TWI263079B - Chemical polishing method for liquid crystal glass substrate and chemical polishing apparatus - Google Patents
Chemical polishing method for liquid crystal glass substrate and chemical polishing apparatusInfo
- Publication number
- TWI263079B TWI263079B TW090110411A TW90110411A TWI263079B TW I263079 B TWI263079 B TW I263079B TW 090110411 A TW090110411 A TW 090110411A TW 90110411 A TW90110411 A TW 90110411A TW I263079 B TWI263079 B TW I263079B
- Authority
- TW
- Taiwan
- Prior art keywords
- glass substrate
- acid
- chemical polishing
- liquid crystal
- crystal glass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02019—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/52—Mechanical processing of waste for the recovery of materials, e.g. crushing, shredding, separation or disassembly
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/60—Glass recycling
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Liquid Crystal (AREA)
Abstract
To provide a chemical polishing method for a liquid crystal glass substrate and chemical polishing apparatus, which produce a thin substrate regardless of the size of the liquid crystal glass substrate and flatten the surface of the glass substrate, and reuse the glass. In a storage vessel, a chemical polishing liquid has a fluoride mixture at least one selected from the group consisting of fluoric acid, ammonium fluoride, potassium fluoride, and sodium fluoride, and inorganic acid at least one selected from the group consisting of hydrochloric acid, sulfuric acid, phosphoric acid and nitric acid, and organic acid at least one selected from the group consisting of acetic acid and succinic acid, and anion-based surfactant of sulfonate-based surfactant, and amine-based ampho-surfactant. The liquid crystal glass substrate is placed in the chemical processing fluid storage vessel, and bubbles are generated form a bubble generating device, and the outer surface of the liquid crystal glass substrate is polished at 0.5-10 micrometer/min.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001114498 | 2001-04-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI263079B true TWI263079B (en) | 2006-10-01 |
Family
ID=18965559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW090110411A TWI263079B (en) | 2001-04-12 | 2001-05-01 | Chemical polishing method for liquid crystal glass substrate and chemical polishing apparatus |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR100380844B1 (en) |
CN (2) | CN1277142C (en) |
SG (1) | SG94843A1 (en) |
TW (1) | TWI263079B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699339B (en) * | 2016-09-30 | 2020-07-21 | 日商松下知識產權經營股份有限公司 | Polishing liquid for glass and polishing method |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG121817A1 (en) * | 2002-11-22 | 2006-05-26 | Nishiyama Stainless Chemical Co Ltd | Glass substrate for flat planel display, and process for producing the same |
CN100343420C (en) * | 2004-07-21 | 2007-10-17 | 常耀辉 | Fast chemical grinding polishing bath liquid for stainless steel surface and its method |
JP2007197236A (en) * | 2006-01-25 | 2007-08-09 | Nishiyama Stainless Chem Kk | Method for manufacturing glass substrate for display and glass substrate |
CN101089688B (en) * | 2006-06-14 | 2010-09-29 | 比亚迪股份有限公司 | Manufacturing method of superthin liquid crystal box |
CN100392477C (en) * | 2006-07-07 | 2008-06-04 | 南京大学 | Liquid crystal display panel resource processing method |
KR101233687B1 (en) * | 2010-10-28 | 2013-02-15 | 삼성디스플레이 주식회사 | Apparatus of etching a glass substrate |
JP5829458B2 (en) * | 2011-08-25 | 2015-12-09 | 株式会社Screenホールディングス | Substrate processing equipment |
CN103033403B (en) * | 2011-09-29 | 2015-09-02 | 鞍钢股份有限公司 | Preparation method of sheet metal film sample |
CN102643028A (en) * | 2012-05-14 | 2012-08-22 | 深圳市拓捷科技发展有限公司 | Glass thinning equipment and method |
CN102701597B (en) * | 2012-06-26 | 2014-10-08 | 汕头市拓捷科技有限公司 | Rapid glass thinning equipment |
CN102701598B (en) * | 2012-06-26 | 2015-09-30 | 广东拓捷科技有限公司 | A kind of glass thinning apparatus of improvement |
CN103046053B (en) * | 2012-09-21 | 2015-04-01 | 中国兵器工业第二一三研究所 | Chemical polishing method of stainless steel by high-temperature oxidation |
CN103508676A (en) * | 2013-07-24 | 2014-01-15 | 芜湖长信科技股份有限公司 | Method for avoiding defect in LCD glass substrate thinning process and acid solution configuration method |
TW201519308A (en) * | 2013-11-13 | 2015-05-16 | Grand Plastic Technology Corp | Circulation type uniformly etching device |
CN105541120A (en) * | 2015-12-28 | 2016-05-04 | 常熟市金亿复合材料有限公司 | Coating process for hollow glass plate |
CN107286853A (en) * | 2017-07-12 | 2017-10-24 | 天津津航技术物理研究所 | A kind of devitrified glass high brightness chemical polishing solution and preparation method |
CN107235641A (en) * | 2017-08-14 | 2017-10-10 | 湖北工程学院 | A kind of glass thinning etching solution and preparation method thereof |
CN107902914A (en) * | 2017-12-14 | 2018-04-13 | 天津美泰真空技术有限公司 | A kind of glass substrate thinning technique etching solution |
CN107814491A (en) * | 2017-12-14 | 2018-03-20 | 天津美泰真空技术有限公司 | A kind of flat glass substrate etching solution |
CN109439329A (en) * | 2018-10-29 | 2019-03-08 | 苏州博洋化学股份有限公司 | FPD array process novel I GZO etching solution |
CN109111859A (en) * | 2018-10-30 | 2019-01-01 | 秦皇岛市大龙建材有限公司 | Glass polishing solution |
CN111029230B (en) * | 2019-12-13 | 2022-04-05 | 山西长城微光器材股份有限公司 | Micro-channel plate in-channel polishing method |
CN111925126A (en) * | 2020-08-12 | 2020-11-13 | 郑州恒昊光学科技有限公司 | Paste for repairing slight scratch of optical glass |
CN116042098A (en) * | 2023-02-08 | 2023-05-02 | 广东粤港澳大湾区黄埔材料研究院 | Nano alumina polishing solution and application thereof in polishing of infrared chalcogenide glass |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854974A (en) * | 1981-09-28 | 1983-04-01 | 三菱電機株式会社 | Golf exerciser |
JPH0641770A (en) * | 1992-07-27 | 1994-02-15 | Daikin Ind Ltd | Treatment for surface of silicon wafer |
CN1088002A (en) * | 1992-11-16 | 1994-06-15 | 东京电子株式会社 | Make the method and apparatus of liquid crystal display substrate and evaluating semiconductor crystals |
JP3531961B2 (en) * | 1994-02-01 | 2004-05-31 | 横浜ゴム株式会社 | Endless processing method of steel cord belt and cooling / refrigeration apparatus for implementing the endless processing method |
JPH10109012A (en) * | 1996-10-04 | 1998-04-28 | Stec Kk | Deodorizing method and deodorizing device for garbage disposal |
US6174371B1 (en) * | 1997-10-06 | 2001-01-16 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating method and apparatus |
JPH11111658A (en) * | 1997-10-06 | 1999-04-23 | Dainippon Screen Mfg Co Ltd | Method and device for processing substrate |
-
2001
- 2001-04-30 KR KR10-2001-0023329A patent/KR100380844B1/en not_active IP Right Cessation
- 2001-05-01 TW TW090110411A patent/TWI263079B/en not_active IP Right Cessation
- 2001-06-05 SG SG200103698A patent/SG94843A1/en unknown
-
2002
- 2002-04-11 CN CNB021059632A patent/CN1277142C/en not_active Expired - Fee Related
- 2002-04-11 CN CNB2005100833270A patent/CN100462319C/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699339B (en) * | 2016-09-30 | 2020-07-21 | 日商松下知識產權經營股份有限公司 | Polishing liquid for glass and polishing method |
Also Published As
Publication number | Publication date |
---|---|
CN1277142C (en) | 2006-09-27 |
KR20020080215A (en) | 2002-10-23 |
KR100380844B1 (en) | 2003-04-18 |
CN1724432A (en) | 2006-01-25 |
CN1380572A (en) | 2002-11-20 |
SG94843A1 (en) | 2003-03-18 |
CN100462319C (en) | 2009-02-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |