TWI471964B - 基板清潔設備 - Google Patents

基板清潔設備 Download PDF

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Publication number
TWI471964B
TWI471964B TW98142613A TW98142613A TWI471964B TW I471964 B TWI471964 B TW I471964B TW 98142613 A TW98142613 A TW 98142613A TW 98142613 A TW98142613 A TW 98142613A TW I471964 B TWI471964 B TW I471964B
Authority
TW
Taiwan
Prior art keywords
cleaning
substrate
impurity
unit
manifold
Prior art date
Application number
TW98142613A
Other languages
English (en)
Chinese (zh)
Other versions
TW201104777A (en
Inventor
Eun Ha Lee
Young Seok Choi
Jae Jung Lee
Original Assignee
Lg Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Display Co Ltd filed Critical Lg Display Co Ltd
Publication of TW201104777A publication Critical patent/TW201104777A/zh
Application granted granted Critical
Publication of TWI471964B publication Critical patent/TWI471964B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW98142613A 2009-07-17 2009-12-11 基板清潔設備 TWI471964B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090065559A KR101097509B1 (ko) 2009-07-17 2009-07-17 기판 세정장치

Publications (2)

Publication Number Publication Date
TW201104777A TW201104777A (en) 2011-02-01
TWI471964B true TWI471964B (zh) 2015-02-01

Family

ID=43545783

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98142613A TWI471964B (zh) 2009-07-17 2009-12-11 基板清潔設備

Country Status (3)

Country Link
KR (1) KR101097509B1 (ko)
CN (1) CN101966525B (ko)
TW (1) TWI471964B (ko)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW387093B (en) * 1996-07-08 2000-04-11 Speedfam Ipec Corp Methods and apparatus for cleaning, rinsing, and drying wafers
TW200419630A (en) * 2002-08-27 2004-10-01 Celerity Group Inc Modular substrate gas panel having manifold connections in a common plane

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3343013B2 (ja) * 1995-12-28 2002-11-11 大日本スクリーン製造株式会社 基板洗浄方法及びその装置
US6440864B1 (en) * 2000-06-30 2002-08-27 Applied Materials Inc. Substrate cleaning process
JP5010875B2 (ja) * 2006-08-28 2012-08-29 東京エレクトロン株式会社 洗浄装置及び洗浄方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW387093B (en) * 1996-07-08 2000-04-11 Speedfam Ipec Corp Methods and apparatus for cleaning, rinsing, and drying wafers
TW200419630A (en) * 2002-08-27 2004-10-01 Celerity Group Inc Modular substrate gas panel having manifold connections in a common plane

Also Published As

Publication number Publication date
KR20110007888A (ko) 2011-01-25
KR101097509B1 (ko) 2011-12-22
TW201104777A (en) 2011-02-01
CN101966525B (zh) 2012-12-05
CN101966525A (zh) 2011-02-09

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees