JPH0654831B2 - Method of treating copper foil for printed circuits - Google Patents

Method of treating copper foil for printed circuits

Info

Publication number
JPH0654831B2
JPH0654831B2 JP21371090A JP21371090A JPH0654831B2 JP H0654831 B2 JPH0654831 B2 JP H0654831B2 JP 21371090 A JP21371090 A JP 21371090A JP 21371090 A JP21371090 A JP 21371090A JP H0654831 B2 JPH0654831 B2 JP H0654831B2
Authority
JP
Japan
Prior art keywords
copper foil
cobalt
treatment
plating
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP21371090A
Other languages
Japanese (ja)
Other versions
JPH0496395A (en
Inventor
英治 日野
敬亮 山西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP21371090A priority Critical patent/JPH0654831B2/en
Publication of JPH0496395A publication Critical patent/JPH0496395A/en
Publication of JPH0654831B2 publication Critical patent/JPH0654831B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Chemically Coating (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、印刷回路用銅箔の処理方法に関するものであ
り、特には銅粗の表面に銅−コバルト−ニッケルから成
るめっきによる粗化処理後、コバルトめっき層或いはコ
バルト及びニッケルから成るめっき層を形成することに
よる、アルカリエッチング性を有し、しかも良好な耐熱
剥離強度及び耐熱酸化性等を具備すると共に黒色の表面
色調を有する印刷回路用銅箔を生成する処理方法に関す
るものである。
TECHNICAL FIELD The present invention relates to a method for treating a copper foil for a printed circuit, and in particular, to a surface of a copper rough surface after a roughening treatment by plating comprising copper-cobalt-nickel, A copper foil for a printed circuit having a black surface color tone, which has alkali etching property, good heat-resistant peel strength and heat-oxidation resistance by forming a cobalt plating layer or a plating layer made of cobalt and nickel The present invention relates to a processing method for generating.

本発明銅箔は、例えばファインパターン印刷回路及び磁
気ヘッド用FPC(Frexible Printed Circuit)として
特に適する。
The copper foil of the present invention is particularly suitable, for example, as a fine pattern printed circuit and an FPC (Frexible Printed Circuit) for a magnetic head.

発明の背景 印刷回路用銅箔は一般に、合成樹脂等の基材に高温高圧
下で積層接着され、その後目的とする回路を形成するべ
く必要な回路を印刷した後、不要部を除去してエッチン
グ処理が施される。最終的に、所要の素子が半田付けさ
れて、エレクトロニクスデバイス用の種々の印刷回路板
を形成する。
BACKGROUND OF THE INVENTION Copper foil for printed circuits is generally laminated and adhered to a base material such as a synthetic resin under high temperature and high pressure, and after printing a necessary circuit to form a target circuit, an unnecessary portion is removed and etched. Processing is performed. Finally, the required elements are soldered to form various printed circuit boards for electronic devices.

印刷配線板用銅箔に対する品質要求は、樹脂基材と接着
される面(所謂粗化面)と、非接着面(所謂光沢面)と
で異なり、両者を同時に満足させることが重要である。
Quality requirements for a copper foil for a printed wiring board are different between a surface bonded to a resin substrate (so-called roughened surface) and a non-bonded surface (so-called glossy surface), and it is important to satisfy both at the same time.

粗化面に対する要求としては、主として、 保存時における酸化変色のないこと、 基材との引き剥し強さが高温加熱、湿式処理、半田付
け、薬品処理等の後でも充分なこと、 基材との積層、エッチング後に生じる所謂積層汚点の
ないこと 等が挙げられる。
The requirements for the roughened surface are mainly that there is no oxidative discoloration during storage, that the peel strength with the substrate is sufficient even after high temperature heating, wet treatment, soldering, chemical treatment, etc. The absence of so-called laminated stain after the laminating and etching, etc. can be mentioned.

他方、光沢面に対しては、 外観が良好なこと及び保存時における酸化変色のない
こと、 半田濡れ性が良好なこと、 高温加熱時に酸化変色がないこと レジストとの密着性が良好なこと 等が要求される。
On the other hand, for glossy surface, good appearance, no oxidative discoloration during storage, good solder wettability, no oxidative discoloration at high temperature heating, good adhesion with resist, etc. Is required.

こうした要求に応えるべく、印刷配線板用銅箔に対して
多くの処理方法が提唱されてきた。処理方法は、圧延銅
箔と電解銅箔とで異なるが、基本的には、脱脂後の銅箔
に粗化処理を行ない、必要に応じ防錆処理を行ない、更
には必要に応じシラン処理、更には焼鈍を行なう方法が
有用な方法の一つとして確立されている。
In order to meet these demands, many treatment methods have been proposed for copper foils for printed wiring boards. Although the treatment method is different between the rolled copper foil and the electrolytic copper foil, basically, the roughening treatment is performed on the copper foil after degreasing, the rust prevention treatment is performed if necessary, and further the silane treatment is performed if necessary. Furthermore, the method of performing annealing has been established as one of the useful methods.

従来技術 上述した粗化処理は銅箔の表面性状を決定するものとし
て、大きな鍵を握っている。粗化処理としては、当初銅
を電着する銅粗化処理が採用されていたが、電子回路の
進展と共にその表面性状の改善を目的として多数の技術
が提唱されそして実施されてきたが、特に耐熱剥離強
度、耐塩酸性及び耐酸化性の改善を目的として銅−ニッ
ケル粗化処理が一つの代表的処理方法として定着するよ
うになっている。本件出願人は、特開昭52−1457
69号において銅−ニッケル粗化処理を提唱し、成果を
納めてきた。
2. Description of the Related Art The above-described roughening treatment holds a big key for determining the surface properties of a copper foil. As the roughening treatment, copper roughening treatment in which copper was initially electrodeposited was adopted, but with the progress of electronic circuits, a number of techniques have been proposed and implemented for the purpose of improving the surface properties thereof, but in particular, A copper-nickel roughening treatment has been established as a typical treatment method for the purpose of improving heat-resistant peel strength, hydrochloric acid resistance and oxidation resistance. The applicant of the present application filed JP-A-52-1457.
In No. 69, a copper-nickel roughening treatment was proposed and the results were paid.

銅−ニッケル処理表面は黒色を呈し、特にフレキシブル
基板用圧延処理箔では、この銅−ニッケル処理の黒色が
商品としてのシンボルとして認められるに至っている。
The copper-nickel treated surface exhibits a black color, and in particular, in the rolled foil for flexible substrates, the black color of the copper-nickel treatment has been recognized as a symbol as a product.

しかしながら、銅−ニッケル粗化処理は、耐熱剥離強度
及び耐酸化性並びに耐塩酸性に優れる反面で、近時ファ
インパターン用処理として重要となってきたアルカリエ
ッチング液でのエッチングが困難であり、150μmピ
ッチ回路巾以下のファインパターン形成時に処理層がエ
ッチング残となってしまう。
However, while the copper-nickel roughening treatment is excellent in heat-resistant peel strength, oxidation resistance and hydrochloric acid resistance, it is difficult to etch with an alkaline etching solution which has recently become important as a fine pattern treatment, and a 150 μm pitch is required. When the fine pattern with a width less than the circuit width is formed, the processing layer remains as an etching residue.

そこで、ファインパターン用処理として、本件出願人
は、先にCu-Co処理(特公昭63−2158号及び特願
平1−112227号)及びCu-Co-Ni処理(特願平1−
112226号)を開発した。これら粗化処理は、エッ
チング性、アルカリエッチング性及び耐塩酸性について
は良好であったが、アクリル系接着剤を用いたときの耐
熱剥離強度が低下することが改めて判明し、また耐酸化
性も所期程充分ではなくそして色調も黒色までには至ら
ず、茶〜こげ茶色であった。
Therefore, as a fine pattern processing, the applicant of the present invention has previously proposed that Cu-Co processing (Japanese Patent Publication No. 63-2158 and Japanese Patent Application No. 1-112227) and Cu-Co-Ni processing (Japanese Patent Application No.
112226) was developed. These roughening treatments were good in terms of etching property, alkali etching property and hydrochloric acid resistance, but it was found again that the heat-resistant peel strength was reduced when an acrylic adhesive was used, and oxidation resistance was also found. The period was not sufficient and the color tone did not reach black, and it was brown to dark brown.

発明が解決しようとする課題 最近の印刷回路のファインパターン化及び多様化への趨
勢にともない、 Cu-Ni処理の場合に匹敵する耐熱剥離強度(特にアク
リル系接着剤を用いたとき)及び耐塩酸性を有するこ
と、 アルカリエッチング液で150μmピッチ回路巾以下
の印刷回路をエッチングできること、 Cu-Ni処理の場合と同様に、耐酸化性(180℃×3
0分のオーブン中での耐酸化性)を向上すること、 Cu-Ni処理の場合と同様の黒化処理であることが更に
要求されるようになった。即ち、回路が細くなると、塩
酸エッチング液により回路が剥離し易くなる傾向が強ま
り、その防止が必要である。回路が細くなると、半田付
け等の処理時の高温により回路がやはり剥離し易くな
り、その防止もまた必要である。ファインパターン化が
進む現在、例えばCuCl2エッチング液で150μmピッ
チ回路巾以下の印刷回路をエッチングできることはもは
や必須の要件であり、レジスト等の多様化にともないア
ルカリエッチングも必要要件となりつつある。黒色表面
も、位置合わせ精度及び熱吸収を高めることの点で銅箔
の製作及びチップマウントの観点から重要となってい
る。
Problems to be Solved by the Invention With the recent trend toward fine patterning and diversification of printed circuits, heat-resistant peel strength (especially when an acrylic adhesive is used) and hydrochloric acid resistance comparable to those of Cu-Ni treatment The ability to etch printed circuits with a circuit width of 150 μm pitch or less with an alkaline etching solution, and oxidation resistance (180 ° C × 3
It was further required to improve the oxidation resistance in an oven for 0 minutes) and to perform the same blackening treatment as in the Cu-Ni treatment. That is, when the circuit becomes thin, the tendency that the circuit is easily peeled off by the hydrochloric acid etching solution becomes stronger, and it is necessary to prevent it. When the circuit becomes thin, the circuit is likely to peel off due to the high temperature at the time of processing such as soldering, and it is also necessary to prevent it. In the present time when fine patterning is progressing, it is already an essential requirement to be able to etch a printed circuit having a circuit width of 150 μm pitch or less with a CuCl 2 etching solution, and alkali etching is becoming a necessary requirement as the resists are diversified. The black surface is also important from the viewpoint of copper foil fabrication and chip mounting in terms of enhancing alignment accuracy and heat absorption.

斯くして、本発明の課題は、印刷回路銅箔として上述し
た多くの一般的特性を具備することはもちろんのこと、
特にCu-Ni処理と匹敵する上述した諸特性を具備し、し
かもアクリル系接着剤を用いたときの耐熱剥離強度を低
下せず、耐酸化性に優れそして表面色調も黒色である銅
箔処理方法を開発することである。
Thus, the problem of the present invention is, of course, to have many of the general characteristics described above as a printed circuit copper foil,
In particular, a copper foil treatment method that has the above-mentioned characteristics that are comparable to those of Cu-Ni treatment, yet does not lower the heat-resistant peel strength when using an acrylic adhesive, has excellent oxidation resistance, and has a black surface color tone. Is to develop.

課題を解決するための手段 本発明者は、従来提唱法の一つである銅−コバルト−ニ
ッケルによる粗化処理の有用性を生かすべく研究を行な
った結果、銅箔表面に銅−コバルト−ニッケルによる粗
化処理後、その上にコバルトめっき層或いはコバルト及
びニッケルから成るめっき層を形成するのが効果的であ
るとの知見を得た。
Means for Solving the Problems The present inventor has conducted research to make use of the usefulness of roughening treatment with copper-cobalt-nickel, which is one of the conventionally proposed methods, and as a result, copper-cobalt-nickel on the copper foil surface. It was found that it is effective to form a cobalt plating layer or a plating layer composed of cobalt and nickel thereon after the roughening treatment by.

この知見に基づいて、本発明は、印刷回路用銅箔の処理
方法において、銅箔の表面に銅−コバルト−ニッケルか
ら成るめっきによる粗化処理後、コバルトめっき層或い
はコバルト及びニッケルから成るめっき層を形成するこ
とを特徴とする印刷回路用銅箔の処理方法を提供するも
のである。
Based on this finding, in the method for treating a copper foil for a printed circuit, the present invention provides a surface of a copper foil after a roughening treatment by plating comprising copper-cobalt-nickel and then a cobalt plating layer or a plating layer comprising cobalt and nickel. The present invention provides a method for treating a copper foil for a printed circuit, which comprises forming

好ましくは、前記コバルトめっき層或いはコバルト及び
ニッケルから成るめっき層を形成した後に、クロム酸化
物の単独皮膜処理或いはクロム酸化物と亜鉛及び(又
は)亜鉛酸化物との混合皮膜処理を代表とする防錆処理
が施される。
Preferably, after forming the cobalt plating layer or the plating layer composed of cobalt and nickel, a coating treatment of chromium oxide alone or a coating treatment of chromium oxide and zinc and / or zinc oxide is representative. Rust treatment is applied.

発明の具体的説明 本発明において使用する銅箔は、電解銅箔或いは圧延銅
箔いずれでも良い。
Detailed Description of the Invention The copper foil used in the present invention may be either an electrolytic copper foil or a rolled copper foil.

通常、銅箔の、樹脂基材と接着する面即ち粗化面には積
層後の銅箔の引き剥し強さを向上させることを目的とし
て、脱脂後の銅箔の表面にふしこぶ状の電着を行なう粗
化処理が施される。本発明においては、この粗化処理は
銅−コバルト−ニッケル合金めっきにより行なわれる。
粗化前の前処理として通常の銅めっき等がそして粗化後
の仕上げ処理として通常の銅めっき等が行なわれること
もある。圧延銅箔と電解銅箔とでは処理の内容を幾分異
にすることもある。本発明においては、こうした前処理
及び仕上げ処理をも含め、銅箔粗化と関連する公知の処
理を必要に応じて含めて、総称して粗化処理と云うもの
とする。
Usually, the surface of the copper foil that is bonded to the resin substrate, that is, the roughened surface, has the purpose of improving the peeling strength of the copper foil after lamination, and for the purpose of improving the peeling strength of the copper foil after degreasing. A roughening process is carried out for the coating. In the present invention, this roughening treatment is performed by copper-cobalt-nickel alloy plating.
Normal copper plating or the like may be performed as a pretreatment before roughening, and normal copper plating or the like may be performed as a finishing treatment after roughening. The rolled copper foil and the electrolytic copper foil may have slightly different contents of treatment. In the present invention, the known treatments related to the copper foil roughening, including such pretreatment and finishing treatment, are collectively referred to as the roughening treatment, if necessary.

本発明に従えば、この合金めっきは、電解めっきによ
り、15〜40mg/dm2銅−100〜2000μg/dm2
バルト−100〜1000μg/dm2ニッケル3元系合金
を形成するように実施される。
According to the invention, this alloy plating is carried out by electroplating to form 15-40 mg / dm 2 copper-100-2000 μg / dm 2 cobalt-100-1000 μg / dm 2 nickel ternary alloy. .

また、Cu−Co−Ni3元系合金層中のCo及びNi
含有量は、1〜4重量%Co及び0.5〜1.5重量%Niで
ある。
In addition, Co and Ni in the Cu-Co-Ni ternary alloy layer
The contents are 1-4 wt% Co and 0.5-1.5 wt% Ni.

こうした三元系合金めっきを形成するための一般的浴及
びめっき条件は次の通りである。
The general bath and plating conditions for forming such a ternary alloy plating are as follows.

浴組成及びめっき条件 Cu: 10〜20g/ Co: 1〜10g/ Ni: 1〜10g/ pH: 1〜4 温度: 40〜50℃ 電流密度D:20〜30A/dm2 時間: 1〜5秒 本発明は、粗化処理後、その上の2段めっきとしてコバ
ルトめっき層或いはコバルト及びニッケルから成るめっ
き層を形成する。
Bath composition and plating conditions Cu: 10 to 20 g / Co: 1 to 10 g / Ni: 1 to 10 g / pH: 1 to 4 Temperature: 40 to 50 ° C. Current density D k : 20 to 30 A / dm 2 hours: 1 to 5 Second In the present invention, after the roughening treatment, a cobalt plating layer or a plating layer composed of cobalt and nickel is formed as a two-step plating thereon.

コバルトめっき或いはコバルト及びニッケルめっきの条
件は次の通りである: コバルトめっき Co 1〜30g/ 温度 30〜80℃ pH 1.0〜3.5 D 1.0〜10.0A/dm2 時間 0.5〜4秒 コバルト−ニッケルめっき Co 1〜30g/ Ni 1〜30g/ 温度 30〜80℃ pH 1.0〜3.5 D 1.0〜10.0A/dm2 時間 0.5〜4秒 このコバルト或いはコバルト−ニッケルめっきは、銅箔
と基板の接着強度を実質的に低下させない程度に行なう
必要がある。即ち、本発明に従えば、コバルト或いはコ
バルト−ニッケルめっきの電着量(μg/dm2)は、 200≦Co≦1700 200≦Co+Ni≦2300 の範囲とすることが好ましい。下限未満だと、所期の効
果が生ぜず、耐熱剥離強度が低下し、そして耐酸化性及
び耐薬品性が悪化する。他方上限を超えると磁性の影響
が大きくなり好ましくない。
Conditions of the cobalt plating or cobalt and nickel plating are as follows: cobalt plating Co 1 to 30 g / Temperature 30~80 ℃ pH 1.0~3.5 D k 1.0~10.0A / dm 2 hours 0.5-4 seconds cobalt - nickel plated Co 1 to 30 g / Ni 1 to 30 g / temperature 30 to 80 ° C. pH 1.0 to 3.5 D k 1.0 to 10.0 A / dm 2 hours 0.5 to 4 seconds This cobalt or cobalt-nickel plating improves the adhesive strength between the copper foil and the substrate. It should be carried out to the extent that it does not substantially decrease. That is, according to the present invention, the electrodeposition amount (μg / dm 2 ) of cobalt or cobalt-nickel plating is preferably in the range of 200 ≦ Co ≦ 1700 200 ≦ Co + Ni ≦ 2300. If it is less than the lower limit, the desired effect does not occur, the heat-resistant peel strength decreases, and the oxidation resistance and chemical resistance deteriorate. On the other hand, if it exceeds the upper limit, the influence of magnetism becomes large, which is not preferable.

なお、コバルト−ニッケルめっきの場合のニッケルの電
着量(μg/dm2)は、 100≦Ni≦1000 とするのが好ましい。下限未満だと、耐熱性が悪くな
り、そして上限を超えると、アルカリエッチング液での
エッチング残が多くなる。
In the case of cobalt-nickel plating, the electrodeposition amount of nickel (μg / dm 2 ) is preferably 100 ≦ Ni ≦ 1000. If it is less than the lower limit, the heat resistance will be poor, and if it is more than the upper limit, the etching residue with the alkaline etching solution will increase.

このようにコバルト或いはコバルト−ニッケルめっき
は、非常に薄くて所期の効果を発揮するのが特徴であ
る。
Thus, the cobalt or cobalt-nickel plating is characterized by being extremely thin and exhibiting the desired effect.

この後、必要に応じ防錆処理が実施される。本発明にお
いて好ましい防錆処理は、クロム酸化物単独の皮膜処理
或いはクロム酸化物と亜鉛/亜鉛酸化物との混合物皮膜
処理である。クロム酸化物と亜鉛/亜鉛酸化物との混合
物皮膜処理とは、亜鉛塩または酸化亜鉛とクロム酸塩と
を含むめっき浴を用いて電気めっきにより亜鉛または酸
化亜鉛とクロム酸化物とより成る亜鉛−クロム基混合物
の防錆層を被覆する処理である。めっき浴としては、代
表的には、K2Cr2O7、Na2Cr2O7等の重クロム酸塩やCrO3
等の少なくとも一種と、水溶性亜鉛塩、例えばZnO、ZnS
O4・7H2O等少なくとも一種と、水酸化アルカリとの混合
水溶液が用いられる。代表的なめっき浴組成と電解条件
例は次の通りである: K2Cr2O7 (Na2Cr2O7或いはCrO3) 2〜10g/ NaOH或いはKOH 10〜50g/ ZnO或いはZnSO4・7H2O 0.05〜10g/ pH 7〜13 浴温 20〜80℃ 電流密度 0.05〜5A/dm2 時間 5〜30秒 アノード Pt-Ti板、ステンレス鋼板等 クロム酸化物はクロム量として15μg/dm2以上そして
亜鉛は30μg/dm2以上の被覆量が要求される。粗面側
と光沢面側とで厚さを異ならしめても良い。こうした防
錆方法は、特公昭58−7077、61−33908、
62−14040等に記載されている。
After that, rustproofing treatment is carried out if necessary. In the present invention, the preferred rust preventive treatment is a coating treatment of chromium oxide alone or a coating treatment of a mixture of chromium oxide and zinc / zinc oxide. Chromium oxide and zinc / zinc oxide mixture coating treatment means zinc or zinc consisting of zinc oxide and chromium oxide by electroplating using a plating bath containing zinc salt or zinc oxide and chromate. This is a treatment for coating the anticorrosion layer of the chromium-based mixture. As the plating bath, dichromates such as K 2 Cr 2 O 7 , Na 2 Cr 2 O 7 and CrO 3 are typically used.
And at least one of water-soluble zinc salts such as ZnO and ZnS
A mixed aqueous solution of at least one of O 4 .7H 2 O and alkali hydroxide is used. Representative plating bath compositions and examples of electrolysis conditions are as follows: K 2 Cr 2 O 7 (Na 2 Cr 2 O 7 or CrO 3 ) 2 to 10 g / NaOH or KOH 10 to 50 g / ZnO or ZnSO 4 · 7H 2 O 0.05 to 10 g / pH 7 to 13 Bath temperature 20 to 80 ° C Current density 0.05 to 5 A / dm 2 hours 5 to 30 seconds Anode Pt-Ti plate, stainless steel plate, etc. Chromium oxide has a chromium content of 15 μg / dm 2 Above, zinc is required to have a coating amount of 30 μg / dm 2 or more. The rough surface side and the glossy surface side may have different thicknesses. Such rust prevention methods are disclosed in Japanese Examined Patent Publications Sho 58-7077, 61-33908,
62-14040 and the like.

こうして得られた銅箔は、Cu-Ni処理の場合と匹敵する
耐熱性剥離強度、耐酸化性及び耐塩酸性を有し、しかも
CuCl2エッチング液で150μmピッチ回路巾以下の印
刷回路をエッチングでき、しかもアルカリエッチングも
可能とする。アルカリエッチング液としては、例えば、
NH4OH:6モル/;NH4Cl:5モル/;CuCl2;2モ
ル/(温度50℃)等の液が知られている。
The copper foil thus obtained has heat-resistant peel strength, oxidation resistance and hydrochloric acid resistance comparable to those of the Cu-Ni treatment, and
A printed circuit with a circuit width of 150 μm or less can be etched with CuCl 2 etching solution, and alkaline etching is also possible. As the alkaline etching solution, for example,
Liquids such as NH 4 OH: 6 mol /; NH 4 Cl: 5 mol /; CuCl 2 ; 2 mol / (temperature 50 ° C.) are known.

更に重要なことは、得られた銅箔は、Cu-Ni処理の場合
と同じく黒色を有していることである。こうした黒色
は、位置合わせ精度及び熱吸収率の高いことの点から重
要である。詳しくは、リジッド基板及びフレキシブル基
板を含め印刷回路基板は、ICや抵抗、コンデンサ等の
部品を自動工程で搭載していくが、その際センサーによ
り回路を読み取りながらチップマウントを行なってい
る。このとき、カプトンなどのフィルムを通して銅箔処
理面での位置合わせを行なうことがある。また、スルー
ホール形成時の位置決めも同様である。このとき処理面
が黒に近い程、光の吸収が良いため、位置決めの精度が
高くなる。更には、基板を作製する際、銅箔とフィルム
とを熱を加えながらキュワリングして接着させることが
多い。このとき、遠赤外線、赤外線等の長波長波を用い
ることにより加熱する場合、処理面の色調が黒い方が加
熱効率が良くなる。
More importantly, the obtained copper foil has a black color as in the case of Cu-Ni treatment. Such black color is important in terms of alignment accuracy and high heat absorption rate. More specifically, printed circuit boards including rigid boards and flexible boards are mounted with components such as ICs, resistors, capacitors, etc. in an automatic process, and at that time, they are mounted on a chip while reading a circuit with a sensor. At this time, alignment on the copper foil treated surface may be performed through a film such as Kapton. The same applies to positioning when forming through holes. At this time, the closer the processed surface is to black, the better the light absorption, and the higher the positioning accuracy. Furthermore, when a substrate is produced, the copper foil and the film are often cured and bonded to each other while applying heat. At this time, when heating is performed by using a long wavelength wave such as far infrared rays or infrared rays, the heating efficiency is improved when the color tone of the treated surface is dark.

最後に、必要に応じ、銅箔と樹脂基板との接着力の改善
を主目的として、防錆層上の少なくとも粗化面にシラン
カップリング剤を塗布するシラン処理が施される。塗布
方法は、シランカップリング剤溶液のスプレーによる吹
付け、コーターでの塗布、浸漬、流しかけ等いずれでも
よい。例えば、特公昭60−15654号は、銅箔の粗
面側にクロメート処理を施した後シランカップリング剤
処理を行なうことによって銅箔と樹脂基板との接着力を
改善することを記載しているので、詳細はこれを参照さ
れたい。
Finally, if necessary, a silane treatment for applying a silane coupling agent to at least the roughened surface of the rust-preventive layer is performed, mainly for the purpose of improving the adhesive force between the copper foil and the resin substrate. The coating method may be spraying of a silane coupling agent solution, coating with a coater, dipping, pouring, or the like. For example, Japanese Examined Patent Publication No. 60-15654 describes that the adhesion between the copper foil and the resin substrate is improved by subjecting the rough surface side of the copper foil to a chromate treatment and then a silane coupling agent treatment. Please refer to this for details.

この後、必要なら、銅箔の延性を改善する目的で焼鈍処
理を施すこともある。
Thereafter, if necessary, an annealing treatment may be performed for the purpose of improving the ductility of the copper foil.

以下、実施例及び比較例を呈示する。Hereinafter, examples and comparative examples will be presented.

実施例及び比較例 圧延銅箔に前述した条件範囲で銅−コバルト−ニッケル
めっき粗化処理を施して、銅を17mg/dm2、コバルトを
2000μg/dm2そしてニッケルを500μg/dm2付着し
た後、水洗し、2段めっきとしてのコバルトめっき或い
はコバルト−ニッケルめっきを形成した。コバルトめっ
き単独の場合コバルト付着量は1000μg/dm2、そし
てコバルト−ニッケルめっきの場合は、コバルト付着量
は500μg/dm2、ニッケル付着量は540μg/dm2であ
った。水洗後、防錆処理を行ないそして乾燥した。
Copper range of conditions described above in the Examples and Comparative Examples rolled copper foil - cobalt - is subjected to nickel plating roughening treatment, copper 17 mg / dm 2, after the cobalt 2000 [mu] g / dm 2 and the nickel was 500 [mu] g / dm 2 deposited After washing with water, cobalt plating or cobalt-nickel plating as two-step plating was formed. If the cobalt adhesion amount of the cobalt plating alone 1000 [mu] g / dm 2, and Cobalt - For nickel plating, cobalt coating weight 500 [mu] g / dm 2, the nickel coating weight was 540μg / dm 2. After washing with water, it was rustproofed and dried.

コバルトめっき及びコバルト−ニッケルめっき条件は次
の通りであった: Coめっき Co: 10g/ pH: 2.5 温度: 50℃ D: 3A/dm2 時間: 2秒 Co-Niめっき Co: 10g/ Ni: 20g/ pH: 2.5 温度: 50℃ D: 3A/dm2 時間: 2秒 また、比較用の基準サンプルとして銅、銅−ニッケル
(基準サンプル)、銅−コバルト及び銅−コバルト−ニ
ッケル粗化めっき処理のみを行なったものも用意した。
これらの条件は次の範囲内から下記の付着量(トータル
で約20mg/dm2)を得るように適宜選択した: 銅粗化処理 Cu: 10〜25g/ H2SO4: 20〜100g/ 温度: 20〜40℃ D: 30〜70A/dm2 時間: 1〜5秒 銅付着量:20mg/dm2 Cu-Niめっき Cu: 5〜10g/ Ni: 10〜20g/ pH: 1〜4 温度: 20〜40℃ D: 10〜30A/dm2 時間: 2〜5秒 銅付着量:10mg/dm2 ニッケル付着量:10mg/dm2 Cu-Coめっき Cu: 10〜20g/ Co: 1〜10g/ pH: 1〜4 温度: 40〜50℃ D: 20〜30A/dm2 時間: 1〜5秒 銅付着量:18mg/dm2 コバルト付着量:2000μg/dm2 Cu-Co-Niめっき 上記の通り。
The cobalt plating and cobalt-nickel plating conditions were as follows: Co plating Co: 10 g / pH: 2.5 Temperature: 50 ° C. D k : 3 A / dm 2 hours: 2 seconds Co-Ni plating Co: 10 g / Ni: 20 g / pH: 2.5 Temperature: 50 ° C. D k : 3 A / dm 2 hours: 2 seconds Further, as reference samples for comparison, copper, copper-nickel (reference sample), copper-cobalt and copper-cobalt-nickel roughening plating. A product that was only processed was also prepared.
These conditions were appropriately selected from the following ranges so as to obtain the following adhesion amount (total about 20 mg / dm 2 ): Copper roughening treatment Cu: 10 to 25 g / H 2 SO 4 : 20 to 100 g / temperature : 20 to 40 ° C Dk : 30 to 70 A / dm 2 hours: 1 to 5 seconds Copper adhesion amount: 20 mg / dm 2 Cu-Ni plating Cu: 5 to 10 g / Ni: 10 to 20 g / pH: 1 to 4 temperature : 20 to 40 ° C. D k : 10 to 30 A / dm 2 hours: 2 to 5 seconds Copper adhesion amount: 10 mg / dm 2 Nickel adhesion amount: 10 mg / dm 2 Cu-Co plating Cu: 10 to 20 g / Co: 1 to 10 g / pH: 1 to 4 Temperature: 40 to 50 ° C. D k : 20 to 30 A / dm 2 hours: 1 to 5 seconds Copper deposition amount: 18 mg / dm 2 Cobalt deposition amount: 2000 μg / dm 2 Cu-Co-Ni plating As above.

銅付着量:17mg/dm2 コバルト付着量:2000μg/dm2 ニッケル付着量:500μg/dm2 これら処理後の材料について、その色調を先ず調べた。
黒化度は、digital desitometer Model144を用いて、標
準サンプル黒を1.81そして標準サンプル白を0.08を基準
として測定した。
Copper coverage: 17 mg / dm 2 Cobalt coverage: 2000 μg / dm 2 Nickel coverage: 500 μg / dm 2 The color tone of these treated materials was first examined.
The degree of blackening was measured using a digital desitometer Model 144, with the standard sample black being 1.81 and the standard sample white being 0.08.

結果を表1に示す。サンプル1は銅粗化のみで2段めっ
きを行なわなかった例である。サンプル2及び3は本発
明例である。サンプル4は基準例としての銅−ニッケル
粗化処理の例である。サンプル5及び6は先行技術例で
ある。
The results are shown in Table 1. Sample 1 is an example in which copper roughening was only performed and two-step plating was not performed. Samples 2 and 3 are examples of the present invention. Sample 4 is an example of copper-nickel roughening treatment as a reference example. Samples 5 and 6 are prior art examples.

次に、これらサンプルについて、150℃×10日間の
エージング後のカプトン等のポリイミドフィルムとアク
リル系接着剤を用いての耐熱剥離強度特性(劣化率
%)、180℃×30分オーブン中に銅箔を入れその表
面の酸化変色を調べる耐酸化性試験、並びにアルカリエ
ッチング特性を評価した。耐熱剥離強度については、サ
ンプルを積層接着し、常態(室温)剥離強度(kg/cm)
を測定し、エージング後の剥離強度の劣化率(%)とし
て示した。耐酸化性は酸化状態の目視による観察結果で
ある。アルカリエッチングは、前記したアルカリエッチ
ング液を使用してのエッチング状態の目視による観察結
果である。
Next, regarding these samples, heat-resistant peel strength characteristics (deterioration rate%) using a polyimide film such as Kapton and an acrylic adhesive after aging at 150 ° C. for 10 days, copper foil in an oven at 180 ° C. for 30 minutes Then, an oxidation resistance test for examining the oxidative discoloration of the surface and an alkali etching property were evaluated. For heat-resistant peel strength, samples are laminated and bonded, and normal (room temperature) peel strength (kg / cm)
Was measured and shown as the deterioration rate (%) of the peel strength after aging. The oxidation resistance is the result of visual observation of the oxidation state. The alkali etching is the result of visual observation of the etching state using the above-mentioned alkali etching solution.

結果を表2にまとめて示す。The results are summarized in Table 2.

黒化度は数値が高い程黒いことを示し、色調より黒化度
は1.0以上である必要がある。
The higher the degree of blackening, the darker it is, and the degree of blackening needs to be 1.0 or more according to the color tone.

以上の表1及び2から、本発明の2段めっきを行なうこ
とにより、銅箔表面の色調は黒色化し、黒化度も銅−ニ
ッケルめっきの1.210に近づいていることがわかる。耐
熱熱剥離強度の劣化率も比較例5及び6に比べて大幅に
改善されている。耐酸化性及びアルカリエッチング性い
ずれも良好である。
From the above Tables 1 and 2, it can be seen that by performing the two-step plating of the present invention, the color tone of the copper foil surface becomes black and the degree of blackening approaches 1.210 of copper-nickel plating. The deterioration rate of heat-resistant peel strength is also significantly improved as compared with Comparative Examples 5 and 6. Both oxidation resistance and alkali etching resistance are good.

発明の効果 本発明は、近時の半導体デバイスの急激な発展に伴なう
印刷回路用の高密度及び高多層化に対応し得る銅箔の処
理方法を提供する。本方法による銅箔は、 Cu-Ni処理の場合に匹敵する耐熱剥離強度(特にアク
リル系接着剤を用いたとき)及び耐塩酸性を有するこ
と、 アルカリエッチング液で150μmピッチ回路巾以下
の印刷回路をエッチングできること、 Cu-Ni処理の場合と同様に、耐酸化性が向上するこ
と、 Cu-Ni処理の場合と同様の黒化処理であることの要件
を満足する。本発明は特に、ファインパターンで且つ磁
気ヘッド用FPCとして使用することができる。
Effects of the Invention The present invention provides a method for treating a copper foil capable of accommodating high density and high number of layers for a printed circuit accompanying the recent rapid development of semiconductor devices. The copper foil according to this method should have heat-resistant peel strength (especially when using an acrylic adhesive) and hydrochloric acid resistance comparable to those in the case of Cu-Ni treatment. Use a printed circuit of 150 μm pitch circuit width or less with an alkaline etching solution. Satisfies the requirements of being able to etch, improving the oxidation resistance as in the case of Cu-Ni treatment, and being the same blackening treatment as in the case of Cu-Ni treatment. The present invention can be used particularly as a fine pattern and as an FPC for a magnetic head.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】印刷回路用銅箔の処理方法において、銅箔
の表面に銅−コバルト−ニッケルから成るめっきによる
粗化処理後、コバルトめっき層或いはコバルト及びニッ
ケルから成るめっき層を形成することを特徴とする印刷
回路用銅箔の処理方法。
1. A method for treating a copper foil for a printed circuit, comprising forming a cobalt plating layer or a plating layer comprising cobalt and nickel on the surface of the copper foil after roughening treatment by plating comprising copper-cobalt-nickel. A characteristic method of treating a copper foil for a printed circuit.
【請求項2】前記コバルトめっき層或いはコバルト及び
ニッケルから成るめっき層を形成した後に防錆処理を施
すことを特徴とする特許請求の範囲第1項記載の印刷回
路用銅箔の処理方法。
2. The method for treating a copper foil for a printed circuit according to claim 1, wherein a rust preventive treatment is performed after the cobalt plating layer or the plating layer composed of cobalt and nickel is formed.
【請求項3】防錆処理がクロム酸化物の単独皮膜処理或
いはクロム酸化物と亜鉛及び(又は)亜鉛酸化物との混
合皮膜処理であることを特徴とする特許請求の範囲第1
項記載の印刷回路用銅箔の処理方法。
3. The rust preventive treatment is a single coating treatment of chromium oxide or a mixed coating treatment of chromium oxide and zinc and / or zinc oxide.
A method for treating a copper foil for a printed circuit according to the item.
JP21371090A 1990-08-14 1990-08-14 Method of treating copper foil for printed circuits Expired - Lifetime JPH0654831B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21371090A JPH0654831B2 (en) 1990-08-14 1990-08-14 Method of treating copper foil for printed circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21371090A JPH0654831B2 (en) 1990-08-14 1990-08-14 Method of treating copper foil for printed circuits

Publications (2)

Publication Number Publication Date
JPH0496395A JPH0496395A (en) 1992-03-27
JPH0654831B2 true JPH0654831B2 (en) 1994-07-20

Family

ID=16643709

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH0654831B2 (en)

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