JP3538470B2 - Downward rectification type immersion cleaning device - Google Patents
Downward rectification type immersion cleaning deviceInfo
- Publication number
- JP3538470B2 JP3538470B2 JP02902995A JP2902995A JP3538470B2 JP 3538470 B2 JP3538470 B2 JP 3538470B2 JP 02902995 A JP02902995 A JP 02902995A JP 2902995 A JP2902995 A JP 2902995A JP 3538470 B2 JP3538470 B2 JP 3538470B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- cleaning
- cleaning liquid
- cleaned
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、洗浄槽の液表面の浮遊
粒子を除去し、供給液の流量変動に対する液面制御が可
能な下降整流式の浸漬洗浄装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a descending rectifying type immersion cleaning apparatus capable of removing suspended particles on the liquid surface of a cleaning tank and controlling the liquid level with respect to fluctuations in the flow rate of a supply liquid.
【0002】[0002]
【従来の技術】半導体ウエハや液晶用ガラス基板の洗浄
は、従来から被洗浄物を洗浄液中に浸漬して洗浄する浸
漬化学洗浄を主として行っている。洗浄は、洗浄薬液中
で処理して被洗浄物に付着した汚れを除去する工程と、
処理後の被洗浄物に残存付着している洗浄薬液を純水で
すすぐ工程と、すすぎ後の被洗浄物を乾燥する工程とか
らなっている。2. Description of the Related Art Conventionally, semiconductor wafers and glass substrates for liquid crystals have been mainly cleaned by immersion chemical cleaning in which an object to be cleaned is immersed in a cleaning liquid. Cleaning is a step of removing dirt attached to the object to be cleaned by processing in a cleaning chemical solution,
The method includes a step of rinsing the cleaning liquid remaining on the object to be cleaned after treatment with pure water and a step of drying the object to be cleaned after rinsing.
【0003】洗浄薬液による浸漬洗浄の場合には、被洗
浄物から遊離した汚染粒子が洗浄液中に分散し、被洗浄
物の数が増大すると洗浄槽内に蓄積される汚染粒子の濃
度が高くなり、洗浄済の被洗浄物に対して上記粒子によ
る再汚染が生じるという問題があり、洗浄槽内の洗浄液
の一部を連続的に抜き出して濾過器を通し、分散する汚
染粒子を除いたのち再び元の槽に戻す、いわゆる循環濾
過を行うことが不可欠になっている。このように洗浄槽
から洗浄液を抜き出して再び洗浄槽に戻す方法には、従
来からオーバーフロー方式の洗浄槽が用いられていた。[0003] In the case of immersion cleaning using a cleaning chemical solution, contaminant particles released from an object to be cleaned are dispersed in the cleaning liquid, and as the number of objects to be cleaned increases, the concentration of the contaminant particles accumulated in the cleaning tank increases, so that cleaning is performed. There is a problem that re-contamination by the above-mentioned particles occurs on the cleaned object to be cleaned, and a part of the cleaning liquid in the cleaning tank is continuously withdrawn and passed through a filter to remove the dispersed contaminating particles, and then the original cleaning liquid is returned. It is indispensable to carry out so-called circulation filtration by returning to the tank. As described above, an overflow type cleaning tank has been conventionally used as a method of extracting the cleaning liquid from the cleaning tank and returning the cleaning liquid to the cleaning tank again.
【0004】一方、すすぎを行う純水リンスの場合に
は、リンス槽の下部から新鮮な純水を連続的に供給し、
リンス槽の上端の周縁部を越えて純水を槽外に溢流さ
せ、洗浄槽から引き上げた被洗浄物に付着して洗浄液が
混入しても、リンス槽内の純水の水質が供給純水の水質
と一致するまで続けるという方法が行われている。On the other hand, in the case of pure water rinsing for rinsing, fresh pure water is continuously supplied from the lower part of the rinsing tank,
Pure water overflows beyond the peripheral edge at the top of the rinsing tank and overflows outside the tank. There is a method of continuing until the quality of the water matches.
【0005】洗浄液の循環濾過の場合も純水リンスの場
合も、洗浄槽やリンス槽に持ち込まれた薬液成分や汚れ
を短時間で完全に排出する能力が高い程、すなわち排出
置換効率が高い程、浸漬洗浄の高洗浄品質を短時間で経
済的に得ることができる。しかしながら、従来の浸漬洗
浄用の槽は、槽の底側から洗浄液または純水を供給し、
槽の上端から溢流させるオーバーフロー方式がもっぱら
用いられている。[0005] In both the case of circulating filtration of the cleaning liquid and the case of rinsing with pure water, the higher the ability to completely and completely remove the chemical components and dirt brought into the cleaning tank or the rinsing tank in a short time, that is, the higher the discharge and replacement efficiency. In addition, high washing quality of immersion washing can be economically obtained in a short time. However, the conventional immersion cleaning tank supplies a cleaning liquid or pure water from the bottom side of the tank,
The overflow method that overflows from the upper end of the tank is mainly used.
【0006】比較的狭い間隔で多数配置されたウエハや
基板等の被洗浄物を洗浄するために、オーバーフロー洗
浄を行っている洗浄槽内の水流を可視化して観察する
と、図6(a)に示すように洗浄槽11の底部から供給
され、(b)に示すすのこ状の被洗浄物支持板12を通
過した洗浄液は、被洗浄物間の狭い間隙は通らずに、被
洗浄物13の周囲と槽内壁との間の広い領域を主に流れ
て上昇する。そして、槽の上縁より溢出するが、上昇流
の一部は液表面に沿って槽の中心方向に移動し、さらに
被洗浄物13の上部からウエハや基板等が作る狭い隙間
を通るゆるやかな下降流に変化する。このゆるやかな下
降流は被洗浄物の下部で供給液の上昇流に誘引され混合
する。すなわち、洗浄槽内には槽の壁側から槽の中心に
向う循環流を生じるが、この循環流はつぎの2点で重要
である。FIG. 6A shows a visualization of a water flow in a cleaning tank in which overflow cleaning is performed in order to clean a large number of objects to be cleaned such as wafers and substrates arranged at relatively small intervals. The cleaning liquid supplied from the bottom of the cleaning tank 11 as shown in FIG. 3B and having passed through the scoop-shaped cleaning object support plate 12 shown in FIG. It flows mainly through a wide area between the tank and the inner wall of the tank and rises. Then, although the liquid overflows from the upper edge of the tank, a part of the upward flow moves toward the center of the tank along the liquid surface, and further slowly passes through a narrow gap formed by a wafer, a substrate, and the like from above the object 13 to be cleaned. It changes to descending flow. This gentle downward flow is attracted to and mixed with the upward flow of the supply liquid below the object to be cleaned. That is, a circulating flow is generated in the cleaning tank from the tank wall side toward the center of the tank, and this circulating flow is important in the following two points.
【0007】その1は、ウエハや基板のような被洗浄物
をバッチ処理する場合に、被洗浄物の表面における洗浄
液の流れが供給液の流量の大きさに比して非常に遅くな
り、被洗浄物表面からの汚染物の離脱作用および離脱汚
染の被洗浄物近傍から排除する作用が十分に発揮され
ず、供給される洗浄液の大部分は洗浄作用に貢献せずに
流出することになる。またその2は、被洗浄物から離脱
した汚染物が、洗浄槽内の循環流に乗り長時間滞留す
る。そのため、洗浄後の清浄な被洗浄物が再び汚染さ
れ、完全に洗浄されるまでには著しく長時間を要するこ
とになる。The first problem is that, when batch processing is performed on an object to be cleaned such as a wafer or a substrate, the flow of the cleaning liquid on the surface of the object to be cleaned becomes extremely slow as compared with the flow rate of the supply liquid. The function of removing contaminants from the surface of the cleaning object and the function of removing the contaminated substances from the vicinity of the object to be cleaned are not sufficiently exhibited, and most of the supplied cleaning liquid flows out without contributing to the cleaning operation. Second, the contaminants detached from the object to be cleaned stay in the circulation flow in the cleaning tank for a long time. Therefore, a clean object to be cleaned after cleaning is again contaminated, and it takes an extremely long time until it is completely cleaned.
【0008】上記問題点の対策として、図7(a)
(b)に示すように被洗浄物の直下部分だけを除きその
他の支持板部分を遮蔽し、槽の底面から注入された洗浄
液が直接被洗浄物の間を通って上昇するようにするとい
う考えがある。上記の場合に流れを可視化して調べる
と、被洗浄物の間隙を通って液面に達した上昇流は槽壁
に向う水平流となって洗浄槽の上縁から溢流するが、水
平流の可成りの部分は槽壁に衝突したのち槽壁に沿う下
降流となり、洗浄槽内の支持板に当り中心方向に向い上
昇流に誘引されて混合する。すなわち、前記循環流とは
逆向きの循環流が槽壁に向けて生じる。上記その1に示
した問題点は改善されるが、その2の問題点は解決され
ず、十分な洗浄品質を得るには長時間の洗浄処理を必要
とする。As a countermeasure against the above problem, FIG.
As shown in (b), the idea is to shield the other support plate except for the portion directly below the object to be cleaned, so that the cleaning liquid injected from the bottom of the tank directly rises between the objects to be cleaned. There is. When the flow is visualized and examined in the above case, the upward flow that reaches the liquid level through the gap between the objects to be cleaned becomes a horizontal flow toward the tank wall and overflows from the upper edge of the cleaning tank. After a considerable portion of the tank collides with the tank wall, it forms a downward flow along the tank wall, hits the support plate in the cleaning tank, and is attracted to the upward flow toward the center to mix. That is, a circulating flow opposite to the circulating flow is generated toward the tank wall. Although the first problem described above is improved, the second problem is not solved, and a long cleaning process is required to obtain sufficient cleaning quality.
【0009】上記オーバーフロー方式の欠点の解決法と
して、被洗浄物を通過した汚染洗浄液を、細孔を設けた
多孔板を介して洗浄槽底部より強制的に排出し、その排
出流量に見合う洗浄液を洗浄槽内壁に沿って一様に上昇
させて供給する方法を用いた新しい洗浄槽を出願した
(特願平5−260505号)。As a solution to the drawbacks of the overflow method, the contaminated cleaning liquid that has passed through the object to be cleaned is forcibly discharged from the bottom of the cleaning tank through a perforated plate provided with pores, and the cleaning liquid corresponding to the discharge flow rate is removed. We have applied for a new washing tank using a method in which the ink is uniformly raised and supplied along the inner wall of the washing tank (Japanese Patent Application No. 5-260505).
【0010】上記洗浄槽で被洗浄物を洗浄するときの状
態は、洗浄液の流れを可視化して観察した結果は図8に
示すとおりである。被洗浄物13下の多孔板14を介し
て洗浄液をポンプで下方に吸引するため、多孔板に適宜
分散配置した複数の細孔の吸い込み流速はほぼ一様にな
っている。したがって、洗浄槽の被洗浄物設置部では、
一様な流速に整えられた下降流が形成される。そのた
め、被洗浄物の周囲と槽壁間の大きな間隙に選択的に流
れる偏流が生じにくく、被洗浄物であるウエハや基板の
間の狭い隙間にも洗浄液がよく流れ、しかも多くの隙間
の間で流速が一様化されている。FIG. 8 shows the condition when the object to be cleaned is cleaned in the cleaning tank and the flow of the cleaning solution is visualized and observed. Since the cleaning liquid is sucked downward by the pump through the perforated plate 14 under the object 13 to be cleaned, the suction flow rates of the plurality of fine pores appropriately dispersed and arranged on the perforated plate are substantially uniform. Therefore, at the cleaning object installation part of the cleaning tank,
A downward flow adjusted to a uniform flow velocity is formed. Therefore, it is difficult for the drift to selectively flow in the large gap between the periphery of the object to be cleaned and the tank wall, and the cleaning liquid flows well also in the narrow gap between the wafer and the substrate to be cleaned. , The flow velocity is made uniform.
【0011】被洗浄物へ洗浄液を供給する方法にはいろ
いろ考えられるが、下降流の整流が良好に行われるため
には、被洗浄物に対する洗浄液の供給の仕方が重要であ
り、被洗浄物に対し周囲から流入する洗浄液の流速が一
様であるのが最もよい条件である。そのため、洗浄槽を
外槽と内槽とからなる2重槽構造とし、外槽壁と内槽壁
との間隙を利用し下部からの上昇流として、新しい洗浄
液を供給する方法をとっている。この場合、洗浄液の注
入口は前後左右対称になるように4個設けることが望ま
しく、少なくとも対称位置に2個設けることは必要であ
る。注入洗浄液の上昇流は、注入口を中心にした流速の
分布を生じることが防げない。この流速分布をできるだ
け緩和するための方法として、例えば注入口近傍に流れ
を分散させる障害物を設けるか、他の方法として外槽と
内槽との間の壁間隙に整流のための多孔板を設けること
である。There are various methods for supplying the cleaning liquid to the object to be cleaned. However, in order to rectify the downward flow satisfactorily, it is important to supply the cleaning liquid to the object to be cleaned. On the other hand, the best condition is that the flow rate of the cleaning liquid flowing from the surroundings is uniform. For this reason, a method is adopted in which the cleaning tank has a double tank structure including an outer tank and an inner tank, and a new cleaning liquid is supplied as an upward flow from below using a gap between the outer tank wall and the inner tank wall. In this case, it is desirable to provide four cleaning liquid injection ports so as to be symmetrical in the front-rear and left-right directions, and it is necessary to provide at least two injection ports at symmetric positions. The upward flow of the injection cleaning liquid cannot prevent the distribution of the flow velocity around the injection port from occurring. As a method for mitigating this flow velocity distribution as much as possible, for example, providing an obstacle to disperse the flow near the injection port, or as another method, a perforated plate for rectification in the wall gap between the outer tank and the inner tank It is to provide.
【0012】このような洗浄槽では、被洗浄物によって
槽内に持ち込まれた薬液や汚れ物質は早い下降整流で被
洗浄物表面から離脱し、速やかに移送され槽底から排出
される。被洗浄物は槽内に生じる下降整流の中に設置さ
れるため、遊離した汚染物質の滞留がなく、洗浄槽内で
は洗浄液の置換が短時間で行われて清浄になる。すなわ
ち、高品質の洗浄をオーバーフロー方式の洗浄槽よりも
短時間に完了でき、経済的に有利である。In such a cleaning tank, chemicals and contaminants brought into the tank by the object to be cleaned are separated from the surface of the object to be cleaned by rapid downflow rectification, quickly transferred, and discharged from the bottom of the tank. Since the object to be cleaned is placed in the downward rectification generated in the tank, there is no stagnation of released contaminants, and the cleaning liquid is replaced in the cleaning tank in a short time to be cleaned. That is, high-quality cleaning can be completed in a shorter time than the overflow-type cleaning tank, which is economically advantageous.
【0013】同一の槽容積のオーバーフロー槽と下降整
流槽を用い、同一流量の純水によるすすぎ、すなわち純
粋リンスを行った。この際の槽内持込みイオンの置換排
出特性を比較して示すと図9(a)のようになる。それ
ぞれの槽から流出する純水の導電率を縦軸に対数目盛で
とり、食塩水中に浸漬しておいたウエハカセットを引き
上げてリンス槽中に入れたときを基準にし、リンスの経
過時間を等分目盛で横軸にとっている。ただし、各時刻
における導電率値としてはカセットを槽中に入れた直後
の最も高い値との比率で示してある。図9(a)から明
らかなように、下降整流槽の場合を示す実線の方が槽内
イオン濃度の低下が早く、同一の濃度に減少するまでの
リンス時間は、破線で示すオーバーフロー槽の場合の約
1/2である。供給する純水の流量が同じであるから、
下降整流槽を用いることにより高価な純水の使用水量は
半分でよいことになり、ランニングコストの大幅な削減
を行うことができる。Using an overflow tank and a descending rectification tank having the same tank volume, rinsing with pure water at the same flow rate, that is, pure rinsing was performed. FIG. 9A shows the replacement and discharge characteristics of the ions carried into the tank at this time. The conductivity of the pure water flowing out of each tank is plotted on a logarithmic scale on the vertical axis, and the elapsed time of rinsing is based on the time when the wafer cassette immersed in the saline solution is pulled up and placed in the rinsing tank. The horizontal axis is on a minute scale. However, the conductivity value at each time is shown as a ratio with the highest value immediately after the cassette is placed in the tank. As is clear from FIG. 9 (a), the solid line indicating the case of the descending rectification tank has a faster decrease of the ion concentration in the tank, and the rinsing time until the ion concentration decreases to the same concentration is the case of the overflow tank indicated by the broken line. About 1/2 of Because the pure water flow rate is the same,
By using the descending rectification tank, the amount of expensive pure water used can be halved, and the running cost can be significantly reduced.
【0014】また、循環濾過を行っている洗浄槽内の粒
子濃度の減少速度についても、図9(b)に示すように
下降整流槽はオーバーフロー槽に比べ約2倍の値を有し
ている。すなわち、被洗浄物により槽内に持ち込まれた
汚染微粒子は、同一条件で循環濾過したとして下降整流
槽ではオーバーフロー槽の場合の約半分の時間で濾過し
除去され、被洗浄物への汚染微粒子による再汚染の機会
を著しく減らし、高清浄な洗浄面を得ることが期待でき
る。上記のように下降整流槽を用いることによって槽内
の循環流を発生させることなく、ウエハやガラス基板の
洗浄時のように被洗浄物間の狭い間隙にかなりの流速
で、しかも一様に純水を流すことができるようになり、
オーバーフロー槽に比べ高品質の洗浄が迅速かつ経済的
に実施できる。Also, as shown in FIG. 9 (b), the descending rectification tank has a value about twice as large as that of the overflow tank with respect to the reduction rate of the particle concentration in the washing tank performing the circulation filtration. . In other words, the contaminated fine particles brought into the tank by the object to be cleaned are filtered and removed in about half the time of the overflow tank in the descending rectification tank assuming that they are circulated and filtered under the same conditions, and the contaminant particles to the object to be cleaned are removed. It can be expected that the chance of re-contamination will be significantly reduced and a high-purity cleaning surface will be obtained. By using the descending rectifying tank as described above, a circulating flow in the tank is not generated, and a considerable flow rate is applied to a narrow gap between the objects to be cleaned, such as when cleaning a wafer or a glass substrate, and the pure water is uniformly distributed. Water can now flow,
High-quality washing can be performed quickly and economically as compared with the overflow tank.
【0015】[0015]
【発明が解決しようとする課題】しかしながら、上記下
降整流式の洗浄槽を用いて実際に洗浄液またはリンスを
行う場合に、つぎに示すような問題点がある。すなわ
ち、供給流量と排出流量とが一致しないと液面の変動
を生じる。液面上に浮遊している汚染微粒子等がある
とそのまま液面に滞留しつづけるため、洗浄後に被洗浄
物を槽外に取り出す際に、上記浮遊微粒子が被洗浄物に
付着し再汚染の原因になる。However, there are the following problems when the cleaning liquid or the rinsing is actually performed using the cleaning tank of the descending rectification type. That is, if the supply flow rate and the discharge flow rate do not match, the liquid level fluctuates. If there are contaminant particles floating on the liquid surface, they will stay on the liquid surface as it is, so when the object to be cleaned is taken out of the tank after cleaning, the above-mentioned floating particles adhere to the object to be cleaned and cause recontamination. become.
【0016】また、液面変動により下降し内槽の上縁に
液面が接近すると、内槽内への洗浄液の流入の状態が乱
れ、槽内における洗浄液の整流性がくずれ、洗浄液の置
換効率が低下する。When the liquid level changes and the liquid level approaches the upper edge of the inner tank, the flow of the cleaning liquid into the inner tank is disturbed, the rectification of the cleaning liquid in the tank is lost, and the efficiency of replacement of the cleaning liquid is reduced. Decreases.
【0017】本発明は、これらの問題点を解決し、洗浄
液または純水の少ない使用流量で、高品質の洗浄を短時
間で行う下降整流式浸漬洗浄装置を得ることを目的とす
る。An object of the present invention is to solve these problems and to provide a descending rectifying type immersion cleaning apparatus for performing high quality cleaning in a short time with a small flow rate of a cleaning liquid or pure water.
【0018】[0018]
【課題を解決するための手段】上記目的は、角形に形成
された内槽と外槽の2重槽からなり、上記内槽と外槽と
の間に設けた間隙の下部から洗浄液を注入し、上記内槽
の上縁から被洗浄物に洗浄液を注ぎ、上記被洗浄物から
遊離した汚染微粒子を含む汚染洗浄液を、多孔板を介し
て内槽底部から排出する下降整流式浸漬洗浄装置におい
て、上記外槽の1側面の上縁に洗浄液の溢出部を設け、
上記溢出部を設けた以外の外槽内側壁中に洗浄液の液面
制御手段を設置するとともに、流量がそれぞれ異なる2
つの流路を洗浄液注入口に設け、上記流量を制御する手
段を設けることにより達成される。また、上記内槽と外
槽との間の間隙上部に多孔板を設け、上記多孔板を透過
した洗浄液が内槽上縁から被洗浄物に注がれることによ
って達成される。さらに、上記液面の制御を槽内壁に設
けたレベルセンサーで行うことにより達成される。すな
わち、上記液面制御や溢出部を設けることにより浮遊微
粒子の排除を行い、上記流量制御手段により洗浄を行っ
ていない状態における洗浄液の低減を実施する機能を備
えるものである。The object of the present invention is to provide a double tank having an inner tank and an outer tank formed in a rectangular shape, and to inject a cleaning liquid from a lower portion of a gap provided between the inner tank and the outer tank. In a descending rectifying type immersion cleaning apparatus, a cleaning liquid is poured into the object to be cleaned from the upper edge of the inner tank, and the contaminated cleaning liquid containing contaminant fine particles released from the object to be cleaned is discharged from the bottom of the inner tank through the perforated plate. An overflow portion of the cleaning liquid is provided on the upper edge of one side of the outer tank,
The cleaning liquid level control means is installed in the inner wall of the outer tank other than the above-mentioned overflow portion, and the flow rates are different from each other.
This is achieved by providing two flow paths at the cleaning liquid inlet and providing means for controlling the flow rate. Further, a perforated plate is provided above the gap between the inner tank and the outer tank, and the cleaning liquid permeated through the perforated plate is poured from the upper edge of the inner tank to the object to be cleaned. Further, the liquid level is controlled by a level sensor provided on the inner wall of the tank. That is, it has a function of eliminating suspended particulates by providing the liquid level control and the overflow portion, and reducing the cleaning liquid in a state where cleaning is not performed by the flow rate control means.
【0019】[0019]
【作用】角形に形成された内槽と、これを囲むように設
けた外槽で2重槽を構成し、上記外槽の4壁面中の1面
の上縁を他の3壁面上縁より低く形成して洗浄液の溢出
部とし、該溢出部の外壁には溢出した洗浄液を受ける溢
水槽と排水管を設けている。なお、上記外槽内壁と内槽
外壁との間に形成される間隙の底部には洗浄液の注入口
を設け、上記間隙の上部には注入洗浄液の整流用多孔板
を内槽の外周にめぐらせている。上記溢出部より低い位
置に上縁が設定された内槽は、被洗浄物が洗浄液に十分
浸漬される位置に多孔板を設けて被洗浄物の設置台と
し、該設置台の下部の内槽底面には排出口を設け、槽外
に設けたポンプにより上記多孔板を通過した汚染洗浄液
を吸引して排出する。なお、上記溢出部および内槽上縁
の洗浄液または純水が溢流する縁の形状は、上記溢流が
一様に行われるようにするために鋸歯状に形成する。A double tank is constituted by an inner tank formed in a square shape and an outer tank provided so as to surround the inner tank, and the upper edge of one of the four wall surfaces of the outer tank is made higher than the upper edge of the other three wall surfaces. An overflow portion of the cleaning liquid is formed to be low, and an overflow tank and a drain pipe for receiving the overflowing cleaning liquid are provided on the outer wall of the overflow portion. A cleaning liquid inlet is provided at the bottom of the gap formed between the inner wall of the outer tank and the outer wall of the inner tank, and a perforated plate for rectifying the injected cleaning liquid is provided around the outer periphery of the inner tank above the gap. ing. The inner tank whose upper edge is set at a position lower than the overflow portion is provided with a perforated plate at a position where the object to be cleaned is sufficiently immersed in the cleaning liquid to serve as a mounting table for the object to be cleaned, and an inner tank below the mounting table. A discharge port is provided on the bottom surface, and the contaminated cleaning liquid that has passed through the perforated plate is sucked and discharged by a pump provided outside the tank. The shape of the overflow portion and the edge of the upper edge of the inner tank where the cleaning liquid or pure water overflows is formed in a sawtooth shape so that the overflow can be uniformly performed.
【0020】上記構成が下降整流式浸漬洗浄槽の基本構
成であり、被洗浄物に対する洗浄液の注入をできるだけ
均一な流速で行うために、上記内槽および外槽間の間隙
に多孔板を設けて注入洗浄液の整流を行っているが、整
流度をさらによくするために、洗浄液の注入口は内槽周
囲の外槽底面で少なくとも2個以上の対称位置を選んで
設ける。The above configuration is the basic configuration of the descending rectification type immersion cleaning tank, and a perforated plate is provided in the gap between the inner tank and the outer tank in order to inject the cleaning liquid into the object to be cleaned at a flow rate as uniform as possible. Although the flushing of the injection cleaning liquid is performed, in order to further improve the degree of rectification, at least two or more symmetrical positions are provided on the bottom of the outer tank around the inner tank in order to further improve the degree of rectification.
【0021】内槽上縁より上方の位置にはレベルセンサ
を設置して平均液面が一定範囲に保たれるようにしてい
る。本発明の洗浄装置では液面をあらかじめ内槽の上縁
より上方に設置するが、注入する洗浄液の流量とポンプ
による排出流量とが一致すれば、当初設定した液面はそ
のまま保持される。しかし実際には流量が多少変動する
のは避けられないから、注入流量と排出流量との流量差
がプラスであれば液面は上昇し、マイナスであれば下降
する。液面の上昇は、上記設定液面の上方のレベルをこ
えても溢出部の縁に到達すれば、当然溢水して排出され
るので余り問題はないが、液面の下降は内槽上縁にまで
接近すると、上記上縁から被洗浄物に流入する洗浄液の
流れが著しく乱れ、その結果内槽内の整流性がくずれ洗
浄液の置換効率が低下してしまう。したがって、洗浄装
置の性能を安定に維持するためには液面のレベルを比較
的狭い範囲に制御することが重要であり、そのために上
限と下限のレベルにレベルセンサを設置して液面レベル
を維持するようにする。A level sensor is provided at a position above the upper edge of the inner tank so that the average liquid level is maintained within a certain range. In the cleaning apparatus of the present invention, the liquid level is previously set above the upper edge of the inner tank, but if the flow rate of the cleaning liquid to be injected matches the discharge flow rate of the pump, the initially set liquid level is maintained as it is. However, in practice, it is unavoidable that the flow rate slightly fluctuates. Therefore, if the flow rate difference between the injection flow rate and the discharge flow rate is plus, the liquid level rises, and if it is minus, it falls. Even if the liquid level rises above the level above the set liquid level and reaches the edge of the overflow portion, it naturally overflows and is drained, so there is not much problem. , The flow of the cleaning liquid flowing from the upper edge to the object to be cleaned is remarkably disturbed. As a result, the rectification in the inner tank is lost and the efficiency of replacing the cleaning liquid is reduced. Therefore, in order to maintain the performance of the cleaning device stably, it is important to control the liquid level within a relatively narrow range. For this purpose, level sensors are installed at the upper and lower levels to reduce the liquid level. Try to maintain.
【0022】また、洗浄液の注入口には、排出口の吸引
流量より僅かに小さい流量用の流路Aと、上記吸引流量
より若干大きな流量用の流路Bとを設け、開閉バルブ、
流量調節ニードルバルブ、流量計、フィルタをそれぞれ
設置し、独立に流量を選定できるようにする。流路Aで
運転すると液面が低下して低位値のレベルセンサに至
り、該センサにより流路Bのバルブが開き液面が上昇
し、高位置の液面レベルセンサに達し、流路Bのバルブ
が閉じ液面が再び下降する。At the inlet of the cleaning liquid, a flow path A for a flow rate slightly smaller than the suction flow rate of the discharge port and a flow path B for a flow rate slightly larger than the suction flow rate are provided.
A flow control needle valve, a flow meter and a filter will be installed so that the flow rate can be selected independently. When the operation is performed in the flow path A, the liquid level is lowered to reach a low value level sensor, the valve of the flow path B is opened by the sensor, the liquid level is raised, and the liquid level sensor in the high position is reached, The valve closes and the liquid level drops again.
【0023】さらに何らかの原因で、洗浄液表面に浮遊
塵埃が落下して液面に滞留した場合には、被洗浄物を槽
から引き上げる時に浮遊塵埃が付着することが避けられ
ない。このような場合は、洗浄液注入口のバルブ以外の
バルブを全べて閉じると液面が上昇し、排出口も閉じら
れているため上位の液面レベルセンサを越え溢出部から
流出するが、この際に浮遊している塵埃は溢出洗浄液と
ともに排出される。上記塵埃が排出されたら閉じたバル
ブを開いて正常な運転に戻す。さらにまた、純水リンス
時に流量が小さい流路Aだけを開き排出口に接続された
吸引ポンプを停止すると、純水が自然流下により排出し
純水の流量を低減できる。循環濾過を行う場合には、吸
引ポンプの行先をドレンの代りに上記流路に接続する。
これらの諸作用により少ない洗浄液の使用流量で、高品
質の洗浄を行うことができる。なお、上記記載は洗浄槽
と洗浄液について主に記載したが、リンス槽における純
水についても全く同様である。Furthermore, if floating dust drops on the surface of the cleaning liquid and stays on the liquid surface for some reason, it is inevitable that the floating dust adheres when the object to be cleaned is lifted from the bath. In such a case, when all valves other than the cleaning liquid inlet valve are closed, the liquid level rises, and since the discharge port is also closed, the liquid level exceeds the upper liquid level sensor and flows out of the overflow portion. The floating dust is discharged together with the overflowing cleaning liquid. When the dust is discharged, open the closed valve to return to normal operation. Furthermore, when only the flow path A having a small flow rate is opened during the pure water rinsing and the suction pump connected to the discharge port is stopped, the pure water is discharged by gravity and the flow rate of the pure water can be reduced. When performing circulation filtration, the destination of the suction pump is connected to the above-mentioned flow path instead of the drain.
By these actions, high quality cleaning can be performed with a small flow rate of the cleaning liquid. Although the above description has been made mainly for the cleaning tank and the cleaning liquid, the same applies to pure water in the rinsing tank.
【0024】[0024]
【実施例】つぎに本発明の下降整流式浸漬洗浄装置の一
実施例を図面とともに説明する。図1は本発明による下
降整流式浸漬洗浄装置の洗浄槽断面を示す図、図2は上
記洗浄槽の外観を示す斜視図、図3は上記洗浄槽の上面
図、図4は液面制御のための説明図、図5は上記浸漬洗
浄装置の配管例を示す図である。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing an embodiment of a descending rectification type immersion cleaning apparatus according to the present invention. FIG. 1 is a view showing a cross section of a cleaning tank of a descending rectification type immersion cleaning apparatus according to the present invention, FIG. 2 is a perspective view showing an appearance of the cleaning tank, FIG. 3 is a top view of the cleaning tank, and FIG. FIG. 5 is a diagram showing a piping example of the immersion cleaning device.
【0025】本発明の下降整流式浸漬洗浄装置用洗浄槽
は図1に示すように、内槽1とこれを囲む外槽2が角形
に形成された2重槽で、外槽2の壁面のうち短辺をなす
1面の上縁を外槽の他面壁の高さより低くして溢出部3
とし、その外側に溢出した洗浄液を受けるための溢水槽
4と排水管5とを設けている。上記内槽1と外槽2との
間に形成される間隙の底面には洗浄液の注入口6を設
け、間隙の上部には複数個の孔を多数あけた多孔板7
を、注入された洗浄液の整流用として内槽1の外壁に沿
って設けている。上記内槽1はその上縁を上記溢水部3
より低い位置に設定し、内槽内において被洗浄物が洗浄
液に十分浸漬される位置に被洗浄物の設置台8を設けて
いるが、上記設置台8は複数個の孔を多数設けた多孔板
で構成され、被洗浄物を洗浄したのちの汚染洗浄液を通
過させ、内槽1内の洗浄液の流れを整流して、上記設置
台8直下の内槽1の底部に設けた排出口9により、槽外
に設けたポンプの働きで汚染洗浄液を吸引して排出す
る。上記構成では注入口6から注入した洗浄液を内槽1
と外槽2とが作る間隙を上昇させ、上記間隙上部に設け
た多孔板7を通過させることにより、整流された洗浄液
を内槽1の上縁から一様の流速で内槽内の被洗浄物に流
し込むが、上記洗浄液の流速を一様にし、より一層整流
化をはかるためには、上記間隙底面における洗浄液注入
口6の配置をできるだけ対称にする必要があり、少なく
とも2個以上を設け例えば図3に示すような対称配置を
行う。As shown in FIG. 1, the cleaning tank for the downward rectification type immersion cleaning apparatus of the present invention is a double tank in which an inner tank 1 and an outer tank 2 surrounding the inner tank 1 are formed in a rectangular shape. The upper edge of one of the short sides is lower than the height of the other wall of the outer tub, and the overflow portion 3
An overflow tank 4 and a drain pipe 5 for receiving the cleaning liquid overflowing to the outside are provided. A cleaning liquid injection port 6 is provided at the bottom of the gap formed between the inner tank 1 and the outer tank 2, and a perforated plate 7 having a plurality of holes is provided at the top of the gap.
Is provided along the outer wall of the inner tank 1 for rectifying the injected cleaning liquid. The upper edge of the inner tank 1 is filled with the overflow 3
A lower position is set, and an installation table 8 for the object to be cleaned is provided at a position where the object to be cleaned is sufficiently immersed in the cleaning liquid in the inner tank. It is constituted by a plate, and passes the contaminated cleaning liquid after cleaning the object to be cleaned, rectifies the flow of the cleaning liquid in the inner tank 1, and discharges the same through a discharge port 9 provided at the bottom of the inner tank 1 directly below the installation table 8. The contaminated cleaning liquid is sucked and discharged by the function of a pump provided outside the tank. In the above configuration, the cleaning liquid injected from the injection port 6 is supplied to the inner tank 1.
By raising the gap formed between the inner tank 1 and the outer tank 2 and passing the same through the perforated plate 7 provided above the gap, the rectified cleaning solution is washed from the upper edge of the inner tank 1 at a uniform flow rate in the inner tank. In order to make the flow rate of the cleaning liquid uniform and to further stabilize the flow, it is necessary to arrange the cleaning liquid inlet 6 at the bottom of the gap as symmetrically as possible. A symmetric arrangement as shown in FIG. 3 is performed.
【0026】上記洗浄液の注入口6から注入された洗浄
液の流量と排出口9から排出される汚染洗浄液の流量と
が等しい場合には、洗浄槽内の洗浄液面が一定の状態を
保持するが、上記両流量のバランスがくずれると洗浄液
が増減する。すなわち、注入流量と排出流量との流量差
がプラスになれば液面が上昇し、マイナスになると液面
が下降する。実際には流量が多少変動するのは避けられ
ず、仮りに上昇しつづけた場合には上記溢出部3の上縁
まで到達し、溢出して排出されるので余り問題にはなら
ないが、液面が下降して内槽1の上縁にまで接近する
と、上縁をこえて内部の被洗浄物に注入される洗浄液の
整流性が乱れて、洗浄液の置換効率が低下してしまう。
そのため、槽内における洗浄液の液面レベルの変動を比
較的狭い範囲に制御しなければならないが、その許容変
動の範囲は所定の平均液面に対して、図4に示すように
およそ±10mmであることが望ましい。そのため上限
と下限のレベルにそれぞれ液面センサ10(LHとL
L)を設置して、上記洗浄液面の変動を一定範囲内に維
持するようにする。なお、内槽1と外槽2との高さおよ
び溢出部3高さ、ならびに平均液面との関係の一例は図
4に示すとおりである。When the flow rate of the cleaning liquid injected from the injection port 6 of the cleaning liquid is equal to the flow rate of the contaminated cleaning liquid discharged from the discharge port 9, the level of the cleaning liquid in the cleaning tank is kept constant. When the balance between the two flow rates is lost, the amount of the cleaning liquid increases or decreases. That is, if the flow rate difference between the injection flow rate and the discharge flow rate becomes positive, the liquid level rises, and if it becomes negative, the liquid level drops. Actually, it is unavoidable that the flow rate slightly fluctuates. If the flow rate continues to rise, it reaches the upper edge of the overflow portion 3 and overflows and is discharged. Descends and approaches the upper edge of the inner tank 1, the rectification of the cleaning liquid injected into the object to be cleaned over the upper edge is disturbed, and the efficiency of replacement of the cleaning liquid decreases.
Therefore, the fluctuation of the liquid level of the cleaning liquid in the tank must be controlled within a relatively narrow range, but the allowable fluctuation range is about ± 10 mm with respect to a predetermined average liquid level as shown in FIG. Desirably. Therefore, the liquid level sensors 10 (LH and L
L) is installed to keep the fluctuation of the cleaning liquid level within a certain range. An example of the relationship between the height of the inner tank 1 and the outer tank 2, the height of the overflow portion 3, and the average liquid level is as shown in FIG.
【0027】本洗浄槽の内槽1と外槽2との間の間隙底
部に設けた4個の洗浄液注入口6には、それぞれ開閉の
バルブV1、V2、V3、V4を介して洗浄液の流路が接続
されているが、上記流路は図5に示すように、排出口9
の吸引流量Ql/minより僅かに小さい流量、例えば
2l/min程小さくした流量(Q−2)l/minに
設定した流量Aと、約3l/min程度の流量に設定し
た流路Bとからなり、各流路はそれぞれ開閉バルブ
V6、V7と流量調節用のニードルバルブV8、V9、およ
び流量計M1、M2とフィルタF1、F2から構成され、各
流路を切替えることにより流量をそれぞれ独立に選定で
きるようにしてある。流路Aにより運転すると、吸引流
量に比べ供給流量が小さいため洗浄液の液面は低下し、
やがて液面レベルセンサLLに達する。センサLLの動
作で流路BのバルブV7が開き、流量(Q−2+3)l
/min、すなわち1l/min程度増し吸引流量より
大きくなって液面は上昇する。上昇が続くと洗浄液面は
やがて液面レベルセンサLHに到達するが、レベルセン
サLHにより流路BのバルブV7を閉じれば洗浄液面を
下降させることができる。このような制御方法により、
洗浄槽内の洗浄液面を、運転開始時のレベルを中心に±
10mmの範囲で上下させ、洗浄処理を行うことができ
る。上記流路AおよびBの流量設定値は、上記例示の値
に決っているわけでなく、洗浄液注入側の流量変動値に
基づいて適切に設定することが必要である。The four cleaning liquid inlets 6 provided at the bottom of the gap between the inner tank 1 and the outer tank 2 of the main cleaning tank are opened and closed via valves V 1 , V 2 , V 3 and V 4 respectively . The cleaning liquid flow path is connected to the discharge port 9 as shown in FIG.
From the flow rate A set to a flow rate slightly smaller than the suction flow rate Q1 / min, for example, the flow rate (Q-2) reduced to about 2 l / min, l / min, and the flow path B set to a flow rate of about 3 l / min. Each flow path is composed of opening and closing valves V 6 and V 7 , flow rate adjusting needle valves V 8 and V 9 , flow meters M 1 and M 2, and filters F 1 and F 2 , respectively. By switching, each flow rate can be selected independently. When the operation is performed by the flow path A, the supply flow rate is smaller than the suction flow rate, so that the level of the cleaning liquid decreases,
Eventually, it reaches the liquid level sensor LL. Valve V 7 of the flow path B by the operation of the sensor LL opens, the flow rate (Q-2 + 3) l
/ Min, that is, about 1 l / min, which is larger than the suction flow rate, and the liquid level rises. Rise to continue the cleaning liquid surface will soon reach a liquid level sensor LH, but can be lowered cleaning liquid surface by closing a valve V 7 of the flow path B by the level sensor LH. With such a control method,
The cleaning liquid level in the cleaning tank is
The cleaning process can be performed by raising and lowering in a range of 10 mm. The flow rate setting values of the flow paths A and B are not fixed to the above-described values, but need to be appropriately set based on the flow rate fluctuation value on the cleaning liquid injection side.
【0028】精密洗浄を行うには、浮遊塵埃などの汚染
を避けるため、クリーンブース内などに洗浄装置を設置
する。しかしながら、万一、洗浄液面に気中の浮遊塵埃
が沈降した場合には、洗浄液面に滞留したままの状態と
なり、洗浄後の被洗浄物を洗浄槽から引き上げる際に上
記浮遊塵埃を付着させ、再び汚染することになる。洗浄
液表面に浮遊塵埃があるときは、図5におけるバルブV
1以外の注入口バルブV2、V3、V4と排出口バルブV5
を閉じると、洗浄液面が上昇し液面レベルセンサLHが
働き流路Bのバルブが閉になるが、排出口バルブV5が
閉じているため引続き洗浄液面は上昇し、溢出部3に到
達して排水管5から流出する。この際、洗浄槽の一方か
ら上記溢出部3に向けて表面の水平な流れが形成され、
表面に浮遊する塵埃は上記流れとともに比較的短時間で
排出される。浮遊塵埃が除去されたら閉じたバルブ
V2、V3、V4およびV5を開き、ポンプによる排出口9
からの吸引を再開すると、洗浄液注入流量が吸引流量よ
りも小さいため洗浄液面は低下する。なお、洗浄液面を
速く所定レベルに戻すためには、一時的に注入口バルブ
V1〜V4を閉にすればよい。To perform precision cleaning, a cleaning device is installed in a clean booth or the like in order to avoid contamination such as floating dust. However, in the unlikely event that airborne dust settles on the cleaning liquid level, it will remain in the cleaning liquid level, causing the floating dust to adhere when the object to be cleaned is lifted from the cleaning tank, It will be polluted again. When floating dust is present on the cleaning liquid surface, the valve V in FIG.
Inlet valves V 2 , V 3 , V 4 other than 1 and outlet valve V 5
When closing, the valve of the cleaning liquid surface rises the liquid level sensor LH acts passage B is closed, subsequently the washing liquid surface rises because the outlet valve V 5 is closed, reaches the overflow portion 3 Out of the drain pipe 5. At this time, a horizontal flow on the surface is formed from one side of the cleaning tank toward the overflow section 3,
Dust floating on the surface is discharged in a relatively short time together with the flow. When the floating dust is removed, the closed valves V 2 , V 3 , V 4 and V 5 are opened, and the discharge port 9 by the pump is opened.
When the suction from the nozzle is restarted, the cleaning liquid level decreases because the cleaning liquid injection flow rate is smaller than the suction flow rate. In order to return to the fast predetermined level cleaning liquid surface is temporarily inlet valve V 1 ~V 4 may be closed.
【0029】また、洗浄を一時中断する場合に、純水リ
ンス槽の清浄度を低下させないため純水の流量を減少さ
せた状態で連続通水するためには、流量が小さい流路B
のバルブV1だけを開き、排出口9に接続されたポンプ
を停止し、バルブV10を開いて自然流下させることによ
り流出する。上記自然流下の流量が流路Bの流量とバラ
ンスするように調節するために、バルブV10の後にはニ
ードルバルブV11を設ける。Further, when the cleaning is temporarily interrupted, the flow rate of the pure water rinse tank is not reduced, and the flow rate of the pure water is reduced.
Open only valve V 1, stops a pump connected to the discharge port 9, flows out by gravity flow by opening the valve V 10. For flow rate of the natural flow is adjusted to balance the flow rate of the flow path B, and after the valve V 10 is provided a needle valve V 11.
【0030】上記説明は洗浄液を主体に記載したが、リ
ンス槽として純水を用いる場合も同様である。また、上
記液面の調節、浮遊塵埃の排除および小流量へ切替えに
よる節水等のバルブ切替え操作は、自動弁を用いたシー
ケンス制御により自動化を行うことが容易にできる。Although the above description has been made mainly of the cleaning liquid, the same applies to the case where pure water is used as the rinsing tank. Further, the valve switching operation such as water level adjustment, elimination of floating dust, and water saving by switching to a small flow rate can be easily automated by sequence control using an automatic valve.
【0031】[0031]
【発明の効果】上記のように本発明による下降整流式浸
漬洗浄装置は、角形に形成された内槽と外槽の2重槽か
らなり、上記内槽と外槽との間に設けた間隙の下部から
洗浄液を注入し、上記内槽の上縁から被洗浄物に洗浄液
を注ぎ、上記被洗浄物から遊離した汚染微粒子を含む汚
染洗浄液を、多孔板を介して内槽底部から排出する下降
整流式浸漬洗浄装置において、上記外槽の1側面の上縁
に洗浄液の溢出部を設け、上記溢出部を設けた以外の外
槽内側壁中に洗浄液の液面制御手段を設置するととも
に、流量がそれぞれ異なる2つの流路を洗浄液注入口に
設け、上記流量を制御する手段を備えたことにより、洗
浄液または純水の少ない使用流量で、洗浄度が高い精密
洗浄を短時間で行うことができる下降整流式浸漬洗浄装
置が得られる。As described above, the descending rectification type immersion washing apparatus according to the present invention comprises a double tank having an inner tank and an outer tank formed in a rectangular shape, and a gap provided between the inner tank and the outer tank. The cleaning liquid is poured from the lower part of the inner tank, the cleaning liquid is poured into the object to be cleaned from the upper edge of the inner tank, and the contaminated cleaning liquid containing the contaminant fine particles released from the object to be cleaned is discharged from the bottom of the inner tank through the porous plate. In the rectifying type immersion cleaning apparatus, an overflow portion of the cleaning liquid is provided on the upper edge of one side surface of the outer tank, and a liquid level control means of the cleaning liquid is installed in the inner wall of the outer tank except for the provision of the overflow section. By providing two different flow paths at the cleaning liquid inlet and providing a means for controlling the flow rate, precise cleaning with high cleaning degree can be performed in a short time with a small flow rate of the cleaning liquid or pure water. A downward rectification type immersion cleaning device is obtained.
【図1】本発明による下降整流式浸漬洗浄装置の洗浄槽
断面を示す図である。FIG. 1 is a view showing a cross section of a cleaning tank of a descending rectification type immersion cleaning apparatus according to the present invention.
【図2】上記洗浄槽の外観を示す斜視図である。FIG. 2 is a perspective view showing an appearance of the cleaning tank.
【図3】上記洗浄槽の上面図である。FIG. 3 is a top view of the cleaning tank.
【図4】液面制御のための説明図である。FIG. 4 is an explanatory diagram for liquid level control.
【図5】上記下降整流式浸漬洗浄装置の配管例を示す図
である。FIG. 5 is a view showing an example of piping of the descending rectification type immersion cleaning apparatus.
【図6】従来のオーバーフロー式洗浄槽の洗浄液の流れ
を示す図である。FIG. 6 is a diagram showing a flow of a cleaning liquid in a conventional overflow type cleaning tank.
【図7】上記従来洗浄槽の他の例における洗浄液の流れ
を示す図である。FIG. 7 is a view showing a flow of a cleaning liquid in another example of the conventional cleaning tank.
【図8】下降整流式洗浄槽における洗浄液の流れを示す
図である。FIG. 8 is a view showing a flow of a cleaning liquid in a descending rectifying type cleaning tank.
【図9】オーバーフロー式洗浄槽と下降整流式洗浄槽に
おける洗浄効率の比較を示す図で、(a)は純水リンス
の場合、(b)は循環洗浄の場合をそれぞれ示す図であ
る。9A and 9B are diagrams showing a comparison of cleaning efficiency between an overflow type cleaning tank and a descending rectification type cleaning tank, wherein FIG. 9A shows a case of pure water rinsing, and FIG. 9B shows a case of circulation cleaning.
1 内槽 2 外槽 3 溢出部 6 注入口 7、8 多孔板 9 排出口 10 レベルセンサ 1 inner tank 2 Outer tank 3 Overflow section 6 Inlet 7, 8 perforated plate 9 outlet 10 Level sensor
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭60−113433(JP,A) 特開 昭60−78680(JP,A) 特開 平6−349804(JP,A) 特開 平5−166791(JP,A) 特開 平5−166787(JP,A) 特開 平7−37850(JP,A) 実開 平1−154631(JP,U) 実開 昭63−130183(JP,U) (58)調査した分野(Int.Cl.7,DB名) B08B 3/10 H01L 21/304 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-60-113433 (JP, A) JP-A-60-78680 (JP, A) JP-A-6-349804 (JP, A) JP-A-5-349 166791 (JP, A) JP-A-5-166787 (JP, A) JP-A-7-37850 (JP, A) JP-A-1-154463 (JP, U) JP-A-63-130183 (JP, U) (58) Field surveyed (Int. Cl. 7 , DB name) B08B 3/10 H01L 21/304
Claims (3)
なり、上記内槽と外槽との間に設けた間隙の下部から洗
浄液を注入し、上記内槽の上縁から被洗浄物に洗浄液を
注ぎ、上記被洗浄物から遊離した汚染微粒子を含む汚染
洗浄液を、多孔板を介して内槽底部から排出する下降整
流式浸漬洗浄装置において、上記外槽の1側面の上縁に
洗浄液の溢出部を設け、上記溢出部を設けた以外の外槽
内側壁中に洗浄液の液面制御手段を設置するとともに、
流量がそれぞれ異なる2つの流路を洗浄液注入口に設
け、上記流量を制御する手段を備えたことを特徴とする
下降整流式浸漬洗浄装置。A cleaning liquid is injected from a lower part of a gap provided between the inner tank and the outer tank, and a washing liquid is injected from an upper edge of the inner tank. In a descending rectification type immersion cleaning apparatus in which a cleaning liquid is poured into an object to be cleaned and a contaminated cleaning liquid containing contaminant fine particles released from the object to be cleaned is discharged from the bottom of the inner tank through a perforated plate, Providing an overflow portion of the cleaning liquid at the edge, and installing a liquid level control means of the cleaning liquid in the inner wall of the outer tank other than providing the overflow portion,
A downflow rectification type immersion cleaning apparatus, characterized in that two flow paths having different flow rates are provided at a cleaning liquid inlet, and a means for controlling the flow rate is provided.
部に多孔板を設け、上記多孔板を透過した洗浄液が内槽
上縁から被洗浄物に注がれることを特徴とする請求項1
記載の下降整流式浸漬洗浄装置。2. A gap provided between the inner tank and the outer tank is provided with a perforated plate at an upper portion thereof, and a cleaning liquid permeating the perforated plate is poured into an object to be cleaned from an upper edge of the inner tank. Claim 1
The descending rectification type immersion cleaning device as described.
置したレベルセンサで行うことを特徴とする請求項1記
載の下降整流式浸漬洗浄装置。3. The descending rectification type immersion cleaning apparatus according to claim 1, wherein the liquid level in the cleaning tank is controlled by a level sensor installed in the cleaning tank.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02902995A JP3538470B2 (en) | 1995-02-17 | 1995-02-17 | Downward rectification type immersion cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02902995A JP3538470B2 (en) | 1995-02-17 | 1995-02-17 | Downward rectification type immersion cleaning device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08215648A JPH08215648A (en) | 1996-08-27 |
JP3538470B2 true JP3538470B2 (en) | 2004-06-14 |
Family
ID=12264993
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP02902995A Expired - Fee Related JP3538470B2 (en) | 1995-02-17 | 1995-02-17 | Downward rectification type immersion cleaning device |
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---|---|
JP (1) | JP3538470B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102343340A (en) * | 2011-10-20 | 2012-02-08 | 高佳太阳能股份有限公司 | Rinsing groove for silicon wafer cleaning machine |
Families Citing this family (7)
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JP4496538B2 (en) * | 2004-04-30 | 2010-07-07 | 三菱化学株式会社 | Method for manufacturing photoconductor drum |
JP4496540B2 (en) * | 2004-05-18 | 2010-07-07 | 三菱化学株式会社 | Method for manufacturing photoconductor drum |
CN104690030A (en) * | 2013-12-05 | 2015-06-10 | 天津中环领先材料技术有限公司 | Tank body for improved silicon chip cleaning machine |
JP7240931B2 (en) * | 2019-03-29 | 2023-03-16 | 株式会社荏原製作所 | Heat exchanger cleaning and polishing equipment |
CN112058774B (en) * | 2020-08-24 | 2021-11-30 | 台州市亿源塑业有限公司 | Overflow groove structure of wet etching cleaning mechanism |
CN113416997A (en) * | 2021-05-25 | 2021-09-21 | 苏州普雷特电子科技有限公司 | Plating bath system convenient to tank liquor is changed |
CN217748362U (en) * | 2022-07-28 | 2022-11-08 | 常州捷佳创精密机械有限公司 | Compatible groove structure and cleaning equipment |
-
1995
- 1995-02-17 JP JP02902995A patent/JP3538470B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102343340A (en) * | 2011-10-20 | 2012-02-08 | 高佳太阳能股份有限公司 | Rinsing groove for silicon wafer cleaning machine |
CN102343340B (en) * | 2011-10-20 | 2016-01-13 | 高佳太阳能股份有限公司 | The potcher of silicon wafer cleaner |
Also Published As
Publication number | Publication date |
---|---|
JPH08215648A (en) | 1996-08-27 |
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