TWI346976B - - Google Patents

Info

Publication number
TWI346976B
TWI346976B TW096105187A TW96105187A TWI346976B TW I346976 B TWI346976 B TW I346976B TW 096105187 A TW096105187 A TW 096105187A TW 96105187 A TW96105187 A TW 96105187A TW I346976 B TWI346976 B TW I346976B
Authority
TW
Taiwan
Application number
TW096105187A
Other versions
TW200737321A (en
Inventor
Katsuhiko Miya
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200737321A publication Critical patent/TW200737321A/zh
Application granted granted Critical
Publication of TWI346976B publication Critical patent/TWI346976B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096105187A 2006-03-30 2007-02-13 Substrate processing apparatus and substrate processing method TW200737321A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006095041A JP4641964B2 (ja) 2006-03-30 2006-03-30 基板処理装置および基板処理方法

Publications (2)

Publication Number Publication Date
TW200737321A TW200737321A (en) 2007-10-01
TWI346976B true TWI346976B (zh) 2011-08-11

Family

ID=38557067

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096105187A TW200737321A (en) 2006-03-30 2007-02-13 Substrate processing apparatus and substrate processing method

Country Status (5)

Country Link
US (1) US8857449B2 (zh)
JP (1) JP4641964B2 (zh)
KR (1) KR100858578B1 (zh)
CN (1) CN100505156C (zh)
TW (1) TW200737321A (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5333732B2 (ja) 2005-04-01 2013-11-06 テル エフエスアイ インコーポレイテッド マイクロエレクトロニクス用の加工物をプロセス処理するための装置
JP4889331B2 (ja) * 2006-03-22 2012-03-07 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP2009543338A (ja) 2006-07-07 2009-12-03 エフエスアイ インターナショナル インコーポレーテッド １つ以上の処理流体によりマイクロエレクトロニクス半製品を処理するために用いられる道具において使われる隔壁構造およびノズル装置
KR100829376B1 (ko) * 2006-12-20 2008-05-13 동부일렉트로닉스 주식회사 반도체 소자의 세정방법
JP5084656B2 (ja) * 2008-07-29 2012-11-28 東京エレクトロン株式会社 現像処理方法及び現像処理装置
JP5270263B2 (ja) * 2008-08-29 2013-08-21 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
CN101526760B (zh) * 2009-04-10 2011-09-07 友达光电股份有限公司 基板处理系统及显影方法
US20110130009A1 (en) * 2009-11-30 2011-06-02 Lam Research Ag Method and apparatus for surface treatment using a mixture of acid and oxidizing gas
CN102062524B (zh) * 2010-11-22 2012-11-21 烟台睿创微纳技术有限公司 一种用于mems器件圆片的自动干燥设备
JP5584653B2 (ja) * 2010-11-25 2014-09-03 東京エレクトロン株式会社 基板処理装置及び基板処理方法
CN102028357B (zh) * 2010-11-30 2012-08-15 沈阳芯源微电子设备有限公司 毛刷清洗装置及其使用方法
SG192847A1 (en) * 2011-03-18 2013-09-30 Basf Se Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
JP6916003B2 (ja) * 2017-02-24 2021-08-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
US11728185B2 (en) 2021-01-05 2023-08-15 Applied Materials, Inc. Steam-assisted single substrate cleaning process and apparatus

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3928125A (en) * 1972-12-18 1975-12-23 Feldmuehle Anlagen Prod Water extraction apparatus for papermaking machine
JP2983495B2 (ja) * 1997-05-20 1999-11-29 株式会社カイジョー 基板の乾燥方法
JP3653198B2 (ja) 1999-07-16 2005-05-25 アルプス電気株式会社 乾燥用ノズルおよびこれを用いた乾燥装置ならびに洗浄装置
JP4064729B2 (ja) * 2001-06-08 2008-03-19 住友精密工業株式会社 基板処理装置
JP3955197B2 (ja) * 2001-09-28 2007-08-08 アルプス電気株式会社 ウエット処理用ノズルおよびウエット処理装置
JP2003151947A (ja) * 2001-11-08 2003-05-23 Seiko Epson Corp 表面処理装置および表面処理方法
AT411335B (de) * 2002-03-06 2003-12-29 Sez Ag Verfahren zum nassbehandeln von scheibenförmigen gegenständen
KR100959740B1 (ko) 2002-06-07 2010-05-25 도쿄엘렉트론가부시키가이샤 기판처리장치
JP4194302B2 (ja) * 2002-06-07 2008-12-10 東京エレクトロン株式会社 現像装置及び現像処理方法
US7383843B2 (en) * 2002-09-30 2008-06-10 Lam Research Corporation Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
JP4589866B2 (ja) * 2002-09-30 2010-12-01 ラム リサーチ コーポレーション メニスカス、真空、ｉｐａ蒸気、乾燥マニホルドを用いた基板処理システム
JP2004335840A (ja) 2003-05-09 2004-11-25 Personal Creation Ltd 基板からの水分除去装置及び水分除去方法
JP4036815B2 (ja) * 2003-10-31 2008-01-23 シャープ株式会社 洗浄装置
JP4455228B2 (ja) * 2004-08-26 2010-04-21 大日本スクリーン製造株式会社 基板処理方法および基板処理装置

Also Published As

Publication number Publication date
CN100505156C (zh) 2009-06-24
KR20070098509A (ko) 2007-10-05
KR100858578B1 (ko) 2008-09-17
CN101047110A (zh) 2007-10-03
US20070227566A1 (en) 2007-10-04
US8857449B2 (en) 2014-10-14
JP2007273575A (ja) 2007-10-18
JP4641964B2 (ja) 2011-03-02
TW200737321A (en) 2007-10-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees