TWI266576B - Electronic device and method for producing the same - Google Patents
Electronic device and method for producing the sameInfo
- Publication number
- TWI266576B TWI266576B TW93137972A TW93137972A TWI266576B TW I266576 B TWI266576 B TW I266576B TW 93137972 A TW93137972 A TW 93137972A TW 93137972 A TW93137972 A TW 93137972A TW I266576 B TWI266576 B TW I266576B
- Authority
- TW
- Taiwan
- Prior art keywords
- electronic device
- components
- receiving layer
- producing
- same
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
- H01L2224/113—Manufacturing methods by local deposition of the material of the bump connector
- H01L2224/1133—Manufacturing methods by local deposition of the material of the bump connector in solid form
- H01L2224/11332—Manufacturing methods by local deposition of the material of the bump connector in solid form using a powder
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/81801—Soldering or alloying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01009—Fluorine [F]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01015—Phosphorus [P]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0102—Calcium [Ca]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01056—Barium [Ba]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0242—Shape of an individual particle
- H05K2201/0257—Nanoparticles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/102—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by bonding of conductive powder, i.e. metallic powder
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Composite Materials (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Wire Bonding (AREA)
- Powder Metallurgy (AREA)
- Non-Insulated Conductors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004006426A JP3997991B2 (ja) | 2004-01-14 | 2004-01-14 | 電子装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200524503A TW200524503A (en) | 2005-07-16 |
TWI266576B true TWI266576B (en) | 2006-11-11 |
Family
ID=34737263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93137972A TWI266576B (en) | 2004-01-14 | 2004-12-08 | Electronic device and method for producing the same |
Country Status (5)
Country | Link |
---|---|
US (1) | US7342179B2 (zh) |
JP (1) | JP3997991B2 (zh) |
KR (1) | KR100702743B1 (zh) |
CN (1) | CN100459829C (zh) |
TW (1) | TWI266576B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI475622B (zh) * | 2011-04-29 | 2015-03-01 | Ind Tech Res Inst | 微凸塊及其形成方法 |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4069867B2 (ja) * | 2004-01-05 | 2008-04-02 | セイコーエプソン株式会社 | 部材の接合方法 |
US7525194B2 (en) * | 2005-07-27 | 2009-04-28 | Palo Alto Research Center Incorporated | System including self-assembled interconnections |
US7504331B2 (en) * | 2005-07-27 | 2009-03-17 | Palo Alto Research Center Incorporated | Method of fabricating self-assembled electrical interconnections |
US7662708B2 (en) * | 2005-07-27 | 2010-02-16 | Palo Alto Research Center Incorporated | Self-assembled interconnection particles |
JP2007059652A (ja) * | 2005-08-25 | 2007-03-08 | Matsushita Electric Ind Co Ltd | 電子部品実装方法 |
JP4731340B2 (ja) * | 2006-02-02 | 2011-07-20 | 富士通株式会社 | 半導体装置の製造方法 |
JP4361572B2 (ja) * | 2007-02-28 | 2009-11-11 | 株式会社新川 | ボンディング装置及び方法 |
US7768366B1 (en) * | 2007-10-29 | 2010-08-03 | The United States Of America As Represented By The Secretary Of The Air Force | Nanoparticles and corona enhanced MEMS switch apparatus |
JP5151584B2 (ja) * | 2008-03-17 | 2013-02-27 | 富士通株式会社 | 半導体装置及び半導体装置の製造方法 |
US8028621B2 (en) * | 2008-05-02 | 2011-10-04 | International Business Machines Corporation | Three-dimensional structures and methods of fabricating the same using a printing plate |
US20090278213A1 (en) * | 2008-05-08 | 2009-11-12 | International Business Machines Corporation | Electrode arrays and methods of fabricating the same using printing plates to arrange particles in an array |
JP2010098156A (ja) * | 2008-10-17 | 2010-04-30 | Seiko Epson Corp | 半導体装置、半導体装置の製造方法、電子機器 |
JP5307669B2 (ja) | 2009-09-09 | 2013-10-02 | 東京エレクトロン株式会社 | 半導体装置の製造方法及び電気的接続を得る方法 |
DE102009050199A1 (de) * | 2009-10-21 | 2011-04-28 | Giesecke & Devrient Gmbh | Herstellung von Leiterstrukturen auf Kunststoff-Folien mittels Nanotinten |
FI124372B (fi) * | 2009-11-13 | 2014-07-31 | Teknologian Tutkimuskeskus Vtt | Kerrostettuihin partikkeleihin liittyvä menetelmä ja tuotteet |
US8580607B2 (en) * | 2010-07-27 | 2013-11-12 | Tessera, Inc. | Microelectronic packages with nanoparticle joining |
JP2012069545A (ja) * | 2010-09-21 | 2012-04-05 | Toyoda Gosei Co Ltd | 発光素子の搭載方法 |
US8853558B2 (en) | 2010-12-10 | 2014-10-07 | Tessera, Inc. | Interconnect structure |
WO2012081144A1 (ja) * | 2010-12-15 | 2012-06-21 | パナソニック株式会社 | 半導体装置及びその製造方法 |
US8618647B2 (en) * | 2011-08-01 | 2013-12-31 | Tessera, Inc. | Packaged microelectronic elements having blind vias for heat dissipation |
CN103170617B (zh) * | 2011-12-23 | 2016-04-27 | 比亚迪股份有限公司 | 一种改性Ag膏及其应用以及功率模块中芯片和基体连接的烧结方法 |
US9633971B2 (en) * | 2015-07-10 | 2017-04-25 | Invensas Corporation | Structures and methods for low temperature bonding using nanoparticles |
US10886250B2 (en) * | 2015-07-10 | 2021-01-05 | Invensas Corporation | Structures and methods for low temperature bonding using nanoparticles |
TW202414634A (zh) | 2016-10-27 | 2024-04-01 | 美商艾德亞半導體科技有限責任公司 | 用於低溫接合的結構和方法 |
CN106449451B (zh) * | 2016-11-29 | 2019-05-07 | 河南省科学院应用物理研究所有限公司 | 一种利用纳米结构的金属界面的键合方法 |
US11244916B2 (en) | 2018-04-11 | 2022-02-08 | Invensas Bonding Technologies, Inc. | Low temperature bonded structures |
JP2020107711A (ja) * | 2018-12-27 | 2020-07-09 | 日東電工株式会社 | 半導体装置製造方法 |
CN109943068B (zh) * | 2019-03-28 | 2022-01-25 | 金旸(厦门)新材料科技有限公司 | 一种耐高温尼龙材料和电镀尼龙材料及其准备方法和应用 |
KR102521946B1 (ko) * | 2022-02-24 | 2023-04-17 | 한국항공우주산업 주식회사 | 전자파흡수필름 제조방법 및 전자파흡수필름을 포함하는 항공기용 전자파흡수패널 |
Family Cites Families (28)
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JPS6224855A (ja) * | 1985-07-25 | 1987-02-02 | Hitachi Ltd | 接合方法 |
EP0248566A3 (en) * | 1986-05-30 | 1990-01-31 | AT&T Corp. | Process for controlling solder joint geometry when surface mounting a leadless integrated circuit package on a substrate |
US4878611A (en) * | 1986-05-30 | 1989-11-07 | American Telephone And Telegraph Company, At&T Bell Laboratories | Process for controlling solder joint geometry when surface mounting a leadless integrated circuit package on a substrate |
FR2657731A1 (fr) * | 1990-02-01 | 1991-08-02 | Corning Incorp | Amplificateur optique integre. |
JPH04323884A (ja) * | 1991-04-24 | 1992-11-13 | Fujitsu Ltd | 圧電トランス |
JPH05327202A (ja) * | 1992-05-22 | 1993-12-10 | Taiyo Yuden Co Ltd | はんだバンプの形成方法 |
JPH06342795A (ja) * | 1993-06-01 | 1994-12-13 | Oki Electric Ind Co Ltd | Icのフリップチップ実装の接続構造 |
JP3116888B2 (ja) * | 1998-02-17 | 2000-12-11 | 日本電気株式会社 | ハンダボール・キャリアテープ及びその製作方法 |
JPH11245081A (ja) * | 1998-02-27 | 1999-09-14 | Fuji Xerox Co Ltd | 熱溶融性接合部材およびこれを用いた半導体実装装置 |
JP2000031387A (ja) * | 1998-07-14 | 2000-01-28 | Fuji Electric Co Ltd | 誘電体薄膜コンデンサの製造方法 |
CN1151367C (zh) | 2000-01-06 | 2004-05-26 | 罗斯蒙德公司 | 微机电系统(mems)用的电互联的晶粒生长 |
EP1255292A1 (en) * | 2000-01-14 | 2002-11-06 | Toray Engineering Co., Ltd. | Chip mounting method |
KR100398716B1 (ko) * | 2000-06-12 | 2003-09-19 | 가부시키가이샤 히타치세이사쿠쇼 | 반도체 모듈 및 반도체 장치를 접속한 회로 기판 |
KR100360476B1 (ko) * | 2000-06-27 | 2002-11-08 | 삼성전자 주식회사 | 탄소나노튜브를 이용한 나노 크기 수직 트랜지스터 및 그제조방법 |
JP3942816B2 (ja) * | 2000-10-25 | 2007-07-11 | ハリマ化成株式会社 | 金属間のロウ付け接合方法 |
JP3867523B2 (ja) | 2000-12-26 | 2007-01-10 | 株式会社デンソー | プリント基板およびその製造方法 |
JP3711873B2 (ja) * | 2001-02-19 | 2005-11-02 | ソニーケミカル株式会社 | バンプレスicチップの製造方法 |
JP4627376B2 (ja) * | 2001-02-20 | 2011-02-09 | バンドー化学株式会社 | 金属コロイド液及びその製造方法 |
CN1412782A (zh) * | 2001-10-19 | 2003-04-23 | 聚鼎科技股份有限公司 | 具有正温度系数的导电复合材料 |
JP2003203450A (ja) * | 2001-12-28 | 2003-07-18 | Alps Electric Co Ltd | 磁気ヘッド |
JP3886401B2 (ja) * | 2002-03-25 | 2007-02-28 | ソニーケミカル&インフォメーションデバイス株式会社 | 接続構造体の製造方法 |
TWI220163B (en) * | 2003-04-24 | 2004-08-11 | Ind Tech Res Inst | Manufacturing method of high-conductivity nanometer thin-film probe card |
JP3904210B2 (ja) * | 2003-04-28 | 2007-04-11 | 株式会社リコー | 光学電子デバイスの接合方法及び接合構造 |
US6989325B2 (en) * | 2003-09-03 | 2006-01-24 | Industrial Technology Research Institute | Self-assembled nanometer conductive bumps and method for fabricating |
US6982492B2 (en) * | 2003-10-23 | 2006-01-03 | Intel Corporation | No-flow underfill composition and method |
DE10359424B4 (de) * | 2003-12-17 | 2007-08-02 | Infineon Technologies Ag | Umverdrahtungsplatte für Halbleiterbauteile mit engem Anschlussraster und Verfahren zur Herstellung derselben |
US20050285116A1 (en) * | 2004-06-29 | 2005-12-29 | Yongqian Wang | Electronic assembly with carbon nanotube contact formations or interconnections |
KR100753468B1 (ko) * | 2005-03-11 | 2007-08-31 | 삼성전기주식회사 | 배선 재료, 배선 기판 및 배선 기판의 형성방법 |
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2004
- 2004-01-14 JP JP2004006426A patent/JP3997991B2/ja not_active Expired - Fee Related
- 2004-12-08 TW TW93137972A patent/TWI266576B/zh not_active IP Right Cessation
- 2004-12-29 US US11/024,992 patent/US7342179B2/en not_active Expired - Fee Related
-
2005
- 2005-01-13 KR KR20050003335A patent/KR100702743B1/ko not_active IP Right Cessation
- 2005-01-14 CN CNB2005100039820A patent/CN100459829C/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI475622B (zh) * | 2011-04-29 | 2015-03-01 | Ind Tech Res Inst | 微凸塊及其形成方法 |
Also Published As
Publication number | Publication date |
---|---|
KR100702743B1 (ko) | 2007-04-03 |
US20050150684A1 (en) | 2005-07-14 |
CN100459829C (zh) | 2009-02-04 |
TW200524503A (en) | 2005-07-16 |
JP3997991B2 (ja) | 2007-10-24 |
KR20050074921A (ko) | 2005-07-19 |
US7342179B2 (en) | 2008-03-11 |
JP2005203468A (ja) | 2005-07-28 |
CN1642394A (zh) | 2005-07-20 |
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