TWI296636B - - Google Patents

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Publication number
TWI296636B
TWI296636B TW093118760A TW93118760A TWI296636B TW I296636 B TWI296636 B TW I296636B TW 093118760 A TW093118760 A TW 093118760A TW 93118760 A TW93118760 A TW 93118760A TW I296636 B TWI296636 B TW I296636B
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TW
Taiwan
Prior art keywords
copper foil
layer
treatment
treated copper
treated
Prior art date
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TW093118760A
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Chinese (zh)
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TW200504148A (en
Inventor
Akiko Sugimoto
Original Assignee
Mitsui Mining & Smelting Co
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Publication of TW200504148A publication Critical patent/TW200504148A/en
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Publication of TWI296636B publication Critical patent/TWI296636B/zh

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0094Shielding materials being light-transmitting, e.g. transparent, translucent
    • H05K9/0096Shielding materials being light-transmitting, e.g. transparent, translucent for television displays, e.g. plasma display panel
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0081Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0084Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/38Chromatising
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Laminated Bodies (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Description

1296636 五、發明說明α) 【發明所屬之技術領域】 理面之表面處理銅 器面板用的電磁波 本發明是有關於一種具有黑色化處 、冶、及使用該表面處理銅箱之電裝顯干 遮蔽用金屬網板。 【先前技術】 織物= 之遮蔽用導電性網板由金屬化纖維 ;物:ί至導電性網板。此導電性網板之製造包括幾種方 方法係於m薄膜上層疊表面處理銅镇、相 J 微影㈣法來製造導電性網板。另一種方 法係以微影蝕刻法,同眛為办丨主 住々 1德每…二 時刻表面處理銅箱與支撐基板, II , # 土板而形成僅有表面處理銅箔之導電性網 板0 目尸m $ 了111應省電之要求’電聚產生信號電壓的 ,_v開發’而伴隨該電壓的降低使亮度減 二二ίίί力於使導電性網板之電路線寬微匕,並減少 f ^ ^ j:性網板之玻璃面板的覆蓋率。因此,必須將導 =板之厚度作帛,並使㈣更容易進行。上述前者之 ㈣法’於PET薄膜上形成作為電鐘種晶的遮蔽 ‘列i2電解銅之電鍍等形成一層薄的銅層,再以微影 /由Λ、I ϋ具有小的網板線寬之導電性網板。 雷性_ t ^ 了使用上述任一種方法來製造導電性網板,導 Γ,設於前方面才反,透過前方玻璃由表面可看 、電性網板中之表面處理銅箔的單一表面,以黑1296636 V. OBJECT OF THE INVENTION α) [Technical Field of the Invention] Electromagnetic wave for surface treatment of copper panel of the surface of the invention The present invention relates to a blackout, smelting, and electric shield using the surface treated copper box Use metal mesh. [Prior Art] Fabric = The conductive mesh for shielding is made of metallized fiber; material: ί to conductive mesh. The manufacture of the conductive stencil includes several methods for laminating a surface-treated copper town and a phase lithography method on an m film to produce a conductive stencil. The other method is to use the lithography method, and to form a conductive stencil with only surface-treated copper foil for the surface treatment of the copper box and the supporting substrate, II, #土板. 0 目尸m $ 111 is required to save power 'electrical generation to generate signal voltage, _v development' and with the reduction of the voltage, the brightness is reduced by a factor of two, so that the circuit board width of the conductive stencil is slightly fine, and Reduce f ^ ^ j: coverage of the glass panel of the stencil. Therefore, it is necessary to make the thickness of the guide plate 帛 and make the (4) easier. The former method (4) of the former forms a thin copper layer on the PET film as a shield of the electric crystal seed crystals, and then has a small stencil line width by lithography/Λ, I ϋ Conductive stencil. Lightning _ t ^ The use of any of the above methods to manufacture a conductive stencil, the guide Γ, set in the former aspect, through the front glass from the surface visible, the surface of the electrical stencil processing a single surface of the copper foil, Black

1296636 五、發明說明(2) 色處理來映襯透光亮度。而多層印刷電路板之黑化處理係 形成氧化銅層來提高與内層電路之樹脂層間的接著性,所 以一直以來’多層印刷電路板之黑化處理即轉應用於此處 理中。 、以上所述之技術揭露於「PDP材料之技術動向日立化 成技術報告第3 3號(1 9 9 9 - 7 )」、「曰本專利公開公報(平 成)第11-186785號」、「日本專利公開公報第2〇〇〇 —31588 號」等中。1296636 V. Description of the invention (2) Color processing to reflect the light transmission brightness. On the other hand, the blackening treatment of the multilayer printed wiring board forms a copper oxide layer to improve the adhesion to the resin layer of the inner layer circuit, and the blackening treatment of the multilayer printed wiring board has been conventionally applied thereto. The above-mentioned technology is disclosed in "Technical Trends of PDP Materials, Hitachi Chemical Technology Report No. 3 (1 9 9 9 - 7)", "Sakamoto Patent Publication Bulletin (Heisei) No. 11-186785", "Japan Patent Publication No. 2 - 31588" and the like.

然而,上述黑化處理中存有很嚴重的問題。亦即,當 銅箔表面上附著多量的銅黑色氧化物時,確實可得到具有 強烈,色之良好黑色化表面。然而,形成於銅箔表面之銅 黑色氧化物之附著量愈多,其愈容易由黑色化表面脫落, 亦即愈容易發生粉脫落之現象。 發生粉脫落現象時,脫落的黑色氧化物會掉入未使用 之處,當進行為使與前方面板玻璃一體化之透明化處理 :,這會導致分散於透明接著劑I,而造成透明度劣化之 田i另Ϊ 般之黑色鎳電鍍、硫化鎳電鍍、鈷電鍍等$However, there are serious problems in the above blackening process. That is, when a large amount of copper black oxide is adhered to the surface of the copper foil, a strong blackened surface having a strong color is surely obtained. However, the more the amount of the copper black oxide formed on the surface of the copper foil adheres, the easier it is to fall off from the blackened surface, that is, the more easily the powder falls off. When the powder is detached, the detached black oxide falls into the unused place, and when it is made transparent to integrate with the front panel glass: this causes dispersion of the transparent adhesive I, which causes the transparency to deteriorate. i Another black nickel plating, nickel sulfide plating, cobalt plating, etc. $

,匕處理可形成如黑化處理般無粉脫落、具有良好之呈 面丨’但於一般蝕刻銅之製程中卻發生無法由黑色化肩 理面側進行蝕刻的問題。 專利二=鎳問題之解決方法揭示於本發明人等- 045669號中。然而,此仍然無法解決 、又之黑色處理面的表面處理銅箔相關的問The ruthenium treatment can form a powder-free detachment like a blackening treatment, and has a good surface 丨. However, in the process of generally etching copper, the problem that etching cannot be performed by the blackened shoulder side occurs. The solution of the patent 2 = nickel problem is disclosed in the inventor's et al. - 045669. However, this still does not solve the problem of surface treatment copper foil with black processing surface.

1296636 五、發明說明(3) ,。尤其是目前市面上具有鈷之璽 在有難以使用銅蝕刻液對鈷;;H電鍍膜的銅落’存 因此,提供一種具有十=:韻刻加工的問題。 易以-般之銅蝕刻製程進行蝕刻之二:層、與容 箔、以及以上述之声面卢柿力 、電鑛層的表面處理銅 .0 ^ ^ ^边之表面處理銅箔所製造之導電性網# 疋目别之重要課題。 电Γ玍、、、罔板,即 【發明内容】 f此,根據本發明人等研究之結果,使用& + 荡,仍可容易妯、ir八有色系鈷電鍍層之表面處理銅 質之電漿顯示5| S ^ M f ^ d加工,而獲得高品 <具有黑色化處:用表的面= 防錄ίί:之表面處理銅羯包括具有 處理層並非絕對:備:;ΐΐ層兩種情形。因此,防錄 存性,該層是需要的。以下將進行本發明之保 的說明。 4丁令知月之表面處理銅箔 Γ上面處理鋼羯:本發明之表面處理銅箱係「-種表面 J理=澤面上具有黑色化處理面之表面處理銅 匕括二上述黑色化處理面係設置於銅箔層之單一表 :愛S ;厚度為2〇〇mg/Dl2〜4〇〇Dlg/m2之硫酸鈷電鍍層,上 ; 处理面之剖面高度為2 〇 〇 n m以下。( 「第1表面處理铜唁、 〇»生二本 I以下將其%為 里鈉、泊」)」。此表面處理銅箔la之剖面結構 画 第7頁 2213-6405-PF(N2);Ahddub.ptd 1296636 ----- 五、發明說明(4) 繪示於第1圖中。 第1圖中之表面處理麵^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 上形成硫酸鈷電鍍層4,於自1&係以於电解銅泊7之光澤面 面)上使用微細之銅粒3進八另一側纟面(即電解銅箱之粗链 中,銅羯之另-侧表面可订粗链化處理^鋼荡為例。其 粗糙化處理。第2圖係心'進打粗糙化/理’亦可不進行 的表面處理miib。以y、/略另一侧表面之粗縫化處理 用以改善與基材等之間^銅纟進行之粗輪化處理層2係 成此粗糙化處理層2之方:接著性,可因應需要來設置。形 的方法、或附著微細之氧可才木用如上述之附著微細銅粒 方法並無特別作限制。•二4主的/二在此粗糙化處理 '扪咱層7主要係使用以電解法所得 之電解銅消、或以壓延法所得之壓延銅箔。 ,後,:此銅箱層7中光滑之光澤面上設置硫酸姑電 鍍層4。、此處所述之硫酸麵電鍍層4係指使用硫酸始溶液、 以電鑛法所形成之膜層。由於此硫酸始電鍍層4係以後述 之製造方法所形成之重量厚度為2〇〇mg/m2〜4〇〇nig/m2之膜 層,因此對銅蝕刻液之溶解性佳,並可充分地黑色化。、呈 有習知鈷層之黑色系電鍍被覆膜的銅箔中,其鈷層之重^ 厚度約為1 000mg/m2,相當的厚,這是與電鍍層之所謂溶I 性之品質相衝突的。結果不僅因厚度過厚,造成以鋼蝕刻 液之溶解速度變慢,而且鈷元素本身高濃度地累積於鋼蝕 刻液中,而降低蝕刻液的作用。本發明之換算重量係指換 异為钻重量的數值。換算重量係將表面處理銅箔溶解於酸 溶液中,以電漿原子發射光譜法計算單位面積之鈷量,再1296636 V. Description of invention (3). In particular, there is currently a cobalt ruthenium on the market. It is difficult to use a copper etching solution for cobalt; the copper plating of the H plating film exists, thereby providing a problem of having a ten=: rhyme processing. It is easy to etch two in the same way as the copper etching process: the layer, the foil, and the surface treated copper foil with the surface of the surface of the copper surface. Conductive mesh # 疋 eye is an important topic. Electric Γ玍, 罔, 罔 , 即 f f f f f f f , 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据 根据Plasma display 5| S ^ M f ^ d processing, and obtain high quality < with blackening: surface of the table = anti-recording ίί: surface treatment gongs including processing layer is not absolute: preparation:; ΐΐ layer Two situations. Therefore, for anti-recording, this layer is needed. The description of the warranty of the present invention will be made below. 4 dingling Zhiyue surface treatment copper foil Γ upper treatment steel 羯: surface treatment copper box of the present invention "------------------------------------------------ The surface is set in a single sheet of copper foil layer: Love S; a cobalt sulfate plating layer having a thickness of 2 〇〇mg/Dl 2 to 4 〇〇Dlg/m2; the cross-sectional height of the treated surface is 2 〇〇 nm or less. "The first surface treatment of copper bismuth and bismuth" is based on the following two. The cross-sectional structure of the surface-treated copper foil la is drawn. Page 7 2213-6405-PF(N2); Ahddub.ptd 1296636 ----- V. Description of the invention (4) is shown in Fig. 1. The surface treated surface in Fig. 1 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ formed on the cobalt sulfate plating layer 4, from the 1 & on the shiny surface of the electrolytic copper Bo 7) using fine copper particles 3 into Eight other side kneading surface (that is, in the thick chain of the electrolytic copper box, the other side surface of the copper beryllium can be set as a thick chaining treatment ^ steel dangling as an example. Its roughening treatment. Fig. 2 is the core 'in the roughening /理' can also be used for the surface treatment miib. The y, / slightly roughening of the other side of the surface to improve the roughing of the layer 2 between the substrate and the like The side of the treatment layer 2: the adhesiveness can be set as needed. The method of the shape, or the adhesion of the fine oxygen can be used for the method of attaching the fine copper particles as described above, and the method of attaching the fine copper particles is not particularly limited. The roughening treatment 'the ruthenium layer 7 mainly uses the electrolytic copper obtained by the electrolytic method or the rolled copper foil obtained by the calendering method. Thereafter, the smooth surface of the copper tank layer 7 is provided with sulfuric acid plating. Layer 4. The sulfuric acid surface plating layer 4 described herein refers to a film layer formed by a method of electrowinning using a sulfuric acid starting solution. The plating layer 4 is a film layer having a weight thickness of 2 〇〇mg/m 2 to 4 〇〇nig/m 2 formed by a manufacturing method described later, and therefore has good solubility in a copper etching solution and can be sufficiently blackened. In the copper foil of the black-based electroplated coating film having a conventional cobalt layer, the thickness of the cobalt layer is about 1 000 mg/m 2 , which is relatively thick, which conflicts with the quality of the so-called dissolution property of the plating layer. As a result, not only the thickness is too thick, but also the dissolution rate of the steel etching solution is slow, and the cobalt element itself accumulates in the steel etching solution at a high concentration, thereby reducing the effect of the etching liquid. The value of the weight of the drill. The weight is calculated by dissolving the surface treated copper foil in an acid solution, and calculating the amount of cobalt per unit area by plasma atomic emission spectrometry.

IM 2213-6405>PF(N2);Ahddub.ptd 第8頁 1296636 五、發明說明(5) 換算表面處理銅箔1 m2 '^夏夏' 〇 此外,始電鍍層是不6 鈷電鍍時之電鍍條件的与^易溶解於鋼蝕刻液,會受進行 之表面處理銅箔之製甚鉅。亦即,採用後述本發明 有相當良好之姓刻特:方法時所得之姑電鍍被覆膜,可具 本發明之表面處理銦Μ 之表面形狀並非相當不平:〗里特徵係該黑色化處理面 度為20Gnm以下為本發-’ 5^,、f色處理化表面之剖面高 TV、13 置要符仏文。亦即,可士 dfc 平滑、具有光澤之S &儿^ J仏成非常 β Tt*序之黑色化處理面。但是, 此特別註明m存在 2 :避免块導在 高声之斛右仞要& 有般製耘粑圍内的誤差,剖面 门又之所有位置也不一"定★ 9 ίΊ Γ\ 、 m c 疋均須在20 0nm以下,當然有時合 、、士應衣程所存在之誤差而使剖面高度超過2〇〇nm。為^ 1本發明之表面處理銅箔!之硫酸鈷電鍍層4之剖面、高 ς丄使用FIB分析儀進行剖面的觀察,其ηΒ圖繪示於第3 =I第3圖所示為於電解銅猪之光澤面上形成黑色化處 里面者。此FIB圖係由與被觀察面呈6〇。的方向進行觀察 的結果。 由第3圖可得知黑色化處理面之剖面存在有一定的凹 凸,當觀察此凹凸圖案時,一般係使用觸針式表面粗糙度 計來進行。然而,由第3圖之刻度可得知該凹凸係無法以& 表面粗糙度計正確量測的圖案。於是,本發明中對應表面 粗糙度計所測量之Rmax值,係以FIB圖觀察之視野中w 頂與山谷的最大差為「剖面高度」。第3圖中「d」所'示之 處為第3圖之剖面高度,可得知其約為10〇ηπι。而且,$第IM 2213-6405>PF(N2);Ahddub.ptd Page 8 1296636 V. Description of invention (5) Conversion of surface-treated copper foil 1 m2 '^夏夏' 〇 In addition, the initial plating layer is electroplated without 6 cobalt plating The condition and the easy to dissolve in the steel etching solution will be greatly affected by the surface treatment of the copper foil. That is, the surface of the surface-treated indium antimony having the surface of the present invention which is obtained by the present invention has a relatively good surname: the electroplated coating obtained by the method is not quite uneven: the characteristic is the blackened surface. The degree is below 20Gnm for the hair-'5^, and the profile of the f-color treated surface is high TV, 13 is required to be written. That is, the smooth, shiny S & ^ 仏 仏 仏 仏 into a very β Tt * order blackening surface. However, this special indicates that there is a 2 in the presence of 2: avoiding the block guide in the high-pitched right and the error in the general control, and the position of the section door is not the same. The mc 疋 must be below 20 nm. Of course, the height of the profile exceeds 2 〇〇 nm due to errors in the process. For the surface treatment of copper foil of the invention! The cross section of the cobalt sulphate plating layer 4 and the sorghum are observed by the FIB analyzer. The ηΒ diagram is shown in the third = I, and the third figure shows the blackening on the shiny surface of the electrolytic copper pig. By. This FIB image is 6 inches from the observed surface. The direction of observation is the result. It can be seen from Fig. 3 that there is a certain concavity in the cross section of the blackened surface, and when the concavo-convex pattern is observed, it is generally carried out using a stylus type surface roughness meter. However, from the scale of Fig. 3, it is known that the unevenness cannot be correctly measured by the & surface roughness meter. Therefore, in the present invention, the Rmax value measured by the corresponding surface roughness meter is the "profile height" of the maximum difference between the w top and the valley in the field of view observed by the FIB chart. The position shown by "d" in Fig. 3 is the height of the section of Fig. 3, and it is known that it is about 10 〇 ηπι. And, $

1296636 五、發明說明(6) 3圖中’硫酸銘電、 面之形狀來形成,又與曰底部2 3勾之厚度,沿著銅箱表 J,不:堇沒有發現硫酸麵電鍍:[、二維持完全密接的狀 有粉脫落情形。 θ /予起專不良情形,也沒 色化處理面,^ ^ ^對形成於習知鋼箔處理表面上之$ ^新-剖面進行FIB觀察時,h士 h ^ 5圖所不。亦即,由^果如苐4圖與第 的剖面高度(d),第4 R 头、’ /大出之狀態。測量此時 可得知其為相當二約 黑色化處理面,1 如上述具有樹枝狀之 片脫落,當然會發也斷裂碎 黑色:ί:表面時引起顏色不均句的;:就疋以肉眼觀察 由第3圖之FIB剖面觀察圖得知, 理銅箔具有非常#、# 上迖本發明之表面處 色化處理,曰:= 雖然其為有光澤之黑 “d 電解銅箱與壓延銅箱之光澤面施以里 色化處理時,Lab色度空間中之[值 —Γ 上之說法並沒有特别掬r i ”、、 上。在此27以 約為41。冑特別規靶其上限值,根據經驗推測上限值 色度^黑it處理面之光澤程度之表示方式,比起-,又二曰車乂佳係使用光澤度。本發明之黑色化處理而夕 光澤度,最好是於電解銅箔或壓延銅箔之光澤面上彤 黑色化處理面之光澤度[Gs( 60。)]於30以下。若光^度二 第10頁 2213-6405-PF(N2);Ahddub.ptd 1296636 五、發明說明(7) 3 0以上的話,會呈頦胼士田 ^ 0 主現所明黑漆漆的狀態,而使金屬光澤f 顯眼。在此沒有特別指餘也 ψ ^ 其約為18。 令Μ規乾先澤度之下限值,根據經驗推測 第2表面處理銅箔·+主 .n A/r L 7 ^ ^ •此表面處理銅箔係於上述第1表面處理 6 Fli _ + # a a 長保存之防銹處理層的銅箔。第 I)圖繪不兩表面均具右p方錄考 ^ 八有I方銹處理層5之表面處理銅箔1 c之立丨丨 面圖。第7圖繪示省略對相拉;、杜/ 口 理銅箔1 d之剖面圖。若目的僅A 4 面處 使用咪唑、本並三挫等之有機防錄、及廣泛 或黃銅等之亞鉛合金的無機防銹等。此,亞鉛 形成硫酸鈷電鍍層的情況中,防錄至二::上 成本發明之表面處理銅箱之硫酸銷電2 =於形 上,亦可設置於兩表面上。 《勺另侧表面 然而,當於兩表面上均設置防銹處 、二 銹處理層不僅用來防止粗縫化處理層2 μ 9寺’這些防 落、及作為硫酸鈷電鍍層4之保護層",=微,銅粒3的脫 表面處理銅箔之外觀。此防銹處理層5 $且可長時間維持 合金層或亞鉛-鈷層。藉由這些防銹處理$好具有亞鉛〜鎳 層4的組合使用,可助於硫酸鈷電鍍層4、曰5與硫酸鈷電鍍 即,比起硫酸鈷電鍍層4單獨存在的棒、、σ的韻刻溶解。亦 '月〉兄,jgf古e 金層或亞船-始合金層者,其硫酸麵蕾 /、有亞錯-鎳合 速。 鍍層4的溶解較為迅 再者’第8圖與第9圖繪示兩表面均| 與鉻處理層6之表面處理銅箔1 c的剖面社、有防銻處理層5 〜構圖。分別比較1296636 V. Description of invention (6) In the figure, the shape of 'sulphuric acid, the shape of the surface is formed, and the thickness of the bottom of the crucible is 2, along the copper box table J, no: no sulfuric acid surface plating is found: [, 2. Maintain a completely closed shape with powder shedding. θ / is given a special problem, and there is no coloration treatment surface. ^ ^ ^ When the FIB observation is made on the $^new-profile formed on the surface of the conventional steel foil treatment, the hshi h^5 diagram does not. That is, the state of the 4th R head, and the state of the "out" is obtained by the image of Fig. 4 and the section height (d) of the first section. At this time, it can be known that it is a considerable amount of blackened surface, 1 such as the above-mentioned dendritic sheet falling off, of course, it will also break and break black: ί: the surface causes color unevenness; Observed from the FIB cross-sectional view of Fig. 3, the copper foil has a surface treatment of the surface of the present invention, 曰: = although it is a glossy black "d electrolytic copper box and rolled copper When the glossy surface of the box is subjected to the inner color processing, the value of the value in the Lab chromaticity space is not particularly 掬 ri, and is above. Here 27 is about 41.胄Specially limit the upper limit of the target, and estimate the upper limit based on experience. The way of expressing the gloss of the chromaticity ^black it treatment surface is compared with the -, and the glossiness is used. In the blackening treatment of the present invention, it is preferable that the glossiness of the blackened surface [Gs (60.)] is 30 or less on the glossy surface of the electrolytic copper foil or the rolled copper foil. If the light is 2, page 12, 2213-6405-PF (N2); Ahddub.ptd 1296636 5, invention description (7) 30 or more, it will be in the state of the 黑 田 ^ ^ ^ And make the metallic luster f conspicuous. There is no special reference here. 其 ^ It is about 18. The 处理 Μ 先 先 先 , , 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第# aa Long preserved copper foil for the rust-proof layer. The first I) picture shows the surface of the surface of the copper foil 1 c. Fig. 7 is a cross-sectional view showing the phase pull of the phase/draw copper foil 1 d. If the purpose is only on the A 4 surface, use organic imprinting such as imidazole, tri-frustration, and inorganic anti-rust of a wide range of lead-based alloys such as brass. Therefore, in the case where the lead is formed into the cobalt sulfate plating layer, the sulfuric acid pin 2 of the surface treatment copper case of the invention is also applied to the two surfaces. "The other side surface of the spoon. However, when the rustproof surface is provided on both surfaces, the rust treatment layer is not only used to prevent the coarse-stitching treatment layer 2 μ 9 Temple's fall prevention, and as a protective layer of the cobalt sulfate plating layer 4 ", = Micro, the appearance of copper foil 3 de-surface treated copper foil. This rust-preventing layer 5 is capable of maintaining an alloy layer or a lead-cobalt layer for a long period of time. By using these anti-rust treatments in combination with the combination of the lead and nickel layers 4, the cobalt sulfate plating layer 4, the crucible 5 and the cobalt sulfate plating can be facilitated, that is, the rods and σ which are present separately from the cobalt sulfate plating layer 4 The rhyme is dissolved. Also 'month' brother, jgf ancient e gold layer or Asian ship - the first alloy layer, its sulfuric acid bud /, with sub-error - nickel speed. The dissolution of the plating layer 4 is relatively fast. Further, Figs. 8 and 9 show the cross-section of the surface treated copper foil 1 c with the chrome-treated layer 6 and the anti-caries treatment layer 5 - patterning. Compare separately

2213-6405-PF(N2);Ahddub.ptd 第11頁 1296636 五、發明說明(8) ___ =圖與第8¾、第7圖與第9圖,可得知其與具有 二5之表面處理銅箔的差異僅在於鉻處理層,而其秀處里 均相同。 〜構 此鉻處理層6係於形成以亞鉛-鎳合金層或亞鉛〜 矣層等所構成之防銹處理層5之後,形成於單一表面或γ 銅匕IS祕藉由此鉻處理層6,可顯著提昇表面ϋ 之柷乳化性能,並有效防止氧化變色等的表面 /、有黑色化處理面之表面處理銅箔之製造方法〉 。 (第1表面處理銅箔之製造方法) 上述第1表面處理銅箔之製造方法最好採用包括 =方法。此製造方法可更細分為採用授掉浴枰 :製::”浴槽的情況。以下分為「第1表面處理銅/ 說明二法A」、「第1表面處理銅箔之製造方法Β」來作 表面處理銅箱之製造方法Α :在此先針對 槽之情況的黑色化處理方法之製造方法來作說明。料冷 t發明之表面處理銅羯之製造方法中所使用之铜 :吏用對上述形成硫酸鈷電鍍層之另一侧表面鉍’ J理,銅箱,亦可使用未進行者。在此先註明進;;2化 处理%之條件並無特別之限制,例如,於形成此超。化 粒時,-般可使用切的銅電解液。例如硫酸鋼類溶=鋼 中,其條件設定為:銅濃度為5〜10g/l、硫酸濃度為吹 100〜120g/l、氣濃度為2〇〜3〇ppm、9—苯基吖啶為 50〜300mg/l、液溫為3〇〜4〇〇c、電流密度為5〜2〇α/_2.2213-6405-PF(N2); Ahddub.ptd Page 11 1296636 V. INSTRUCTIONS (8) ___ = Figure and 83⁄4, 7 and 9 are known to be surface treated with copper The difference in foil is only in the chrome-treated layer, which is the same in the show. The chrome-treated layer 6 is formed on the rust-preventing layer 5 formed of a sub-lead-nickel alloy layer or a sub-lead-tantalum layer, etc., and is formed on a single surface or γ-copper 匕 IS secret chrome-treated layer 6. It can significantly improve the surface ϋ emulsification performance, and effectively prevent the surface of oxidative discoloration, etc., and the manufacturing method of the surface-treated copper foil which has a blackened surface. (Method for Producing First Surface-treated Copper Foil) It is preferable to use the method of manufacturing the first surface-treated copper foil. This manufacturing method can be further subdivided into the case of using a bath: ":", the following is divided into "first surface treatment copper / description two method A", "first surface treatment copper foil manufacturing method" A method of manufacturing a surface-treated copper box Α: First, a method of manufacturing a blackening treatment method in the case of a groove will be described. The cold used in the method for producing a surface-treated copper crucible of the invention is the same as the surface of the other side of the cobalt sulfate-plated layer formed above, and the copper box may not be used. The conditions for the % treatment are not particularly limited, for example, in forming this super. When granulating, it is generally possible to use a cut copper electrolyte. For example, in sulfuric acid steel-soluble steel, the conditions are set as follows: copper concentration is 5 to 10 g/l, sulfuric acid concentration is 100 to 120 g/l, gas concentration is 2 〇 to 3 〇 ppm, and 9-phenyl acridine is 50~300mg/l, liquid temperature is 3〇~4〇〇c, current density is 5~2〇α/_2.

2213-6405-PF(N2);Ahddub.ptd 第12頁 1296636 五、發明說明(9) a )製程係於上述銅箔之光澤面上形成硫酸鈷電鍍層。 ^硫酸鈷電鍍層之不攪拌浴槽係使用8g/ 1〜1 0g/1之七水合 鈷pH值5又定為4· 0以上之硫酸鈷鍍液,以2A/din2之電 ^密度進行電解,來形成黑色系之硫酸鈷電鍍層。亦即, ί Ϊ Ϊ溶液擾掉之情況的硫酸姑電鍍條件。此處若硫酸鈷 二電酸始未滿8g/i的話’會使得所形成之硫 均句。速度減慢,而且使硫酸鎳層厚度更加不 --相對地’右七水合硫酸鈷超過1〇g/;l的話,合 所形i J硫酸鈷電鍍層之色調良好的黑色化狀態的曰消失。 ,最好將此時之硫酸鈷鍍液之溶液 =·5的範㈣。調整於此範圍中,可獲得良率佳^^ 氧:Κ ”鈷電鍍層。於調整此ρΗ時’最好是不添加氫 乳化鈉或虱氧化鉀等其他的電解質。這是因為鈷 黑色溶液易於轉變為金屬色之緣故。 1s的 蚀々,藉由將溶液中之金屬離子濃度維持於一定,可 穩定ϊ持於4·0以上之範圍。由於為了使上述 ::2 ί鈷離子濃度穩$ ’最#採用*用溶解性之鈷電極 。=用氯氧化始進行適宜地添加,以使銘離 :,進行電解之電解密度係使用2A/dm2以上之電 ,#鑛液即使使用過量的電解電流,而形1真 的現象。因此該處也很少發生粉脫落 並不而要特別限制電流密度之上限值,玎 第13頁 2213-6405-PF(N2);Ahddub.ptd 1296636 五、發明說明(10) 依照—般技術常識,考慮製程之生產性, 定。 采作任意的設 b )製耘中,對經上述製程之銅箔,-以得到以硫酸鈷電鍍層為黑色化處理:水洗、乾燥, 此處之水洗方法、乾燥方法並無 面處理銅猪。 的方式來進行。 J吸制’可採用一般 第1表面處理銅箔之製造方法B :在此對 況的里多卜虛王Φ 士、+ >細 用祝掉浴槽之情 …、色化處理方法之製造方法來作說明。 月 本發明之表面處理銅箔之製造方法 :是形成於銅箱之光澤面上,藉由採用:下=電32213-6405-PF(N2); Ahddub.ptd Page 12 1296636 V. Description of the Invention (9) a) The process is to form a cobalt sulfate plating layer on the shiny side of the above copper foil. ^Cobalt sulfate electroplating layer is not stirred bath system using 8g / 1~1 0g / 1 of hydrated cobalt heptahydrate pH 5 is also determined to be more than 4.0 cobalt sulfate plating solution, electrolysis with 2A / din2 electric density, To form a black cobalt sulfate plating layer. That is, the ί Ϊ Ϊ solution disturbs the situation of the sulphate plating condition. Here, if the cobalt sulphate diacid is less than 8 g/i, the sulfur formed will be uniform. The speed is slowed down, and the thickness of the nickel sulfate layer is further reduced--relatively, the cobalt sulphate of the right heptahydrate is more than 1 〇g/; l, the 黑色 of the blackened state with a good color tone of the cobalt-cobalt plating layer disappears . It is better to use the solution of the cobalt sulfate plating solution at this time = (5). Adjusted in this range, a good yield of ^^ oxygen: Κ "cobalt plating layer can be obtained. When adjusting this ρΗ, it is preferable to add no other electrolyte such as hydrogen emulsified sodium or potassium cesium oxide. This is because the cobalt black solution It is easy to change to metallic color. The 1s etch can be stably maintained at a temperature above 4·0 by maintaining the concentration of metal ions in the solution at a certain level, because the concentration of the above::2 ί cobalt ion is stable. $ 'Most # uses *Soluble cobalt electrode. = Appropriately added with chlorine oxidation to make the separation: The electrolytic density of electrolysis is 2A/dm2 or more, #矿矿 even if used excessively Electrolytic current, and shape 1 is true. Therefore, there is little powder shedding at this place, and the upper limit of current density is not limited. 玎page 13 2213-6405-PF(N2); Ahddub.ptd 1296636 (Invention) (10) In accordance with the general technical knowledge, considering the productivity of the process, it is determined to be used in any of the b) bismuth, for the copper foil of the above process, to obtain a black cobalt plating layer Treatment: washing, drying, washing method here, dry The method is not to deal with the copper pig. The method of J suction can use the general first surface treatment copper foil manufacturing method B: In this case, the Rideau virtual king Φ, + > The method for manufacturing the color treatment method is described in the following: The method for producing the surface-treated copper foil of the present invention is formed on the shiny surface of the copper box by using: lower = electricity 3

不攪拌之硫酸姑電鍍槽所形成之硫 A 緻密的黑色化處理面。 站罨鍍層相冋 =時㈧的製程中,使用10g/卜40g/1之七水合硫酸 =、PH值於4.0以上、液溫於30 1以下之設定的硫酸始鍍 液,採用攪拌浴槽,以4A/dm2之電流密度進行電解,於上 述,箔之光澤面上形成黑色系硫酸鈷電鍍層。亦即,此處 j第1表面處理銅羯之製造方法A之差異處在於進行硫酸= 電鑛時,於攪拌上述硫酸鈷鍍液的同時,進行電解。此硫 酸始濃度有硫酸鈷濃度愈低,愈能製造出良好黑色化狀態 的傾向。然而,若硫酸鈷鍍液中之七水合硫酸鈷未滿 “ 10g/l的話,會使得採用攪拌浴槽所形成之硫酸鈷電鍍層 之電鍍速度減慢,而且使硫酸鎳層厚度更加不均勻,因而 欠缺工業的生產性。而若七水合硫酸鈷超過40g/ι的話, 會使形成之硫酸鈷電鍍層不易形成緻密的凹凸圖案,而使Sulfur formed by a non-stirred sulphate plating bath A dense blackened surface. In the process of standing 罨 plating phase 冋 = hour (eight), 10 g / b 40 g / 1 of heptahydrate sulfuric acid =, pH value of 4.0 or more, liquid temperature of 30 1 or less set of sulfuric acid starting plating solution, using a stirring bath, The current density of 4A/dm2 was electrolyzed, and a black cobalt sulfate plating layer was formed on the shiny side of the foil as described above. That is, here, the difference in the manufacturing method A of the first surface-treated copper crucible is that electrolysis is carried out while stirring the cobalt sulfate plating solution while sulfuric acid = electrowinning. The lower the concentration of sulfuric acid, the lower the concentration of cobalt sulfate, the more likely it is to produce a good blackening state. However, if the cobalt sulfate heptahydrate in the cobalt sulfate plating solution is less than "10g/l, the plating speed of the cobalt sulfate plating layer formed by the stirring bath is slowed down, and the thickness of the nickel sulfate layer is made more uneven. Lack of industrial productivity. If the cobalt sulfate heptahydrate exceeds 40g/ι, the formed cobalt sulfate plating layer is not easy to form a dense concave and convex pattern.

1296636 五、發明說明(11) 得良好的黑色化狀態消失。 卜此時的硫酸始鍍液之溶液pH值於4 u μ 係調整於….5的範圍。設定於此範圍4.; 時,最=定:良好的黑色始電鍍層。於調整此ΡΗ 田么Ζ 虱軋化鈉或氫氧化鉀等其他的電解質。 二,由Ϊ =黑色溶液易於轉變為金屬色之緣故。 值穩定之之金Λ離子濃_ 、4.〇以上之乾圍也是同於上述原因。 此時之硫酸銅鑛液,盆液、、四异 二此時的液溫有愈低,愈:得到 傾向。當液溫訊A认ο Π Μ 丁 ^—巴化處理面的 銅落之製造方:Α 下時’以上述之第1表面處理 以里色ίA= 可於未經粗链化處理之銅箱表面上施 1化處理中,得到良好的黑色化處理面。 流。於i範=電=:=:::使用歸以下之電 圖案的硫酸姑ί2;枓ί 密著性、良好之微細凹凸 面時,一般係採^: ^于面具有凹凸圖案之黑色系電鍍表 方法。然❿,、i此:::電流流入過多的無光澤灰色區之 行良好的黑色之電流密度小★’較能穩定進 若考慮工業上的生產性二此’儘可能使用小的電流密度’ 〇· 5A/dm2。另—方^ ,活:可推測電流密度之下限值為 述第1表面處理鋼爷之氣Γ、生電流密度超過4A/dm2的話,以上 化處理之銅簿表而,A坆方法A,即可形成與對未經粗糙 上加以黑色化處理相同程度之黑色化處 2213-6405-PF(N2);Ahddub.ptd 第15頁 1296636 五、發明說明(12) 理面,如此便失去採用製造方法B的意義。而且, 之電流密度範圍内形成黑色化處理面,;上述 脫落的現象。 該處也不會發生粉 般 b)袭程中’對經上述製程之銅箱’進行水洗 以得到以歧姑t鑛層為黑色化處理自的表面處理H 此處之水洗方法、乾燥方法並無特殊的限制,可’用〗= 的方式來進行。 (第2表面處理銅箔之製造方法) 第2表面處理銅箔之情況,以與上述第丨表面處理銅箔 相同之製造方法,來製造以硫酸鈷電鍍層為黑色處理化表 面之表面處理銅箔’其後形成防銹處理層。因此,製造流 程包括:「a )於銅箔之光澤面上形成黑色系之硫酸鈷電鍍 層;b)於形成黑色硫酸鈷電鍍層之銅箔之兩表面或單一表 面上’形成防銹處理層;及c )其後,進行水洗、乾燥」。 亦即,於第1表面處理銅箔之製造方法(製造方法A與製造 方法B )中僅增加防銹處理層之形成製程。 因此,在此對防銹處理層之形成製程來作說明。準備 元成黑色硫酸始電鍍層之形成的銅箔,於其雨表面或單 一表面上形成防銹處理層。關於使用習知之咪唑、苯並三 挫4之有機防銹、與一般所使用之亞錯或黃銅等之亞錯合 金的無機防銹等之情況,可以一般方法來進行,故此處不 再作詳細的說明。 以下將針對使用亞鉛-鎳合金鍍液或亞船-#合金鍍液 進行電鍍處理,以形成防銹處理層之情況來作說明。首先1296636 V. Description of invention (11) A good blackening state disappears. At this time, the pH of the solution of the sulfuric acid starting plating solution was adjusted to a range of .5 in 4 μ μ. Set to this range 4.; When, the most = fixed: a good black initial plating. Adjusting this ΡΗ田Ζ 虱 rolling other electrolytes such as sodium or potassium hydroxide. Second, because Ϊ = black solution is easy to change to metallic color. The value of the stable gold Λ ion concentration _, 4. 〇 above the dry circumference is also the same as above. At this time, the copper sulphate ore solution, the pot liquid, and the tetra-dial two have a lower liquid temperature at this time, and the more: the tendency is obtained. When the liquid temperature A ο Π Μ Μ — — — — 巴 巴 巴 巴 巴 巴 巴 巴 巴 — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — In the surface treatment, a good blackened surface was obtained. flow. In the i fan = electric =: =::: using the following electric pattern of sulfuric acid; ίί adhesion, good micro-concave surface, generally ^: ^ black plating on the surface with concave and convex pattern Table method. Then, i::: current flows into the excessively matt gray area. Good black current density is small. ★ It is more stable. Consider industrial productivity. 'Use small current density as much as possible' 〇· 5A/dm2. In addition, the square ^, live: It can be estimated that the lower limit of the current density is the first surface treatment steel, and the current density is more than 4A/dm2, and the above-mentioned copper sheet is processed, A method A, The blackening portion 2213-6405-PF(N2) can be formed to the same degree as the blackening treatment without roughening; Ahddub.ptd, page 15 1296636 V, invention description (12), so that the manufacturing is lost. The meaning of method B. Further, a blackened surface is formed in the current density range; the above phenomenon occurs. There is no powder-like b) in the process of b) washing the copper box of the above process to obtain the surface treatment H which is treated with blackening of the Qiu t-mine layer. Here, the washing method and drying method are There are no special restrictions, you can use '〗 〖 to do. (Method for Producing Second Surface-treated Copper Foil) In the case of the second surface-treated copper foil, a surface-treated copper having a black sulfated surface treated with a cobalt sulfate plating layer is produced in the same manner as the above-described second surface-treated copper foil. The foil 'afterwards forms an anti-rust treatment layer. Therefore, the manufacturing process includes: "a) forming a black cobalt sulfate plating layer on the shiny side of the copper foil; b) forming a rustproof treatment layer on both surfaces or a single surface of the copper foil forming the black cobalt sulfate plating layer ; and c) thereafter, washing and drying. That is, in the method of manufacturing the first surface-treated copper foil (the manufacturing method A and the manufacturing method B), only the formation process of the rust-preventing treatment layer is increased. Therefore, the formation process of the rust-preventing treatment layer will be described here. A copper foil formed by forming a black sulfuric acid initial plating layer is prepared to form a rust-preventing treatment layer on the rain surface or a single surface thereof. Regarding the use of conventional imidazole, organic rust prevention of benzotrim 4, and inorganic rust prevention of an Asian alloy such as sub-error or brass used in general, it can be carried out by a general method, and therefore it is not used here. Detailed explanation. The following description will be made on the case where the lead-nickel-nickel plating solution or the sub-ship-# alloy plating solution is subjected to a plating treatment to form a rust-preventing treatment layer. First of all

2213-6405-PF(N2);Ahddub.ptd 第16頁 1296636 五、發明說明(13) 說明亞船-鎳合金電鍍之情形。此處並無對使用之亞鉛一鎳 合金鍍液作特殊限制,在此舉出一例,例如使用鎳濃度為 卜2· 5g/l之硫酸鎳、使用亞鉛濃度為〇·卜lg/1之焦磷酸亞 錯、焦磷酸钟為50〜50 0g/l、液溫設定為2〇〜5(rc、pH值為 8〜11、電流密度為0.3〜10A/dm2之條件等。 接著說明亞鉛-鈷合金電鍍。此處也未對使用之亞鉛一 始合金鑛液作特殊限制,在此舉出一例,例如使用鈷濃度 為卜2.5g/l之硫酸鈷、使用亞鉛濃度為〇•卜1§/1之焦磷酸 亞鉛、焦磷酸鉀為50〜5 0 0g/l、液溫設定為2〇〜5〇〇c、&quot;值 為8〜11、電流密度為0.3〜l〇A/dm2之條件等。包括此亞鉛一 鈷合金電鍍與後述之鉻處理層的組合之防銹處理層,尤其 具有相當良好的防蝕性能。 a 第2表面處理銅镇之情形中,若於mi表面上形成亞 鉛-鎳合金層或亞鉛-鈷合金層等之後,形成鉻層,如此可 得到更佳的防鍅性。亦即,开3μ、+、&amp; ^ ^ J 1 形成上述防銹處理層後,可進 行鉻處理製程。此鉻處理制招由 θ ^ « ^ 一 I私中,即使是於鉻溶液與該銅 洛表面進彳亍接觸的置換處理介 状处埋,亦可採用電解鉻處理中之任 一種方法,其包括於鉻溶液φ ;隹― 士、+ L aL l ^ 合/夜中進仃電解以形成鉻被覆層之 方法。此外,此處所使用之枚、、六 ,,ffl ^ r m妙β $用之鉻溶液,可使用一般方法中所 走,田A —主二*田▲水洗、乾燥,以形成具有黑色化 處理面之表面處理銅箱。 〈電磁波遮蔽用之導電性網说、士 柿而々本品♦饰、罔板&gt; 本發明之上述具有黑色化處 理面之表面處理銅治,不备恭 泌又僬瓦古自紅财 曰^生黑色化處理面之粉掉落情 形’不僅具有良好的黑色,螻 ^ 成黑色化處理面也可以一般的2213-6405-PF(N2); Ahddub.ptd Page 16 1296636 V. Description of invention (13) Explain the case of Asian ship-nickel alloy plating. There is no particular limitation on the use of the lead-nickel-nickel alloy plating solution, and an example is given here, for example, nickel sulfate having a nickel concentration of 5.2 g/l, and a concentration of the lead used is 〇·b lg/1. The pyrophosphate pyrolysis, pyrophosphate clock is 50~50 0g/l, the liquid temperature is set to 2〇~5 (rc, the pH is 8~11, the current density is 0.3~10A/dm2, etc.) Lead-cobalt alloy plating. There is no special restriction on the use of the lead-based alloy ore solution. Here, for example, cobalt sulfate with a cobalt concentration of 2.5 g/l and a lead concentration of ruthenium are used. • Bu 1§/1 lead pyrophosphate, potassium pyrophosphate 50~500g/l, liquid temperature set to 2〇~5〇〇c, &quot;value 8~11, current density 0.3~l The condition of 〇A/dm2, etc. The rust-preventing layer including the combination of the bismuth-cobalt alloy plating and the chrome-treated layer described later has a particularly good anti-corrosion property. a In the case of the second surface-treated copper town, After forming a lead-nickel alloy layer or a lead-cobalt alloy layer on the mi surface, a chromium layer is formed, so that better tamper resistance can be obtained. That is, open 3μ, +, &Amp; ^ ^ J 1 After forming the above rust-preventing treatment layer, a chromium treatment process can be performed. The chrome treatment process is carried out by θ ^ « ^ I, even if the chromium solution is in contact with the copper surface. The displacement treatment medium may be buried, and any one of electrolytic chromium treatment may be used, which is included in the chromium solution φ; 隹 士, + L aL l ^ / night 仃 / 仃 夜 夜 夜 。 。 。 。 。 。 。 。 , used here, the six, f, ffl ^ rm wonderful β $ chromium solution, can be used in the general method, the field A - the main two * field ▲ washed, dried to form a blackened surface Surface treatment copper box. <Electrically conductive mesh for electromagnetic wave shielding, shi persimmon and 々 品 ♦ 罔 罔 罔 & & & & & 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本The ancient black money 曰 ^ raw blackening treatment of the powder drop situation 'not only has a good black, 蝼 ^ into a blackened surface can also be general

2213-6405-PF(N2);Ahddub.ptd 第17頁 1296636 五、發明說明(14) 銅蝕刻製程來蝕刻去除 之製程中時,可以报容 些優點,本發明可說是 之電磁波遮蔽用導電性 〈發明效果〉 本發明之具有黑色 酸鈷電鍍層多麼薄,均 波遮蔽用導電性網板需 量少,故蝕刻性佳,且 氧化氫系之銅蝕刻液的 此外,本發明之表 述表面處理銅箔之良率 電鍍層之效率增加,且 。因此,若應用於製造印刷電路板 易地進行任意形狀的加工。根據這 非常適用於電漿顯示器面板所裝置 網板。 化處理面之表面處理銅箱,無論硫 能呈現符合電漿顯示器面板之電磁 要之良好的黑色。此外,由於鈷含 不會降低一般之氯化鐵、硫酸一過 作用,使溶液壽命延長。 面處理銅箔之製造方法,可提升上 以上述製造條件所形成之硫酸始 可溶解於銅蝕刻液中。 【實施方式】 之黑色化處理表面 製造電磁波遮蔽用 之表面處理 導電性網板 以下列出製造具有上述 銅箔,進而使用銅|虫刻液來 之結果。 【實施例1】 本實施形態中係製造 1 a ’並以餘刻法試驗性地 形狀,以確認蝕刻性能。 圖所不之第1表面處理銅箔 作電磁波遮蔽用導電性網板之 本實施形態係採用以電M ^ ^ ,的銅自。然後,使用硫酸/ 液所得之厚度為15 /辰度為150g/i、液溫為3〇它2213-6405-PF(N2); Ahddub.ptd Page 17 1296636 V. Description of the Invention (14) When the copper etching process is used in the process of etching and removing, some advantages can be reported, and the present invention can be said to be conductive for shielding electromagnetic waves. [Effect of the Invention] The thickness of the black cobalt-cobalt plating layer of the present invention is small, and the amount of the conductive screen for the uniform wave shielding is small, so that the etching property is good, and the copper-etching liquid of the hydrogen peroxide system is further provided. The efficiency of processing the copper foil yield plating layer is increased, and. Therefore, if it is applied to the manufacture of a printed circuit board, it is easy to perform processing of an arbitrary shape. According to this, it is very suitable for the stencil of the plasma display panel. The surface treated copper box of the treated surface, regardless of the sulfur, exhibits a good black color in accordance with the electromagnetic properties of the plasma display panel. In addition, since the cobalt content does not lower the general action of ferric chloride and sulfuric acid, the life of the solution is prolonged. The method for producing a surface-treated copper foil can be improved by dissolving the sulfuric acid formed under the above-mentioned production conditions in the copper etching solution. [Embodiment] The surface of the blackened surface is used for the surface treatment of electromagnetic wave shielding. Conductive stencil The following is a result of manufacturing the copper foil described above and using copper worm liquid. [Example 1] In the present embodiment, 1 a ' was produced and experimentally shaped by a residual method to confirm the etching performance. The first surface-treated copper foil is not used as the conductive mesh for electromagnetic wave shielding. In this embodiment, copper is used as the electric M ^ ^ . Then, using a sulfuric acid/liquid, the thickness is 15/min, 150 g/i, and the liquid temperature is 3 〇.

2213-6405-PF(N2);Ahddub.ptd 1296636 五、發明說明(15) _ 溶液’並將㈣浸泡於此溶⑽秒,其後二 化;*ί後此ΐ厚度為15❹之電解鋼箱的粗糖面進行粗糙 化處理。此時之粗糙化處理俦 《延订祖才造 銅濃度卿卜硫酸為二之溶液中,採用 為“Omg/i之溶液,並使用液溫為38t :本广丫啶 ISA/df、電解時間2秒的電解條件。第1〇二在^為 化處理之銅箔表面。 ®、、、曰不!此粗糙 a) 製程中,於上述電解銅箔之 。此硫酸,⑽層4之形成係採用不攪= 濃度為10g/l之七水合硫酸鈷、pH 、y/、曰使用 硫酸鈷鍍液,以2A/dm2之電流宓声、隹:·;文/皿為30 C之 成黑色的硫酸銘電鐘層(換算;度度為進二8秒鐘的電解,以形 中之㈣子濃度並μ特別的V整』時溶液 間電解,不需調整金屬離子之濃声 由於為了以短時 形成之硫酸始電㈣。 辰度的緣故。第11圖繪示所 b) 製程中,以充足的純水進 境溫度達150 °C之乾燥爐中停留約4彩於,;以加熱器使環 獲得具有非常良好色調之二;水分去乾,而 la。上述各製程之間,原則的表面處理銅箱 J J1女排約1 5秒鐘的 程,以防止預處理製程之溶液的滲透。 、 /氣 〈表面處理銅箔之物性〉 以ΠΒ裝置,觀察具有經上述製程所得之黑色化處理2213-6405-PF(N2); Ahddub.ptd 1296636 V. Inventive Note (15) _ Solution 'and immerse (4) in this solution for 10 minutes, then dilute; * ί after this thickness of 15 ❹ electrolytic steel box The rough sugar surface is roughened. At this time, the roughening treatment 俦 "to extend the ancestor to make the copper concentration of the sulphuric acid to the second solution, the use of "Omg / i solution, and the use of liquid temperature of 38t: Benzidin ISA / df, electrolysis time 2 seconds of electrolysis conditions. The first two are on the surface of the copper foil that has been treated. ®,,, 曰 No! This roughness a) in the process, in the above-mentioned electrolytic copper foil. This sulfuric acid, (10) layer 4 formation system Use a cobalt sulphate solution with a concentration of 10 g/l, a pH of y/, and a cobalt sulphate plating solution at a concentration of 10 g/l, with a current of 2 A/dm2, 隹:·; text/dish is 30 C black Sulfuric acid Mingdian clock layer (conversion; degree of electrolysis into two 8 seconds of electrolysis, in the form of (four) sub-concentration and μ special V whole" electrolysis between the solutions, no need to adjust the thick sound of metal ions due to short At the time of the formation of sulfuric acid (four). The reason for the degree of Chen. Figure 11 shows that b) in the process, with sufficient pure water into the drying temperature of 150 ° C in the drying furnace to stay about 4 color; The ring is obtained with a very good color tone; the moisture is dried, and la. Between the above processes, the principle of the surface treatment copper box J J1 women's platoon about 1 5 Zhong Cheng, to prevent the penetration of a solution of pre-treatment process., / Air <the surface treated copper foil> A ΠΒ apparatus having a blackening was observed that obtained by the above process

2213-6405-PF(N2);Ahddub.ptd 第19頁 五、發明說明(16) 面的表面處理鋼箔之立丨丨 ^ 面,該黑色化處理面二結果得到與第3圖相同之剖 理面之Lab色度空門中度(d)為100nffl,該黑色化處 …,於r色::糊,光澤度[_ 剝離將之測試,,也沒有%:::口 〈電水顯不^之電磁波遮蔽用網板之製造〉 刻罩;=得It面張貼物 電:波遮蔽用導電性網二 =ίϊί :: 板間距為200 ,網板線寬為 罔 ,以紫外線進行曝光,以形成周圍具㈣Wm5 :網板的圖案。於進行的同肖,也: 之㈣。之:成以後續顯影步驟無法去除 案圖案4,使用鹼性溶液進行顯影’而形成蝕刻圖 然後,使用氯化鐵甜刻液作為銅 理面側進行銅蝕刻,其後剝離蝕刻罩幕層 :土化處 遮蔽用導電性網板。結,,不僅沒有姓刻殘留:成:磁波 刻製程進行地相當良好。第i 2圖繪示用以測 =蝕 試圖案(電路線寬為1 3 // m)之蝕刻狀態。由第丨2 x 、測 知’不僅沒有蝕刻殘留•,且可得到相t 回可 的整齊之電路。 之餘刻因子 【實施例2】 本實施形態中係製造第6圖所示之具有作為防錢處理 1296636 五、發明說明(17) 層之亞鉛-鎳合金層的第2表面處理銅箔1 c,並以触刻法試 驗性地製作電磁波遮蔽用導電性網板之形狀,以確認蝕刻 性能。因此,至形成硫酸鈷電鍍層之黑色化處理層止,均 與實施例1相同,所以在此僅對防銹處理條件作說明。又 黑色之硫酸鈷電鍍層之換算厚度與實施例1相同,為 3 2 0 m g / m2 〇 此處準備一於實施例1之單一表面上完成黑色硫酸鈷 電鍍層之形成的銅箔,對兩表面使用亞鉛—鎳合金鍍液進 行電鍍,於兩表面上形成亞鉛-鎳合金層。亞鉛—鎳合金層 之形成係以包括使用鎳濃度為2 · 0 g / 1之硫酸錄、使用亞錯 ?辰度為0· 5g/l之焦構酸亞錯、焦填酸钟為25〇g/ 1、液溫設 定為35°C、pH值為10、電流密度為5A/dm2之條件,進行約5 秒鐘的電解,以於兩表面上電鍍出均勻且平滑的膜層。 然後’如同實施例1,以充足的純水進行沖洗,於以 加熱器使環境溫度達150艽之乾燥爐中停留約4秒鐘,把水 分去乾’而獲得具有非常良好色調之黑色化處理面的表面 處理銅箔1 c。上述各製程之間,原則上安排約丨5秒鐘之純 水清洗製程,以防止預處理製程之溶液的滲透。 〈表面處理銅箔之物性〉 以F I B裝置,觀察具有經上述製程所得之黑色化處理 面的表面處理銅箔之剖面,其結果得到與第3圖相同的剖 面,該黑色化處理面之剖面高度為丨丨5nm,該黑色化處理 面之Lab色度空間中的L值為28,光澤度[Gs(6〇。為2ι。 此外,於黑色化處理面上貼附黏著性膠帶,並將膠帶剝離2213-6405-PF(N2); Ahddub.ptd Page 19 V. OBJECT DESCRIPTION OF THE INVENTION (16) The surface of the surface treated steel foil is the same as that of the surface of the blackened surface. Lab's Lab color empty door medium (d) is 100nffl, the blackening is..., in r color:: paste, gloss [_ peeling will test, and there is no %::: mouth <electric water does not show ^ Manufacture of electromagnetic wave shielding mesh board > hood; = It is the surface sticker electricity: wave shielding conductive mesh 2 = ίϊί :: The board spacing is 200, the stencil line width is 罔, exposed by ultraviolet light, Form a pattern with (4) Wm5: stencil around. In the same Xiao Xiao, also: (4). In the subsequent development step, the pattern 4 cannot be removed, and the development is performed using an alkaline solution to form an etching pattern. Then, the copper chloride etching is performed using the ferric chloride sweet etching liquid as the copper surface side, and then the etching mask layer is peeled off: The conductive stencil for the earthing area is shielded. Knot, not only does the surname have no residue: Cheng: Magnetic wave engraving process is quite good. Figure i2 shows the etched state used to measure the etched pattern (circuit line width is 1 3 // m). From the second x2 x , the measurement ‘not only has no etch residue•, but also a neat circuit that can be phased back. (Resolution 2) In the present embodiment, the second surface-treated copper foil 1 having the pinzo-nickel alloy layer as the anti-money treatment 1296636 and the invention (17) layer shown in Fig. 6 is produced. c. The shape of the conductive mesh for electromagnetic wave shielding was experimentally produced by the etch method to confirm the etching performance. Therefore, since the blackening treatment layer for forming the cobalt sulfate plating layer is the same as that of the first embodiment, only the rustproof treatment conditions will be described here. The conversion thickness of the black cobalt sulfate plating layer was the same as that of Example 1, which was 3 2 0 mg / m 2 . Here, a copper foil formed by performing a black cobalt sulfate plating layer on the single surface of Example 1 was prepared. The surface is plated with a lead-nickel alloy plating solution to form a lead-nickel alloy layer on both surfaces. The formation of the sub-lead-nickel alloy layer includes the use of a sulfuric acid having a nickel concentration of 2 · 0 g / 1 , the use of a sub-error ? 0 g / l of a pyro-acidic acid error, and a coke filling acid clock of 25 〇g/1, the liquid temperature was set to 35 ° C, the pH was 10, and the current density was 5 A/dm 2 , and electrolysis was performed for about 5 seconds to plate a uniform and smooth film layer on both surfaces. Then, as in Example 1, rinsing with sufficient pure water, staying in a drying oven with a heater at an ambient temperature of 150 Torr for about 4 seconds, and drying the water to obtain a blackening treatment with a very good color tone. Surface treatment of copper foil 1 c. Between the above processes, a pure water cleaning process of about 5 seconds is arranged in principle to prevent penetration of the solution of the pretreatment process. <Physical properties of surface-treated copper foil> The cross-section of the surface-treated copper foil having the blackened surface obtained by the above process was observed by a FIB apparatus, and as a result, the same cross section as that of Fig. 3 was obtained, and the height of the blackened surface was obtained. For 丨丨5nm, the L value in the Lab chromaticity space of the blackened surface is 28, and the gloss [Gs (6 〇. is 2 ι. In addition, the adhesive tape is attached to the blackened surface, and the tape is attached) Stripping

1296636 ——---- 五、發明說明(18) 之測忒中,也沒有發現粉脫落情形。 &lt;電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理 =蔽用導電性網板。結果,即使 '處〜來製作電磁 了相當良好的蝕刻。 」緣省物,可說是進行 【實施例3】 本實施例係製造第8圖所示之具有作 f錯-鎳合金層、與鉻處理層#第2表面處理鋼二理層之 蝕刻法試驗性地製作電磁波遮蔽用導板:1,’並以 :認餘刻性能…,至形成硫酸姑以:卢以 二㈤相同,所以在此僅處上^ 同為=硫酸姑電鑛層之換算厚度與實施^ :銹f理層之形成如同實施例2,使用亞鉛—鎳合金铲 :戶m上形成亞鉛-鎳合金層之後,對兩表面進行' ^處理。在此,採用電解路處理,電解條件之設定包 = 〇g/l、PH值為11.5、液溫為35。〇、電解密度為 8A/dm2、電解時間為5秒鐘。 然後,當完成鉻層之形成時,以充足的純水進行沖 2 ?以加熱器使環境溫度達15〇。〇之乾燥爐中停留約4秒 鈿’二水分去It,而獲得具有非常良好色調之黑色化處理 面的表面處理銅箔le。上述各製程之間,原則上安排約15 秒鐘之純水清洗製程,以防止預處理製程之溶液的滲透。 2213-6405-PF(N2);Ahddub.ptd 第22頁 1296636 五、發明說明(19) 〈表面處理銅箔之物性&gt; 以FIB裝置,觀察具有經上述製程所得之 面的表面處理銅箔之叫面,置沾 …、色化處理 面广:、色化處理面之剖面高度為12lnm,該黑色化: 面之Lab色度空間中的L值為27,光澤度[Gs(6 ; 此外,於黑色化處理面上貼附點著性膠帶,並將= 之測試中,也沒有發現粉脫落情形。 夕W離 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅羯來製作 波遮蔽用導電性網板。結果,即使有防銹處理層的存 蝕刻也沒有受到影響,而且沒有蝕刻殘留物,可說是 了相當良好的蝕刻。 w 7^订 【實施例4】 本實施例係製造第6圖所示之具有作為防銹處理層之 亞鉛-始合金層的第2表面處理銅箱1 c,並以餘刻法試驗座 地製作電磁波遮蔽用導電性網板之形狀,以確認餘刻性生 能。因此,至形成硫酸鈷電鍍層之黑色化處理層止,均邀 實施例1相同,所以在此僅對防銹處理條件作說明。又黑、 色之硫酸鈷電鍍層之換算厚度與實施例1相同,為 320mg/m2 〇 此處準備一於實施例1之光澤面上完成黑色硫酸鍺電 鑛層之形成的銅箔’對其兩表面使用亞錯-始合金鍍液進 行電鍍,以於兩表面上形成亞鉛-鈷合金層。亞鉛-麵合金 層之形成係以包括使用鈷濃度為2· Og/ 1之硫酸鈷、使用亞 2213-6405-PF(N2);Ahddub.ptd 第23頁 1296636 五、發明說明(20) 錯濃度為0 · 5 g / 1之焦鱗酸亞錯、焦填酸鉀為2 5 0 g / 1、液溫 設定為35°C、pH值為10、電流密度為5A/dm2之條件,進行 約5秒鐘的電解,以於兩表面上電鍍出均勻且平滑的膜 層0 然後,如同實施例1,以充足的純水進行沖洗,於以 加熱器使環境溫度達1 5 0 °C之乾燥爐中停留約4秒鐘,把水 分去乾,而獲得具有非常良好色調之黑色化處理面的表面 處理銅箱1 c。上述各製程之間,原則上安排約丨5秒鐘之純 水清洗製程,以防止預處理製程之溶液的滲透。 〈表面處理銅箔之物性〉 以FIB裝置,觀察具有經上述製程所得之黑色化處理 面的表面處理銅箔之剖面,其結果得到與第3圖相同的剖 面,該黑色化處理面之剖面高度為128nm,該黑色化處^ 面之Lab色度空間中的l值為28,光澤度[Gs(6〇。。 此外,於黑色化處理面上貼附黏著性膠帶,並將膠帶雜 之測试中’也沒有發現粉脫落情形。 : 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅箔來 波遮蔽用導電性網板。結果,即使有防銹處理乍電磁 蝕刻也不會受到影響,而且沒有蝕刻殘留⑯,4 d 了相當良好的蝕刻。 η兄疋進行 【實施例5】1296636 ——————- V. In the test of the invention (18), no powder shedding was found. &lt;Manufacture of Electromagnetic Wave Screening Screen for Plasma Display> As in Example 1, the obtained surface treatment was used = a conductive mesh plate was used. As a result, even the 'where ~ to make electromagnetics is quite good etching. [Embodiment 3] This embodiment is an etching method having a f-type nickel alloy layer and a chromium-treated layer #2nd surface-treated steel two-layer layer as shown in FIG. The tester for electromagnetic wave shielding is experimentally produced: 1, 'and to: recognize the residual performance..., to form the sulfuric acid: Lu is the same as the second (five), so here only ^ is the same as = sulfuric acid The thickness is calculated and the formation of the rust layer is the same as in the second embodiment. After the lead-nickel alloy shovel is formed on the household m, the two surfaces are subjected to '^ treatment. Here, electrolysis treatment is used, and the setting conditions of the electrolysis conditions are 〇g/l, the pH is 11.5, and the liquid temperature is 35. 〇, electrolytic density is 8A/dm2, and electrolysis time is 5 seconds. Then, when the formation of the chromium layer is completed, the flushing is performed with sufficient pure water to heat the ambient temperature to 15 Torr. In the drying oven of the crucible, the surface treated copper foil le having a very good hue of the blackened surface was obtained by leaving it for about 4 seconds. Between the above processes, a pure water cleaning process of about 15 seconds is arranged in principle to prevent penetration of the solution of the pretreatment process. 2213-6405-PF(N2); Ahddub.ptd Page 22 1296636 V. Description of Invention (19) <Physical properties of surface-treated copper foil> Using a FIB apparatus, the surface-treated copper foil having the surface obtained by the above process was observed. Called surface, coated..., color processing surface: The height of the colorized surface is 12lnm, the blackening: the L value of the Lab's Lab color space is 27, and the gloss [Gs(6; A point tape was attached to the blackened surface, and no powder peeling was observed in the test of =. The manufacturing of the electromagnetic wave shielding mesh for the plasma display was as follows. The copper ruthenium was surface-treated to form a conductive stencil for wave shielding. As a result, even if the etching treatment of the rust-preventing treatment layer was not affected, and there was no etching residue, it was said to be a relatively good etching. [Embodiment 4] In this embodiment, the second surface-treated copper case 1c having the lead-starting alloy layer as the rust-preventing treatment layer shown in Fig. 6 is produced, and the electromagnetic wave shielding is performed by the test method in the remaining test method. Use the shape of the conductive mesh to confirm the residual energy Therefore, the blackening treatment layer to form the cobalt sulfate plating layer is the same as in the first embodiment, so only the rustproof treatment conditions will be described here. The converted thickness of the black and color cobalt sulfate plating layer and the embodiment 1 Similarly, it is 320 mg/m2. Here, a copper foil which is formed on the glossy surface of Example 1 to form a black barium sulfate electroplated layer is prepared, and the two surfaces are plated with a sub-alloy-alloy plating solution for two. A lead-cobalt alloy layer is formed on the surface. The formation of the lead-and-face alloy layer includes the use of cobalt sulfate having a cobalt concentration of 2.0 g/1, using sub-2213-6405-PF (N2); Ahddub.ptd 23rd Page 1296636 V. Description of the invention (20) The pyrophosphate acid error with a concentration of 0 · 5 g / 1 is 2,500 g / 1, the liquid temperature is set to 35 ° C, and the pH is 10, With a current density of 5 A/dm 2 , electrolysis was carried out for about 5 seconds to electroplate a uniform and smooth film layer on both surfaces. Then, as in Example 1, it was rinsed with sufficient pure water to heat the heater. Allow the environment to reach a temperature of 150 ° C in the drying oven for about 4 seconds, drain the water, and get very good The surface treatment copper box 1 c of the blackened surface of the color tone. In principle, a pure water cleaning process of about 5 seconds is arranged between the above processes to prevent the penetration of the solution of the pretreatment process. Physical properties> The cross section of the surface-treated copper foil having the blackened surface obtained by the above process was observed by a FIB apparatus, and as a result, the same cross section as that of Fig. 3 was obtained. The height of the blackened surface was 128 nm, and the blackening was performed. The l value in the Lab chromaticity space at the surface is 28, and the gloss [Gs (6 〇. . Further, an adhesive tape was attached to the blackened surface, and no powder peeling was observed in the test of the tape. : <Manufacture of Electromagnetic Wave Screening Screen for Plasma Display> As in Example 1, the obtained surface-treated copper foil was used to shield the conductive mesh. As a result, even if there is an anti-rust treatment, the electromagnetic etching is not affected, and there is no etching residue for 16 and 4 d, which is quite good etching. η 疋 疋 [Example 5]

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五、發明說明(21) #刻法試驗性地製作蕾 確認敍刻性能。因^磁波遮蔽用導電性網板之形狀,以 層止,均與實施例“目同至形鈷電鍍層之黑色化處理 說明。又S色之护_ β同,所以在此僅對防銹處理條件作 同為二,:二”酸姑電鑛層之換 防錄處理層之形忐 液,於兩表面上形成J二實人施::,使用亞鉛-銘合金鍍 鉻處理。在此,採之後’對兩表面進行 酸5,&quot;、ΡΗ值為U.5、液溫為35。。、電’:以包括鉻 8A/dm2、電解時間為5秒鐘。 I心度為 然後’當完成鉻層之形成時,以充足的純水進 :器使環境溫度達15(rc之乾燥爐中停留約“少 的Ϊ: 獲得具有非常良好色調之黑色化處理 面的表面處理_e。上述各製程之間,原則上 秒鐘之純水清洗製程,以防止預處理製程之溶液的滲透。 〈表面處理銅箔之物性〉 ^ 以FIB裝置,觀察具有經上述製程所得之黑色化處理 面的表面處理銅箔之剖面,其結果得到與第3圖相同的剖 面’該黑色化處理面之剖面高度為1 2 〇ηιη,該黑色化處理 面之Lab色度空間中的丄值為29,光澤度[Gs(60。)]為22。 此外,於黑色化處理面上貼附黏著性膠帶,並將膠帶剝離 之測試中,也沒有發現粉脫落情形。 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅箔來製作電磁V. INSTRUCTIONS INSTRUCTIONS (21) #刻法试验制作制作制作 Confirmation of characterization performance. Because the shape of the conductive mesh plate for magnetic wave shielding is layered, it is the same as the blackening treatment of the cobalt plating layer of the embodiment. The same is true for the S color protection, so only the rust prevention is used here. The treatment conditions are the same as two: the shape of the sputum of the anti-recording treatment layer of the second “Shengu electric ore layer” is formed on the two surfaces: J: chrome treatment with a lead-precious alloy. Here, after the picking, the two surfaces were subjected to acid 5, &quot;, the enthalpy value was U.5, and the liquid temperature was 35. . , electricity ': to include chromium 8A / dm2, electrolysis time is 5 seconds. I heart is then 'when the formation of the chrome layer is completed, with sufficient pure water to enter: the ambient temperature reaches 15 (the rc drying oven stays about "less Ϊ: obtain a blackened surface with very good color tone Surface treatment _e. In principle, a pure water cleaning process between the above processes is to prevent the penetration of the solution of the pretreatment process. <Physical properties of the surface-treated copper foil> ^ With the FIB device, the observation has the above process The cross section of the surface-treated copper foil of the obtained blackened surface was obtained, and as a result, the cross section of the blackened surface was obtained as the cross-sectional height of the blackened surface, which was 1 2 〇ηιη, and the blackened surface was in the Lab chromaticity space. The 丄 value was 29, and the gloss [Gs (60.)] was 22. In addition, in the test in which the adhesive tape was attached to the blackened surface and the tape was peeled off, no powder peeling was observed. Manufacture of Electromagnetic Wave Masking Screen for Display> As in Example 1, the obtained surface-treated copper foil was used to fabricate electromagnetic

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Ik 五、發明說明(22) 波遮蔽用導電性網板。結果,即使有防銹處理層的存在, 餘刻也沒有受到影響,而且沒有蝕刻殘留物,可說是進行 了相當良好的姓刻。 【實施例6】 本實施例與實施例1不同的是未對電解銅箔之粗表面 進行粗糙化處理,以下則如同實施例1,於電解銅箱之光 澤面上,形成硫酸鈷電鍍層之黑色化處理層,以製造如第 2圖所示之第2表面處理銅箔1 b,並進行與實施例1相同之 測試。因此,為了避免與實施例1相同的贅述,此處省略 其說明。又黑色硫酸鈷電鍍層之換算厚度為31〇mg/m2。第 1 3圖繪示此處所獲得之表面處理銅箔之黑色化表面(硫, 鈷電鍍層)。 |夂 〈表面處理銅猪之物性&gt; 以fib裝置,觀察具有經上述製程所得之黑色化广 面的表面處理銅箱之剖面,其結果得到與第3圖相二 面,該黑色化處理面之剖面高度為丨丨6nm,該黑色 _ 4 面之Lab色度空間中的L值為27,光澤度[Gs(6〇、、。 处理 此外,於黑色化處理面上貼附黏著性膠帶,並 =23。 之測試中,也沒有發現粉脫落情形。 &gt; 帶剝離 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面^理銅箱 波遮蔽用導電性網板。結果,即使有防銹處理衣作電磁 餘刻也沒有受到影響’而且沒有蝕刻殘留物,:二存在’ 了相當良好的蝕刻。 ’可說是進行Ik V. INSTRUCTIONS (22) Conductive stencil for wave shielding. As a result, even if there is a rust-preventing treatment layer, the residual is not affected, and there is no etching residue, and it can be said that a relatively good surname is performed. [Embodiment 6] This embodiment differs from Embodiment 1 in that the rough surface of the electrolytic copper foil is not roughened. Hereinafter, as in Embodiment 1, a cobalt sulfate plating layer is formed on the shiny surface of the electrolytic copper box. The treated layer was blackened to produce the second surface-treated copper foil 1 b as shown in Fig. 2, and the same test as in Example 1 was carried out. Therefore, in order to avoid the same description as in the first embodiment, the description thereof is omitted here. The converted thickness of the black cobalt sulfate plating layer was 31 〇 mg/m 2 . Fig. 13 shows the blackened surface (sulfur, cobalt plating layer) of the surface-treated copper foil obtained herein. |夂<Physical properties of surface-treated copper pigs> The cross-section of the surface-treated copper box having the blackened wide surface obtained by the above process was observed by a fib apparatus, and the result was obtained on the same side as the third figure, and the blackened surface was The height of the section is 丨丨6nm, and the L value of the Lab chromaticity space of the black _4 surface is 27, and the glossiness [Gs (6〇, . . . In addition, the adhesive tape is attached to the blackened surface, And =23. In the test, no powder shedding was observed. &gt; Fabrication of Electromagnetic Wave Screening Screen with Stripping <Microprocessor Display> As in Example 1, the obtained surface copper box wave shielding conductivity was used. The stencil. As a result, even if there is a rust-proof treatment for electromagnetic remneration, it is not affected 'and there is no etching residue, two: there is a fairly good etching. 'It can be said that

I296636 五、發明說明(23) 【實施例7】 本實施例與實施例6相同,未對電 ,粗輪化處理,使用未進行上述粗糙化:理之之粗二表面 進仃黑色化處理,以製造如第2圖所示之第1 ^冶,來 :狀並以敍刻法試驗性地製作電磁波 形狀,以確認蝕刻性能。 守电f生、揭板之 本實施形態係採用以電解硫酸銅溶液所得之 二的銅?I。然後’使用硫酸濃度為15〇g/1、液 :、、、5 而稀硫酸溶液,並將銅箔浸泡於此溶液 ‘&quot;、 面之清洗。 ,、俊進仃表 Μ Ϊ後;^對該㈣之光澤面進行a)製程,以形成硫酸姑 =鍍層。硫㈣電鑛層之形成係採用攪拌浴槽,使 ^ ”水合硫酸姑、PH值為5.5、液溫為27°C之硫酸Ϊ f液,以lA/dm2之電流密度進行15秒鐘的電解,以形成里 色的硫酸鈷電鍍層(換算厚度為334mg/m2)。此時溶液= 2離子濃度並不作特別的調整。這是因以了以短時 解,而不需調整金屬離子之濃度的緣故。第14圖繪 成之硫酸鈷電鍍層。 1〜 b )製程中,以充足的純水進行沖洗,於以加埶器俨 境,度達150 t之乾燥爐中停留約4秒鐘,把水分#去乾,= 獲得具有非常良好色調之黑色化處理面的表面處理銅箔 1。上述各製程之間,原則上安排約15秒鐘之純水清洗製 程’以防止預處理製程之溶液的滲透。 〈表面處理銅箔之物性〉I296636 V. INSTRUCTION DESCRIPTION (23) [Embodiment 7] This embodiment is the same as the embodiment 6, and is not subjected to electric power, coarse rounding treatment, and the use of the above-mentioned roughening: the rough surface of the rough surface is blackened. The electromagnetic wave shape was experimentally produced by the first etching method as shown in Fig. 2 to confirm the etching performance. In the present embodiment, the copper I obtained by electrolyzing a copper sulfate solution is used. Then, use a sulfuric acid solution with a sulfuric acid concentration of 15 〇g / 1, liquid :, , , 5, and soak the copper foil in the solution ‘&quot;, face cleaning. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The formation of the sulfur (4) electro-mineral layer is carried out by using a stirring bath to make the hydrazine sulfate, the pH value of 5.5, and the liquid temperature of 27 ° C of barium sulfate f, and electrolysis at a current density of 1 A/dm 2 for 15 seconds. To form a color cobalt cobalt plating layer (converted to a thickness of 334 mg / m 2 ). At this time, the solution = 2 ion concentration is not specially adjusted. This is because a short-term solution does not need to adjust the concentration of metal ions. For the reason, the cobalt sulfate coating layer is drawn in Fig. 14. 1~ b) In the process, rinse with sufficient pure water, and stay in the drying furnace with a temperature of 150 t for about 4 seconds. The moisture-treated # is dried, and the surface-treated copper foil 1 having a blackening treatment surface having a very good color tone is obtained. In principle, a pure water cleaning process of about 15 seconds is arranged between the above processes to prevent the solution of the pretreatment process. Penetration. <Physical properties of surface treated copper foil>

2213-6405-PF(N2);Ahddub.ptd 1296636 五、發明說明(24) 以F I B裝置,觀察具有經上述製程所得之黑色化處王 面的表面處理銅箔之剖面,其結果得到與第3圖相== 面,該黑色化處理面之剖面高度為131nm,該黑色化詹= 面之Lab色度空間中的L值為w,光澤度[Gs(6〇、。)]為I理 此外,於黑色化處理面上貼附黏著性膠帶,並將膠帶雜 之測試中’也沒有發現粉脫落情形。 ; 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅箔來製 波遮蔽用導電性網板。結果’即使有防錄處理層的广在 蝕刻也不會受到造成影響,而且沒有蝕刻殘留^4二 進行了相當良好的蝕刻。 兄疋 【實施例8】 本實施例與實施例6相同,未對電解銅箔之粗輪 進行粗糙化處理,使用未進行上述粗糙化處理之銅^' 進行黑色化處理,以製造如第2圖所示之第1裘而老、泊’來 n . 示1衣面處理銅箔 lb,並以蝕刻法試驗性地製作電磁波遮蔽用 形狀,以確認蝕刻性能。 網板之 本實施形態係採用以電解硫酸銅溶液所得之厚声 /zm的銅箔。然後,使用硫酸濃度為15〇g/1、液溫為^”、、。 的稀硫酸溶液,並將銅箔於此溶液浸泡3 〇粆,^〜 C 面之清洗。 ,、後進行表 其後’對該銅箱之光澤面進行a)製程,以形成炉 電鍍層。硫酸鈷電鑛層之形成係採用擾拌浴槽,使1 ^、 20g/l之七水合硫酸姑、PH值設定為5·5、液‘為2213-6405-PF(N2); Ahddub.ptd 1296636 V. Description of the invention (24) The FIB device was used to observe the profile of the surface-treated copper foil having the blackened surface of the blackened portion obtained by the above process, and the result was obtained and the third The phase == surface, the height of the blackened surface is 131 nm, the L value of the black gamma = Lab's chromaticity space is w, and the gloss [Gs(6〇, .)] is Adhesive tape was attached to the blackened surface, and the powder was not tested. <Manufacture of Electromagnetic Wave Screening Screen for Plasma Display> As in Example 1, the obtained surface-treated copper foil was used to dampen the conductive mesh for shielding. As a result, even if the etching prevention layer was extensively etched, it was not affected, and no etching residue was performed, and a relatively good etching was performed. [Embodiment 8] This embodiment is the same as the embodiment 6, and the roughening of the electrolytic copper foil is not roughened, and the copper is not subjected to the above-described roughening treatment to be blackened to produce the second The first surface of the figure is shown in the figure, and the surface of the copper foil lb is shown in the first surface. The shape of the electromagnetic wave shielding is experimentally produced by an etching method to confirm the etching performance. In the present embodiment, a thick acoustic/zm copper foil obtained by electrolyzing a copper sulfate solution is used. Then, use a dilute sulfuric acid solution having a sulfuric acid concentration of 15 〇g/1 and a liquid temperature of ^", and the copper foil is immersed in the solution for 3 〇粆, ^~ C surface cleaning, and then After the 'a glossy surface of the copper box, a) process to form a furnace plating layer. The formation of the cobalt sulfate electric ore layer is a scavenging bath, so that 1 ^, 20 g / l of heptahydrate sulfate, PH value is set to 5·5, liquid 'for

1296636 五、發明說明(25) 酸鈷鍍液,以2A/dm2之電流密度進行7秒鐘的電解, 黑色的硫酸鈷電鍍層(換算厚度為34〇mg/m2)。此/形成 之#離子濃度並不作特別的調整。這是因為為了以短=中 電解,而不需調整金屬離子之濃度的緣故。所形=間 鈷電鍍層之形態與第1 4圖所示的相同。 爪酸 b)製程中,以充足的純水進行沖洗,於以加埶 境溫度達150 t之乾燥爐中停留約4秒鐘,把水分使環 獲得具有非常良好色調之黑色化處理面的表面處理^而 ib。上述各製程之間,原則上安排約15秒鐘 清: 程,以防止預處理製程之溶液的滲透。 ^无良 〈表面處理銅箔之物性〉 以FIB裝置,觀察具有經上述製程所得之黑色化严 面的表面處理銅箔之剖面,其結果得到與第3圖相^ 面,該黑色化處理面之剖面高度為124nm,該黑色化广j 面之Lab色度空間中的L值為33,光澤度[Gs(6〇。。 此外’於黑色化處理面上貼附黏著性膠帶,1將膠帶齙 之測試中’也沒有發現粉脫落情形。 ; 〈電聚顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅箔來製 波遮蔽用導電性網板。結果,即使有防銹處理層的 蝕刻也不會受到造成影響,而且沒有蝕刻殘留 進行了相當良好的蝕刻。 4况疋 【實施例9】 本實施例與實施例6相同 未對電解銅箱之粗表面進1296636 V. INSTRUCTIONS (25) The cobalt cobalt plating solution is electrolyzed for 7 seconds at a current density of 2 A/dm 2 , and a black cobalt sulfate plating layer (converted to a thickness of 34 〇 mg/m 2 ). This/formation #ion concentration is not specifically adjusted. This is because in order to electrolyze in the short = medium, it is not necessary to adjust the concentration of the metal ions. The shape of the cobalt-plated layer is the same as that shown in Fig. 14. In the process of the claw acid b), it is rinsed with sufficient pure water, and left in a drying oven with a temperature of 150 t, for about 4 seconds, to give the ring a surface with a very good color blackening surface. Process ^ and ib. Between the above processes, in principle, about 15 seconds are cleared to prevent penetration of the solution of the pretreatment process. ^Unscrupulous <Physical properties of surface-treated copper foil> A cross-section of a surface-treated copper foil having a blackened surface obtained by the above-described process was observed by a FIB apparatus, and as a result, the surface of the surface-treated copper foil was obtained, and the blackened surface was obtained. The height of the section is 124 nm, and the L value in the Lab color space of the blackened wide face is 33, and the glossiness [Gs (6 〇.) In addition, the adhesive tape is attached to the blackened surface, and the tape is applied. In the test of 龅, no powder detachment was observed. <Manufacture of Electromagnetic Wave Shielding Screen for Electro-Polymer Display> As in Example 1, the obtained surface-treated copper foil was used to prepare a conductive stencil for shielding. Even if the etching of the rust-preventing treatment layer is not affected, and the etching residue is not performed, a relatively good etching is performed. 4 Case 疋 [Example 9] This example is the same as Example 6 except for the rough surface of the electrolytic copper box. Enter

1296636 五、發明說明(26) -- 行粗糙化處理,對其光澤面來進行黑色化處理,以製造如 第2圖所不之第If面處理銅箱lb ’並以蝕刻法試驗性 作電磁^蔽^導電性纟m狀,以確難刻性能。 本貫施形恶係採用以電解硫酸銅溶液所得之厚度為15 _的銅羯。然後,使用硫酸濃度為15〇g/1、液溫為 的稀硫酸溶液,並將銅箔浸泡於此溶液3 〇秒,其後進行表 面之清洗。 其後,對該mi之光澤面進行a)製程,以形成硫 電鍍層。硫酸姑電鍍層之形成係採用授摔浴槽,使用包括 40g/l之七水合硫酸鈷、pH值為5 5、液溫為27它之硫酸鈷 鍍液,以1A/dm2之電流密度進行15秒鐘的電解,以 色的硫酸始電鍍層(換算厚度為338mg/m2)。此時溶液中^ 飴離子濃度並不作特別的調整。$是因為為了以 解,而不需調整金屬離子之濃度的緣故 ^ 電鍍層之形態與第11圖所示的相同。 取瓜歧鈷 b)製程中,以充足的純水進行沖洗,於以加埶 境溫度達1501之乾燥爐中停留約4秒鐘,把水分;;乾使^ 獲得具有非常良好色調之黑色化處理面的表面處理銅箔 1=。上述各製程之間,原則上安排約15秒鐘之純水清洗 程,以防止預處理製程之溶液的滲透。 〈表面處理銅箔之物性〉 以FIB裝置,觀察具有經上述製程所得之黑色化處理 面的表面處理銅羯之剖面’其結果得到與第3圖相同的 面,該黑色化處理面之剖面高度為134nm,該黑色化處理1296636 V. INSTRUCTIONS (26) -- Roughening treatment, blackening the shiny surface to produce the first If-hand treated copper box lb ' as shown in Fig. 2 and experimentally using electromagnetic etching ^ ^ ^ Conductive 纟 m shape, so it is difficult to inscribe performance. The present embodiment uses a copper ruthenium having a thickness of 15 Å obtained by electrolyzing a copper sulfate solution. Then, a dilute sulfuric acid solution having a sulfuric acid concentration of 15 〇g / 1, liquid temperature was used, and the copper foil was immersed in the solution for 3 sec seconds, after which the surface was cleaned. Thereafter, the glossy side of the mi is subjected to a) process to form a sulfur plating layer. The formation of the sulphate plating layer is carried out by using a bath, using a cobalt sulfate solution containing 40 g/l of cobalt sulfate heptahydrate, a pH of 55, and a liquid temperature of 27, at a current density of 1 A/dm 2 for 15 seconds. Electrolysis of the clock, color sulfuric acid initial plating (converted thickness of 338mg/m2). At this time, the concentration of 饴 ions in the solution is not specially adjusted. $ is because the concentration of the metal ions is not required to be solved, and the form of the plating layer is the same as that shown in Fig. 11. In the process of taking the guacame b), rinse with sufficient pure water, and leave it in a drying oven with a temperature of 1501 to hold the water for about 4 seconds to remove the water; dry to obtain a black color with a very good color tone. Surface treated copper foil 1 = of the treated surface. Between the above processes, a pure water cleaning process of about 15 seconds is arranged in principle to prevent penetration of the solution of the pretreatment process. <Physical properties of surface-treated copper foil> The cross-section of the surface-treated copper enamel having the blackened surface obtained by the above process was observed by a FIB apparatus. As a result, the same surface as that of the third figure was obtained, and the height of the blackened surface was obtained. 134nm, the blackening process

12966361296636

五、發明說明(27) 面之Lab色度空間中的L值為34,光澤度[Gs(6〇。)]為21 此外,於黑色化處理面上貼附黏著性膠帶,並將膠二。 之測試中,也沒有發現粉脫落情形。 / 彳離 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅箔來製作 波遮蔽用導電性網板。結果,即使有防銹處理芦的’磁 餘刻有不會受到造成影響,而且沒有韻刻殘留‘:二 進行了相當良好的蝕刻。 况足 【實施例1 0】 本實施例係製造第7圖所示之具有作為防銹處理 亞鉛-鈷合金層的第2表面處理銅羯ld,並以蝕刻 曰之 地製作電磁波遮蔽用導電性網板之形狀,以確職2性 能。因此,至形成硫酸鈷電鍍層之黑色化處理層止二 實施例7相同’所以在此僅對防錢處理條件作說 句與 色之硫酸鈷電鍍層之換算厚度與實施例7相同, … 3 3 4 m g / m2 〇 此處準備一於實施例7之星一志;ρ &gt; 電鍍層之形成的銅箔,以同於# 2 ”、、硫酸鈷 面上形成鑛亞鉛1合金層。於然V:” 的純水進行沖洗,於以加熱器Ε /貝知例',以充足 爐中停留約4秒鐘,把水分去^衣見媒直广達150°c之乾燥 調之黑色化處理面的表面處去理乾二獲得具有非常良好色 原則上安排約15秒鐘之純上述各製程之間, 之溶液的滲透。 ^洗製程’以防止預處理製程V. Description of invention (27) The L value of the Lab's Lab color space is 34, and the gloss [Gs(6〇.)] is 21 In addition, the adhesive tape is attached to the blackened surface, and the adhesive tape is applied. . In the test, no powder shedding was found. / 彳 <Manufacture of Electromagnetic Wave Screening Screen for Plasma Display> As in Example 1, the obtained surface-treated copper foil was used to fabricate a conductive screen for wave shielding. As a result, even if there is a rust-proof treatment, the magnetic remnant of the reed is not affected, and there is no rhyme residue ‘: two is performed quite well. [Example 10] In this embodiment, the second surface-treated copper crucible ld having the anti-rust treatment of the lead-cobalt alloy layer shown in Fig. 7 was produced, and the electromagnetic wave shielding conductive was produced by etching the crucible. The shape of the stencil to ensure 2 performance. Therefore, the blackening treatment layer to form the cobalt sulfate plating layer is the same as in the second embodiment. Therefore, only the conversion thickness of the anti-money treatment condition and the color cobalt sulfate plating layer are the same as in the seventh embodiment, ... 3 3 4 mg / m2 〇 Prepare a star foil of Example 7; ρ &gt; The copper foil formed by the plating layer is formed on the same surface as the # 2 ”, cobalt sulfate surface. However, the pure water of V:" is rinsed, and it is kept in a sufficient temperature in the furnace for about 4 seconds, and the water is removed to the surface of the medium. The surface of the treated surface is dehydrated to obtain a solution having a very good color, which is arranged in principle for about 15 seconds between the above respective processes. ^washing process' to prevent pretreatment process

i 1296636 五、發明說明(28) ------ 〈表面處理銅箱之物性〉 以FIB裝置,觀察具有經上述製程所得之黑色化處理 面的表面處理銅羯之剖面,其結果得到與第3圖相同的 面,該黑色化處理面之剖面高度為128nm,該黑色化處理 面之Lab色度空間中的L值為28 ’光澤度[Gs(6〇。)]為3〇。 此外,於黑色化處理面上貼附黏著性膠帶,並將膠帶剝 之測試中,也沒有發現粉脫落情形。 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理銅箔來製作電磁 波遮蔽用導電性網板。結果,即使有防銹處理層的存在, 钮刻也不會受到影響,而且沒有蝕刻殘留物,可說是 ’一 了相當良好的蝕刻。 n 【實施例11】 本實施例係製造第9圖所示之具有作為防銹處理層之 亞鉛-鈷合金層、與鉻處理層的第2表面處理銅箔丨f /並以 蝕刻法試驗性地製作電磁波遮蔽用導電性網板之形狀^ 確認蝕刻性能。因此,至形成硫酸鈷電鍍層之黑‘化广= 層止,均與實施例7相同,所以在此僅對防銹處理條件&amp;作 說明。又黑色之硫酸鈷電鍍層之換算厚度與實施例7 同,為334mg/m2。 防銹處理層之形成如同實施例4,使用亞鉛—鈷合金鲈 液’於兩表面上形成亞鉛-鈷合金層之後,對兩表面一、 鉻處理。 订 然後,當元成鉻層之形成時,以充足的純水進行沖i 1296636 V. INSTRUCTIONS (28) ------ <Physical properties of surface-treated copper box> The surface of the surface-treated copper enamel having the blackened surface obtained by the above process was observed by a FIB apparatus, and the result was obtained. In the same plane as in Fig. 3, the cross-sectional height of the blackened surface was 128 nm, and the L value in the Lab chromaticity space of the blackened surface was 28 'gloss [Gs (6 Å)) was 3 Å. Further, in the test in which the adhesive tape was attached to the blackened surface and the tape was peeled off, no powder peeling was observed. <Manufacturing of Electromagnetic Wave Screening Screen for Plasma Display> As in Example 1, the obtained surface-treated copper foil was used to produce a conductive mesh for electromagnetic shielding. As a result, even if there is a rust-preventing treatment layer, the button is not affected, and there is no etching residue, which can be said to be a relatively good etching. n [Example 11] This example is a second surface-treated copper foil 丨f / having a ruthenium-cobalt alloy layer as a rust-preventing treatment layer and a chromium-treated layer shown in Fig. 9 and tested by an etching method. The shape of the conductive mesh for electromagnetic wave shielding was prepared in a manner to confirm the etching performance. Therefore, the black blackening of the cobalt sulfate plating layer is the same as that of the seventh embodiment, and therefore only the rustproof treatment conditions &amp; The converted thickness of the black cobalt sulfate plating layer was the same as in Example 7, and was 334 mg/m2. The rust-preventing treatment layer was formed as in Example 4, and after forming a sub-lead-cobalt alloy layer on both surfaces using a lead-cobalt alloy ruthenium solution, the two surfaces were treated with chromium. Then, when the element is formed into a chrome layer, it is rushed with sufficient pure water.

2213-6405-PF(N2);Ahddub.ptd 第32頁 1296636 五、發明說明(29) =,於以加熱器使環境溫度達150 °C之乾燥爐中停留約4秒 鐘,把水分去乾,而獲得具有非常良好色調之黑色化處理 面的表面處理銅箔1 f。上述各製程之間,原則上安排約i 5 矜釦之純水清洗製程,以防止預處理製程之溶液的滲透。 〈表面處理銅箔之物性〉 / 以FIB裝置,觀察具有經上述製程所得之黑色化處理 面的表面處理銅箔之剖面,其結果得到與第3圖相同 面’該黑色化處理面之剖面高度為i i 5nm : 面之Ub色度空間中的L值為29,光澤度[Gs(6〇m理 此外’於黑色化處理面上貼附黏著性膠帶二 之測試巾,也沒有發現粉脫落情形。 謂h剝離 〈電漿顯示器之電磁波遮蔽用網板之製造〉 如同實施例1,使用所得之表面處理鋼 波遮蔽用導電性網板。結果,即使有防錄處理朿衣作電磁 蝕刻也不會受到影響,而且沒有蝕 曰的存在, 了相當良好的㈣。 J殘召物,可說是進行 產業上可利性: 不會有黑 蝕刻液進 蔽用導電 使用具有 製程中之 表面處理 本發明之具有黑色化處理面之表面處理产 色化處理面之粉脫洛問題,而且可使用一如 自 行姑刻加X,用於電漿顯板用之= 性網板時,可製成高品質的黑色罩幕。而且收, 黑色化處理表面之表面處理銅箔時,可省略 右 黑色化處理製程。此外,具有此黑色化處理:^2213-6405-PF(N2); Ahddub.ptd Page 32 1296636 V. Description of invention (29) =, stay in a drying oven with a heater to an ambient temperature of 150 °C for about 4 seconds to remove moisture A surface-treated copper foil 1 f having a blackened surface having a very good hue is obtained. Between the above processes, a pure water cleaning process of about 5 矜 is arranged in principle to prevent penetration of the solution of the pretreatment process. <Physical properties of surface-treated copper foil> The cross-section of the surface-treated copper foil having the blackened surface obtained by the above-mentioned process was observed by a FIB apparatus, and as a result, the section height of the blackened surface was obtained as in the third figure. For ii 5nm: the L value in the Ub chromaticity space of the surface is 29, and the gloss [Gs (6〇m ly) is attached to the test towel of the adhesive tape on the blackened surface, and no powder drop is found. The production of the electromagnetic wave shielding mesh plate of the plasma display device is as follows. As in the first embodiment, the obtained surface-treated steel wave shielding conductive mesh plate is used. As a result, even if there is an anti-recording treatment, the coating is not electromagnetically etched. Will be affected, and there is no erosive existence, quite good (4). J Remnant, can be said to be industrially profitable: there will be no black etching solution for conductive use with surface treatment in the process The invention has the problem of powder detachment of the surface treatment coloration treatment surface with the blackened surface, and can be used as the self-engaged X, and can be made into a high-quality stencil for the plasma display panel. Quality The color mask and to close, when the blackening of the surface of the surface-treated copper foil can be omitted and right blackening process Further, with this blackening treatment:. ^

2213-6405-PF(N2);Ahddub.ptd 第33頁 _ 12966362213-6405-PF(N2); Ahddub.ptd Page 33 _ 1296636

2213-6405-PF(N2);Ahddub.ptd 第34頁 1296636 圖式簡單說明 第1圖與第2圖係繪示具有黑色化處理面之表面處理銅 箔之剖面結構圖。 第3圖〜第5圖係具有黑色化處理面之表面處理銅箔之 剖面結構之F I B圖。 第6圖〜第9圖係繪示具有黑色化處理面之表面處理銅 箔的剖面結構之各種變化。 第1 0圖係經粗糙化處理之銅箔表面的掃描式電子顯微 鏡圖。 第11圖係硫酸鈷電鍍層之掃描式電子顯微鏡圖。 第1 2圖係蝕刻測試圖案之掃描式電子顯微鏡圖。 第1 3圖與第1 4圖係不經粗糙化處理,形成硫酸鈷電鍍 層之銅猪表面的掃描式電子顯微鏡圖。 【符號說明】 2〜粗糙化處理層; 3〜銅粒; 4〜硫酸鈷電鍍層; 5〜防銹處理層; 6〜鉻處理層; 7〜電解銅箔層; la、lb、lc、ld、le、lf〜表面處理銅箔。2213-6405-PF(N2); Ahddub.ptd Page 34 1296636 Brief Description of the Drawings Figs. 1 and 2 show a cross-sectional structural view of a surface-treated copper foil having a blackened surface. Fig. 3 to Fig. 5 are F I B diagrams showing the cross-sectional structure of the surface-treated copper foil having a blackened surface. Fig. 6 to Fig. 9 show various changes in the cross-sectional structure of the surface-treated copper foil having a blackened surface. Figure 10 is a scanning electron micrograph of the roughened copper foil surface. Figure 11 is a scanning electron micrograph of a cobalt sulphate plating layer. Figure 12 is a scanning electron microscope image of the etching test pattern. Fig. 1 3 and Fig. 14 are scanning electron micrographs of the surface of a copper pig forming a cobalt sulfate plating layer without roughening. [Description] 2~ roughening layer; 3~ copper particles; 4~ cobalt sulfate plating layer; 5~ anti-rust treatment layer; 6~chromium treatment layer; 7~ electrolytic copper foil layer; la, lb, lc, ld , le, lf ~ surface treated copper foil.

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Claims (1)

1296636 六、申請專利範圍 1 · 一種表面處理銅箔,光澤面上具有黑色化處理面, 其特徵在於: 上述黑色化處理面係設置於銅箔層之單一表面、且重 里厚度為200mg/ni2〜400mg/ni2之硫酸錯電鑛層,上述黑色化 處理面之剖面高度為2 〇 〇 nm以下。 7丹1f ,其中 ,其中 ,其中 與鉻處 2 ·如申請專利範圍第1項所述之表面處理銅猪 黑色化處理面,其Lab色度空間之L值為27以上。 3 ·如申請專利範圍第1項所述之表面處理銅箱 上述黑色化處理面包括防銹處理層。 4·如申請專利範圍第3項所述之表面處 防鎊處理層係使用亞錯或亞錯合金。 ㈣泊 5 ·如申請專利範圍 防銹處理層包括以亞:員所述之表面處理銅羯 理層。 兑兔或亞鉛合金所形成之膜層、 6 ·如申請專利範 上述黑色化處理面係於1項所述之表面處理銅箔,其中 成上述黑色化處理面,、。解銅箔或壓延銅箔之光澤面上形 7. —種表面處理奶士光,睪度[Gs(60。)]為30以下。 面之表面處理銅箔之製! 衣k方法,係具有黑色化處理 b)之製程: k方去’其特徵在於包括下列a )與 a )採用不攪拌浴槽, 酸鈷、pH值於4· 〇以上曰之」史用包括8§/卜l〇g/l之七水合硫 之電流密度進行雷銥 範圍之硫酸鈷鍍液,以2A/ dm2以上 酸鈷電鍍層;及 d、冶之光澤面上形成黑色系之硫1296636 VI. Patent Application No. 1 · A surface-treated copper foil having a blackened surface on a glossy surface, wherein the blackened surface is disposed on a single surface of the copper foil layer and has a thickness of 200 mg/ni 2 . The 400 mg/ni2 sulfuric acid staggered ore layer has a cross-sectional height of 2 〇〇 nm or less. 7 Dan 1f, wherein, among them, with the chromium portion 2 · The surface treatment copper pig blackening surface described in the first application of the patent scope, the L value of the Lab color space is 27 or more. 3. The surface-treated copper case according to claim 1, wherein the blackened surface includes a rust-preventing layer. 4. If the surface of the anti-pound treatment layer described in item 3 of the patent application scope is an error or sub-alloy. (4) Poor 5 · If the patent application scope The anti-rust treatment layer includes the surface treatment copper enamel layer described by the sub-members. A film layer formed of a rabbit or a lead-lead alloy, and a blackening treatment surface according to the above-mentioned surface-treated copper foil, wherein the blackened surface is formed. The surface of the copper foil or the rolled copper foil is 7. The surface treatment of the milk is light, and the twist [Gs (60.)] is 30 or less. The surface of the surface is treated with copper foil! The coating k method is a process having a blackening treatment b): k square to 'characterized by including the following a) and a) using a non-stirring bath, cobalt cobalt, pH value above 4 · 曰" § / Bu l〇g / l of the sulphuric acid current density of the thunderstone range of cobalt sulfate plating solution, 2A / dm2 or more acid cobalt plating; and d, the shiny surface of the smelting of black sulfur 1296636 六、申請專利範圍 b )其後’進行水洗、乾燥。 8· 一種表面處理銅箔之製造方法,係具有黑色化處理 面表面處理銅、冶之製造方法,其特徵在於包括下列a )與 b)之製程: a) 採用授拌浴槽,使用包括10g/卜40以1之七水合硫 酉义始、pH值於4 · 〇以上、液溫於3 〇。〇以下之硫酸鈷鍍液, 以4A/dni/以上之電流密度進行電解,於銅箔之光澤面上形 成黑色系之硫酸鈷電鍍層;及 b) 其後,進行水洗、乾燥。 9· 一種表面處理銅箔之製造方法,係具有防銹處理層 與黑色化處理層之表面處理銅箔之製造方法,其特徵在於 包括下列a)〜c)之製程: a)採用不攪拌浴槽’使用包括8g/1〜1〇g/1之七水合硫 酸#、pH值於4. 〇以上之範圍之硫酸鈷鍍液,以2A/dm2以上 之電流密度進行電解,於銅箔之光澤面上形成黑色系之硫 酸鈷電鍍層; b )於形成黑色硫酸鈷電鍍層之銅箔之兩表面或單一表 面上,形成防銹處理層;及 c) 其後’進行水洗、乾燥。 10· —種表面處理銅箔之製造方法,係具有含防銹處 理層之黑色化處理層的表面處理銅箔之製造方法,其特禮 在於包括下列a)〜C)之製裎: a)採用攪拌浴槽,使用包括1〇g/卜4〇g/1之七水合妒 酸鈷、pH值於4.0以上、液溫設定於3〇 t以下之硫酸二^1296636 VI. Application for patent scope b) Afterwards, it is washed and dried. 8. A method for producing a surface-treated copper foil, which is a method for producing a surface treated copper with a blackened surface, characterized by comprising the following processes a) and b): a) using a mixing bath, including 10 g/ Bu 40 starts with sulphuric acid, and has a pH of 4 〇 or more and a liquid temperature of 3 〇. The following cobalt sulfate plating solution is electrolyzed at a current density of 4 A/dni/ or more to form a black cobalt sulfate plating layer on the shiny side of the copper foil; and b) thereafter, washed with water and dried. A method for producing a surface-treated copper foil, which is a method for producing a surface-treated copper foil having a rust-preventing treatment layer and a blackening treatment layer, which comprises the following processes a) to c): a) using a non-stirred bath 'Using a sulfated cobalt sulfate solution containing 8g/1~1〇g/1 of heptahydrate sulfate and a pH value of 4. 〇 or more, electrolysis at a current density of 2A/dm2 or more, on the shiny side of copper foil Forming a black cobalt sulfate plating layer thereon; b) forming a rustproof treatment layer on both surfaces or a single surface of the copper foil forming the black cobalt sulfate plating layer; and c) thereafter washing and drying. 10. A method for producing a surface-treated copper foil, which is a method for producing a surface-treated copper foil having a blackened layer containing a rust-preventing layer, comprising the following a) to C): a) Using a stirring bath, using a cobalt sulphate heptahydrate containing 1〇g/b 4〇g/1, a pH of 4.0 or more, and a liquid temperature of 3 〇t or less. 1296636 六、申請專利範圍 液,以4A/dm2以下之電流密度進行電解,於銅箔之光澤面 上形成黑色系之硫酸鈷電鍍層; b )於形成黑色硫酸钻電鍍層之銅箔之兩表面或單一表 面上,形成防銹處理層;及 c)其後,進行水洗、乾燥。 11 . 一種電漿顯示器面板用之電磁波遮蔽用導電性網 板,以申請專利範圍第1項所述之表面處理銅箔所形成。 1 2. —種電漿顯示器面板用之電磁波遮蔽用導電性網 板,以申請專利範圍第2項所述之表面處理銅箔所形成。 1 3. —種電漿顯示器面板用之電磁波遮蔽用導電性網 板,以申請專利範圍第3項所述之表面處理銅箔所形成。 1 4. 一種電漿顯示器面板用之電磁波遮蔽用導電性網 板,以申請專利範圍第4項所述之表面處理銅箔所形成。 1 5. —種電漿顯示器面板用之電磁波遮蔽用導電性網 板,以申請專利範圍第5項所述之表面處理銅箔所形成。 1 6. —種電漿顯示器面板用之電磁波遮蔽用導電性網 板,以申請專利範圍第6項所述之表面處理銅箔所形成。1296636 6. Applying for the patent range liquid, electrolysis is performed at a current density of 4 A/dm2 or less, forming a black cobalt sulfate plating layer on the shiny side of the copper foil; b) forming two surfaces of the copper foil of the black sulfuric acid drill plating layer Or forming a rust-preventing treatment layer on a single surface; and c) thereafter, washing with water and drying. A conductive mesh for electromagnetic wave shielding for a plasma display panel, which is formed by the surface-treated copper foil according to claim 1 of the patent application. 1 2. A conductive mesh for electromagnetic wave shielding for a plasma display panel, which is formed by the surface-treated copper foil described in claim 2 of the patent application. 1 3. A conductive mesh for electromagnetic wave shielding for a plasma display panel, which is formed by the surface-treated copper foil described in claim 3 of the patent application. 1 . A conductive mesh for electromagnetic wave shielding for a plasma display panel, which is formed by the surface-treated copper foil described in claim 4 of the patent application. 1 5. A conductive mesh for electromagnetic wave shielding for a plasma display panel, which is formed by the surface-treated copper foil described in claim 5 of the patent application. 1 6. A conductive mesh for electromagnetic wave shielding for a plasma display panel, which is formed by the surface-treated copper foil described in claim 6 of the patent application. 2213-6405-PF(N2);Ahddub.ptd 第38頁2213-6405-PF(N2); Ahddub.ptd第38页
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