CN102836842A - Multi-groove circulating silicon wafer cleaning machine - Google Patents
Multi-groove circulating silicon wafer cleaning machine Download PDFInfo
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- CN102836842A CN102836842A CN2012102798534A CN201210279853A CN102836842A CN 102836842 A CN102836842 A CN 102836842A CN 2012102798534 A CN2012102798534 A CN 2012102798534A CN 201210279853 A CN201210279853 A CN 201210279853A CN 102836842 A CN102836842 A CN 102836842A
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Abstract
The invention discloses a multi-groove circulating silicon wafer cleaning machine which comprises a machine shell, cleaning grooves, a water-supplying pipeline, and water-exhausting pipelines, wherein the cleaning grooves are at least groove bodies which are sequentially arranged. The groove bodies are sequentially composed of at least two difunctional cleaning grooves, at least two medicine-washing cleaning grooves, and at least two water-washing cleaning grooves which are of slow-lifting prewashing dewatering grooves. The difunctional cleaning grooves are used for pure water cleaning or medical liquid alkali cleaning, the medicine-washing cleaning grooves are used for medical liquid alkali cleaning, and the water-washing cleaning grooves are used for pure water cleaning. Overflowing pipes which are arranged between two adjacent groove bodies of the difunctional cleaning grooves are communicated with the groove bodies, and reverse sequence overflowing of the difunctional cleaning grooves is formed by the overflowing pipes. The water-exhausting pipes are connected with the overflowing pipes through tee joint valves, so that overflowing liquid can flow into a lower-level groove body or exhaust through the water-exhausting pipes, and thereby the difunctional cleaning grooves achieve dual functions of pure water cleaning and medical liquid alkali cleaning. The difunctional cleaning grooves of the multi-groove circulating silicon wafer cleaning machine can not only be used as alkali-cleaning grooves, but only can be used as water-washing grooves, facilitate adjusting and arranging of a silicon wafer cleaning working procedure, reduce water consumption through an overflowing manner, and save water resources.
Description
Technical field
The present invention relates to a kind of silicon wafer cleaner, particularly a kind of multiple-grooved circulation silicon wafer cleaner.
Background technology
In the production technology of silicon chip, in order to obtain the silicon chip of better quality, require seldom attached to the impurity level of silicon chip surface, therefore, the silicon chip after the cutting need clean.
At present, the cleaning equipment of employing is 7 groove cleaning machines, and 7 groove cleaning machines comprise casing, be arranged on rinse bath, Vltrasonic device in the casing, the supply line of pure water is provided and discharge the discharge pipe line of cleaning fluid, and rinse bath is generally 7 and its function and all immobilizes.7 groove cleaning machines are when running, and shifting mechanical arm can be put into 7 rinse baths to the cleaning basket that silicon chip is housed successively and handle, and silicon chip cleans and finishes through rinsing, alkali cleaning (cleaning with liquid medicine), rinsing, baking operation in order.
There is following defective in existing 7 groove cleaning machines: cleaning way is very limited; 7 rinse baths are arranged in order, and wherein, 3,4 grooves are generally changeless medicine groove (adopting liquid medicine to carry out alkali cleaning to silicon chip); Water in 7 rinse baths arranging in order in the cell body at arrangement rear can be more cleaner than the water in the cell body of the place ahead; But, because the cause that 3-4 groove configuration liquid medicine intercepts has caused the pollution rate of soup to improve greatly; Thereby make the also raising thereupon of frequency of changing dressings, therefore existing 7 groove cleaning machines have very big restriction to the Process configuration of cleaning liquid medicine; In addition, if rinse bath water spill-over stream can only be discharged it outside body through the overflow mechanism of opening 7 groove cleaning machines; So, overflowing liquid can't carry out recycle, has caused rinse bath need frequently change water; Water resource is caused greatly waste, in a disguised form increased the production cost of silicon chip.
Summary of the invention
The object of the present invention is to provide a kind of multiple-grooved circulation silicon wafer cleaner that makes things convenient for the adjustment of silicon chip matting and configuration, flexibly changing medicine groove, conserve water resource, can guarantee product cleaning quality and environmental protection.
The object of the invention is realized through following technical measures: a kind of multiple-grooved circulation silicon wafer cleaner; Comprise casing, be arranged on the interior rinse bath of casing, be used to the discharge pipe line that rinse bath provides the supply line of pure water and is used for the rinse bath cleaning liquid inside is discharged; It is characterized in that said rinse bath is at least 6 cell bodies of arranging in order; Mainly be used for by at least two that pure water cleans successively or the difunctional rinse bath of liquid medicine alkali cleaning, at least two medicines that are used for the liquid medicine alkali cleaning wash down washing trough and at least two and be used for the washing rinse baths that pure water cleans and form; Wherein, The washing rinse bath of position, ordering end is for carry the prewashing drench pit slowly; Be provided with the overflow pipe that is communicated with this cell body and forms the reverse overflow in order of difunctional rinse bath in the said difunctional rinse bath between adjacent two cell bodies, said discharge pipe line links to each other with overflow pipe through three-way valve, and perhaps the liquid medicine alkali cleaning is difunctional so that overflowing liquid inflow subordinate cell body is perhaps discharged the pure water cleaning that realizes difunctional rinse bath through discharge pipe line.
Difunctional rinse bath of the present invention adopts the mode of taking over overflow and passes through triple valve and connects discharge pipe line; Can realize the overflow between each cell body or overflowing liquid discharged through discharge pipe line, make difunctional rinse bath both can be used as alkaline bath (liquid medicine alkali cleaning), also can be used as rinsing bowl (pure water cleaning); Make things convenient for adjustment of silicon chip matting and configuration; And flexibly changing medicine groove (liquid medicine alkali cleaning) thus realize the flexible configuration of cleaning, and, can significantly reduce water consumption through the overflow mode; The conserve water resource reduces cost; The present invention can reduce liquid medicine contamination through the adjustment to cleaning, guarantees the cleaning quality of product.
As a kind of preferred implementation of the present invention, said rinse bath is 9, wherein; Said difunctional rinse bath is 4, is the 1-4 rinse bath, and it is 2 that said medicine washes down washing trough; Be the 5th, 6 rinse baths; Said washing rinse bath is 3, is the 7-9 rinse bath, and the said prewashing drench pit of carrying slowly is the 9th rinse bath.
The overflow pipe of the present invention between said the 1st, 2 rinse baths is first overflow pipe; Overflow pipe between said the 2nd, 3 rinse baths is second overflow pipe; Overflow pipe between said the 3rd, 4 rinse baths is the 3rd overflow pipe; Said first, second and third overflow pipe has the water inlet end and the water side that is used for overflowing liquid is delivered to subordinate's cell body that is used to receive overflowing liquid respectively; Said water inlet end is connected the notch position of higher level's rinse bath, and said water side is connected the cell wall bottom of subordinate's rinse bath, and the notch of said 1-4 rinse bath increases to realize the reverse overflow in order of 1-4 rinse bath in order.Adopt reverse overflow mode, promptly according to the Sort Direction overflow in order (according to the reverse overflow in order of the Sort Direction of 1-4 rinse bath) of 4-1 rinse bath.Because the water that is arranged in the rinse bath at rear is cleaner, so the direction of overflow is reverse overflow in order, can be with in the rinse bath that compares clean water overflow to the place ahead.
As a kind of improvement of the present invention; The reverse overflow in order of said 7-9 rinse bath; Said multiple-grooved circulation silicon wafer cleaner also comprises the secondary groove overflow system that is used for the overflowing liquid in the 7-9 rinse bath is delivered to the 1-4 rinse bath; Said secondary groove overflow system mainly is made up of connecting line, secondary groove, inlet valve and pump; Wherein, said connecting line comprises the overflow water inlet pipe that is used to introduce overflowing liquid, be used for overflowing liquid is expelled to the drainpipe of discharge pipe line and is used for overflowing liquid is supplied with the outlet pipe of said 1-4 rinse bath, and said overflow water inlet pipe is connected between said the 7th rinse bath and the said secondary groove; The water inlet end of said outlet pipe is connected the bottom of secondary groove cell wall; The water side of said outlet pipe is equipped with flowing water Valve and lays respectively at the notch top of said 1-4 rinse bath, and said inlet valve is installed on the said outlet pipe and near the water inlet end of outlet pipe, said pump is positioned on the outlet pipe pipeline at said inlet valve rear.
As further improvement of the present invention; The connecting line of said secondary groove overflow system also comprises the pure water water inlet pipe, and said secondary groove has closure casing, and an end of said pure water water inlet pipe is connected on the said supply line; The other end is connected on the said secondary groove; If pure water supply line pressure is not enough, pure water then can pass through secondary groove, by the tubing pump pressurization 1-4 rinse bath is supplied water.
Embodiment as the present invention's recommendation; Said supply line is positioned at the top of said 1-9 rinse bath; Said discharge pipe line is positioned at the below of said 1-9 rinse bath; Said discharge pipe line mainly is made up of the draining fairlead of drawing from each rinse bath, horizontal branch drain, spill pipe, vertical drain and horizontal main sewer; Said draining fairlead is stretched out by the bottom of said 1-9 rinse bath respectively and water discharging valve is installed; Said 1-4 rinse bath, the 5th, 6 rinse baths and 7-9 rinse bath be as three groups of rinse baths, and the draining fairlead of each rinse bath below is connected on the main sewer via vertical drain through the branch drain of each group respectively, and said spill pipe is arranged between said first, second and third overflow pipe and the corresponding branch drain.
The present invention can also have following improvement, and the notch of said 7-9 rinse bath increases in order, is provided with overflow launder between the notch of adjacent two cell bodies, and the overflowing liquid in the said 7-9 rinse bath is realized reverse overflow in order through flow through said overflow launder of overflow mode in the groove.
As further improvement of the present invention; Said multiple-grooved circulation silicon wafer cleaner also comprises the feeding platform that is used to send into silicon chip, be used to the tunnel drying system seeing the blanking bench of silicon chip off and be used to dry silicon chip; Said casing is a cuboid, and said 1-9 rinse bath is according to vertical arrangement of casing, and the two ends of said casing have charging aperture and discharging opening respectively; Said feeding platform and blanking bench are corresponding respectively to extend in the said casing through said charging aperture and discharging opening; Wherein, said feeding platform is positioned at the place ahead of said the 1st rinse bath, and said tunnel drying system is positioned at the rear and the follow-up said blanking bench of plugging into of said the 9th rinse bath.
Multiple-grooved circulation silicon wafer cleaner according to the invention also comprises Vltrasonic device and is used for moving the transplanting machine hand of silicon chip basket; Said Vltrasonic device is located on the outer surface of said 1-8 rinse bath bottom surface in the casing, and said transplanting machine hand is positioned at the top of said 1-9 rinse bath notch and can moves along the orientation of rinse bath.Vltrasonic device is positioned at casing, can reduce the injury of environmental noise to human body.
As further improvement of the present invention; The connecting line of said secondary groove overflow system comprises that also being used for secondary trough inner water drains into the secondary groove overflow pipe of drainpipe with overflowing liquid after full; The water storage valve is installed on the said drainpipe; One end of said secondary groove overflow pipe is connected the cell wall top of said secondary groove; The other end is connected on the said drainpipe, and the connecting portion of said secondary groove overflow pipe and drainpipe is positioned on the rear pipeline of said water storage valve realizes current mediation or secondary groove water storage function respectively to open the water storage valve.The water storage valve is in closed condition under normal conditions, for secondary groove water storage, and secondary groove water completely the unnecessary water in back can slowly flow into secondary groove overflow pipe and discharge; When needs carry out the current mediation, open the water storage valve.
As one embodiment of the present invention, said each valve adopts Ball valve of pipeline; Said pump adopts tubing pump.
Compared with prior art, the present invention has following significant effect:
⑴ the difunctional rinse bath of the present invention adopts the mode of taking over overflow and passes through triple valve and connects discharge pipe line; Can realize the overflow between each cell body or overflowing liquid discharged through discharge pipe line; Make difunctional rinse bath both can be used as alkaline bath; Also can be used as rinsing bowl, make things convenient for silicon chip matting adjustment and configuration, and flexibly changing medicine groove (alkaline bath) thus realize the flexible configuration of cleaning.
⑵ the present invention can significantly reduce water consumption through the overflow mode, and the conserve water resource reduces production costs.
⑶ the present invention can reduce liquid medicine contamination through the adjustment to cleaning, guarantees the cleaning quality of product.
⑷ Vltrasonic device is arranged in the casing, can reduce the injury of environmental noise to human body, guarantees staff's health.
⑸ close the water storage valve when needs use secondary groove water storage, secondary groove is behind the storage full water, and unnecessary water can flow into the water storage function that realizes secondary groove in the main sewer through secondary groove overflow pipe.
⑹ can be according to taking all factors into consideration silicon chip cleaning quality and using water wisely, and selecting the water in the difunctional rinse bath is overflow water or the pure water that adopts secondary groove to provide, so the present invention has multiple flexible occupation mode.
⑺ when need use as the medicine groove when rinse bath in the difunctional rinse bath, flow into this groove as long as intercept overflowing liquid, the overflowing liquid that is about to this groove upper level rinse bath is discharged; Perhaps when needs used as rinsing bowl, as long as the overflowing liquid of upper level rinse bath is entered this groove, therefore, the present invention was easy to realize, is suitable for extensive popularization.
Description of drawings
Below in conjunction with accompanying drawing and specific embodiment the present invention is done further detailed description.
Fig. 1 is the sketch map (the interior rinse bath of casing and the pipe-line system that only show cleaning machine) of the embodiment of the invention 1.
The specific embodiment
Embodiment 1
As shown in Figure 1; It is a kind of multiple-grooved ultrasonic wave of the present invention circulation silicon wafer cleaner; Comprise cuboid casing, be arranged on rinse bath in the casing, be used to the discharge pipe line that rinse bath provides the supply line 1 of pure water and is used for the rinse bath cleaning liquid inside is discharged; In the present embodiment; Rinse bath is 9 cell bodies of arranging in order; Mainly by being used for that pure water cleans or the difunctional rinse bath (1-4 rinse bath 1#-4#) of liquid medicine alkali cleaning, the medicine that is used for the liquid medicine alkali cleaning wash down washing trough (the 5th rinse bath 5#, the 6th rinse bath 6#), are used for the washing rinse bath (the 7th rinse bath 7#, the 8th rinse bath 8# and the 9th rinse bath 9#) that pure water cleans and form; Wherein, The washing rinse bath (the 9th rinse bath 9#) of position, ordering end is carried the prewashing drench pit slowly, is provided with the overflow pipe that is communicated with this cell body and forms four reverse overflows in order of rinse bath in the 1-4 rinse bath between adjacent two cell bodies, and supply line 1 is positioned at the top of 1-9 rinse bath; Discharge pipe line is positioned at the below of 1-9 rinse bath, and discharge pipe line links to each other with overflow pipe through three-way valve 20 so that overflowing liquid flows into subordinate's cell body or realizes that through the discharge pipe line discharge pure water of 1-4 rinse bath cleans or the liquid medicine alkali cleaning is difunctional.The 1-4 rinse bath is according to the reverse overflow in order of ordering, promptly according to the order overflow in order of the 4th rinse bath to the 1 rinse bath.
Overflow pipe between the 1st, 2 rinse baths is first overflow pipe 2; Overflow pipe between the 2nd, 3 rinse baths is second overflow pipe 3; Overflow pipe between the 3rd, 4 rinse baths is the 3rd overflow pipe 4; First, second and third overflow pipe has the water inlet end and the water side that is used for overflowing liquid is delivered to subordinate's cell body that is used to receive overflowing liquid respectively; Water inlet end is connected the notch position of higher level's rinse bath, and the water side is connected the cell wall bottom of subordinate's rinse bath, and the notch of 1-4 rinse bath increases to realize the reverse overflow in order of 1-4 rinse bath in order.
In the present embodiment; The 7-9 rinse bath is according to the reverse overflow in order of Sort Direction; Promptly according to the order overflow in order of the 9th rinse bath to the 7 rinse baths; The notch of 7-9 rinse bath increases in order, is provided with overflow launder between the notch of adjacent two cell bodies, and the overflowing liquid in the 7-9 rinse bath is realized reverse overflow in order through the overflow launder of flowing through of overflow mode in the groove.
Also comprise the secondary groove overflow system that is used for the overflowing liquid in the 7-9 rinse bath is delivered to the 1-4 rinse bath; Secondary groove overflow system mainly is made up of connecting line, secondary groove 5, inlet valve 6 and pump 7; Secondary groove 5 has closure casing; Pump 7 adopts tubing pump; Connecting line comprises the overflow water inlet pipe 8, the pure water water inlet pipe 10 that is used to introduce pure water that are used to introduce overflowing liquid, be used for overflowing liquid be expelled to discharge pipe line drainpipe 9, be used for overflowing liquid supplied with the outlet pipe 30 of 1-4 rinse bath and be used for water in the secondary groove 5 overflowing liquid being drained into the secondary groove overflow pipe 15 of drainpipe 9 after full; One end of pure water water inlet pipe 10 is connected on the supply line, and the other end is connected on the secondary groove 5.Overflow water inlet pipe 8 is connected between the 7th rinse bath and the secondary groove 5; The water inlet end of outlet pipe 30 is connected the bottom of secondary groove 5 cell walls; The water side of outlet pipe 30 is equipped with flowing water Valve 50 and lays respectively at the notch top of 1-4 rinse bath; Inlet valve 6 is installed on the outlet pipe 30 and near the water inlet end of outlet pipe 30, tubing pump is positioned on outlet pipe 30 pipelines at inlet valve 6 rears.Water storage valve 16 is installed on the drainpipe 9; One end of secondary groove overflow pipe 15 is connected the cell wall top of secondary groove 5; The other end is connected on the drainpipe 9, and the connecting portion of secondary groove overflow pipe 15 and drainpipe 9 is positioned on the rear pipeline of water storage valve 16 realizes current mediation or secondary groove 5 water storage functions respectively to open and close water storage valve 16.
In the present embodiment; Discharge pipe line mainly is made up of the draining fairlead 11 of drawing from each rinse bath, horizontal branch drain 12, spill pipe 13, vertical drain 40 and horizontal main sewer 14; Draining fairlead 11 is stretched out by the bottom of 1-9 rinse bath respectively and water discharging valve 60 is installed; 1-4 rinse bath, the 5th, 6 rinse baths and 7-9 rinse bath are as three groups of rinse baths; The draining fairlead 11 of each rinse bath below is connected on the main sewer 14 via vertical drain 40 through the branch drain 12 of each group respectively, and spill pipe 13 is arranged between first, second and third overflow pipe and the corresponding branch drain.
Present embodiment also comprises the feeding platform that is used for sending into silicon chip, be used to see the blanking bench of silicon chip off and be used to dry the tunnel drying system (figure does not draw) of silicon chip; The 1-9 rinse bath is according to vertical arrangement of casing; The two ends of casing have charging aperture and discharging opening respectively, and feeding platform and blanking bench are corresponding respectively to extend in the casing, wherein through charging aperture and discharging opening; Feeding platform is positioned at the place ahead of the 1st rinse bath, and the tunnel drying system is positioned at the rear and the follow-up blanking bench of plugging into of the 9th rinse bath.
Present embodiment also comprises Vltrasonic device and is used for moving the transplanting machine hand (figure does not draw) of silicon chip basket; Vltrasonic device is located on the outer surface of 1-8 rinse bath bottom surface in the casing, and the transplanting machine hand is positioned at the top of 1-9 rinse bath notch and can moves along the orientation of rinse bath.
Above-mentioned each valve all adopts Ball valve of pipeline.
Use of the present invention is:
⑴ 1-4 rinse bath is as the pure water rinse bath: be communicated with through overflow pipe between the 1-4 rinse bath (hereinafter to be referred as the 1-4 groove) and be connected with three-way valve, through regulating three-way valve, can make the overflowing liquid of 4 grooves flow into 3 grooves; The overflowing liquid of 3 grooves flows into 2 grooves, and the overflowing liquid of 2 grooves flows into 1 groove, at this moment; The 1-4 rinse bath is the pure water rinse bath; Can guarantee the silicon chip cleaning quality like this, also can using water wisely, reduce production costs;
⑵ 1-4 rinse bath is as liquid medicine alkaline bath (medicine groove): through regulating three-way valve, any one cell body all can be configured as the medicine groove in the 1-4 groove, for example 2 grooves is configured to the medicine groove; Promptly open the valve on the supply line of 4 grooves; And regulate the three-way valve between 4 grooves and 3 grooves, make the overflowing liquid of 4 grooves flow into 3 grooves, regulate the three-way valve between 3 grooves and 2 grooves; The overflowing liquid of 3 grooves is directly drained; Intercept overflowing liquid and get into 2 grooves, the soup that prepared in 2 grooves this moment can not diluted by overflowing liquid, can use as the medicine groove; Open the valve on the supply line of 1 groove, form the independent groove overflow voluntarily of 1 groove.In like manner, any one groove in the 1-4 groove can become the medicine groove by this operating process, and other groove is as normal overflow launder, the greatly flexible cleaning configuration of cleaning machine;
⑶ the water intake mode of 1-4 rinse bath: the valve of opening the supply line of 1-4 groove top; Regulate three-way valve and close drain function; Each groove in the 1-4 groove all has two kinds of water intake modes; A kind of pure water from the beginning that is to use, a kind of in addition is to reuse the overflowing liquid collected from secondary groove with using water wisely; Close the valve of the supply line of 1-3 groove, so just can realize 4 grooves water inlets, 1 groove draining, from 4 grooves to the overflow in order of 1 groove;
⑷ overflow (promptly not through the pipeline overflow) in the groove of 9-7 rinse bath: the overflowing liquid of 7 grooves flows into secondary groove, and the overflowing liquid that secondary groove is collected can be through pump as the water inlet of one or several grooves arbitrarily of 1-4 groove.The water inlet of 1-4 groove is to select the recycle-water of secondary groove or select the new water of Purified Water Station to depend on that company is to silicon chip cleaning quality and water-saving comprehensive consideration.
If selected one of them groove then makes the overflowing liquid of upper level groove directly drain rather than flows into this groove and get final product through regulating three-way valve between this groove and the upper level cell body as the medicine groove in the 1-4 rinse bath.
Embodiment 2
The difference of present embodiment and embodiment 1 is: rinse bath is 6, and wherein, difunctional rinse bath is 2; Be the 1st, 2 rinse baths, it is 2 that medicine washes down washing trough, is the 3rd, 4 rinse baths; The washing rinse bath is 2, is the 5th, 6 rinse baths, and carrying the prewashing drench pit slowly is the 6th rinse bath.
Embodiment 3
The difference of present embodiment and embodiment 1 is: rinse bath is 12, and wherein, difunctional rinse bath is 5; Be the 1-5 rinse bath, it is 3 that medicine washes down washing trough, is the 6-8 rinse bath; The washing rinse bath is 4, is the 9-12 rinse bath, and carrying the prewashing drench pit slowly is the 12nd rinse bath.
Embodiment of the present invention is not limited thereto; According to foregoing of the present invention; According to the ordinary skill knowledge and the customary means of this area, do not breaking away under the above-mentioned basic fundamental thought of the present invention prerequisite, rinse bath of the present invention is at least 6 cell bodies of arranging in order; Mainly be used for by at least two that pure water cleans successively or the difunctional rinse bath of liquid medicine alkali cleaning, at least two medicines that are used for the liquid medicine alkali cleaning wash down washing trough and at least two and be used for the washing rinse baths that pure water cleans and form; Wherein, the washing rinse bath of ordering end position is for carrying the prewashing drench pit slowly, so the quantity of rinse bath can be selected suitable according to actual conditions; The present invention can also make modification, replacement or the change of other various ways, all drops within the rights protection scope of the present invention.
Claims (10)
1. multiple-grooved circulation silicon wafer cleaner; Comprise casing, be arranged on the interior rinse bath of casing, be used to the discharge pipe line that rinse bath provides the supply line of pure water and is used for the rinse bath cleaning liquid inside is discharged; It is characterized in that: said rinse bath is at least 6 cell bodies of arranging in order; Mainly be used for by at least two that pure water cleans successively or the difunctional rinse bath of liquid medicine alkali cleaning, at least two medicines that are used for the liquid medicine alkali cleaning wash down washing trough and at least two and be used for the washing rinse baths that pure water cleans and form; Wherein, The washing rinse bath of position, ordering end is for carry the prewashing drench pit slowly; Be provided with the overflow pipe that is communicated with this cell body and forms the reverse overflow in order of difunctional rinse bath in the said difunctional rinse bath between adjacent two cell bodies, said discharge pipe line links to each other with overflow pipe through three-way valve, and perhaps the liquid medicine alkali cleaning is difunctional so that overflowing liquid inflow subordinate cell body is perhaps discharged the pure water cleaning that realizes difunctional rinse bath through discharge pipe line.
2. multiple-grooved circulation silicon wafer cleaner according to claim 1 is characterized in that: said rinse bath is 9, wherein; Said difunctional rinse bath is 4, is the 1-4 rinse bath, and it is 2 that said medicine washes down washing trough; Be the 5th, 6 rinse baths; Said washing rinse bath is 3, is the 7-9 rinse bath, and the said prewashing drench pit of carrying slowly is the 9th rinse bath.
3. multiple-grooved circulation silicon wafer cleaner according to claim 2; It is characterized in that: the overflow pipe between said the 1st, 2 rinse baths is first overflow pipe; Overflow pipe between said the 2nd, 3 rinse baths is second overflow pipe; Overflow pipe between said the 3rd, 4 rinse baths is the 3rd overflow pipe; Said first, second and third overflow pipe has the water inlet end and the water side that is used for overflowing liquid is delivered to subordinate's cell body that is used to receive overflowing liquid respectively; Said water inlet end is connected the notch position of higher level's rinse bath, and said water side is connected the cell wall bottom of subordinate's rinse bath, and the notch of said 1-4 rinse bath increases to realize the reverse overflow in order of 1-4 rinse bath in order.
4. multiple-grooved circulation silicon wafer cleaner according to claim 3; It is characterized in that: the reverse overflow in order of said 7-9 rinse bath; Said multiple-grooved circulation silicon wafer cleaner also comprises the secondary groove overflow system that is used for the overflowing liquid in the 7-9 rinse bath is delivered to the 1-4 rinse bath; Said secondary groove overflow system mainly is made up of connecting line, secondary groove, inlet valve and pump; Wherein, said connecting line comprises the overflow water inlet pipe that is used to introduce overflowing liquid, be used for overflowing liquid is expelled to the drainpipe of discharge pipe line and is used for overflowing liquid is supplied with the outlet pipe of said 1-4 rinse bath, and said overflow water inlet pipe is connected between said the 7th rinse bath and the said secondary groove; The water inlet end of said outlet pipe is connected the bottom of secondary groove cell wall; The water side of said outlet pipe is equipped with flowing water Valve and lays respectively at the notch top of said 1-4 rinse bath, and said inlet valve is installed on the said outlet pipe and near the water inlet end of outlet pipe, said pump is positioned on the outlet pipe pipeline at said inlet valve rear.
5. multiple-grooved circulation silicon wafer cleaner according to claim 4; It is characterized in that: the connecting line of said secondary groove overflow system also comprises the pure water water inlet pipe; Said secondary groove has closure casing; One end of said pure water water inlet pipe is connected on the said supply line, and the other end is connected on the said secondary groove.
6. according to the arbitrary described multiple-grooved circulation silicon wafer cleaner of claim 1 ~ 5; It is characterized in that: said supply line is positioned at the top of said 1-9 rinse bath; Said discharge pipe line is positioned at the below of said 1-9 rinse bath; Said discharge pipe line mainly is made up of the draining fairlead of drawing from each rinse bath, horizontal branch drain, spill pipe, vertical drain and horizontal main sewer; Said draining fairlead is stretched out by the bottom of said 1-9 rinse bath respectively and water discharging valve is installed; Said 1-4 rinse bath, the 5th, 6 rinse baths and 7-9 rinse bath be as three groups of rinse baths, and the draining fairlead of each rinse bath below is connected on the main sewer via vertical drain through the branch drain of each group respectively, and said spill pipe is arranged between said first, second and third overflow pipe and the corresponding branch drain.
7. multiple-grooved circulation silicon wafer cleaner according to claim 5; It is characterized in that: the notch of said 7-9 rinse bath increases in order; Be provided with overflow launder between the notch of adjacent two cell bodies, the overflowing liquid in the said 7-9 rinse bath is realized reverse overflow in order through the overflow launder of flowing through of overflow mode in the groove.
8. multiple-grooved circulation silicon wafer cleaner according to claim 7; It is characterized in that: said multiple-grooved circulation silicon wafer cleaner also comprises the feeding platform that is used to send into silicon chip, be used to the tunnel drying system seeing the blanking bench of silicon chip off and be used to dry silicon chip; Said casing is a cuboid; Said 1-9 rinse bath is according to vertical arrangement of casing; The two ends of said casing have charging aperture and discharging opening respectively, and said feeding platform and blanking bench are corresponding respectively to extend in the said casing, wherein through said charging aperture and discharging opening; Said feeding platform is positioned at the place ahead of said the 1st rinse bath, and said tunnel drying system is positioned at the rear and the follow-up said blanking bench of plugging into of said the 9th rinse bath.
9. multiple-grooved circulation silicon wafer cleaner according to claim 8; It is characterized in that: said multiple-grooved circulation silicon wafer cleaner also comprises Vltrasonic device and is used for moving the transplanting machine hand of silicon chip basket; Said Vltrasonic device is located on the outer surface of said 1-8 rinse bath bottom surface in the casing, and said transplanting machine hand is positioned at the top of said 1-9 rinse bath notch and can moves along the orientation of rinse bath.
10. multiple-grooved circulation silicon wafer cleaner according to claim 9; It is characterized in that: the connecting line of said secondary groove overflow system comprises that also being used for secondary trough inner water drains into the secondary groove overflow pipe of drainpipe with overflowing liquid after full; The water storage valve is installed on the said drainpipe; One end of said secondary groove overflow pipe is connected the cell wall top of said secondary groove; The other end is connected on the said drainpipe, and the connecting portion of said secondary groove overflow pipe and drainpipe is positioned on the rear pipeline of said water storage valve realizes current mediation or secondary groove water storage function respectively to open and close the water storage valve.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103357608A (en) * | 2013-07-18 | 2013-10-23 | 上海宝锋工程技术有限公司 | System and method for cleaning acid-washed metal materials |
| CN104117501A (en) * | 2014-06-26 | 2014-10-29 | 苏州一合光学有限公司 | Tank arrangement structure of ultrasonic washing unit |
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| CN108722977A (en) * | 2017-04-20 | 2018-11-02 | 隆基绿能科技股份有限公司 | Raw material cleaning device and material cleaning apparatus |
| CN109616551A (en) * | 2018-11-19 | 2019-04-12 | 横店集团东磁股份有限公司 | A kind of bad cell piece rework preocess of polycrystalline surface organic matter |
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| CN113877876A (en) * | 2021-11-13 | 2022-01-04 | 镇江原轼新型材料有限公司 | A wash basin for rinsing diamond wire liquid medicine |
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| CN111014167A (en) * | 2019-11-25 | 2020-04-17 | 大同新成新材料股份有限公司 | Intelligent cleaning machine for high-precision chip silicon production and cleaning method thereof |
| CN112691995A (en) * | 2020-12-31 | 2021-04-23 | 苏州欧赫电气自动化有限公司 | Pump set for vacuum cleaning and drying system |
| CN113877876A (en) * | 2021-11-13 | 2022-01-04 | 镇江原轼新型材料有限公司 | A wash basin for rinsing diamond wire liquid medicine |
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