TWI600968B - 著色硬化性樹脂組成物 - Google Patents

著色硬化性樹脂組成物 Download PDF

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Publication number
TWI600968B
TWI600968B TW105115482A TW105115482A TWI600968B TW I600968 B TWI600968 B TW I600968B TW 105115482 A TW105115482 A TW 105115482A TW 105115482 A TW105115482 A TW 105115482A TW I600968 B TWI600968 B TW I600968B
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TW
Taiwan
Prior art keywords
group
formula
compound
mass
hydrocarbon group
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Application number
TW105115482A
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English (en)
Chinese (zh)
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TW201631390A (zh
Inventor
市岡賢二
朴昭妍
Original Assignee
住友化學股份有限公司
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Publication of TW201631390A publication Critical patent/TW201631390A/zh
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Publication of TWI600968B publication Critical patent/TWI600968B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW105115482A 2011-08-05 2012-08-03 著色硬化性樹脂組成物 TWI600968B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011171720 2011-08-05
JP2011269974A JP5923960B2 (ja) 2011-08-05 2011-12-09 着色硬化性樹脂組成物

Publications (2)

Publication Number Publication Date
TW201631390A TW201631390A (zh) 2016-09-01
TWI600968B true TWI600968B (zh) 2017-10-01

Family

ID=48130569

Family Applications (2)

Application Number Title Priority Date Filing Date
TW105115482A TWI600968B (zh) 2011-08-05 2012-08-03 著色硬化性樹脂組成物
TW101127941A TWI540389B (zh) 2011-08-05 2012-08-03 著色硬化性樹脂組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW101127941A TWI540389B (zh) 2011-08-05 2012-08-03 著色硬化性樹脂組成物

Country Status (3)

Country Link
JP (2) JP5923960B2 (ja)
KR (1) KR101849456B1 (ja)
TW (2) TWI600968B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013036006A (ja) * 2011-08-11 2013-02-21 Sumitomo Chemical Co Ltd 化合物
JP5932435B2 (ja) * 2012-03-29 2016-06-08 サカタインクス株式会社 カラーフィルター用青色顔料分散組成物及びそれを含有するカラーフィルター用青色顔料分散レジスト組成物
JP6115281B2 (ja) * 2012-06-07 2017-04-19 Jsr株式会社 着色組成物、カラーフィルタ及び表示素子
JP6350335B2 (ja) * 2014-02-27 2018-07-04 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6601037B2 (ja) * 2014-07-29 2019-11-06 住友化学株式会社 着色硬化性樹脂組成物
JP6331940B2 (ja) * 2014-10-03 2018-05-30 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
TWI705109B (zh) * 2014-11-11 2020-09-21 日商住友化學股份有限公司 著色硬化性樹脂組合物
JP6551085B2 (ja) * 2015-09-09 2019-07-31 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
KR20230062678A (ko) * 2016-12-02 2023-05-09 미쯔비시 케미컬 주식회사 착색 감광성 수지 조성물, 안료 분산액, 격벽, 유기 전계 발광 소자, 화상 표시 장치 및 조명
JP6977679B2 (ja) * 2018-07-17 2021-12-08 三菱ケミカル株式会社 着色樹脂組成物、カラーフィルタ及び画像表示装置
JP7312015B2 (ja) * 2018-07-20 2023-07-20 東友ファインケム株式会社 着色硬化性樹脂組成物
CN115698853A (zh) * 2020-09-08 2023-02-03 三星Sdi株式会社 感光性树脂组成物及使用其制造的感光性树脂膜以及彩色滤光片

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62296167A (ja) * 1986-06-16 1987-12-23 Konica Corp 画像形成方法
JPH05255599A (ja) * 1992-03-11 1993-10-05 Mitsui Toatsu Chem Inc カラーフィルター用青色色素
US20040121249A1 (en) * 2002-11-01 2004-06-24 Kazuhiro Machiguchi Red-colored photosensitive composition and color filter comprising the same
TW201221520A (en) * 2010-06-28 2012-06-01 Fujifilm Corp Color composition for a color filter, color filter and production method thereof, anthraquinone compound, and liquid crystal display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3442173B2 (ja) * 1994-12-20 2003-09-02 日本化薬株式会社 カラーフィルタ用色素及びこれを含有するカラーレジスト、カラーフィルタ
JPH08327812A (ja) * 1995-06-01 1996-12-13 Canon Inc カラーフィルタ用インク、カラーフィルタ、カラーフィルタの製造方法および液晶パネル
JPH11223720A (ja) * 1998-02-04 1999-08-17 Kyodo Printing Co Ltd カラーフィルタおよび色パターン材料
JP2011032300A (ja) * 2009-07-29 2011-02-17 Sumitomo Chemical Co Ltd 着色硬化性樹脂組成物の製造方法
TWI444441B (zh) * 2009-09-25 2014-07-11 Toyo Ink Mfg Co 著色組成物及彩色濾光片

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62296167A (ja) * 1986-06-16 1987-12-23 Konica Corp 画像形成方法
JPH05255599A (ja) * 1992-03-11 1993-10-05 Mitsui Toatsu Chem Inc カラーフィルター用青色色素
US20040121249A1 (en) * 2002-11-01 2004-06-24 Kazuhiro Machiguchi Red-colored photosensitive composition and color filter comprising the same
TW201221520A (en) * 2010-06-28 2012-06-01 Fujifilm Corp Color composition for a color filter, color filter and production method thereof, anthraquinone compound, and liquid crystal display device

Also Published As

Publication number Publication date
JP2013053292A (ja) 2013-03-21
TW201631390A (zh) 2016-09-01
TW201324040A (zh) 2013-06-16
JP5923960B2 (ja) 2016-05-25
KR20160075437A (ko) 2016-06-29
JP6172323B2 (ja) 2017-08-02
TWI540389B (zh) 2016-07-01
KR101849456B1 (ko) 2018-04-16
JP2016172861A (ja) 2016-09-29

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