TWI547978B - 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備 - Google Patents

用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備 Download PDF

Info

Publication number
TWI547978B
TWI547978B TW101120494A TW101120494A TWI547978B TW I547978 B TWI547978 B TW I547978B TW 101120494 A TW101120494 A TW 101120494A TW 101120494 A TW101120494 A TW 101120494A TW I547978 B TWI547978 B TW I547978B
Authority
TW
Taiwan
Prior art keywords
pulse
energy
substrate
laser
pulses
Prior art date
Application number
TW101120494A
Other languages
English (en)
Chinese (zh)
Other versions
TW201303977A (zh
Inventor
莫非特史帝夫
霍姆葛倫道格拉斯E
赫威爾斯山謬C
童艾德瑞克
亞當布魯斯E
李吉平
杭特亞倫穆爾
Original Assignee
應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 應用材料股份有限公司 filed Critical 應用材料股份有限公司
Publication of TW201303977A publication Critical patent/TW201303977A/zh
Application granted granted Critical
Publication of TWI547978B publication Critical patent/TWI547978B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03—Observing, e.g. monitoring, the workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03—Observing, e.g. monitoring, the workpiece
    • B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure
    • B23K26/127—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure in an enclosure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
    • H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic materials other than metals or composite materials
    • B23K2103/56—Inorganic materials other than metals or composite materials being semiconducting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/14—Arrangements of heating devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laser Beam Processing (AREA)
  • Recrystallisation Techniques (AREA)
  • Electromagnetism (AREA)
TW101120494A 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備 TWI547978B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161500727P 2011-06-24 2011-06-24
US13/194,552 US20120325784A1 (en) 2011-06-24 2011-07-29 Novel thermal processing apparatus
US13/194,775 US8569187B2 (en) 2011-06-24 2011-07-29 Thermal processing apparatus

Publications (2)

Publication Number Publication Date
TW201303977A TW201303977A (zh) 2013-01-16
TWI547978B true TWI547978B (zh) 2016-09-01

Family

ID=47360854

Family Applications (4)

Application Number Title Priority Date Filing Date
TW101120494A TWI547978B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備
TW105115758A TWI600063B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備
TW107145005A TWI700736B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備
TW106128051A TWI654669B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝 之設備

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW105115758A TWI600063B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備
TW107145005A TWI700736B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備
TW106128051A TWI654669B (zh) 2011-06-24 2012-06-07 用於熱處理基材之設備與系統以及用於組合電磁能脈衝 之設備

Country Status (7)

Country Link
US (3) US20120325784A1 (OSRAM)
EP (1) EP2724364B1 (OSRAM)
JP (3) JP6096184B2 (OSRAM)
KR (1) KR101987398B1 (OSRAM)
CN (2) CN103597587B (OSRAM)
TW (4) TWI547978B (OSRAM)
WO (1) WO2012177743A2 (OSRAM)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9498845B2 (en) * 2007-11-08 2016-11-22 Applied Materials, Inc. Pulse train annealing method and apparatus
US20120325784A1 (en) * 2011-06-24 2012-12-27 Applied Materials, Inc. Novel thermal processing apparatus
FR2989388B1 (fr) * 2012-04-17 2019-10-18 Saint-Gobain Glass France Procede d'obtention d'un substrat muni d'un revetement
CN104160489A (zh) * 2012-04-18 2014-11-19 应用材料公司 先进退火工艺中减少颗粒的设备和方法
US9390926B2 (en) 2013-03-11 2016-07-12 Applied Materials, Inc. Process sheet resistance uniformity improvement using multiple melt laser exposures
WO2014143327A1 (en) * 2013-03-11 2014-09-18 Applied Materials, Inc. Apparatus for speckle reduction, pulse stretching, and beam homogenization
KR102091652B1 (ko) 2013-03-12 2020-03-20 어플라이드 머티어리얼스, 인코포레이티드 레이저 어닐링 시스템들에서의 에지 프로파일의 제어를 위한 맞춤화된 퍼필 스톱 장치
JP6270820B2 (ja) * 2013-03-27 2018-01-31 国立大学法人九州大学 レーザアニール装置
KR20160042434A (ko) 2013-08-08 2016-04-19 어플라이드 머티어리얼스, 인코포레이티드 디플리션 빔을 이용한 서브-미크론 피쳐 형성을 위한 반응물의 포토닉 활성화
WO2015023791A1 (en) 2013-08-16 2015-02-19 Applied Materials, Inc. Dynamic optical valve for mitigating non-uniform heating in laser processing
US9889524B2 (en) * 2014-03-05 2018-02-13 TeraDiode, Inc. Polarization-adjusted beam operation for materials processing
US11204506B2 (en) * 2014-03-05 2021-12-21 TeraDiode, Inc. Polarization-adjusted and shape-adjusted beam operation for materials processing
JP6430142B2 (ja) * 2014-04-25 2018-11-28 浜松ホトニクス株式会社 レーザ加工モニタ及びレーザ加工装置
US10239155B1 (en) * 2014-04-30 2019-03-26 The Boeing Company Multiple laser beam processing
KR20170037633A (ko) * 2014-07-21 2017-04-04 어플라이드 머티어리얼스, 인코포레이티드 스캐닝형 펄스 어닐링 장치 및 방법
US10095114B2 (en) 2014-11-14 2018-10-09 Applied Materials, Inc. Process chamber for field guided exposure and method for implementing the process chamber
CN106158609B (zh) * 2015-03-31 2019-07-23 上海微电子装备(集团)股份有限公司 一种激光退火装置及其退火方法
US9864276B2 (en) 2015-04-07 2018-01-09 Applied Materials, Inc. Laser annealing and electric field
US11691341B2 (en) 2015-10-30 2023-07-04 Seurat Technologies, Inc. Part manipulation using printed manipulation points
CN109564857B (zh) * 2016-09-06 2023-05-16 极光先进雷射株式会社 激光装置和激光退火装置
KR102406333B1 (ko) * 2016-11-18 2022-06-08 아이피지 포토닉스 코포레이션 재료 가공 레이저 시스템 및 방법
US10012544B2 (en) * 2016-11-29 2018-07-03 Cymer, Llc Homogenization of light beam for spectral feature metrology
DE112018000643T5 (de) * 2017-02-02 2019-11-14 Mitsubishi Electric Corporation Wärmebehandlungseinrichtung, wärmebehandlungsverfahren und verfahren zum herstellen einer halbleitervorrichtung
CN107886823B (zh) * 2017-11-15 2024-05-10 中国工程物理研究院电子工程研究所 一种优化集成式单光路激光电离效应模拟系统
JP7254444B2 (ja) * 2018-02-13 2023-04-10 旭化成株式会社 金属配線の製造方法及び金属配線製造装置
JP7048372B2 (ja) * 2018-03-20 2022-04-05 株式会社Screenホールディングス 熱処理装置および熱処理方法
CN112385028B (zh) * 2018-04-12 2024-06-25 玛特森技术公司 低热量预算退火
US11650506B2 (en) 2019-01-18 2023-05-16 Applied Materials Inc. Film structure for electric field guided photoresist patterning process
EP3685954B1 (en) * 2019-01-22 2024-01-24 Synova S.A. Method for cutting a workpiece with a complex fluid-jet-guided laser beam
CN110767576B (zh) * 2019-10-17 2022-10-21 上海华力集成电路制造有限公司 激光退火设备及激光退火工艺
GB2593456B (en) * 2020-03-18 2024-02-28 Thermo Fisher Scient Ecublens Sarl Double-pulse laser system
US11429026B2 (en) 2020-03-20 2022-08-30 Applied Materials, Inc. Lithography process window enhancement for photoresist patterning
US11909091B2 (en) 2020-05-19 2024-02-20 Kymeta Corporation Expansion compensation structure for an antenna
KR102875674B1 (ko) * 2020-07-21 2025-10-23 삼성디스플레이 주식회사 레이저 장치 및 표시 장치의 제조 방법
US12162074B2 (en) 2020-11-25 2024-12-10 Lawrence Livermore National Security, Llc System and method for large-area pulsed laser melting of metallic powder in a laser powder bed fusion application
WO2022205082A1 (en) * 2021-03-31 2022-10-06 Yangtze Memory Technologies Co., Ltd. Laser system for dicing semiconductor structure and operation method thereof
US12594623B2 (en) 2021-11-03 2026-04-07 Samsung Display Co., Ltd. Laser annealing apparatus and laser annealing method using the same
JP2024020801A (ja) * 2022-08-02 2024-02-15 株式会社ディスコ レーザ加工装置
JP7819151B2 (ja) * 2023-05-31 2026-02-24 三菱電機株式会社 半導体製造装置及び半導体装置の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6366308B1 (en) * 2000-02-16 2002-04-02 Ultratech Stepper, Inc. Laser thermal processing apparatus and method
TW533467B (en) * 2001-03-29 2003-05-21 Gsi Lumonics Corp Methods and systems for processing a device, methods and systems for modeling same and the device
US20090032511A1 (en) * 2007-07-31 2009-02-05 Adams Bruce E Apparatus and method of improving beam shaping and beam homogenization
US20090200279A1 (en) * 2008-02-11 2009-08-13 Jiping Li Automatic focus and emissivity measurements for a substrate system
TW201008061A (en) * 2008-02-07 2010-02-16 Zeiss Carl Laser Optics Gmbh Illuminating apparatus and method for controlling energy of a laser source
US7919348B2 (en) * 2008-06-13 2011-04-05 Aptina Imaging Corporation Methods for protecting imaging elements of photoimagers during back side processing

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4663513A (en) * 1985-11-26 1987-05-05 Spectra-Physics, Inc. Method and apparatus for monitoring laser processes
US5552892A (en) 1994-05-24 1996-09-03 Nikon Corporation Illumination optical system, alignment apparatus, and projection exposure apparatus using the same
JP3435247B2 (ja) * 1995-02-28 2003-08-11 株式会社東芝 レーザ光照射装置及びレーザ光照射方法
US5975703A (en) * 1996-09-30 1999-11-02 Digital Optics International Image projection system
JP4322373B2 (ja) * 1999-11-15 2009-08-26 日本電気株式会社 膜体部改質装置及び膜体部改質方法
JP3903761B2 (ja) 2001-10-10 2007-04-11 株式会社日立製作所 レ−ザアニ−ル方法およびレ−ザアニ−ル装置
JP2003124137A (ja) 2001-10-10 2003-04-25 Fujitsu Ltd 半導体製造装置
JP2004063924A (ja) 2002-07-31 2004-02-26 Mitsubishi Heavy Ind Ltd レーザアニール方法及び装置
US6747245B2 (en) 2002-11-06 2004-06-08 Ultratech Stepper, Inc. Laser scanning apparatus and methods for thermal processing
SG137674A1 (en) * 2003-04-24 2007-12-28 Semiconductor Energy Lab Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
CN100564592C (zh) * 2003-09-19 2009-12-02 应用材料公司 对无电沉积的终点进行检测的装置和方法
JP2005116729A (ja) 2003-10-07 2005-04-28 Sharp Corp レーザ加工装置およびレーザ加工方法
US7813406B1 (en) 2003-10-15 2010-10-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Temporal laser pulse manipulation using multiple optical ring-cavities
WO2005074002A2 (en) * 2004-01-29 2005-08-11 Applied Materials Israel, Ltd. Focusing system and method for a charged particle imaging system
JP4610201B2 (ja) * 2004-01-30 2011-01-12 住友重機械工業株式会社 レーザ照射装置
US8110775B2 (en) 2004-06-18 2012-02-07 Electro Scientific Industries, Inc. Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing
US20090011614A1 (en) * 2004-06-18 2009-01-08 Electro Scientific Industries, Inc. Reconfigurable semiconductor structure processing using multiple laser beam spots
US20060114948A1 (en) * 2004-11-29 2006-06-01 Lo Ho W Workpiece processing system using a common imaged optical assembly to shape the spatial distributions of light energy of multiple laser beams
JP2006185933A (ja) * 2004-12-24 2006-07-13 Advanced Lcd Technologies Development Center Co Ltd レーザアニール方法およびレーザアニール装置
US7279721B2 (en) 2005-04-13 2007-10-09 Applied Materials, Inc. Dual wavelength thermal flux laser anneal
JP2006344844A (ja) * 2005-06-10 2006-12-21 Sony Corp レーザ処理装置
JP2007059431A (ja) 2005-08-22 2007-03-08 Mitsubishi Electric Corp 半導体装置の製造方法及びレーザ加工装置
JP4956987B2 (ja) 2005-12-16 2012-06-20 株式会社島津製作所 レーザー結晶化装置及び結晶化方法
US20070221640A1 (en) 2006-03-08 2007-09-27 Dean Jennings Apparatus for thermal processing structures formed on a substrate
JP5384331B2 (ja) * 2006-06-01 2014-01-08 ユニベルシテ・ド・リエージュ 表面プラズモン共鳴に基づくセンサ
JP5000944B2 (ja) * 2006-08-02 2012-08-15 株式会社ディスコ レーザー加工装置のアライメント方法
JP4677392B2 (ja) 2006-10-30 2011-04-27 住友重機械工業株式会社 パルスレーザ熱処理装置とその制御方法
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
US20080316748A1 (en) * 2007-06-21 2008-12-25 Carl Zeiss Laser Optics Gmbh Illumination system
US20090034072A1 (en) * 2007-07-31 2009-02-05 Dean Jennings Method and apparatus for decorrelation of spatially and temporally coherent light
US8332922B2 (en) * 2007-08-31 2012-12-11 Microsoft Corporation Transferable restricted security tokens
US20090120924A1 (en) * 2007-11-08 2009-05-14 Stephen Moffatt Pulse train annealing method and apparatus
US8178818B2 (en) 2008-03-31 2012-05-15 Electro Scientific Industries, Inc. Photonic milling using dynamic beam arrays
US7982160B2 (en) 2008-03-31 2011-07-19 Electro Scientific Industries, Inc. Photonic clock stabilized laser comb processing
CN102414787B (zh) * 2009-09-02 2014-05-21 Wi-A株式会社 激光反射掩模以及其制造方法
TWI575630B (zh) * 2011-06-10 2017-03-21 應用材料股份有限公司 脈衝循環器
US20120325784A1 (en) * 2011-06-24 2012-12-27 Applied Materials, Inc. Novel thermal processing apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6366308B1 (en) * 2000-02-16 2002-04-02 Ultratech Stepper, Inc. Laser thermal processing apparatus and method
TW533467B (en) * 2001-03-29 2003-05-21 Gsi Lumonics Corp Methods and systems for processing a device, methods and systems for modeling same and the device
US20090032511A1 (en) * 2007-07-31 2009-02-05 Adams Bruce E Apparatus and method of improving beam shaping and beam homogenization
TW201008061A (en) * 2008-02-07 2010-02-16 Zeiss Carl Laser Optics Gmbh Illuminating apparatus and method for controlling energy of a laser source
US20090200279A1 (en) * 2008-02-11 2009-08-13 Jiping Li Automatic focus and emissivity measurements for a substrate system
US7919348B2 (en) * 2008-06-13 2011-04-05 Aptina Imaging Corporation Methods for protecting imaging elements of photoimagers during back side processing

Also Published As

Publication number Publication date
EP2724364A4 (en) 2015-09-30
US8569187B2 (en) 2013-10-29
US20120325784A1 (en) 2012-12-27
JP6096184B2 (ja) 2017-03-15
TW201926423A (zh) 2019-07-01
JP6290997B2 (ja) 2018-03-07
TW201637079A (zh) 2016-10-16
JP2017135390A (ja) 2017-08-03
EP2724364B1 (en) 2020-04-29
US20120329178A1 (en) 2012-12-27
TWI700736B (zh) 2020-08-01
CN103597587A (zh) 2014-02-19
CN106141424B (zh) 2018-05-29
CN106141424A (zh) 2016-11-23
CN103597587B (zh) 2016-08-17
JP2014525141A (ja) 2014-09-25
JP2017041637A (ja) 2017-02-23
TW201303977A (zh) 2013-01-16
JP6321237B2 (ja) 2018-05-09
EP2724364A2 (en) 2014-04-30
TWI654669B (zh) 2019-03-21
TWI600063B (zh) 2017-09-21
KR101987398B1 (ko) 2019-06-10
WO2012177743A2 (en) 2012-12-27
WO2012177743A3 (en) 2013-04-04
US10181409B2 (en) 2019-01-15
US20140138362A1 (en) 2014-05-22
TW201812868A (zh) 2018-04-01
KR20140039300A (ko) 2014-04-01

Similar Documents

Publication Publication Date Title
TWI600063B (zh) 用於熱處理基材之設備與系統以及用於組合電磁能脈衝之設備
US9953851B2 (en) Process sheet resistance uniformity improvement using multiple melt laser exposures
TWI582466B (zh) 用於改良同調光的能源的均勻性的裝置及用於產生均勻照明場的裝置
JP2014525141A5 (OSRAM)
CN103489812B (zh) 具超短驻留时间之雷射退火系统及方法
CN106158609A (zh) 一种激光退火装置及其退火方法
TWI613464B (zh) 用於減少斑點、伸展脈衝、並使光束均勻化之設備