TW200740939A - Composition for forming silica coating and silica coating - Google Patents
Composition for forming silica coating and silica coatingInfo
- Publication number
- TW200740939A TW200740939A TW096109990A TW96109990A TW200740939A TW 200740939 A TW200740939 A TW 200740939A TW 096109990 A TW096109990 A TW 096109990A TW 96109990 A TW96109990 A TW 96109990A TW 200740939 A TW200740939 A TW 200740939A
- Authority
- TW
- Taiwan
- Prior art keywords
- silica coating
- composition
- forming
- disclosed
- generates
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Disclosed is a composition for forming a silica coating which enables to form a silica coating by being applied over a substrate and then heated thereon at a low temperature. Also disclosed is a silica coating obtained by using such a composition. Specifically disclosed is a composition for forming a silica coating, which contains a hydrolysis-condensation product (A) of an alkoxysilane and a compound (B) which generates an acid or a base by the action of heat. It is preferable that the compound (B) generates an acid or a base at a temperature of not less than 100 DEG C but not more than 300 DEG C.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006083732A JP2007254677A (en) | 2006-03-24 | 2006-03-24 | Composition for forming silica-based film and silica-based film |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200740939A true TW200740939A (en) | 2007-11-01 |
TWI358431B TWI358431B (en) | 2012-02-21 |
Family
ID=38541188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109990A TW200740939A (en) | 2006-03-24 | 2007-03-22 | Composition for forming silica coating and silica coating |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2007254677A (en) |
TW (1) | TW200740939A (en) |
WO (1) | WO2007111271A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5329281B2 (en) * | 2009-03-31 | 2013-10-30 | 東京応化工業株式会社 | Coating liquid and method for forming silica-based coating film using the coating liquid |
WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
JP2020090420A (en) * | 2018-12-07 | 2020-06-11 | 住友金属鉱山株式会社 | Graphite or ceramic substrate, substrate manufacturing method, silicon carbide film forming method, and silicon carbide substrate manufacturing method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3300089B2 (en) * | 1993-02-15 | 2002-07-08 | クラリアント インターナショナル リミテッド | Positive radiation-sensitive mixture |
KR20050040275A (en) * | 2003-10-28 | 2005-05-03 | 삼성전자주식회사 | Composition for forming dielectric film and method for forming dielectric film or pattern using the same |
JP4553113B2 (en) * | 2004-06-10 | 2010-09-29 | 信越化学工業株式会社 | Porous film-forming composition, pattern-forming method, and porous sacrificial film |
JP2006137932A (en) * | 2004-10-12 | 2006-06-01 | Toray Ind Inc | Coating composition and display device using the same |
JP2005136429A (en) * | 2004-11-12 | 2005-05-26 | Hitachi Chem Co Ltd | Silica coat formation composition, silica coat and its formation method, and electronic component having silica coat |
JP5087807B2 (en) * | 2006-02-22 | 2012-12-05 | 東京応化工業株式会社 | Method for producing organic semiconductor element and composition for forming insulating film used therefor |
-
2006
- 2006-03-24 JP JP2006083732A patent/JP2007254677A/en active Pending
-
2007
- 2007-03-22 TW TW096109990A patent/TW200740939A/en unknown
- 2007-03-23 WO PCT/JP2007/056091 patent/WO2007111271A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2007111271A1 (en) | 2007-10-04 |
TWI358431B (en) | 2012-02-21 |
JP2007254677A (en) | 2007-10-04 |
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