JP3247322B2 - Cleaning equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning substrates such as glass substrates, and more particularly to a cleaning apparatus suitable for cleaning large substrates of 400 mm.times.400 mm or more.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have the advantages that they can be made much thinner (depth), consume less power, and can be easily made full-color than other display devices. Used in a wide range of fields. This liquid crystal display device usually has a configuration in which a liquid crystal layer is sandwiched between a pair of glass substrates.

A thin film such as a transparent conductive layer, an organic polymer film, or a metal film is formed on the glass substrate, and a thin film transistor (TFT) or the like is formed on the glass substrate by patterning the thin film. Elements and wirings for driving and controlling the switching elements are formed.

In the steps of forming the above various thin films, it is necessary to remove the submicron to several μm particles attached to the glass substrate by cleaning the glass substrate. This is because, when a thin film is formed with particles remaining on a glass substrate, a wiring defect such as disconnection or leakage occurs in the wiring formed by patterning the formed thin film. This wiring defect causes a malfunction in the switching element, and also causes a line defect or a point defect in the obtained liquid crystal display device. A similar problem is the IC
It also occurs in the manufacture of LSIs and LSIs.

Therefore, in order to solve the above problems,
2. Description of the Related Art Conventionally, a method of removing particles on a substrate by cleaning a substrate such as a glass substrate with a cleaning device, and then forming a thin film on the substrate has been used. Examples of the above-mentioned cleaning apparatus include an overflow-type cleaning apparatus in which a cleaning liquid flows into a cleaning tank almost uniformly. As the overflow type cleaning apparatus, for example, as shown in FIG.
2. There is a cleaning apparatus 100 provided with at least a cleaning tank 103, an inlet 105, a discharge means 106, and a punching plate 107.

In the cleaning apparatus 100, first, the pump 1
Particles contained in the cleaning liquid pumped by 01 are removed by the filter 102. The cleaning liquid from which particles have been removed flows into the cleaning tank 103 through an inflow port 105 formed in a plane on the bottom surface of the cleaning tank 103. At this time, the punching plate 10
7 is provided, and the flow of the cleaning liquid is smoothed by the punching plate 107, so that the cleaning liquid flows into the cleaning tank 103 uniformly.

In the cleaning tank 103, a substrate 1 to be cleaned is placed.
A plurality of substrates 04 (glass substrates and the like) are arranged, and the substrate 104 is cleaned by the uniformly flowing cleaning liquid. The cleaning liquid is discharged by a discharge unit 106 through an outflow port (not shown) provided in the cleaning tank 103.

As described above, since the inflow port 105 is formed in a planar shape on the bottom surface of the cleaning tank 103 and is provided with the punching plate 107, as shown in FIG. Flows into the washing tank 103 as described above.
Then, the cleaning liquid flows from below the cleaning tank 103 toward the upper side where the two outlets 108 are provided. The substrate 104 is cleaned by the flow of the cleaning liquid. Thereafter, the cleaning liquid flows out of the outlet 108 formed at a position in contact with the upper end of the cleaning tank 103 as described above, and is discharged by the discharge means 106.

As such an overflow type cleaning device, the following cleaning devices can be mentioned in addition to the above-mentioned cleaning device 100. First, in the cleaning device 110,
As shown in FIG. 9, the cleaning liquid flows into the cleaning tank 113 from the inflow port 115 formed in the bottom surface of the cleaning tank 113 in a parabolic manner. The flow of the cleaning liquid that has flowed in cleans the substrate 104 and flows out of two outflow ports 118 provided at positions that are in contact with the upper end surface of the side surface of the cleaning tank 113.

Next, in the cleaning apparatus 120, as shown in FIG.
Is provided, and the cleaning liquid flows in uniformly from the inflow port 125. The flow of the cleaning liquid that has flowed in cleans the substrate 104 and flows out of the two outflow ports 128 provided at positions that are in contact with the bottom surface of the side surface of the cleaning tank 123.

[0011] Further, a cleaning device for uniformly discharging the cleaning liquid flowing from a plurality of inlets, that is, a uniform outflow system in which the structure of the inlet and the outlet is opposite to that of the above-mentioned overflow cleaning device. Is also known. For example, as shown in FIG. 11, in the cleaning device 130, the cleaning liquid flows in from an inflow port 135 formed at a position in contact with the upper end surface of the side surface of the cleaning tank 133. The flow of the cleaning liquid that has flowed in cleans the substrate 104 and uniformly flows out from the outflow port 138 that is formed in a planar shape on the bottom surface of the cleaning tank 133.

[0012] Of the above-mentioned uniform outflow type cleaning apparatus, as a cleaning apparatus used for cleaning a silicon wafer which is a disk-shaped substrate used for ICs and LSIs, for example, as shown in FIG. In addition, a cleaning device 140 in which the cross-sectional shape of the cleaning tank 143 is substantially semicircular is exemplified.

In the cleaning apparatus 140, a cleaning tank 143 is formed according to the shape of the silicon wafer 144 to be cleaned.
Is set. Above the cleaning tank 143, a pure water supply unit 142 for supplying pure water as a cleaning liquid is formed, and inside the cleaning tank 143, pure water is supplied at a position corresponding to the shape of the silicon wafer 144. Are formed in plurality. The cleaning tank 1 is sprayed with pure water by the shower pipe 145.
The pure water in 43 is agitated, and particles on silicon wafer 144 are removed. Thereafter, the pure water uniformly flows out from the outlet 148 and is discharged.

As another cleaning apparatus having the same configuration, there is another cleaning apparatus disclosed in Japanese Patent Application Laid-Open No. Hei 8-290134. In this cleaning device 150, as shown in FIG. 13, two flows formed at the upper end of one side surface of the substantially rectangular parallelepiped cleaning tank 153 so that the flowing angles of pure water (cleaning liquid) flowing therethrough are different. An inlet 155 is provided.
The flow of pure water flowing from the two inlets 155 removes particles on the silicon wafer 144, which is an object to be cleaned, and then flows near the outlet 158 formed in a plane on the bottom surface of the cleaning tank 153. Merge to offset the flow momentum of each other. And the pure water whose flow momentum was offset,
It will flow out of the outlet 158 and be discharged.

Further, there is also known a tornado type cleaning apparatus in which a cleaning liquid flowing from a plurality of inlets flows out from one or more outlets. As this tornado type cleaning device, for example, as shown in FIG. 14, two inflow ports 165 formed at positions contacting the upper end surface of the side surface of the cleaning tank 163 are provided, and a position contacting the bottom surface of the cleaning tank 163 is provided. One outlet 168 formed in
There is a cleaning device 160 provided with. In the cleaning device 160, the cleaning liquid flowing from the two inlets 165 swirls in the cleaning tank 163 to clean the substrate 104, and the cleaning liquid flows out and is discharged from the outlet 168.

Similarly, as shown in FIG.
The cleaning device 170 is provided with two inflow ports 175 formed at positions in contact with the upper end surfaces of the three side surfaces, and two outflow ports 178 formed at positions in contact with the bottom surface of the cleaning tank 173 side surface. Can be mentioned. Also in the cleaning device 170, the cleaning liquid flows in the cleaning tank 173 so as to swirl, and cleans the substrate 104.

By cleaning the substrate 104 with each of the above-described cleaning devices, it is possible to remove particles adhering to the substrate 104.

[0018]

However, in the cleaning apparatus 100 which is the overflow type cleaning apparatus, the cleaning liquid uniformly flowing from the inflow port 105 is subjected to viscous resistance by the substrate 104 to be cleaned. . Therefore, the flow of the cleaning liquid is separated so as to escape to the side where the two outlets 108 are present as going upward. Therefore, in the central part near the liquid surface of the cleaning tank 103, which corresponds to the division of the flow of the cleaning liquid, the cleaning liquid stagnates and particles remain in the stagnation (the generation of residual particles).

When the above-described residual particles are generated, a large amount of particles particularly remain in a region corresponding to the stagnation on the substrate 104 disposed in the cleaning tank 103. Therefore, on the substrate 104, a region where the residual number of particles increases and contamination due to particles remains (hereinafter referred to as a contamination residual region), and a region where the residual particle is smaller than a predetermined residual number and is clean ( And the substrate 1
On 04, the residual number of particles becomes uneven.

Therefore, in order to uniformly clean the entire surface of the substrate 104 by the cleaning apparatus 100, the cleaning must be continued until the number of particles remaining in the contaminated residual area becomes substantially equal to the number of particles remaining in the clean area. . Therefore, there is a problem that it takes a considerably long time to clean the entire surface of the substrate 104.

Further, after cleaning the substrate 104, the cleaning tank 1
When the substrate 104 is pulled up from the substrate 03, the particles remaining in the stagnation of the cleaning liquid are cleaned of the substrate 10
4 and re-contaminates the substrate 104.

On the other hand, in the cleaning device 110, since the inflowing cleaning liquid is distributed in a parabolic manner, the amount of the cleaning liquid flowing into the central portion of the cleaning tank 113 near the liquid surface increases. therefore,
Although the generation of the residual particles at the center is slightly suppressed, the generation of the residual particles cannot be completely prevented, and the above problems cannot be solved.

Similarly, even in the case of an overflow type cleaning apparatus such as the cleaning apparatus 120 in which the cleaning liquid flows uniformly from above the cleaning tank 123, the side having the two outlets 128 below the cleaning tank 123. The flow of the cleaning liquid is separated so as to escape. Therefore, stagnation of the cleaning liquid occurs at the above-mentioned flow branch, and it is not possible to prevent generation of residual particles.

Further, in the cleaning apparatus 130 which is a uniform outflow type cleaning apparatus, the cleaning liquid flowing from the two inlets 135 flows in the cleaning tank 133 in a large swirl. When the cleaning liquid flows in such a swirling manner, the flow velocity of the cleaning liquid is weakened. Therefore, the cleaning device 13
At 0, no stagnation of the cleaning liquid is formed in the cleaning tank 133 as in the overflow type cleaning apparatus.
Since the flow of the cleaning liquid is weak, particles on the substrate 104 cannot be effectively removed.
04 has a problem that it takes a long time to clean until the entire surface is clean.

In the cleaning device 140 having the same configuration as the cleaning device 130, pure water is supplied from the upper portion of the cleaning tank 143, and pure water is jetted around the silicon wafer 144, which is the central portion of the cleaning tank 143. You. For this reason, although effective for cleaning the silicon wafer 144, pure water is agitated at the center of the cleaning tank 143.
Particles removed by washing are immediately discharged to outlet 1
There is a problem that it is not discharged from the cleaning tank 48 and remains in the cleaning tank 143.

Further, in the cleaning device 150 disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 8-290134, the flow of pure water is offset in the vicinity of the outlet 158. Therefore, the removed particles do not remain in the cleaning tank 153 and are immediately discharged from the outlet 158. Therefore, the problem in the cleaning device 140 is eliminated. However, as shown in FIG. 13, the pure water flowing from the two inlets 155 causes stagnation of pure water in a region indicated by an arrow A above the cleaning tank 153.

In the cleaning device 150, since the object to be cleaned is not as large as the glass substrate used for the liquid crystal display device like the silicon wafer 144, the influence of the stagnation on the cleaning is not so large. However, if the size of the object to be cleaned is as large as that of the glass substrate, residual particles are generated due to the stagnation as in the case of the overflow type cleaning apparatus, and the cleaning efficiency is greatly reduced.

On the other hand, a tornado type cleaning device 160
In 170, the cleaning liquid flows in a large swirl in the same manner as in the above-described cleaning apparatus 130, so that the generation of the cleaning liquid in the cleaning tanks 163 and 173 can be suppressed. However, in the case of a flow of the cleaning liquid that swirls greatly, the substrate 1
04 does not have sufficient momentum to clean it, and again, particles on the substrate 104 cannot be efficiently removed.

The present invention has been made in view of the above problems, and has as its object to prevent the generation of stagnation of a cleaning liquid in a cleaning tank and to reduce the flow of the cleaning liquid having a momentum capable of removing particles. Provided is a cleaning device which can be efficiently formed by cleaning a large object to be cleaned, such as a large glass substrate used in a liquid crystal display device or the like, which is disposed in a cleaning tank by being formed as a whole. It is.

[0030]

According to a first aspect of the present invention, there is provided a cleaning apparatus, comprising: a cleaning tank having a substantially rectangular parallelepiped shape having an area for accommodating an object to be cleaned; And a first inflow portion formed on the first side surface for flowing fluid into the cleaning tank, and a second side surface formed on the second side surface facing the first side surface to flow fluid into the cleaning tank. A second inflow portion, and an outflow port for discharging a fluid flowing from the first inflow portion and the second inflow portion;
The inflow section and / or the second inflow section is characterized in that it has a plurality of inflow ports having different heights from the bottom of the cleaning tank.

In a normal cleaning apparatus, in a cleaning tank,
Since the fluid is designed to form a predetermined large flow, in the cleaning tank, the fluid tends to form a simple flow. Therefore, in this simple large flow, the momentum of the flow is weakened, and in a region deviating from the simple large flow, stagnation of the fluid is likely to occur.

On the other hand, in the structure of the first aspect, at least three fluid flows are formed, and the flows are opposed to each other.
In this state, the fluid forms a more complicated flow in the cleaning tank without canceling the flow momentum of each other.

That is, in the cleaning tank, the formation of a predetermined large flow of the fluid is suppressed, and the flow of the fluid is more complicated and vigorous than before. Therefore, the generation of stagnation of the fluid in the cleaning tank is effectively prevented, and the formation of a simple and weak flow in which the fluid swirls large is suppressed.

Therefore, dirt on the surface of the object to be cleaned is
With the flow of the complex and strong momentum, with the elapse of the cleaning time, the surface is almost uniformly and efficiently removed without causing large unevenness on the entire surface. Also, there is no fluid stagnation,
In addition, since the flow is strong, dirt removed from the object to be cleaned is prevented from remaining in the cleaning tank.

In addition, in the above configuration, the cleaning tank has a substantially rectangular parallelepiped shape, and a complicated and strong flow is formed throughout the cleaning tank having this shape. Therefore, as compared to a conventional cleaning device such as a silicon wafer, such that only a cleaning object having a specific shape can be cleaned, it can be used for cleaning various objects to be cleaned,
It is also possible to clean a large object to be cleaned. Further, since the flow rate of the fluid is stronger than in the past, dirt on the object to be cleaned such as particles removed by cleaning can be immediately discharged from the cleaning tank.

According to a second aspect of the present invention, in order to solve the above-mentioned problems, in addition to the configuration of the first aspect, a fluid flowing into the cleaning tank from the inflow port of the first inflow portion is provided. And the inflow angle of the fluid flowing from the inflow port of the second inflow section to the cleaning tank is different from each other.

According to the configuration of the second aspect, since the inflow angles from the inflow ports are different, the flow of the fluid in the cleaning tank can be further complicated. for that reason,
Generation of fluid stagnation and weak flow in the cleaning tank can be more effectively prevented.

According to a third aspect of the present invention, in order to solve the above-described problem, an inlet of the first inflow portion is provided in addition to the configuration of the first or second aspect. The position and the position where the inflow port of the second inflow portion is formed are characterized in that the height from the bottom of the washing tank is different from each other.

According to the above configuration, since the heights of the inflow ports from the bottom of the cleaning tank are different from each other, the flow of the fluid in the cleaning tank can be further complicated. Therefore, generation of fluid stagnation and weak flow in the cleaning tank can be more effectively prevented.

According to a fourth aspect of the present invention, in order to solve the above-mentioned problems, in addition to the configuration of the first, second, or third aspect, the first inflow portion and the second inflow portion are provided. At least one of the plurality of inlets is provided at a position in contact with the bottom of the cleaning tank.

According to the configuration of the fourth aspect, at least one of the plurality of inlets is formed at the above-described position, so that a strong fluid flow is formed near the bottom of the cleaning tank. Will be. Therefore, it is possible to effectively prevent stagnation or weak flow of the fluid which is likely to be generated near the bottom of the cleaning tank.

According to a fifth aspect of the present invention, there is provided a cleaning apparatus having a substantially rectangular parallelepiped cleaning tank having an area for storing an object to be cleaned in an inclined manner, and The cleaning tank is provided at a position between the upper end and the lower end of the object to be cleaned, as viewed from the bottom of the cleaning tank, on the first side surface of the cleaning tank to which the upper end of the object is close. A first inflow portion for inflowing fluid into the fluid, and a second side surface facing the side surface provided with the first inflow portion,
A second inflow portion that is provided at a height from the bottom surface of the cleaning tank near the lower end of the object to be cleaned inclined, and in which a fluid flows into the cleaning tank, the first side surface and the second side surface; The side surface is provided at a position in contact with the upper end surface of the washing tank, and includes a plurality of outlets for discharging fluid flowing from the first inflow portion and the second inflow portion, and the first inflow portion. Alternatively, the second inflow portion has a plurality of inlets having different heights from the bottom of the cleaning tank.

According to the structure of the fifth aspect, the first inflow portion and the second inflow portion are respectively formed on the side surfaces at the upper end or the lower end side of the object to be cleaned.
For this reason, the fluid flows in from just beside the upper and lower ends of the object to be cleaned which is arranged in an inclined manner.
As a result, a more complicated and strong momentum flow is formed on the object to be cleaned, so that the cleaning effect can be increased.

Further, since the object to be cleaned is arranged obliquely, the cleaning liquid is better drained when the object to be cleaned is pulled up from the cleaning tank. Therefore, even if particles are included in the cleaning liquid, the cleaning liquid is almost completely removed from the object to be cleaned, so that the particles do not remain on the object to be cleaned. Therefore, the effect of cleaning the object to be cleaned can be further improved.

According to a sixth aspect of the present invention, in order to solve the above-mentioned problems, in addition to the configuration of the fifth aspect, the first inflow portion is provided with a slanted cleaning object. A first inflow port provided at a position below the central portion, and a second inflow port provided at a position above the central portion; The inflow portion is provided with a third inlet provided at a position in contact with the bottom of the washing tank, and a fourth inlet provided at a position substantially at the same height as the lower end of the object to be washed when viewed from the bottom of the washing tank. And an inlet.

According to the above configuration, the first and second inflow ports in the first inflow section and the third and fourth inflow ports in the second inflow section are located right beside the object to be cleaned. The tanks are opposed to each other so as to be located at different positions, and are provided at different positions from the bottom of the cleaning tank. Therefore, the flow of the fluid on the object to be cleaned is
Without compromising each other's momentum, it becomes more complicated, and the generation of fluid stagnation and weak flow can be effectively prevented. In addition, the third inflow port can effectively prevent a fluid that is likely to be generated near the bottom of the cleaning tank from stagnation or a weak flow.

According to a seventh aspect of the present invention, in order to solve the above-mentioned problem, in addition to the configuration of the sixth aspect, a fluid flowing from the first inlet is provided at a bottom surface of the cleaning tank. The fluid flowing from the second inlet flows obliquely downward toward the bottom of the cleaning tank, and the fluid flowing from the third inlet flows into the bottom of the cleaning tank. The fluid that flows in substantially parallel and flows in from the fourth inflow port is characterized in that it flows substantially parallel to the second side surface.

According to the above configuration, the fluid flows obliquely downward from the second inlet, so that the flow of the fluid from the first inlet for cleaning the object to be cleaned from right beside,
Two flows of the fluid for cleaning the object to be cleaned are formed obliquely. In addition, since these flows flow in a complicated manner without canceling the momentum due to the flow from the inlet of the second inflow section, it is possible to effectively prevent the generation of the fluid stagnation and the weak momentum flow. it can.

Further, since the fluid flows from the fourth inlet so as to be substantially parallel to the second side face, that is, along the second side face, the fluid also flows near the second side face. It is possible to effectively prevent stagnation of the fluid and generation of a weak flow.

According to an eighth aspect of the present invention, in order to solve the above problem, in addition to the configuration of the sixth or seventh aspect, the second inflow portion further includes a second side surface. Is characterized by having a fifth inflow port at a position near the outflow port provided in the.

According to the eighth aspect of the present invention, the flow of the fluid from the fifth inlet effectively removes dirt removed from the object to be cleaned which tends to remain near the water surface above the cleaning tank. Can be removed. Therefore, when the object to be cleaned is lifted from the cleaning tank after cleaning, recontamination of the object to be cleaned due to the remaining dirt can be prevented. Further, effectively preventing generation of fluid stagnation and a weakly vibrating flow in a region above the object to be cleaned arranged in the cleaning tank by the flow of the fluid from the fifth inlet. Can be.

According to a ninth aspect of the present invention, in order to solve the above-described problem, in addition to the configuration of the eighth aspect, the inflow amount of the fluid from the fifth inflow port is different from that of the fifth aspect. It is characterized in that the flow rate is smaller than the flow rate of the fluid from the inlet.

According to the configuration of the ninth aspect, the flow rate of the fluid from the fifth inlet is small because the flow rate of the fluid from the fifth inlet is small. Slightly weaker than the flow. Therefore, the dirt removed from the object to be cleaned, which tends to remain near the water surface above the cleaning tank, can be effectively removed without disturbing the flow of other fluids.

According to a tenth aspect of the present invention, in order to solve the above-mentioned problems, in addition to the configuration according to any one of the first to ninth aspects, the cleaning apparatus further comprises a plurality of discharge ports. The apparatus is characterized in that a circulation means is provided for filtering the filtered fluid and flowing the filtered fluid again through the inlets of the first and second inflow portions into the washing tank.

According to the configuration of the tenth aspect, the fluid discharged from the outlet through the outlet to the outside of the cleaning tank is used to remove dirt removed from the object to be cleaned by the filtering means.
Further, the clean fluid from which the dirt has been removed flows into the cleaning tank again by the circulation means. Therefore, the fluid used for cleaning the object to be cleaned can be efficiently used, and since there is no need to use a large amount of fluid, the cost of cleaning can be reduced.

[0056]

BEST MODE FOR CARRYING OUT THE INVENTION

[Embodiment 1] An embodiment of the present invention will be described below with reference to FIGS. Note that the present invention is not limited by this. As shown in FIG. 1, the cleaning device 1 of the present embodiment includes a circulation unit 2, a cleaning tank 3, a first inflow unit 4, a second inflow unit 5, and two outflow ports 6.
a and 6b and a pipe 7 are provided.

The circulating section 2 includes a pump 2a and a filter 2
b. The pump 2 a pumps a cleaning liquid as a fluid to the cleaning tank 3. The filter 2b removes dirt such as particles contained in the cleaning liquid pumped by the pump 2a. The cleaning tank 3 has a substantially rectangular parallelepiped shape having an area in which a plurality of large glass substrates used for a liquid crystal display device can be stored. The cleaning liquid that has been pressure-fed from the pump 2a and cleaned by the filter 2b flows into the cleaning tank 3 from the inflow ports of the first inflow section 4 and the second inflow section 5 via the pipe 7.

In the present embodiment, the first inflow section 4 is
As shown in FIGS. 1 and 2, a first inflow port 4 a formed at a position close to the bottom of the cleaning tank 3,
That is, it has a second inlet 4b formed at a position higher than the inlet 4a above the bottom of the washing tank 3. Hereinafter, the height from the bottom of the cleaning tank 3 is simply referred to as height.

Similarly, in the present embodiment, the second inflow section 5 is formed at a position close to the bottom of the cleaning tank 3.
And a fourth inlet 5b formed at a position higher than the inlet 5a. Inlet 5
a is formed at a position at the same height as the inflow port 4a in the first inflow section 4, and the inflow port 5b is formed at a position at the same height as the inflow port 4b. As shown in FIG. 2, the inflow ports 5a and 5b of the second inflow section are connected to the first inflow section 4 via an area for storing the article 8 to be cleaned.
Are formed at positions facing the inflow ports 4a and 4b.

The two outflow ports 6 a and 6 b for discharging the cleaning liquid from the cleaning tank 3 to the outside are connected to the inflow port 4 a of the first inflow section 4.
4b and higher than the inlets 5a and 5b of the second inflow section 5. In the present embodiment, the cleaning tank 3
Is formed at a position close to the upper end surface of the. The outlet 6a is formed at a position vertically above the first inflow portion 4, and the outlet 6b is formed at a position facing the outlet 6a, that is, at a position vertically above the second inflow portion. ing.

The discharged washing liquid returns to the pump 2a of the circulating unit 2 via the pipe 7, and is again pumped. The cleaning liquid immediately after the pressure feeding is filtered by the filter 2b, and the dirt in the cleaning liquid is removed to be cleaned. The cleaned cleaning liquid flows directly into the pipe 7 and flows into the cleaning tank 3 again.

In the cleaning apparatus 1 having the above configuration, the inflow ports 4a and 4a formed at positions facing each other.
Since the cleaning liquid flows into the cleaning tank 3 from the first inflow section 4 having the inlet 4a and the second inflow section 5 having the inlets 5a and 5b, a plurality of flows of the cleaning liquid opposing each other in the cleaning tank 3. Is formed. When such a flow is formed, the cleaning liquid forms a more complicated flow in the cleaning tank 3 without canceling out the flow force.

Therefore, the formation of a simple and large flow of the cleaning liquid in the cleaning tank 3 is suppressed, and the flow of the cleaning liquid that is more complicated and vigorous than before is formed. Therefore, the generation of stagnation of the cleaning liquid in the cleaning tank 3 is effectively prevented, and the formation of a simple, weakly vibrating flow in which the cleaning liquid forms a large swirl is also suppressed.

Therefore, the particles adhering to the glass substrate as the object to be cleaned 8 are almost uniformly and efficiently produced by the complicated and vigorous flow with the lapse of the cleaning time without causing large unevenness on the entire surface. Removed. Moreover, since the flow rate of the cleaning liquid is stronger than before, the particles removed by the cleaning do not remain in the cleaning tank 3 and are immediately discharged from the cleaning tank 3. Therefore, the occurrence of recontamination of the cleaning object 8 due to the residual particles in the cleaning tank 3 can be suppressed.

Further, in the circulating section 2, the outlet 6
The cleaning liquid discharged from a and 6b is filtered by a filter 2b to remove dirt such as particles in the cleaning liquid. Thereafter, the cleaning liquid that has been cleaned by the filtration flows again into the cleaning tank 3 by the pump 2a. In other words, the circulating unit 2 functions as a circulating unit, so that the cleaning liquid can be efficiently used, and since it is not necessary to use a large amount of the cleaning liquid, the cost of cleaning can be reduced.

In the present embodiment, the size of the cleaning tank 3 is 600 mm long × 600 mm wide × 600 mm deep, but is not particularly limited. Any size is acceptable as long as it can be stored. Further, in the present embodiment, pure water is used as the cleaning liquid. However, the present invention is not limited to this, and various chemicals may be mixed according to the type of the object to be cleaned 8 or the purpose of cleaning. And other solvents can be used.

In this embodiment, a large glass substrate used for a liquid crystal display device is used as the object 8 to be cleaned. However, the present invention is not particularly limited, and various objects can be cleaned. . For example, the object to be cleaned 8 may be a small disk-shaped object to be cleaned such as a silicon wafer. In this embodiment mode, a large glass substrate having a size of 400 mm × 500 mm is used. In the following description, the object 8 to be cleaned is a glass substrate 8.

After cleaning the glass substrate 8 and lifting the glass substrate 8 from the cleaning tank 3, it is necessary to remove the cleaning liquid from the glass substrate 8 as much as possible. this is,
If the remaining cleaning liquid contains particles,
This is because particles are left on the glass substrate 8 and recontaminated by removing the cleaning liquid from the glass substrate 8 by drying.

Therefore, when the object to be cleaned is not disc-shaped or spherical, specifically, when the object to be cleaned is substantially rectangular like the glass substrate 8, the cleaning tank 3
It is preferable to dispose it in a state inclined with respect to the bottom surface.
As a result, when the glass substrate 8 is pulled up from the cleaning liquid, the cleaning liquid collects at the lowermost apex of the glass substrate 8. For this reason, the cleaning liquid is easily cut, and the generation of residual particles on the glass substrate 8 can be suppressed.

The range of the inclination of the glass substrate 8 is as follows.
The range of 10 ° to 30 ° with respect to the bottom of the washing tank 3 is preferable. When the inclination is within the above range, the generation of residual particles is suppressed, and the size of the cleaning tank 3 does not need to be larger than necessary with respect to the size of the object to be cleaned (glass substrate) 8. .

Here, the shape of the cleaning tank 3 needs to be a substantially rectangular parallelepiped. This is because the generation of a useless area in the cleaning tank 3 when cleaning the large glass substrate 8 can be suppressed. Further, when the shape of the cleaning tank 3 is other than a substantially rectangular parallelepiped, it is difficult to obtain the effect of the present invention of forming a complicated strong flow of the cleaning liquid without stagnation in the cleaning tank 3, which is not preferable.

In the cleaning device 1 of the present embodiment, at least one of the plurality of inlets of the first inflow portion 4 and the second inflow portion 5 is provided at a position in contact with the bottom surface of the cleaning tank 3. Is preferred. For example, as shown in FIG. 2, the lower inlet 4a of the first inlet 4 and the lower inlet 5a of the second inlet 5 are both formed at positions close to the bottom of the washing tank 3. Have been. In addition, these inflow ports 4a.
Only one of 5 a may be provided at a position in contact with the bottom of cleaning tank 3.

Further, out of the inlets of the first inflow section 4 and the second inflow section 5, the inflow ports (inflow ports 4 a and 5 a) other than the inflow ports (inflow ports 4 a and 5 a) formed at positions in contact with the bottom surface of the washing tank 3. The position where the inlets 4b and 5b) are provided is not particularly limited. Cleaning device 1 according to the present invention
Then, the inflow ports 4b and 5b are provided at least in the washing tank 3
Within, the momentum of the flow of the cleaning liquid is not offset, and
It is sufficient that the cleaning liquid is formed at a position where the cleaning liquid can flow so that no stagnation of the cleaning liquid occurs. In the cleaning apparatus 1 shown in FIGS. 1 and 2, the inflow port 4 b and the inflow port 5 b are formed at positions where the centers of the inflow ports are at a height of 260 mm from the bottom of the cleaning tank 3.

It is assumed that the cleaning device 1 has only a single inflow port in each of the first inflow section 4 and the second inflow section 5. In that case, a simple and large flow is easily formed in the cleaning tank 3, and stagnation of the cleaning liquid is easily generated in a region deviating from the large flow. In addition, the large flow itself may become a weak flow by swirling or the like, and the glass substrate 8 cannot be effectively cleaned.

Further, at least one of the inlets of the first inflow section 4 and the second inflow section 5 is provided with the cleaning tank 3.
If it is not formed at a position in contact with the bottom surface, the cleaning tank 3
In the vicinity of the bottom surface, stagnation or the like of the cleaning solution is easily generated, which is not preferable.

That is, in the cleaning apparatus 1 of the present embodiment,
At least the first inflow section 4 and / or the second inflow section 5 only need to have a plurality of inlets having different heights from the bottom of the washing tank 3, respectively, and preferably the first inflow section At least one of the plurality of inlets of the fourth inflow portion 5 and the second inflow portion 5 may be formed at a position adjacent to the bottom surface of the washing tank 3.

Therefore, in the present embodiment, as another example of the cleaning device 1, as shown in FIG.
The difference between the heights of the two inlets 14a and 14b of the inflow part 14 from the bottom of the cleaning tank 3 is greater than the difference between the heights of the two inlets 4a and 4b in the first inflow part 4 of the cleaning device 1. The cleaning device 11 may be smaller. The cleaning device 11 has the same configuration as the cleaning device 1 such as the cleaning tank 3 and the outlets 6a and 6b, except that the configurations of the first inflow portion 14 and the second inflow portion 15 are different from those of the cleaning device 1. It has become.

Further, in the cleaning device 11, the inflow angle of the cleaning liquid at the inflow ports 14 a and 14 b and the inflow angle of the cleaning liquid at the inflow port 15 a of the second inflow section 15 are different from the inflow angle of the inflow port 5 a of the cleaning apparatus 1. Similarly, it is almost perpendicular to the side surface where each inlet is formed,
The inflow angle of the cleaning liquid at the upper inflow port 15b of the second inflow section 15 is obliquely downward with respect to the side surface.

As in the cleaning device 11, the first inflow section 1
If the inflow angles at the inflow ports 14a and 14b of the fourth inflow port 4 and the inflow angles at the inflow port 15b of the second inflow section 15 are different from each other, the cleaning tank 3 is compared with the cleaning apparatus 1 described above.
The flow of the cleaning liquid in the inside can be made more complicated and a strong flow. More preferably, the inlet 15
a of the inflow port 14a of the first inflow section 14
It may be different from the inflow angle at 14b.

That is, by appropriately changing the inflow angle of the cleaning liquid from each of the above-mentioned inlets, the flow of the cleaning liquid in the cleaning tank 3 becomes more complicated, and the generation of stagnation of the cleaning liquid and the generation of the weakly flowing cleaning liquid are prevented. It can be more effectively prevented. Note that the range of the change in the angle and the optimum inflow angle are appropriately changed depending on the position where the inflow port is formed. For example, the range of the inflow angle at the inlet 15b is preferably 35 ° to 55 °, and more preferably 40 ° to 50 °, but the range of the inflow angle is different from that of the other inlets 14a.・ 14b ・ 15
It cannot be applied unconditionally to a.

In the cleaning apparatuses 1 and 11 of the present embodiment, the shapes of the inlets of the first inflow sections 4 and 14 and the second inflow sections 5 and 15 are not particularly limited. The shape of the inflow port may be a large inflow port formed on the side surface of the cleaning tank 3 in a planar shape. Cleaning device 1 of the present embodiment
・ In 11, the size of the inlet is 3 mm or more in diameter.
A nozzle having five circular openings in a range of 4 mm is used. As described above, by using the nozzle having a plurality of small openings collectively as the inflow port, the flow rate of the cleaning liquid into the cleaning tank 3 is improved, and a strong flow of the cleaning liquid is formed in the cleaning tank 3. Will be done. Therefore, the glass substrate 8 can be more effectively cleaned.

The inflow port of the first inflow section (the inflow ports 4a and 4b in the cleaning apparatus 1, and the inflow port 14 in the cleaning apparatus 11)
a.14b) and the inflow port of the second inflow section (inflow ports 5a and 5b in the cleaning device 1, and inflow port 15 in the cleaning device 11).
The shapes of the nozzles used as a and 15b) are almost the same. Therefore, the kinetic energy of the cleaning liquid flowing from each of the inlets is substantially equal. Here, the first inflow portion 4 or 14 and the second inflow portion 5 or 15 are arranged in the cleaning tank 3 at positions where the glass substrate 8 is sandwiched. Therefore, the flow of the cleaning liquid flowing from the side surface with respect to the glass substrate 8 has the same kinetic energy. As a result, stagnation of the cleaning liquid is less likely to occur in the cleaning tank 3.

Each of the inlets may be an opening formed on the side surface of the washing tank 3. A pipe is provided in the washing tank 3, and a slit or an opening formed in the pipe is formed. It may be.

In this embodiment, the flow rate of the cleaning liquid from each of the inlets is 50 liters / minute to 200 liters / minute.
Minutes, preferably about 100 liters /
More preferably, it is minutes. When the inflow amount of the cleaning liquid is within the above range, the cleaning liquid does not flow to the entire inside of the cleaning tank 3 to form stagnation, and further, it is possible to avoid the cleaning liquid from flowing in a swirling manner. This is because a complicated and strong flow of the cleaning liquid can be formed. Thus, particles attached to the surface of the glass substrate 8 can be quickly and uniformly removed.

In the cleaning apparatuses 1 and 11 of the present embodiment, two outlets 6 for discharging the cleaning liquid from the cleaning tank 3 are provided.
a · 6b includes a first inflow section 4.14 and a second inflow section 5 · 14.
It is provided at a position higher than the bottom of the cleaning tank 3 and in contact with the upper end surface of the cleaning tank 3. The outlet 6a is located above the first inflow portions 4.14,
The outflow port 6b is located above the second inflow sections 5.15. Each of the outlets 6a and 6b is formed as an overflow outlet for uniformly discharging the cleaning liquid from the upper surface of the cleaning tank 3.

If the outlets 6a and 6b are provided at the above positions in the above-described shape, the cleaning liquid flowing into the washing tank 3 is washed from the lower side of the washing tank 3 with the outlets 6a and 6b. It flows toward the upper part of the tank 3. However, the flow of the cleaning liquid becomes more complicated because the cleaning liquid itself has a tendency to flow below the cleaning tank 3 due to gravity. In addition, since the two outlets 6a and 6b are formed, the flow of the cleaning liquid is more complicated than when only one outlet is provided. As a result, cleaning tank 3
It is possible to more effectively prevent the washing liquid from stagnation or the flow of the washing liquid having a weak momentum in the inside.

As described above, in the cleaning apparatus of the present embodiment, the first inflow section and the second inflow section are formed on the sides of the substantially rectangular parallelepiped cleaning tank so as to face each other. -At least one of the second inflow portions has a plurality of inflow ports. Moreover, the heights of the inlets provided on the same side surface are different from each other. Therefore, the generation of stagnation of the cleaning liquid in the cleaning tank can be prevented, and a flow of the cleaning liquid having a momentum capable of removing particles can be formed throughout the cleaning tank. Therefore, with the use of the above-described cleaning device, a large object to be cleaned such as a glass substrate used for a liquid crystal display device or the like can be efficiently cleaned.

In the cleaning apparatus (cleaning apparatuses 1 and 11) described in the present embodiment, the first
The inflow section and the second inflow section each have two inflow ports. However, the configuration of the cleaning device according to the present invention is not limited to the above configuration, and the first inflow portion and / or the second inflow portion may have three or more inflow ports.

Embodiment 2 Another embodiment of the present invention will be described below with reference to FIGS. 4 and 5. Note that members having the same functions as the members described in the first embodiment are given the same member numbers, and descriptions thereof are omitted. The present invention is not limited by the embodiments.

The cleaning device according to the present embodiment is characterized in that the range of the height where the two inflow ports of the first inflow section are provided is limited, and that the two inflow ports of the second inflow section have The configuration is the same as that of the cleaning devices 1 and 11 in the first embodiment except that the position of the inflow port located above is different.

That is, the cleaning device 21 of the present embodiment is
As shown in FIG. 4, a circulating unit and piping (not shown), a cleaning tank 3, a first inflow unit 24, a second inflow unit 25, and an outflow port 6 a.
6b. The cleaning device 21 cleans the glass substrate 8 as an object to be cleaned in the cleaning tank 3, and then cleans the outflow ports 6a and 6
b to the outside of the cleaning tank 3. The discharged cleaning liquid can be filtered and re-introduced as a fluid by a circulation unit (not shown) in the same manner as in the cleaning apparatus 1 of the first embodiment.

The first inflow portion 24 is a side surface of the cleaning tank 3 which is in contact with the upper end side of the glass substrate 8 which is the object to be cleaned, which is disposed in the substantially rectangular parallelepiped cleaning tank 3.
It is provided on the side of. On the other hand, the second inflow portion 25 is provided on a second side surface, which is a side surface with which the lower end side of the inclined glass substrate 8 contacts. The first side surface and the second side surface face each other as in the first embodiment.

The first inflow portion 24 is provided at a position between the heights corresponding to the upper end and the lower end of the glass substrate 8 when viewed from the bottom of the cleaning tank 3, and the two inflow ports 24a and 2
4b. On the other hand, the second inflow section 25 is provided with the cleaning tank 3
It is provided at a position whose height from the bottom surface is near the lower end of the inclined glass substrate 8, and has two inlets 25a.
25b. Further, above the first inflow portion 24 and the second inflow portion 25, that is, the first side surface and the second
The outlets 6a and 6b for discharging the cleaning liquid are provided at positions in contact with the upper end surface of the cleaning tank 3 on the side surfaces of the first embodiment.
Are provided in the same manner as the cleaning devices 1 and 11 in FIG.

The position where the first inlet 24a and the second inlet 24b are formed in the first inlet 24 is determined by the height corresponding to the upper end and the lower end of the inclined glass substrate 8. The first inlet 24a is provided at a position lower than the center of the inclined glass substrate 8, although it is not particularly limited as long as the position is between them. Is preferably provided at a position higher than the central portion.

Similarly, the third inflow section 25 in the second inflow section 25
The position where the inflow port 25a and the fourth inflow port 25b are formed is not particularly limited as long as it is a position near the lower end of the inclined glass substrate 8; The inlet 25a is provided at a position in contact with the bottom surface of the cleaning tank 3, and the fourth inlet 25b is provided at a position which is substantially the same height as the lower end of the glass substrate 8 when viewed from the bottom surface of the cleaning tank 3. Is preferred.

In the present embodiment, the size of the cleaning tank 3 is 600 mm long × 600 mm wide, as in the first embodiment.
mm × 600 mm in depth. Further, the range of the inclination of the glass substrate 8 is preferably in the range of 10 ° to 30 ° with respect to the bottom of the cleaning tank 3 as in the first embodiment.

In the present embodiment, the first inflow port 24a in the first inflow section 24 is provided on the first side surface at a height of 90 mm from the bottom of the cleaning tank 3, and
Is provided on the first side surface at a height of 370 mm from the bottom surface of the washing tank 3. On the other hand, the third inflow port 25a in the second inflow section 25 is provided on the second side surface adjacent to the bottom surface of the cleaning tank 3, and
Is provided on the second side surface at a height of 50 mm from the bottom surface of the washing tank 3.

The inlets 24a and 24 of the first inflow section 24
The shapes of the b and the inlets 25a and 25b of the second inflow part 25 are not particularly limited as long as they are not large inlets formed in the side surface of the washing tank 3 as in the first embodiment. is not. In the present embodiment, the size is 3
A nozzle having five circular openings in a range of mm to 5 mm is used. As described above, by using a nozzle having a plurality of small openings collectively as the respective inlets, the flow rate of the cleaning liquid into the cleaning tank 3 can be improved, and the flow rate of the cleaning liquid can be increased. Therefore, the glass substrate 8 can be more effectively cleaned.

The inflow ports 24a and 24 of the first inflow section 24
b and the nozzles used as the inflow ports 25a and 25b of the second inflow section 25 have substantially the same shape. Therefore, the kinetic energies of the cleaning liquids flowing from the respective inlets are substantially equal, and the first embodiment is described.
Similarly, the flow of the cleaning liquid flowing from the side surface of the cleaning tank 3 has the same kinetic energy.
Inside, the stagnation of the washing liquid is less likely to occur.

Each of the inlets may be an opening formed on the side surface of the washing tank 3, or a pipe may be provided in the washing tank 3 and a slit or an opening provided in the pipe. You may.

As described above, the first inflow portion 24 is provided at a position between the heights corresponding to the upper end and the lower end of the inclined glass substrate 8, and the second inflow portion has the inclined glass substrate 8. The first inflow portion 24 and the second inflow portion 25 are located right beside the glass substrate 8, respectively. Therefore, the cleaning liquid flowing from right beside the glass substrate 8 forms a more complicated and strong flow on the glass substrate 8.

Further, the first inflow port 24a and the second inflow port 24b in the first inflow section 24 and the second inflow section 2
5 at the third inlet 25a and the fourth inlet 25
As described above, if the position provided with b is opposite to the position just beside the glass substrate 8 and is provided at a position different in height from the bottom of the cleaning tank 3. The flow of the cleaning liquid on the glass substrate 8 becomes more complicated without canceling out the momentum of each other. As a result, it is possible to effectively prevent stagnation of the cleaning liquid and generation of a weakly flowing flow. In addition, the third inflow port 25a can effectively prevent the washing liquid from being easily generated near the bottom surface of the washing tank 3 and the flow of the washing liquid having a weak momentum.

Moreover, since the glass substrate 8 is disposed at an angle, the cleaning liquid is easily drained when the glass substrate 8 is pulled up from the cleaning tank. Therefore, even if particles are included in the cleaning liquid, the cleaning liquid is almost removed from the glass substrate 8, so that the particles do not remain on the glass substrate 8. Therefore, the cleaning effect on the glass substrate 8 can be further improved.

Further, in the cleaning device 21 of the present embodiment, the cleaning liquid flows from the inflow port 24a so as to be substantially parallel to the bottom surface of the cleaning tank 3, and from the inflow port 24b, the cleaning liquid flows in the bottom surface of the cleaning tank 3. Flows obliquely downward toward. The cleaning liquid flows from the inlet 25a so as to be substantially parallel to the bottom surface of the cleaning tank 3, and flows from the inlet 25b so as to be substantially parallel to the second side surface. That is, in the cleaning device 21 of the present embodiment, the first
In the second inflow section, the height at which each inflow port is provided is different, and the inflow angle of the cleaning liquid is also different.

When the respective inlets are provided as described above, the cleaning liquid flows obliquely downward from the inlet 24a, so that the cleaning liquid from the inlet 24b for cleaning the glass substrate 8 to be cleaned from right beside. And a flow of the cleaning liquid for cleaning the glass substrate 8 from obliquely above. In addition, the inflow ports 24a and 24 of the first inflow section 24
Since the heights of the inlets 25a and 25b of the second inlet 25 are different from those of the second inlet 25, the respective flows from the inlets 24a and 24b are caused by the flow of the cleaning liquid from the inlets 25a and 25b in the second inlet 25. The momentum has not been offset.

As a result, the flow of the cleaning liquid in the cleaning tank 3 becomes more complicated without canceling out the momentum. Therefore, the generation of stagnation of the cleaning liquid and the flow of the cleaning liquid having a weak momentum is effectively prevented, and the glass substrate 8
Cleaning efficiency can be improved.

Further, since the two inflow ports 24a and 24b in the first inflow portion 24 are formed right beside the glass substrate 8, the flow of the cleaning liquid, which is more complicated and vigorously strong, is formed on the glass substrate 8. Is formed.
Therefore, the cleaning effect on the glass substrate 8 can be further improved.

Further, the third inlet 25 a is located at the same height as the lower end of the glass substrate 8. That is, the inflow port 25a is provided at a position in contact with the bottom surface of the cleaning tank 3. Therefore, stagnation of the cleaning liquid, which is likely to be generated in the vicinity of the bottom of the cleaning tank 3, and the flow of the cleaning liquid having a weak momentum can be effectively prevented.

In addition, the outlets 6a and 6b through which the cleaning liquid flows out and out of the cleaning tank 3 are provided, as in the first embodiment, more than the first inflow section 24 and the second inflow section 25. The cleaning tank 3 is provided at a position higher than the bottom surface and in contact with the upper end surface of the cleaning tank 3. The shape is also the same as in the first embodiment. Therefore, the flow of the cleaning liquid in the cleaning tank 3 can be made more complicated, and the generation of the stagnation of the cleaning liquid and the flow of the cleaning liquid having a weak force in the cleaning tank 3 can be more effectively prevented.

The range of the inflow angle of the cleaning liquid at the second inlet 24b is preferably in the range of 30 ° to 60 °, and more preferably in the range of 40 ° to 50 °. Inlet 2
When the inflow angle of the cleaning liquid in 4b is out of the above range, the cleaning liquid stagnates or weakly flows on the glass substrate 8, which is not preferable. Further, the range of the inflow angle of the cleaning liquid at the fourth inlet 25b is preferably 10 ° or less, more preferably 5 ° or less.
If the inflow angle of the cleaning liquid at the inflow port 25b is out of the above range, the cleaning liquid tends to stagnate above the cleaning tank 3, which is not preferable.

Also, in this embodiment, the flow rate of the cleaning liquid from each of the inlets is 50
It is preferably in the range of liter / min to 200 liter / min, and more preferably around 100 liter / min. When the inflow amount of the cleaning liquid is within the above range, the cleaning liquid does not flow through the entire cleaning tank 3 to form stagnation, and further, it is possible to prevent the cleaning liquid from flowing in a simple and large manner as if swirling. This is because particles adhering to the surface of the glass substrate 8 or the like to be cleaned can be quickly and uniformly removed.

The cleaning device of the present embodiment may be a cleaning device 21a provided with a fifth inlet 25c as shown in FIG. 5, in addition to the above-described configuration. The position where the fifth inflow port 25c is provided includes the two inflow ports 25a and 25b of the second inflow section 25.
This is a position near the outlet 6b provided above. Specifically, the inlet 25c is provided at a position 16 mm below the lower end of the outlet 6b of the cleaning device 21a.

If the fifth inlet 25c is formed at the above position, the cleaning liquid flows from the inlet 25c to remove the glass substrate 8 which tends to remain near the water surface above the cleaning tank 3. It is possible to effectively remove dirt such as particles that have been removed. Therefore, when the glass substrate 8 is pulled out of the cleaning tank 3 after cleaning, recontamination of the glass substrate 8 due to remaining particles and the like can be prevented. In addition, the flow of the cleaning liquid from the inflow port 25c effectively prevents the generation of the stagnation of the cleaning liquid and the flow of the weak cleaning liquid in a region above the glass substrate 8 disposed in the cleaning tank 3. it can.

Further, it is preferable that the inflow of the cleaning liquid from the inlet 25c is smaller than the inflow of the fluid from the other inlets. Specifically, the flow rate from the inlet 25c is preferably in a range of 3 liter / min to 10 liter / min, and more preferably about 5 liter / min.

If the flow rate of the cleaning liquid from the fifth inlet 25c is within the above range, the flow of the cleaning liquid from the inlet 25c is slightly weaker than the flow of the cleaning liquid from the other inlets. Therefore, particles that tend to remain near the water surface above the cleaning tank 3 can be effectively removed without disturbing the flow of the cleaning liquid from another inlet. In addition, when the glass substrate 8 is lifted from the cleaning tank 3, the surface of the glass substrate 8 is further cleaned, so that re-contamination due to particles can be prevented.

On the other hand, if the inflow amount of the cleaning liquid flowing from the inlet 25c is out of the above range, the flow of the cleaning liquid from the inlet 25c disturbs the flow of the other cleaning liquid. The turbulence in the flow of the cleaning liquid may weaken the flow of the cleaning liquid, for example, by offsetting the flow of the cleaning liquid. Further, particles that easily remain above the cleaning liquid in the cleaning tank 3 cannot be effectively removed, and when the glass substrate 8 is pulled up, there is a possibility that recontamination by the remaining particles may occur.

As described above, the cleaning apparatus according to the present embodiment has the first inflow section and the second inflow section formed on the side surfaces of the substantially rectangular parallelepiped cleaning tank so as to face each other.
The two inflow ports of the first inflow section are formed at positions just beside the object to be cleaned, and one of the two inflow ports of the second inflow section is formed in contact with the bottom of the cleaning tank, and is located immediately above the bottom. Another inlet is formed in the vicinity. Therefore, while maintaining the state in which the flow of the cleaning liquid in the cleaning tank is strong, the cleaning liquid becomes more complicated, and the generation of stagnation of the cleaning liquid can be effectively prevented.

Further, the cleaning apparatus according to the present embodiment has a
Since the inflow portion has another inflow port near the outflow port, the generation of stagnation of the cleaning liquid in the cleaning tank is prevented, and the flow of the cleaning liquid having a momentum capable of removing particles flows through the entire cleaning tank. Can be formed.
Therefore, with the use of the above-described cleaning apparatus, a large object to be cleaned such as a glass substrate used for a liquid crystal display device or the like can be more efficiently cleaned.

In the cleaning apparatus (cleaning apparatuses 21 and 21a) described in the present embodiment, as described above,
The first inflow section and the second inflow section each have two or three
It has one inlet for each. However, the configuration of the cleaning device according to the present invention is not limited to the above configuration, and the first inflow portion and the second inflow portion may each have three or more inflow ports.

[0120]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A specific embodiment of the cleaning apparatus according to the present invention will be described below with reference to the drawings.

Example 1 Using the cleaning apparatus 1 shown in FIGS. 1 and 2 described in the first embodiment, ten glass substrates 8 of 400 mm × 500 mm used for a liquid crystal display device were cleaned. Washed. Deionized water (pure water) was used as the cleaning liquid. Further, the inflow amount of the deionized water from the inlet in the cleaning device 1 is 100
Liters per minute. Other conditions, such as the positions and shapes of the inlets and outlets, the inflow angles of deionized water at each inlet, and the like, are described in the first embodiment.
The detailed description is omitted here.

Using the cleaning apparatus 1, the above glass substrate 8
0 sheets were washed for 10 minutes, and then lifted out of the washing tank 3. After the glass substrate 8 pulled up from the cleaning tank 3 is dried, the number of particles on the glass substrate 8 is determined by Hitachi DE.
Particle measurement device manufactured by CO (product number: GI-47)
00). The result at that time is shown in FIG.
Shown in

Example 2 Ten glass substrates 8 were cleaned in the same manner as in Example 1 except that the cleaning apparatus 21a shown in FIG. 5 described in Embodiment 2 was used. At this time, the second inlet 2 in the cleaning device 21a
The inflow angle of deionized water at 4b is 45 °, and the inflow angle of deionized water at fourth inlet 25b is 0 °.
Met. In addition, the inflow of deionized water from each inlet is 100 liter / all except for the fifth inlet 25c.
And the inflow rate of deionized water at the fifth inlet 25c was 5 liters / minute. Other conditions, for example,
The positions at which the inflow port and the outflow port are formed, their sizes, and the like have been described in detail in the second embodiment, and will not be described. The number of particles on the glass substrate 8 after the cleaning was measured in the same manner as in Example 1. The result is shown in FIG.
It is shown in (b).

[Comparative Example 1] An overflow type cleaning apparatus 1 shown in FIGS. 7 and 8, which is a conventional cleaning apparatus.
400 mm × 5 mm used for liquid crystal display device
A 00 mm glass substrate 8 (indicated by 104 in the figure) is
No cleaning was performed as the object to be cleaned. Deionized water (pure water) was used as the cleaning liquid. The inflow port 105 in the cleaning apparatus 100 is provided on the bottom surface of the cleaning tank 103, and the inflow amount of the deionized water from the inflow port 103 is set to 100 liter / minute. The size of the cleaning tank 103 is 600 mm long.
× 600 mm wide × 600 mm deep was used. As the outlet 108, the outlets 6 a and 6 b in the cleaning device 1 of the first embodiment are provided at the upper end of the opposite side surface of the cleaning tank 103.
Two outflow ports 108 having the same configuration as that described above were provided. The number of particles on the glass substrate 8 after the cleaning was measured in the same manner as in Example 1. The result is shown in FIG.

Comparative Example 2 A glass substrate 8 was cleaned in the same manner as in Comparative Example 1, except that an overflow type cleaning apparatus 110 as shown in FIG. 9, which is a conventional cleaning apparatus, was used. The configuration and cleaning conditions of the cleaning device 110 at this time are the same as in Comparative Example 1, except that deionized water flows in from the inlet 115 so as to spread in a parabolic manner, and thus description thereof is omitted. The number of particles on the glass substrate 8 after the cleaning was measured in the same manner as in Example 1. The result is shown in FIG.

Comparative Example 3 FIG. 10 shows a conventional cleaning apparatus.
The glass substrate 8 was cleaned in the same manner as in Comparative Example 1 except that the overflow type cleaning apparatus 120 shown in FIG. The configuration and cleaning conditions of the cleaning device 120 at this time are as follows.
Except that the inflow port 125 is provided on the upper end surface of the cleaning tank 123 and the two outflow ports 128 are provided in contact with the bottom surface of the cleaning tank 123, the description is omitted because it is the same as in Comparative Example 1. The number of particles on the glass substrate 8 after the cleaning was measured in the same manner as in Example 1. The result is shown in FIG.

[Comparative Example 4] FIG. 11 shows a conventional cleaning apparatus.
The glass substrate 8 was cleaned in the same manner as in Comparative Example 1 except that the uniform outflow type cleaning device 130 shown in FIG.
At this time, the configuration of the cleaning device 130 and the cleaning conditions are such that the inflow port 135 is configured to pour deionized water from the periphery, the inflow amount of the deionized water is 100 liter / min, Except that the outflow rate of the deionized water is 100 liters / minute, it is the same as in Comparative Example 1, and thus the description is omitted. The number of particles on the glass substrate 8 after the cleaning was measured in the same manner as in Example 1. Figure 1 shows the results.
This is shown in FIG.

Comparative Example 5 FIG. 14 shows a conventional cleaning apparatus.
The glass substrate 8 was cleaned in the same manner as in Comparative Example 1 except that the cleaning device 160 of the tornado type shown in FIG. At this time, the configuration of the cleaning device 160 and the cleaning conditions are such that the inflow port 165 is located at the upper end of the opposite side of the cleaning tank 163.
And the outlet 168 is connected to the inlet 1
Except that one is provided at the lower end of the side surface on which one of the 65 is provided, it is the same as Comparative Example 1, and therefore the description is omitted. The number of particles on the glass substrate 8 after the cleaning was measured in the same manner as in Example 1. The result is shown in FIG.
Shown in

Comparative Example 6 FIG. 15 shows a conventional cleaning apparatus.
The glass substrate 8 was cleaned in the same manner as in Comparative Example 1 except that a tornado-type cleaning device 170 shown in FIG. The configuration and cleaning conditions of the cleaning device 170 at this time were the same as those of Comparative Example 5 except that two outflow ports 178 were provided.
It is omitted because it is the same as. Glass substrate 8 after cleaning
The number of particles above was measured as in Example 1 above.
The result is shown in FIG.

As shown in FIGS. 6A and 6B, in the cleaning apparatuses 1 and 21a of the present embodiment, particles on the glass substrate 8 are uniformly and sufficiently removed without unevenness as a whole. In particular, in the cleaning device 21a provided with the fifth inlet 25c, the glass substrate 8 represented by a white dot is used.
Particles larger than a predetermined size were hardly seen on the top.

On the other hand, FIG. 16 (a) and FIG.
(B) As shown in FIG. 16 (c), in the conventional overflow type cleaning apparatus, even if cleaning is performed under the same conditions as those of the cleaning apparatus of the present invention, the deionized water stagnation and momentum remain in the cleaning tank. Therefore, particles on the glass substrate 8 could not be uniformly removed. Similarly,
As shown in FIGS. 17 (a), 17 (b), and 17 (c), even the uniform outflow type or conventional tornado type cleaning apparatus cannot uniformly remove particles on the glass substrate 8. Was.

Further, on the ten glass substrates 8 cleaned in the first embodiment, there is a problem 5 in the production of the liquid crystal display device.
On average, only 16 particles having a size of μm or more remained on the 10 glass substrates 8 washed in Example 2, and only 4 particles remained on average.

On the other hand, on the ten glass substrates 8 cleaned in Comparative Examples 1 to 6, an average of 50 or more particles remained, and at the same time, FIGS.
6 (c), as shown in FIGS. 17 (a) to 17 (c),
The particles remaining on the glass substrate 8 were uneven. Therefore, when a liquid crystal display device is manufactured using the above-described conventional cleaning device, the yield of the liquid crystal display device is reduced. Further, in order to reduce the number of particles to an amount that does not affect the production, the throughput of the liquid crystal display device also decreases.

As described above, the cleaning apparatus according to the present invention can efficiently clean a large substrate such as a glass substrate used in a liquid crystal display device.
Therefore, particles adhering to the glass substrate to be cleaned can be treated without unevenness in a short time. Therefore, it is possible to suppress a decrease in the quality and yield of the glass substrate due to contamination of particles and the like, and to improve the throughput of a liquid crystal display device to be manufactured.

The cleaning apparatus according to the present invention can further improve the cleaning effect by combining with the existing ultrasonic cleaning method. Further, in the above embodiment, the glass substrate as the object to be cleaned is inclined with respect to the bottom of the cleaning tank. However, in the cleaning apparatus according to the present invention, a high cleaning effect can be obtained without inclining the object to be cleaned. It has become something. The object to be cleaned is not limited to the glass substrate used for the liquid crystal display device, but may be a silicon wafer used for manufacturing an IC or an LSI.

[0136]

As described above, the cleaning apparatus according to the first aspect of the present invention has a substantially rectangular parallelepiped cleaning tank having an area for accommodating an object to be cleaned, and is formed on the first side surface of the cleaning tank. ,
A first inflow portion for flowing a fluid into the cleaning tank, a second inflow portion formed on a second side surface facing the first side surface, and for flowing a fluid into the cleaning bath; Inflow and second
An outlet for discharging the fluid flowing from the inflow portion, and the first inflow portion and / or the second inflow portion have a plurality of inflow ports having different heights from the bottom of the cleaning tank. Configuration.

Therefore, in the above configuration, the formation of a predetermined large flow of the fluid in the cleaning tank is suppressed, and the flow of the fluid is more complicated and vigorous than in the past. . Therefore, the dirt on the surface of the object to be cleaned is removed almost uniformly and efficiently by a complicated and strong flow of current without a large unevenness over the entire surface with the elapse of the cleaning time. Further, since there is no stagnation of the fluid and the flow is strong, there is an effect that dirt removed from the object to be cleaned is prevented from remaining in the cleaning tank.

Further, in the above configuration, the cleaning tank has a substantially rectangular parallelepiped shape, and a complicated and strong flow is formed in the entire cleaning tank having this shape. Therefore, it can be used for cleaning various objects to be cleaned,
It is also possible to clean a large object to be cleaned. In addition, since the flow rate of the fluid is stronger than in the past, there is also an effect that dirt on an object to be cleaned such as particles removed by cleaning can be immediately discharged from the cleaning tank.

As described above, the cleaning apparatus according to the second aspect of the present invention has the first configuration in addition to the configuration according to the first aspect.
The inflow angle of the fluid flowing from the inlet of the inflow section into the cleaning tank and the inflow angle of the fluid flowing from the inflow port of the second inflow section to the cleaning tank are different from each other.

Therefore, in the above configuration, since the inflow angle from the inflow port is different, the flow of the fluid in the cleaning tank can be more complicated. Therefore, there is an effect that generation of fluid stagnation and a weak flow in the cleaning tank can be more effectively prevented.

As described above, the cleaning device according to the third aspect of the present invention has the following features in addition to the configuration according to the first or second aspect.
A position where the inflow port of the first inflow portion is provided;
The position where the inflow port of the inflow portion is formed is a configuration in which the heights from the bottom of the cleaning tank are different from each other.

Therefore, in the above configuration, since the heights of the inflow ports from the bottom of the cleaning tank are different from each other, the flow of the fluid in the cleaning tank can be further complicated. Therefore, there is an effect that generation of fluid stagnation and a weak flow in the cleaning tank can be more effectively prevented.

According to a fourth aspect of the present invention, as described above, in addition to the configuration of the first, second, or third aspect, a plurality of the first and second inflow portions are provided. At least one of the inlets is provided at a position in contact with the bottom of the cleaning tank.

Therefore, in the above configuration, since at least one of the inflow ports is formed at the above position, a strong fluid flow is formed near the bottom of the cleaning tank. Therefore, there is an effect that it is possible to effectively prevent the generation of the fluid stagnation and the weak flow which tend to occur near the bottom of the cleaning tank.

As described above, the cleaning apparatus according to the fifth aspect of the present invention has a substantially rectangular parallelepiped cleaning tank having an area for storing an object to be cleaned in an inclined manner, and an upper end side of the inclined object to be cleaned. A first side surface of the cleaning tank is provided at a position between the upper end and the lower end of the object to be cleaned when viewed from the bottom of the cleaning tank, and a fluid flows into the cleaning tank. A first inflow portion, and a second side surface opposite to the side surface provided with the first inflow portion, provided at a position where the height from the bottom of the cleaning tank is near the lower end of the inclined object to be cleaned. A second inflow portion for flowing a fluid into the cleaning tank, and the first side surface and the second side surface are provided at positions in contact with an upper end surface of the cleaning tank. And a plurality of outlets for discharging the fluid flowing from the two inflow portions. Both the first inlet and / or the second inlet portion is configured such that the height from the cleaning tank bottom has a plurality of different inlets mutually.

Therefore, in the above configuration, the fluid flows in from just beside the upper end and the lower end of the object to be cleaned which is arranged obliquely. As a result, a more complex and strong momentum flow is formed on the object to be cleaned,
This has the effect of increasing the cleaning effect.

In addition, since the object to be cleaned is arranged obliquely, when the object to be cleaned is pulled up from the cleaning tank, the cleaning liquid is easily drained, so that no particles remain on the object to be cleaned. Therefore, there is also an effect that the effect of cleaning the object to be cleaned can be further improved.

As described above, the cleaning apparatus according to the sixth aspect of the present invention has the above-described first aspect in addition to the configuration according to the fifth aspect.
The inflow portion is provided with a first inlet provided at a position lower than a center portion of the inclined cleaning object, and a second inlet provided at a position higher than the center portion. An inlet, and the second inflow portion has a third inlet provided at a position in contact with the bottom of the washing tank, and a height substantially equal to a lower end of the object to be washed when viewed from the bottom of the washing tank. And a fourth inflow port provided at a position corresponding to the first position.

Therefore, in the above configuration, the flow of the fluid on the object to be cleaned is made more complicated without canceling out the momentum thereof, and the generation of the stagnation of the fluid and the generation of the flow with a weak momentum are effectively performed. Can be prevented. Also,
The third inflow port has an effect of effectively preventing a fluid that is likely to be generated near the bottom surface of the cleaning tank from stagnation or weak flow.

As described above, the cleaning apparatus according to the seventh aspect of the present invention has the above-described first aspect in addition to the configuration according to the sixth aspect.
The fluid flowing from the inflow port flows in substantially parallel to the bottom of the washing tank, and the fluid flowing from the second inflow port is:
The fluid that flows obliquely downward toward the bottom of the cleaning tank, the fluid that flows in from the third inlet, flows in substantially parallel to the bottom of the cleaning tank, and the fluid that flows in from the fourth inlet is 2 so as to flow substantially parallel to the side surface.

Therefore, in the above configuration, the fluid flows obliquely downward from the second inflow port, so that the fluid flows from the first inflow port for cleaning the object to be cleaned from right beside and the fluid flows from the oblique direction. Two of the fluid streams for cleaning the cleaning object will be formed. In addition, since these flows flow in a complicated manner without canceling the momentum due to the flow from the inlet of the second inflow section, it is possible to effectively prevent the generation of the fluid stagnation and the weak momentum flow. It has the effect of being able to.

Further, since the fluid flows from the fourth inflow port so as to be substantially parallel to the second side face, that is, along the second side face, the fluid flows near the second side face. It also has an effect that generation of fluid stagnation and weak flow can be effectively prevented.

As described above, the cleaning device according to the eighth aspect of the present invention has the following features in addition to the configuration according to the sixth or seventh aspect.
The second inflow section has a fifth inflow port at a position near an outflow port provided on the second side surface.

Therefore, in the above configuration, the flow of the fluid from the fifth inlet effectively removes dirt removed from the object to be cleaned which tends to remain near the water surface above the cleaning tank. Can be. Therefore, when the object to be cleaned is lifted from the cleaning tank after cleaning, recontamination of the object to be cleaned due to the remaining dirt can be prevented. Further, effectively preventing generation of fluid stagnation and a weakly vibrating flow in a region above the object to be cleaned arranged in the cleaning tank by the flow of the fluid from the fifth inlet. This has the effect that it can be performed.

According to a ninth aspect of the present invention, as described above, in addition to the configuration of the eighth aspect, the amount of fluid flowing in from the fifth inlet is controlled by the amount of fluid flowing in from the other inlet. In this configuration, the amount is smaller than the inflow amount of the fluid.

Therefore, in the above configuration, since the amount of fluid flowing in from the fifth inlet is small, the flow of fluid from the fifth inlet is slightly smaller than the flow of fluid from the other inlets. become weak. Therefore, dirt removed from the object to be cleaned, which tends to remain near the water surface above the cleaning tank,
This has the effect that it can be effectively removed without disturbing the flow of other fluids.

According to a tenth aspect of the present invention, as described above, in addition to the configuration according to any one of the first to ninth aspects, in addition to the configuration according to any one of the first to ninth aspects, the cleaning apparatus further comprises a plurality of the fluid outlets. The apparatus is provided with a circulating means for filtering and flowing the filtered fluid from the inlets of the first and second inflow portions into the washing tank again.

[0158] Therefore, in the above configuration, the fluid discharged from the outlet to the outside of the washing tank is filtered by the filtering means.
The dirt removed from the object to be cleaned is removed. Further, the clean fluid from which the dirt has been removed flows into the cleaning tank again by the circulation means. Therefore, it is possible to efficiently use the fluid used for cleaning the object to be cleaned, and it is not necessary to use a large amount of fluid, so that it is possible to reduce the cost of cleaning.

[Brief description of the drawings]

FIG. 1 is an explanatory diagram illustrating a configuration of a cleaning device according to an embodiment of the present invention.

FIG. 2 is an explanatory diagram showing a configuration of a cleaning tank in the cleaning device of FIG.

FIG. 3 is an explanatory diagram showing a configuration of a cleaning tank in a modified example of the cleaning device of FIG. 1;

FIG. 4 is an explanatory diagram showing a configuration of a cleaning tank in a cleaning apparatus according to another embodiment of the present invention.

FIG. 5 is an explanatory diagram showing a configuration of a cleaning tank in a modified example of the cleaning device of FIG. 4;

6 (a) is a diagram showing a particle concentration on a glass substrate when cleaning is performed using the cleaning apparatus of FIG. 1; and FIG. 6 (b) is a graph showing a particle concentration when cleaning is performed using the cleaning apparatus of FIG. FIG. 3 is a diagram illustrating a particle concentration on a glass substrate.

FIG. 7 is an explanatory view showing a configuration of a conventional overflow type cleaning apparatus.

8 is an explanatory diagram showing a configuration of a cleaning tank in the overflow-type cleaning device of FIG. 7;

FIG. 9 is an explanatory view showing a configuration of a cleaning tank in another example of the conventional overflow type cleaning apparatus.

FIG. 10 is an explanatory view showing a configuration of a cleaning tank in still another example of the conventional overflow type cleaning apparatus.

FIG. 11 is an explanatory diagram showing a configuration of a cleaning tank in a conventional uniform outflow type cleaning apparatus.

FIG. 12 is an explanatory diagram showing a configuration of a cleaning tank in another example of a conventional uniform outflow type cleaning apparatus.

FIG. 13 is an explanatory view showing a configuration of a cleaning tank in still another example of the conventional uniform outflow type cleaning apparatus.

FIG. 14 is an explanatory view showing a configuration of a cleaning tank in a conventional tornado type cleaning apparatus.

FIG. 15 is an explanatory view showing a configuration of a cleaning tank in another example of a conventional tornado type cleaning apparatus.

16 (a) is a diagram showing the particle concentration on a glass substrate when cleaning is performed using the cleaning device of FIG. 7, and FIG. 16 (b) is a diagram illustrating the particle concentration when cleaning is performed using the cleaning device of FIG. It is a figure which shows the particle density on a glass substrate, (c) is a figure which shows the particle density on a glass substrate at the time of wash | cleaning using the cleaning apparatus of FIG.

17 (a) is a diagram showing the particle concentration on a glass substrate when cleaning is performed using the cleaning device of FIG. 11, and FIG. 17 (b) is a diagram illustrating the case where cleaning is performed using the cleaning device of FIG. FIG. 16 is a diagram illustrating the particle concentration on the glass substrate, and FIG. 15C is a diagram illustrating the particle concentration on the glass substrate when the cleaning is performed using the cleaning device of FIG. 15.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Washing apparatus 2 Circulation part (circulation means) 4 1st inflow part 4a Inflow port 4b Inflow port 5 2nd inflow section 5a Inflow port 5b Inflow port 11 Cleaning apparatus 14 1st inflow section 14a Inflow port 14b Inflow port 15 Second inflow Part 15a Inlet 15b Inlet 21 Cleaning device 21a Cleaning device 24 First inflow portion 24a Inflow port 24b Inflow port 25 Second inflow section 25a Inflow port 25b Inflow port 25c Inflow port

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. ⁷ , DB name) B08B 3/10

Claims (10)

(57) [Claims] 1. A substantially rectangular parallelepiped cleaning tank having an area for storing an object to be cleaned, a first inflow section formed on a first side surface of the cleaning tank, and for flowing a fluid into the cleaning tank; A second inflow portion formed on a second side surface facing the first side surface and configured to flow fluid into the cleaning tank; and a flow configured to discharge fluid flowing from the first inflow portion and the second inflow portion. An outlet, and the first inflow section and / or the second inflow section have a plurality of inflow ports having different heights from the bottom of the cleaning tank. 2. The inflow angle of the fluid flowing from the inlet of the first inflow section into the cleaning tank and the inflow angle of the fluid flowing from the inflow port of the second inflow section into the cleaning tank are different from each other. The cleaning device according to claim 1, wherein: 3. The position where the inlet of the first inlet is provided and the position where the inlet of the second inlet is formed are different in height from the bottom of the washing tank. The cleaning device according to claim 1 or 2, wherein 4. The cleaning apparatus according to claim 1, wherein at least one of the plurality of inlets of the first inflow section and the second inflow section is provided at a position in contact with the bottom of the washing tank. 4. The cleaning device according to 3. 5. A cleaning tank having a substantially rectangular parallelepiped shape having an area for storing an object to be cleaned in an inclined state, and a bottom surface of the cleaning tank on a first side of the cleaning tank in which an upper end side of the inclined object to be cleaned is close to the cleaning tank. And a first inflow portion for flowing a fluid into the cleaning tank, the first inflow portion being provided at a position between the heights corresponding to the upper end and the lower end of the object to be cleaned, and the first inflow portion being provided. A second inflow is provided at a position facing the lower side of the object to be cleaned inclined from the bottom surface of the cleaning tank on a second side surface opposite to the side surface of the cleaning tank. And a first inflow portion and a second inflow portion provided on the first side surface and the second side surface in contact with the upper end surface of the cleaning tank.
A plurality of outlets for discharging the fluid flowing from the inflow portion, and the first inflow portion and / or the second inflow portion have a plurality of inflow ports having different heights from the bottom of the cleaning tank. A cleaning device, comprising: 6. The first inflow section is provided with a first inflow port provided at a position lower than a center portion of the inclined object to be cleaned, and at a position higher than the center portion. A second inflow port provided with the third inflow port provided at a position in contact with the bottom surface of the cleaning tank, and the second inflow portion is provided with the second inlet port as viewed from the bottom surface of the cleaning tank. 6. The cleaning apparatus according to claim 5, further comprising a fourth inlet provided at a position substantially at the same height as the lower end of the cleaning object. 7. The fluid flowing from the first inlet flows in substantially parallel to the bottom of the cleaning tank, and the fluid flowing from the second inlet flows obliquely downward toward the bottom of the cleaning tank. As the fluid flows in, the fluid flowing in from the third inlet flows in substantially parallel to the bottom of the cleaning tank, and the fluid flowing in from the fourth inlet flows in substantially parallel to the second side surface. The cleaning device according to claim 6, wherein the cleaning device flows into the cleaning device. 8. The apparatus according to claim 6, wherein the second inflow portion further has a fifth inflow port at a position near an outflow port provided on the second side surface. 8. The cleaning device according to 7. 9. The flow rate of the fluid from the fifth inlet is:
9. The cleaning device according to claim 8, wherein the amount is smaller than the amount of fluid flowing in from the other inlet. 10. A circulating means for filtering fluid discharged from the plurality of outlets and flowing the filtered fluid from the inlets of the first and second inlet portions into the washing tank again. 10. The method according to claim 1, wherein:
The cleaning device according to Item.