TWI372311B - Method of manufactureing a pellicle for lithography - Google Patents

Method of manufactureing a pellicle for lithography

Info

Publication number
TWI372311B
TWI372311B TW097122677A TW97122677A TWI372311B TW I372311 B TWI372311 B TW I372311B TW 097122677 A TW097122677 A TW 097122677A TW 97122677 A TW97122677 A TW 97122677A TW I372311 B TWI372311 B TW I372311B
Authority
TW
Taiwan
Prior art keywords
manufactureing
pellicle
lithography
Prior art date
Application number
TW097122677A
Other languages
English (en)
Other versions
TW200905378A (en
Inventor
Toru Shirasaki
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW200905378A publication Critical patent/TW200905378A/zh
Application granted granted Critical
Publication of TWI372311B publication Critical patent/TWI372311B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW097122677A 2007-07-19 2008-06-18 Method of manufactureing a pellicle for lithography TWI372311B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007188713A JP4931717B2 (ja) 2007-07-19 2007-07-19 リソグラフィー用ペリクルの製造方法

Publications (2)

Publication Number Publication Date
TW200905378A TW200905378A (en) 2009-02-01
TWI372311B true TWI372311B (en) 2012-09-11

Family

ID=39865604

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097122677A TWI372311B (en) 2007-07-19 2008-06-18 Method of manufactureing a pellicle for lithography

Country Status (6)

Country Link
US (1) US7914952B2 (zh)
EP (1) EP2017671A1 (zh)
JP (1) JP4931717B2 (zh)
KR (1) KR101369849B1 (zh)
CN (1) CN101349873B (zh)
TW (1) TWI372311B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009025559A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd ペリクルフレーム
JP2010261987A (ja) * 2009-04-30 2010-11-18 Shin-Etsu Chemical Co Ltd フォトマスク
JP5481106B2 (ja) * 2009-06-24 2014-04-23 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
JP2011076042A (ja) * 2009-10-02 2011-04-14 Shin-Etsu Chemical Co Ltd ペリクル
KR101990345B1 (ko) * 2009-10-02 2019-06-18 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 제조 방법
JP2011164259A (ja) * 2010-02-08 2011-08-25 Shin-Etsu Chemical Co Ltd リソグラフィー用ペリクル
JP5478463B2 (ja) 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル
JP5411200B2 (ja) 2011-04-26 2014-02-12 信越化学工業株式会社 リソグラフィ用ペリクル
JP5950467B2 (ja) * 2013-09-24 2016-07-13 信越化学工業株式会社 ペリクル
JP6025178B2 (ja) 2013-11-11 2016-11-16 信越化学工業株式会社 ペリクルの貼り付け方法及びこの方法に用いる貼り付け装置
JP6308676B2 (ja) * 2014-12-18 2018-04-11 信越化学工業株式会社 リソグラフィ用ペリクル容器。
JP6602547B2 (ja) * 2015-03-16 2019-11-06 旭化成株式会社 ペリクル
US9835940B2 (en) * 2015-09-18 2017-12-05 Taiwan Semiconductor Manufacturing Company, Ltd. Method to fabricate mask-pellicle system
JP2020160466A (ja) * 2020-06-12 2020-10-01 旭化成株式会社 ペリクル
JPWO2023038141A1 (zh) 2021-09-13 2023-03-16
WO2023182186A1 (ja) * 2022-03-23 2023-09-28 三井化学株式会社 粘着層付きペリクル枠の製造方法、保護フィルム付きペリクル枠、粘着層付きペリクル枠、ペリクル及びペリクル付きフォトマスク

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
JPS58219023A (ja) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
JPS6083032A (ja) 1983-10-13 1985-05-11 Asahi Chem Ind Co Ltd 光透過性に優れたフオトマスク用防塵カバ−
US4861402A (en) 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
JP3089153B2 (ja) 1993-12-13 2000-09-18 信越化学工業株式会社 リソグラフィー用ペリクル
JPH10114388A (ja) * 1996-10-07 1998-05-06 Nikon Corp ペリクル容器
JPH10207041A (ja) * 1997-01-24 1998-08-07 Mitsui Chem Inc ペリクル
JPH10213897A (ja) * 1997-01-31 1998-08-11 Mitsui Chem Inc マスク保護装置
JPH10282640A (ja) * 1997-02-10 1998-10-23 Mitsui Chem Inc マスク等の基板へのペリクルの貼付方法及び該方法によって得られるペリクル貼付基板
CN1198316C (zh) * 2000-12-27 2005-04-20 三井化学株式会社 薄膜
JP2003007832A (ja) 2001-06-25 2003-01-10 Mitsubishi Electric Corp 半導体装置
JP3577514B2 (ja) * 2001-10-05 2004-10-13 独立行政法人情報通信研究機構 全反射型蛍光顕微鏡
KR20030041811A (ko) * 2001-11-21 2003-05-27 아사히 가라스 가부시키가이샤 페리클의 포토마스크에 대한 장착구조
JP2003307832A (ja) 2002-04-16 2003-10-31 Asahi Glass Co Ltd ペリクル及びペリクル装着フォトマスク
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
US20050157288A1 (en) 2003-11-26 2005-07-21 Sematech, Inc. Zero-force pellicle mount and method for manufacturing the same
JP4358683B2 (ja) * 2004-05-31 2009-11-04 信越化学工業株式会社 ペリクルフレーム及びフォトリソグラフィー用ペリクル
JP4388467B2 (ja) * 2004-12-28 2009-12-24 信越化学工業株式会社 フォトリソグラフィ用ペリクル及びペリクルフレーム
JP2008158116A (ja) * 2006-12-22 2008-07-10 Asahi Kasei Electronics Co Ltd ペリクルフレーム

Also Published As

Publication number Publication date
EP2017671A1 (en) 2009-01-21
JP4931717B2 (ja) 2012-05-16
US20090029269A1 (en) 2009-01-29
US7914952B2 (en) 2011-03-29
KR101369849B1 (ko) 2014-03-04
CN101349873A (zh) 2009-01-21
KR20090009098A (ko) 2009-01-22
CN101349873B (zh) 2011-05-04
TW200905378A (en) 2009-02-01
JP2009025560A (ja) 2009-02-05

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