CN105983553A - Ultrasonic cleaning device and cleaning method - Google Patents
Ultrasonic cleaning device and cleaning method Download PDFInfo
- Publication number
- CN105983553A CN105983553A CN201510249519.8A CN201510249519A CN105983553A CN 105983553 A CN105983553 A CN 105983553A CN 201510249519 A CN201510249519 A CN 201510249519A CN 105983553 A CN105983553 A CN 105983553A
- Authority
- CN
- China
- Prior art keywords
- bubble
- supersonic oscillations
- ultrasonic
- oscillations plate
- rinse bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to an ultrasonic cleaning device and cleaning method. The device comprises a cleaning tank used for storing cleaning liquid, an ultrasonic generator comprising at least one ultrasonic oscillation plate which is arranged in the cleaning tank, and a bubble generator capable of generating bubbles in the cleaning tank storing the cleaning liquid, wherein each ultrasonic oscillation plate is used for applying ultrasonic vibration to the cleaning liquid stored in the cleaning tank; the bubble generator is provided with at least one bubble overflow port; each bubble overflow port can convey the bubbles to the ultrasonic vibration path of each ultrasonic oscillation plate; and each ultrasonic oscillation plate can apply ultrasonic vibration to the bubbles overflowing from the corresponding bubble overflow port. The ultrasonic cleaning device and cleaning method can greatly reduce the using amount of a cleaning agent, more water and electricity are saved in the silicon wafer cleaning process, the effect on environmental protection is large, and most directly, the solar battery piece machining cost is greatly reduced.
Description
Technical field
The present invention relates to a kind of ultrasonic cleaning equipment and cleaning method, be specifically designed a kind of can the ultrasonic cleaning equipment that is carried out of class workpiece thin and brittle to silicon chip, wafer etc. and cleaning method.
Background technology
Silicon chip is as the Typical Representative of thin and brittle class workpiece, and it is the carrier of solar battery sheet, generally has silicon rod cutting to form, and carries out clean cleaning when making solar battery sheet.Common silicon rod cutting method has wire cutting silicon chip method and silicon wafer cut by diamond wire method two kinds.Wire cutting silicon chip method is to utilize carborundum powder and PEG cutting liquid to be ejected into after being sufficiently mixed on the wire of walking at a high speed and act on to cut on silicon rod.Silicon wafer cut by diamond wire method utilizes diamond wire to add water preparation coolant (also lubricating other effects) and cuts, low cost due to cutting silicon chip water preparation used in this cutting method, environment is friendly, and institute is cut enterprise by increasing silicon rod in this way and uses.
But owing to silica flour is hydrophobic, therefore the silica flour that falls from silicon rod is easily reunited and is difficult to separately at silicon chip surface during cutting.It is compared to the silicon chip after PEG cutting liquid (the poly-the sixth of the twelve Earthly Branches glycol) cutting used in wire cutting method, it is more difficult to remove the silica flour of silicon chip surface.Therefore, when the follow-up cleaning of the silicon chip utilizing silicon wafer cut by diamond wire method to cut, needing heats by a certain amount of alkali liquor reacts removal and is carried out, the operation that this dependence alkali liquor is carried out not only to consume substantial amounts of alkali, and the follow-up alkali liquor in order to remove residual also needs to rinse further, waste water is laborious, is also unfavorable for environmental protection.
Summary of the invention
In order to solve above-mentioned technical problem, it is an object of the invention to provide a kind of ultrasonic cleaning equipment being capable of high-efficiency washing.It is a further object of the present invention to provide a kind of method for suppersonic cleaning with high-efficiency washing effect
In order to realize the first purpose of foregoing invention, the present invention uses and such as sows technical scheme:
A kind of ultrasonic cleaning equipment, this device includes:
Rinse bath, it is used for store washing liquid；
Supersonic generator, it includes that at least one supersonic oscillations plate, described supersonic oscillations plate are arranged in described rinse bath, and described supersonic oscillations plate can apply ultrasonic activation to the cleanout fluid in being stored in described rinse bath；
Bubble generator, it can produce bubble in storage has the rinse bath of cleanout fluid, and described bubble generator has at least one bubble escape orifice, and described bubble escape orifice can carry bubble on the ultrasonic activation path of described supersonic oscillations plate.
In technique scheme, it is preferable that a diameter of described supersonic oscillations plate of bubble produced by described bubble escape orifice vibrates more than 5 times of diameter of produced cavitation bubble in described cleanout fluid.
In technique scheme, it is preferable that described bubble generator includes at least bubbling pipe being connected with a high-pressure air source, described bubbling pipe offers at least one aperture, the described bubble escape orifice described in aperture composition.Further preferred, described bubble generator includes many bubbling pipes, the many parallel tops being distributed in corresponding described supersonic oscillations plate of described bubbling pipe.
In technique scheme, it is preferable that described supersonic oscillations plate is arranged on the inner bottom part of described rinse bath, described bubble escape orifice is positioned at the surface of described supersonic oscillations plate.Further preferred, described supersonic oscillations plate be arranged above being cleaned by the Support bracket of part for support, described bubble escape orifice is between described supersonic oscillations plate and described Support bracket.
In technique scheme, it is preferable that described rinse bath is open topped formula rinse bath.
In technique scheme, it is preferable that the frequency of oscillation of described supersonic oscillations plate is more than 28KHz.
In order to realize above-mentioned second goal of the invention, the present invention adopts the following technical scheme that a kind of method for suppersonic cleaning, and the method comprises the steps:
Set the rinse bath of supersonic oscillations plate in preparing one, in rinse bath, inject cleanout fluid, part will be cleaned by and supersonic oscillations plate is immersed in described cleanout fluid；
At described supersonic oscillations plate and be cleaned by between part persistently inputting bubble；
Utilize described supersonic oscillations plate to described cleanout fluid, bubble applies ultrasonic activation thus realization is to the cleaning being cleaned by part surface.
In technique scheme, it is preferable that a diameter of described supersonic oscillations plate of bubble produced by described bubble escape orifice vibrates more than 5 times of diameter of produced cavitation bubble in described cleanout fluid.
The present invention compared with prior art obtains following beneficial effect: use this ultrasonic cleaning equipment and cleaning method can be greatly saved the usage amount of abluent, more water-saving when making Wafer Cleaning, power saving, the biggest to environmental-protection function, it is the most directly to greatly reduce solar battery sheet processing cost.
Accompanying drawing explanation
Accompanying drawing 1 is the structural representation of the ultrasonic cleaning equipment of the present invention；
Accompanying drawing 2 is the close-up schematic view of the ultrasonic waves for cleaning process of the present invention；
100, ultrasonic cleaning equipment；10, rinse bath；11, cleanout fluid；13, it is cleaned by silicon chip；14, the silicon chip frock gaily decorated basket；15, Support bracket；16, supersonic generator；17, supersonic oscillations plate；19, bubbling pipe；20, aperture；21, bubble；22, cavitation bubble.
Detailed description of the invention
By describing technology contents, the structural feature of invention in detail, being reached purpose and effect, below in conjunction with embodiment and coordinate accompanying drawing to be described in detail.
Ultrasonic cleaning equipment 100 as shown in Figure 1, this device 100 is a cleaning device for cleaning silicon chip.This device 100 is mainly made up of such as lower part: the rinse bath 10 of store washing liquid 11, rinse bath 10 is the structure of open topped；Supporting in cleanout fluid 11 and be cleaned by silicon chip this example of 13(, silicon chip 13 is all contained in the silicon chip frock gaily decorated basket 14) Support bracket 15；Supersonic generator 16, it possesses the multiple supersonic oscillations plates 17 that can outwards produce ultrasonic activation, multiple supersonic oscillations plates 17 are arranged on the inner bottom part of rinse bath 10, Support bracket 15 is positioned at the surface of supersonic oscillations plate 17, supersonic oscillations plate 17 can be to the cleanout fluid 11 of surface and be immersed in cleanout fluid 11 and the frequency of oscillation of supersonic oscillations plate 17 that applies to select in ultrasonic activation, this example with the silicon chip to be cleaned 13 of surface is at more than 28KHz；Bubble generator, it can produce bubble 21 in storage has the rinse bath 10 of cleanout fluid 11, and the diameter of bubble 21 is more than 5 times of the diameter of the cavitation bubble that supersonic oscillations plate 17 is formed when applying ultrasonic activation and produce cavitation in cleanout fluid 11.
In this example, bubble generator includes the many bubbling pipes 19 being connected with a compressed air source, the many parallel tops being distributed in corresponding supersonic oscillations plate 17 of bubbling pipe 19, the upper wall surface of each bubbling pipe 19 offers several trickle apertures 20 vertically, this aperture 20 also constitutes bubble escape orifice, i.e. bubble escape orifice is positioned on the ultrasonic activation path of supersonic oscillations plate 17 (this example ultrasonic activation path is upwardly direction), open the air valve of compressed air source, compressed air can be discharged in cleanout fluid via aperture 20 and produce its bubble 21 in this and cleanout fluid effect, supersonic oscillations plate 17 can apply ultrasonic activation to the bubble 21 produced by aperture 20 simultaneously.
In order to produce a large amount of bubble smoothly, it is ensured that the compressed-air actuated speed imported in cleanout fluid 11 via aperture 20 is greater than air and is dissolved in the speed of water, high-pressure air source can also be other safe gas in addition to compressed air.
The process once utilizing above-mentioned cleaning device that silicon chip is carried out described below:
First in rinse bath 10 inject cleanout fluid 11(can be water), the height of water level in rinse bath 10 to be remained in cleaning process, to this end, rinse bath 10 would generally with one supply solution tank adjacent or one in low outer high double-slot；
Secondly, the silicon chip frock gaily decorated basket 14 that will be loaded with being cleaned by silicon chip 13 is placed on Support bracket 15, it is ensured that all silicon chips 13 that are cleaned by are fully immersed in cleanout fluid 11；
Again, open supersonic generator 16 and bubble generator makes its work, supersonic oscillations plate 17 operationally produces ultrasonic cavitation effect, the cavitation bubble 22 produced at cleanout fluid 11 is vibrated under the effect of ultrasound wave, as shown in Figure 2, simultaneously, produced by bubble generator, the size of this bubble 21 of bubble 21(is the size much larger than cavitation bubble 22) also can be moved upward to endlessly be cleaned by silicon chip surface, the ultrasonic activation effect same purpose of supersonic oscillations plate 17 is on bubble 21, so cavitation bubble 22 and bubble 21 all ruptures collapsing under the vibration of ultrasound wave, the impulsive force produced during its collapse splitting can effectively be removed and be cleaned by the dirt of silicon chip surface and tiny silicon powder particle, thus realize the purpose of clean cleaning.
In this example, the bubble that ultrasonic small cavitation bubble (cavitation effect) and bubble generator bloat all can remove part silicon powder particle, but the cavitation bubble active force produced due to single, ultrasonic cavitation is less, and the large volume bubble that individually bubble generator bloats can be attached to be cleaned by part (silicon chip) surface migration and inoperative, the force of explosion that therefore this example produces when the large volume of bubble bloated by bubble generator being smashed by the cavitation bubble that ultrasonic cavitation produces impacts and is cleaned by part (silicon chip) surface and realizes cleaning silicon chip.
Above-described embodiment only for technology design and the feature of the present invention are described, its object is to allow person skilled in the art will appreciate that present disclosure and to implement according to this, can not limit the scope of the invention with this.All equivalence changes made according to present invention spirit or modification, all should contain within protection scope of the present invention.
Claims (10)
1. a ultrasonic cleaning equipment, it is characterised in that: this device includes:
Rinse bath, it is used for store washing liquid；
Supersonic generator, it includes that at least one supersonic oscillations plate, described supersonic oscillations plate are arranged in described rinse bath, and described supersonic oscillations plate can apply ultrasonic activation to the cleanout fluid in being stored in described rinse bath；
Bubble generator, it can produce bubble in storage has the rinse bath of cleanout fluid, and described bubble generator has at least one bubble escape orifice, and described bubble escape orifice can carry bubble on the ultrasonic activation path of described supersonic oscillations plate.
Ultrasonic cleaning equipment the most according to claim 1, it is characterised in that: a diameter of described supersonic oscillations plate of bubble produced by described bubble escape orifice vibrates more than 5 times of diameter of produced cavitation bubble in described cleanout fluid.
Ultrasonic cleaning equipment the most according to claim 1, it is characterized in that: described bubble generator includes at least bubbling pipe being connected with a high-pressure air source, at least one aperture, the described bubble escape orifice described in aperture composition is offered on described bubbling pipe.
Ultrasonic cleaning equipment the most according to claim 3, it is characterised in that: described bubble generator includes many bubbling pipes, the many parallel tops being distributed in corresponding described supersonic oscillations plate of described bubbling pipe.
Ultrasonic cleaning equipment the most according to claim 1, it is characterised in that: described supersonic oscillations plate is arranged on the inner bottom part of described rinse bath, and described bubble escape orifice is positioned at the surface of described supersonic oscillations plate.
Ultrasonic cleaning equipment the most according to claim 5, it is characterized in that: the Support bracket being arranged above being cleaned by part for support of described supersonic oscillations plate, described bubble escape orifice is between described supersonic oscillations plate and described Support bracket.
Ultrasonic cleaning equipment the most according to claim 1, it is characterised in that: described rinse bath is open topped formula rinse bath.
Ultrasonic cleaning equipment the most according to claim 1, it is characterised in that: the frequency of oscillation of described supersonic oscillations plate is more than 28KHz.
9. a method for suppersonic cleaning, it is characterised in that: the method comprises the steps:
Set the rinse bath of supersonic oscillations plate in preparing one, in rinse bath, inject cleanout fluid, part will be cleaned by and supersonic oscillations plate is immersed in described cleanout fluid；
At described supersonic oscillations plate and be cleaned by between part persistently inputting bubble；
Utilize described supersonic oscillations plate to described cleanout fluid, bubble applies ultrasonic activation thus realization is to the cleaning being cleaned by part surface.
Method for suppersonic cleaning the most according to claim 9, it is characterised in that: a diameter of described supersonic oscillations plate of bubble produced by described bubble escape orifice vibrates more than 5 times of diameter of produced cavitation bubble in described cleanout fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510249519.8A CN105983553A (en) | 2015-05-18 | 2015-05-18 | Ultrasonic cleaning device and cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510249519.8A CN105983553A (en) | 2015-05-18 | 2015-05-18 | Ultrasonic cleaning device and cleaning method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105983553A true CN105983553A (en) | 2016-10-05 |
Family
ID=57040142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510249519.8A Pending CN105983553A (en) | 2015-05-18 | 2015-05-18 | Ultrasonic cleaning device and cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105983553A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106862178A (en) * | 2017-03-13 | 2017-06-20 | 赵子宁 | A kind of solar pipe cleaning device |
| CN109413857A (en) * | 2018-11-09 | 2019-03-01 | 博罗康佳精密科技有限公司 | A kind of manufacture craft of high-frequency high-speed plate |
| CN110694354A (en) * | 2019-10-15 | 2020-01-17 | 蒋立宪 | Filter cloth belt cleaning device |
| CN111229047A (en) * | 2020-03-13 | 2020-06-05 | 广东威特宝土壤修复科研中心有限公司 | Submicron bubble oscillation cleaning system and cleaning method |
| WO2024098493A1 (en) * | 2022-11-09 | 2024-05-16 | 深圳先进技术研究院 | Ultrasonic cleaning device and ultrasonic cleaning method |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3626054A1 (en) * | 1985-07-10 | 1987-06-25 | Waelzlager Normteile Veb | Process and device for the ultrasonic cleaning of rotationally symmetrical series parts |
| JPH02191761A (en) * | 1989-01-20 | 1990-07-27 | Sando Iron Works Co Ltd | Continuous washing device for web |
| JP2001259550A (en) * | 2000-03-17 | 2001-09-25 | Satsuma Tsushin Kogyo Kk | Washing nozzle |
| CN1723091A (en) * | 2002-10-07 | 2006-01-18 | 株式会社星团 | Ultrsonic washing equipment and ultrasonic washing method |
| CN1939609A (en) * | 2005-09-30 | 2007-04-04 | 台达电子工业股份有限公司 | Ultrasonic cleansing system and method |
| CN101428281A (en) * | 2007-11-08 | 2009-05-13 | 上海市卢湾区东南医院 | Method for cleaning artificial tooth with ultrasonic |
| CN101452593A (en) * | 2007-11-30 | 2009-06-10 | 黄金富 | Banknote cleaning equipment and method for cleaning black money |
| CN204171018U (en) * | 2014-09-12 | 2015-02-25 | 湘潭天汽模普瑞森传动部件有限公司 | A kind of external tooth hub cleaning equipment |
| CN204817320U (en) * | 2015-05-18 | 2015-12-02 | 张家港市超声电气有限公司 | Ultrasonic cleaning apparatus |
-
2015
- 2015-05-18 CN CN201510249519.8A patent/CN105983553A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3626054A1 (en) * | 1985-07-10 | 1987-06-25 | Waelzlager Normteile Veb | Process and device for the ultrasonic cleaning of rotationally symmetrical series parts |
| JPH02191761A (en) * | 1989-01-20 | 1990-07-27 | Sando Iron Works Co Ltd | Continuous washing device for web |
| JP2001259550A (en) * | 2000-03-17 | 2001-09-25 | Satsuma Tsushin Kogyo Kk | Washing nozzle |
| CN1723091A (en) * | 2002-10-07 | 2006-01-18 | 株式会社星团 | Ultrsonic washing equipment and ultrasonic washing method |
| CN1939609A (en) * | 2005-09-30 | 2007-04-04 | 台达电子工业股份有限公司 | Ultrasonic cleansing system and method |
| CN101428281A (en) * | 2007-11-08 | 2009-05-13 | 上海市卢湾区东南医院 | Method for cleaning artificial tooth with ultrasonic |
| CN101452593A (en) * | 2007-11-30 | 2009-06-10 | 黄金富 | Banknote cleaning equipment and method for cleaning black money |
| CN204171018U (en) * | 2014-09-12 | 2015-02-25 | 湘潭天汽模普瑞森传动部件有限公司 | A kind of external tooth hub cleaning equipment |
| CN204817320U (en) * | 2015-05-18 | 2015-12-02 | 张家港市超声电气有限公司 | Ultrasonic cleaning apparatus |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106862178A (en) * | 2017-03-13 | 2017-06-20 | 赵子宁 | A kind of solar pipe cleaning device |
| CN109413857A (en) * | 2018-11-09 | 2019-03-01 | 博罗康佳精密科技有限公司 | A kind of manufacture craft of high-frequency high-speed plate |
| CN110694354A (en) * | 2019-10-15 | 2020-01-17 | 蒋立宪 | Filter cloth belt cleaning device |
| CN111229047A (en) * | 2020-03-13 | 2020-06-05 | 广东威特宝土壤修复科研中心有限公司 | Submicron bubble oscillation cleaning system and cleaning method |
| WO2024098493A1 (en) * | 2022-11-09 | 2024-05-16 | 深圳先进技术研究院 | Ultrasonic cleaning device and ultrasonic cleaning method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN204817320U (en) | Ultrasonic cleaning apparatus | |
| CN105983553A (en) | Ultrasonic cleaning device and cleaning method | |
| CN110026908B (en) | Ultrasonic cavitation auxiliary jet polishing system and polishing method | |
| CN103878143A (en) | Ultrasonic cleaner | |
| CN104148360B (en) | A kind of rare precious metal turning material cleaning | |
| CN201711310U (en) | Multi-functional silicon-wafer bubbling cleaning water tank | |
| CN203711404U (en) | Ultrasonic cleaning machine | |
| CN103934235A (en) | Vertical type ultrasonic cleaner | |
| US10711222B2 (en) | Cleaning liquid | |
| CN205236517U (en) | Ultrasonic cleaning system | |
| CN107262452B (en) | A kind of chemical experiment test tube cleaning device | |
| CN203899845U (en) | Improved engagement sleeve oil immersion device | |
| CN102496590A (en) | Isopropyl alcohol dryer with ultrasonic or megasonic vibrators | |
| CN210704236U (en) | Novel wafer grinding and polishing equipment | |
| CN103681239A (en) | Method for cleaning surface of monocrystalline silicon wafer | |
| CN207250463U (en) | Wafer fast draining wash tank | |
| CN107262453B (en) | A kind of chemical test test tube cleaning device | |
| CN106363826A (en) | Device and method for cutting silicon ingot | |
| CN207250469U (en) | A kind of Rapid Cleaning groove for being used for 12 cun of wafers | |
| CN202129240U (en) | Immersion structure for ultrasonic vibrating plate emission surface | |
| CN201473591U (en) | Etch cleaning tank | |
| CN212349788U (en) | Glass bottle belt cleaning device | |
| CN206415373U (en) | A kind of Split portable supersonic wave cleaning machine | |
| CN211638224U (en) | Lost foam processing is with piece processing apparatus | |
| CN207250464U (en) | A kind of wafer fast draining wash tank |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20161005 |