the alignment mark formed on above-mentioned photomask, perform above-mentioned polarization The para-position of element, adjusts the para-position operation of the polarization direction of multiple above-mentioned polarizer simultaneously.
According to the present invention, by using the alignment mark formed on photomask, the position of fine rule just can be obtained in high precision With angle information, can be consistent with angle with desired position easily.
More specifically, by the operation of the operation and formation photomask that form fine rule is set to same operation, just can carry Rise the relative positional accuracy of fine rule and photomask.So, by forming alignment mark on photomask, just can be from alignment mark essence Degree obtains position and the angle information of fine rule well.Thus situation, by using the alignment mark formed on photomask, just Can precision perform well para-position and determine polarizer polarization direction fine line region in the court of long side direction of fine rule To confirmation.
The assemble method of polarizer of the present invention at least includes para-position operation.
Hereinafter, the every operation for the assemble method of polarizer of the present invention is described in detail.
1. para-position operation
The para-position operation of the present invention is to utilize formed alignment mark on above-mentioned photomask, performs above-mentioned polarizer Para-position, and adjust the operation of the polarization direction of multiple above-mentioned polarizer.
It addition, the used polarizer of this operation and the alignment mark that formed on photomask because can be set to In above-mentioned " A. polarizer " item, described content is same, therefore does not repeats them here.
Perform the para-position of polarizer as this operation and adjust the method for polarization direction of multiple above-mentioned polarizer, As long as using the method for formed alignment mark on above-mentioned photomask, then there is no particular limitation, can take to use alignment The general alignment method etc. of labelling.
Multiple polarizers can be formed and be directed at above-mentioned such as in light aligning device on allocation position by said method The configuration side alignment mark that labelling is corresponding, then by the alignment mark of polarizer according to configuration side alignment mark on overlooking be Overlapping mode carries out the method etc. configured.
2. the assemble method of polarizer
The assemble method of polarizer of the present invention is to include above-mentioned para-position operation, but optionally may also comprise other works Sequence.
Above, though for polarizer, the manufacture method of polarizer, light aligning device and the polarizer of the present invention Assemble method, is described separately respective embodiment, but the present invention is not limited merely to above-mentioned embodiment.Above-mentioned embodiment Only terminate in illustration, such as with scope of the present invention patent described in technological thought have substantially identical composition, and reach same Action effect person, is all covered by the technical scope of the present invention.
[embodiment]
Embodiment illustrated below, carries out more specifically property for the present invention and illustrates.
[embodiment 1]
First, manufacture following test substrate, and measure the refractive index (n) under each wavelength and attenuation quotient (k), calculate rule Determine optical density during thickness.
(photomask formation)
Prepare the synthetic quartz glass of thickness 6.35mm on transparency carrier, use molybdenum and silicon mixing target (Mo:Si=1: 2mol%), in ar gas environment, utilize reactive sputtering method to form the molybdenum silicide film of thickness 60nm, just prepare test substrate.
It addition, above-mentioned thickness is to utilize VEECO company AFM device DIMENSION-X3D to be measured.
(refractive index and the mensuration of attenuation quotient)
For test substrate, utilize transmission-type elliptically polarized light instrument (Woollam company VUV-VASE), measure wavelength The refractive index (n) of 190nm～380nm ultraviolet light and attenuation quotient (k).Result is as shown in table 1.
[table 1]
Wavelength [nm] n k
190 1.141 2.726
200 1.323 2.876
220 1.723 3.094
240 2.114 3.211
260 2.479 3.274
280 2.835 3.287
300 3.170 3.241
320 3.463 3.145
340 3.705 3.020
360 3.901 2.885
380 4.058 2.748
(optical density)
According to refractive index (n) and attenuation quotient (k) shown in table 1, calculate the thickness of above-mentioned molybdenum silicide film be 60nm and Optical density (OD) during 100nm.Result is as shown in table 2.
[table 2]
Wavelength [nm] Dense 60nm Thickness 100nm
190 4.71 ＞ 7.00
200 4.77 ＞ 7.00
220 4.76 ＞ 7.00
240 4.61 ＞ 7.00
260 4.41 7.00
280 4.18 6.70
300 3.91 6.30
320 3.62 5.77
340 3.34 5.28
360 3.07 4.82
380 2.83 4.40
(evaluation of embodiment 1)
As shown in table 2, as long as the photomask of polarizer of the present invention can confirm that having thickness reaches the silication of more than 60nm Molybdenum film, then to more than 190nm and the ultraviolet light of below 380nm wavelength, have optical density and reach the light-proofness of more than 2.8.
It addition, can confirm that when photomask be reached by thickness the molybdenum silicide film of more than 100nm constitute time, just to 190nm with Go up and the ultraviolet light of below 380nm wavelength, there is optical density and reach the light-proofness of more than 4.4.
[embodiment 2]
Secondly, manufacture following polarizer, and measure the P ripple absorbance under each wavelength and S ripple absorbance, and calculate and disappear Light ratio.
(manufacture of polarizer)
As transparency carrier, prepare planar dimension 152mm × 152mm, the synthetic quartz glass of thickness 6.35mm, use molybdenum With silicon mixing target (Mo:Si=1:2mol%), under ar gas environment, reactive sputtering method is utilized to form the silicon of thickness 100nm Change molybdenum film.
Then, use chromium target, under ar gas environment, utilize reactive sputtering method, on above-mentioned molybdenum silicide film, form film The chromium film of thick 5nm.
Then, on above-mentioned chromium film, the electron sensitive resist (Japan ZEON company ZEP520) of coating eurymeric, carry out electricity Son bundle is described, and forms the corrosion-resisting pattern having thread pattern with photomask pattern.
Herein, above-mentioned thread pattern is lines and the intermittent pattern of spacing 100nm, above-mentioned lines and intermittent pattern entirety Planar dimension is 90mm × 100mm.In other words, the polarized regions planar dimension of polarizer becomes 90mm × 100mm.It addition, The length of the long side direction of fine rule is 90mm, becomes the form that fine rule is connected with photomask.
It addition, the inner edge of above-mentioned photomask pattern is consistent with the outer rim of above-mentioned polarized regions, and outer rim become 152mm × 152mm size.
It addition, the inner edge of photomask pattern is according to the direction relative to the lines with intermittent pattern constituting thread pattern, tool Have the mode in parallel edge with both vertical edges to be formed, and the intermittent pattern of above-mentioned lines and intermittent pattern according to Direction relative to lines Yu intermittent pattern, until it reaches parallel photomask inner edge (edge) place all becomes the side of clean width Formula is formed.
Then, it is used for etching mask by above-mentioned corrosion-resisting pattern, first passes through the dry-etching using chlorine with oxygen gas mixture, Chromium film is etched processing and forms chromium film figure, the most again to the molybdenum silicide film exposed from above-mentioned chromium film figure, pass through Use SF6The dry-etching of gas is processed, and then removes above-mentioned corrosion-resisting pattern and chromium film figure, just obtains and is being configured with carefully The polarized regions periphery of line, is formed with the polarizer of the embodiment 2 of photomask.
Fine rule width, thickness and the spacing of the polarizer of this embodiment 2, through using Vistec company SEM to measure dress Put LWM9000 with VEECO company AFM device DIMENSION-X3D to be measured, result be respectively 36nm, 100nm and 100nm。
(the structure evaluation of fine rule)
For the fine rule of polarizer and the photomask of embodiment 2, (Woollam is public to utilize transmission-type elliptically polarized light instrument Take charge of VUV-VASE processed) carry out the evaluation that constructs.
As a result, can confirm that above-mentioned fine rule has: width and thickness be respectively 31.8nm and 95.8nm molybdenum silicide film and The above thickness of above-mentioned molybdenum silicide film and the oxide-film being made up of silicon oxide of side thickness respectively 4.2nm and 4.2nm.
It addition, can confirm that above-mentioned photomask has: above the molybdenum silicide film of thickness 95.8nm and above-mentioned molybdenum silicide film The oxide-film being made up of silicon oxide of thickness 4.2nm.
(P ripple absorbance and the mensuration of S ripple absorbance)
For the polarizer of embodiment 2, utilize transmission-type elliptically polarized light instrument (Woollam company VUV-VASE), In the range of mensuration wavelength 200nm～400nm, (the P ripple in P wave component/incident illumination in injection light becomes the P ripple absorbance of ultraviolet light Point) and S ripple absorbance (the S wave component in S wave component/incident illumination in injection light), and calculate extinction ratio (P ripple transmission Rate/S ripple absorbance).Result is as shown in table 3 and Figure 11.
As shown in table 3 and Figure 11, in the range of wavelength 240nm～400nm, the P ripple absorbance of the polarizer of embodiment 2 Reaching more than 64.3%, extinction ratio reaches more than 55.1.
It addition, in the range of wavelength 240nm～260nm, the P ripple absorbance of the polarizer of embodiment 2 reach 64.3% with On, extinction ratio reaches more than 55.1.Additionally in the range of wavelength 355nm～375nm, the P ripple absorbance of the polarizer of embodiment 2 Reaching more than 77.1%, extinction ratio reaches more than 277.9.
[table 3]
(evaluation of embodiment 2)
As shown in table 3 and Figure 11, the polarizer of embodiment 2 has higher P ripple absorbance, and extinction ratio is excellent.
It addition, by the result of above-described embodiment 1, if can confirm that, having thickness reaches the molybdenum silicide film of more than 60nm, the most right More than 190nm and the ultraviolet light of below 380nm wavelength, just have optical density and reach the light-proofness of more than 2.8, because embodiment 2 The photomask of polarizer has the molybdenum silicide film that at least thickness is 95.8nm, thus it is the highest also can be evaluated as light-proofness.
[symbol description]
1 transparency carrier
2 fine rules
3 polarized regions
4 photomasks
5 inner edges
6 outer rims
7 alignment marks
8 fine rules
10,20 polarizer
31 polarizing material
31P polarized material pattern
32 layer of hard mask material
32P hard mask pattern
33 resist layers
34 corrosion-resisting patterns
34a thread pattern
34b photomask pattern
50,60 smooth aligning device
51,61 polarizer unit
52,62 ultra-violet lamp
53,63 reflecting mirror
54,64 polarized light
55,65 optical alignment film
56,66 workpiece
71,72 boundary portion
110,120 polarizer
112,122 fine rule
121 glass substrates

Claims (17)

1. a polarizer, it is characterised in that be have on radioparent transparency carrier configuration side by side to ultraviolet light a plurality of The polarizer of fine rule,
In the outside of the polarized regions being configured with described fine rule, it is formed with the photomask that described ultraviolet light is given shading.
Polarizer the most according to claim 1, it is characterised in that along the limit constituting described polarized regions outer rim It is formed with described photomask.
Polarizer the most according to claim 1 and 2, it is characterised in that formed in the periphery of described polarized regions State photomask.
4. according to the polarizer according to any one of claims 1 to 3, it is characterised in that be formed on described photomask Word, mark or alignment mark.
Polarizer the most according to claim 4, it is characterised in that described word, described mark or described alignment mark There is the composition configuring a plurality of fine rule side by side.
Polarizer the most according to claim 5, it is characterised in that described word, described mark or described alignment mark In the value of the S ripple absorbance to described ultraviolet light, be identical to the S ripple absorbance of described ultraviolet light with described polarized regions Value or less than value to the S ripple absorbance of described ultraviolet light in described polarized regions.
7. according to the polarizer according to any one of claim 1～6, it is characterised in that described fine rule and described photomask Connect.
8. according to the polarizer according to any one of right 1～7, it is characterised in that the material constituting described photomask contains Constitute the material of described fine rule.
9. according to the polarizer according to any one of claim 1～8, it is characterised in that constitute the material of described photomask It is made up of the material containing molybdenum silicide.
10. the manufacture method of a polarizer, it is characterised in that be that ultraviolet light is had tool on radioparent transparency carrier Having a plurality of fine rule and described ultraviolet light gives the manufacture method of polarizer of photomask of shading, this manufacture method includes:
Prepare to be formed the operation of the duplexer of the 1st material layer on described transparency carrier；
Described 1st material layer is formed the operation of resist layer；
Described resist layer is processed and forms the operation of the corrosion-resisting pattern with thread pattern and photomask pattern；And
Described corrosion-resisting pattern is used in etching mask, described 1st material layer is etched the operation of processing.
The manufacture method of 11. polarizers according to claim 10, it is characterised in that described resist layer is by eurymeric electronics Bundle resist is constituted,
The operation forming the corrosion-resisting pattern with described thread pattern and described photomask pattern comprises becoming composition described carefully The step of the resist layer irradiating electron beam of the position in the intermittent pattern portion in the lines of line chart case and intermittent pattern.
12. 1 kinds of light aligning devices, it is characterised in that be ultraviolet light to be carried out polarization and is irradiated in the light orientation of optical alignment film Device, possesses the polarizer according to any one of claim 1～9, by the described polarized regions of polarizer described in transmission Light be irradiated to described optical alignment film.
13. smooth aligning devices according to claim 12, it is characterised in that possess and have the machine making described optical alignment film move Structure；
On the moving direction of described optical alignment film and the direction the two direction orthogonal with the moving direction of described optical alignment film It is provided with multiple described polarizer；
The boundary portion between the plurality of polarizer adjacent on the direction orthogonal with the moving direction of described optical alignment film with The mode that is connected of seriality described multiple polarizers will not be configured with the moving direction of described optical alignment film.
14. 1 kinds of polarizers, it is characterised in that be that the light of the polarization direction being parallel to fine rule of incident ultraviolet light is given To cover, and make to be perpendicular to the light transmissive polarizer of the polarization direction of described fine rule,
A plurality of described fine rule is configured side by side described ultraviolet light being had on radioparent substrate；
The photomask that described ultraviolet light is given shading it is provided with in the region that described fine rule is configured the i.e. outside of fine line region；
And the edge of described photomask inner edge side to form direction parallel or vertical with the long side direction of described fine rule.
15. polarizers according to claim 14, it is characterised in that join described in being formed in the outside of described photomask It is equipped with region that is the 2nd fine line region of fine rule.
16. 1 kinds of light aligning devices, it is characterised in that be the light aligning device possessing and having multiple polarizer,
Described polarizer possesses and configures side by side a plurality of fine rule and be configured with outside the region i.e. fine line region of fine rule described in being formed at The photomask of side；
Multiple described polarizers do not contain described screening with the described polarizer of adjacent configuration between respective described fine line region The mode of light film configures.
The assemble method of 17. 1 kinds of polarizers, it is characterised in that multiple polarizers are assembled in the polarization of light aligning device The assemble method of element,
Described polarizer has the i.e. fine line region in region that configures side by side a plurality of fine rule and be configured with fine rule described in being formed at The photomask in outside；
Described method includes: utilize the alignment mark formed on described photomask, implements the para-position of described polarizer, simultaneously Adjust the para-position operation of the polarization direction of multiple described polarizer.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104834043A (en) * 2014-02-07 2015-08-12 株式会社V技术 Polarizer, polarized light irradiating apparatus and polarization axis direction adjustment method

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6766370B2 (en) * 2015-02-18 2020-10-14 大日本印刷株式会社 Polarizer, polarizer holder, and photoaligner
JP6884501B2 (en) * 2015-08-25 2021-06-09 大日本印刷株式会社 Polarizer
JP6270927B2 (en) * 2016-07-08 2018-01-31 日本エイアンドエル株式会社 Plating resin composition and plating molded product
JP2018017952A (en) * 2016-07-29 2018-02-01 ウシオ電機株式会社 Light projection apparatus and light projection method
JP2019109375A (en) * 2017-12-19 2019-07-04 セイコーエプソン株式会社 Polarization element, and manufacturing method for polarization element

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003131356A (en) * 2001-10-25 2003-05-09 Hitachi Ltd Method for manufacturing photomask and pattern exposure system
JP2004271558A (en) * 2003-03-05 2004-09-30 Ricoh Opt Ind Co Ltd Polarizing optical element and its manufacturing method
JP2006113583A (en) * 2004-10-11 2006-04-27 Samsung Electronics Co Ltd Apparatus and method for exposing circuit pattern, photomask used therein, design method of the same, illumination system and its embodiment method
JP2010078437A (en) * 2008-09-25 2010-04-08 Toshiba Corp Polarization state inspecting device and polarization state inspecting method
JP2011186394A (en) * 2010-03-11 2011-09-22 Toppan Printing Co Ltd Method for correction of white defect in mask pattern, and mask pattern
JP2011248284A (en) * 2010-05-31 2011-12-08 Sony Chemical & Information Device Corp Polarizing plate and method of manufacturing the same
JP2011253209A (en) * 2011-09-21 2011-12-15 Shin Etsu Chem Co Ltd Pattern transfer method and photomask

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534574B2 (en) 1972-11-10 1980-09-08
KR100732749B1 (en) * 2001-12-28 2007-06-27 주식회사 하이닉스반도체 Mask for Forming Minute Pattern
US20040174596A1 (en) * 2003-03-05 2004-09-09 Ricoh Optical Industries Co., Ltd. Polarization optical device and manufacturing method therefor
JP4506412B2 (en) * 2004-10-28 2010-07-21 ウシオ電機株式会社 Polarizing element unit and polarized light irradiation device
JP4815995B2 (en) * 2005-10-24 2011-11-16 ウシオ電機株式会社 Polarized light irradiation device for photo-alignment
JP4951960B2 (en) * 2005-12-22 2012-06-13 大日本印刷株式会社 Metal mask, metal mask position alignment method and apparatus
JP2007178763A (en) 2005-12-28 2007-07-12 Seiko Epson Corp Method for manufacturing optical element, liquid crystal device, and projection-type display device
JP2008083215A (en) * 2006-09-26 2008-04-10 Seiko Epson Corp Mask for manufacturing alignment layer and method of manufacturing liquid crystal device
JP5109520B2 (en) * 2007-07-27 2012-12-26 セイコーエプソン株式会社 Optical element, liquid crystal device, mother substrate for liquid crystal device, electronic device, and wire grid polarization element
JP4968165B2 (en) 2008-04-24 2012-07-04 ウシオ電機株式会社 Polarized light irradiation device for photo-alignment
EP2482104A2 (en) * 2009-09-22 2012-08-01 LG Chem, Ltd. High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof
JP2011203669A (en) * 2010-03-26 2011-10-13 Toppan Printing Co Ltd Polarizing exposure apparatus
JP5682437B2 (en) * 2010-09-07 2015-03-11 ソニー株式会社 Solid-state imaging device, solid-state imaging device, imaging apparatus, and polarizing element manufacturing method
US8873144B2 (en) * 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
JP5077465B2 (en) * 2011-07-14 2012-11-21 ウシオ電機株式会社 Polarized light irradiation device for photo-alignment
JP2013145863A (en) 2011-11-29 2013-07-25 Gigaphoton Inc Two-beam interference apparatus and two-beam interference exposure system
US8922890B2 (en) * 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
WO2013190681A1 (en) * 2012-06-21 2013-12-27 日立コンシューマエレクトロニクス株式会社 Optical element, production method for optical element, and optical device
JP6308816B2 (en) * 2013-03-07 2018-04-11 株式会社ブイ・テクノロジー Polarized light irradiation device for photo-alignment
JP5344105B1 (en) * 2013-03-08 2013-11-20 ウシオ電機株式会社 Polarizing light irradiation apparatus for photo-alignment and polarized light irradiation method for photo-alignment
JP6428171B2 (en) * 2013-11-13 2018-11-28 大日本印刷株式会社 Polarizer, polarizer substrate and optical alignment apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003131356A (en) * 2001-10-25 2003-05-09 Hitachi Ltd Method for manufacturing photomask and pattern exposure system
JP2004271558A (en) * 2003-03-05 2004-09-30 Ricoh Opt Ind Co Ltd Polarizing optical element and its manufacturing method
JP2006113583A (en) * 2004-10-11 2006-04-27 Samsung Electronics Co Ltd Apparatus and method for exposing circuit pattern, photomask used therein, design method of the same, illumination system and its embodiment method
JP2010078437A (en) * 2008-09-25 2010-04-08 Toshiba Corp Polarization state inspecting device and polarization state inspecting method
JP2011186394A (en) * 2010-03-11 2011-09-22 Toppan Printing Co Ltd Method for correction of white defect in mask pattern, and mask pattern
JP2011248284A (en) * 2010-05-31 2011-12-08 Sony Chemical & Information Device Corp Polarizing plate and method of manufacturing the same
JP2011253209A (en) * 2011-09-21 2011-12-15 Shin Etsu Chem Co Ltd Pattern transfer method and photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104834043A (en) * 2014-02-07 2015-08-12 株式会社V技术 Polarizer, polarized light irradiating apparatus and polarization axis direction adjustment method
CN104834043B (en) * 2014-02-07 2018-12-11 株式会社V技术 Polarized light illumination device

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