CN201711310U - Multi-functional silicon-wafer bubbling cleaning water tank - Google Patents
Multi-functional silicon-wafer bubbling cleaning water tank Download PDFInfo
- Publication number
- CN201711310U CN201711310U CN 201020261778 CN201020261778U CN201711310U CN 201711310 U CN201711310 U CN 201711310U CN 201020261778 CN201020261778 CN 201020261778 CN 201020261778 U CN201020261778 U CN 201020261778U CN 201711310 U CN201711310 U CN 201711310U
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- water tank
- tank
- water
- plastic plate
- wafer
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Abstract
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Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201020261778 CN201711310U (en) | 2010-07-12 | 2010-07-12 | Multi-functional silicon-wafer bubbling cleaning water tank |
Applications Claiming Priority (1)
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CN 201020261778 CN201711310U (en) | 2010-07-12 | 2010-07-12 | Multi-functional silicon-wafer bubbling cleaning water tank |
Publications (1)
Publication Number | Publication Date |
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CN201711310U true CN201711310U (en) | 2011-01-19 |
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Family Applications (1)
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CN 201020261778 Expired - Lifetime CN201711310U (en) | 2010-07-12 | 2010-07-12 | Multi-functional silicon-wafer bubbling cleaning water tank |
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CN (1) | CN201711310U (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102430542A (en) * | 2011-12-29 | 2012-05-02 | 北京泰拓精密清洗设备有限公司 | Multi-station bubbling cleaning machine |
CN103008281A (en) * | 2011-09-20 | 2013-04-03 | 宜兴市环洲微电子有限公司 | Cleaning tank used for cleaning semiconductor wafers |
CN104979235A (en) * | 2014-04-10 | 2015-10-14 | 沈阳芯源微电子设备有限公司 | Wafer soaking device |
CN105127139A (en) * | 2015-07-27 | 2015-12-09 | 句容骏成电子有限公司 | Device for cleaning surfaces of LCD products |
CN106269690A (en) * | 2016-08-31 | 2017-01-04 | 湘潭大众整流器制造有限公司 | A kind of positive plate cleaning case |
CN106334688A (en) * | 2016-08-29 | 2017-01-18 | 桂林福达全州高强度螺栓有限公司 | Air bubble cleaning device for product surface treatment |
CN106583053A (en) * | 2016-12-21 | 2017-04-26 | 晶科能源有限公司 | Silicon material floatation and cleaning method |
WO2024051135A1 (en) * | 2022-09-05 | 2024-03-14 | 上海中欣晶圆半导体科技有限公司 | Method for improving silicon-wafer cleaning effect |
-
2010
- 2010-07-12 CN CN 201020261778 patent/CN201711310U/en not_active Expired - Lifetime
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103008281A (en) * | 2011-09-20 | 2013-04-03 | 宜兴市环洲微电子有限公司 | Cleaning tank used for cleaning semiconductor wafers |
CN102430542A (en) * | 2011-12-29 | 2012-05-02 | 北京泰拓精密清洗设备有限公司 | Multi-station bubbling cleaning machine |
CN102430542B (en) * | 2011-12-29 | 2013-09-11 | 北京泰拓精密清洗设备有限公司 | Multi-station bubbling cleaning machine |
CN104979235A (en) * | 2014-04-10 | 2015-10-14 | 沈阳芯源微电子设备有限公司 | Wafer soaking device |
CN104979235B (en) * | 2014-04-10 | 2017-07-07 | 沈阳芯源微电子设备有限公司 | Wafer infuser device |
CN105127139A (en) * | 2015-07-27 | 2015-12-09 | 句容骏成电子有限公司 | Device for cleaning surfaces of LCD products |
CN106334688A (en) * | 2016-08-29 | 2017-01-18 | 桂林福达全州高强度螺栓有限公司 | Air bubble cleaning device for product surface treatment |
CN106269690A (en) * | 2016-08-31 | 2017-01-04 | 湘潭大众整流器制造有限公司 | A kind of positive plate cleaning case |
CN106269690B (en) * | 2016-08-31 | 2019-07-26 | 湘潭大众整流器制造有限公司 | A kind of anode plate cleaning case |
CN106583053A (en) * | 2016-12-21 | 2017-04-26 | 晶科能源有限公司 | Silicon material floatation and cleaning method |
WO2024051135A1 (en) * | 2022-09-05 | 2024-03-14 | 上海中欣晶圆半导体科技有限公司 | Method for improving silicon-wafer cleaning effect |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Free format text: FORMER OWNER: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Effective date: 20120210 Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: BEIJING GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS Effective date: 20120210 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120210 Address after: 100088, 2, Xinjie street, Beijing Patentee after: GRINM Semiconductor Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Co-patentee before: GRINM Semiconductor Materials Co., Ltd. Patentee before: General Research Institute for Nonferrous Metals |
|
C56 | Change in the name or address of the patentee |
Owner name: GRINM ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: GRINM SEMICONDUCTOR MATERIALS CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: 100088, 2, Xinjie street, Beijing Patentee after: YOUYAN NEW MATERIAL CO., LTD. Address before: 100088, 2, Xinjie street, Beijing Patentee before: GRINM Semiconductor Materials Co., Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GRINM ADVANCED MATERIALS CO., LTD. Effective date: 20150611 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150611 Address after: 101300 Beijing city Shunyi District Shuanghe Linhe Industrial Development Zone on the south side of the road Patentee after: You Yan Semi Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Patentee before: YOUYAN NEW MATERIAL CO., LTD. |
|
CX01 | Expiry of patent term |
Granted publication date: 20110119 |
|
CX01 | Expiry of patent term |