JP3386892B2 - Wash tank - Google Patents

Wash tank

Info

Publication number
JP3386892B2
JP3386892B2 JP18558694A JP18558694A JP3386892B2 JP 3386892 B2 JP3386892 B2 JP 3386892B2 JP 18558694 A JP18558694 A JP 18558694A JP 18558694 A JP18558694 A JP 18558694A JP 3386892 B2 JP3386892 B2 JP 3386892B2
Authority
JP
Japan
Prior art keywords
tank
cleaning
cleaning liquid
cleaned
discharge port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18558694A
Other languages
Japanese (ja)
Other versions
JPH0851093A (en
Inventor
豊 平塚
正 秋山
道他 佐々木
Original Assignee
株式会社ダン科学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ダン科学 filed Critical 株式会社ダン科学
Priority to JP18558694A priority Critical patent/JP3386892B2/en
Publication of JPH0851093A publication Critical patent/JPH0851093A/en
Application granted granted Critical
Publication of JP3386892B2 publication Critical patent/JP3386892B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、半導体装置の製造に際
し、ウェハ等の洗浄を行う洗浄槽に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning tank for cleaning a wafer or the like when manufacturing a semiconductor device.
【0002】[0002]
【従来の技術】半導体装置の製造でウェハ等の洗浄に用
いる洗浄槽は通常オーバーフロー槽が用いられ、洗浄槽
の底部に設けた洗浄液注入口から注入した洗浄液が、保
持棚上の洗浄物中または洗浄物の周囲を上昇して流れ、
上記洗浄液の自由表面から洗浄槽の上端外周に設けた溝
にオーバーフローさせ、排出口から槽外に排出する。上
記洗浄物は一般に合成樹脂製のカセットに多数個併置し
たウェハであり、自動搬送装置の吊具で上記カセットを
係止して搬送し、上記洗浄槽の直上で洗浄液中に浸漬さ
れる。また、上記排出口から排出された汚染洗浄液は、
洗浄槽外においてフィルタを透過し清浄化されたのち、
再び上記洗浄槽に循環して供給される。上記従来技術で
は、流入した洗浄液は洗浄槽内に拡がって上昇するが、
洗浄物を通過する際の抵抗が大きく洗浄物の外側を上昇
する洗浄液よりも流速が遅くなり、十分な洗浄効果を得
にくく、またオーバーフローしきれない汚染洗浄液の一
部が洗浄槽内壁に沿って下降し、洗浄槽内で還流を生じ
るため、洗浄物から遊離した微粒子の一部が滞留するこ
とになり、洗浄を繰り返すと次第に洗浄液中の汚染粒子
が蓄積して著しく洗浄効果が低下する。これらの問題を
解決するために発明者らは、図4に示すように洗浄物5
を搬出入できるだけの間隙と高さを有する筒状の囲壁1
6を洗浄槽15の底部に固着し、上記囲壁16中に設置
した洗浄物5が十分浸漬される囲壁中間の位置に、所定
細孔を所要数設けた洗浄物5の支持棚7を設置し、洗浄
槽下部の囲壁外側の注入口3から注入した洗浄液4を吸
引排出する排出口8を、上記支持棚7下方の洗浄槽底部
に設けた洗浄槽を提案した(特願平5−260506
号)。
2. Description of the Related Art An overflow tank is usually used as a cleaning tank used for cleaning wafers in the manufacture of semiconductor devices, and the cleaning solution injected from the cleaning solution injection port provided at the bottom of the cleaning tank is used for cleaning the contents on the holding shelf or Rise around the wash and flow,
The free surface of the cleaning liquid is overflowed into a groove provided on the outer periphery of the upper end of the cleaning tank and discharged from the discharge port to the outside of the tank. The above-mentioned washed product is generally a large number of wafers placed side by side in a cassette made of synthetic resin, and the cassette is locked and conveyed by a suspending tool of an automatic conveyance device, and immersed in the cleaning liquid just above the cleaning tank. Also, the contaminated cleaning liquid discharged from the discharge port is
After passing through the filter and being cleaned outside the cleaning tank,
It is circulated and supplied again to the cleaning tank. In the above conventional technology, the inflowing cleaning liquid spreads and rises in the cleaning tank,
The flow velocity is slower than that of the cleaning liquid that has a large resistance when passing through the cleaning product and rises outside the cleaning product, and it is difficult to obtain a sufficient cleaning effect, and some of the contaminated cleaning liquid that cannot overflow overflows along the inner wall of the cleaning tank. Since it descends and causes reflux in the cleaning tank, some of the fine particles released from the cleaning product will stay, and when cleaning is repeated, contaminant particles in the cleaning liquid gradually accumulate and the cleaning effect remarkably decreases. In order to solve these problems, the inventors of the present invention, as shown in FIG.
Cylindrical enclosure 1 with a gap and height that can carry in and out
6 is fixed to the bottom of the cleaning tank 15, and a support shelf 7 for the cleaning product 5 provided with a predetermined number of predetermined pores is installed at a position in the middle of the surrounding wall where the cleaning product 5 installed in the surrounding wall 16 is sufficiently immersed. , A cleaning tank having an outlet 8 for sucking and discharging the cleaning liquid 4 injected from the inlet 3 on the outer side of the lower wall of the cleaning tank is provided at the bottom of the cleaning tank below the support shelf 7 (Japanese Patent Application No. 5-260506).
issue).
【0003】[0003]
【発明が解決しようとする課題】上記提案によってオー
バーフロー型洗浄槽の問題点は大幅に改善されたが、上
記改良された洗浄槽が比較的狭い囲壁内に洗浄液を流し
て被洗浄物を洗浄するのに対し、短時間により効果的な
洗浄を行うために多量の洗浄液を円滑に流すことが期待
されるとともに、洗浄槽そのものの洗浄を容易に行うこ
とができ、常に洗浄槽内から汚染微粒子を容易に除去で
きる、保守管理がしやすい洗浄槽が求められていた。
Although the problems of the overflow type cleaning tank are greatly improved by the above proposal, the improved cleaning tank flows the cleaning liquid into the relatively narrow wall to clean the object to be cleaned. On the other hand, a large amount of cleaning liquid is expected to flow smoothly in order to carry out effective cleaning in a short time, and the cleaning tank itself can be easily cleaned, and contaminated fine particles are always removed from the cleaning tank. There was a need for a cleaning tank that can be easily removed and is easy to maintain.
【0004】本発明は、短時間に効率よく洗浄でき、し
かも保守管理がしやすい洗浄槽を得ることを目的とす
る。
An object of the present invention is to provide a cleaning tank which can be efficiently cleaned in a short time and which can be easily maintained and managed.
【0005】[0005]
【課題を解決するための手段】上記目的は、内槽と外槽
との2重槽からなる洗浄槽を用い、上記内槽の外周上部
に上記外槽との間隙をほぼ塞ぐように底面と平行に多孔
板を設けるとともに、被洗浄物が洗浄液に十分浸漬でき
る内槽内の位置に、上記被洗浄物を載架する多孔板を支
持台として設けた内槽を、該内槽の上縁が上記外槽の上
縁より十分低く、かつ周囲にほぼ等しい間隙を保って外
槽内部に着脱自在に設置できる構成とし、上記外槽底部
中央の注入口から注入し、外槽と内槽の間隙を上昇して
内槽上縁から被洗浄物に注ぐ洗浄液の排出口を、接続手
段を介し槽外の排出管に接続することにより達成され
る。
[Means for Solving the Problems] The above-mentioned object is to use a cleaning tank composed of a double tank including an inner tank and an outer tank, and to provide a bottom surface on the outer peripheral upper part of the inner tank so as to substantially close a gap between the inner tank and the outer tank. In addition to providing the perforated plates in parallel, the inner tank provided with the perforated plate on which the above-mentioned object to be cleaned is mounted as a support base is positioned at a position within the inner tank where the object to be cleaned can be sufficiently immersed in the cleaning liquid. Is sufficiently lower than the upper edge of the outer tub and can be removably installed inside the outer tub while maintaining a substantially equal gap around the outer tub. This is achieved by connecting the discharge port of the cleaning liquid, which rises the gap and pours from the upper edge of the inner tank to the object to be cleaned, to the discharge pipe outside the tank via the connecting means.
【0006】また、上記内槽に設けた排出口を、ポール
ジョイントを介して外槽に設置した排出管に接続される
ことにより達成され、あるいは上記内槽に設けた排出口
を、Oリングシールの継手を介して排出管に接続するこ
とにより達成できる。
Further, the discharge port provided in the inner tank is connected to a discharge pipe provided in the outer tank through a pole joint, or the discharge port provided in the inner tank is O-ring sealed. It can be achieved by connecting to the discharge pipe through the joint of the.
【0007】[0007]
【作用】本発明による洗浄槽は、内槽と外槽とからなる
2重槽構造の洗浄槽であって、外槽内壁に対しほぼ等間
隔であり、内槽の上縁が外槽の上縁より十分低くなるよ
うに、着脱自在に設置できる内槽の外周上部には、外槽
との間隙をほぼ塞ぐように底面と平行に設けた多孔板を
有し、被洗浄物が洗浄液に十分浸漬できる内槽内の位置
に、上記被洗浄物を支持する多孔板の支持台を設けてい
る。上記外槽の底部中央から注入した洗浄液をほぼ均等
な流速で上記内槽の上縁に運び、内槽内の被洗浄物に多
量の洗浄液を一様に注ぎ、上記被洗浄物から遊離した汚
染微粒子を含む汚染洗浄液を内槽底部に設けた排出口か
ら排出するが、上記内槽を外槽に対して容易に着脱でき
る構成にするために、上記内槽底部の排出口は上記外槽
外に設けた排出管に、着脱自在でしかも気密に接続する
必要があるため、中間に接続手段を介して接続してい
る。そのため、上記内槽を外槽の定位置に装着すると、
上記内槽の外周に設けた多孔板は外槽内壁との空間をほ
ぼ塞ぎ、外槽底部中央より注入され平均に内槽の外壁に
沿って上昇する洗浄液が上記多孔板を通過することによ
り整流され、上記内槽の上縁から一様に内槽内の被洗浄
物に注がれる。上記被洗浄物を通過し汚染微粒子を遊離
した汚染洗浄液は、そのまま内槽底部の排出口に吸入さ
れるが、上記排出口は外槽底部に設けた排出管に気密に
接続されているため、外槽内に汚染洗浄液が混入するこ
となく、内槽と外槽との間の空間を通過して洗浄槽の外
部に排出される。なお、排出された汚染洗浄液は、ポン
プで吸引されフィルタを通して清浄化されたのち、再び
外槽のほぼ中央部に設けた注入口から洗浄槽内に注入さ
れ、循環使用することができる。
The cleaning tank according to the present invention is a cleaning tank having a double tank structure composed of an inner tank and an outer tank, which are substantially equidistant from the inner wall of the outer tank, and the upper edge of the inner tank is above the outer tank. At the upper part of the outer periphery of the inner tank that can be detachably installed so that it is sufficiently lower than the edge, there is a perforated plate that is parallel to the bottom so as to close the gap with the outer tank. A support base of a perforated plate that supports the object to be cleaned is provided at a position in the inner tank where it can be dipped. The cleaning liquid injected from the center of the bottom of the outer tank is conveyed to the upper edge of the inner tank at a substantially uniform flow rate, and a large amount of the cleaning liquid is evenly poured onto the object to be cleaned in the inner tank, resulting in contamination released from the object to be cleaned. The contaminated cleaning liquid containing fine particles is discharged from the discharge port provided at the bottom of the inner tank, but the discharge port at the bottom of the inner tank is outside the outer tank so that the inner tank can be easily attached to and detached from the outer tank. Since it is necessary to connect to the discharge pipe provided in the above in a detachable and airtight manner, it is connected in the middle through a connecting means. Therefore, when the inner tank is installed in a fixed position on the outer tank,
The perforated plate provided on the outer periphery of the inner tank substantially closes the space with the inner wall of the outer tank, and the cleaning liquid that is injected from the center of the bottom of the outer tank and rises along the outer wall of the inner tank on average flows through the perforated plate to rectify the flow. Then, the object to be cleaned in the inner tank is uniformly poured from the upper edge of the inner tank. The contaminated cleaning liquid that has passed through the object to be cleaned and liberated contaminated fine particles is directly sucked into the discharge port at the bottom of the inner tank, but since the discharge port is airtightly connected to the discharge pipe provided at the bottom of the outer tank, The contaminated cleaning liquid is not mixed into the outer tank, and passes through the space between the inner tank and the outer tank and is discharged to the outside of the cleaning tank. The discharged contaminated cleaning liquid is sucked by a pump, cleaned through a filter, and then again injected into the cleaning tank from an injection port provided at the substantially central portion of the outer tank, and can be reused.
【0008】[0008]
【実施例】つぎに本発明の実施例を図面とともに説明す
る。図1は本発明による洗浄槽の一実施例を示す断面
図、図2は上記実施例における内槽排出口と排出管との
接続を示す図、図3は上記実施例における洗浄液の循環
ろ過を行う場合と、純水リンスを行う場合の配管系をそ
れぞれ示す図である。
Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a cross-sectional view showing an embodiment of a cleaning tank according to the present invention, FIG. 2 is a view showing a connection between an inner tank discharge port and a discharge pipe in the above embodiment, and FIG. 3 is a circulation filtration of a cleaning liquid in the above embodiment. It is a figure which shows the piping system at the time of performing and pure water rinse, respectively.
【0009】図1に示す本発明の洗浄槽は、内槽1と外
槽2とからなる2重槽で構成され、上記内槽1は上記外
槽2の内壁から底面も含めてほぼ等間隔を保ち、かつ内
槽1の上縁が外槽2の上縁より十分低くなるように設け
られ、上記外槽2の底部中央に設けた注入口3から洗浄
槽内に注入された洗浄液4が、上記内槽1と外槽2との
間隙を上昇して内槽1の上縁を越えて、内槽1内の被洗
浄物5に注ぐ。上記内槽1の外周上部には外槽2との間
隙をほぼ塞ぐように小さな孔を多数設けた多孔板6を底
面と平行に固着し、内槽1の内部には被洗浄物5が洗浄
液4に十分浸漬される位置に多板孔を設け上記被洗浄物
5の支持台7にしている。上記内槽1と外槽2との間の
間隙は、注入口3より注入する洗浄液4の流れをできる
だけ均一にするために少なくとも20mm以上にする
が、上記間隙が大きくなると洗浄槽全体が大形化するの
で、40mm程度にとどめるのが望ましく、また、内槽
1の外周に固着した多孔板6は、直径数mm程度の孔を
多数一様な間隔で設け、内槽1の上縁から内部の被洗浄
物5に一様な流速で洗浄液4を注ぐように整流するため
に、内槽1と外槽2との間隙の適当な位置に設けなけれ
ばならないが、加工の容易さから内槽1の外壁で上縁か
ら数10mm以上低い位置に外槽2と1〜2mm距てて
設けるとよい。また、上記支持台7は数mm径の孔をほ
ぼ均一な間隔で全面に設け、汚染微粒子を遊離して含む
汚染洗浄液を均一な流速で速やかに流下させるため、支
持台7の設置位置は内槽底面の少なくとも20mm程度
上に設けるようにする。
The cleaning tank of the present invention shown in FIG. 1 is composed of a double tank composed of an inner tank 1 and an outer tank 2, and the inner tank 1 is substantially equidistant from the inner wall of the outer tank 2 to the bottom surface thereof. And the upper edge of the inner tank 1 is sufficiently lower than the upper edge of the outer tank 2, and the cleaning liquid 4 injected into the cleaning tank from the injection port 3 provided at the center of the bottom of the outer tank 2 is Then, the gap between the inner tank 1 and the outer tank 2 is raised to cross the upper edge of the inner tank 1 and pour on the object to be cleaned 5 in the inner tank 1. A perforated plate 6 having a large number of small holes so as to substantially close the gap with the outer tank 2 is fixed to the upper part of the outer periphery of the inner tank 1 in parallel with the bottom surface. 4 is provided with a multi-plate hole at a position where it is sufficiently immersed in the substrate 4, and is used as a support base 7 for the article 5 to be cleaned. The gap between the inner tank 1 and the outer tank 2 is at least 20 mm or more in order to make the flow of the cleaning liquid 4 injected from the injection port 3 as uniform as possible. However, if the gap becomes large, the entire cleaning tank becomes large. Therefore, it is desirable to keep it to about 40 mm, and the perforated plate 6 fixed to the outer periphery of the inner tank 1 is provided with a large number of holes having a diameter of about several mm at even intervals, and In order to rectify the cleaning liquid 4 into the article to be cleaned 5 at a uniform flow rate, it must be provided at an appropriate position in the gap between the inner tank 1 and the outer tank 2, but it is easy to process because It is advisable to provide the outer wall of the tank 1 at a position lower than the upper edge by several tens of mm or more with a distance of 1 to 2 mm from the outer tank 2. Further, the support base 7 is provided with holes having a diameter of several mm at substantially uniform intervals over the entire surface thereof, and the contaminated cleaning liquid containing the contaminated fine particles is quickly flowed down at a uniform flow rate. At least 20 mm above the bottom of the tank.
【0010】被洗浄物5として、例えばカセットに併置
した多数のウェハをを上記支持台7に載架した場合に
は、上記カセットやウェハの間を通過する洗浄液が汚染
微粒子を遊離する。これらの汚染微粒子を含む汚染洗浄
液は上記支持台7の細孔を通り内槽1の底面に設けた排
出口8から洗浄槽外に排除される。しかしながら、上記
内槽1は外槽2に対し着脱自在に装着するために、上記
排出口8から排出する汚染洗浄液を外槽2内の清浄洗浄
液に影響を与えないようにして、外槽2の外に設けた排
出管に導く必要があり、そのために、上記内槽1の排出
口8と外槽2に取り付けた排出管との接続手段が重要で
ある。
When a large number of wafers placed in parallel in a cassette are placed on the support base 7 as the objects to be cleaned 5, the cleaning liquid passing between the cassettes and the wafers releases contaminated fine particles. The contaminated cleaning liquid containing these contaminated fine particles passes through the pores of the support base 7 and is discharged to the outside of the cleaning tank from the discharge port 8 provided on the bottom surface of the inner tank 1. However, since the inner tank 1 is detachably attached to the outer tank 2, the contaminated cleaning liquid discharged from the outlet 8 is prevented from affecting the clean cleaning liquid in the outer tank 2, It is necessary to lead to the discharge pipe provided outside, and for that purpose, the connecting means between the discharge port 8 of the inner tank 1 and the discharge pipe attached to the outer tank 2 is important.
【0011】上記排出管に対する内槽1の排出口8を接
続する手段の一例は、図2(a)に示すようにボールジ
ョイントを使用する方法である。内槽1の底面中央近く
に設けた排出口8の突出した先端を球面状に形成し、一
方外槽2の底面中央近くに固着貫通するように設けた排
出管10の外槽2内の先端を、上記排出管8の突出先端
の球面に対応する凹面状に形成する。上記内槽1を外槽
2内の定位置に設置すると、上記球面状排出口8は上記
凹面状排出管10の先端に気密に嵌合し、上記球面状排
出口8と同様に内槽1の底面外方に突出して設けた少な
くとも2本の突出支柱(図示せず)とともに、上記内槽
1を外槽2内に一定の間隙を保って安定に保持すること
ができる。
An example of means for connecting the discharge port 8 of the inner tank 1 to the discharge pipe is a method using a ball joint as shown in FIG. 2 (a). The protruding tip of the discharge port 8 provided near the center of the bottom surface of the inner tank 1 is formed into a spherical shape, while the tip of the discharge pipe 10 provided inside the outer tank 2 so as to be fixed and penetrated near the center of the bottom surface of the outer tank 2. Is formed in a concave shape corresponding to the spherical surface of the protruding tip of the discharge pipe 8. When the inner tub 1 is installed at a fixed position in the outer tub 2, the spherical discharge port 8 is airtightly fitted to the tip of the concave discharge pipe 10, and like the spherical discharge port 8, the inner tub 1 is closed. The inner tub 1 can be stably held in the outer tub 2 with a constant gap, together with at least two projecting struts (not shown) provided so as to project outward from the bottom surface of the.
【0012】また、図2(b)に示す接続手段は、Oリ
ングシール継手を用いた方法であって、図示のように内
槽1の中央底面に設けた排出口8は、内槽1の外側に向
けて管状に突出して形成されている。外槽2の底部中心
には、上記管状に突出した排出口8が十分な間隙を周囲
に設けて容易に挿通できるように、大きく外方向に突出
した注入口3を設け、上記管状に突出した排出口8と上
記突出注入口3との接合部に、Oリングシール11を介
してOリングシール継手12を嵌入している。上記Oリ
ングシール継手12は、排出管接続口10と注入管接続
口13を有している。なお、上記内槽1の底面には、内
槽1と外槽2との間隔を一定に保持するための複数本の
支柱が設けられている(図示せず)。上記Oリングシー
ル継手によって内槽1の排出口8と外槽2外の排出管と
を接続するときは、洗浄液の注入口3も汚染洗浄液の排
出口8も、それぞれ外槽2および内槽1の底面中央に位
置するため、槽内を流動する洗浄液の流れが整流され、
そのため効率がよい均一な洗浄を行うことができる。
The connecting means shown in FIG. 2 (b) is a method using an O-ring seal joint, and as shown in the figure, the discharge port 8 provided at the center bottom surface of the inner tank 1 is It is formed so as to project in a tubular shape toward the outside. At the center of the bottom portion of the outer tub 2, a large outwardly projecting inlet port 3 is provided so that the tubularly projecting outlet port 8 can be easily inserted by providing a sufficient gap in the periphery and projecting in the tubular form. An O-ring seal joint 12 is fitted into a joint between the discharge port 8 and the protruding injection port 3 via an O-ring seal 11. The O-ring seal joint 12 has a discharge pipe connection port 10 and an injection pipe connection port 13. The bottom surface of the inner tank 1 is provided with a plurality of columns for keeping the distance between the inner tank 1 and the outer tank 2 constant (not shown). When the discharge port 8 of the inner tank 1 and the discharge pipe outside the outer tank 2 are connected by the O-ring seal joint, both the cleaning liquid inlet 3 and the contaminated cleaning liquid discharge port 8 are connected to the outer tank 2 and the inner tank 1, respectively. Since it is located in the center of the bottom of the tank, the flow of cleaning liquid flowing in the tank is rectified,
Therefore, efficient and uniform cleaning can be performed.
【0013】本発明の洗浄槽において洗浄液を循環ろ過
するには、図3(a)に示すような構成にする。すなわ
ち、内槽1の排出口8から排出された汚染洗浄液は、ポ
ンプおよび流量計を経てフィルタに至り、洗浄液中の汚
染微粒子が上記フィルタで除かれ、再び清浄にされたの
ち注入口3を経て外槽2内に導かれるが、このような循
環ろ過を特に高温度薬液に対して行う場合には、上記排
出口8と外槽2の外に設けられた排出管との接続に、ボ
ールジョイントによる方法を用いるのが適している。
In order to circulate and filter the cleaning liquid in the cleaning tank of the present invention, the structure shown in FIG. 3 (a) is used. That is, the contaminated cleaning liquid discharged from the discharge port 8 of the inner tank 1 reaches the filter through the pump and the flow meter, the contaminated fine particles in the cleaning liquid are removed by the filter, and the cleaning liquid is cleaned again and then passed through the injection port 3. Although it is introduced into the outer tub 2, when such circulation filtration is carried out especially for a high temperature chemical liquid, a ball joint is used to connect the discharge port 8 and a discharge pipe provided outside the outer tub 2. It is suitable to use the method according to.
【0014】つぎに、洗浄を行ったのちに純水によるリ
ンスを行う場合の配管系構成を図3(b)に示す。注入
口3には所要純度の純水配管をフィルタを介して接続し
純水を外槽2内に注入するが、一方、内槽1において支
持台7を通過した汚染された純水は、ポンプ、流量計を
経て排水ドレンに接続されるが、この場合の排出管の接
続にはOリングシール継手による方法が適している。
Next, FIG. 3B shows a piping system configuration in the case of rinsing with pure water after cleaning. Pure water pipe of required purity is connected to the inlet 3 through a filter to inject pure water into the outer tank 2. On the other hand, contaminated pure water which has passed through the support 7 in the inner tank 1 is pumped. , Is connected to the drainage drain through the flowmeter, and in this case, a method using an O-ring seal joint is suitable for connecting the discharge pipe.
【0015】上記のように本発明の洗浄槽は、外槽に着
脱自在に装着し、内槽・外槽間隙を十分確保した2槽構
造で、上記間隙に多孔板を設けて整流作用を行わせてい
るので、外槽底面の中央から注入した洗浄液は一様な流
速で内槽上縁から被洗浄物に注ぎ、被洗浄物から遊離し
た汚染粒子などの汚れは洗浄槽内に広く拡散することな
く流下し、短時間に洗浄できるとともに、上記内槽の排
出口に接続手段を介して槽外の排出管と接続するため、
製作が容易になるだけでなく、上記2槽を取り外してそ
れぞれ必要時に洗浄することができ保守管理が容易なた
め、槽底の沈降粒子による洗浄液の汚染を防ぎ効率がよ
い洗浄を行うことができる。
As described above, the cleaning tank of the present invention has a two-tank structure in which it is detachably attached to the outer tank and a sufficient gap is secured between the inner tank and the outer tank. Since the cleaning solution is injected from the center of the bottom of the outer tank, it is poured at a uniform flow rate from the upper edge of the inner tank to the object to be cleaned, and contaminants released from the object to be cleaned diffuse widely into the cleaning tank. Without flowing down, it can be washed in a short time, and because it is connected to the discharge port outside the tank via the connecting means to the discharge port of the inner tank,
Not only is the production easy, but the above two tanks can be removed and each can be cleaned when necessary, and maintenance management is easy, so that the cleaning liquid can be prevented from being contaminated by sedimented particles at the bottom of the tank and efficient cleaning can be performed. .
【0016】[0016]
【発明の効果】上記のように本発明による洗浄槽は、内
槽と外槽との2重槽からなる洗浄槽を用い、上記内槽の
外周上部に上記外槽との間隙をほぼ塞ぐように底面と平
行に多孔板を設けるとともに、被洗浄物が洗浄液に十分
浸漬できる内槽内の位置に、上記被洗浄物を載架する多
孔板を支持台として設けた内槽を、該内槽の上縁が上記
外槽の上縁より十分低く、かつ周囲にほぼ等しい間隙を
保って外槽内部に着脱自在に設置できる構成とし、上記
外槽底部中央の注入口から注入し、外槽と内槽の間隙を
上昇して内槽上縁から被洗浄物に注ぐ洗浄液の排出口
を、接続手段を介して槽外の排出管に接続することによ
り、外槽中央より注入された洗浄液が一様に分布して内
槽との十分な間隙を上昇し、多孔板で整流されて内槽上
縁より被洗浄物に注ぎ、汚染微粒子を遊離した汚染洗浄
液を、支持台の多孔板を通し内槽底面中央近くに設けた
排出口により槽外に排出させるため、短時間で良好な洗
浄を行うことができ、かつ、内槽の排出口を接続手段を
介して槽外の排出管に接続するため、上記汚染洗浄液が
外槽内に漏出することなく、上記内槽を外槽から容易に
取り外すことができ、洗浄槽の清浄化や保守管理が簡単
で効率がよい洗浄を常に行うことができる。
As described above, the cleaning tank according to the present invention uses a cleaning tank composed of a double tank including an inner tank and an outer tank, and substantially closes a gap between the outer tank and the outer peripheral portion of the inner tank. In addition to providing a perforated plate parallel to the bottom surface of the inner tank, an inner tank provided with a perforated plate on which the object to be cleaned is mounted as a support base at a position in the inner tank where the object to be cleaned can be sufficiently immersed in the cleaning liquid. The outer edge of the outer tank is sufficiently lower than the upper edge of the outer tank, and the outer tank has a structure in which it can be detachably installed inside the outer tank with a gap substantially equal to that of the outer tank. By connecting the discharge port of the cleaning liquid, which rises the gap of the inner tank and pours from the upper edge of the inner tank to the object to be cleaned, to the discharge pipe outside the tank through the connecting means, the cleaning liquid injected from the center of the outer tank is Distributed in a uniform manner to raise a sufficient gap with the inner tank, rectified by a perforated plate and poured onto the object to be cleaned from the upper edge of the inner tank. Since the contaminated cleaning liquid from which contaminated fine particles are released is discharged through the perforated plate of the support table to the outside of the tank through the discharge port provided near the center of the inner tank bottom, good cleaning can be performed in a short time, and Since the discharge port of the tank is connected to the discharge pipe outside the tank through the connecting means, the inner tank can be easily removed from the outer tank without the contaminated cleaning liquid leaking into the outer tank. Easy cleaning and maintenance management and efficient cleaning can always be performed.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明による洗浄槽の一実施例を示す断面図で
ある。
FIG. 1 is a sectional view showing an embodiment of a cleaning tank according to the present invention.
【図2】上記実施例における内槽排出口と排出管の接続
を示す図で、(a)はボールジョイントによる方法を示
す図、(b)はOリングシール継手を用いる方法を示す
図である。
2A and 2B are views showing the connection between the inner tank discharge port and the discharge pipe in the above embodiment, FIG. 2A is a view showing a method using a ball joint, and FIG. 2B is a view showing a method using an O-ring seal joint. .
【図3】上記実施例の洗浄液循環ろ過と純水リンスを行
う配管系を示す図で、(a)は洗浄液の循環ろ過の場合
を示す図、(b)は純水リンスの場合を示す図である。
3A and 3B are diagrams showing a piping system for circulating and filtering cleaning liquid and rinsing with pure water in the above-mentioned embodiment, FIG. 3A is a diagram showing a case of circulating filtration of a cleaning liquid, and FIG. 3B is a diagram showing a case of rinsing with pure water. Is.
【図4】従来の洗浄槽の一例を示す図である。FIG. 4 is a diagram showing an example of a conventional cleaning tank.
【符号の説明】[Explanation of symbols]
1 内槽 2 外槽 3 注入口 4 洗浄液 5 被洗浄物 6 多孔板 7 支持台 8 排出口 9 ボールジョイント 10 排出管 12 Oリング 14 接続手段 1 inner tank 2 outer tank 3 Injection port 4 Cleaning solution 5 Items to be cleaned 6 Perforated plate 7 Support 8 Ejection port 9 Ball joint 10 Discharge pipe 12 O-ring 14 Connection means
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平8−31787(JP,A) 特開 平6−61209(JP,A) 特開 平1−242116(JP,A) 特開 平4−323824(JP,A) 特開 平5−74753(JP,A) 特開 平4−247621(JP,A) 特開 昭63−156533(JP,A) 特開 平5−234978(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 21/304 ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP-A-8-31787 (JP, A) JP-A-6-61209 (JP, A) JP-A-1-242116 (JP, A) JP-A-4- 323824 (JP, A) JP 5-74753 (JP, A) JP 4-247621 (JP, A) JP 63-156533 (JP, A) JP 5-234978 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H01L 21/304

Claims (3)

    (57)【特許請求の範囲】(57) [Claims]
  1. 【請求項1】内槽と外槽との2重槽からなる洗浄槽を用
    い、上記内槽の外周上部に上記外槽との間隙をほぼ塞ぐ
    ように底面と平行に多孔板を設けるとともに、被洗浄物
    が洗浄液に十分浸漬できる内槽内の位置に、上記被洗浄
    物を載架する多孔板を支持台として設けた内槽を、該内
    槽の上縁が上記外槽の上縁より十分低く、かつ周囲にほ
    ぼ等しい間隙を保って外槽内部に着脱自在に設置できる
    構成とし、上記外槽底部中央の注入口から注入し、外槽
    と内槽の間隙を上昇して内槽上縁から被洗浄物に注ぐ洗
    浄液の排出口を、接続手段を介して槽外の排出管に接続
    した洗浄槽。
    1. A cleaning tank comprising a double tank consisting of an inner tank and an outer tank is used, and a perforated plate is provided in parallel with a bottom surface so as to substantially close a gap between the inner tank and the outer tank. An inner tank provided with a perforated plate on which the above-mentioned to-be-cleaned object is mounted as a support base is provided at a position within the inner tank where the to-be-cleaned object can be sufficiently immersed in the cleaning liquid. It is configured to be detachably installed inside the outer tank with a sufficiently low and almost equal gap around it, and it is injected from the injection port at the center of the bottom of the outer tank, and the gap between the outer tank and the inner tank is raised to A cleaning tank in which the outlet of the cleaning liquid that pours from the edge to the object to be cleaned is connected to a discharge pipe outside the tank via a connecting means.
  2. 【請求項2】上記排出口の接続手段は、ボールジョイン
    トを介して外槽に設置した排出管に接続することを特徴
    とする請求項1記載の洗浄槽。
    2. The cleaning tank according to claim 1, wherein the connection means of the discharge port is connected to a discharge pipe installed in the outer tank via a ball joint.
  3. 【請求項3】上記排出口の接続手段は、Oリングシール
    継手を介して外槽外に設けた排出管に接続することを特
    徴とする請求項1記載の洗浄槽。
    3. The cleaning tank according to claim 1, wherein the connection means of the discharge port is connected to a discharge pipe provided outside the outer tank via an O-ring seal joint.
JP18558694A 1994-08-08 1994-08-08 Wash tank Expired - Fee Related JP3386892B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18558694A JP3386892B2 (en) 1994-08-08 1994-08-08 Wash tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18558694A JP3386892B2 (en) 1994-08-08 1994-08-08 Wash tank

Publications (2)

Publication Number Publication Date
JPH0851093A JPH0851093A (en) 1996-02-20
JP3386892B2 true JP3386892B2 (en) 2003-03-17

Family

ID=16173401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18558694A Expired - Fee Related JP3386892B2 (en) 1994-08-08 1994-08-08 Wash tank

Country Status (1)

Country Link
JP (1) JP3386892B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3643500B2 (en) * 1999-06-29 2005-04-27 健 粟谷 Cleaning device
KR101257482B1 (en) * 2011-10-05 2013-04-24 주식회사 싸이노스 Cleaning apparatus for a shower-head used in manufacturing process of semiconductor
KR101971152B1 (en) 2017-08-18 2019-04-22 에스케이실트론 주식회사 Wafer Cleaning Apparatus And Cleaning Method Using Thereof

Also Published As

Publication number Publication date
JPH0851093A (en) 1996-02-20

Similar Documents

Publication Publication Date Title
JPH0644098Y2 (en) Bubbler for cleaning semiconductor wafers
US4092176A (en) Apparatus for washing semiconductor wafers
KR100252221B1 (en) Wet etching apparatus for semiconductor manufacturing and method of etchant circulation therein
KR100274128B1 (en) Substrate processing apparatus
JPH09283488A (en) Semiconductor wafer washing equipment
JP3146841B2 (en) Wafer rinse equipment
JPH07115080A (en) Cleaning tank
JP3386892B2 (en) Wash tank
JP2920165B2 (en) Overflow tank for single wafer cleaning
KR20130037099A (en) Cleaning apparatus for a shower-head used in manufacturing process of semiconductor
JP3538470B2 (en) Downward rectification type immersion cleaning device
JPH0736399B2 (en) Cleaning rinse tank for semiconductor wafers
JP3289469B2 (en) Substrate cleaning device and cleaning method
JP2012104682A (en) Cleaning apparatus
JPH09186126A (en) Cleaning device for semiconductor wafer
CN113714201A (en) Groove type process system for single-chip wet treatment process
JPH11319734A (en) Apparatus and method for washing and substrate
CN210386771U (en) Silicon wafer cleaning agent tank
JPH0631253A (en) Method and device for washing disk-shaped object
JP3185387B2 (en) Cleaning apparatus and method for cleaning a substrate such as a semiconductor wafer using the same
JP2007105626A (en) Substrate treatment apparatus
KR20000024808A (en) Device and method for etching glass of tft lcd automatically
JPH03266431A (en) Cleaning device of substrate
JPH0831787A (en) Cleaning container
JP2568799Y2 (en) Wafer processing equipment

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080110

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090110

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090110

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100110

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110110

Year of fee payment: 8

LAPS Cancellation because of no payment of annual fees