TWI330552B - Megasonic cleaning using supersaturated cleaning solution - Google Patents

Megasonic cleaning using supersaturated cleaning solution Download PDF

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Publication number
TWI330552B
TWI330552B TW093116958A TW93116958A TWI330552B TW I330552 B TWI330552 B TW I330552B TW 093116958 A TW093116958 A TW 093116958A TW 93116958 A TW93116958 A TW 93116958A TW I330552 B TWI330552 B TW I330552B
Authority
TW
Taiwan
Prior art keywords
gas
substrate
solution
cleaning
temperature
Prior art date
Application number
TW093116958A
Other languages
English (en)
Chinese (zh)
Other versions
TW200507954A (en
Inventor
S Franklin Cole
Wu Yi
Fraser Brian
Original Assignee
Akrion Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akrion Technologies Inc filed Critical Akrion Technologies Inc
Publication of TW200507954A publication Critical patent/TW200507954A/zh
Application granted granted Critical
Publication of TWI330552B publication Critical patent/TWI330552B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H10P52/00—
    • H10P72/0414—

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW093116958A 2003-06-11 2004-06-11 Megasonic cleaning using supersaturated cleaning solution TWI330552B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47760203P 2003-06-11 2003-06-11

Publications (2)

Publication Number Publication Date
TW200507954A TW200507954A (en) 2005-03-01
TWI330552B true TWI330552B (en) 2010-09-21

Family

ID=34061915

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116958A TWI330552B (en) 2003-06-11 2004-06-11 Megasonic cleaning using supersaturated cleaning solution

Country Status (6)

Country Link
EP (1) EP1631396A4 (enExample)
JP (1) JP4643582B2 (enExample)
KR (1) KR101110905B1 (enExample)
CN (1) CN1849182A (enExample)
TW (1) TWI330552B (enExample)
WO (1) WO2005006396A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010108641A (ko) * 2000-05-30 2001-12-08 강병근 무우를 주재로한 건강음료 및 그 제조방법
KR20020037177A (ko) * 2000-11-13 2002-05-18 김용현 무를 첨가한 꿀음료
KR100827618B1 (ko) * 2006-05-11 2008-05-07 한국기계연구원 세정용 초음파 장치 및 이를 이용한 초음파 세정시스템
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
JPWO2008050832A1 (ja) * 2006-10-27 2010-02-25 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法、プログラム、および記録媒体
KR100748480B1 (ko) * 2007-06-27 2007-08-10 한국기계연구원 세정용 초음파 장치를 이용한 초음파 세정시스템
JP4532580B2 (ja) * 2008-08-20 2010-08-25 株式会社カイジョー 超音波洗浄装置
JP4915455B2 (ja) * 2010-02-25 2012-04-11 トヨタ自動車株式会社 車両等大型製品のマイクロバブルによる脱脂システム
JP2014130881A (ja) * 2012-12-28 2014-07-10 Ebara Corp 研磨装置
JP6678448B2 (ja) * 2015-12-22 2020-04-08 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
WO2020095091A1 (en) * 2018-11-06 2020-05-14 Arcelormittal Equipment improving the ultrasound cleaning
JP7233691B2 (ja) 2019-03-28 2023-03-07 株式会社エアレックス 低温物品の除染方法及びこれに使用するパスボックス
CN119376198B (zh) * 2023-11-10 2026-01-06 深圳市昇维旭技术有限公司 光刻胶去除方法和系统

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5368054A (en) * 1993-12-17 1994-11-29 International Business Machines Corporation Ultrasonic jet semiconductor wafer cleaning apparatus
JPH1022246A (ja) 1996-07-04 1998-01-23 Tadahiro Omi 洗浄方法
WO1998008248A1 (en) 1996-08-20 1998-02-26 Organo Corporation Method and device for washing electronic parts member, or the like
US5800626A (en) 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
US5849091A (en) * 1997-06-02 1998-12-15 Micron Technology, Inc. Megasonic cleaning methods and apparatus
US6167891B1 (en) 1999-05-25 2001-01-02 Infineon Technologies North America Corp. Temperature controlled degassification of deionized water for megasonic cleaning of semiconductor wafers
JP3322853B2 (ja) 1999-08-10 2002-09-09 株式会社プレテック 基板の乾燥装置および洗浄装置並びに乾燥方法および洗浄方法
US6743301B2 (en) * 1999-12-24 2004-06-01 mFSI Ltd. Substrate treatment process and apparatus
US6684890B2 (en) * 2001-07-16 2004-02-03 Verteq, Inc. Megasonic cleaner probe system with gasified fluid
US20030084916A1 (en) * 2001-10-18 2003-05-08 Sonia Gaaloul Ultrasonic cleaning products comprising cleaning composition having dissolved gas

Also Published As

Publication number Publication date
WO2005006396A2 (en) 2005-01-20
EP1631396A4 (en) 2013-08-14
KR101110905B1 (ko) 2012-02-20
WO2005006396A3 (en) 2005-09-15
CN1849182A (zh) 2006-10-18
KR20060037270A (ko) 2006-05-03
JP4643582B2 (ja) 2011-03-02
EP1631396A2 (en) 2006-03-08
JP2007502032A (ja) 2007-02-01
TW200507954A (en) 2005-03-01

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