CN202021177U - Multi-stage circulation cleaning equipment for solar silicon wafer - Google Patents

Multi-stage circulation cleaning equipment for solar silicon wafer Download PDF

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Publication number
CN202021177U
CN202021177U CN2010206888288U CN201020688828U CN202021177U CN 202021177 U CN202021177 U CN 202021177U CN 2010206888288 U CN2010206888288 U CN 2010206888288U CN 201020688828 U CN201020688828 U CN 201020688828U CN 202021177 U CN202021177 U CN 202021177U
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CN
China
Prior art keywords
potcher
tank
rinse tank
overflow
rinse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2010206888288U
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Chinese (zh)
Inventor
于琨
沈谋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Baoding Lightway Green Energy Technology Co ltd
Guangwei Green Energy Technology Co ltd
Original Assignee
LIGHTWAY GREEN NEW ENERGY CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LIGHTWAY GREEN NEW ENERGY CO Ltd filed Critical LIGHTWAY GREEN NEW ENERGY CO Ltd
Priority to CN2010206888288U priority Critical patent/CN202021177U/en
Application granted granted Critical
Publication of CN202021177U publication Critical patent/CN202021177U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model discloses multi-stage circulation cleaning equipment for solar silicon wafers. The multi-stage circulation cleaning equipment comprises a rinse tank (1), an alkali washing tank (2), a rinse tank (3), an alkali washing tank (4), a rinse tank (5), a rinse tank (6) and a pre-dewatering tank (7) which are distributed from front to back, wherein an ultrasonic vibrator or a mechanical vibrator is arranged at the bottom of the rinse tank (1), and a water supplement pipe is arranged at the upper part of rinse tank (1); overflow baffle plates are arranged between the pre-dewatering tank (7) and the rinse tank (6), between the rinse tank (6) and the rinse tank (5), and in front of the rinse tank (5); overflow ports are formed at the bottom between the pre-dewatering tank (7), the rinse tank (6) and the rinse tank (5), and the overflow baffle plates which are arranged in front of the tanks (7, 6 and 5); overflow water inlets are formed at the bottoms of the rinse tank (6), the rinse tank (5) and the rinse tank (3); the overflow ports are connected with adjacent overflow water inlets through overflow pipes; a water inlet pipe is arranged on the pre-dewatering tank (7); and a drain port is formed at the bottom of each tank. The multi-stage circulation cleaning equipment has good cleaning effects, saves energy by 50%, and reduces water consumption. Calculated on the basis of three working hours every day, the water consumption is 3.5 to 3.6 tons and reduced by 2 tons/day as compared with the similar equipment.

Description

The solar silicon wafers multilevel circulating cleaning equipment
Technical field
The utility model relates to a kind of silicon chip of solar cell cleaning equipment.
Background technology
Silicon chip of solar cell must be through multistage cleaning, to remove the mortar attached to silicon chip surface after cutting.Present used cleaning equipment is multistage groove-type cleaning machine, usually contain rinse bath more than three grades, silicon chip to be cleaned shifts out after first order rinse bath begins to clean step by step, the impurity that silicon chip surface adheres in first rinse bath is maximum, to reduce step by step later on, in existing multistage rinse bath structure, each grade rinse bath has independently water inlet and outlet system, every grade all has waste water to discharge, the sewage of being discharged in the rinse baths at different levels directly discharges, the water yield of the required consumption of cleaning silicon chip is very big, and so not only water consumption is big, but also pollutes the environment.The patent No. is that 201020022309 utility model patent discloses a kind of multilevel circulating cleaning equipment for solar cell silicon wafers, it comprises first rinse bath, transition rinse bath and last rinse bath, also be provided with filtration processing tank, first rinse bath, the water of transition rinse bath and last rinse bath also is extracted in the rinse bath of its front recycling by water circulating pump, water after the filtration in the filtration processing tank also is recycled water pump and is extracted into the use of first rinse bath, it has avoided the water resource waste that causes because of rinse bath independence water, water-saving result is apparent in view, but all recirculated water all uses the water pump suction, but its energy-saving effect extreme difference has been wasted the energy.
Summary of the invention
The utility model solves the above-mentioned problems in the prior art exactly, and a kind of water source of both having saved is provided, and saves the energy again, the solar silicon wafers multilevel circulating cleaning equipment that cleaning performance is good.
For addressing the above problem, technical solution of the present utility model is: a kind of solar silicon wafers multilevel circulating cleaning equipment, and it comprises that the bottom of arranging from front to back is provided with the potcher 1 of ultrasonic wave a period of time or mechanical vibrator, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5, potcher 6 and pre-drench pit 7; Between pre-drench pit 7 and potcher 6, between potcher 6 and the potcher 5, the front of potcher 5 all is fixed with the overflow baffle of the wall of the front bulkhead, potcher 6 and the potcher 5 that are higher than pre-drench pit 7, the bottom surface of pre-drench pit 7 is higher than potcher 6, have overfall on the bottom surface between the overflow baffle of pre-drench pit 7, potcher 6 and potcher 5 and its front, have the overflow water inlet on the bottom surface of potcher 6, potcher 5 and potcher 3, connect by overflow pipe between the overflow water inlet that overfall is adjacent; Pre-drench pit 7 is provided with water inlet pipe, and potcher 1, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5 and potcher 6 are provided with filling pipe, and each trench bottom all is provided with sewage draining exit.
Because the utility model is by the cleaning of potcher 1, alkaline bath 2, potcher 3 and alkaline bath 4, top mortar has been removed totally, again through repeatedly rinsing, can reduce metal ion in the silicon chip surface residual liquor and reach pollution to alkaline bath 4 soups.The silicon chip surface residual impurity can further reduce, and the no watermark in surface.The water of pre-drench pit 7 overflows to potcher 6, and the water of potcher 6 overflows to potcher 5, and the water of potcher 5 overflows to potcher 3 and carries out water reuse, has both saved the water source, has saved the energy again.Repeatedly test through the applicant, the utility model can be saved the energy 50%, reduces with hourly water consumption, and calculated by 3 hours every day, and water consumption is the 3.5-3.6 ton, 2 tons/day of equipment water-savings more of the same race.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
The specific embodiment
Below in conjunction with the drawings and specific embodiments the utility model is further described.
As shown in Figure 1, present embodiment comprises that the bottom of arranging from front to back is provided with the potcher 1 of ultrasonic wave a period of time or mechanical vibrator 12, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5, potcher 6 and pre-drench pit 7.Between pre-drench pit 7 and potcher 6, between potcher 6 and the potcher 5, the front of potcher 5 all is fixed with the overflow baffle 10 of the wall of the front bulkhead, potcher 6 and the potcher 5 that are higher than pre-drench pit 7.The bottom surface of pre-drench pit 7 is higher than potcher 6.Have overfall on the bottom surface between the overflow baffle 10 of pre-drench pit 7, potcher 6 and potcher 5 and its front; Have the overflow water inlet on the bottom surface of potcher 6, potcher 5 and potcher 3; Connect by overflow pipe 11 between the overflow water inlet that overfall is adjacent.Pre-drench pit 7 is provided with water inlet pipe 8, and potcher 1, alkaline bath 2, potcher 3, alkaline bath 4, potcher 5 and potcher 6 are provided with filling pipe 13, and each trench bottom all is provided with sewage draining exit 9.Sewage draining exit 9 connects drainpipe 14 by valve.

Claims (1)

1. solar silicon wafers multilevel circulating cleaning equipment is characterized in that: it comprises that the bottom of arranging from front to back is provided with the potcher of ultrasonic wave a period of time or mechanical vibrator (1), alkaline bath (2), potcher (3), alkaline bath (4), potcher (5), potcher (6) and pre-drench pit (7); Between pre-drench pit (7) and potcher (6), between potcher (6) and the potcher (5), the front of potcher (5) all is fixed with the overflow baffle of the wall of the front bulkhead, potcher (6) and the potcher (5) that are higher than pre-drench pit (7), the bottom surface of pre-drench pit (7) is higher than potcher (6), have overfall on the bottom surface between the overflow baffle of pre-drench pit (7), potcher (6) and potcher (5) and its front, connect by overflow pipe between each adjacent overfall; Pre-drench pit (7) is provided with water inlet pipe, and potcher (1), alkaline bath (2), potcher (3), alkaline bath (4), potcher (5) and potcher (6) are provided with filling pipe, and each trench bottom all is provided with sewage draining exit.
CN2010206888288U 2010-12-30 2010-12-30 Multi-stage circulation cleaning equipment for solar silicon wafer Expired - Fee Related CN202021177U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010206888288U CN202021177U (en) 2010-12-30 2010-12-30 Multi-stage circulation cleaning equipment for solar silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010206888288U CN202021177U (en) 2010-12-30 2010-12-30 Multi-stage circulation cleaning equipment for solar silicon wafer

Publications (1)

Publication Number Publication Date
CN202021177U true CN202021177U (en) 2011-11-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010206888288U Expired - Fee Related CN202021177U (en) 2010-12-30 2010-12-30 Multi-stage circulation cleaning equipment for solar silicon wafer

Country Status (1)

Country Link
CN (1) CN202021177U (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102836842A (en) * 2012-08-08 2012-12-26 晶海洋半导体材料(东海)有限公司 Multi-groove circulating silicon wafer cleaning machine
CN102989717A (en) * 2012-12-25 2013-03-27 西安烽火光伏科技股份有限公司 On-line waste water reusing method in pre-cleaning working procedure
TWI571321B (en) * 2015-07-27 2017-02-21 盟立自動化股份有限公司 Automation system for washing a plate member
CN107164109A (en) * 2017-03-31 2017-09-15 吴江创源新材料科技有限公司 Cleaning fluid and preparation method thereof and cleaning before a kind of sapphire wafer annealing
CN108704894A (en) * 2018-05-25 2018-10-26 安徽尚忠活塞环有限公司 A kind of piston ring cleaning line of high degree of automation
CN110605275A (en) * 2019-10-11 2019-12-24 张家港市科宇信超声有限公司 Cleaning liquid circulating system and circulating method for ultrasonic cleaning machine

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102836842A (en) * 2012-08-08 2012-12-26 晶海洋半导体材料(东海)有限公司 Multi-groove circulating silicon wafer cleaning machine
CN102836842B (en) * 2012-08-08 2014-07-16 晶海洋半导体材料(东海)有限公司 Multi-groove circulating silicon wafer cleaning machine
CN102989717A (en) * 2012-12-25 2013-03-27 西安烽火光伏科技股份有限公司 On-line waste water reusing method in pre-cleaning working procedure
TWI571321B (en) * 2015-07-27 2017-02-21 盟立自動化股份有限公司 Automation system for washing a plate member
CN107164109A (en) * 2017-03-31 2017-09-15 吴江创源新材料科技有限公司 Cleaning fluid and preparation method thereof and cleaning before a kind of sapphire wafer annealing
CN108704894A (en) * 2018-05-25 2018-10-26 安徽尚忠活塞环有限公司 A kind of piston ring cleaning line of high degree of automation
CN110605275A (en) * 2019-10-11 2019-12-24 张家港市科宇信超声有限公司 Cleaning liquid circulating system and circulating method for ultrasonic cleaning machine

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
C56 Change in the name or address of the patentee
CP01 Change in the name or title of a patent holder

Address after: 074000 new industrial zone of Hebei, Gaobeidian Province, light green new energy Limited by Share Ltd

Patentee after: Guangwei Green Energy Technology Co.,Ltd.

Address before: 074000 new industrial zone of Hebei, Gaobeidian Province, light green new energy Limited by Share Ltd

Patentee before: Lightway Green New Energy Co.,Ltd.

TR01 Transfer of patent right

Effective date of registration: 20160718

Address after: 074000, Baoding City, Hebei province Gaobeidian City Road on the north side of the west side of prosperous street

Patentee after: BAODING LIGHTWAY GREEN ENERGY TECHNOLOGY CO.,LTD.

Address before: 074000 new industrial zone of Hebei, Gaobeidian Province, light green new energy Limited by Share Ltd

Patentee before: Guangwei Green Energy Technology Co.,Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20111102

Termination date: 20181230

CF01 Termination of patent right due to non-payment of annual fee