JPH04186244A - Photomask and exposure - Google Patents

Photomask and exposure

Info

Publication number
JPH04186244A
JPH04186244A JP31414890A JP31414890A JPH04186244A JP H04186244 A JPH04186244 A JP H04186244A JP 31414890 A JP31414890 A JP 31414890A JP 31414890 A JP31414890 A JP 31414890A JP H04186244 A JPH04186244 A JP H04186244A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
parts
shading
pattern
part
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31414890A
Other versions
JP3094439B2 (en )
Inventor
Shigeru Hirukawa
Masaomi Kameyama
Kyoichi Suwa
Nobutaka Umagome
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To prevent the remaining of a resist in an edge part by dividing a pattern into plural parts, endosing peripheries of transparent parts of respective patterns with a shading part, and adjoining the edge part, to which the shading part is facing, to the mutually different transparent parts.
CONSTITUTION: A grid-like mask pattern RP is formed with a transmission part G and shielding parts Cr in a pattern region PA enclosed with a shading belt LST. The pattern RP is divided into a pattern RP1 in a lateral direction and a pattern RP2 in a longitudinal direction, and is formed by alternately and repeatedly arranging shading parts Cr1 and Cr2 and the transmission part respectively. Transparent parts are formed with transparent parts H1 and H2, in which phase members π are provided, and transparent parts G1 and G2 having no π. Moreover two edge parts, faced with shading parts Cr1 and Cr2 corresponding to parts of the shielding parts Cr, are made to adjoin the mutually different transparent parts in this formation.
COPYRIGHT: (C)1992,JPO&Japio
JP31414890A 1990-11-21 1990-11-21 Exposure method Expired - Fee Related JP3094439B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31414890A JP3094439B2 (en) 1990-11-21 1990-11-21 Exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31414890A JP3094439B2 (en) 1990-11-21 1990-11-21 Exposure method

Publications (2)

Publication Number Publication Date
JPH04186244A true true JPH04186244A (en) 1992-07-03
JP3094439B2 JP3094439B2 (en) 2000-10-03

Family

ID=18049808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31414890A Expired - Fee Related JP3094439B2 (en) 1990-11-21 1990-11-21 Exposure method

Country Status (1)

Country Link
JP (1) JP3094439B2 (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5744268A (en) * 1996-09-06 1998-04-28 Mitsubishi Denki Kabushiki Kaisha Phase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift mask
US5958656A (en) * 1996-06-20 1999-09-28 Mitsubishi Denki Kabushiki Kaisha Pattern forming method using phase shift mask
US6265137B1 (en) 1997-04-07 2001-07-24 Nikon Corporation Exposure method and device producing method using the same
US6558881B2 (en) 1998-11-09 2003-05-06 Nec Corporation Method of exposing a lattice pattern onto a photo-resist film
JP2005517969A (en) * 2001-06-08 2005-06-16 ニューメリカル テクノロジーズ インコーポレイテッド Phase conflict resolution method for the photolithographic masks
US7629109B2 (en) 2001-06-08 2009-12-08 Synopsys, Inc. Exposure control for phase shifting photolithographic masks
US7739649B2 (en) 2000-07-05 2010-06-15 Synopsys, Inc. Design and layout of phase shifting photolithographic masks
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5958656A (en) * 1996-06-20 1999-09-28 Mitsubishi Denki Kabushiki Kaisha Pattern forming method using phase shift mask
US5744268A (en) * 1996-09-06 1998-04-28 Mitsubishi Denki Kabushiki Kaisha Phase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift mask
US6265137B1 (en) 1997-04-07 2001-07-24 Nikon Corporation Exposure method and device producing method using the same
US6558881B2 (en) 1998-11-09 2003-05-06 Nec Corporation Method of exposing a lattice pattern onto a photo-resist film
US7739649B2 (en) 2000-07-05 2010-06-15 Synopsys, Inc. Design and layout of phase shifting photolithographic masks
US8566757B2 (en) 2000-07-05 2013-10-22 Synopsys, Inc. Layout of phase shifting photolithographic masks with refined shifter shapes
JP2005517969A (en) * 2001-06-08 2005-06-16 ニューメリカル テクノロジーズ インコーポレイテッド Phase conflict resolution method for the photolithographic masks
US7629109B2 (en) 2001-06-08 2009-12-08 Synopsys, Inc. Exposure control for phase shifting photolithographic masks
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date Type
JP3094439B2 (en) 2000-10-03 grant

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees