AU2001288856A1 - Adaptive sampling method for improved control in semiconductor manufacturing - Google Patents

Adaptive sampling method for improved control in semiconductor manufacturing

Info

Publication number
AU2001288856A1
AU2001288856A1 AU2001288856A AU8885601A AU2001288856A1 AU 2001288856 A1 AU2001288856 A1 AU 2001288856A1 AU 2001288856 A AU2001288856 A AU 2001288856A AU 8885601 A AU8885601 A AU 8885601A AU 2001288856 A1 AU2001288856 A1 AU 2001288856A1
Authority
AU
Australia
Prior art keywords
semiconductor manufacturing
sampling method
improved control
adaptive sampling
adaptive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001288856A
Inventor
Michael Lee Miller
Alexander James Pasadyn
Anthony John Toprac
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of AU2001288856A1 publication Critical patent/AU2001288856A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B21/00—Systems involving sampling of the variable controlled
    • G05B21/02—Systems involving sampling of the variable controlled electric
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P.I., P.I.D.
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/048—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators using a predictor
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B17/00—Systems involving the use of models or simulators of said systems
    • G05B17/02—Systems involving the use of models or simulators of said systems electric
AU2001288856A 2000-09-15 2001-09-07 Adaptive sampling method for improved control in semiconductor manufacturing Abandoned AU2001288856A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66373200A 2000-09-15 2000-09-15
US09/663,732 2000-09-15
PCT/US2001/028003 WO2002023289A2 (en) 2000-09-15 2001-09-07 Adaptive sampling method for improved control in semiconductor manufacturing

Publications (1)

Publication Number Publication Date
AU2001288856A1 true AU2001288856A1 (en) 2002-03-26

Family

ID=24663051

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001288856A Abandoned AU2001288856A1 (en) 2000-09-15 2001-09-07 Adaptive sampling method for improved control in semiconductor manufacturing

Country Status (9)

Country Link
US (1) US6988017B2 (en)
EP (1) EP1317694B1 (en)
JP (1) JP2004509407A (en)
KR (1) KR100824443B1 (en)
CN (1) CN1186700C (en)
AU (1) AU2001288856A1 (en)
DE (1) DE60104705T2 (en)
TW (1) TW563218B (en)
WO (1) WO2002023289A2 (en)

Families Citing this family (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8510476B2 (en) * 2001-02-15 2013-08-13 Brooks Automation, Inc. Secure remote diagnostic customer support network
US7698012B2 (en) * 2001-06-19 2010-04-13 Applied Materials, Inc. Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
US7160739B2 (en) 2001-06-19 2007-01-09 Applied Materials, Inc. Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles
US7505879B2 (en) 2002-06-05 2009-03-17 Tokyo Electron Limited Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
US7402257B1 (en) * 2002-07-30 2008-07-22 Advanced Micro Devices, Inc. Plasma state monitoring to control etching processes and across-wafer uniformity, and system for performing same
US7376472B2 (en) * 2002-09-11 2008-05-20 Fisher-Rosemount Systems, Inc. Integrated model predictive control and optimization within a process control system
US7295954B2 (en) * 2002-09-26 2007-11-13 Lam Research Corporation Expert knowledge methods and systems for data analysis
US8017411B2 (en) * 2002-12-18 2011-09-13 GlobalFoundries, Inc. Dynamic adaptive sampling rate for model prediction
US7653515B2 (en) * 2002-12-20 2010-01-26 Lam Research Corporation Expert knowledge methods and systems for data analysis
US6766214B1 (en) * 2003-04-03 2004-07-20 Advanced Micro Devices, Inc. Adjusting a sampling rate based on state estimation results
JP4468366B2 (en) * 2003-05-16 2010-05-26 東京エレクトロン株式会社 Method for monitoring a process system during a semiconductor manufacturing process
US6988045B2 (en) 2003-08-04 2006-01-17 Advanced Micro Devices, Inc. Dynamic metrology sampling methods, and system for performing same
US7328126B2 (en) 2003-09-12 2008-02-05 Tokyo Electron Limited Method and system of diagnosing a processing system using adaptive multivariate analysis
DE10345626A1 (en) * 2003-09-29 2005-05-12 Heidenhain Gmbh Dr Johannes Numerical control with machine tool simulator
US7187989B2 (en) * 2003-12-22 2007-03-06 Fakhruddin T Attarwala Use of core process models in model predictive controller
US7473566B1 (en) * 2004-02-03 2009-01-06 Advanced Micro Devices, Inc. Method and apparatus for controlling a film formation process with multiple objectives
US7203554B2 (en) * 2004-03-16 2007-04-10 United Technologies Corporation Model predictive controller with life extending control
US7127358B2 (en) * 2004-03-30 2006-10-24 Tokyo Electron Limited Method and system for run-to-run control
US7203555B2 (en) * 2004-05-14 2007-04-10 University Of Delaware Predictive regulatory controller
US7502715B1 (en) * 2004-09-21 2009-03-10 Asml Netherlands B.V Observability in metrology measurements
US7076321B2 (en) * 2004-10-05 2006-07-11 Advanced Micro Devices, Inc. Method and system for dynamically adjusting metrology sampling based upon available metrology capacity
US8676538B2 (en) * 2004-11-02 2014-03-18 Advanced Micro Devices, Inc. Adjusting weighting of a parameter relating to fault detection based on a detected fault
US8095240B2 (en) * 2004-11-18 2012-01-10 Applied Materials, Inc. Methods for starting and operating a thermal abatement system
US7682574B2 (en) * 2004-11-18 2010-03-23 Applied Materials, Inc. Safety, monitoring and control features for thermal abatement reactor
US7477960B2 (en) * 2005-02-16 2009-01-13 Tokyo Electron Limited Fault detection and classification (FDC) using a run-to-run controller
EP1853982B1 (en) * 2005-02-28 2008-08-20 Siemens Aktiengesellschaft Method for electronically operating a machine tool
US7117059B1 (en) * 2005-04-18 2006-10-03 Promos Technologies Inc. Run-to-run control system and operating method of the same
US7299154B1 (en) * 2005-05-16 2007-11-20 Advanced Micro Devices, Inc. Method and apparatus for fast disturbance detection and classification
DE102005024915B4 (en) 2005-05-31 2016-09-15 Advanced Micro Devices, Inc. Method and system for advanced process control with plant-dependent machine constants
DE102005030586A1 (en) 2005-06-30 2007-01-11 Advanced Micro Devices, Inc., Sunnyvale Method and system for advanced process control using measurement uncertainty as control input
DE102005035735B4 (en) * 2005-07-29 2007-08-16 Advanced Micro Devices, Inc., Sunnyvale Method and system for estimating a state of uninitialized advanced process control by using subdivided control data
KR100702843B1 (en) * 2005-08-12 2007-04-03 삼성전자주식회사 Semiconductor prodution device can processing batch of variable lot and method for processing variable lot
DE102005046972A1 (en) * 2005-09-30 2007-04-05 Advanced Micro Devices, Inc., Sunnyvale Method for progressive process control e.g. for fabrication of semiconductor components, requires obtaining measurement data from some processed substrates
US8036760B2 (en) * 2005-10-04 2011-10-11 Fisher-Rosemount Systems, Inc. Method and apparatus for intelligent control and monitoring in a process control system
US20070088448A1 (en) * 2005-10-19 2007-04-19 Honeywell International Inc. Predictive correlation model system
US7200523B1 (en) * 2005-11-30 2007-04-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for filtering statistical process data to enhance process performance
US20080042830A1 (en) * 2005-12-30 2008-02-21 Skyetek, Inc. Virtual rfid-based tag sensor
JP4791840B2 (en) * 2006-02-06 2011-10-12 株式会社日立ハイテクノロジーズ Charged particle beam apparatus, scanning electron microscope, and sample inspection method
JP4825530B2 (en) * 2006-02-06 2011-11-30 株式会社日立ハイテクノロジーズ Pattern defect inspection method and apparatus
US7970483B2 (en) * 2006-03-16 2011-06-28 Applied Materials, Inc. Methods and apparatus for improving operation of an electronic device manufacturing system
US7577483B2 (en) * 2006-05-25 2009-08-18 Honeywell Asca Inc. Automatic tuning method for multivariable model predictive controllers
US8005575B2 (en) 2006-06-01 2011-08-23 General Electric Company Methods and apparatus for model predictive control in a real time controller
GB2438893B (en) * 2006-06-09 2010-10-27 Applied Materials Inc Ion beams in an ion implanter
US7373215B2 (en) * 2006-08-31 2008-05-13 Advanced Micro Devices, Inc. Transistor gate shape metrology using multiple data sources
US7580768B2 (en) * 2006-09-22 2009-08-25 Texas Instruments Deutschland Gmbh Method of adjusting process variables in a processing flow
US7738986B2 (en) 2006-10-09 2010-06-15 GlobalFoundries, Inc. Method and apparatus for compensating metrology data for site bias prior to filtering
US7509186B2 (en) * 2006-11-07 2009-03-24 International Business Machines Corporation Method and system for reducing the variation in film thickness on a plurality of semiconductor wafers having multiple deposition paths in a semiconductor manufacturing process
DE102006059430A1 (en) * 2006-12-15 2008-06-19 Robert Bosch Gmbh Automated creation and adaptation of a machine or plant model
US7991499B2 (en) * 2006-12-27 2011-08-02 Molnar Charles J Advanced finishing control
US7716230B2 (en) * 2007-02-07 2010-05-11 International Business Machines Corporation Multi-dimensional serial containment process
US8244644B2 (en) * 2007-02-07 2012-08-14 International Business Machines Corporation Supply chain multi-dimensional serial containment process
US20080216077A1 (en) * 2007-03-02 2008-09-04 Applied Materials, Inc. Software sequencer for integrated substrate processing system
US8145337B2 (en) * 2007-05-04 2012-03-27 Taiwan Semiconductor Manufacturing Company, Ltd. Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment
CN101678407A (en) * 2007-05-25 2010-03-24 应用材料股份有限公司 The method and apparatus that is used for the valid function of abatement system
JP2010528475A (en) * 2007-05-25 2010-08-19 アプライド マテリアルズ インコーポレイテッド Method and apparatus for assembling and operating an electronic device manufacturing system
US20090018688A1 (en) * 2007-06-15 2009-01-15 Applied Materials, Inc. Methods and systems for designing and validating operation of abatement systems
US20090012744A1 (en) * 2007-07-03 2009-01-08 Texas Instruments Incorporated System and Method for Statistically Evaluating the Operation of Integrated Circuit Fabrication Tools
US8095907B2 (en) * 2007-10-19 2012-01-10 International Business Machines Corporation Reliability evaluation and system fail warning methods using on chip parametric monitors
WO2009055750A1 (en) * 2007-10-26 2009-04-30 Applied Materials, Inc. Methods and apparatus for smart abatement using an improved fuel circuit
DE102008000038A1 (en) * 2008-01-11 2009-07-16 Robert Bosch Gmbh contraption
US7622308B2 (en) * 2008-03-07 2009-11-24 Mks Instruments, Inc. Process control using process data and yield data
US8271122B2 (en) 2008-03-07 2012-09-18 Mks Instruments, Inc. Process control using process data and yield data
US8355810B2 (en) * 2009-01-29 2013-01-15 Applied Materials, Inc. Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility
US8229588B2 (en) * 2009-03-03 2012-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for tuning advanced process control parameters
US8433434B2 (en) * 2009-07-09 2013-04-30 Taiwan Semiconductor Manufacturing Company, Ltd. Near non-adaptive virtual metrology and chamber control
US8620461B2 (en) * 2009-09-24 2013-12-31 Honeywell International, Inc. Method and system for updating tuning parameters of a controller
JP5547472B2 (en) * 2009-12-28 2014-07-16 株式会社荏原製作所 Substrate polishing apparatus, substrate polishing method, and polishing pad surface temperature control apparatus for substrate polishing apparatus
EP2365410B1 (en) * 2010-03-09 2018-06-27 Siemens Aktiengesellschaft Controlling a manufacturing process
US8606386B2 (en) * 2010-03-12 2013-12-10 Ana Maria Dias Medureira Pereira Multi-agent system for distributed manufacturing scheduling with Genetic Algorithms and Tabu Search
US9026239B2 (en) * 2010-06-03 2015-05-05 Taiwan Semiconductor Manufacturing Company, Ltd. APC model extension using existing APC models
US10295993B2 (en) * 2011-09-01 2019-05-21 Kla-Tencor Corporation Method and system for detecting and correcting problematic advanced process control parameters
US9677493B2 (en) 2011-09-19 2017-06-13 Honeywell Spol, S.R.O. Coordinated engine and emissions control system
US9650934B2 (en) 2011-11-04 2017-05-16 Honeywell spol.s.r.o. Engine and aftertreatment optimization system
US20130111905A1 (en) 2011-11-04 2013-05-09 Honeywell Spol. S.R.O. Integrated optimization and control of an engine and aftertreatment system
US9002498B2 (en) * 2012-02-02 2015-04-07 Taiwan Semiconductor Manufacturing Co., Ltd. Tool function to improve fab process in semiconductor manufacturing
CN102540895B (en) * 2012-02-28 2015-04-15 中国科学院微电子研究所 Advanced process control system and test method thereof
US9158867B2 (en) 2012-10-09 2015-10-13 Taiwan Semiconductor Manufacturing Co., Ltd. 2D/3D analysis for abnormal tools and stages diagnosis
US9292010B2 (en) * 2012-11-05 2016-03-22 Rockwell Automation Technologies, Inc. Online integration of model-based optimization and model-less control
US9187800B2 (en) * 2013-02-15 2015-11-17 Ford Motor Company Process control for post-form heat treating parts for an assembly operation
US10324424B2 (en) 2013-03-11 2019-06-18 Johnson Controls Technology Company Control system with response time estimation and automatic operating parameter adjustment
US9395708B2 (en) * 2013-03-11 2016-07-19 Johnson Controls Technology Company Systems and methods for adaptive sampling rate adjustment
US9282048B1 (en) 2013-03-14 2016-03-08 Moat, Inc. System and method for dynamically controlling sample rates and data flow in a networked measurement system by dynamic determination of statistical significance
US9245067B2 (en) 2013-03-15 2016-01-26 General Electric Company Probabilistic method and system for testing a material
US9567660B2 (en) 2013-06-27 2017-02-14 Ford Global Technologies, Llc Method and system for using an irreversible thermo-chromatic indicator for quality assurance of a part subjected to heat treating
US9606519B2 (en) * 2013-10-14 2017-03-28 Applied Materials, Inc. Matching process controllers for improved matching of process
US10576603B2 (en) * 2014-04-22 2020-03-03 Kla-Tencor Corporation Patterned wafer geometry measurements for semiconductor process controls
US9733627B2 (en) 2014-08-13 2017-08-15 Honeywell International Inc. Cloud computing system and method for advanced process control
US10133263B1 (en) 2014-08-18 2018-11-20 Kla-Tencor Corporation Process condition based dynamic defect inspection
EP3051367B1 (en) 2015-01-28 2020-11-25 Honeywell spol s.r.o. An approach and system for handling constraints for measured disturbances with uncertain preview
EP3056706A1 (en) 2015-02-16 2016-08-17 Honeywell International Inc. An approach for aftertreatment system modeling and model identification
US20170139077A1 (en) * 2015-03-17 2017-05-18 Halliburton Energy Services, Inc Optimization of Downhole Logging Tool Data Resolution
US10551247B1 (en) * 2015-04-27 2020-02-04 National Technology & Engineering Solutions Of Sandia, Llc Global analysis peak fitting for chemical spectroscopy data
EP3091212A1 (en) 2015-05-06 2016-11-09 Honeywell International Inc. An identification approach for internal combustion engine mean value models
TWI539298B (en) * 2015-05-27 2016-06-21 國立成功大學 Metrology sampling method with sampling rate decision scheme and computer program product thereof
EP3734375B1 (en) 2015-07-31 2023-04-05 Garrett Transportation I Inc. Quadratic program solver for mpc using variable ordering
US10272779B2 (en) 2015-08-05 2019-04-30 Garrett Transportation I Inc. System and approach for dynamic vehicle speed optimization
US10359371B2 (en) 2015-08-24 2019-07-23 Kla-Tencor Corp. Determining one or more characteristics of a pattern of interest on a specimen
US10415492B2 (en) 2016-01-29 2019-09-17 Garrett Transportation I Inc. Engine system with inferential sensor
JP6647931B2 (en) * 2016-03-16 2020-02-14 株式会社Kelk Semiconductor wafer temperature control device and semiconductor wafer temperature control method
US10036338B2 (en) 2016-04-26 2018-07-31 Honeywell International Inc. Condition-based powertrain control system
US10124750B2 (en) 2016-04-26 2018-11-13 Honeywell International Inc. Vehicle security module system
CN106294126B (en) * 2016-07-22 2019-01-04 上海华力微电子有限公司 The automation formula correctness management method and device of SEN ion injection machine table
US11199120B2 (en) 2016-11-29 2021-12-14 Garrett Transportation I, Inc. Inferential flow sensor
US10868857B2 (en) 2017-04-21 2020-12-15 Johnson Controls Technology Company Building management system with distributed data collection and gateway services
US10333810B2 (en) 2017-06-09 2019-06-25 Johnson Controls Technology Company Control system with asynchronous wireless data transmission
US10739028B2 (en) 2017-06-09 2020-08-11 Johnson Controls Technology Company Thermostat with efficient wireless data transmission
CN107546998B (en) * 2017-07-25 2019-12-10 华南理工大学 Switching type control method based on double-loop prediction control
US11397171B2 (en) 2017-09-18 2022-07-26 Ecolab Usa Inc. Adaptive range flow titration systems and methods with sample conditioning
US11057213B2 (en) 2017-10-13 2021-07-06 Garrett Transportation I, Inc. Authentication system for electronic control unit on a bus
JP7035457B2 (en) * 2017-11-01 2022-03-15 ブラザー工業株式会社 Parameter update method, parameter update system, and program
CN108008695A (en) * 2017-12-05 2018-05-08 鄂州职业大学 A kind of numerical-control processing method and control system of intelligent die manufacture
CN110246775B (en) * 2018-03-09 2022-05-03 联华电子股份有限公司 Apparatus and method for controlling operation of machine
US11113168B2 (en) * 2018-03-09 2021-09-07 Toyota Motor Engineering & Manufacturing North America, Inc. Distributed architecture for fault monitoring
US11454619B2 (en) 2018-04-09 2022-09-27 Ecolab Usa Inc. Methods for colorimetric endpoint detection and multiple analyte titration systems
US11397170B2 (en) * 2018-04-16 2022-07-26 Ecolab Usa Inc. Repetition time interval adjustment in adaptive range titration systems and methods
EP3611570A1 (en) * 2018-08-16 2020-02-19 ASML Netherlands B.V. Method for controlling a manufacturing process and associated apparatuses
US10700605B1 (en) 2018-12-12 2020-06-30 Infineon Technologies Austria Ag Electrical power converter with predictor
US20210141787A1 (en) 2019-06-25 2021-05-13 Toshiba Mitsubishi-Electric Industrial Systems Corporation Data collection device, plant monitoring system and data collection method
US11644817B2 (en) 2019-11-01 2023-05-09 Beijing E-Town Semiconductor Technology Co., Ltd Control system for adaptive control of a thermal processing system
TWI728576B (en) * 2019-11-27 2021-05-21 台灣積體電路製造股份有限公司 Manufacturing method of semiconductor structure and computer-readable storage medium
US11429091B2 (en) 2020-10-29 2022-08-30 Kla Corporation Method of manufacturing a semiconductor device and process control system for a semiconductor manufacturing assembly

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3777128A (en) * 1972-03-31 1973-12-04 Kearney & Trecker Corp Input data sampling scheme for computer controlled machine tools
US5740033A (en) * 1992-10-13 1998-04-14 The Dow Chemical Company Model predictive controller
JP3293680B2 (en) * 1993-03-08 2002-06-17 中部電力株式会社 Discrete-time model reference type adaptive steam temperature controller for thermal power boiler
US5519605A (en) * 1994-10-24 1996-05-21 Olin Corporation Model predictive control apparatus and method
US5896294A (en) * 1997-03-11 1999-04-20 Advanced Micro Devices, Inc. Method and apparatus for inspecting manufactured products for defects in response to in-situ monitoring
US5926690A (en) * 1997-05-28 1999-07-20 Advanced Micro Devices, Inc. Run-to-run control process for controlling critical dimensions
US6161054A (en) * 1997-09-22 2000-12-12 On-Line Technologies, Inc. Cell control method and apparatus
JPH11272305A (en) * 1998-03-23 1999-10-08 Toshiba Corp Plant control device
US6248602B1 (en) * 1999-11-01 2001-06-19 Amd, Inc. Method and apparatus for automated rework within run-to-run control semiconductor manufacturing
US6337217B1 (en) * 2000-02-14 2002-01-08 Advanced Micro Devices, Inc. Method and apparatus for improved focus in optical processing
US6245581B1 (en) * 2000-04-19 2001-06-12 Advanced Micro Devices, Inc. Method and apparatus for control of critical dimension using feedback etch control

Also Published As

Publication number Publication date
WO2002023289A3 (en) 2002-08-29
US6988017B2 (en) 2006-01-17
CN1459052A (en) 2003-11-26
KR20030036791A (en) 2003-05-09
KR100824443B1 (en) 2008-04-23
WO2002023289A2 (en) 2002-03-21
JP2004509407A (en) 2004-03-25
TW563218B (en) 2003-11-21
DE60104705D1 (en) 2004-09-09
EP1317694B1 (en) 2004-08-04
EP1317694A2 (en) 2003-06-11
US20050221514A1 (en) 2005-10-06
DE60104705T2 (en) 2005-09-15
CN1186700C (en) 2005-01-26

Similar Documents

Publication Publication Date Title
AU2001288856A1 (en) Adaptive sampling method for improved control in semiconductor manufacturing
AU2002214580A1 (en) Semiconductor structure and process for fabricating same
EP1361614B8 (en) Semiconductor device manufacturing method
AU2001273556A1 (en) Manufacturing process for alpha-olefins
EP1158581A4 (en) Method for manufacturing soi wafer, and soi wafer
AU2001280821A1 (en) Method for fabricating electronics
AU2002218140A1 (en) Beam-shaping method
AU5269401A (en) Semiconductor manufacturing system and control method thereof
AU2001294188A1 (en) Device and method for manufacturing semiconductor
AU2001291882A1 (en) Method for producing polyisobutylphenols
AU2001227954A1 (en) Method for manufacturing concrete
AU1431500A (en) Method for semiconductor manufacturing
AU2001249617A1 (en) High throughput methods for haplotyping
AU6035000A (en) Semiconductor and manufacturing method for semiconductor
AU2001237530A1 (en) Method
EP1189269A4 (en) Production method for annealed wafer
AU2002352320A1 (en) Method for enhancing keratinocyte stem cells
AU4235601A (en) Method for controlling parasites present in soils
AU2002212750A1 (en) Method for fabricating semiconductor photodetector
AU2001230253A1 (en) Processing method
AU2001241636A1 (en) Halotherapy method
AU2001268981A1 (en) Method for producing 2-chloro-5-chloromethyl-1,3-thiazole
AU2002221819A1 (en) Passivation method
AU2002220757A1 (en) Method for obtaining azaerythromycin
AU2001245513A1 (en) Method for immune switching