TWI335244B - - Google Patents

Download PDF

Info

Publication number
TWI335244B
TWI335244B TW096149871A TW96149871A TWI335244B TW I335244 B TWI335244 B TW I335244B TW 096149871 A TW096149871 A TW 096149871A TW 96149871 A TW96149871 A TW 96149871A TW I335244 B TWI335244 B TW I335244B
Authority
TW
Taiwan
Prior art keywords
inclined surface
liquid
coating
nozzle
organic
Prior art date
Application number
TW096149871A
Other languages
English (en)
Chinese (zh)
Other versions
TW200911388A (en
Inventor
Sagara Shuichi
Masuichi Mikio
Takamura Yukihiro
Kawagoe Masafumi
Matsuka Tsuyoshi
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200911388A publication Critical patent/TW200911388A/zh
Application granted granted Critical
Publication of TWI335244B publication Critical patent/TWI335244B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Coating Apparatus (AREA)
TW096149871A 2007-05-22 2007-12-25 Coating device TW200911388A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007135779A JP4964023B2 (ja) 2007-05-22 2007-05-22 塗布装置

Publications (2)

Publication Number Publication Date
TW200911388A TW200911388A (en) 2009-03-16
TWI335244B true TWI335244B (esLanguage) 2011-01-01

Family

ID=40099807

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096149871A TW200911388A (en) 2007-05-22 2007-12-25 Coating device

Country Status (4)

Country Link
JP (1) JP4964023B2 (esLanguage)
KR (1) KR100908546B1 (esLanguage)
CN (1) CN101310870B (esLanguage)
TW (1) TW200911388A (esLanguage)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI601463B (zh) * 2013-12-27 2017-10-01 斯克林集團公司 圖案形成方法、圖案印刷方法、圖案形成系統以及圖案印刷系統

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5342282B2 (ja) * 2009-03-17 2013-11-13 大日本スクリーン製造株式会社 塗布装置
JP5267519B2 (ja) * 2009-09-04 2013-08-21 カシオ計算機株式会社 吐出部、塗布装置及び塗布方法
KR101085214B1 (ko) 2011-06-29 2011-11-21 (주)디오 흐름코팅용 코팅액 회수대 및 이를 포함하는 흐름코팅 시스템
KR101597044B1 (ko) * 2013-09-06 2016-02-23 가부시키가이샤 스크린 홀딩스 도포 장치 및 도포 방법
JP6410535B2 (ja) * 2014-09-10 2018-10-24 芝浦メカトロニクス株式会社 液受け装置及び塗布装置
CN104941869B (zh) * 2015-07-03 2018-03-02 深圳市华星光电技术有限公司 涂布装置
CN105082151A (zh) * 2015-08-31 2015-11-25 江苏新光数控技术有限公司 多方向带彩色功能的喷涂工业机器人

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS518069Y2 (esLanguage) * 1971-09-23 1976-03-03
JP2000005666A (ja) 1998-06-24 2000-01-11 Matsushita Electric Works Ltd スプレー塗装装置と塗装方法
JP4256583B2 (ja) * 1999-12-17 2009-04-22 東京エレクトロン株式会社 塗布膜形成装置
JP2002361155A (ja) 2001-06-01 2002-12-17 Tokyo Electron Ltd 塗布処理装置及びその方法
JP3844670B2 (ja) * 2001-09-14 2006-11-15 東京エレクトロン株式会社 塗布膜形成装置
JP4391147B2 (ja) 2003-07-25 2009-12-24 大日本印刷株式会社 液体回収機能付きスピンコーター
JP2005271458A (ja) * 2004-03-25 2005-10-06 Ricoh Co Ltd 液体吐出装置の維持装置及び画像形成装置
KR100625318B1 (ko) * 2004-10-08 2006-09-18 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
JP4573645B2 (ja) * 2004-12-27 2010-11-04 大日本スクリーン製造株式会社 塗布装置
JP2006192862A (ja) * 2005-01-17 2006-07-27 Seiko Epson Corp 液体噴射装置及びそのフラッシング方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI601463B (zh) * 2013-12-27 2017-10-01 斯克林集團公司 圖案形成方法、圖案印刷方法、圖案形成系統以及圖案印刷系統

Also Published As

Publication number Publication date
KR20080102943A (ko) 2008-11-26
CN101310870B (zh) 2012-11-21
KR100908546B1 (ko) 2009-07-20
JP4964023B2 (ja) 2012-06-27
JP2008289960A (ja) 2008-12-04
TW200911388A (en) 2009-03-16
CN101310870A (zh) 2008-11-26

Similar Documents

Publication Publication Date Title
TWI335244B (esLanguage)
TW590891B (en) Apparatus for forming film member; and method of manufacturing lens, color filter, and organic EL device
US20050078144A1 (en) Image recording apparatus with maintenance unit
TW201030879A (en) Cleaning module for a substrate and apparatus for processing a substrate having the same
KR102274303B1 (ko) 정제 인쇄 장치 및 정제 인쇄 방법
TW200822973A (en) Methods and apparatus for purging a substrate during inkjet printing
JP7259294B2 (ja) 粘着剤塗布装置およびインクジェット画像形成装置
JP2010214305A (ja) 塗布装置
TWI459074B (zh) 液晶填充裝置
TWI295196B (en) Coating device
JP3722629B2 (ja) 現像液吐出ノズルおよび現像液供給装置
CN1976761B (zh) 溶液的涂敷装置及涂敷方法
JP2004081988A (ja) 製膜方法と製膜装置及びデバイス製造方法並びにデバイス製造装置
KR20060031673A (ko) 디스플레이용 패널 세정장치
KR20160083431A (ko) 헤드 세정 유닛 및 이를 포함하는 기판 처리 장치
TWI415693B (zh) 清潔基板之裝置
JP2013184126A (ja) 塗工装置
CN114248543A (zh) 液体喷射头以及液体喷射装置
KR101696195B1 (ko) 헤드 세정 유닛 및 이를 포함하는 기판 처리 장치
JP2013160936A (ja) 塗工装置
KR100684981B1 (ko) 평판표시장치용 회전식 분사장치 및 그를 포함한 제조장치
KR20150006553A (ko) 액정디스펜서의 펌프모듈 및 펌프 시스템
JP3634174B2 (ja) カラー表示ｐｄｐの蛍光体形成方法及びその装置
WO2016051896A1 (ja) 塗布装置および塗布方法
KR20120102311A (ko) 다중 러빙 장치

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees