CN202021177U - Multi-stage circulation cleaning equipment for solar silicon wafer - Google Patents
Multi-stage circulation cleaning equipment for solar silicon wafer Download PDFInfo
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- CN202021177U CN202021177U CN2010206888288U CN201020688828U CN202021177U CN 202021177 U CN202021177 U CN 202021177U CN 2010206888288 U CN2010206888288 U CN 2010206888288U CN 201020688828 U CN201020688828 U CN 201020688828U CN 202021177 U CN202021177 U CN 202021177U
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- potcher
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- rinsing
- rinsing tank
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
本实用新型公开了一种太阳能硅片多级循环清洗设备，其包括从前到后排布的底部设置有超声波阵子或者机械振动装置、上设置有补水管的漂洗槽1、碱洗槽2、漂洗槽3、碱洗槽4、漂洗槽5、漂洗槽6和预脱水槽7。在预脱水槽7与漂洗槽6之间、漂洗槽6与漂洗槽5之间、漂洗槽5的前面都固定有溢流挡板，预脱水槽7、漂洗槽6和漂洗槽5与其前面的溢流挡板之间的底面上开有溢流口，漂洗槽6、漂洗槽5和漂洗槽3的底面上开有溢流进水口，溢流口与其相邻的溢流进水口之间由溢流管连接；预脱水槽7上设置有进水管，各槽底部都设置有排污口。本实用新型清洗效果好，可以节省能源50％，同时用水量降低，每天按3小时计算，用水量为3.5-3.6吨，较同种设备省水2吨/天。
The utility model discloses a multi-stage cycle cleaning device for solar silicon wafers, which comprises a rinsing tank 1, an alkali washing tank 2, a rinsing tank 1 provided with an ultrasonic array or a mechanical vibration device arranged at the bottom arranged from front to back, and a water replenishment pipe arranged on the top. Tank 3, alkali washing tank 4, rinsing tank 5, rinsing tank 6 and pre-dehydration tank 7. Between the pre-dehydration tank 7 and the rinsing tank 6, between the rinsing tank 6 and the rinsing tank 5, and in front of the rinsing tank 5, overflow baffles are fixed, and the pre-dehydration tank 7, the rinsing tank 6 and the rinsing tank 5 and their fronts An overflow port is provided on the bottom surface between the overflow baffles, and an overflow water inlet is provided on the bottom surfaces of the rinse tank 6, the rinse tank 5 and the rinse tank 3, and the overflow port and its adjacent overflow water inlet are formed by The overflow pipe is connected; the pre-dehydration tank 7 is provided with a water inlet pipe, and each tank bottom is provided with a sewage outlet. The utility model has a good cleaning effect, can save energy by 50%, and at the same time reduce the water consumption. Calculated as 3 hours per day, the water consumption is 3.5-3.6 tons, which is 2 tons/day less than the same equipment.
Description
Technical field
The utility model relates to a kind of silicon chip of solar cell cleaning equipment.
Background technology
Silicon chip of solar cell must be through multistage cleaning, to remove the mortar attached to silicon chip surface after cutting.Present used cleaning equipment is multistage groove-type cleaning machine, usually contain rinse bath more than three grades, silicon chip to be cleaned shifts out after first order rinse bath begins to clean step by step, the impurity that silicon chip surface adheres in first rinse bath is maximum, to reduce step by step later on, in existing multistage rinse bath structure, each grade rinse bath has independently water inlet and outlet system, every grade all has waste water to discharge, the sewage of being discharged in the rinse baths at different levels directly discharges, the water yield of the required consumption of cleaning silicon chip is very big, and so not only water consumption is big, but also pollutes the environment.The patent No. is that 201020022309 utility model patent discloses a kind of multilevel circulating cleaning equipment for solar cell silicon wafers, it comprises first rinse bath, transition rinse bath and last rinse bath, also be provided with filtration processing tank, first rinse bath, the water of transition rinse bath and last rinse bath also is extracted in the rinse bath of its front recycling by water circulating pump, water after the filtration in the filtration processing tank also is recycled water pump and is extracted into the use of first rinse bath, it has avoided the water resource waste that causes because of rinse bath independence water, water-saving result is apparent in view, but all recirculated water all uses the water pump suction, but its energy-saving effect extreme difference has been wasted the energy.
Summary of the invention
The utility model solves the above-mentioned problems in the prior art exactly, and a kind of water source of both having saved is provided, and saves the energy again, the solar silicon wafers multilevel circulating cleaning equipment that cleaning performance is good.
For addressing the above problem, technical solution of the present utility model is: a kind of solar silicon wafers multilevel circulating cleaning equipment, and it comprises that the bottom of arranging from front to back is provided with the potcher 1 of ultrasonic wave a period of time or mechanical vibrator, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5, potcher 6 and pre-drench pit 7; Between pre-drench pit 7 and potcher 6, between potcher 6 and the potcher 5, the front of potcher 5 all is fixed with the overflow baffle of the wall of the front bulkhead, potcher 6 and the potcher 5 that are higher than pre-drench pit 7, the bottom surface of pre-drench pit 7 is higher than potcher 6, have overfall on the bottom surface between the overflow baffle of pre-drench pit 7, potcher 6 and potcher 5 and its front, have the overflow water inlet on the bottom surface of potcher 6, potcher 5 and potcher 3, connect by overflow pipe between the overflow water inlet that overfall is adjacent; Pre-drench pit 7 is provided with water inlet pipe, and potcher 1, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5 and potcher 6 are provided with filling pipe, and each trench bottom all is provided with sewage draining exit.
Because the utility model is by the cleaning of potcher 1, alkaline bath 2, potcher 3 and alkaline bath 4, top mortar has been removed totally, again through repeatedly rinsing, can reduce metal ion in the silicon chip surface residual liquor and reach pollution to alkaline bath 4 soups.The silicon chip surface residual impurity can further reduce, and the no watermark in surface.The water of pre-drench pit 7 overflows to potcher 6, and the water of potcher 6 overflows to potcher 5, and the water of potcher 5 overflows to potcher 3 and carries out water reuse, has both saved the water source, has saved the energy again.Repeatedly test through the applicant, the utility model can be saved the energy 50%, reduces with hourly water consumption, and calculated by 3 hours every day, and water consumption is the 3.5-3.6 ton, 2 tons/day of equipment water-savings more of the same race.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
The specific embodiment
Below in conjunction with the drawings and specific embodiments the utility model is further described.
As shown in Figure 1, present embodiment comprises that the bottom of arranging from front to back is provided with the potcher 1 of ultrasonic wave a period of time or mechanical vibrator 12, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5, potcher 6 and pre-drench pit 7.Between pre-drench pit 7 and potcher 6, between potcher 6 and the potcher 5, the front of potcher 5 all is fixed with the overflow baffle 10 of the wall of the front bulkhead, potcher 6 and the potcher 5 that are higher than pre-drench pit 7.The bottom surface of pre-drench pit 7 is higher than potcher 6.Have overfall on the bottom surface between the overflow baffle 10 of pre-drench pit 7, potcher 6 and potcher 5 and its front; Have the overflow water inlet on the bottom surface of potcher 6, potcher 5 and potcher 3; Connect by overflow pipe 11 between the overflow water inlet that overfall is adjacent.Pre-drench pit 7 is provided with water inlet pipe 8, and potcher 1, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5 and potcher 6 are provided with filling pipe 13, and each trench bottom all is provided with sewage draining exit 9.Sewage draining exit 9 connects drainpipe 14 by valve.
Claims (1)
1. solar silicon wafers multilevel circulating cleaning equipment is characterized in that: it comprises that the bottom of arranging from front to back is provided with the potcher of ultrasonic wave a period of time or mechanical vibrator (1), alkaline bath (2), potcher (3), alkaline bath (4), potcher (5), potcher (6) and pre-drench pit (7); Between pre-drench pit (7) and potcher (6), between potcher (6) and the potcher (5), the front of potcher (5) all is fixed with the overflow baffle of the wall of the front bulkhead, potcher (6) and the potcher (5) that are higher than pre-drench pit (7), the bottom surface of pre-drench pit (7) is higher than potcher (6), have overfall on the bottom surface between the overflow baffle of pre-drench pit (7), potcher (6) and potcher (5) and its front, connect by overflow pipe between each adjacent overfall; Pre-drench pit (7) is provided with water inlet pipe, and potcher (1), alkaline bath (2), potcher (3), alkaline bath (4), potcher (5) and potcher (6) are provided with filling pipe, and each trench bottom all is provided with sewage draining exit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206888288U CN202021177U (en) | 2010-12-30 | 2010-12-30 | Multi-stage circulation cleaning equipment for solar silicon wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206888288U CN202021177U (en) | 2010-12-30 | 2010-12-30 | Multi-stage circulation cleaning equipment for solar silicon wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202021177U true CN202021177U (en) | 2011-11-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010206888288U Expired - Fee Related CN202021177U (en) | 2010-12-30 | 2010-12-30 | Multi-stage circulation cleaning equipment for solar silicon wafer |
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| Country | Link |
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| CN (1) | CN202021177U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102836842A (en) * | 2012-08-08 | 2012-12-26 | 晶海洋半导体材料（东海）有限公司 | Multi-groove circulating silicon wafer cleaning machine |
| CN102989717A (en) * | 2012-12-25 | 2013-03-27 | 西安烽火光伏科技股份有限公司 | On-line waste water reusing method in pre-cleaning working procedure |
| TWI571321B (en) * | 2015-07-27 | 2017-02-21 | 盟立自動化股份有限公司 | Automation system for washing a plate member |
| CN107164109A (en) * | 2017-03-31 | 2017-09-15 | 吴江创源新材料科技有限公司 | Cleaning fluid and preparation method thereof and cleaning before a kind of sapphire wafer annealing |
| CN108704894A (en) * | 2018-05-25 | 2018-10-26 | 安徽尚忠活塞环有限公司 | A kind of piston ring cleaning line of high degree of automation |
| CN110605275A (en) * | 2019-10-11 | 2019-12-24 | 张家港市科宇信超声有限公司 | Cleaning liquid circulation system and circulation method for ultrasonic cleaning machine |
-
2010
- 2010-12-30 CN CN2010206888288U patent/CN202021177U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102836842A (en) * | 2012-08-08 | 2012-12-26 | 晶海洋半导体材料（东海）有限公司 | Multi-groove circulating silicon wafer cleaning machine |
| CN102836842B (en) * | 2012-08-08 | 2014-07-16 | 晶海洋半导体材料（东海）有限公司 | Multi-groove circulating silicon wafer cleaning machine |
| CN102989717A (en) * | 2012-12-25 | 2013-03-27 | 西安烽火光伏科技股份有限公司 | On-line waste water reusing method in pre-cleaning working procedure |
| TWI571321B (en) * | 2015-07-27 | 2017-02-21 | 盟立自動化股份有限公司 | Automation system for washing a plate member |
| CN107164109A (en) * | 2017-03-31 | 2017-09-15 | 吴江创源新材料科技有限公司 | Cleaning fluid and preparation method thereof and cleaning before a kind of sapphire wafer annealing |
| CN108704894A (en) * | 2018-05-25 | 2018-10-26 | 安徽尚忠活塞环有限公司 | A kind of piston ring cleaning line of high degree of automation |
| CN110605275A (en) * | 2019-10-11 | 2019-12-24 | 张家港市科宇信超声有限公司 | Cleaning liquid circulation system and circulation method for ultrasonic cleaning machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 074000 new industrial zone of Hebei, Gaobeidian Province, light green new energy Limited by Share Ltd Patentee after: Guangwei Green Energy Technology Co.,Ltd. Address before: 074000 new industrial zone of Hebei, Gaobeidian Province, light green new energy Limited by Share Ltd Patentee before: Lightway Green New Energy Co.,Ltd. |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20160718 Address after: 074000, Baoding City, Hebei province Gaobeidian City Road on the north side of the west side of prosperous street Patentee after: BAODING LIGHTWAY GREEN ENERGY TECHNOLOGY CO.,LTD. Address before: 074000 new industrial zone of Hebei, Gaobeidian Province, light green new energy Limited by Share Ltd Patentee before: Guangwei Green Energy Technology Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20111102 Termination date: 20181230 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |