CN102836842B - Multi-groove circulating silicon wafer cleaning machine - Google Patents
Multi-groove circulating silicon wafer cleaning machine Download PDFInfo
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- CN102836842B CN102836842B CN201210279853.4A CN201210279853A CN102836842B CN 102836842 B CN102836842 B CN 102836842B CN 201210279853 A CN201210279853 A CN 201210279853A CN 102836842 B CN102836842 B CN 102836842B
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Abstract
The invention discloses a multi-groove circulating silicon wafer cleaning machine which comprises a machine shell, cleaning grooves, a water-supplying pipeline, and water-exhausting pipelines, wherein the cleaning grooves are at least groove bodies which are sequentially arranged. The groove bodies are sequentially composed of at least two difunctional cleaning grooves, at least two medicine-washing cleaning grooves, and at least two water-washing cleaning grooves which are of slow-lifting prewashing dewatering grooves. The difunctional cleaning grooves are used for pure water cleaning or medical liquid alkali cleaning, the medicine-washing cleaning grooves are used for medical liquid alkali cleaning, and the water-washing cleaning grooves are used for pure water cleaning. Overflowing pipes which are arranged between two adjacent groove bodies of the difunctional cleaning grooves are communicated with the groove bodies, and reverse sequence overflowing of the difunctional cleaning grooves is formed by the overflowing pipes. The water-exhausting pipes are connected with the overflowing pipes through tee joint valves, so that overflowing liquid can flow into a lower-level groove body or exhaust through the water-exhausting pipes, and thereby the difunctional cleaning grooves achieve dual functions of pure water cleaning and medical liquid alkali cleaning. The difunctional cleaning grooves of the multi-groove circulating silicon wafer cleaning machine can not only be used as alkali-cleaning grooves, but only can be used as water-washing grooves, facilitate adjusting and arranging of a silicon wafer cleaning working procedure, reduce water consumption through an overflowing manner, and save water resources.
Description
Technical field
The present invention relates to a kind of silicon wafer cleaner, particularly a kind of multiple-grooved circulation wafer washer.
Background technology
In the production technology of silicon chip, in order to obtain the silicon chip of better quality, require to be attached to the impurity level of silicon chip surface few, therefore, the silicon chip after cutting need to clean.
At present, the cleaning equipment of employing is 7 groove cleaning machines, and 7 groove cleaning machines comprise casing, be arranged on rinse bath, Vltrasonic device in casing, the supply line of pure water is provided and discharge the discharge pipe line of cleaning fluid, and rinse bath is generally 7 and its function and all immobilizes.7 groove cleaning machines are in when running, and shifting mechanical arm can be put into successively 7 rinse baths the cleaning basket that silicon chip is housed and process, and silicon chip cleans complete by rinsing, alkali cleaning (cleaning with liquid medicine), rinsing, baking operation in turn.
There is following defect in existing 7 groove cleaning machines: cleaning way is very limited, 7 rinse baths are arranged in turn, wherein, 3,4 grooves are generally changeless medicine groove (adopting liquid medicine to carry out alkali cleaning to silicon chip), the water of arranging in 7 rinse baths arranging in turn in the cell body at rear can be more cleaner than the water in the cell body of front, but, because the cause that 3-4 groove configuration liquid medicine intercepts, cause the pollution rate of liquid greatly to improve, thereby the frequency that makes to change dressings also improves thereupon, and therefore existing 7 groove cleaning machines have very large restriction to the Process configuration of cleaning liquid medicine; In addition, if rinse bath water spill-over stream can only be discharged outside body by the overflow mechanism of opening 7 groove cleaning machines, so, overflowing liquid cannot recycle, and has caused rinse bath need to frequently change water, water resource is caused to greatly waste, in a disguised form increased the production cost of silicon chip.
Summary of the invention
The object of the present invention is to provide a kind of multiple-grooved circulation wafer washer that facilitates the adjustment of Wafer Cleaning operation and configuration, flexibly changing medicine groove, saving water resource, can ensure product cleaning quality and environmental protection.
Object of the present invention realizes by following technical measures: a kind of multiple-grooved circulation wafer washer, comprise casing, be arranged on the rinse bath in casing, be used to rinse bath that the supply line of pure water and the discharge pipe line for rinse bath cleaning liquid inside is discharged are provided, it is characterized in that described rinse bath is at least 6 cell bodies of arranging in turn, successively mainly by least two difunctional rinse baths for pure water cleaning or liquid medicine alkali cleaning, at least two medicines for liquid medicine alkali cleaning wash down washing trough and at least two washing rinse bath compositions that clean for pure water, wherein, the washing rinse bath of position, sequence end is for carrying slowly prewashing drench pit, in described difunctional rinse bath, between adjacent two cell bodies, be provided with the overflow pipe that is communicated with this cell body and form the reverse overflow in turn of difunctional rinse bath, described discharge pipe line is connected with overflow pipe by three-way valve so that overflowing liquid flows into subordinate's cell body or discharges by discharge pipe line that to realize pure water cleaning or the liquid medicine alkali cleaning of difunctional rinse bath difunctional.
Difunctional rinse bath of the present invention adopts to be taken over the mode of overflow and connects discharge pipe line by triple valve, can realize the overflow between each cell body or overflowing liquid is discharged by discharge pipe line, make difunctional rinse bath both can be used as alkaline bath (liquid medicine alkali cleaning), also can be used as rinsing bowl (pure water cleaning), facilitate Wafer Cleaning operation to adjust and configuration, and flexibly changing medicine groove (liquid medicine alkali cleaning) thus realize the flexible configuration of cleaning, and, can greatly reduce water consumption by overflow mode, saving water resource, reduces costs; The present invention, by the adjustment to cleaning, can reduce liquid medicine contamination, ensures the cleaning quality of product.
As a kind of preferred embodiment of the present invention, described rinse bath is 9, wherein, described difunctional rinse bath is 4, is 1-4 rinse bath, and it is 2 that described medicine washes down washing trough, be the 5th, 6 rinse baths, described washing rinse bath is 3, is 7-9 rinse bath, and the described prewashing drench pit of carrying is slowly the 9th rinse bath.
The present invention is positioned at the described the 1st, overflow pipe between 2 rinse baths is the first overflow pipe, be positioned at the described the 2nd, overflow pipe between 3 rinse baths is the second overflow pipe, be positioned at the described the 3rd, overflow pipe between 4 rinse baths is the 3rd overflow pipe, described first, two, three overflow pipes have respectively water inlet end for receiving overflowing liquid with for overflowing liquid being delivered to the water side of subordinate's cell body, described water inlet end is connected to the notch position of higher level's rinse bath, described water side is connected to the cell wall bottom of subordinate's rinse bath, the notch of described 1-4 rinse bath increases to realize the reverse overflow in turn of 1-4 rinse bath in turn.Adopt reverse overflow mode, according to the overflow in turn of the Sort Direction of 4-1 rinse bath (according to the reverse overflow in turn of the Sort Direction of 1-4 rinse bath).Because it is cleaner to be arranged in water in the rinse bath at rear, so the direction of overflow is reverse overflow in turn, relatively clean water overflow is to the rinse bath in front.
As a modification of the present invention, the reverse overflow in turn of described 7-9 rinse bath, described multiple-grooved circulation wafer washer also comprises the secondary groove overflow system for the overflowing liquid in 7-9 rinse bath being delivered to 1-4 rinse bath, described secondary groove overflow system is mainly by connecting line, secondary groove, inlet valve and pump composition, wherein, described connecting line comprises the overflow water inlet pipe for introducing overflowing liquid, for overflowing liquid being expelled to the drainpipe of discharge pipe line and for overflowing liquid being supplied with to the outlet pipe of described 1-4 rinse bath, described overflow water inlet pipe is connected between described the 7th rinse bath and described secondary groove, the water inlet end of described outlet pipe is connected to the bottom of secondary groove cell wall, the water side of described outlet pipe is provided with flowing water Valve and lays respectively at the notch top of described 1-4 rinse bath, described inlet valve is arranged on described outlet pipe and the water inlet end of close outlet pipe, described pump is positioned on the outlet pipe pipeline at described inlet valve rear.
As a further improvement on the present invention, the connecting line of described secondary groove overflow system also comprises pure water water inlet pipe, described secondary groove has closure casing, one end of described pure water water inlet pipe is connected on described supply line, the other end is connected on described secondary groove, if pure water supply line pressure is inadequate, pure water can pass through secondary groove, by tubing pump pressurization, 1-4 rinse bath is supplied water.
The embodiment of recommending as the present invention, described supply line is positioned at the top of described 1-9 rinse bath, described discharge pipe line is positioned at the below of described 1-9 rinse bath, described discharge pipe line is mainly by the draining fairlead of drawing from each rinse bath, horizontal branch drain, spill pipe, vertical drain and horizontal main sewer composition, described draining fairlead is stretched out by the bottom of described 1-9 rinse bath respectively and water discharging valve is installed, described 1-4 rinse bath, the 5th, 6 rinse baths and 7-9 rinse bath are as three groups of rinse baths, the draining fairlead of each rinse bath below is connected on main sewer via vertical drain by the branch drain of each group respectively, described spill pipe is arranged on described first, two, between three overflow pipes and corresponding branch drain.
The present invention can also have following improvement, and the notch of described 7-9 rinse bath increases in turn, between the notch of adjacent two cell bodies, is provided with overflow launder, and the overflowing liquid in described 7-9 rinse bath is realized reverse overflow in turn by the described overflow launder of flowing through of overflow mode in groove.
As a further improvement on the present invention, described multiple-grooved circulation wafer washer also comprises the feeding platform for sending into silicon chip, for sending the blanking bench of silicon chip and for drying the tunnel drying system of silicon chip, described casing is cuboid, described 1-9 rinse bath is according to the longitudinal arrangement of casing, the two ends of described casing have respectively charging aperture and discharging opening, described feeding platform and blanking bench are corresponding respectively to be extended in described casing by described charging aperture and discharging opening, wherein, described feeding platform is positioned at the front of described the 1st rinse bath, described tunnel drying system is positioned at rear the follow-up described blanking bench of plugging into of described the 9th rinse bath.
Multiple-grooved circulation wafer washer of the present invention also comprises Vltrasonic device and the transplanting machine hand for mobile silicon wafer basket, described Vltrasonic device is located on the outer surface of described 1-8 rinse bath bottom surface in casing, and described transplanting machine hand is positioned at the top of described 1-9 rinse bath notch and can moves along the orientation of rinse bath.Vltrasonic device is positioned at casing, can reduce the injury of environmental noise to human body.
As a further improvement on the present invention, the connecting line of described secondary groove overflow system also comprises after full for secondary trough inner water overflowing liquid is drained into the secondary groove overflow pipe of drainpipe, water storage valve is installed on described drainpipe, one end of described secondary groove overflow pipe is connected to the cell wall top of described secondary groove, the other end is connected on described drainpipe, and the connecting portion of described secondary groove overflow pipe and drainpipe is positioned on the rear pipeline of described water storage valve realizes respectively current dredging or secondary groove water storage function to open water storage valve.Water storage valve is under normal conditions in closed condition, and for secondary groove water storage, and the completely rear unnecessary water of secondary groove water can slowly flow into secondary groove overflow pipe discharge; In the time that needs carry out current dredging, open water storage valve.
As one embodiment of the present invention, described each valve adopts Ball valve of pipeline; Described pump adopts tubing pump.
Compared with prior art, the present invention has following significant effect:
(1) the difunctional rinse bath of the present invention adopts and takes over the mode of overflow and connect discharge pipe line by triple valve, can realize the overflow between each cell body or overflowing liquid is discharged by discharge pipe line, make difunctional rinse bath both can be used as alkaline bath, also can be used as rinsing bowl, facilitate Wafer Cleaning operation to adjust and configuration, and flexibly changing medicine groove (alkaline bath) thus realize the flexible configuration of cleaning.
(2) the present invention can greatly reduce water consumption by overflow mode, and saving water resource, reduces production costs.
(3) the present invention, by the adjustment to cleaning, can reduce liquid medicine contamination, ensures the cleaning quality of product.
(4) Vltrasonic device is arranged in casing, can reduce the injury of environmental noise to human body, ensures staff's health.
(5) in the time that needs use secondary groove water storage, close water storage valve, secondary groove is after storage full water, and unnecessary water can flow into the water storage function of realizing secondary groove in main sewer by secondary groove overflow pipe.
(6) can be according to Wafer Cleaning quality and using water wisely be considered, selecting the water in difunctional rinse bath is overflow water or the pure water that adopts secondary groove to provide, therefore the present invention has multiple flexible occupation mode.
(7) in the time that rinse bath in difunctional rinse bath need to be served as the use of medicine groove, flow into this groove as long as intercept overflowing liquid, discharge by the overflowing liquid of this groove upper level rinse bath; Or in the time that needs use as rinsing bowl, as long as the overflowing liquid of upper level rinse bath is entered to this groove, therefore, the present invention is easy to realize, and is suitable for extensive popularization.
Brief description of the drawings
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Fig. 1 is the schematic diagram (only showing the interior rinse bath of casing and the pipe-line system of cleaning machine) of the embodiment of the present invention 1.
Detailed description of the invention
Embodiment 1
As shown in Figure 1, it is a kind of multiple-grooved ultrasonic wave of the present invention circulation wafer washer, comprise the casing of cuboid, be arranged on the rinse bath in casing, be used to rinse bath that the supply line 1 of pure water and the discharge pipe line for rinse bath cleaning liquid inside is discharged are provided, in the present embodiment, rinse bath is 9 cell bodies of arranging in turn, mainly by cleaning for pure water or the difunctional rinse bath (1-4 rinse bath 1#-4#) of liquid medicine alkali cleaning, medicine for liquid medicine alkali cleaning washes down washing trough (the 5th rinse bath 5#, the 6th rinse bath 6#), washing rinse bath (the 7th rinse bath 7# cleaning for pure water, the 8th rinse bath 8# and the 9th rinse bath 9#) composition, wherein, the washing rinse bath (the 9th rinse bath 9#) of position, sequence end is to carry slowly prewashing drench pit, in 1-4 rinse bath, between adjacent two cell bodies, be provided with the overflow pipe that is communicated with this cell body and form four reverse overflows in turn of rinse bath, supply line 1 is positioned at the top of 1-9 rinse bath, discharge pipe line is positioned at the below of 1-9 rinse bath, discharge pipe line is connected with overflow pipe by three-way valve 20 so that overflowing liquid flows into subordinate's cell body or discharges by discharge pipe line that to realize pure water cleaning or the liquid medicine alkali cleaning of 1-4 rinse bath difunctional.1-4 rinse bath is according to the reverse overflow in turn of sequence, according to the order overflow in turn of the 4th rinse bath to the 1 rinse bath.
Overflow pipe between the 1st, 2 rinse baths is the first overflow pipe 2, overflow pipe between the 2nd, 3 rinse baths is the second overflow pipe 3, overflow pipe between the 3rd, 4 rinse baths is the 3rd overflow pipe 4, first, second and third overflow pipe have respectively water inlet end for receiving overflowing liquid with for overflowing liquid being delivered to the water side of subordinate's cell body, water inlet end is connected to the notch position of higher level's rinse bath, water side is connected to the cell wall bottom of subordinate's rinse bath, and the notch of 1-4 rinse bath increases to realize the reverse overflow in turn of 1-4 rinse bath in turn.
In the present embodiment, 7-9 rinse bath is according to the reverse overflow in turn of Sort Direction, according to the order overflow in turn of the 9th rinse bath to the 7 rinse baths, the notch of 7-9 rinse bath increases in turn, between the notch of adjacent two cell bodies, be provided with overflow launder, the overflowing liquid in 7-9 rinse bath is realized reverse overflow in turn by the overflow launder of flowing through of overflow mode in groove.
Also comprise the secondary groove overflow system for the overflowing liquid in 7-9 rinse bath being delivered to 1-4 rinse bath, secondary groove overflow system is mainly by connecting line, secondary groove 5, inlet valve 6 and pump 7 form, secondary groove 5 has closure casing, pump 7 adopts tubing pump, connecting line comprises the overflow water inlet pipe 8 for introducing overflowing liquid, for introducing the pure water water inlet pipe 10 of pure water, for overflowing liquid being expelled to the drainpipe 9 of discharge pipe line, for overflowing liquid is supplied with the outlet pipe 30 of 1-4 rinse bath and full for the interior water of secondary groove 5 after overflowing liquid is drained into the secondary groove overflow pipe 15 of drainpipe 9, one end of pure water water inlet pipe 10 is connected on supply line, the other end is connected on secondary groove 5.Overflow water inlet pipe 8 is connected between the 7th rinse bath and secondary groove 5, the water inlet end of outlet pipe 30 is connected to the bottom of secondary groove 5 cell walls, the water side of outlet pipe 30 is provided with flowing water Valve 50 and lays respectively at the notch top of 1-4 rinse bath, inlet valve 6 is arranged on outlet pipe 30 and the water inlet end of close outlet pipe 30, and tubing pump is positioned on outlet pipe 30 pipelines at inlet valve 6 rears.Water storage valve 16 is installed on drainpipe 9, one end of secondary groove overflow pipe 15 is connected to the cell wall top of secondary groove 5, the other end is connected on drainpipe 9, and secondary groove overflow pipe 15 and the connecting portion of drainpipe 9 are positioned on the rear pipeline of water storage valve 16 realizes respectively current dredging or secondary groove 5 water storage functions to open and close water storage valve 16.
In the present embodiment, discharge pipe line is mainly by the draining fairlead 11 of drawing from each rinse bath, horizontal branch drain 12, spill pipe 13, vertical drain 40 and horizontal main sewer 14 form, draining fairlead 11 is stretched out by the bottom of 1-9 rinse bath respectively and water discharging valve 60 is installed, 1-4 rinse bath, the 5th, 6 rinse baths and 7-9 rinse bath are as three groups of rinse baths, the draining fairlead 11 of each rinse bath below is connected on main sewer 14 via vertical drain 40 by the branch drain 12 of each group respectively, spill pipe 13 is arranged on first, two, between three overflow pipes and corresponding branch drain.
The present embodiment also comprises feeding platform for sending into silicon chip, for sending the blanking bench of silicon chip and for drying the tunnel drying system (not shown in FIG.) of silicon chip, 1-9 rinse bath is according to the longitudinal arrangement of casing, the two ends of casing have respectively charging aperture and discharging opening, feeding platform and blanking bench are corresponding respectively to be extended in casing by charging aperture and discharging opening, wherein, feeding platform is positioned at the front of the 1st rinse bath, and tunnel drying system is positioned at rear the follow-up blanking bench of plugging into of the 9th rinse bath.
The present embodiment also comprises Vltrasonic device and the transplanting machine hand (not shown in FIG.) for mobile silicon wafer basket, Vltrasonic device is located on the outer surface of 1-8 rinse bath bottom surface in casing, and transplanting machine hand is positioned at the top of 1-9 rinse bath notch and can moves along the orientation of rinse bath.
Above-mentioned each valve all adopts Ball valve of pipeline.
Use procedure of the present invention is:
(1) 1-4 rinse bath is as pure water rinse bath: between 1-4 rinse bath (hereinafter to be referred as 1-4 groove), be communicated with by overflow pipe and be connected with three-way valve, by regulating three-way valve door, can make the overflowing liquid of 4 grooves flow into 3 grooves, the overflowing liquid of 3 grooves flows into 2 grooves, and the overflowing liquid of 2 grooves flows into 1 groove, now, 1-4 rinse bath is pure water rinse bath, can ensure like this Wafer Cleaning quality, also can using water wisely, reduce production costs;
(2) 1-4 rinse bath is as liquid medicine alkaline bath (medicine groove): by regulating three-way valve door, in 1-4 groove, any one cell body all can be configured as medicine groove, for example 2 grooves are configured to medicine groove, open the valve on the supply line of 4 grooves, and regulate the three-way valve between 4 grooves and 3 grooves, make the overflowing liquid of 4 grooves flow into 3 grooves, regulate the three-way valve between 3 grooves and 2 grooves, the overflowing liquid of 3 grooves is directly drained, intercept overflowing liquid and enter 2 grooves, the liquid now having prepared in 2 grooves can not diluted by overflowing liquid, can serve as medicine groove and use; Open the valve on the supply line of 1 groove, form the independent groove overflow voluntarily of 1 groove.In like manner, any one groove in 1-4 groove can become medicine groove by this operating process, and other groove is as normal overflow launder, the greatly flexible cleaning configuration of cleaning machine;
(3) the water intake mode of 1-4 rinse bath: the valve of opening the supply line of 1-4 groove top, regulating three-way valve door is closed drain function, each groove in 1-4 groove has two kinds of water intake modes, one is to use pure water from the beginning, and another is to reuse the overflowing liquid of collecting from secondary groove with using water wisely; Close the valve of the supply line of 1-3 groove, so just can realize 4 groove water inlets, 1 groove draining, from 4 grooves to the overflow in turn of 1 groove;
(4) overflow (not by pipeline overflow) in the groove of 9-7 rinse bath: the overflowing liquid of 7 grooves flows into secondary groove, the overflowing liquid of secondary groove collection can the water inlet as 1-4 groove any one or several grooves by pump.The water inlet of 1-4 groove is to select the recycle-water of secondary groove or select the new water of Purified Water Station to depend on that company is to Wafer Cleaning quality and water-saving comprehensive consideration.
If in 1-4 rinse bath selected one of them groove as medicine groove, by regulating three-way valve between this groove and upper level cell body that the overflowing liquid of upper level groove is directly drained instead of flowing into this groove.
Embodiment 2
The difference of the present embodiment and embodiment 1 is: rinse bath is 6, and wherein, difunctional rinse bath is 2, be the 1st, 2 rinse baths, it is 2 that medicine washes down washing trough, is the 3rd, 4 rinse baths, washing rinse bath is 2, is the 5th, 6 rinse baths, and carrying slowly prewashing drench pit is the 6th rinse bath.
Embodiment 3
The difference of the present embodiment and embodiment 1 is: rinse bath is 12, and wherein, difunctional rinse bath is 5, be 1-5 rinse bath, it is 3 that medicine washes down washing trough, is 6-8 rinse bath, washing rinse bath is 4, is 9-12 rinse bath, and carrying slowly prewashing drench pit is the 12nd rinse bath.
Embodiments of the present invention are not limited to this, according to foregoing of the present invention, according to ordinary skill knowledge and the customary means of this area, do not departing under the above-mentioned basic fundamental thought of the present invention prerequisite, rinse bath of the present invention is at least 6 cell bodies of arranging in turn, successively mainly by least two difunctional rinse baths for pure water cleaning or liquid medicine alkali cleaning, at least two medicines for liquid medicine alkali cleaning wash down washing trough and at least two washing rinse bath compositions that clean for pure water, wherein, the washing rinse bath of position, sequence end is for carrying slowly prewashing drench pit, therefore the quantity of rinse bath can be selected to be suitable for according to actual conditions, the present invention can also make the amendment of other various ways, replace or change, within all dropping on rights protection scope of the present invention.
Claims (10)
1. a multiple-grooved circulation wafer washer, comprise casing, be arranged on the rinse bath in casing, be used to rinse bath that the supply line of pure water and the discharge pipe line for rinse bath cleaning liquid inside is discharged are provided, it is characterized in that: described rinse bath is at least 6 cell bodies of arranging in turn, successively mainly by least two difunctional rinse baths for pure water cleaning or liquid medicine alkali cleaning, at least two medicines for liquid medicine alkali cleaning wash down washing trough and at least two washing rinse bath compositions that clean for pure water, wherein, the washing rinse bath of position, sequence end is for carrying slowly prewashing drench pit, in described difunctional rinse bath, between adjacent two cell bodies, be provided with the overflow pipe that is communicated with this cell body and form the reverse overflow in turn of difunctional rinse bath, described discharge pipe line is connected with overflow pipe by three-way valve so that overflowing liquid flows into subordinate's cell body or discharges by discharge pipe line that to realize pure water cleaning or the liquid medicine alkali cleaning of difunctional rinse bath difunctional.
2. multiple-grooved circulation wafer washer according to claim 1, it is characterized in that: described rinse bath is 9, wherein, described difunctional rinse bath is 4, is 1-4 rinse bath, and it is 2 that described medicine washes down washing trough, be the 5th, 6 rinse baths, described washing rinse bath is 3, is 7-9 rinse bath, and the described prewashing drench pit of carrying is slowly the 9th rinse bath.
3. multiple-grooved circulation wafer washer according to claim 2, it is characterized in that: be positioned at the described the 1st, overflow pipe between 2 rinse baths is the first overflow pipe, be positioned at the described the 2nd, overflow pipe between 3 rinse baths is the second overflow pipe, be positioned at the described the 3rd, overflow pipe between 4 rinse baths is the 3rd overflow pipe, described first, two, three overflow pipes have respectively water inlet end for receiving overflowing liquid with for overflowing liquid being delivered to the water side of subordinate's cell body, described water inlet end is connected to the notch position of higher level's rinse bath, described water side is connected to the cell wall bottom of subordinate's rinse bath, the notch of described 1-4 rinse bath increases to realize the reverse overflow in turn of 1-4 rinse bath in turn.
4. multiple-grooved circulation wafer washer according to claim 3, it is characterized in that: the reverse overflow in turn of described 7-9 rinse bath, described multiple-grooved circulation wafer washer also comprises the secondary groove overflow system for the overflowing liquid in 7-9 rinse bath being delivered to 1-4 rinse bath, described secondary groove overflow system is mainly by connecting line, secondary groove, inlet valve and pump composition, wherein, described connecting line comprises the overflow water inlet pipe for introducing overflowing liquid, for overflowing liquid being expelled to the drainpipe of discharge pipe line and for overflowing liquid being supplied with to the outlet pipe of described 1-4 rinse bath, described overflow water inlet pipe is connected between described the 7th rinse bath and described secondary groove, the water inlet end of described outlet pipe is connected to the bottom of secondary groove cell wall, the water side of described outlet pipe is provided with flowing water Valve and lays respectively at the notch top of described 1-4 rinse bath, described inlet valve is arranged on described outlet pipe and the water inlet end of close outlet pipe, described pump is positioned on the outlet pipe pipeline at described inlet valve rear.
5. multiple-grooved circulation wafer washer according to claim 4, it is characterized in that: the connecting line of described secondary groove overflow system also comprises pure water water inlet pipe, described secondary groove has closure casing, one end of described pure water water inlet pipe is connected on described supply line, and the other end is connected on described secondary groove.
6. according to the multiple-grooved circulation wafer washer described in claim 2～5 any one, it is characterized in that: described supply line is positioned at the top of described 1-9 rinse bath, described discharge pipe line is positioned at the below of described 1-9 rinse bath, described discharge pipe line is mainly by the draining fairlead of drawing from each rinse bath, horizontal branch drain, spill pipe, vertical drain and horizontal main sewer composition, described draining fairlead is stretched out by the bottom of described 1-9 rinse bath respectively and water discharging valve is installed, described 1-4 rinse bath, the 5th, 6 rinse baths and 7-9 rinse bath are as three groups of rinse baths, the draining fairlead of each rinse bath below is connected on main sewer via vertical drain by the branch drain of each group respectively, described spill pipe is arranged on described first, two, between three overflow pipes and corresponding branch drain.
7. multiple-grooved circulation wafer washer according to claim 5, it is characterized in that: the notch of described 7-9 rinse bath increases in turn, between the notch of adjacent two cell bodies, be provided with overflow launder, the overflowing liquid in described 7-9 rinse bath is realized reverse overflow in turn by the overflow launder of flowing through of overflow mode in groove.
8. multiple-grooved circulation wafer washer according to claim 7, it is characterized in that: described multiple-grooved circulation wafer washer also comprises the feeding platform for sending into silicon chip, for sending the blanking bench of silicon chip and for drying the tunnel drying system of silicon chip, described casing is cuboid, described 1-9 rinse bath is according to the longitudinal arrangement of casing, the two ends of described casing have respectively charging aperture and discharging opening, described feeding platform and blanking bench are corresponding respectively to be extended in described casing by described charging aperture and discharging opening, wherein, described feeding platform is positioned at the front of described the 1st rinse bath, described tunnel drying system is positioned at rear the follow-up described blanking bench of plugging into of described the 9th rinse bath.
9. multiple-grooved circulation wafer washer according to claim 8, it is characterized in that: described multiple-grooved circulation wafer washer also comprises Vltrasonic device and the transplanting machine hand for mobile silicon wafer basket, described Vltrasonic device is located on the outer surface of described 1-8 rinse bath bottom surface in casing, and described transplanting machine hand is positioned at the top of described 1-9 rinse bath notch and can moves along the orientation of rinse bath.
10. multiple-grooved circulation wafer washer according to claim 9, it is characterized in that: the connecting line of described secondary groove overflow system also comprises after full for secondary trough inner water overflowing liquid is drained into the secondary groove overflow pipe of drainpipe, water storage valve is installed on described drainpipe, one end of described secondary groove overflow pipe is connected to the cell wall top of described secondary groove, the other end is connected on described drainpipe, and the connecting portion of described secondary groove overflow pipe and drainpipe is positioned on the rear pipeline of described water storage valve realizes respectively current dredging or secondary groove water storage function to open and close water storage valve.
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| CN201210279853.4A CN102836842B (en) | 2012-08-08 | 2012-08-08 | Multi-groove circulating silicon wafer cleaning machine |
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