ITMI20041736A1 - Miscele per l'evaporazione del litio e dispensatori di litio - Google Patents

Miscele per l'evaporazione del litio e dispensatori di litio

Info

Publication number
ITMI20041736A1
ITMI20041736A1 IT001736A ITMI20041736A ITMI20041736A1 IT MI20041736 A1 ITMI20041736 A1 IT MI20041736A1 IT 001736 A IT001736 A IT 001736A IT MI20041736 A ITMI20041736 A IT MI20041736A IT MI20041736 A1 ITMI20041736 A1 IT MI20041736A1
Authority
IT
Italy
Prior art keywords
lithium
mixtures
dispensers
evaporation
lithium evaporation
Prior art date
Application number
IT001736A
Other languages
English (en)
Italian (it)
Inventor
Lorena Cattaneo
Chiharu Maeda
Simona Pirola
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Priority to IT001736A priority Critical patent/ITMI20041736A1/it
Publication of ITMI20041736A1 publication Critical patent/ITMI20041736A1/it
Priority to TW094130153A priority patent/TWI388501B/zh
Priority to PCT/IT2005/000509 priority patent/WO2006027814A2/en
Priority to CN200580021281A priority patent/CN100575536C/zh
Priority to KR1020077003072A priority patent/KR101195634B1/ko
Priority to JP2007530857A priority patent/JP4804469B2/ja
Priority to EP05778885.3A priority patent/EP1786946B1/en
Priority to HK07110752.0A priority patent/HK1105538B/xx
Priority to US11/570,816 priority patent/US7625505B2/en
Priority to US12/572,640 priority patent/US7794630B2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
    • Y10T428/12063—Nonparticulate metal component
    • Y10T428/12104—Particles discontinuous
    • Y10T428/12111—Separated by nonmetal matrix or binder [e.g., welding electrode, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
IT001736A 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio ITMI20041736A1 (it)

Priority Applications (10)

Application Number Priority Date Filing Date Title
IT001736A ITMI20041736A1 (it) 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio
TW094130153A TWI388501B (zh) 2004-09-10 2005-09-02 供鋰蒸發用之混合物及鋰分配器
PCT/IT2005/000509 WO2006027814A2 (en) 2004-09-10 2005-09-06 Mixtures for evaporation of lithium and lithium dispensers
CN200580021281A CN100575536C (zh) 2004-09-10 2005-09-06 用于蒸发锂的混合物
KR1020077003072A KR101195634B1 (ko) 2004-09-10 2005-09-06 리튬 증발용 혼합물 및 리튬 디스펜서
JP2007530857A JP4804469B2 (ja) 2004-09-10 2005-09-06 リチウムの蒸発及びリチウム・ディスペンサのための混合物
EP05778885.3A EP1786946B1 (en) 2004-09-10 2005-09-06 Mixtures for evaporation of lithium and lithium dispensers
HK07110752.0A HK1105538B (en) 2004-09-10 2005-09-06 Mixtures for evaporation of lithium
US11/570,816 US7625505B2 (en) 2004-09-10 2005-09-06 Mixtures for evaporation of lithium and lithium dispensers
US12/572,640 US7794630B2 (en) 2004-09-10 2009-10-02 Lithium dispenser for lithium evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT001736A ITMI20041736A1 (it) 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio

Publications (1)

Publication Number Publication Date
ITMI20041736A1 true ITMI20041736A1 (it) 2004-12-10

Family

ID=35448266

Family Applications (1)

Application Number Title Priority Date Filing Date
IT001736A ITMI20041736A1 (it) 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio

Country Status (8)

Country Link
US (2) US7625505B2 (enExample)
EP (1) EP1786946B1 (enExample)
JP (1) JP4804469B2 (enExample)
KR (1) KR101195634B1 (enExample)
CN (1) CN100575536C (enExample)
IT (1) ITMI20041736A1 (enExample)
TW (1) TWI388501B (enExample)
WO (1) WO2006027814A2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20042279A1 (it) 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli
ITMI20070301A1 (it) 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
AU2008310584A1 (en) * 2007-10-12 2009-04-16 University Of Delaware Thermal evaporation sources for wide-area deposition
US9339869B2 (en) 2011-10-26 2016-05-17 Konstantin Chuntonov Apparatus and method for droplet casting of reactive alloys and applications
ITMI20112051A1 (it) * 2011-11-11 2013-05-12 Getters Spa Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi
ITMI20131171A1 (it) * 2013-07-11 2015-01-11 Getters Spa Erogatore migliorato di vapori metallici
KR102094142B1 (ko) * 2013-08-30 2020-03-27 엘지디스플레이 주식회사 유기전계 발광소자 제조방법
US9876188B2 (en) 2013-12-27 2018-01-23 Pioneer Corporation Light emitting element and method of manufacturing light emitting element
WO2015133275A1 (ja) 2014-03-06 2015-09-11 シャープ株式会社 混合材料、その製造方法、及びそれを用いた有機素子
KR102231490B1 (ko) * 2014-09-02 2021-03-25 삼성디스플레이 주식회사 유기 전계 발광 소자
US10886095B2 (en) * 2016-01-08 2021-01-05 Photonis Netherlands B.V. Image intensifier for night vision device
JP7037493B2 (ja) 2016-03-08 2022-03-16 テラパワー， エルエルシー ゲッター素子およびゲッター素子の製造方法
CN207038182U (zh) 2017-03-29 2018-02-23 泰拉能源有限责任公司 铯收集器
CN107523793B (zh) * 2017-08-23 2019-06-07 京东方科技集团股份有限公司 一种金属锂蒸发装置、蒸镀设备及金属锂蒸发方法
US11626213B2 (en) * 2019-08-23 2023-04-11 Terrapower, Llc Sodium vaporizer and methods
US11185915B2 (en) 2019-08-30 2021-11-30 Applied Materials, Inc. Deposition of reactive metals with protection layer for high volume manufacturing
CN115125491A (zh) * 2022-06-15 2022-09-30 北方夜视技术股份有限公司 一种多碱光电阴极制备用碱源的蒸发特性测量的方法

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US2117735A (en) * 1936-10-01 1938-05-17 Rca Corp Getter
US2424512A (en) * 1944-08-08 1947-07-22 Nat Res Corp Production of alkali metals and their oxides
US2948635A (en) * 1959-01-12 1960-08-09 Gen Electric Phosphor evaporation method and apparatus
US3096211A (en) * 1959-03-31 1963-07-02 Emi Ltd Alkali metal generators
US3579459A (en) 1966-12-13 1971-05-18 Getters Spa Metal vapor generating compositions
NL6913693A (enExample) 1968-09-13 1970-03-17
US3658713A (en) * 1968-11-12 1972-04-25 Tokyo Shibaura Electric Co Alkali metal generating agents
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GB1384890A (en) * 1970-09-04 1975-02-26 Rockwell International Corp Protective coatings for ferrous metals
US3742185A (en) * 1971-05-07 1973-06-26 Lincoln Electric Co Lithium containing welding electrode
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WO2004066339A1 (ja) 2003-01-17 2004-08-05 Hamamatsu Photonics K.K. アルカリ金属発生剤、アルカリ金属発生器、光電面、二次電子放出面、電子管、光電面の製造方法、二次電子放出面の製造方法及び電子管の製造方法
JP3938147B2 (ja) * 2003-04-08 2007-06-27 住友金属鉱山株式会社 タンタル酸リチウム基板およびその製造方法
US20060032558A1 (en) * 2004-08-12 2006-02-16 Scott Holloway Titanium aluminide intermetallic composites
ITMI20042279A1 (it) 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli

Also Published As

Publication number Publication date
US7625505B2 (en) 2009-12-01
EP1786946B1 (en) 2014-02-26
HK1105538A1 (zh) 2008-02-15
TW200621638A (en) 2006-07-01
JP4804469B2 (ja) 2011-11-02
KR101195634B1 (ko) 2012-10-30
US20100021623A1 (en) 2010-01-28
EP1786946A2 (en) 2007-05-23
JP2008512570A (ja) 2008-04-24
CN100575536C (zh) 2009-12-30
US20080042102A1 (en) 2008-02-21
CN1981066A (zh) 2007-06-13
KR20070050920A (ko) 2007-05-16
US7794630B2 (en) 2010-09-14
WO2006027814A2 (en) 2006-03-16
WO2006027814A3 (en) 2006-05-18
TWI388501B (zh) 2013-03-11

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