TWI358431B - - Google Patents

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Publication number
TWI358431B
TWI358431B TW96109990A TW96109990A TWI358431B TW I358431 B TWI358431 B TW I358431B TW 96109990 A TW96109990 A TW 96109990A TW 96109990 A TW96109990 A TW 96109990A TW I358431 B TWI358431 B TW I358431B
Authority
TW
Taiwan
Prior art keywords
cerium oxide
acid
compound
composition
forming
Prior art date
Application number
TW96109990A
Other languages
English (en)
Chinese (zh)
Other versions
TW200740939A (en
Inventor
Kiyoshi Ishikawa
Toshiyuki Ogata
Hideo Hada
Shogo Matsumaru
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200740939A publication Critical patent/TW200740939A/zh
Application granted granted Critical
Publication of TWI358431B publication Critical patent/TWI358431B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
TW096109990A 2006-03-24 2007-03-22 Composition for forming silica coating and silica coating TW200740939A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006083732A JP2007254677A (ja) 2006-03-24 2006-03-24 シリカ系被膜形成用組成物およびシリカ系被膜

Publications (2)

Publication Number Publication Date
TW200740939A TW200740939A (en) 2007-11-01
TWI358431B true TWI358431B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2012-02-21

Family

ID=38541188

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096109990A TW200740939A (en) 2006-03-24 2007-03-22 Composition for forming silica coating and silica coating

Country Status (3)

Country Link
JP (1) JP2007254677A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW200740939A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO2007111271A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329281B2 (ja) * 2009-03-31 2013-10-30 東京応化工業株式会社 塗布液及び当該塗布液を用いるシリカ系被膜の形成方法
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP2020090420A (ja) * 2018-12-07 2020-06-11 住友金属鉱山株式会社 黒鉛製またはセラミックス製の基板、基板の製造方法、炭化珪素の成膜方法および炭化珪素基板の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3300089B2 (ja) * 1993-02-15 2002-07-08 クラリアント インターナショナル リミテッド ポジ型放射感応性混合物
KR20050040275A (ko) * 2003-10-28 2005-05-03 삼성전자주식회사 절연막 형성용 조성물 및 이를 이용한 절연막 또는 절연막패턴의 형성방법
JP4553113B2 (ja) * 2004-06-10 2010-09-29 信越化学工業株式会社 多孔質膜形成用組成物、パターン形成方法、及び多孔質犠性膜
JP2006137932A (ja) * 2004-10-12 2006-06-01 Toray Ind Inc コーティング用組成物およびそれを用いた表示装置
JP2005136429A (ja) * 2004-11-12 2005-05-26 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP5087807B2 (ja) * 2006-02-22 2012-12-05 東京応化工業株式会社 有機半導体素子の製造方法及びそれに用いる絶縁膜形成用組成物

Also Published As

Publication number Publication date
JP2007254677A (ja) 2007-10-04
TW200740939A (en) 2007-11-01
WO2007111271A1 (ja) 2007-10-04

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