CN102343340B - The potcher of silicon wafer cleaner - Google Patents

The potcher of silicon wafer cleaner Download PDF

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Publication number
CN102343340B
CN102343340B CN201110322826.6A CN201110322826A CN102343340B CN 102343340 B CN102343340 B CN 102343340B CN 201110322826 A CN201110322826 A CN 201110322826A CN 102343340 B CN102343340 B CN 102343340B
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China
Prior art keywords
potcher
water level
level controller
potchers
silicon wafer
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Active
Application number
CN201110322826.6A
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Chinese (zh)
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CN102343340A (en
Inventor
刘伟
王欣
杨乐
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Konca Solar Cell Co Ltd
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Konca Solar Cell Co Ltd
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Priority to CN201110322826.6A priority Critical patent/CN102343340B/en
Publication of CN102343340A publication Critical patent/CN102343340A/en
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  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention discloses a kind of potcher of silicon wafer cleaner, comprise front and back two parts, first half arranges five potchers successively, latter half arranges two potchers successively, the outermost potcher I of described first half is connected with water inlet, and between the potcher V of potcher I and first half inner side, stepped construction from high to low is all adopted between potcher VI and outside potcher VII inside latter half, described potcher V is connected by an overflow pipe with potcher VI, described potcher VII offers sewage draining exit, described overflow pipe is provided with catch basin, in described catch basin, water level controller is installed, water level controller is connected with tubing pump.This potcher adopts Ladder Overflow formula structure, only needs a water inlet and delivery port, has that structure is simple, the advantage of reduce water consumption.

Description

The potcher of silicon wafer cleaner
Technical field
The present invention relates to a kind of potcher of silicon wafer cleaner, particularly relate to a kind of silicon wafer cleaner potcher of water-saving overflow-type.
Background technology
The silicon wafer cleaner potcher of current use is divided into two parts, first half comprises five potchers arranged successively, latter half comprises two potchers arranged successively, two immersion slots are arranged successively between first half and latter half, every two potchers are the unit that works alone, seven potchers have four water inlets and delivery port, make silicon wafer cleaner water consumption comparatively large, cause the waste of water resource.
Summary of the invention
The object of the invention is to solve the problem, provide a kind of potcher of silicon wafer cleaner, it adopts overflow-type structure, only needs a water inlet and delivery port, has that structure is simple, the advantage of reduce water consumption.
The object of the invention is to be achieved through the following technical solutions:
A kind of potcher of silicon wafer cleaner, comprise front and back two parts, first half arranges five potchers successively, latter half arranges two potchers successively, the outermost potcher I of described first half is connected with water inlet, and between the potcher V of potcher I and first half inner side, stepped construction from high to low is all adopted between potcher VI and outside potcher VII inside latter half, described potcher V is connected by an overflow pipe with potcher VI, described potcher VII offers sewage draining exit, described overflow pipe is provided with catch basin, in described catch basin, water level controller is installed, water level controller is connected with tubing pump.
Described water level controller comprises high water level controller and low water level controller.
In described potcher, material inductor is all installed.
When there being silicon chip basketry to enter potcher, material inductor transmits signals to control system, and control cleaning machine and enter duty, when silicon chip basketry leaves potcher, material inductor transmits signals to control system, controls cleaning machine and enters holding state.
Beneficial effect of the present invention is: between the potcher V of potcher I and first half inner side, all adopt stepped construction from high to low inside latter half between potcher VI and outside potcher VII, making between potcher is overflow pattern, without the need to increasing pipeline; By being connected by potcher V and potcher VI overflow pipe, namely realizing being communicated with of first half and latter half, making only to need a water inlet and delivery port; By arranging water level controller, when the water level in catch basin reaches the high water level of setting, high water level controller controls tubing pump and carries out draining, otherwise, low water level controller controls tubing pump and stops draining, have the advantage that automaticity is high, contrast prior art, this potcher has that structure is simple, the advantage of reduce water consumption.
Accompanying drawing explanation
According to drawings and embodiments the present invention is described in further detail below.
Fig. 1 is the structural representation of the potcher of silicon wafer cleaner of the present invention.
In figure:
1, potcher I; 2, potcher V; 3, washing trough VI; 4, potcher VII; 5, overflow pipe; 6, catch basin; 7, tubing pump; 8, water inlet; 9, sewage draining exit.
Detailed description of the invention
As shown in Figure 1, in the present embodiment, the potcher of silicon wafer cleaner of the present invention, comprise front and back two parts, first half arranges five potchers successively, latter half arranges two potchers successively, the outermost potcher I 1 of first half is connected with water inlet 8, and between the potcher V 2 of potcher I 1 and first half inner side, stepped construction from high to low is all adopted between potcher VI 3 and outside potcher VII 4 inside latter half, potcher V 2 is connected by an overflow pipe 5 with potcher VI 3, potcher VII 4 offers sewage draining exit 9, overflow pipe 5 is provided with catch basin 6, in catch basin 6, water level controller is installed, water level controller is connected with tubing pump 7, water level controller comprises high water level controller and low water level controller.
Between the potcher V 2 of potcher I 1 and first half inner side, inside latter half, between potcher VI 3 and outside potcher VII 4, all adopting stepped construction from high to low, making to be overflow pattern between potcher, without the need to increasing pipeline; By being connected by potcher V 2 and potcher VI 3 overflow pipe 5, namely realizing being communicated with of first half and latter half, making only to need a water inlet 8 and sewage draining exit 9; By arranging water level controller, when the water level in catch basin 6 reaches the high water level of setting, high water level controller controls tubing pump 7 and carries out draining, otherwise, low water level controller controls tubing pump 7 and stops draining, has that automaticity is high, structure is simple, the advantage of reduce water consumption
In each potcher, material inductor is all installed, when there being silicon chip basketry to enter potcher, material inductor transmits signals to control system, control cleaning machine and enter duty, when silicon chip basketry leaves potcher, material inductor transmits signals to control system, controls cleaning machine and enters holding state, further save with water, power consumption.

Claims (2)

1. the potcher of a silicon wafer cleaner, comprise front and back two parts, first half arranges five potchers successively, latter half arranges two potchers successively, it is characterized in that: the outermost potcher I of described first half is connected with water inlet, and between the potcher V of potcher I and first half inner side, stepped construction from high to low is all adopted between potcher VI and outside potcher VII inside latter half, described potcher V is connected by an overflow pipe with potcher VI, described potcher VII offers sewage draining exit, described overflow pipe is provided with catch basin, in described catch basin, water level controller is installed, water level controller is connected with tubing pump, in described potcher, material inductor is all installed, when there being silicon chip basketry to enter potcher, material inductor transmits signals to control system, control cleaning machine and enter duty, when silicon chip basketry leaves potcher, material inductor transmits signals to control system, control cleaning machine and enter holding state.
2. the potcher of silicon wafer cleaner according to claim 1, is characterized in that: described water level controller comprises high water level controller and low water level controller.
CN201110322826.6A 2011-10-20 2011-10-20 The potcher of silicon wafer cleaner Active CN102343340B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201110322826.6A CN102343340B (en) 2011-10-20 2011-10-20 The potcher of silicon wafer cleaner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201110322826.6A CN102343340B (en) 2011-10-20 2011-10-20 The potcher of silicon wafer cleaner

Publications (2)

Publication Number Publication Date
CN102343340A CN102343340A (en) 2012-02-08
CN102343340B true CN102343340B (en) 2016-01-13

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110322826.6A Active CN102343340B (en) 2011-10-20 2011-10-20 The potcher of silicon wafer cleaner

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CN (1) CN102343340B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06132270A (en) * 1992-10-15 1994-05-13 Mitsubishi Electric Corp Wet cleaner and its chemical exchanging method
JP3538470B2 (en) * 1995-02-17 2004-06-14 株式会社ダン科学 Downward rectification type immersion cleaning device
CN101773916A (en) * 2010-01-20 2010-07-14 常州亿晶光电科技有限公司 Stepped multi-stage silicon material cleaning equipment
CN101773915A (en) * 2010-01-20 2010-07-14 常州亿晶光电科技有限公司 Multistage circulating cleaning equipment for solar cell silicon wafers
CN202316398U (en) * 2011-10-20 2012-07-11 高佳太阳能股份有限公司 Rinsing groove for silicon wafer cleaning machine

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06132270A (en) * 1992-10-15 1994-05-13 Mitsubishi Electric Corp Wet cleaner and its chemical exchanging method
JP3538470B2 (en) * 1995-02-17 2004-06-14 株式会社ダン科学 Downward rectification type immersion cleaning device
CN101773916A (en) * 2010-01-20 2010-07-14 常州亿晶光电科技有限公司 Stepped multi-stage silicon material cleaning equipment
CN101773915A (en) * 2010-01-20 2010-07-14 常州亿晶光电科技有限公司 Multistage circulating cleaning equipment for solar cell silicon wafers
CN202316398U (en) * 2011-10-20 2012-07-11 高佳太阳能股份有限公司 Rinsing groove for silicon wafer cleaning machine

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