TWI330323B - Method, apparatus, article and system for adjusting a sampling protocol of processed workpieces - Google Patents
Method, apparatus, article and system for adjusting a sampling protocol of processed workpieces Download PDFInfo
- Publication number
- TWI330323B TWI330323B TW093103876A TW93103876A TWI330323B TW I330323 B TWI330323 B TW I330323B TW 093103876 A TW093103876 A TW 093103876A TW 93103876 A TW93103876 A TW 93103876A TW I330323 B TWI330323 B TW I330323B
- Authority
- TW
- Taiwan
- Prior art keywords
- next process
- processed
- measured
- workpieces
- process state
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 161
- 238000005070 sampling Methods 0.000 title claims description 51
- 230000008569 process Effects 0.000 claims description 136
- 238000012545 processing Methods 0.000 claims description 65
- 238000005259 measurement Methods 0.000 claims description 19
- 239000004065 semiconductor Substances 0.000 claims description 14
- 238000011112 process operation Methods 0.000 claims description 10
- 238000003860 storage Methods 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 4
- 238000012360 testing method Methods 0.000 claims description 3
- 230000008520 organization Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 24
- 235000012431 wafers Nutrition 0.000 description 16
- 230000008859 change Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 238000004886 process control Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 239000013256 coordination polymer Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 235000012054 meals Nutrition 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 206010011469 Crying Diseases 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013528 artificial neural network Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 235000011389 fruit/vegetable juice Nutrition 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32077—Batch control system
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32078—Calculate process end time, form batch of workpieces and transport to process
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32096—Batch, recipe configuration for flexible batch control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/50—Machine tool, machine tool null till machine tool work handling
- G05B2219/50065—Estimate trends from past measured values, correct before really out of tolerance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Drying Of Semiconductors (AREA)
- Feedback Control In General (AREA)
- General Factory Administration (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/406,675 US6766214B1 (en) | 2003-04-03 | 2003-04-03 | Adjusting a sampling rate based on state estimation results |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200424873A TW200424873A (en) | 2004-11-16 |
| TWI330323B true TWI330323B (en) | 2010-09-11 |
Family
ID=32681863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093103876A TWI330323B (en) | 2003-04-03 | 2004-02-18 | Method, apparatus, article and system for adjusting a sampling protocol of processed workpieces |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6766214B1 (enExample) |
| JP (1) | JP4745668B2 (enExample) |
| KR (1) | KR101113203B1 (enExample) |
| CN (1) | CN100498615C (enExample) |
| AU (1) | AU2003300341A1 (enExample) |
| DE (1) | DE10394223B4 (enExample) |
| GB (1) | GB2416045B (enExample) |
| TW (1) | TWI330323B (enExample) |
| WO (1) | WO2004095154A1 (enExample) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US6912433B1 (en) * | 2002-12-18 | 2005-06-28 | Advanced Mirco Devices, Inc. | Determining a next tool state based on fault detection information |
| US7424392B1 (en) * | 2002-12-18 | 2008-09-09 | Advanced Micro Devices, Inc. | Applying a self-adaptive filter to a drifting process |
| US8017411B2 (en) * | 2002-12-18 | 2011-09-13 | GlobalFoundries, Inc. | Dynamic adaptive sampling rate for model prediction |
| US6859746B1 (en) * | 2003-05-01 | 2005-02-22 | Advanced Micro Devices, Inc. | Methods of using adaptive sampling techniques based upon categorization of process variations, and system for performing same |
| US7016754B2 (en) * | 2003-05-08 | 2006-03-21 | Onwafer Technologies, Inc. | Methods of and apparatus for controlling process profiles |
| US6985825B1 (en) * | 2003-07-15 | 2006-01-10 | Advanced Micro Devices, Inc. | Method and apparatus for adaptive sampling based on process covariance |
| US20080281438A1 (en) * | 2004-04-23 | 2008-11-13 | Model Predictive Systems, Inc. | Critical dimension estimation |
| US6961626B1 (en) | 2004-05-28 | 2005-11-01 | Applied Materials, Inc | Dynamic offset and feedback threshold |
| US7096085B2 (en) | 2004-05-28 | 2006-08-22 | Applied Materials | Process control by distinguishing a white noise component of a process variance |
| TWI336823B (en) * | 2004-07-10 | 2011-02-01 | Onwafer Technologies Inc | Methods of and apparatuses for maintenance, diagnosis, and optimization of processes |
| US7502715B1 (en) * | 2004-09-21 | 2009-03-10 | Asml Netherlands B.V | Observability in metrology measurements |
| US7076321B2 (en) * | 2004-10-05 | 2006-07-11 | Advanced Micro Devices, Inc. | Method and system for dynamically adjusting metrology sampling based upon available metrology capacity |
| US7117059B1 (en) * | 2005-04-18 | 2006-10-03 | Promos Technologies Inc. | Run-to-run control system and operating method of the same |
| KR100724187B1 (ko) * | 2005-12-27 | 2007-05-31 | 동부일렉트로닉스 주식회사 | Ａｐｃ 시스템에서 포토공정 ｃｄ 제어 방법 |
| US7257502B1 (en) * | 2006-02-28 | 2007-08-14 | Advanced Micro Devices, Inc. | Determining metrology sampling decisions based on fabrication simulation |
| US7672740B1 (en) * | 2006-09-28 | 2010-03-02 | Rockwell Automation Technologies, Inc. | Conditional download of data from embedded historians |
| US7742833B1 (en) | 2006-09-28 | 2010-06-22 | Rockwell Automation Technologies, Inc. | Auto discovery of embedded historians in network |
| US7913228B2 (en) * | 2006-09-29 | 2011-03-22 | Rockwell Automation Technologies, Inc. | Translation viewer for project documentation and editing |
| US8181157B2 (en) * | 2006-09-29 | 2012-05-15 | Rockwell Automation Technologies, Inc. | Custom language support for project documentation and editing |
| US7933666B2 (en) * | 2006-11-10 | 2011-04-26 | Rockwell Automation Technologies, Inc. | Adjustable data collection rate for embedded historians |
| US20080114474A1 (en) * | 2006-11-10 | 2008-05-15 | Rockwell Automation Technologies, Inc. | Event triggered data capture via embedded historians |
| US8175831B2 (en) * | 2007-04-23 | 2012-05-08 | Kla-Tencor Corp. | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers |
| US7974937B2 (en) | 2007-05-17 | 2011-07-05 | Rockwell Automation Technologies, Inc. | Adaptive embedded historians with aggregator component |
| WO2008151083A1 (en) | 2007-05-30 | 2008-12-11 | Kla-Tencor Corporation | Feedforward/feedback litho process control of stress and overlay |
| US7917857B2 (en) * | 2007-09-26 | 2011-03-29 | Rockwell Automation Technologies, Inc. | Direct subscription to intelligent I/O module |
| US7930261B2 (en) * | 2007-09-26 | 2011-04-19 | Rockwell Automation Technologies, Inc. | Historians embedded in industrial units |
| US7930639B2 (en) * | 2007-09-26 | 2011-04-19 | Rockwell Automation Technologies, Inc. | Contextualization for historians in industrial systems |
| US7809656B2 (en) * | 2007-09-27 | 2010-10-05 | Rockwell Automation Technologies, Inc. | Microhistorians as proxies for data transfer |
| US7882218B2 (en) * | 2007-09-27 | 2011-02-01 | Rockwell Automation Technologies, Inc. | Platform independent historian |
| US7962440B2 (en) * | 2007-09-27 | 2011-06-14 | Rockwell Automation Technologies, Inc. | Adaptive industrial systems via embedded historian data |
| US20090089671A1 (en) * | 2007-09-28 | 2009-04-02 | Rockwell Automation Technologies, Inc. | Programmable controller programming with embedded macro capability |
| JP2009224374A (ja) * | 2008-03-13 | 2009-10-01 | Oki Semiconductor Co Ltd | Ｐｅｂ装置及びその制御方法 |
| CN101872714B (zh) * | 2009-04-24 | 2012-06-20 | 中芯国际集成电路制造(上海)有限公司 | 晶圆在线检测方法及系统 |
| NL2004887A (en) * | 2009-06-24 | 2010-12-27 | Asml Netherlands Bv | Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method. |
| NL2009853A (en) * | 2011-12-23 | 2013-06-26 | Asml Netherlands Bv | Methods and apparatus for measuring a property of a substrate. |
| US9588441B2 (en) | 2012-05-18 | 2017-03-07 | Kla-Tencor Corporation | Method and device for using substrate geometry to determine optimum substrate analysis sampling |
| CN103887203A (zh) * | 2014-03-24 | 2014-06-25 | 上海华力微电子有限公司 | 一种扫描机台程式使用浮动阈值进行晶圆检测的方法 |
| TWI607825B (zh) * | 2016-11-29 | 2017-12-11 | 財團法人工業技術研究院 | 自動化加工程式切削力優化系統及方法 |
| EP3709110A1 (de) * | 2019-03-14 | 2020-09-16 | GKN Sinter Metals Engineering GmbH | Verfahren zur steuerung eines produktionsprozesses zur herstellung von bauteilen |
| EP3783448B1 (de) * | 2019-08-19 | 2025-10-22 | GKN Sinter Metals Engineering GmbH | Verfahren zur prüfung eines produktionsprozesses zur herstellung von bauteilen |
| EP3848767B1 (de) * | 2020-01-13 | 2023-11-01 | Hexagon Technology Center GmbH | Verfahren zur qualitätskontrolle von werkstücken sowie koordinatenmessgerät und computerprogramm |
| CN114305368B (zh) * | 2020-09-27 | 2025-05-20 | 深圳海翼智新科技有限公司 | 心率监测方法、装置及设备 |
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| US5402367A (en) * | 1993-07-19 | 1995-03-28 | Texas Instruments, Incorporated | Apparatus and method for model based process control |
| EP0658833B1 (de) * | 1993-11-23 | 1996-06-19 | Siemens Aktiengesellschaft | Vorrichtung zur Führung eines technischen Prozesses, welche aus On-line- und Off-line-Prozessmesswerten Sollwerteinstellungen für die optimale Prozessführung in Form von klassifizierten, komprimierter Zuordnungsmesswertesätzen automatisch generiert |
| JP3699776B2 (ja) * | 1996-04-02 | 2005-09-28 | 株式会社日立製作所 | 電子部品の製造方法 |
| DE19641432C2 (de) * | 1996-10-08 | 2000-01-05 | Siemens Ag | Verfahren und Einrichtung zur Vorausberechnung von vorab unbekannten Parametern eines industriellen Prozesses |
| KR100292028B1 (ko) * | 1997-12-05 | 2001-06-01 | 윤종용 | 반도체 장비의 실시간 제어방법 |
| KR100278600B1 (ko) * | 1998-01-14 | 2001-01-15 | 윤종용 | 반도체 제조설비 관리시스템의 설비유닛의 상태 관리방법 |
| KR100297371B1 (ko) * | 1998-02-03 | 2001-10-25 | 윤종용 | 반도체 공정 데이터 통합 관리 방법 |
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| DE19834797C2 (de) * | 1998-08-01 | 2002-04-25 | Christian Kuerten | Verfahren und Vorrichtung zur zustandsabhängigen Prozeßführung bei der Verarbeitung von Kunststoffen |
| JP2000317775A (ja) * | 1999-04-28 | 2000-11-21 | Mitsutoyo Corp | 加工システム |
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| JP2001143982A (ja) * | 1999-06-29 | 2001-05-25 | Applied Materials Inc | 半導体デバイス製造のための統合臨界寸法制御 |
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| KR100336525B1 (ko) * | 2000-08-07 | 2002-05-11 | 윤종용 | 반도체 장치의 제조를 위한 노광 방법 |
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| JPWO2002027769A1 (ja) * | 2000-09-28 | 2004-02-05 | 株式会社東芝 | 製造装置、製造装置の制御方法、製造装置の制御システム、製造装置の制御プログラムを記録したコンピュータ読み取り可能な記録媒体及び製造装置の制御プログラム |
| JP2002124445A (ja) * | 2000-10-13 | 2002-04-26 | Hitachi Ltd | 半導体デバイスの製造方法 |
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| KR100375559B1 (ko) * | 2001-07-03 | 2003-03-10 | 삼성전자주식회사 | 공정장치의 제어방법 |
| US6589800B2 (en) * | 2001-08-21 | 2003-07-08 | Texas Instruments Incorporated | Method of estimation of wafer-to-wafer thickness |
| US8017411B2 (en) * | 2002-12-18 | 2011-09-13 | GlobalFoundries, Inc. | Dynamic adaptive sampling rate for model prediction |
-
2003
- 2003-04-03 US US10/406,675 patent/US6766214B1/en not_active Expired - Lifetime
- 2003-12-22 CN CNB2003801102197A patent/CN100498615C/zh not_active Expired - Lifetime
- 2003-12-22 JP JP2004571185A patent/JP4745668B2/ja not_active Expired - Fee Related
- 2003-12-22 GB GB0519909A patent/GB2416045B/en not_active Expired - Lifetime
- 2003-12-22 DE DE10394223T patent/DE10394223B4/de not_active Expired - Lifetime
- 2003-12-22 AU AU2003300341A patent/AU2003300341A1/en not_active Abandoned
- 2003-12-22 WO PCT/US2003/041177 patent/WO2004095154A1/en not_active Ceased
- 2003-12-22 KR KR1020057018826A patent/KR101113203B1/ko not_active Expired - Lifetime
-
2004
- 2004-02-18 TW TW093103876A patent/TWI330323B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE10394223T5 (de) | 2006-06-08 |
| GB0519909D0 (en) | 2005-11-09 |
| US6766214B1 (en) | 2004-07-20 |
| KR20050120697A (ko) | 2005-12-22 |
| CN1759358A (zh) | 2006-04-12 |
| WO2004095154A1 (en) | 2004-11-04 |
| GB2416045B (en) | 2006-08-09 |
| JP4745668B2 (ja) | 2011-08-10 |
| TW200424873A (en) | 2004-11-16 |
| CN100498615C (zh) | 2009-06-10 |
| GB2416045A (en) | 2006-01-11 |
| JP2006515114A (ja) | 2006-05-18 |
| DE10394223B4 (de) | 2012-04-19 |
| AU2003300341A1 (en) | 2004-11-19 |
| KR101113203B1 (ko) | 2012-02-15 |
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