TWI357438B - - Google Patents
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- Publication number
- TWI357438B TWI357438B TW093132622A TW93132622A TWI357438B TW I357438 B TWI357438 B TW I357438B TW 093132622 A TW093132622 A TW 093132622A TW 93132622 A TW93132622 A TW 93132622A TW I357438 B TWI357438 B TW I357438B
- Authority
- TW
- Taiwan
- Prior art keywords
- diamond
- particles
- honing
- artificial
- density
- Prior art date
Links
- 239000010432 diamond Substances 0.000 claims description 165
- 239000002245 particle Substances 0.000 claims description 132
- 229910003460 diamond Inorganic materials 0.000 claims description 128
- 239000011163 secondary particle Substances 0.000 claims description 47
- 239000000758 substrate Substances 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 31
- 238000012545 processing Methods 0.000 claims description 20
- 239000011164 primary particle Substances 0.000 claims description 19
- 239000002002 slurry Substances 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000000227 grinding Methods 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 4
- -1 that is Substances 0.000 claims description 3
- 239000000047 product Substances 0.000 description 27
- 230000000052 comparative effect Effects 0.000 description 21
- 239000002253 acid Substances 0.000 description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 18
- 239000011521 glass Substances 0.000 description 17
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 15
- 239000012535 impurity Substances 0.000 description 14
- SPSSULHKWOKEEL-UHFFFAOYSA-N 2,4,6-trinitrotoluene Chemical compound CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O SPSSULHKWOKEEL-UHFFFAOYSA-N 0.000 description 13
- 239000000015 trinitrotoluene Substances 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052742 iron Inorganic materials 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 238000007667 floating Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000001307 helium Substances 0.000 description 6
- 229910052734 helium Inorganic materials 0.000 description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 6
- 239000011133 lead Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 238000010333 wet classification Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 239000002360 explosive Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000010306 acid treatment Methods 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 230000010365 information processing Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010299 mechanically pulverizing process Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002113 nanodiamond Substances 0.000 description 1
- VLZLOWPYUQHHCG-UHFFFAOYSA-N nitromethylbenzene Chemical compound [O-][N+](=O)CC1=CC=CC=C1 VLZLOWPYUQHHCG-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
- B01J3/08—Application of shock waves for chemical reactions or for modifying the crystal structure of substances
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003366851A JP2005131711A (ja) | 2003-10-28 | 2003-10-28 | ダイヤモンド研磨粒子及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200516135A TW200516135A (en) | 2005-05-16 |
| TWI357438B true TWI357438B (enExample) | 2012-02-01 |
Family
ID=34510265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093132622A TW200516135A (en) | 2003-10-28 | 2004-10-27 | Diamond polishing particles and method of producing same |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20050086870A1 (enExample) |
| JP (1) | JP2005131711A (enExample) |
| TW (1) | TW200516135A (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080070482A1 (en) * | 2004-07-12 | 2008-03-20 | Showa Denko K.K. | Composition for Texturing Process |
| WO2007001031A1 (ja) * | 2005-06-29 | 2007-01-04 | Nippon Kayaku Kabushiki Kaisha | 微細ダイヤモンドの製造方法及び微細ダイヤモンド |
| JP4936424B2 (ja) * | 2005-10-31 | 2012-05-23 | 日本ミクロコーティング株式会社 | 研磨材及びその製造方法 |
| JP5599547B2 (ja) * | 2006-12-01 | 2014-10-01 | Ｍｉｐｏｘ株式会社 | 硬質結晶基板研磨方法及び油性研磨スラリー |
| JP4838703B2 (ja) | 2006-12-26 | 2011-12-14 | 富士電機株式会社 | 磁気記録媒体用ディスク基板の製造方法、磁気記録媒体用ディスク基板、磁気記録媒体の製造方法、磁気記録媒体、及び磁気記録装置 |
| ATE550144T1 (de) * | 2007-03-26 | 2012-04-15 | Tokyo Diamond Tools Mfg Co Ltd | Synthetischer schleifstein |
| JP5199011B2 (ja) * | 2007-12-17 | 2013-05-15 | ビジョン開発株式会社 | 研磨材 |
| WO2009078277A1 (ja) * | 2007-12-17 | 2009-06-25 | Vision Development Co., Ltd. | 研磨材 |
| US20110020646A1 (en) * | 2008-01-25 | 2011-01-27 | West Allen J | Nanodiamonds and diamond-like particles from carbonaeous material |
| JP4953323B2 (ja) * | 2008-10-28 | 2012-06-13 | ビジョン開発株式会社 | グラファイト系炭素とダイヤモンドとからなる粒子を含有する繊維及びそれを用いた寝具 |
| US8932553B2 (en) * | 2009-03-09 | 2015-01-13 | Institut National De La Sante Et De La Recherche Medical (Inserm) | Method for manufacturing cubic diamond nanocrystals |
| CN104962234B (zh) * | 2015-05-13 | 2017-05-03 | 华侨大学 | 一种掺杂二氧化钛金刚石复合磨粒及其制备方法和应用 |
| US9865470B2 (en) * | 2015-06-29 | 2018-01-09 | Panasonic Corporation | Processing apparatus and processing method |
| SG11202110295XA (en) * | 2019-03-26 | 2021-10-28 | Daicel Corp | Method for producing nanodiamonds doped with group 14 element, and method for purifying same |
| CN115340089B (zh) * | 2022-08-24 | 2024-02-06 | 内蒙古唐合科技有限公司 | 一种人造金刚石的提纯方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE319138B (enExample) * | 1966-05-11 | 1970-01-12 | A Lovegreen | |
| EP0731490A3 (en) * | 1995-03-02 | 1998-03-11 | Ebara Corporation | Ultra-fine microfabrication method using an energy beam |
| JP4245310B2 (ja) * | 2001-08-30 | 2009-03-25 | 忠正 藤村 | 分散安定性に優れたダイヤモンド懸濁水性液、このダイヤモンドを含む金属膜及びその製造物 |
-
2003
- 2003-10-28 JP JP2003366851A patent/JP2005131711A/ja active Pending
-
2004
- 2004-10-26 US US10/974,867 patent/US20050086870A1/en not_active Abandoned
- 2004-10-27 TW TW093132622A patent/TW200516135A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005131711A (ja) | 2005-05-26 |
| TW200516135A (en) | 2005-05-16 |
| US20050086870A1 (en) | 2005-04-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |