CN101773916A - Step-type multi-step silicon material cleaning equipment - Google Patents
Step-type multi-step silicon material cleaning equipment Download PDFInfo
- Publication number
- CN101773916A CN101773916A CN201010018233A CN201010018233A CN101773916A CN 101773916 A CN101773916 A CN 101773916A CN 201010018233 A CN201010018233 A CN 201010018233A CN 201010018233 A CN201010018233 A CN 201010018233A CN 101773916 A CN101773916 A CN 101773916A
- Authority
- CN
- China
- Prior art keywords
- rinse bath
- cleaning
- chamber
- elementary
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to step-type multi-step silicon material cleaning equipment. The step-type multi-step silicon material cleaning equipment comprises primary cleaning tanks, transitional cleaning tanks, a final cleaning tank, a water inlet valve, a filtration treating pond, a circulating pump, a separation bank and a foul solution tank, wherein each primary cleaning tank and transitional cleaning tank are provided with a separation net-like plate respectively; each cleaning tank is divided into a cleaning chamber and a foul solution overflowing chamber by the separation net-like plate; the cleaning solution flowing from the next cleaning tank flows into the previous cleaning tank to be used for supplementing the cleaning solution; sewage floating on the upper surface of the foul solution overflowing chamber flows into a filtrate treating pond through a hose to perform secondary treatment; and the processed cleaning liquid is pumped to the primary cleaning tanks by the circulating pump to be used as the cleaning solution of the primary cleaning tanks. The actual use of the applicant proves that the step-type multi-step silicon material cleaning equipment has the advantages that: the water consumption for cleaning one ton of silicon wafer is three tons and is reduced by more than five tons compared with that of the conventional cleaner, water-saving effect is very obvious and the water waste caused by independent water use of the cleaning tanks is avoided.
Description
Technical field:
The present invention relates to silicon material cleaning equipment.
Background technology:
In photovoltaic manufacturing enterprise, it is essential through multistage cleaning to draw the used silicon material of silicon rod, to remove attachments such as greasy dirt attached to silicon material surface, dust, to improve the purity of silicon rod, present used cleaning equipment is multistage groove-type cleaning machine, contains rinse bath more than three grades usually, and silicon material to be cleaned shifts out after first order rinse bath begins to clean step by step, the impurity that silicon chip surface adheres in elementary rinse bath is maximum, will reduce step by step later on.In existing multistage rinse bath structure, each grade rinse bath has independently water inlet and outlet system, every grade all has waste water to discharge, the sewage of being discharged in the rinse baths at different levels directly discharges, the water yield of cleaning the required consumption of silicon material is very big, so not only water consumption is big, but also pollutes the environment, and photovoltaic enterprise presses for the silicon material cleaning equipment that a kind of cleaning fluid can recycle.
Summary of the invention:
In order to overcome existing silicon material cleaning equipment above shortcomings, the purpose of this invention is to provide a kind of step-type multi-step silicon material cleaning equipment.
The technical solution adopted in the present invention is:
Described step-type multi-step silicon material cleaning equipment, comprise frame, elementary rinse bath, transition rinse bath, last rinse bath, water intaking valve, filtration processing tank, circulating pump, separation web plate and soiling solution groove, soiling solution groove, elementary rinse bath, transition rinse bath and last rinse bath from left to right are arranged on the frame successively with raising, water intaking valve interlinks with last rinse bath, in the end the sidewall that is bordered of rinse bath and transition rinse bath is provided with return port, and return port interlinks by flexible pipe and filtration processing tank; In the transition rinse bath, be provided with the separation web plate, separate web plate the transition rinse bath is separated into the purge chamber and the dirty chamber of overflowing, overflow dirty chamber with rinse bath is adjacent at last, the height of separating web plate is higher than the left side wall of transition rinse bath, on the left side wall of transition rinse bath, also be provided with return port, it is suitable with the separation web plate that return port is provided with height, and return port interlinks by flexible pipe and filtration processing tank; In elementary rinse bath, be provided with the separation web plate, separate web plate elementary rinse bath is separated into the purge chamber and the dirty chamber of overflowing, the height of separating web plate is higher than the left side wall of soiling solution groove, is provided with return port in the bottom of the purge chamber of elementary rinse bath, and return port interlinks by flexible pipe and filtration processing tank; Have circulating pump to link to each other between the purge chamber of the pure water inlet of filtration processing tank and elementary rinse bath, promptly the pure water inlet place of the water sucking mouth of circulating pump and filtration processing tank interlinks, and the delivery port of circulating pump interlinks through the purge chamber of flexible pipe and elementary rinse bath.
Further, between elementary rinse bath and last rinse bath, arrange 2～5 transition rinse baths continuously.
Further, described filtration processing tank comprises admission chamber, purifies chamber and water-purifying cavity, upper end open place at admission chamber is provided with the horizontal filtering layer, be equipped with the side filter course in admission chamber and the side-walls in purification chamber and the side-walls of purification chamber and water-purifying cavity, on the internal partition of filtration processing tank, be provided with liquid drain hole, in water-purifying cavity, be placed with circulating pump.
The course of work of the present invention is as follows:
Earlier with all rinse bath topped up with water, last rinse bath is connected with running water pipe by water intaking valve, again silicon chip to be cleaned is put into the purge chamber of elementary rinse bath, after ultrasonic wave or mechanical oscillation cleaning, the greasy dirt that attaches on the silicon material, grit adheres to the dirt overwhelming majority and all can enter in the cleaning fluid, clean again through by mechanical system the silicon material being relayed in the transition rinse bath again behind the previous cleaning of elementary rinse bath, it is individual next definite according to the cleaning requirement how many transition rinse baths designs, after the transition rinse bath cleans, change at last and carry out final rinsing in the last rinse bath and get final product.
Through the actual use checking of applicant, adopt the present invention, the water consumption of continuous wash silicon material is 1/3～1/10 of an existing cleaning machine, water-saving result is very remarkable, has both reduced the cleaning cost, reduces the waste to water resource again.
Description of drawings:
Fig. 1 is the structural representation of step-type multi-step silicon material cleaning equipment;
Among the figure: the 1-frame; The elementary rinse bath of 2-; 3-transition rinse bath; The last rinse bath of 4-; The 5-water intaking valve; The 6-filtration processing tank; The 7-circulating pump; 8-separates web plate; 9-soiling solution groove; The 10-return port; The 11-purge chamber; The 12-dirty chamber of overflowing; The 13-flexible pipe; The 61-admission chamber; 62-purifies the chamber; The 63-water-purifying cavity; 64-horizontal filtering layer; 65-side filter course; The 66-internal partition; The 67-liquid drain hole.
The specific embodiment:
Step-type multi-step silicon material cleaning equipment of the present invention as shown in Figure 1, it comprises frame 1, elementary rinse bath 2, transition rinse bath 3, last rinse bath 4, water intaking valve 5, filtration processing tank 6, circulating pump 7, separates web plate 8 and soiling solution groove 9, soiling solution groove 9, elementary rinse bath 2, transition rinse bath 3 and last rinse bath 4 from left to right are arranged on the frame 1 successively with raising, water intaking valve 5 interlinks with last rinse bath 4, in the end rinse bath 4 is provided with return port 10 with the sidewall that transition rinse bath 3 is bordered, and return port 10 interlinks by flexible pipe 13 and filtration processing tank 6; In transition rinse bath 3, be provided with and separate web plate 8, separate web plate 8 transition rinse bath 3 is separated into purge chamber 11 and the dirty chamber 12 of overflowing, overflow dirty chamber 12 with rinse bath 4 is adjacent at last, the height of separating web plate 8 is higher than the left side wall of transition rinse bath 3, on the left side wall of transition rinse bath 3, also be provided with return port 10, it is suitable with separation web plate 8 that return port 10 is provided with height, and return port 10 interlinks by flexible pipe 13 and filtration processing tank 6; In elementary rinse bath 2, be provided with and separate web plate 8, separate web plate 8 elementary rinse bath 2 is separated into purge chamber 11 and the dirty chamber 12 of overflowing, the height of separating web plate 8 is higher than the left side wall of soiling solution groove 9, bottom in the purge chamber 11 of elementary rinse bath 2 is provided with return port 10, and return port 10 interlinks by flexible pipe 13 and filtration processing tank 6; Between the purge chamber 11 of the pure water inlet of filtration processing tank 6 and elementary rinse bath 2, there is circulating pump 7 to link to each other, be that the water sucking mouth of circulating pump 7 and the pure water inlet place of filtration processing tank 6 interlink, the delivery port of circulating pump 7 interlinks through the purge chamber 11 of flexible pipe 13 with elementary rinse bath 2.Described filtration processing tank 6 comprises admission chamber 61, purifies chamber 62 and water-purifying cavity 63, upper end open place at admission chamber 61 is provided with horizontal filtering layer 64, be provided with side filter course 65 in admission chamber 61 and the side-walls that purifies chamber 62 and purification chamber 62 and water-purifying cavity 63, be provided with liquid drain hole 67 on the internal partition 66 of filtration processing tank 6, circulating pump 7 is placed in the water-purifying cavity 63.
The recycling process of cleaning fluid is as follows in the cleaning process:
Running water is by the supply in last rinse bath 4 of water intaking valve 5 low discharge ground, the cleaning fluid that contains micro-dust in the last rinse bath 4 then through the left plate overflow to the excessive dirty chamber 12 of transition rinse bath 3, the cleaning fluid that overflows from last rinse bath 4 can be used as the cleaning fluid of preceding road transition rinse bath 3, the floating pollution layer water of all dirty chamber 12 upper surfaces that overflow is from return port 10 and be connected the admission chamber 61 of flexible pipe 13 inflow filtration processing tanks 6, flow into water-purifying cavity 63 through purifying chamber 62 again, clean water in the water-purifying cavity 63 is sent in the purge chamber 11 of elementary rinse bath 2 by circulating pump 7 suctions, the floating soiling solution of purge chamber's 11 upper surfaces of elementary rinse bath 2 flows into the soiling solution groove 9 from left plate, passing on sewage treatment plant focuses on, lower floor's sewage then is provided with return port 10 by in the admission chamber 61 the flexible pipe 13 inflow filtration processing tanks 6 in the purge chamber 11 of elementary rinse bath 2 from its bottom, be transported in the purge chamber 11 of elementary rinse bath 2, by circulating pump 7 again by the cleaning fluid after filtration processing tank 6 after-treatments as the cleaning fluid of elementary rinse bath 2.
Claims (3)
1. step-type multi-step silicon material cleaning equipment, it is characterized in that: it comprises frame (1), elementary rinse bath (2), transition rinse bath (3), last rinse bath (4), water intaking valve (5), filtration processing tank (6), circulating pump (7), separate web plate (8) and soiling solution groove (9), soiling solution groove (9), elementary rinse bath (2), transition rinse bath (3) and last rinse bath (4) from left to right are arranged on the frame (1) successively with raising, water intaking valve (5) interlinks with last rinse bath (4), in the end rinse bath (4) is provided with return port (10) with the sidewall that transition rinse bath (3) is bordered, and return port (10) interlinks by flexible pipe (13) and filtration processing tank (6); In transition rinse bath (3), be provided with and separate web plate (8), separate web plate (8) transition rinse bath (3) is separated into purge chamber (11) and the dirty chamber (12) of overflowing, overflow dirty chamber (12) with rinse bath (4) is adjacent at last, the height of separating web plate (8) is higher than the left side wall of transition rinse bath (3), on the left side wall of transition rinse bath (3), also be provided with return port (10), return port (10) is provided with height and separates web plate (8) quite, and return port (10) interlinks by flexible pipe (13) and filtration processing tank (6); In elementary rinse bath (2), be provided with and separate web plate (8), separate web plate (8) elementary rinse bath (2) is separated into purge chamber (11) and the dirty chamber (12) of overflowing, the height of separating web plate (8) is higher than the left side wall of soiling solution groove (9), bottom in the purge chamber (11) of elementary rinse bath (2) is provided with return port (10), and return port (10) interlinks by flexible pipe (13) and filtration processing tank (6); Between the purge chamber (11) of the pure water inlet of filtration processing tank (6) and elementary rinse bath (2), there is circulating pump (7) to link to each other, the pure water inlet place of the water sucking mouth of circulating pump (7) and filtration processing tank (6) interlinks, and the delivery port of circulating pump (7) interlinks through the purge chamber (11) of flexible pipe (13) with elementary rinse bath (2).
2. according to the described step-type multi-step silicon material cleaning equipment of claim 1, it is characterized in that: between elementary rinse bath (1) and last rinse bath (4), arrange 2～5 transition rinse baths (3) continuously.
3. according to claim 1 or 2 described step-type multi-step silicon material cleaning equipments, it is characterized in that: described filtration processing tank (6) comprises admission chamber (61), purifies chamber (62) and water-purifying cavity (63), be provided with horizontal filtering layer (64) at the upper end open place of admission chamber (61), be provided with side filter course (65) in admission chamber (61) and the side-walls that purifies chamber (62) and purification chamber (62) and water-purifying cavity (63), on the internal partition (66) of filtration processing tank (6), be provided with liquid drain hole (67), in water-purifying cavity (63), be provided with circulating pump (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010018233A CN101773916A (en) | 2010-01-20 | 2010-01-20 | Step-type multi-step silicon material cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010018233A CN101773916A (en) | 2010-01-20 | 2010-01-20 | Step-type multi-step silicon material cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101773916A true CN101773916A (en) | 2010-07-14 |
Family
ID=42510578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010018233A Pending CN101773916A (en) | 2010-01-20 | 2010-01-20 | Step-type multi-step silicon material cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101773916A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102054903A (en) * | 2010-12-14 | 2011-05-11 | 浙江宝利特新能源股份有限公司 | Automatic tank replacing type cleaning device for solar battery silicon wafer cleaning machine |
| CN102231943A (en) * | 2011-06-24 | 2011-11-02 | 高德（无锡）电子有限公司 | Horizontal-line multi-washing serial washing overflow structure |
| CN102266859A (en) * | 2011-07-25 | 2011-12-07 | 营口晶晶光电科技有限公司 | Method and device for cleaning cauliflower-shaped polycrystalline silicon raw material with oxides on surface thereof |
| CN102315318A (en) * | 2011-07-07 | 2012-01-11 | 苏州赤诚洗净科技有限公司 | Water-saving washing device of solar battery silicon wafer |
| CN102343340A (en) * | 2011-10-20 | 2012-02-08 | 高佳太阳能股份有限公司 | Rinsing groove for silicon wafer cleaning machine |
| CN102615077A (en) * | 2012-04-13 | 2012-08-01 | 保定天威英利新能源有限公司 | Solar battery silicon chip cleaning machine and control method thereof |
| CN102847480A (en) * | 2012-09-19 | 2013-01-02 | 北京七星华创电子股份有限公司 | Chemical liquid mixing device and method |
| CN104172442A (en) * | 2014-05-30 | 2014-12-03 | 成都金大洲实业发展有限公司 | Automatic circulation rinsing device and rinsing method for edible material processing |
| CN105396831A (en) * | 2015-11-20 | 2016-03-16 | 无锡南方声学工程有限公司 | Cleaning pool structure of ultrasonic cleaning machine |
| CN109013536A (en) * | 2018-07-11 | 2018-12-18 | 田康 | A kind of silicon powder ultrasonic cleaning equipment |
| CN110201959A (en) * | 2019-05-31 | 2019-09-06 | 苏州卡利肯新光讯科技有限公司 | A kind of Water-saving cleaner and its control method |
| CN110587885A (en) * | 2019-08-29 | 2019-12-20 | 陈晓东 | Multistage swash plate forming device |
| CN113941560A (en) * | 2021-10-15 | 2022-01-18 | 广州六捌一机械有限公司 | Ultrasonic cleaner of ladder flowing water formula |
| CN114247693A (en) * | 2021-12-20 | 2022-03-29 | 永臻科技股份有限公司 | System and method for cleaning dirt on end head of clamp |
| JP7085366B2 (en) | 2018-03-02 | 2022-06-16 | 株式会社アイホー | Cleaning equipment |
-
2010
- 2010-01-20 CN CN201010018233A patent/CN101773916A/en active Pending
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102054903B (en) * | 2010-12-14 | 2012-03-28 | 浙江宝利特新能源股份有限公司 | Automatic tank replacing type cleaning device for solar battery silicon wafer cleaning machine |
| CN102054903A (en) * | 2010-12-14 | 2011-05-11 | 浙江宝利特新能源股份有限公司 | Automatic tank replacing type cleaning device for solar battery silicon wafer cleaning machine |
| CN102231943A (en) * | 2011-06-24 | 2011-11-02 | 高德（无锡）电子有限公司 | Horizontal-line multi-washing serial washing overflow structure |
| CN102231943B (en) * | 2011-06-24 | 2012-10-10 | 高德（无锡）电子有限公司 | Horizontal-line multi-washing serial washing overflow structure |
| CN102315318A (en) * | 2011-07-07 | 2012-01-11 | 苏州赤诚洗净科技有限公司 | Water-saving washing device of solar battery silicon wafer |
| CN102266859A (en) * | 2011-07-25 | 2011-12-07 | 营口晶晶光电科技有限公司 | Method and device for cleaning cauliflower-shaped polycrystalline silicon raw material with oxides on surface thereof |
| CN102343340B (en) * | 2011-10-20 | 2016-01-13 | 高佳太阳能股份有限公司 | The potcher of silicon wafer cleaner |
| CN102343340A (en) * | 2011-10-20 | 2012-02-08 | 高佳太阳能股份有限公司 | Rinsing groove for silicon wafer cleaning machine |
| CN102615077A (en) * | 2012-04-13 | 2012-08-01 | 保定天威英利新能源有限公司 | Solar battery silicon chip cleaning machine and control method thereof |
| CN102615077B (en) * | 2012-04-13 | 2014-08-27 | 保定天威英利新能源有限公司 | Solar battery silicon chip cleaning machine and control method thereof |
| CN102847480A (en) * | 2012-09-19 | 2013-01-02 | 北京七星华创电子股份有限公司 | Chemical liquid mixing device and method |
| CN104172442A (en) * | 2014-05-30 | 2014-12-03 | 成都金大洲实业发展有限公司 | Automatic circulation rinsing device and rinsing method for edible material processing |
| CN105396831A (en) * | 2015-11-20 | 2016-03-16 | 无锡南方声学工程有限公司 | Cleaning pool structure of ultrasonic cleaning machine |
| JP7085366B2 (en) | 2018-03-02 | 2022-06-16 | 株式会社アイホー | Cleaning equipment |
| CN109013536A (en) * | 2018-07-11 | 2018-12-18 | 田康 | A kind of silicon powder ultrasonic cleaning equipment |
| CN109013536B (en) * | 2018-07-11 | 2021-08-20 | 崇义县源德矿业有限公司 | Silica flour ultrasonic cleaning device |
| CN110201959A (en) * | 2019-05-31 | 2019-09-06 | 苏州卡利肯新光讯科技有限公司 | A kind of Water-saving cleaner and its control method |
| CN110587885A (en) * | 2019-08-29 | 2019-12-20 | 陈晓东 | Multistage swash plate forming device |
| CN113941560A (en) * | 2021-10-15 | 2022-01-18 | 广州六捌一机械有限公司 | Ultrasonic cleaner of ladder flowing water formula |
| CN114247693A (en) * | 2021-12-20 | 2022-03-29 | 永臻科技股份有限公司 | System and method for cleaning dirt on end head of clamp |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101773916A (en) | Step-type multi-step silicon material cleaning equipment | |
| CN101773915B (en) | Multilevel circulating cleaning equipment for solar cell silicon wafers | |
| CN201684745U (en) | Step-type multistage silicon material cleaning apparatus | |
| CN203461901U (en) | Recycling system for cleaning water of koji making mould box for making wine | |
| CN201586649U (en) | Multistage circulating cleaning equipment for solar cell silicon chip | |
| CN202655283U (en) | Multi-stage circulated cleaning equipment | |
| CN108379885A (en) | A kind of detention tank and its combined-flow are from clear method | |
| CN202021177U (en) | Multi-stage circulation cleaning equipment for solar silicon wafer | |
| CN208839200U (en) | Steelmaking converter turbid circulating water secondary treatment system | |
| CN107175229B (en) | Stamping forming's TV set backplate flushing cycle system | |
| CN109384324B (en) | Washing and sweeping vehicle washs water cyclic utilization processing system | |
| CN208018273U (en) | A kind of slag-soil truck cleaning waste water circulation utilized device | |
| CN206881242U (en) | High efficiency oil-water separate tank | |
| CN207056050U (en) | A kind of sludge plate compression equipment | |
| CN216295736U (en) | Purifying equipment for treating semiconductor waste gas | |
| CN115770419A (en) | Vertical inclined tube precipitation structure and application | |
| CN209577569U (en) | A kind of photovoltaic welding belt water-saving cleaning system | |
| CN210825665U (en) | Glass edging process water circle device | |
| CN210559719U (en) | Self-circulation water treatment facilities of electrophoresis application | |
| CN210023074U (en) | Cleaning fluid recovery device | |
| CN209307110U (en) | A kind of beet cleaning water pretreatment system | |
| CN106378336A (en) | Continuous type cleaning machine for automobile parts | |
| CN218574367U (en) | Wash water saving fixtures of zongzi leaf | |
| CN109160583A (en) | The treatment process of cast pipe coating slime water | |
| CN210023296U (en) | Ultrasonic cleaning device for enameled flat wire conductor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20100714 |