TWI351524B - Apparatus for planarizing a probe card and method - Google Patents
Apparatus for planarizing a probe card and method Download PDFInfo
- Publication number
- TWI351524B TWI351524B TW093122605A TW93122605A TWI351524B TW I351524 B TWI351524 B TW I351524B TW 093122605 A TW093122605 A TW 093122605A TW 93122605 A TW93122605 A TW 93122605A TW I351524 B TWI351524 B TW I351524B
- Authority
- TW
- Taiwan
- Prior art keywords
- probe
- plane
- probe card
- plate
- central portion
- Prior art date
Links
- 239000000523 sample Substances 0.000 title claims description 280
- 238000000034 method Methods 0.000 title claims description 28
- 238000012360 testing method Methods 0.000 claims description 53
- 230000007246 mechanism Effects 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 38
- 230000003014 reinforcing effect Effects 0.000 claims description 33
- 230000002093 peripheral effect Effects 0.000 claims description 22
- 230000008878 coupling Effects 0.000 claims description 5
- 238000010168 coupling process Methods 0.000 claims description 5
- 238000005859 coupling reaction Methods 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 4
- 239000012811 non-conductive material Substances 0.000 claims description 4
- 230000006835 compression Effects 0.000 claims description 3
- 238000007906 compression Methods 0.000 claims description 3
- 230000002195 synergetic effect Effects 0.000 claims 3
- 238000009413 insulation Methods 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 84
- 239000003351 stiffener Substances 0.000 description 16
- XBTHILIDLBPRPM-UHFFFAOYSA-N 2,2',4,5-tetrachlorobiphenyl Chemical compound ClC1=CC=CC=C1C1=CC(Cl)=C(Cl)C=C1Cl XBTHILIDLBPRPM-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07314—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2889—Interfaces, e.g. between probe and tester
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49062103P | 2003-07-28 | 2003-07-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200514181A TW200514181A (en) | 2005-04-16 |
| TWI351524B true TWI351524B (en) | 2011-11-01 |
Family
ID=34115416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093122605A TWI351524B (en) | 2003-07-28 | 2004-07-28 | Apparatus for planarizing a probe card and method |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7098650B2 (enExample) |
| JP (1) | JP4571133B2 (enExample) |
| KR (1) | KR101181639B1 (enExample) |
| TW (1) | TWI351524B (enExample) |
| WO (1) | WO2005013332A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI593981B (zh) * | 2012-06-06 | 2017-08-01 | Tokyo Electron Ltd | Wafer inspection interface and wafer inspection device |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7262611B2 (en) | 2000-03-17 | 2007-08-28 | Formfactor, Inc. | Apparatuses and methods for planarizing a semiconductor contactor |
| JP4951523B2 (ja) * | 2005-11-15 | 2012-06-13 | 株式会社アドバンテスト | テストヘッド、電子部品試験装置、及び電子部品試験装置へのパフォーマンスボードの装着方法 |
| WO2007057944A1 (ja) | 2005-11-15 | 2007-05-24 | Advantest Corporation | 電子部品試験装置及び電子部品試験装置へのパフォーマンスボードの装着方法 |
| US7746089B2 (en) * | 2006-09-29 | 2010-06-29 | Formfactor, Inc. | Method and apparatus for indirect planarization |
| JP2010050437A (ja) * | 2008-07-25 | 2010-03-04 | Yokogawa Electric Corp | Icテスタ |
| JP2010175507A (ja) | 2009-02-02 | 2010-08-12 | Micronics Japan Co Ltd | 電気的接続装置 |
| JPWO2011013231A1 (ja) * | 2009-07-30 | 2013-01-07 | 株式会社アドバンテスト | プローブカード保持装置及びプローバ |
| US8278956B2 (en) * | 2010-04-08 | 2012-10-02 | Advantest America, Inc | Probecard system and method |
| SG11201405000UA (en) * | 2012-06-29 | 2014-09-26 | Hydrovision Asia Pte Ltd | An improved suspended sediment meter |
| US9134343B2 (en) * | 2012-09-28 | 2015-09-15 | Intel Corporation | Sort probe gripper |
| KR101255113B1 (ko) | 2012-10-31 | 2013-04-19 | 주식회사 프로이천 | 완충부재를 구비한 프로브 블록의 제조방법 |
| JP6042761B2 (ja) * | 2013-03-28 | 2016-12-14 | 東京エレクトロン株式会社 | プローブ装置 |
| JP6184301B2 (ja) * | 2013-11-14 | 2017-08-23 | 株式会社日本マイクロニクス | 検査装置 |
| KR102566685B1 (ko) | 2016-07-18 | 2023-08-14 | 삼성전자주식회사 | 프로브 카드용 클램핑 장치 및 이를 포함하는 프로브 카드 |
| US11022628B2 (en) | 2019-09-13 | 2021-06-01 | Reid-Ashman Manufacturing, Inc. | Probe card support apparatus for automatic test equipment |
| CN116559506B (zh) * | 2023-04-28 | 2025-11-18 | 强一半导体(苏州)股份有限公司 | 一种薄膜探针卡 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3810016A (en) * | 1971-12-17 | 1974-05-07 | Western Electric Co | Test probe for semiconductor devices |
| US4038599A (en) * | 1974-12-30 | 1977-07-26 | International Business Machines Corporation | High density wafer contacting and test system |
| JPS6362245A (ja) * | 1986-09-02 | 1988-03-18 | Canon Inc | ウエハプロ−バ |
| JPH0833433B2 (ja) * | 1987-11-30 | 1996-03-29 | 東京エレクトロン株式会社 | プローブ装置 |
| US5081415A (en) * | 1990-08-07 | 1992-01-14 | United Microelectronics Corporation | Load board insertion system |
| US5059898A (en) * | 1990-08-09 | 1991-10-22 | Tektronix, Inc. | Wafer probe with transparent loading member |
| US5559446A (en) * | 1993-07-19 | 1996-09-24 | Tokyo Electron Kabushiki Kaisha | Probing method and device |
| US6741085B1 (en) * | 1993-11-16 | 2004-05-25 | Formfactor, Inc. | Contact carriers (tiles) for populating larger substrates with spring contacts |
| US7064566B2 (en) * | 1993-11-16 | 2006-06-20 | Formfactor, Inc. | Probe card assembly and kit |
| JP3135825B2 (ja) * | 1995-09-27 | 2001-02-19 | 株式会社東芝 | プローブカードおよびそのプローブカードを使用した半導体集積回路のプロービング試験方法 |
| US6060891A (en) * | 1997-02-11 | 2000-05-09 | Micron Technology, Inc. | Probe card for semiconductor wafers and method and system for testing wafers |
| US6798224B1 (en) * | 1997-02-11 | 2004-09-28 | Micron Technology, Inc. | Method for testing semiconductor wafers |
| JPH1123615A (ja) * | 1997-05-09 | 1999-01-29 | Hitachi Ltd | 接続装置および検査システム |
| JP3315339B2 (ja) * | 1997-05-09 | 2002-08-19 | 株式会社日立製作所 | 半導体素子の製造方法並びに半導体素子へのプロービング方法およびその装置 |
| US6078186A (en) * | 1997-12-31 | 2000-06-20 | Micron Technology, Inc. | Force applying probe card and test system for semiconductor wafers |
| JP2001056346A (ja) * | 1999-08-19 | 2001-02-27 | Fujitsu Ltd | プローブカード及び複数の半導体装置が形成されたウエハの試験方法 |
| JP3343541B2 (ja) * | 2000-02-18 | 2002-11-11 | 日本電子材料株式会社 | プローブカード |
| DE10039336C2 (de) * | 2000-08-04 | 2003-12-11 | Infineon Technologies Ag | Verfahren zum Testen von Halbleiterschaltungen und Testvorrichtung zur Durchführung des Verfahrens |
| KR100347765B1 (ko) * | 2000-10-18 | 2002-08-09 | 삼성전자 주식회사 | 웨이퍼의 전기적 특성을 검사하는 방법 및 장치 |
| TWI272394B (en) * | 2004-02-24 | 2007-02-01 | Mjc Probe Inc | Multi-function probe card |
-
2004
- 2004-07-28 JP JP2006522082A patent/JP4571133B2/ja not_active Expired - Lifetime
- 2004-07-28 US US10/902,188 patent/US7098650B2/en not_active Expired - Lifetime
- 2004-07-28 TW TW093122605A patent/TWI351524B/zh not_active IP Right Cessation
- 2004-07-28 KR KR1020067001928A patent/KR101181639B1/ko not_active Expired - Lifetime
- 2004-07-28 WO PCT/US2004/024574 patent/WO2005013332A2/en not_active Ceased
-
2006
- 2006-08-17 US US11/506,653 patent/US8120375B2/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI593981B (zh) * | 2012-06-06 | 2017-08-01 | Tokyo Electron Ltd | Wafer inspection interface and wafer inspection device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060034718A (ko) | 2006-04-24 |
| US20060279302A1 (en) | 2006-12-14 |
| WO2005013332A3 (en) | 2005-12-29 |
| US8120375B2 (en) | 2012-02-21 |
| US20050062464A1 (en) | 2005-03-24 |
| KR101181639B1 (ko) | 2012-09-13 |
| JP4571133B2 (ja) | 2010-10-27 |
| JP2007500945A (ja) | 2007-01-18 |
| WO2005013332A2 (en) | 2005-02-10 |
| US7098650B2 (en) | 2006-08-29 |
| TW200514181A (en) | 2005-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |