JP2004002205A5 - - Google Patents

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Publication number
JP2004002205A5
JP2004002205A5 JP2003324189A JP2003324189A JP2004002205A5 JP 2004002205 A5 JP2004002205 A5 JP 2004002205A5 JP 2003324189 A JP2003324189 A JP 2003324189A JP 2003324189 A JP2003324189 A JP 2003324189A JP 2004002205 A5 JP2004002205 A5 JP 2004002205A5
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JP
Japan
Prior art keywords
chemical
chemical processing
glass substrate
liquid
working fluid
Prior art date
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Pending
Application number
JP2003324189A
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Japanese (ja)
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JP2004002205A (en
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Publication date
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Priority to JP2003324189A priority Critical patent/JP2004002205A/en
Priority claimed from JP2003324189A external-priority patent/JP2004002205A/en
Publication of JP2004002205A publication Critical patent/JP2004002205A/en
Publication of JP2004002205A5 publication Critical patent/JP2004002205A5/ja
Pending legal-status Critical Current

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Claims (9)

化学加工液中にガラス基板を浸漬し、このガラス基板の外表面を構成する片側の一部若しくは全部または両側の一部若しくは全部を研磨して薄くする加工を行う化学加工方法であって、
前記ガラス基板を化学加工液中に略垂直配置し、
前記化学加工液中に連続して発生させた気泡により上昇液流を生じさせ、
前記化学加工液中の反応生成物を連続的に除去しつつ、
１０μｍ／分以下の加工速度で加工する
ことを特徴とする化学加工方法。 A chemical processing method for immersing a glass substrate in a chemical processing liquid and performing a process of polishing and thinning part or all of one side or part or all of both sides constituting the outer surface of the glass substrate ,
The glass substrate is disposed substantially vertically in the chemical processing liquid,
A rising liquid flow is generated by bubbles generated continuously in the chemical working fluid,
While continuously removing reaction products in the chemical working fluid,
A chemical processing method characterized by processing at a processing speed of 10 μm / min or less . 前記化学加工液が、フッ酸、並びに塩酸、硫酸、リン酸および硝酸から選ばれる１種以上の無機酸を含有する請求項１に記載の化学加工方法。 The chemical processing method according to claim 1, wherein the chemical processing liquid contains hydrofluoric acid and one or more inorganic acids selected from hydrochloric acid, sulfuric acid, phosphoric acid, and nitric acid. 前記化学加工液は、前記ガラス基板表面に前記反応生成物が再付着することを防止する再付着防止剤を含有し、
前記再付着防止剤が陰イオン系界面活性剤またはアミン系界面活性剤である請求項１または２に記載の化学加工方法。 The chemical working fluid contains an anti-redeposition agent that prevents the reaction product from re-adhering to the glass substrate surface,
The chemical processing method according to claim 1, wherein the anti-redeposition agent is an anionic surfactant or an amine surfactant . 前記上昇液流により化学加工液を化学加工液貯留槽から溢出させる請求項１〜３のいずれかに記載の化学加工方法。The chemical processing method according to claim 1, wherein the chemical processing liquid overflows from the chemical processing liquid storage tank by the rising liquid flow. 前記気泡を超音波振動子または揺動攪拌翼により化学加工液中で拡散させている請求項１〜４のいずれかに記載の化学加工方法。The chemical processing method according to claim 1, wherein the bubbles are diffused in the chemical processing liquid by an ultrasonic vibrator or an oscillating stirring blade. 請求項１〜５のいずれかに記載の方法により加工したガラス基板。The glass substrate processed by the method in any one of Claims 1-5. 請求項６に記載のガラス基板を使用して製造されたフラットパネルディスプレイ。The flat panel display manufactured using the glass substrate of Claim 6. ガラス基板の外表面を構成する片側の一部若しくは全部または両側の一部若しくは全部を研磨して薄くする加工を行う化学加工装置であって、A chemical processing apparatus that performs processing to polish and thin part or all of one side or part or all of both sides constituting the outer surface of a glass substrate,
化学加工液を貯溜する化学加工液貯溜槽と、A chemical processing fluid storage tank for storing chemical processing fluid;
前記化学加工液貯留槽の底部に配置させた気泡発生装置と、A bubble generator disposed at the bottom of the chemical working fluid storage tank;
前記化学加工液貯溜槽から溢出させた化学加工液を受ける溢出液受け槽と、An overflow receiving tank for receiving the chemical working liquid overflowed from the chemical working liquid storage tank;
前記化学加工液を化学加工液貯溜槽に送るポンプとA pump for feeding the chemical working fluid to a chemical working fluid storage tank;
を備えたことを特徴とする化学加工装置。A chemical processing apparatus comprising: 超音波振動子または揺動攪拌翼を備える請求項８に記載の化学加工装置。The chemical processing apparatus according to claim 8, comprising an ultrasonic vibrator or a rocking stirring blade.
JP2003324189A 2001-04-12 2003-09-17 Chemical processing method of glass substrate Pending JP2004002205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003324189A JP2004002205A (en) 2001-04-12 2003-09-17 Chemical processing method of glass substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001114498 2001-04-12
JP2003324189A JP2004002205A (en) 2001-04-12 2003-09-17 Chemical processing method of glass substrate

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2002110838A Division JP3523239B2 (en) 2001-04-12 2002-04-12 Glass substrate chemical processing method and glass substrate

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2005059895A Division JP2005239546A (en) 2001-04-12 2005-03-04 Chemical processing method for glass substrate
JP2005059892A Division JP2005247687A (en) 2001-04-12 2005-03-04 Chemical processing method of glass substrate

Publications (2)

Publication Number Publication Date
JP2004002205A JP2004002205A (en) 2004-01-08
JP2004002205A5 true JP2004002205A5 (en) 2005-08-04

Family

ID=30445675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003324189A Pending JP2004002205A (en) 2001-04-12 2003-09-17 Chemical processing method of glass substrate

Country Status (1)

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JP (1) JP2004002205A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100677052B1 (en) 2005-06-17 2007-02-02 테크노세미켐 주식회사 Etching Composition for LCD Glass
JP4738212B2 (en) * 2006-03-06 2011-08-03 カシオ計算機株式会社 Manufacturing method of liquid crystal display device
JP2010191446A (en) * 2010-03-19 2010-09-02 Casio Computer Co Ltd Method for manufacturing liquid crystal display
WO2019044757A1 (en) * 2017-08-31 2019-03-07 日本電気硝子株式会社 Method for etching glass, etching treatment device and glass sheet

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