KR101195634B1 - 리튬 증발용 혼합물 및 리튬 디스펜서 - Google Patents

리튬 증발용 혼합물 및 리튬 디스펜서 Download PDF

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Publication number
KR101195634B1
KR101195634B1 KR1020077003072A KR20077003072A KR101195634B1 KR 101195634 B1 KR101195634 B1 KR 101195634B1 KR 1020077003072 A KR1020077003072 A KR 1020077003072A KR 20077003072 A KR20077003072 A KR 20077003072A KR 101195634 B1 KR101195634 B1 KR 101195634B1
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South Korea
Prior art keywords
lithium
mixture
evaporation
dispenser
container
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KR1020077003072A
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English (en)
Korean (ko)
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KR20070050920A (ko
Inventor
로레나 캣타네오
시모나 피로라
치하루 메다
안토니오 보누치
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사에스 게터스 에스.페.아.
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
    • Y10T428/12063—Nonparticulate metal component
    • Y10T428/12104—Particles discontinuous
    • Y10T428/12111—Separated by nonmetal matrix or binder [e.g., welding electrode, etc.]

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020077003072A 2004-09-10 2005-09-06 리튬 증발용 혼합물 및 리튬 디스펜서 Expired - Lifetime KR101195634B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT001736A ITMI20041736A1 (it) 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio
ITMI2004A001736 2004-09-10
PCT/IT2005/000509 WO2006027814A2 (en) 2004-09-10 2005-09-06 Mixtures for evaporation of lithium and lithium dispensers

Publications (2)

Publication Number Publication Date
KR20070050920A KR20070050920A (ko) 2007-05-16
KR101195634B1 true KR101195634B1 (ko) 2012-10-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077003072A Expired - Lifetime KR101195634B1 (ko) 2004-09-10 2005-09-06 리튬 증발용 혼합물 및 리튬 디스펜서

Country Status (8)

Country Link
US (2) US7625505B2 (enExample)
EP (1) EP1786946B1 (enExample)
JP (1) JP4804469B2 (enExample)
KR (1) KR101195634B1 (enExample)
CN (1) CN100575536C (enExample)
IT (1) ITMI20041736A1 (enExample)
TW (1) TWI388501B (enExample)
WO (1) WO2006027814A2 (enExample)

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ITMI20042279A1 (it) 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli
ITMI20070301A1 (it) 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
AU2008310584A1 (en) * 2007-10-12 2009-04-16 University Of Delaware Thermal evaporation sources for wide-area deposition
US9339869B2 (en) 2011-10-26 2016-05-17 Konstantin Chuntonov Apparatus and method for droplet casting of reactive alloys and applications
ITMI20112051A1 (it) * 2011-11-11 2013-05-12 Getters Spa Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi
ITMI20131171A1 (it) * 2013-07-11 2015-01-11 Getters Spa Erogatore migliorato di vapori metallici
KR102094142B1 (ko) * 2013-08-30 2020-03-27 엘지디스플레이 주식회사 유기전계 발광소자 제조방법
US9876188B2 (en) 2013-12-27 2018-01-23 Pioneer Corporation Light emitting element and method of manufacturing light emitting element
WO2015133275A1 (ja) 2014-03-06 2015-09-11 シャープ株式会社 混合材料、その製造方法、及びそれを用いた有機素子
KR102231490B1 (ko) * 2014-09-02 2021-03-25 삼성디스플레이 주식회사 유기 전계 발광 소자
US10886095B2 (en) * 2016-01-08 2021-01-05 Photonis Netherlands B.V. Image intensifier for night vision device
JP7037493B2 (ja) 2016-03-08 2022-03-16 テラパワー， エルエルシー ゲッター素子およびゲッター素子の製造方法
CN207038182U (zh) 2017-03-29 2018-02-23 泰拉能源有限责任公司 铯收集器
CN107523793B (zh) * 2017-08-23 2019-06-07 京东方科技集团股份有限公司 一种金属锂蒸发装置、蒸镀设备及金属锂蒸发方法
US11626213B2 (en) * 2019-08-23 2023-04-11 Terrapower, Llc Sodium vaporizer and methods
US11185915B2 (en) 2019-08-30 2021-11-30 Applied Materials, Inc. Deposition of reactive metals with protection layer for high volume manufacturing
CN115125491A (zh) * 2022-06-15 2022-09-30 北方夜视技术股份有限公司 一种多碱光电阴极制备用碱源的蒸发特性测量的方法

Citations (1)

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US20040001916A1 (en) * 2001-05-15 2004-01-01 Saes Getters S.P.A. Cesium dispensers and process for the use thereof

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Also Published As

Publication number Publication date
US7625505B2 (en) 2009-12-01
EP1786946B1 (en) 2014-02-26
HK1105538A1 (zh) 2008-02-15
TW200621638A (en) 2006-07-01
JP4804469B2 (ja) 2011-11-02
US20100021623A1 (en) 2010-01-28
EP1786946A2 (en) 2007-05-23
ITMI20041736A1 (it) 2004-12-10
JP2008512570A (ja) 2008-04-24
CN100575536C (zh) 2009-12-30
US20080042102A1 (en) 2008-02-21
CN1981066A (zh) 2007-06-13
KR20070050920A (ko) 2007-05-16
US7794630B2 (en) 2010-09-14
WO2006027814A2 (en) 2006-03-16
WO2006027814A3 (en) 2006-05-18
TWI388501B (zh) 2013-03-11

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