TWI388501B - 供鋰蒸發用之混合物及鋰分配器 - Google Patents

供鋰蒸發用之混合物及鋰分配器 Download PDF

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Publication number
TWI388501B
TWI388501B TW094130153A TW94130153A TWI388501B TW I388501 B TWI388501 B TW I388501B TW 094130153 A TW094130153 A TW 094130153A TW 94130153 A TW94130153 A TW 94130153A TW I388501 B TWI388501 B TW I388501B
Authority
TW
Taiwan
Prior art keywords
lithium
mixture
dispenser
evaporation
alloy
Prior art date
Application number
TW094130153A
Other languages
English (en)
Chinese (zh)
Other versions
TW200621638A (en
Inventor
Lorena Cattaneo
Simona Pirola
Chiharu Maeda
Antonio Bonucci
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Publication of TW200621638A publication Critical patent/TW200621638A/zh
Application granted granted Critical
Publication of TWI388501B publication Critical patent/TWI388501B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30Doping active layers, e.g. electron transporting layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60Forming conductive regions or layers, e.g. electrodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12014All metal or with adjacent metals having metal particles
    • Y10T428/12028Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
    • Y10T428/12063Nonparticulate metal component
    • Y10T428/12104Particles discontinuous
    • Y10T428/12111Separated by nonmetal matrix or binder [e.g., welding electrode, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
TW094130153A 2004-09-10 2005-09-02 供鋰蒸發用之混合物及鋰分配器 TWI388501B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT001736A ITMI20041736A1 (it) 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio

Publications (2)

Publication Number Publication Date
TW200621638A TW200621638A (en) 2006-07-01
TWI388501B true TWI388501B (zh) 2013-03-11

Family

ID=35448266

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094130153A TWI388501B (zh) 2004-09-10 2005-09-02 供鋰蒸發用之混合物及鋰分配器

Country Status (8)

Country Link
US (2) US7625505B2 (enExample)
EP (1) EP1786946B1 (enExample)
JP (1) JP4804469B2 (enExample)
KR (1) KR101195634B1 (enExample)
CN (1) CN100575536C (enExample)
IT (1) ITMI20041736A1 (enExample)
TW (1) TWI388501B (enExample)
WO (1) WO2006027814A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10109446B2 (en) 2007-02-16 2018-10-23 Saes Getters S.P.A. Air-stable alkali or alkaline-earth metal dispensers

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ITMI20112051A1 (it) * 2011-11-11 2013-05-12 Getters Spa Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi
ITMI20131171A1 (it) * 2013-07-11 2015-01-11 Getters Spa Erogatore migliorato di vapori metallici
KR102094142B1 (ko) * 2013-08-30 2020-03-27 엘지디스플레이 주식회사 유기전계 발광소자 제조방법
US9876188B2 (en) 2013-12-27 2018-01-23 Pioneer Corporation Light emitting element and method of manufacturing light emitting element
WO2015133275A1 (ja) 2014-03-06 2015-09-11 シャープ株式会社 混合材料、その製造方法、及びそれを用いた有機素子
KR102231490B1 (ko) * 2014-09-02 2021-03-25 삼성디스플레이 주식회사 유기 전계 발광 소자
US10886095B2 (en) * 2016-01-08 2021-01-05 Photonis Netherlands B.V. Image intensifier for night vision device
JP7037493B2 (ja) 2016-03-08 2022-03-16 テラパワー, エルエルシー ゲッター素子およびゲッター素子の製造方法
CN207038182U (zh) 2017-03-29 2018-02-23 泰拉能源有限责任公司 铯收集器
CN107523793B (zh) * 2017-08-23 2019-06-07 京东方科技集团股份有限公司 一种金属锂蒸发装置、蒸镀设备及金属锂蒸发方法
US11626213B2 (en) * 2019-08-23 2023-04-11 Terrapower, Llc Sodium vaporizer and methods
US11185915B2 (en) 2019-08-30 2021-11-30 Applied Materials, Inc. Deposition of reactive metals with protection layer for high volume manufacturing
CN115125491A (zh) * 2022-06-15 2022-09-30 北方夜视技术股份有限公司 一种多碱光电阴极制备用碱源的蒸发特性测量的方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10109446B2 (en) 2007-02-16 2018-10-23 Saes Getters S.P.A. Air-stable alkali or alkaline-earth metal dispensers

Also Published As

Publication number Publication date
US7625505B2 (en) 2009-12-01
EP1786946B1 (en) 2014-02-26
HK1105538A1 (zh) 2008-02-15
TW200621638A (en) 2006-07-01
JP4804469B2 (ja) 2011-11-02
KR101195634B1 (ko) 2012-10-30
US20100021623A1 (en) 2010-01-28
EP1786946A2 (en) 2007-05-23
ITMI20041736A1 (it) 2004-12-10
JP2008512570A (ja) 2008-04-24
CN100575536C (zh) 2009-12-30
US20080042102A1 (en) 2008-02-21
CN1981066A (zh) 2007-06-13
KR20070050920A (ko) 2007-05-16
US7794630B2 (en) 2010-09-14
WO2006027814A2 (en) 2006-03-16
WO2006027814A3 (en) 2006-05-18

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