TWI554338B - 圖案形成方法、附透明導電膜基材、畫像顯示裝置及畫像顯示用電子機器 - Google Patents

圖案形成方法、附透明導電膜基材、畫像顯示裝置及畫像顯示用電子機器 Download PDF

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Publication number
TWI554338B
TWI554338B TW104120663A TW104120663A TWI554338B TW I554338 B TWI554338 B TW I554338B TW 104120663 A TW104120663 A TW 104120663A TW 104120663 A TW104120663 A TW 104120663A TW I554338 B TWI554338 B TW I554338B
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TW
Taiwan
Prior art keywords
pattern
liquid
linear liquid
substrate
parallel line
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TW104120663A
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English (en)
Chinese (zh)
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TW201617140A (zh
Inventor
新妻直人
大屋秀信
山內正好
小俣猛憲
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柯尼卡美能達股份有限公司
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Publication of TW201617140A publication Critical patent/TW201617140A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
TW104120663A 2014-06-25 2015-06-25 圖案形成方法、附透明導電膜基材、畫像顯示裝置及畫像顯示用電子機器 TWI554338B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014130804 2014-06-25
JP2014165035 2014-08-13
JP2015040138 2015-03-02

Publications (2)

Publication Number Publication Date
TW201617140A TW201617140A (zh) 2016-05-16
TWI554338B true TWI554338B (zh) 2016-10-21

Family

ID=54938281

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104120663A TWI554338B (zh) 2014-06-25 2015-06-25 圖案形成方法、附透明導電膜基材、畫像顯示裝置及畫像顯示用電子機器

Country Status (5)

Country Link
JP (1) JP6540698B2 (ja)
KR (1) KR101779738B1 (ja)
CN (1) CN106457297B (ja)
TW (1) TWI554338B (ja)
WO (1) WO2015199204A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102003625B1 (ko) * 2015-03-02 2019-07-24 코니카 미놀타 가부시키가이샤 패턴 형성 방법, 투명 도전막을 구비한 기재, 디바이스 및 전자 기기
JP6406078B2 (ja) * 2015-03-14 2018-10-17 コニカミノルタ株式会社 パターン形成装置及びパターン形成方法
JP6862041B2 (ja) * 2016-08-10 2021-04-21 住友重機械工業株式会社 膜形成方法及び膜形成装置
CN106782748B (zh) * 2017-03-03 2018-04-24 东南大学 一种制作银纳米线柔性透明导电薄膜的方法
JP7096656B2 (ja) * 2017-09-29 2022-07-06 マクセル株式会社 コーティング組成物、導電性膜、タッチパネル及び製造方法
CN108008862B (zh) * 2017-12-19 2020-10-23 上海天马微电子有限公司 触控膜层、触控面板及其触控显示装置
US20220332052A1 (en) * 2019-09-24 2022-10-20 Fuji Corporation Image processing device, image processing method, and program

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW561106B (en) * 2001-07-04 2003-11-11 Seiko Epson Corp Method and apparatus for manufacturing color filter, liquid crystal display apparatus, electroluminescent substrate, electroluminescent device and film, optical apparatus and its manufacturing method, and electronic machine
TW200800609A (en) * 2006-02-20 2008-01-01 Daicel Chem Porous membrane film and laminate using the same
JP2008033284A (ja) * 2006-07-04 2008-02-14 Semiconductor Energy Lab Co Ltd 表示装置の作製方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4325343B2 (ja) 2003-09-25 2009-09-02 セイコーエプソン株式会社 膜形成方法およびデバイス製造方法
JP4096868B2 (ja) * 2003-11-25 2008-06-04 セイコーエプソン株式会社 膜形成方法、デバイス製造方法および電気光学装置
JP2008176009A (ja) * 2007-01-18 2008-07-31 Seiko Epson Corp パターン形成方法
EP2496661B1 (en) 2009-11-02 2018-07-11 Yissum Research Development Company of the Hebrew University of Jerusalem, Ltd. Transparent conductive coatings for optoelectronic and electronic devices
JP5467957B2 (ja) * 2010-07-15 2014-04-09 富士フイルム株式会社 線描画方法及び装置
WO2013011775A1 (ja) * 2011-07-15 2013-01-24 住友重機械工業株式会社 薄膜形成方法及び薄膜形成装置
US9147505B2 (en) * 2011-11-02 2015-09-29 Ut-Battelle, Llc Large area controlled assembly of transparent conductive networks
JP6160040B2 (ja) 2012-08-20 2017-07-12 コニカミノルタ株式会社 導電性材料を含む平行線パターンの形成方法及び透明導電膜付き基材の形成方法
KR101792585B1 (ko) * 2012-08-20 2017-11-02 코니카 미놀타 가부시키가이샤 도전성 재료를 포함하는 평행선 패턴, 평행선 패턴 형성 방법, 투명 도전막을 구비한 기재, 디바이스 및 전자 기기
WO2015111731A1 (ja) 2014-01-24 2015-07-30 コニカミノルタ株式会社 パターン形成方法、透明導電膜付き基材、デバイス及び電子機器
JP6331457B2 (ja) * 2014-02-20 2018-05-30 コニカミノルタ株式会社 塗膜形成方法、透明導電膜付き基材、デバイス及び電子機器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW561106B (en) * 2001-07-04 2003-11-11 Seiko Epson Corp Method and apparatus for manufacturing color filter, liquid crystal display apparatus, electroluminescent substrate, electroluminescent device and film, optical apparatus and its manufacturing method, and electronic machine
TW200800609A (en) * 2006-02-20 2008-01-01 Daicel Chem Porous membrane film and laminate using the same
JP2008033284A (ja) * 2006-07-04 2008-02-14 Semiconductor Energy Lab Co Ltd 表示装置の作製方法

Also Published As

Publication number Publication date
TW201617140A (zh) 2016-05-16
KR101779738B1 (ko) 2017-09-18
CN106457297A (zh) 2017-02-22
CN106457297B (zh) 2019-11-01
JPWO2015199204A1 (ja) 2017-04-20
JP6540698B2 (ja) 2019-07-10
KR20160147874A (ko) 2016-12-23
WO2015199204A1 (ja) 2015-12-30

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