TWI490374B - Electrolytic copper foil, and a secondary battery collector and a secondary battery using the same - Google Patents

Electrolytic copper foil, and a secondary battery collector and a secondary battery using the same Download PDF

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Publication number
TWI490374B
TWI490374B TW102127920A TW102127920A TWI490374B TW I490374 B TWI490374 B TW I490374B TW 102127920 A TW102127920 A TW 102127920A TW 102127920 A TW102127920 A TW 102127920A TW I490374 B TWI490374 B TW I490374B
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TW
Taiwan
Prior art keywords
intensity ratio
diffraction intensity
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Prior art date
Application number
TW102127920A
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English (en)
Chinese (zh)
Other versions
TW201428138A (zh
Inventor
Michiya Kohiki
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of TW201428138A publication Critical patent/TW201428138A/zh
Application granted granted Critical
Publication of TWI490374B publication Critical patent/TWI490374B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/66—Selection of materials
    • H01M4/661—Metal or alloys, e.g. alloy coatings
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00—Secondary cells; Manufacture thereof
    • H01M10/05—Accumulators with non-aqueous electrolyte
    • H01M10/052—Li-accumulators
    • H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
TW102127920A 2012-08-17 2013-08-05 Electrolytic copper foil, and a secondary battery collector and a secondary battery using the same TWI490374B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012181019A JP5698196B2 (ja) 2012-08-17 2012-08-17 電解銅箔、並びにこれを用いた二次電池集電体及び二次電池

Publications (2)

Publication Number Publication Date
TW201428138A TW201428138A (zh) 2014-07-16
TWI490374B true TWI490374B (zh) 2015-07-01

Family

ID=50268815

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102127920A TWI490374B (zh) 2012-08-17 2013-08-05 Electrolytic copper foil, and a secondary battery collector and a secondary battery using the same

Country Status (3)

Country Link
JP (1) JP5698196B2 (ja)
KR (1) KR101564139B1 (ja)
TW (1) TWI490374B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101500566B1 (ko) * 2014-03-20 2015-03-12 일진머티리얼즈 주식회사 전해동박, 이를 포함하는 집전체, 음극 및 리튬전지
KR101500565B1 (ko) * 2014-03-20 2015-03-12 일진머티리얼즈 주식회사 전해동박, 이를 포함하는 집전체, 음극 및 리튬전지
KR101798195B1 (ko) * 2015-10-21 2017-11-15 엘에스엠트론 주식회사 전해 동박, 그리고 이 전해 동박을 포함하는 리튬 이차전지용 집전체 및 리튬 이차전지
KR102581018B1 (ko) * 2016-01-25 2023-09-20 에스케이넥실리스 주식회사 고강도를 갖는 리튬 이차전지 집전체용 전해동박 및 이를 포함하는 리튬 이차전지
KR101734840B1 (ko) * 2016-11-11 2017-05-15 일진머티리얼즈 주식회사 내굴곡성이 우수한 이차전지용 전해동박 및 그의 제조방법
KR101733408B1 (ko) * 2016-11-11 2017-05-10 일진머티리얼즈 주식회사 이차전지용 전해동박 및 그의 제조방법
JP7075332B2 (ja) * 2018-11-30 2022-05-25 三洋電機株式会社 二次電池及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1105398A (zh) * 1993-10-22 1995-07-19 古尔德电子有限公司 电解淀积铜箔及其制作方法
JP2008101267A (ja) * 2006-04-28 2008-05-01 Mitsui Mining & Smelting Co Ltd 電解銅箔、その電解銅箔を用いた表面処理銅箔及びその表面処理銅箔を用いた銅張積層板並びにその電解銅箔の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002004714A1 (en) 2000-07-07 2002-01-17 Hitachi Metals, Ltd. Electrolytic copper-plated r-t-b magnet and plating method thereof
JP4704025B2 (ja) 2004-12-21 2011-06-15 Ｊｘ日鉱日石金属株式会社 高周波回路用粗化処理圧延銅箔及びその製造方法
JP5365866B2 (ja) 2009-09-11 2013-12-11 トヨタ自動車株式会社 圧延銅箔の熱履歴測定方法
JP5345974B2 (ja) 2010-06-01 2013-11-20 Ｊｘ日鉱日石金属株式会社 圧延銅合金箔、並びにこれを用いた負極集電体、負極板及び二次電池
CN102959135B (zh) * 2010-07-01 2016-03-09 三井金属矿业株式会社 电解铜箔以及其制造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1105398A (zh) * 1993-10-22 1995-07-19 古尔德电子有限公司 电解淀积铜箔及其制作方法
JP2008101267A (ja) * 2006-04-28 2008-05-01 Mitsui Mining & Smelting Co Ltd 電解銅箔、その電解銅箔を用いた表面処理銅箔及びその表面処理銅箔を用いた銅張積層板並びにその電解銅箔の製造方法

Also Published As

Publication number Publication date
KR101564139B1 (ko) 2015-10-28
TW201428138A (zh) 2014-07-16
KR20140023236A (ko) 2014-02-26
JP5698196B2 (ja) 2015-04-08
JP2014037583A (ja) 2014-02-27

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