TWI584404B - 基板搬送方法及基板搬送裝置 - Google Patents

基板搬送方法及基板搬送裝置 Download PDF

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Publication number
TWI584404B
TWI584404B TW102104302A TW102104302A TWI584404B TW I584404 B TWI584404 B TW I584404B TW 102104302 A TW102104302 A TW 102104302A TW 102104302 A TW102104302 A TW 102104302A TW I584404 B TWI584404 B TW I584404B
Authority
TW
Taiwan
Prior art keywords
substrate
pedestal
wafer
resin
temperature
Prior art date
Application number
TW102104302A
Other languages
English (en)
Chinese (zh)
Other versions
TW201351558A (zh
Inventor
山本雅之
長谷幸敏
Original Assignee
日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日東電工股份有限公司 filed Critical 日東電工股份有限公司
Publication of TW201351558A publication Critical patent/TW201351558A/zh
Application granted granted Critical
Publication of TWI584404B publication Critical patent/TWI584404B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93—Batch processes
    • H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/12—Passive devices, e.g. 2 terminal devices
    • H01L2924/1204—Optical Diode
    • H01L2924/12041—LED
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/12—Passive devices, e.g. 2 terminal devices
    • H01L2924/1204—Optical Diode
    • H01L2924/12042—LASER
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/156—Material
    • H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15788—Glasses, e.g. amorphous oxides, nitrides or fluorides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30—Technical effects
    • H01L2924/35—Mechanical effects
    • H01L2924/351—Thermal stress
    • H01L2924/3511—Warping

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW102104302A 2012-02-06 2013-02-05 基板搬送方法及基板搬送裝置 TWI584404B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012023009A JP5959216B2 (ja) 2012-02-06 2012-02-06 基板搬送方法および基板搬送装置

Publications (2)

Publication Number Publication Date
TW201351558A TW201351558A (zh) 2013-12-16
TWI584404B true TWI584404B (zh) 2017-05-21

Family

ID=47721908

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102104302A TWI584404B (zh) 2012-02-06 2013-02-05 基板搬送方法及基板搬送裝置

Country Status (5)

Country Link
EP (1) EP2624292B1 (enExample)
JP (1) JP5959216B2 (enExample)
KR (1) KR20130090827A (enExample)
PT (1) PT2624292E (enExample)
TW (1) TWI584404B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101940580B1 (ko) * 2012-05-24 2019-01-22 에이씨엠 리서치 (상하이) 인코포레이티드 로드록 챔버와, 그를 이용하여 기판을 처리하는 방법
KR101455205B1 (ko) * 2014-04-29 2014-10-27 주식회사 다이나테크 교정장치
JP6322083B2 (ja) * 2014-08-08 2018-05-09 日東電工株式会社 半導体ウエハの冷却方法および半導体ウエハの冷却装置
JP6811951B2 (ja) * 2017-02-03 2021-01-13 株式会社ディスコ 搬送機構
JP7112220B2 (ja) * 2017-05-12 2022-08-03 キヤノン株式会社 方法、装置、システム、および物品の製造方法
JP7061012B2 (ja) * 2018-05-01 2022-04-27 株式会社ディスコ 加工装置
JP7282467B2 (ja) * 2019-08-14 2023-05-29 株式会社ディスコ 加工装置
KR102235146B1 (ko) * 2019-10-08 2021-04-02 리얼룩앤컴퍼니 주식회사 냉각 성능이 개선된 3d 포밍필름 제조 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0542657A (ja) * 1991-08-08 1993-02-23 Toshiba Corp 基板位置決め方法
JPH11168131A (ja) * 1997-12-04 1999-06-22 Nec Kyushu Ltd ウエハ搬送チャック
US20030092252A1 (en) * 2000-04-24 2003-05-15 Kazuo Nishiyama Chip-like electronic components, a method of manufacturing the same, a pseudo wafer therefor and a method of manufacturing thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6378546A (ja) * 1986-09-22 1988-04-08 Hitachi Ltd ウエハハンドリング装置
JP3442253B2 (ja) * 1997-03-13 2003-09-02 東京エレクトロン株式会社 基板処理装置
JP4592270B2 (ja) 2003-10-06 2010-12-01 日東電工株式会社 半導体ウエハの支持材からの剥離方法およびこれを用いた装置
JP2007317822A (ja) * 2006-05-25 2007-12-06 Sony Corp 基板処理方法及び半導体装置の製造方法
JP2008053432A (ja) * 2006-08-24 2008-03-06 Disco Abrasive Syst Ltd ウエーハ加工装置
DE102008041250A1 (de) * 2008-08-13 2010-02-25 Ers Electronic Gmbh Verfahren und Vorrichtung zum thermischen Bearbeiten von Kunststoffscheiben, insbesondere Moldwafern
JP5090536B2 (ja) * 2008-11-21 2012-12-05 芝浦メカトロニクス株式会社 基板処理方法及び基板処理装置
JP5549185B2 (ja) * 2009-11-06 2014-07-16 株式会社ニコン 半導体デバイスの製造方法および基板貼り合せ装置
JP2011151149A (ja) 2010-01-20 2011-08-04 Tdk Corp 積層型電子部品の製造方法
JP5543813B2 (ja) * 2010-03-23 2014-07-09 日東電工株式会社 ワーク搬送方法およびワーク搬送装置
JP2012186245A (ja) * 2011-03-04 2012-09-27 Tokyo Electron Ltd 接合装置、接合システム、接合方法、プログラム及びコンピュータ記憶媒体
JP2011223014A (ja) * 2011-06-02 2011-11-04 Furukawa Electric Co Ltd:The チップ保護用フィルム

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0542657A (ja) * 1991-08-08 1993-02-23 Toshiba Corp 基板位置決め方法
JPH11168131A (ja) * 1997-12-04 1999-06-22 Nec Kyushu Ltd ウエハ搬送チャック
US20030092252A1 (en) * 2000-04-24 2003-05-15 Kazuo Nishiyama Chip-like electronic components, a method of manufacturing the same, a pseudo wafer therefor and a method of manufacturing thereof

Also Published As

Publication number Publication date
PT2624292E (pt) 2015-05-20
JP5959216B2 (ja) 2016-08-02
EP2624292B1 (en) 2015-04-22
EP2624292A1 (en) 2013-08-07
TW201351558A (zh) 2013-12-16
JP2013161958A (ja) 2013-08-19
KR20130090827A (ko) 2013-08-14

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