KR101113203B1 - 상태 추정 결과에 기초한 샘플링 레이트 조정 - Google Patents

상태 추정 결과에 기초한 샘플링 레이트 조정 Download PDF

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Publication number
KR101113203B1
KR101113203B1 KR1020057018826A KR20057018826A KR101113203B1 KR 101113203 B1 KR101113203 B1 KR 101113203B1 KR 1020057018826 A KR1020057018826 A KR 1020057018826A KR 20057018826 A KR20057018826 A KR 20057018826A KR 101113203 B1 KR101113203 B1 KR 101113203B1
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South Korea
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state
workpieces
adjusting
sampling
subsequently processed
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Korean (ko)
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KR20050120697A (ko
Inventor
진 왕
브라이언 케이. 쿠손
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어드밴스드 마이크로 디바이시즈, 인코포레이티드
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32077—Batch control system
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32078—Calculate process end time, form batch of workpieces and transport to process
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32096—Batch, recipe configuration for flexible batch control
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/50—Machine tool, machine tool null till machine tool work handling
    • G05B2219/50065—Estimate trends from past measured values, correct before really out of tolerance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Drying Of Semiconductors (AREA)
  • Feedback Control In General (AREA)
  • General Factory Administration (AREA)
KR1020057018826A 2003-04-03 2003-12-22 상태 추정 결과에 기초한 샘플링 레이트 조정 Expired - Lifetime KR101113203B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/406,675 2003-04-03
US10/406,675 US6766214B1 (en) 2003-04-03 2003-04-03 Adjusting a sampling rate based on state estimation results
PCT/US2003/041177 WO2004095154A1 (en) 2003-04-03 2003-12-22 Adjusting a sampling rate based on state estimation results

Publications (2)

Publication Number Publication Date
KR20050120697A KR20050120697A (ko) 2005-12-22
KR101113203B1 true KR101113203B1 (ko) 2012-02-15

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KR1020057018826A Expired - Lifetime KR101113203B1 (ko) 2003-04-03 2003-12-22 상태 추정 결과에 기초한 샘플링 레이트 조정

Country Status (9)

Country Link
US (1) US6766214B1 (enExample)
JP (1) JP4745668B2 (enExample)
KR (1) KR101113203B1 (enExample)
CN (1) CN100498615C (enExample)
AU (1) AU2003300341A1 (enExample)
DE (1) DE10394223B4 (enExample)
GB (1) GB2416045B (enExample)
TW (1) TWI330323B (enExample)
WO (1) WO2004095154A1 (enExample)

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US8175831B2 (en) * 2007-04-23 2012-05-08 Kla-Tencor Corp. Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
US7974937B2 (en) 2007-05-17 2011-07-05 Rockwell Automation Technologies, Inc. Adaptive embedded historians with aggregator component
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US7930639B2 (en) * 2007-09-26 2011-04-19 Rockwell Automation Technologies, Inc. Contextualization for historians in industrial systems
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US7962440B2 (en) * 2007-09-27 2011-06-14 Rockwell Automation Technologies, Inc. Adaptive industrial systems via embedded historian data
US20090089671A1 (en) * 2007-09-28 2009-04-02 Rockwell Automation Technologies, Inc. Programmable controller programming with embedded macro capability
JP2009224374A (ja) * 2008-03-13 2009-10-01 Oki Semiconductor Co Ltd Ｐｅｂ装置及びその制御方法
CN101872714B (zh) * 2009-04-24 2012-06-20 中芯国际集成电路制造(上海)有限公司 晶圆在线检测方法及系统
NL2004887A (en) * 2009-06-24 2010-12-27 Asml Netherlands Bv Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method.
NL2009853A (en) * 2011-12-23 2013-06-26 Asml Netherlands Bv Methods and apparatus for measuring a property of a substrate.
US9588441B2 (en) 2012-05-18 2017-03-07 Kla-Tencor Corporation Method and device for using substrate geometry to determine optimum substrate analysis sampling
CN103887203A (zh) * 2014-03-24 2014-06-25 上海华力微电子有限公司 一种扫描机台程式使用浮动阈值进行晶圆检测的方法
TWI607825B (zh) * 2016-11-29 2017-12-11 財團法人工業技術研究院 自動化加工程式切削力優化系統及方法
EP3709110A1 (de) * 2019-03-14 2020-09-16 GKN Sinter Metals Engineering GmbH Verfahren zur steuerung eines produktionsprozesses zur herstellung von bauteilen
EP3783448B1 (de) * 2019-08-19 2025-10-22 GKN Sinter Metals Engineering GmbH Verfahren zur prüfung eines produktionsprozesses zur herstellung von bauteilen
EP3848767B1 (de) * 2020-01-13 2023-11-01 Hexagon Technology Center GmbH Verfahren zur qualitätskontrolle von werkstücken sowie koordinatenmessgerät und computerprogramm
CN114305368B (zh) * 2020-09-27 2025-05-20 深圳海翼智新科技有限公司 心率监测方法、装置及设备

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KR20010058692A (ko) * 1999-12-30 2001-07-06 황인길 반도체 웨이퍼의 오버레이 파라미터 보정 방법
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Also Published As

Publication number Publication date
DE10394223T5 (de) 2006-06-08
GB0519909D0 (en) 2005-11-09
US6766214B1 (en) 2004-07-20
KR20050120697A (ko) 2005-12-22
CN1759358A (zh) 2006-04-12
TWI330323B (en) 2010-09-11
WO2004095154A1 (en) 2004-11-04
GB2416045B (en) 2006-08-09
JP4745668B2 (ja) 2011-08-10
TW200424873A (en) 2004-11-16
CN100498615C (zh) 2009-06-10
GB2416045A (en) 2006-01-11
JP2006515114A (ja) 2006-05-18
DE10394223B4 (de) 2012-04-19
AU2003300341A1 (en) 2004-11-19

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