KR101849456B1 - 착색 경화성 수지 조성물 - Google Patents
착색 경화성 수지 조성물 Download PDFInfo
- Publication number
- KR101849456B1 KR101849456B1 KR1020160072593A KR20160072593A KR101849456B1 KR 101849456 B1 KR101849456 B1 KR 101849456B1 KR 1020160072593 A KR1020160072593 A KR 1020160072593A KR 20160072593 A KR20160072593 A KR 20160072593A KR 101849456 B1 KR101849456 B1 KR 101849456B1
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- South Korea
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- carbon atoms
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- 0 *c(ccc([N+])c1C(c2ccccc22)=O)c1C2=O Chemical compound *c(ccc([N+])c1C(c2ccccc22)=O)c1C2=O 0.000 description 5
- GRGUGHOMWLKRBP-UHFFFAOYSA-O OC1C(C2)C(CC3[OH+]C33)C3C2C1 Chemical compound OC1C(C2)C(CC3[OH+]C33)C3C2C1 GRGUGHOMWLKRBP-UHFFFAOYSA-O 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2011-171720 | 2011-08-05 | ||
JP2011171720 | 2011-08-05 | ||
JP2011269974A JP5923960B2 (ja) | 2011-08-05 | 2011-12-09 | 着色硬化性樹脂組成物 |
JPJP-P-2011-269974 | 2011-12-09 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020120084262A Division KR101632461B1 (ko) | 2011-08-05 | 2012-08-01 | 착색 경화성 수지 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160075437A KR20160075437A (ko) | 2016-06-29 |
KR101849456B1 true KR101849456B1 (ko) | 2018-04-16 |
Family
ID=48130569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160072593A KR101849456B1 (ko) | 2011-08-05 | 2016-06-10 | 착색 경화성 수지 조성물 |
Country Status (3)
Country | Link |
---|---|
JP (2) | JP5923960B2 (ja) |
KR (1) | KR101849456B1 (ja) |
TW (2) | TWI600968B (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013036006A (ja) * | 2011-08-11 | 2013-02-21 | Sumitomo Chemical Co Ltd | 化合物 |
JP5932435B2 (ja) * | 2012-03-29 | 2016-06-08 | サカタインクス株式会社 | カラーフィルター用青色顔料分散組成物及びそれを含有するカラーフィルター用青色顔料分散レジスト組成物 |
JP6115281B2 (ja) * | 2012-06-07 | 2017-04-19 | Jsr株式会社 | 着色組成物、カラーフィルタ及び表示素子 |
JP6350335B2 (ja) * | 2014-02-27 | 2018-07-04 | Jsr株式会社 | 着色組成物、着色硬化膜及び表示素子 |
JP6601037B2 (ja) * | 2014-07-29 | 2019-11-06 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
JP6331940B2 (ja) * | 2014-10-03 | 2018-05-30 | 東洋インキScホールディングス株式会社 | カラーフィルタ用着色組成物及びカラーフィルタ |
TWI705109B (zh) * | 2014-11-11 | 2020-09-21 | 日商住友化學股份有限公司 | 著色硬化性樹脂組合物 |
JP6551085B2 (ja) * | 2015-09-09 | 2019-07-31 | 東洋インキScホールディングス株式会社 | カラーフィルタ用着色組成物及びカラーフィルタ |
KR20230062678A (ko) * | 2016-12-02 | 2023-05-09 | 미쯔비시 케미컬 주식회사 | 착색 감광성 수지 조성물, 안료 분산액, 격벽, 유기 전계 발광 소자, 화상 표시 장치 및 조명 |
JP6977679B2 (ja) * | 2018-07-17 | 2021-12-08 | 三菱ケミカル株式会社 | 着色樹脂組成物、カラーフィルタ及び画像表示装置 |
JP7312015B2 (ja) * | 2018-07-20 | 2023-07-20 | 東友ファインケム株式会社 | 着色硬化性樹脂組成物 |
CN115698853A (zh) * | 2020-09-08 | 2023-02-03 | 三星Sdi株式会社 | 感光性树脂组成物及使用其制造的感光性树脂膜以及彩色滤光片 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011032300A (ja) * | 2009-07-29 | 2011-02-17 | Sumitomo Chemical Co Ltd | 着色硬化性樹脂組成物の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62296167A (ja) * | 1986-06-16 | 1987-12-23 | Konica Corp | 画像形成方法 |
JP3229642B2 (ja) * | 1992-03-11 | 2001-11-19 | 三井化学株式会社 | カラーフィルター用青色色素 |
JP3442173B2 (ja) * | 1994-12-20 | 2003-09-02 | 日本化薬株式会社 | カラーフィルタ用色素及びこれを含有するカラーレジスト、カラーフィルタ |
JPH08327812A (ja) * | 1995-06-01 | 1996-12-13 | Canon Inc | カラーフィルタ用インク、カラーフィルタ、カラーフィルタの製造方法および液晶パネル |
JPH11223720A (ja) * | 1998-02-04 | 1999-08-17 | Kyodo Printing Co Ltd | カラーフィルタおよび色パターン材料 |
KR20040038863A (ko) * | 2002-11-01 | 2004-05-08 | 스미또모 가가꾸 고오교오 가부시끼가이샤 | 적색 착색 감광성 조성물 및 그것을 함유하는 칼라 필터 |
TWI444441B (zh) * | 2009-09-25 | 2014-07-11 | Toyo Ink Mfg Co | 著色組成物及彩色濾光片 |
JP2012093696A (ja) * | 2010-06-28 | 2012-05-17 | Fujifilm Corp | カラーフィルタ用着色組成物、カラーフィルタ及びその製造方法、アントラキノン化合物、並びに液晶表示装置 |
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2011
- 2011-12-09 JP JP2011269974A patent/JP5923960B2/ja active Active
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2012
- 2012-08-03 TW TW105115482A patent/TWI600968B/zh active
- 2012-08-03 TW TW101127941A patent/TWI540389B/zh active
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2016
- 2016-04-21 JP JP2016085028A patent/JP6172323B2/ja active Active
- 2016-06-10 KR KR1020160072593A patent/KR101849456B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011032300A (ja) * | 2009-07-29 | 2011-02-17 | Sumitomo Chemical Co Ltd | 着色硬化性樹脂組成物の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2013053292A (ja) | 2013-03-21 |
TW201631390A (zh) | 2016-09-01 |
TW201324040A (zh) | 2013-06-16 |
JP5923960B2 (ja) | 2016-05-25 |
KR20160075437A (ko) | 2016-06-29 |
JP6172323B2 (ja) | 2017-08-02 |
TWI600968B (zh) | 2017-10-01 |
TWI540389B (zh) | 2016-07-01 |
JP2016172861A (ja) | 2016-09-29 |
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